KR20230095599A - Susceptor and substrate processing equipment having the same - Google Patents

Abstract

The present invention relates to a substrate processing apparatus, and more particularly, to a susceptor for performing substrate processing and a substrate processing apparatus including the same.
The present invention is installed in the processing space (S) of the process chamber 100, the substrate seating plate 210 on which the substrate 10 is seated, and a support rod extending downward from the center of the bottom surface of the substrate seating plate 210 As a susceptor 200 including a portion 220, the substrate seating plate 210 is formed with a plurality of temperature control passages 310 and 320 through which a temperature control medium flows, and the plurality of temperature control passages 310 , 320) have the same length within a preset length deviation range, and the inlets 311 and 321 and the outlets 312 and 322 of each of the plurality of temperature control passages 310 and 320 are the support rod part. Disclosed is a susceptor characterized in that it is arranged symmetrically with respect to the center of the plane of the substrate seating plate 210 at a position corresponding to (220).

Description

Susceptor and substrate processing equipment including the same {Susceptor and substrate processing equipment having the same}

The present invention relates to a substrate processing apparatus, and more particularly, to a susceptor for performing substrate processing and a substrate processing apparatus including the same.

As in Patent Documents 1 and 2, the substrate processing device refers to a device that performs substrate processing such as etching and deposition on the surface of a substrate seated on a susceptor in an atmosphere of process conditions by applying power to an enclosed processing space. .

On the other hand, for the processing of large substrates and multiple substrates, the susceptor is also being enlarged in size, and as the susceptor is enlarged, process conditions on the seating surface of the substrate, particularly temperature distribution, greatly affect the uniformity of substrate processing.

For example, as in Patent Document 1, the temperature of the susceptor can be controlled by forming a temperature control passage for temperature control in the susceptor and flowing a temperature control medium such as water into the temperature control passage.

However, in the case of a susceptor having a structure according to Patent Document 1, it is difficult to form a temperature control passage, and a piping structure for injecting and discharging a temperature control medium into the temperature control passage is complicated.

In particular, it is preferable that the pipe connection for the inflow and discharge of the temperature control medium is formed in a straight line according to the use of a metal pipe such as SUS. A piping structure is required.

(Patent Document 1) KR 10-1736363 B1

(Patent Document 2) KR 10-2055370 B1

In order to solve the above problems, an object of the present invention is to form a plurality of temperature control passages, and arrange the inlet and outlet of the temperature control medium symmetrically for each of the temperature control passages so that the susceptor seating surface It is to provide a susceptor capable of uniform temperature control and a substrate processing apparatus having the same.

The present invention was created to achieve the object of the present invention as described above, and the present invention is installed in the processing space (S) of the process chamber 100 and the substrate seating plate 210 on which the substrate 10 is seated and , A susceptor 200 including a support rod portion 220 extending downward from the center of the bottom surface of the substrate seating plate 210, wherein the substrate seating plate 210 controls a plurality of temperatures through which a temperature control medium flows. Flow paths 310 and 320 are formed, and the plurality of temperature control channels 310 and 320 have the same length within a preset length deviation range, and each inlet of the plurality of temperature control channels 310 and 320 (311, 321) and outlets (312, 322) are arranged symmetrically with respect to the center of the plane of the substrate seating plate (210) at a position corresponding to the support rod portion (220). Initiate the scepter.

The substrate seating plate 210 has a rectangular planar shape having a pair of horizontal sides and a pair of vertical sides, and a pair of partitioned areas by the virtual vertical center line C1 of the rectangle parallel to the vertical sides. (A1, A2), and the temperature control passages (310, 320) are connected from the first inlet (311) located in the support rod part (220) along the edges of the respective partitioned areas (A1, A2). a first control passage 310 extended and connected to the first outlet 312 located in the support rod part 220; From the second inlet 321 located on the support rod part 220 to the same length as the first control passage 310 inside the first control passage 310 in each of the partition areas A1 and A2. A second control passage 320 extending and connected to the second outlet 322 located in the support rod part 220 may be included.

The first control passage 310 and the second control passage 320 may be formed in line symmetry with respect to the virtual horizontal center line C2 of the rectangle in each of the partition areas A1 and A2.

The first control passage 310 is formed in line symmetry with respect to the virtual horizontal center line C2 of the rectangle in each of the partition areas A1 and A2, and the second control passage 320 is In the partition areas A1 and A2, they may be formed asymmetrically with respect to the virtual horizontal center line C2 of the rectangle.

The second control passage 320 is located in the small region where the second inlet 321 is located among the two small regions partitioning each of the partition regions A1 and A2 by the virtual horizontal center line C2. The length of the passage located in the small area where the second outlet 322 is located may be longer than the length of the passage.

The second control passage 320 is located in the small region where the second inlet 321 is located among the two small regions partitioning each of the partition regions A1 and A2 by the virtual horizontal center line C2. The number of inflection points of the passages located in the small area where the second outlet 322 is located may be greater than the number of inflection points of the passages to be formed.

The first inlet 311 and the second inlet 321 of any one of the pair of partition areas A1 and A2 are the first inlet 311 and the second inlet 321 of the other one. and may be arranged point-symmetrically or line-symmetrically with respect to the center of the plane of the substrate seating plate 210 .

The first inlet 311 and the second inlet 321 of each of the partition areas A1 and A2 may be adjacent to each other in a clockwise direction.

Any one of the pair of partition areas A1 and A2 is the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet 312 in a clockwise direction. Arranged in order, the other one of the pair of partition areas A1 and A2 is the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet ( 312) may be disposed point-symmetrically with respect to any one of the pair of partition areas A1 and A2.

The range of the length deviation relative to the preset reference length is preferably 5% or less.

The first inlet 311 and the first outlet 312, and the second inlet 321 and the second outlet 322 are arranged along the circumferential direction around the central axis of the support rod part 220, , Connected to the first inlet connector 331, the first discharge connector 332, the second inlet connector 341, and the second discharge connector 342, respectively, and the first inlet connector 331 ), the first discharge connection pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342 are installed within the support rod part 220, and one end is the main inlet pipe 491 ) and the other end of the passage branch connected to the main discharge pipe 492.

