KR20240164884A - 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 - Google Patents

감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 Download PDF

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KR20240164884A
KR20240164884A KR1020247029186A KR20247029186A KR20240164884A KR 20240164884 A KR20240164884 A KR 20240164884A KR 1020247029186 A KR1020247029186 A KR 1020247029186A KR 20247029186 A KR20247029186 A KR 20247029186A KR 20240164884 A KR20240164884 A KR 20240164884A
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South Korea
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KR1020247029186A
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English (en)
Korean (ko)
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다카히로 미야자키
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미쯔비시 케미컬 주식회사
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Publication of KR20240164884A publication Critical patent/KR20240164884A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020247029186A 2022-03-18 2023-03-15 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 Pending KR20240164884A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2022-044594 2022-03-18
JP2022044594 2022-03-18
JPJP-P-2023-009336 2023-01-25
JP2023009336 2023-01-25
PCT/JP2023/010143 WO2023176898A1 (ja) 2022-03-18 2023-03-15 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置

Publications (1)

Publication Number Publication Date
KR20240164884A true KR20240164884A (ko) 2024-11-21

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ID=88023926

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247029186A Pending KR20240164884A (ko) 2022-03-18 2023-03-15 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JPWO2023176898A1 (enrdf_load_stackoverflow)
KR (1) KR20240164884A (enrdf_load_stackoverflow)
TW (1) TW202346399A (enrdf_load_stackoverflow)
WO (1) WO2023176898A1 (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012068613A (ja) 2010-08-27 2012-04-05 Toyo Ink Sc Holdings Co Ltd 黒色樹脂組成物及びブラックマトリクス

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4484482B2 (ja) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
JP2005281386A (ja) * 2004-03-29 2005-10-13 Toray Ind Inc 黒色樹脂組成物、樹脂ブラックマトリクス、カラーフィルターおよび液晶表示装置
JP5317908B2 (ja) * 2008-09-30 2013-10-16 サカタインクス株式会社 カラーフィルター用顔料分散物およびそれを含有するカラーフィルター用顔料分散レジスト組成物
JP5494530B2 (ja) * 2010-03-11 2014-05-14 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP5627273B2 (ja) * 2010-04-15 2014-11-19 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP6119104B2 (ja) * 2012-03-27 2017-04-26 東レ株式会社 感光性黒色樹脂組成物、それを用いた樹脂ブラックマトリクス基板およびタッチパネル
JP2015001652A (ja) * 2013-06-17 2015-01-05 東レ株式会社 積層樹脂ブラックマトリクス基板
JP6184902B2 (ja) * 2014-05-30 2017-08-23 花王株式会社 カーボンブラック分散液
JP6617703B2 (ja) * 2014-07-11 2019-12-11 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
JP7091039B2 (ja) * 2017-09-05 2022-06-27 東洋インキＳｃホールディングス株式会社 有機ｅｌ表示装置用赤色着色組成物、カラーフィルタ及び有機ｅｌ表示装置
TWI779259B (zh) * 2020-01-20 2022-10-01 新應材股份有限公司 樹脂組成物以及濾光元件

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012068613A (ja) 2010-08-27 2012-04-05 Toyo Ink Sc Holdings Co Ltd 黒色樹脂組成物及びブラックマトリクス

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Publication number Publication date
TW202346399A (zh) 2023-12-01
WO2023176898A1 (ja) 2023-09-21
JPWO2023176898A1 (enrdf_load_stackoverflow) 2023-09-21

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Patent event date: 20240829

Patent event code: PA01051R01D

Comment text: International Patent Application

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