KR840005494A - 아크플라즈마 발생장치 - Google Patents

아크플라즈마 발생장치 Download PDF

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Publication number
KR840005494A
KR840005494A KR1019830003254A KR830003254A KR840005494A KR 840005494 A KR840005494 A KR 840005494A KR 1019830003254 A KR1019830003254 A KR 1019830003254A KR 830003254 A KR830003254 A KR 830003254A KR 840005494 A KR840005494 A KR 840005494A
Authority
KR
South Korea
Prior art keywords
electrode
arc plasma
combustion chamber
setting
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1019830003254A
Other languages
English (en)
Korean (ko)
Inventor
불카노빅 블라디미르
Original Assignee
래리 윌리암 에반스
더 스탠다드 오일 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 래리 윌리암 에반스, 더 스탠다드 오일 캄파니 filed Critical 래리 윌리암 에반스
Publication of KR840005494A publication Critical patent/KR840005494A/ko
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
KR1019830003254A 1982-07-14 1983-07-14 아크플라즈마 발생장치 Ceased KR840005494A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39815182A 1982-07-14 1982-07-14
US398151 1989-08-24

Publications (1)

Publication Number Publication Date
KR840005494A true KR840005494A (ko) 1984-11-14

Family

ID=23574191

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830003254A Ceased KR840005494A (ko) 1982-07-14 1983-07-14 아크플라즈마 발생장치

Country Status (5)

Country Link
EP (1) EP0099725A3 (cg-RX-API-DMAC10.html)
JP (1) JPS5929031A (cg-RX-API-DMAC10.html)
KR (1) KR840005494A (cg-RX-API-DMAC10.html)
CA (1) CA1197493A (cg-RX-API-DMAC10.html)
IN (1) IN160089B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102502054B1 (ko) * 2022-07-21 2023-02-22 (주)이엠씨 모듈타입의 조립체를 구비한 선박용 플라즈마 밸러스트수 처리장치

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0173583B1 (en) * 1984-08-31 1990-12-19 Anelva Corporation Discharge apparatus
US4668365A (en) * 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
CH664768A5 (de) * 1985-06-20 1988-03-31 Balzers Hochvakuum Verfahren zur beschichtung von substraten in einer vakuumkammer.
EP0383962A1 (de) * 1989-02-20 1990-08-29 Hauzer Holding B.V. Hochspannungsgleichrichter und zugeordnete Steuerelektronik
ATE168819T1 (de) * 1991-03-25 1998-08-15 Commw Scient Ind Res Org Makroteilchenfilter in lichtbogenquelle
US5478608A (en) * 1994-11-14 1995-12-26 Gorokhovsky; Vladimir I. Arc assisted CVD coating method and apparatus
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1154180A (fr) * 1955-06-15 1958-04-03 Du Pont Procédé pour conduire des réactions chimiques
US3416021A (en) * 1966-05-11 1968-12-10 Navy Usa Arc apparatus employing three dimensional arc motion and dynamic balancing
US4003770A (en) * 1975-03-24 1977-01-18 Monsanto Research Corporation Plasma spraying process for preparing polycrystalline solar cells

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102502054B1 (ko) * 2022-07-21 2023-02-22 (주)이엠씨 모듈타입의 조립체를 구비한 선박용 플라즈마 밸러스트수 처리장치
WO2024019223A1 (ko) * 2022-07-21 2024-01-25 (주)이엠씨 모듈타입의 조립체를 구비한 선박용 플라즈마 밸러스트수 처리장치

Also Published As

Publication number Publication date
CA1197493A (en) 1985-12-03
EP0099725A2 (en) 1984-02-01
IN160089B (cg-RX-API-DMAC10.html) 1987-06-27
EP0099725A3 (en) 1985-01-23
JPS5929031A (ja) 1984-02-16

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19830714

A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19830827

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19830714

Comment text: Patent Application

PG1501 Laying open of application
E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 19880104

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D