The flow path branch part has one end of the first main connection part 412 directly or indirectly connected to any one of the main inlet pipe 491 and the main discharge pipe 492, and the other end of the "first inlet connection pipe ( 331) and the second inlet connection pipe 341", and a plurality of first flow path connection parts 411 connected to any one of "the first discharge connection pipe 332 and the second discharge connection pipe 342" The first flow path branch portion 410 is formed, and coupled to the first flow path branch portion 410, one end of which is directly or indirectly connected to the other one of the main inlet pipe 491 and the main discharge pipe 492 The second main connection part 422 and the other end are "the first inlet connection pipe 331 and the second inlet connection pipe 341", and "the first discharge connection pipe 332 and the second discharge connection" It may include a second flow path branching part 420 having a plurality of second flow path connection parts 421 connected to the other one of the tubes 342".

The first flow path branching part 410 has a first column shape in which two of the plurality of first flow path connection parts 411 are formed at opposite positions with respect to the central axis of the support rod part 220, The second flow path branching part 420 has a second column shape in which two of the plurality of second flow path connection parts 421 are formed at opposite positions with respect to the central axis of the support rod part 220, The second flow path branch part 420 is connected to the cylindrical first flow path branch part 410 so that the one first main connection part 412 and the four first flow path connection parts 411 communicate with each other in the longitudinal direction. can be inserted into

The main inlet pipe 491 and the main discharge pipe 492 are connected at symmetrical positions around the central axis of the support rod part 220, and the first main connection part 412 and the second main connection part ( 422) and is positioned to correspond to the position of the auxiliary connectors 413 and 414, further comprising an auxiliary flow path branching portion 430 connected to the first main connection portion 412 and the second main connection portion 422. can do.

The flow path branch part is coupled with the main inlet pipe 491 formed by dividing the central axis of the support rod part 220 into two spaces, and the first flow path branch part 440 and the main discharge pipe 492 ) is coupled, and the first flow path branching part 440 includes the first direct flow path forming part 441 and the first indirect flow path forming part 442 in a clockwise direction from the boundary. ), the second direct flow path forming part 443 and the second indirect flow path forming part 444 are formed at equal intervals, and the second flow path branching part 450 forms the first direct flow path counterclockwise from the boundary. The part 451, the first indirect passage forming part 452, the second direct passage forming part 453, and the second indirect passage forming part 454 are formed at equal intervals, and the first indirect passage forming part 442 ) and the second indirect flow path forming part 444 are connected to the communication pipe 446 communicating with the space S20 formed by the second flow path branching part 450, and the first flow path branching part 440 ), a first connector 445 connected to either one of the main inlet pipe 491 and the main discharge pipe 492 is formed, and the first indirect flow path forming part 452 and the second indirect The flow path forming part 454 is connected to a communication pipe 456 communicating with the space S10 formed by the first flow path branching part 440, and on the bottom surface of the second flow path branching part 450, A second connector 446 connected to the other one of the main inlet pipe 491 and the main discharge pipe 492 may be formed.

The present invention also includes a process chamber 100 forming a closed processing space (S); Disclosed is a substrate processing apparatus comprising a susceptor 200 installed in the processing space S and on which the substrate 10 is seated, wherein the susceptor 200 has the above configuration.

The susceptor and the substrate processing apparatus having the same according to the present invention form a plurality of temperature control passages, and arrange the inlet and outlet of the temperature control medium symmetrically for each of the temperature control passages so that the susceptor's seating surface It has the advantage of being able to control the temperature uniformly.

In addition, as a plurality of temperature control passages are formed in the susceptor, it is possible to create a uniform temperature condition on the susceptor by compactly configuring the passage supply structure for inflow and discharge of the temperature control medium to each temperature control passage. Thus, there is an advantage in that temperature control by the temperature control passages can be optimized.

1 is a cross-sectional view showing a substrate processing apparatus according to the present invention.
2A to 2C are plan views showing one example of the susceptor of the substrate processing apparatus of FIG. 1, respectively, and are plan views showing the flow of the temperature control medium in different cases.
3A and 3B are plan views showing another example of the susceptor of the substrate processing apparatus of FIG. 1, respectively, and are plan views showing different cases of flow of the temperature control medium.
FIG. 4 is a partial perspective view showing an example of a flow path branching part coupled to a sursubter in the substrate processing apparatus of FIG. 1 .
5A and 4 are cross-sectional views in the direction V-V′, and FIG. 5B is a perspective view showing a first flow path branch and a second flow path branch.
6A is a plan view showing the auxiliary flow path branch shown in FIG. 4, and FIG. 6B is a perspective view showing the auxiliary flow path branch shown in FIG.
FIG. 7 is a partial perspective view showing another example of a flow path branching unit coupled to a sursubter in the substrate processing apparatus of FIG. 1 .
8A and 7 are cross-sectional views in the IX-IX' direction, and FIG. 8B is a perspective view showing the flow path branching portion shown in FIG. 7 .

Hereinafter, a substrate processing apparatus according to the present invention will be described with reference to the accompanying drawings.

As shown in FIG. 1, a substrate processing apparatus according to the present invention includes a process chamber 100 forming a closed processing space S; It is installed in the processing space (S) and includes a susceptor 200 on which the substrate 10 is seated.

Here, the substrate 10 to be processed is a substrate on which substrate processing such as deposition and etching is performed, and any substrate can be used as long as it has a rectangular shape, particularly a rectangular shape, such as a substrate for LCD manufacturing, a substrate for OLED manufacturing, and a substrate for solar cell manufacturing. do.

And, of course, the substrate processing apparatus can perform substrate processing such as patterned deposition and etching by attaching a mask (not shown) from the upper side.

The process chamber 100 is configured to form a closed processing space S for substrate processing, and various configurations are possible.

For example, the process chamber 100 may include a chamber body 110 having an open upper side and an upper lid 120 detachably coupled to the opening of the chamber body 110 .

The chamber body 110 has a configuration in which the susceptor 200 and the like are installed, and various configurations are possible, and one or more gates 111 are installed on the inner wall for introducing and discharging the substrate 10 into the processing space S. ) can be formed. Also, the process chamber 100 may be grounded.

