KR20260019675A - 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들 - Google Patents

변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들

Info

Publication number
KR20260019675A
KR20260019675A KR1020267003749A KR20267003749A KR20260019675A KR 20260019675 A KR20260019675 A KR 20260019675A KR 1020267003749 A KR1020267003749 A KR 1020267003749A KR 20267003749 A KR20267003749 A KR 20267003749A KR 20260019675 A KR20260019675 A KR 20260019675A
Authority
KR
South Korea
Prior art keywords
channel
plenum
dielectric window
coolant
paragraph
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020267003749A
Other languages
English (en)
Korean (ko)
Inventor
한리 이사비
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20260019675A publication Critical patent/KR20260019675A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020267003749A 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들 Pending KR20260019675A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US202062968305P 2020-01-31 2020-01-31
US62/968,305 2020-01-31
PCT/US2021/014505 WO2021154590A1 (en) 2020-01-31 2021-01-22 Plenum assemblies for cooling transformer coupled plasma windows
KR1020227029894A KR102925154B1 (ko) 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020227029894A Division KR102925154B1 (ko) 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들

Publications (1)

Publication Number Publication Date
KR20260019675A true KR20260019675A (ko) 2026-02-10

Family

ID=77078296

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020267003749A Pending KR20260019675A (ko) 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들
KR1020227029894A Active KR102925154B1 (ko) 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020227029894A Active KR102925154B1 (ko) 2020-01-31 2021-01-22 변압기 커플링된 플라즈마 윈도우들을 냉각하기 위한 플레넘 어셈블리들

Country Status (5)

Country Link
US (2) US12261018B2 (https=)
JP (2) JP7706459B2 (https=)
KR (2) KR20260019675A (https=)
CN (1) CN115039197A (https=)
WO (1) WO2021154590A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240297017A1 (en) * 2023-03-01 2024-09-05 Shine Technologies, Llc Jet impingement cooling assembly for plasma windows positioned in a beam accelerator system
US20250087505A1 (en) * 2023-09-12 2025-03-13 Applied Materials, Inc. Microwave annealing for low thermal budget applications
WO2025122269A1 (en) * 2023-12-04 2025-06-12 Lam Research Corporation Assembled window for processing chamber
CN121662693A (zh) * 2024-08-30 2026-03-13 北京北方华创微电子装备有限公司 半导体工艺腔室、半导体工艺设备及介质窗的温控方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8741097B2 (en) 2009-10-27 2014-06-03 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
US9313872B2 (en) 2009-10-27 2016-04-12 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
JP5851681B2 (ja) 2009-10-27 2016-02-03 東京エレクトロン株式会社 プラズマ処理装置
US8608903B2 (en) 2009-10-27 2013-12-17 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
US9530656B2 (en) * 2011-10-07 2016-12-27 Lam Research Corporation Temperature control in RF chamber with heater and air amplifier
US9978565B2 (en) * 2011-10-07 2018-05-22 Lam Research Corporation Systems for cooling RF heated chamber components
US9745663B2 (en) 2012-07-20 2017-08-29 Applied Materials, Inc. Symmetrical inductively coupled plasma source with symmetrical flow chamber
TWI623960B (zh) * 2013-03-27 2018-05-11 Lam Research Corporation 半導體製造設備及其處理方法
US9885493B2 (en) * 2013-07-17 2018-02-06 Lam Research Corporation Air cooled faraday shield and methods for using the same
US9484214B2 (en) * 2014-02-19 2016-11-01 Lam Research Corporation Systems and methods for improving wafer etch non-uniformity when using transformer-coupled plasma
US11538666B2 (en) 2017-11-15 2022-12-27 Lam Research Corporation Multi-zone cooling of plasma heated window

Also Published As

Publication number Publication date
CN115039197A (zh) 2022-09-09
KR102925154B1 (ko) 2026-02-06
WO2021154590A1 (en) 2021-08-05
JP2023511745A (ja) 2023-03-22
US20230065203A1 (en) 2023-03-02
US20250218724A1 (en) 2025-07-03
JP2025148377A (ja) 2025-10-07
KR20220134680A (ko) 2022-10-05
US12261018B2 (en) 2025-03-25
JP7706459B2 (ja) 2025-07-11

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