KR20230038096A - 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 Download PDF

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Publication number
KR20230038096A
KR20230038096A KR1020220110473A KR20220110473A KR20230038096A KR 20230038096 A KR20230038096 A KR 20230038096A KR 1020220110473 A KR1020220110473 A KR 1020220110473A KR 20220110473 A KR20220110473 A KR 20220110473A KR 20230038096 A KR20230038096 A KR 20230038096A
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KR
South Korea
Prior art keywords
alignment mark
substrate
original plate
unit
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020220110473A
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English (en)
Korean (ko)
Inventor
노조무 하야시
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230038096A publication Critical patent/KR20230038096A/ko
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90—Measuring, controlling or regulating

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020220110473A 2021-09-10 2022-09-01 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 Pending KR20230038096A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2021-147508 2021-09-10
JP2021147508A JP7633908B2 (ja) 2021-09-10 2021-09-10 インプリント装置、インプリント方法、及び物品の製造方法

Publications (1)

Publication Number Publication Date
KR20230038096A true KR20230038096A (ko) 2023-03-17

Family

ID=85478605

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220110473A Pending KR20230038096A (ko) 2021-09-10 2022-09-01 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법

Country Status (3)

Country Link
US (1) US11833737B2 (https=)
JP (1) JP7633908B2 (https=)
KR (1) KR20230038096A (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2882821B2 (ja) * 1989-11-14 1999-04-12 キヤノン株式会社 アライメント装置
JP6029495B2 (ja) 2012-03-12 2016-11-24 キヤノン株式会社 インプリント方法およびインプリント装置、それを用いた物品の製造方法
JP2015170815A (ja) 2014-03-10 2015-09-28 キヤノン株式会社 インプリント装置、アライメント方法及び物品の製造方法
JP6457773B2 (ja) * 2014-10-07 2019-01-23 キヤノン株式会社 インプリント方法、インプリント装置及び物品製造方法
US10788749B2 (en) 2017-11-30 2020-09-29 Canon Kabushiki Kaisha System and method for improving the throughput of a nanoimprint system
JP7337670B2 (ja) * 2019-11-15 2023-09-04 キヤノン株式会社 インプリント装置、インプリント方法、および、物品の製造方法

Also Published As

Publication number Publication date
JP7633908B2 (ja) 2025-02-20
US11833737B2 (en) 2023-12-05
US20230083496A1 (en) 2023-03-16
JP2023040493A (ja) 2023-03-23

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