In addition, the process chamber 100 can be configured in various ways according to the type of substrate processing to be performed, and includes a gas injection unit 140 for supplying processing gas for substrate processing and substrate processing according to process conditions. A power supply system (not shown), an exhaust system (not shown) for pressure control and exhaust of the processing space (S), etc. may be connected or installed.

For example, the gas spraying unit 140 is installed above the susceptor 200 to spray gas for performing a process, and various configurations such as a shower head are possible.

The gas injection unit 140 may include a spray plate (not shown) on which a plurality of gas injection holes (not shown) are formed, and may be grounded as an upper electrode facing the susceptor 200 or applied with RF power. It can be.

The susceptor 200 is installed below the processing space S to support the substrate 10, and various configurations are possible depending on the substrate support structure.

The susceptor 200 may be grounded as a lower electrode of the substrate processing apparatus or RF power may be applied.

In addition, as shown in FIG. 1, the susceptor 200 may be installed so as to move up and down for introduction and discharge of the substrate 10 through the gate 111, and at this time, substrate loading or unloading A plurality of lift pins (not shown) for lifting the substrate may be installed.

The lift pin is installed through the susceptor 200 and can lift the substrate 10 from the upper surface of the susceptor 200 or be seated on the upper surface of the susceptor 200 through relative vertical movement with the susceptor 200. can

Meanwhile, in the susceptor 200, a temperature control unit such as a heater may be additionally installed for temperature control such as heating or cooling the substrate 10.

The temperature control unit includes various configurations depending on the structure of the susceptor 200 for the substrate 10, the heating method, and the temperature conditions, such as including a heater heated by applying electricity and a temperature control passage through which the temperature control medium circulates. this is possible

In particular, in the susceptor 200 according to the present invention, a temperature control unit for controlling the temperature of the susceptor by circulating a temperature control medium is installed, and will be described below in conjunction with the structure of the susceptor 200.

The susceptor 200 may include a substrate seating plate 210 on which the substrate 10 is seated, and a support rod portion 220 extending downward from the center of the bottom surface of the substrate seating plate 210 .

The substrate seating plate 210 is a configuration on which the substrate 10 is seated for substrate processing, and various configurations are possible depending on the planar shape of the substrate 10 .

For example, when the planar shape of the substrate 10 is a quadrangle, the substrate seating plate 210 may have a quadrangular shape corresponding to the planar shape of the substrate 10 . Specifically, when the substrate 10 is a substrate 10 having a rectangular planar shape for a flat panel display, the planar shape of the substrate seating plate 210 may also have a rectangular shape.

The support rod part 220 extends downward from the center of the lower surface of the substrate seating plate 210 , and various configurations such as being integrated with the substrate seating plate 210 are possible.

Further, in the support rod part 220, an inlet connection pipe and an outlet connection pipe for transferring a temperature control medium, a power supply line for an electrostatic chuck (limited to the case where it is installed), and the like may be installed therein. In addition, when RF power is applied to the substrate seating plate 210, an RF rod for this may be installed inside the support rod part 220.

Meanwhile, the support rod part 220 may be moved up and down by a substrate vertical movement module (not shown), and in particular, may be connected to the substrate vertical movement module (not shown) through the bottom of the process chamber 100. there is.

At this time, in the support rod part 220, a bellows 212 may be installed between the lower surface of the process chamber 100 and the substrate up-and-down movement module to block the vacuum pressure.

Meanwhile, the substrate seating plate 210 is formed with a plurality of temperature control passages 310 and 320 through which a temperature control medium circulates to control the temperature of the substrate 10 .

Here, a fluid such as water may be used as the temperature control medium.

The plurality of temperature control passages 310 and 320 are passages formed in the substrate seating plate 210 to control the temperature of the substrate 10, and are composed of pipes through which a temperature control medium flows, or are used for machining or the like. Through this, various configurations such as being composed of a flow path formed in the substrate seating plate 210 are possible.

Meanwhile, the plurality of temperature control passages 310 and 320 may be formed in various patterns on the substrate mounting plate 210 .

Here, in forming the plurality of temperature control passages 310 and 320, the substrate seating plate 210, as shown in FIGS. 2A to 2C, 3A and 3B, a plurality of temperature control passages 310 , 320) has a rectangular plane shape having a pair of horizontal sides and a pair of vertical sides, and a pair of partitioned areas A1 by the virtual vertical center line C1 of the rectangle parallel to the vertical sides. , A2).

The pair of partition areas A1 and A2 are regions virtually partitioned for forming a plurality of temperature control passages 310 and 320 in the substrate seating plate 210, and the rectangular substrate seating plate ( 210) may include a first partitioned area A1 and a second partitioned area A2 divided into 1/2.

The first partition area A1 and the second partition area A2 divide the upper surface of the substrate seating plate 210 into two areas of the same size, and are used for forming a plurality of temperature control passages 310 and 320. It is defined as a virtual set area.

The plurality of temperature control passages 310 and 320 may include a first control passage 310 and a second control passage 320 disposed in each of the pair of partition areas A1 and A2.

The first control flow path 310 extends from the first inlet 311 located in the support rod part 220 along the edge of each of the partition areas A1 and A2 to form the support rod part 220 again. As a flow path connected to the first outlet 312 located at , it may be formed in various patterns.

For example, the first control passage 310 has a rectangular shape along the edges of the corresponding partition areas A1 and A2 centered on the support rod part 220 in each of the compartment areas A1 and A2. can achieve

At this time, of course, the first control passage 310 may be formed by avoiding installation holes for lift pins (not shown) and through holes of mask support posts (not shown).

The second control passage 320 is formed from the second inlet 321 located on the inside of the first control passage 310, that is, the support rod part 220, and the first control passage 320 of each of the partition areas A1 and A2. A passage that extends from the inside of the first control passage 310 to the same length as the first control passage 310 and is connected to the second outlet 322 located on the support rod part 220, and is formed in various patterns. It can be.

For example, the second control passage 320 may be formed in various patterns as free curves inside the first control passage 310 in each of the partition areas A1 and A2.

Meanwhile, as shown in FIGS. 2A and 2B , the first control passage 310 and the second control passage 320 are rectangular in each of the partition areas A1 and A2 based on the inlet and the outlet. It may be formed by making line symmetry based on the virtual horizontal center line (C2) of.

