KR20230036045A - 성막 장치 - Google Patents
성막 장치 Download PDFInfo
- Publication number
- KR20230036045A KR20230036045A KR1020220108255A KR20220108255A KR20230036045A KR 20230036045 A KR20230036045 A KR 20230036045A KR 1020220108255 A KR1020220108255 A KR 1020220108255A KR 20220108255 A KR20220108255 A KR 20220108255A KR 20230036045 A KR20230036045 A KR 20230036045A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- holding
- mask
- film forming
- unit
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 261
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 74
- 230000008021 deposition Effects 0.000 claims description 73
- 238000012546 transfer Methods 0.000 claims description 43
- 230000008020 evaporation Effects 0.000 claims description 31
- 238000001704 evaporation Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 14
- 238000005516 engineering process Methods 0.000 abstract description 2
- 230000010485 coping Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 98
- 239000010408 film Substances 0.000 description 96
- 238000000151 deposition Methods 0.000 description 69
- 230000032258 transport Effects 0.000 description 36
- 238000010586 diagram Methods 0.000 description 21
- 230000005525 hole transport Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 230000007246 mechanism Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 5
- 230000036544 posture Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000007667 floating Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000005339 levitation Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021144913A JP2023038027A (ja) | 2021-09-06 | 2021-09-06 | 成膜装置 |
| JPJP-P-2021-144913 | 2021-09-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230036045A true KR20230036045A (ko) | 2023-03-14 |
Family
ID=85431674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020220108255A KR20230036045A (ko) | 2021-09-06 | 2022-08-29 | 성막 장치 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2023038027A (ja) |
| KR (1) | KR20230036045A (ja) |
| CN (1) | CN115799129A (ja) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019192898A (ja) | 2018-04-26 | 2019-10-31 | キヤノントッキ株式会社 | 基板搬送システム、電子デバイスの製造装置及び電子デバイスの製造方法 |
-
2021
- 2021-09-06 JP JP2021144913A patent/JP2023038027A/ja active Pending
-
2022
- 2022-08-29 KR KR1020220108255A patent/KR20230036045A/ko active Search and Examination
- 2022-09-02 CN CN202211069068.6A patent/CN115799129A/zh active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019192898A (ja) | 2018-04-26 | 2019-10-31 | キヤノントッキ株式会社 | 基板搬送システム、電子デバイスの製造装置及び電子デバイスの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023038027A (ja) | 2023-03-16 |
| CN115799129A (zh) | 2023-03-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102649142B1 (ko) | 유기 발광 표시 장치, 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조방법 | |
| CN113106387B (zh) | 成膜装置及电子器件的制造方法 | |
| JP7190997B2 (ja) | 吸着及びアライメント方法、吸着システム、成膜方法、成膜装置及び電子デバイスの製造方法 | |
| KR102505832B1 (ko) | 흡착장치, 위치 조정 방법, 및 성막 방법 | |
| KR20210126147A (ko) | 마스크 프레임 통합, 마스크 프레임을 위한 캐리어, 및 마스크를 핸들링하는 방법 | |
| KR20210137902A (ko) | 얼라인먼트 장치, 성막 장치, 얼라인먼트 방법, 전자 디바이스의 제조 방법, 프로그램 및 기억 매체 | |
| KR20220168159A (ko) | 반송 장치 및 성막 장치 | |
| JP7246598B2 (ja) | 吸着装置、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 | |
| KR102501609B1 (ko) | 성막 장치, 이를 사용한 성막 방법, 및 전자 디바이스의 제조방법 | |
| JP7288756B2 (ja) | 静電チャックシステム、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 | |
| CN116641025A (zh) | 成膜装置 | |
| KR20230036045A (ko) | 성막 장치 | |
| KR20230036046A (ko) | 성막 장치 | |
| KR102501615B1 (ko) | 성막 장치, 성막 방법, 및 전자 디바이스의 제조방법 | |
| KR20230036047A (ko) | 성막 장치, 기판 반송 장치, 기판 반송 방법 및 전자 디바이스의 제조 방법 | |
| KR20230090239A (ko) | 성막 장치 및 성막 방법 | |
| KR102520050B1 (ko) | 흡착 장치, 성막장치, 흡착방법, 성막방법 및 전자 디바이스의 제조방법 | |
| JP7262221B2 (ja) | 静電チャックシステム、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 | |
| KR20210080065A (ko) | 성막 장치, 성막 방법, 및 전자 디바이스의 제조방법 | |
| JP2023183223A (ja) | 搬送装置、搬送方法、電子デバイスの製造方法及び成膜装置 | |
| WO2024176848A1 (ja) | 成膜装置、成膜方法及び電子デバイスの製造方法 | |
| CN111128835A (zh) | 吸附及对准方法、吸附系统、成膜方法及装置、电子器件的制造方法 | |
| CN113005398B (zh) | 成膜装置、成膜方法及电子器件的制造方法 | |
| KR20230052223A (ko) | 성막 장치 | |
| KR20230063313A (ko) | 반사율 측정 장치, 성막 장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination |