KR20240089484A - 에칭 조성물 - Google Patents

에칭 조성물 Download PDF

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Publication number
KR20240089484A
KR20240089484A KR1020247015383A KR20247015383A KR20240089484A KR 20240089484 A KR20240089484 A KR 20240089484A KR 1020247015383 A KR1020247015383 A KR 1020247015383A KR 20247015383 A KR20247015383 A KR 20247015383A KR 20240089484 A KR20240089484 A KR 20240089484A
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KR
South Korea
Prior art keywords
composition
weight
acid
clause
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247015383A
Other languages
English (en)
Korean (ko)
Inventor
믹 비옐로파블릭
카를 바예스테로스
Original Assignee
후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. filed Critical 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨.
Publication of KR20240089484A publication Critical patent/KR20240089484A/ko
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/12Preparing bulk and homogeneous wafers
    • H10P90/126Preparing bulk and homogeneous wafers by chemical etching
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/10Etching, surface-brightening or pickling compositions containing an inorganic acid containing a boron compound
    • H01L21/02019
    • H01L21/30604
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/60Wet etching
    • H10P50/64Wet etching of semiconductor materials
    • H10P50/642Chemical etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020247015383A 2021-10-12 2022-10-06 에칭 조성물 Pending KR20240089484A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163254625P 2021-10-12 2021-10-12
US63/254,625 2021-10-12
PCT/US2022/045845 WO2023064145A1 (en) 2021-10-12 2022-10-06 Etching compositions

Publications (1)

Publication Number Publication Date
KR20240089484A true KR20240089484A (ko) 2024-06-20

Family

ID=85797811

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247015383A Pending KR20240089484A (ko) 2021-10-12 2022-10-06 에칭 조성물

Country Status (8)

Country Link
US (1) US12074020B2 (enExample)
EP (1) EP4416233A4 (enExample)
JP (1) JP2024536512A (enExample)
KR (1) KR20240089484A (enExample)
CN (1) CN118119686A (enExample)
IL (1) IL311940A (enExample)
TW (1) TW202315928A (enExample)
WO (1) WO2023064145A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118957589B (zh) * 2024-10-18 2025-02-11 润晶(合肥)光电材料有限公司 一种银铝蚀刻液组合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030007969A (ko) * 2000-06-16 2003-01-23 카오카부시키가이샤 세정제 조성물
US6717019B2 (en) 2002-01-30 2004-04-06 Air Products And Chemicals, Inc. Glycidyl ether-capped acetylenic diol ethoxylate surfactants
JP6110814B2 (ja) * 2013-06-04 2017-04-05 富士フイルム株式会社 エッチング液およびそのキット、これらを用いたエッチング方法、半導体基板製品の製造方法および半導体素子の製造方法
US10889757B2 (en) * 2017-10-19 2021-01-12 Fujifilm Electronic Materials U.S.A., Inc. Etching compositions
US10920144B2 (en) 2018-12-03 2021-02-16 Fujifilm Electronic Materials U.S.A., Inc. Etching compositions
JP7450334B2 (ja) 2018-12-27 2024-03-15 東京応化工業株式会社 エッチング液、及び半導体素子の製造方法
KR102880474B1 (ko) 2019-07-08 2025-11-03 바스프 에스이 실리콘-게르마늄 재료를 선택적으로 에칭하기 위한 조성물, 그의 용도 및 방법
JP7668626B2 (ja) 2019-10-04 2025-04-25 東京応化工業株式会社 エッチング液、及び半導体素子の製造方法
WO2021176903A1 (ja) * 2020-03-04 2021-09-10 富士フイルム株式会社 処理液
WO2022055814A1 (en) * 2020-09-11 2022-03-17 Fujifilm Electronic Materials U.S.A., Inc. Etching compositions
JP2025507176A (ja) * 2022-03-10 2025-03-13 フジフイルム エレクトロニック マテリアルズ ユー.エス.エー., インコーポレイテッド エッチング組成物

Also Published As

Publication number Publication date
US12074020B2 (en) 2024-08-27
IL311940A (en) 2024-06-01
TW202315928A (zh) 2023-04-16
WO2023064145A1 (en) 2023-04-20
CN118119686A (zh) 2024-05-31
US20230112795A1 (en) 2023-04-13
JP2024536512A (ja) 2024-10-04
EP4416233A1 (en) 2024-08-21
EP4416233A4 (en) 2025-08-20

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