In addition, the first control passage 310 and the second control passage 320, as shown in FIG. 2C, have point symmetry based on the inlet and outlet, based on the center of the rectangle. can be formed.

That is, one of the pair of partition areas A1 and A2 is the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet in a clockwise direction ( 312), and the other one of the pair of partition areas A1 and A2 includes the first inlet 311, the second outlet 322, the second inlet 321 and the first inlet 311. The outlet 312 may be disposed point-symmetrically with respect to any one of the pair of partition areas A1 and A2.

In the case of having a channel structure as shown in FIG. 2C, the length of the channel is the same, and the inlet and outlet of the temperature control medium are sequentially arranged in a clockwise or counterclockwise direction, so that the point-symmetric structure is not considered in other surrounding conditions. Due to this, it is determined as an optimized structure capable of uniform temperature control on the upper surface of the substrate seating plate 210.

In addition, the first control passage 310 and the second control passage 320 consider the asymmetry of the process chamber 100, as shown in FIGS. 3A and 3B, the first control passage ( 310) and the second control passage 320, in particular, the second control passage 320 may be formed asymmetrically with respect to the virtual horizontal center line C2 of the rectangle in each of the partition areas A1 and A2. there is.

Of course, the first control passage 310 may be arranged in line symmetry with respect to the virtual horizontal center line C2 of the rectangle in each of the partition areas A1 and A2.

As described above, in order to compensate for the asymmetry of the internal environment of the process chamber 100, the first control passage 310 and the second control passage 320, particularly the second control passage 320, The chamber 100 may be formed in a structure that compensates for the asymmetry of the internal environment.

For example, in the second control flow path 320, the length of the flow path located in any one of the two small areas in which the respective partition areas A1 and A2 are partitioned by the virtual horizontal center line C2 is the other one. By being formed longer than in, it is possible to increase the relative temperature in the small region.

Furthermore, as shown in FIG. 3B, the second inlet 321 of the second control passage 320 is located in a small region in which the length of the passage located in any one of the two small regions is shorter. desirable.

That is, the small area where the second inlet 321 of the second control passage 320 is located has a shorter flow path than other small areas, and the second outlet 322 of the second control passage 320 It is preferable that the small region where is located has a longer passage length.

In summary, the second control passage 320 is the small area where the second inlet 321 is located among the two small areas partitioning each of the partition areas A1 and A2 by the virtual horizontal center line C2. It is preferable that the length of the passage located in the small region where the second outlet 322 is located is longer than the length of the passage located in the region.

In addition, from another point of view in relation to the length of the flow path, the second control flow path 320 is the second control flow path 320 of the two small areas partitioning each of the partition areas A1 and A2 by the virtual horizontal center line C2. The number of inflection points of passages located in the small region where the second outlet 322 is located may be greater than the number of inflection points of passages located in the small region where the second inlet 321 is located.

For reference, according to the experiment on the substrate seating plate having the flow path arrangement and flow structure shown in FIG. 3A, the temperature standard deviation of the substrate seating plate of FIG. 3A is 0.302° C., and the inlet and outlet are In the opposite case, the temperature standard deviation is 0.216 ° C, and it can be seen that the structure in which the length of the passage is longer in the small area where the second outlet 322 of the second control passage 320 is located further improves the temperature uniformity. there is.

Meanwhile, in the plurality of temperature control passages 310 and 320 formed on the substrate seating plate 210, when the lengths of the passages are different, a difference in flow rate and flow rate occurs, thereby increasing the amount of heat generated by each temperature control passage 310 and 320. Alternatively, there is a problem in that a temperature deviation occurs on the surface of the substrate seating plate 210 due to a change in heat absorption.

Specifically, the resistance of the flow velocity is proportional to the length of the flow path and the viscosity of the medium, and is inversely proportional to the diameter of the flow path. going crazy

Accordingly, it is preferable that the lengths of the plurality of temperature control passages 310 and 320 are equal to each other.

That is, when the lengths of the plurality of temperature control passages 310 and 320 are the same, the flow rate and velocity of the medium flowing through each passage can be set substantially the same, so the uniformity of the temperature control effect by each passage is improved. can make it

Here, the meaning that the lengths of the temperature control passages 310 and 320 are the same means that the flow of the temperature control medium through the temperature control passages 310 and 320 is substantially It is defined as the same degree of length, and in the present invention, when the range of length deviation compared to the reference length is 5% or less, the length may be defined as the same.

In addition, the cross section of the temperature control passages 310 and 320, that is, the size of the passage pipe may be defined in the same way as the definition of the same length.

For reference, while the lengths of the temperature control passages 310 and 320 are the same, in the case of the passage arrangement and flow structure of FIGS. 2A and 2B, as described above, the temperature standard deviations are 0.170° C. and 0.244° C. In the case of the conventional substrate mounting plate having a different length, it was confirmed that the temperature uniformity was greatly improved with a temperature standard deviation of 0.278 ° C.

Furthermore, in the case of the same flow path in addition to the flow path arrangement and flow structure shown in FIG. 3A, it was confirmed that the temperature uniformity was greatly improved compared to the conventional structure with a temperature standard deviation of 0.216 ° C.

Meanwhile, the inlets 311 and 321 and the outlets 312 and 322 of the plurality of temperature control passages 310 and 320 are, as shown in FIGS. 2A, 2B and 2C, the support rod part ( 220) is preferably arranged symmetrically (line-symmetrically or point-symmetrically) with respect to the center of the plane of the substrate seating plate 210.

In particular, the inlets 311 and 321 and the outlets 312 and 322 of the plurality of temperature control passages 310 and 320 are, as shown in FIGS. 2A to 3C, the plane of the substrate seating plate 210. It may be arranged in line symmetry or point symmetry with respect to the center of the image.

As shown in FIGS. 2A and 2B, the first inlet 311 and the second inlet 321 of any one of the pair of partition areas A1 and A2 are the first inlet of the other one. 311, the second inlet 321, and the substrate seat plate 210 may be arranged in point symmetry (FIGS. 2B, 2C, 3B) or line symmetry (FIGS. 2A and 3A) based on the center of the plane. there is.

Here, the first inlet 311 and the second inlet 321 of each of the partition areas A1 and A2 may be adjacent to each other in a clockwise direction. This is because there is a limit in the pipe connection structure with the main inlet pipe 491 to be described later for pipes in opposite directions.

On the other hand, according to experiments, the arrangement structure of the inlets 311 and 321 and the outlets 312 and 322 is point symmetrical (the arrangement structure of FIGS. 2B and 2C), and the uniformity of the substrate seating plate 210 on a plane It can be seen that the improvement is further improved.

For reference, the standard deviation of the temperature for the substrate seating plate having the flow path arrangement and flow structure shown in FIG. 2a is 0.170° C., and the temperature uniformity is 0.244° C. for the substrate seating plate with the flow path arrangement and flow structure shown in FIG. 2b. higher was confirmed.

This is interpreted as being caused by the deviation of the temperature of the temperature control medium flowing through the temperature control passages 310 and 320 at the inlets 311 and 321 and the outlets 312 and 322 .

Considering the above points, it is determined that a more improved temperature uniformity can be achieved by combining the flow structure of FIGS. 2A and 2C and the flow path arrangement of FIGS. 3A and 3B.

On the other hand, since the temperature of the temperature control medium discharged through the outlets 312 and 322 is relatively low when the high temperature temperature control medium flows into the inlets 311 and 321, the inlets 311 and 321 and the outlet 312, 322) is preferably arranged alternately one by one in a clockwise or counterclockwise direction.

However, since there is a limit to installing the temperature control medium supply pipes to the inlets 311 and 321 and the outlets 312 and 322 within the support rod part 220, as shown in FIG. 2A, clockwise or counterclockwise The first inlet 311, the second inlet 321, the second outlet 322, the first outlet 312, the first inlet 311, the second inlet 321, the second outlet 332, 1 may be arranged in the order of the outlet 312.

Meanwhile, according to the arrangement of the inlets 311 and 321 and the outlets 312 and 322 as shown in FIG. 2A, a structure for inflow and discharge of a temperature control medium from the outside, that is, a configuration of a flow path branch is required.

The first inlet 311 and the first outlet 312, and the second inlet 321 and the second outlet 322 rotate clockwise along the circumferential direction with respect to the central axis of the support rod part 220. Or it needs to be arranged counterclockwise.

And, the first inlet 311 and the first outlet 312, and the second inlet 321 and the second outlet 322 have a first inlet connection pipe 331 and a first discharge connection pipe 332, respectively. ), the second inlet connection pipe 341, and the second discharge connection pipe 342 are connected.

And in the above structure, the first inlet connection pipe 331, the first discharge connection pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342 are the support rod portion ( 220), and one end may be coupled to the other end of the flow path branching part connected to the main inlet pipe 491 and the main discharge pipe 492.

The passage branch is installed in the support rod part 220, one end is connected to the main inlet pipe 491 and the main discharge pipe 492, and the other end is connected to the first inlet connection pipe 331 and the first discharge pipe. As a configuration connected to the pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342, various configurations are possible according to the branching structure of the flow path.

In particular, in the flow path branch, the first inlet connection pipe 331, the first discharge connection pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342 are sequentially arranged along the circumferential direction. As it is arranged, it needs to be composed of a connection structure with one main inlet pipe 491 and one main discharge pipe 492.

As an example of the flow path branching part, as shown in FIGS. 4, 5A and 5B, the first flow path branching part 410 forming a columnar shape, and the first flow path branching part 410 It may include a second flow path branching portion 420 inserted into the inner circumferential side of and integrally coupled.

Here, by mutual coupling of the first flow path branching part 410 and the second flow path branching part 420, the support rod part 220 may have a single cylindrical shape to form a continuous outer shape.

The first flow path branch part 410 has one end connected to the first main connection part 412 directly or indirectly connected to any one of the main inlet pipe 491 and the main discharge pipe 492, and the other end A plurality of ducts connected to any one of the first inlet connection pipe 331 and the second inlet connection pipe 341" and "the first discharge connection pipe 332 and the second discharge connection pipe 342". Various configurations are possible with the configuration in which the one-way connection portion 411 is formed.

For example, the first flow path branch 410 may have a cylindrical shape and may have an opening into which a second flow path branch 420 to be described later may be inserted.

And the first flow path branch part 410, "the first inlet connection pipe 331 and the second inlet connection pipe 341" and "the first discharge connection pipe 332 and the first A plurality of first passage connection parts 411 connected to any one of the two discharge connection pipes 342" are formed, and directly or indirectly with any one of the main inlet pipe 491 and the main discharge pipe 492 on the bottom surface. A first main connection portion 412 to be connected may be formed.

The material of the first flow path branch 410 is preferably made of a metal such as aluminum, aluminum alloy, or stainless steel, and the second flow path branch 420 and pipes described later may be joined by welding.

The second flow path branch part 420 is coupled to the first flow path branch part 410 and has one end directly or indirectly connected to the other one of the main inlet pipe 491 and the main discharge pipe 492. 2 The main connection part 422 and the other end are "the first inlet connection pipe 331 and the second inlet connection pipe 341", and "the first discharge connection pipe 332 and the second discharge connection pipe" (342)" is a configuration in which a plurality of second flow path connectors 421 connected to the other one are formed, and various configurations are possible.

For example, the second passage branch 420 has a columnar shape into which the cylindrical first passage branch 410 having an internal space S20 can be inserted, has an internal space S10, and has a cross-sectional shape. As this symmetrical shape, various shapes such as having a ribbon shape are possible.

In particular, it is preferable that the second flow path branching part 420 has a planar shape and has a sufficiently large size at the edge when viewed from above so as not to interfere with the formation of the second flow path connection part 421 .

And the second passage branch 420, "the first inlet connection pipe 331 and the second inlet connection pipe 341" and "the first discharge connection pipe 332 and the first A plurality of second passage connection parts 421 connected to the other one of the two discharge connection pipes 342" are formed, and the main inlet pipe 491 and the main discharge pipe 492 are directly or indirectly connected to the other one of the bottom surface. A second main connection part 422 connected thereto may be formed.

The material of the second flow path branch 420 is preferably made of a metal such as aluminum, aluminum alloy, or stainless steel, and the first flow path branch 410 and the pipe may be welded together.

On the other hand, the configuration and coupling of the first passage branch 410 and the second passage branch 420 having the above configuration may be configured as follows.

First, the first flow path branch part 410 has a first column shape in which two of the plurality of first flow path connection parts 411 are formed at opposite positions around the central axis of the support rod part 220. can

In addition, the second flow path branching part 420 has a second column shape in which the plurality of second flow path connection parts 421 are formed by two at opposite positions around the central axis of the support rod part 220. can

Finally, the second flow path branching part 420 is connected to the cylindrical first flow path branching part 410 so that one of the first main connection parts 412 and the four first flow path connecting parts 411 communicate with each other. After being inserted in the longitudinal direction, it may be fixedly coupled to the first passage branch 410 by welding or the like.

That is, after the first flow path branch 410 and the second flow path branch 420 are coupled, the outer circumferential surface of the second flow path branch 420 and the inner circumferential surface of the first flow path branch 410 are separated. Despite the installation of the second flow path branch 420 through the gap S30, it can be maintained as one space S20 separated from the space S10 formed by the second flow path branch 420.

Meanwhile, the first main connection part 412 and the second main connection part 422 connected to the main inlet pipe 491 and the main discharge pipe 492 are, as shown in FIG. 5B, the support rod part 220 ) Is formed eccentrically from the central axis of the main inlet pipe 491 and the main discharge pipe 492 has a problem that the connection is not smooth.

Accordingly, as shown in FIGS. 4 and 6A and 6B, the main inlet pipe 491 and the main discharge pipe 492 are connected at positions symmetrical to each other around the central axis of the support rod part 220, , The first main connection part 412 and the second main connection part 412 and the second main connection part ( 422) may further include an auxiliary passage branching portion 430 connected to it.

The auxiliary flow path branching part 430 is configured such that the connection position of the first main connection part 412 and the second main connection part 422 is located in a position symmetrical to the central axis of the support rod part 220. As such, various configurations are possible.

For example, as shown in FIGS. 6A and 6B, the auxiliary flow path branching part 430 has connectors 433 and 434 connected to the auxiliary connectors 413 and 414 formed on the upper surface and the main surface on the lower surface. A cylindrical cylinder 431 formed with connectors 435 and 436 connecting the inlet pipe 491 and the main discharge pipe 492, and the first auxiliary connector 413 by dividing the cylindrical cylinder 431 in the axial direction And it may include a barrier rib portion 432 to block the communication of the second auxiliary connection pipe (414).

According to the configuration as described above, the auxiliary flow path branching part 430 makes the connection position of the first main connection part 412 and the second main connection part 422 symmetrical to the central axis of the support rod part 220. position can be placed.

Meanwhile, reference numeral 423 not described in FIG. 4 denotes a connecting member for connecting the auxiliary passage branch 430 to the first passage branch 410 .

As another example of the flow path branching part, as shown in FIGS. 7, 8A and 8B, the flow path branching part is divided into two spaces S10 and S20 across the central axis of the support rod part 220. It may include a first flow path branching part 440 to which the formed main inlet pipe 491 is coupled, and a second flow path branching part 450 to which the main discharge pipe 492 is coupled.

As a specific example, the flow path branch part has a cylindrical cylinder 449 in which two spaces S10 and S20 separated from each other are formed, and a partition wall partitioning the cylindrical cylinder 449 into two spaces S10 and S20. (448).

In addition, the upper surface of the cylindrical cylinder 449 and the upper surface of the first flow path branching part 440 are the first direct flow path forming part 441, the first indirect flow path forming part 442, and the second flow path forming part 442 in a clockwise direction from the boundary. The direct passage forming part 443 and the second indirect passage forming part 444 may be formed at equal intervals.

Meanwhile, the first indirect flow path forming part 442 and the second indirect flow path forming part 444 are not the space S10 formed by the first flow path branching part 440, but the second flow path branching part. It should communicate with the space S20 formed by the 450, and may be connected to the communication pipe 446 communicating with the space S20 formed by the second passage branch 450, respectively.

The communication pipe 446 communicates with the space S20 formed by the first indirect flow path forming part 442, the second indirect flow path forming part 444, and the second flow path branching part 450. As such, various configurations are possible.

Meanwhile, a first connector 445 connected to either one of the main inlet pipe 491 and the main discharge pipe 492 may be formed on the bottom surface of the first passage branch 440 .

And the upper surface of the second flow path branching part 450 is a first direct flow path forming part 451, a first indirect flow path forming part 452, a second direct flow path forming part 453, and a counterclockwise direction from the boundary. The second indirect passage forming parts 454 may be formed at regular intervals.

Meanwhile, the first indirect flow path forming part 452 and the second indirect flow path forming part 454 are not the space S20 formed by the second flow path branching part 450, but the first flow path branching part. It should communicate with the space S10 formed by the 440, and may be connected to the communication pipe 456 communicating with the space S10 formed by the first passage branch 440, respectively.

The communication pipe 456 communicates with the space S10 formed by the first indirect flow path forming part 452, the second indirect flow path forming part 454, and the first flow path branching part 440. As such, various configurations are possible.

Meanwhile, a second connector 446 connected to the other one of the main inlet pipe 491 and the main discharge pipe 492 may be formed on the bottom surface of the second passage branch 450 .

And, the second passage branch 450 having the above configuration can be manufactured by various methods such as processing and molding by combining a cylindrical cylinder, a disk, and a pipe.

The passage branch having the above configuration includes the inlets 311 and 321 and outlets 312, respectively, of the plurality of temperature control passages 310 and 320 from the main inlet pipe 491 and the main discharge pipe 492. 322), the temperature control medium can be stably introduced and discharged according to the number and arrangement.

Since the above has only been described with respect to some of the preferred embodiments that can be implemented by the present invention, as noted, the scope of the present invention should not be construed as being limited to the above embodiments, and the scope of the present invention described above It will be said that the technical idea and the technical idea together with the root are all included in the scope of the present invention.

100: process chamber 200: susceptor
310, 320: temperature control passage
311, 321: inlet 312, 322: outlet

Claims (26)

A substrate seating plate 210 installed in the processing space S of the process chamber 100 and on which the substrate 10 is seated, and a support rod portion 220 extending downward from the center of the bottom surface of the substrate seating plate 210 As the susceptor 200 including,
The substrate seating plate 210 is formed with a plurality of temperature control passages 310 and 320 through which a temperature control medium flows,
The plurality of temperature control passages 310 and 320 have the same length within a preset length deviation range,
The inlets 311 and 321 and the outlets 312 and 322 of the plurality of temperature control passages 310 and 320 are located on the plane of the substrate seating plate 210 at positions corresponding to the support rod part 220. A susceptor characterized in that it is symmetrically arranged with respect to the center of the image. The method of claim 1,
The substrate seating plate 210 has a rectangular planar shape having a pair of horizontal sides and a pair of vertical sides, and a pair of partitioned areas by the virtual vertical center line C1 of the rectangle parallel to the vertical sides. It is divided into (A1, A2),
The temperature control passages 310 and 320,
From the first inlet 311 located on the support rod part 220 to the first outlet 312 located on the support rod part 220 extending along the edge of each of the partition areas A1 and A2. a first control passage 310 connected thereto;
From the second inlet 321 located on the support rod part 220 to the same length as the first control passage 310 inside the first control passage 310 in each of the partition areas A1 and A2. The susceptor characterized in that it comprises a second control passage 320 extending and connected to the second outlet 322 located in the support rod part 220 again. The method of claim 2,
The first control passage 310 and the second control passage 320,
The susceptor, characterized in that formed in line symmetry with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2). The method of claim 2,
The first control passage 310,
In each of the partition areas A1 and A2, line symmetry is formed based on the virtual horizontal center line C2 of the rectangle,
The second control passage 320,
The susceptor, characterized in that it is formed asymmetrically with respect to the virtual horizontal center line (C2) of the rectangle in each of the partition areas (A1, A2). The method of claim 4,
The second control passage 320,
The second outlet ( A susceptor characterized in that the length of the passage located in the small region where 322) is located is formed longer. The method of claim 4,
The second control passage 320,
The second discharge port is greater than the number of inflection points of passages located in the small region where the second inlet 321 is located among the two small regions dividing each of the partition regions A1 and A2 by the virtual horizontal center line C2. A susceptor characterized in that the number of inflection points of the passage located in the small region where 322 is located is larger. The method of any one of claims 2 to 6,
The first inlet 311 and the second inlet 321 of any one of the pair of partition areas A1 and A2 are the first inlet 311 and the second inlet 321 of the other one. and a susceptor characterized in that it is arranged point-symmetrically or line-symmetrically with respect to the center of the plane of the substrate seating plate 210. The method of any one of claims 2 to 6,
The susceptor, characterized in that the first inlet 311 and the second inlet 321 of each of the partition areas (A1, A2) are adjacent to each other in a clockwise direction. The method of any one of claims 2 to 6,
Any one of the pair of partition areas A1 and A2 is the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet 312 in a clockwise direction. arranged in order,
In the other one of the pair of partition areas A1 and A2, the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet 312 are configured as described above. A susceptor characterized in that it is arranged point-symmetrically with respect to any one of the pair of partition areas (A1, A2). The method of any one of claims 1 to 6,
Susceptor, characterized in that the range of the length deviation relative to the preset reference length is 5% or less. The method of claim 7,
The first inlet 311 and the first outlet 312, and the second inlet 321 and the second outlet 322,
It is disposed along the circumferential direction around the central axis of the support rod portion 220,
Connected to the first inlet connector 331, the first discharge connector 332, the second inlet connector 341, and the second discharge connector 342, respectively,
The first inlet connection pipe 331, the first discharge connection pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342 are installed within the support rod part 220, , Susceptor, characterized in that one end is coupled to the other end of the flow path branch connected to the main inlet pipe 491 and the main discharge pipe 492. The method of claim 11,
The flow path branch,
A first main connection part 412 having one end directly or indirectly connected to any one of the main inlet pipe 491 and the main discharge pipe 492, and the other end having "the first inlet connection pipe 331 and the first A first flow path in which a plurality of first flow path connection parts 411 connected to either one of two inlet connection pipes 341" and "the first discharge connection pipe 332 and the second discharge connection pipe 342" are formed. With the branching part 410,
A second main connection part 422 coupled to the first passage branch 410 and having one end directly or indirectly connected to the other of the main inlet pipe 491 and the main discharge pipe 492, and the other end " A plurality of pluralities connected to the other one of the first inlet connection pipe 331 and the second inlet connection pipe 341" and "the first discharge connection pipe 332 and the second discharge connection pipe 342". The susceptor characterized in that it comprises a second flow path branching portion 420 in which the second flow path connection portion 421 is formed. The method of claim 12,
The first passage branch 410,
The plurality of first flow path connection parts 411 have a first column shape formed by two at opposite positions around the central axis of the support rod part 220,
The second flow path branching part 420 has a second column shape in which two of the plurality of second flow path connection parts 421 are formed at opposite positions with respect to the central axis of the support rod part 220,
The second flow path branch part 420 is connected to the cylindrical first flow path branch part 410 so that the one first main connection part 412 and the four first flow path connection parts 411 communicate with each other in the longitudinal direction. Susceptor, characterized in that inserted into. The method of claim 12,
The main inlet pipe 491 and the main discharge pipe 492 are connected at symmetrical positions around the central axis of the support rod part 220,
The first main connection part 412 and the second main connection part 422 are located corresponding to the positions of the first main connection part 412 and the second main connection part 422 by means of auxiliary connecting pipes 413 and 414. ) Susceptor characterized in that it further comprises an auxiliary passage branch 430 connected to. The method of claim 11,
The flow path branch,
The main inlet pipe 491 formed by dividing the central axis of the support rod part 220 into two spaces is coupled, and the first flow path branch part 440 and the main discharge pipe 492 are coupled. It includes a 2-way branch 450,
The first flow path branching part 440 includes a first direct flow path forming part 441, a first indirect flow path forming part 442, a second direct flow path forming part 443, and a second indirect flow path in a clockwise direction from the boundary. Forming portions 444 are formed at equal intervals,
The second flow path branching part 450 comprises a first direct flow path forming part 451, a first indirect flow path forming part 452, a second direct flow path forming part 453, and a second indirect flow path forming part 451 in a counterclockwise direction from the boundary. Flow path forming parts 454 are formed at equal intervals,
The first indirect flow path forming part 442 and the second indirect flow path forming part 444 are connected to a communication pipe 446 communicating with the space S20 formed by the second flow path branching part 450, ,
A first connector 445 connected to either one of the main inlet pipe 491 and the main discharge pipe 492 is formed on the bottom surface of the first passage branch 440,
The first indirect flow path forming part 452 and the second indirect flow path forming part 454 are connected to a communication pipe 456 communicating with the space S10 formed by the first flow path branching part 440, ,
Susceptor, characterized in that the second connector 446 connected to the other one of the main inlet pipe 491 and the main discharge pipe 492 is formed on the bottom surface of the second flow path branch part 450. a process chamber 100 forming a closed processing space S;
It is installed in the processing space (S) and includes a susceptor 200 on which the substrate 10 is seated,
The susceptor 200 is a substrate processing apparatus, characterized in that the susceptor according to any one of claims 1 to 6. The method of claim 16
Substrate processing apparatus characterized in that the range of the length deviation relative to the preset reference length is 5% or less. a process chamber 100 forming a closed processing space S;
It is installed in the processing space (S) and includes a susceptor 200 on which the substrate 10 is seated,
The susceptor 200 is a substrate processing apparatus, characterized in that the susceptor according to claim 7. The method of claim 18
The substrate processing apparatus, characterized in that the first inlet 311 and the second inlet 321 of each of the partition areas A1 and A2 are adjacent to each other in a clockwise direction. The method of claim 18
Any one of the pair of partition areas A1 and A2 is the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet 312 in a clockwise direction. arranged in order,
In the other one of the pair of partition areas A1 and A2, the first inlet 311, the second outlet 322, the second inlet 321 and the first outlet 312 are configured as described above. A substrate processing apparatus characterized in that it is arranged point-symmetrically with respect to any one of the pair of partition areas (A1, A2). The method of claim 18
Substrate processing apparatus characterized in that the range of the length deviation relative to the preset reference length is 5% or less. The method of claim 18
The first inlet 311 and the first outlet 312, and the second inlet 321 and the second outlet 322,
It is disposed along the circumferential direction around the central axis of the support rod portion 220,
Connected to the first inlet connector 331, the first discharge connector 332, the second inlet connector 341, and the second discharge connector 342, respectively,
The first inlet connection pipe 331, the first discharge connection pipe 332, the second inlet connection pipe 341, and the second discharge connection pipe 342 are installed within the support rod part 220, , A substrate processing apparatus characterized in that one end is coupled to the other end of the flow path branching part connected to the main inlet pipe 491 and the main discharge pipe 492. The method of claim 22
The flow path branch,
A first main connection part 412 having one end directly or indirectly connected to any one of the main inlet pipe 491 and the main discharge pipe 492, and the other end having "the first inlet connection pipe 331 and the first A first flow path in which a plurality of first flow path connection parts 411 connected to either one of two inlet connection pipes 341" and "the first discharge connection pipe 332 and the second discharge connection pipe 342" are formed. With the branching part 410,
A second main connection part 422 coupled to the first passage branch 410 and having one end directly or indirectly connected to the other of the main inlet pipe 491 and the main discharge pipe 492, and the other end " A plurality of pluralities connected to the other one of the first inlet connection pipe 331 and the second inlet connection pipe 341" and "the first discharge connection pipe 332 and the second discharge connection pipe 342". A substrate processing apparatus comprising a second flow path branching portion 420 in which a second flow path connection portion 421 is formed. The method of claim 23
The first passage branch 410,
The plurality of first flow path connection parts 411 have a first column shape formed by two at opposite positions around the central axis of the support rod part 220,
The second flow path branching part 420 has a second column shape in which two of the plurality of second flow path connection parts 421 are formed at opposite positions with respect to the central axis of the support rod part 220,
The second flow path branch part 420 is connected to the cylindrical first flow path branch part 410 so that the one first main connection part 412 and the four first flow path connection parts 411 communicate with each other in the longitudinal direction. A substrate processing apparatus characterized in that inserted into. The method of claim 22
The main inlet pipe 491 and the main discharge pipe 492 are connected at symmetrical positions around the central axis of the support rod part 220,
The first main connection part 412 and the second main connection part 422 are located corresponding to the positions of the first main connection part 412 and the second main connection part 422 by means of auxiliary connecting pipes 413 and 414. ) Substrate processing apparatus characterized in that it further comprises an auxiliary passage branch 430 connected to. The method of claim 18
The flow path branch,
The main inlet pipe 491 formed by dividing the central axis of the support rod part 220 into two spaces is coupled, and the first flow path branch part 440 and the main discharge pipe 492 are coupled. It includes a 2-way branch 450,
The first flow path branching part 440 includes a first direct flow path forming part 441, a first indirect flow path forming part 442, a second direct flow path forming part 443, and a second indirect flow path in a clockwise direction from the boundary. Forming portions 444 are formed at equal intervals,
The second flow path branching part 450 comprises a first direct flow path forming part 451, a first indirect flow path forming part 452, a second direct flow path forming part 453, and a second indirect flow path forming part 451 in a counterclockwise direction from the boundary. Flow path forming parts 454 are formed at equal intervals,
The first indirect flow path forming part 442 and the second indirect flow path forming part 444 are connected to a communication pipe 446 communicating with the space S20 formed by the second flow path branching part 450, ,
A first connector 445 connected to either one of the main inlet pipe 491 and the main discharge pipe 492 is formed on the bottom surface of the first passage branch 440,
The first indirect flow path forming part 452 and the second indirect flow path forming part 454 are connected to a communication pipe 456 communicating with the space S10 formed by the first flow path branching part 440, ,
A substrate processing apparatus, characterized in that a second connector 446 connected to the other one of the main inlet pipe 491 and the main discharge pipe 492 is formed on the bottom surface of the second flow path branch part 450.

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