CN115799129A - 成膜装置 - Google Patents
成膜装置 Download PDFInfo
- Publication number
- CN115799129A CN115799129A CN202211069068.6A CN202211069068A CN115799129A CN 115799129 A CN115799129 A CN 115799129A CN 202211069068 A CN202211069068 A CN 202211069068A CN 115799129 A CN115799129 A CN 115799129A
- Authority
- CN
- China
- Prior art keywords
- substrate
- film forming
- mask
- vapor deposition
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 258
- 238000007740 vapor deposition Methods 0.000 claims description 81
- 230000008021 deposition Effects 0.000 claims description 36
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 abstract description 34
- 239000010408 film Substances 0.000 description 93
- 239000010410 layer Substances 0.000 description 91
- 238000000151 deposition Methods 0.000 description 34
- 239000000463 material Substances 0.000 description 12
- 230000005525 hole transport Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000036544 posture Effects 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000007667 floating Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- -1 and the like Substances 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021144913A JP2023038027A (ja) | 2021-09-06 | 2021-09-06 | 成膜装置 |
| JP2021-144913 | 2021-09-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115799129A true CN115799129A (zh) | 2023-03-14 |
Family
ID=85431674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211069068.6A Pending CN115799129A (zh) | 2021-09-06 | 2022-09-02 | 成膜装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2023038027A (ja) |
| KR (1) | KR20230036045A (ja) |
| CN (1) | CN115799129A (ja) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190124610A (ko) | 2018-04-26 | 2019-11-05 | 캐논 톡키 가부시키가이샤 | 기판 반송 시스템, 전자 디바이스 제조장치 및 전자 디바이스 제조방법 |
-
2021
- 2021-09-06 JP JP2021144913A patent/JP2023038027A/ja active Pending
-
2022
- 2022-08-29 KR KR1020220108255A patent/KR20230036045A/ko active Search and Examination
- 2022-09-02 CN CN202211069068.6A patent/CN115799129A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023038027A (ja) | 2023-03-16 |
| KR20230036045A (ko) | 2023-03-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7190997B2 (ja) | 吸着及びアライメント方法、吸着システム、成膜方法、成膜装置及び電子デバイスの製造方法 | |
| CN113644018B (zh) | 对准装置、成膜装置、对准方法、电子器件的制造方法及存储介质 | |
| KR102505832B1 (ko) | 흡착장치, 위치 조정 방법, 및 성막 방법 | |
| WO2020180334A1 (en) | Mask frame integration, carrier for mask frame and method of handling a mask | |
| KR20220168159A (ko) | 반송 장치 및 성막 장치 | |
| KR102501609B1 (ko) | 성막 장치, 이를 사용한 성막 방법, 및 전자 디바이스의 제조방법 | |
| JP7288756B2 (ja) | 静電チャックシステム、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 | |
| KR20210109998A (ko) | 흡착장치, 성막장치, 흡착방법, 성막방법 및 전자 디바이스의 제조방법 | |
| CN116641025A (zh) | 成膜装置 | |
| CN115799129A (zh) | 成膜装置 | |
| CN115772646A (zh) | 成膜装置 | |
| JP2020070491A (ja) | アライメント装置、成膜装置、アライメント方法、成膜方法、及び電子デバイスの製造方法 | |
| KR102501617B1 (ko) | 성막 장치, 성막 방법, 및 전자 디바이스의 제조방법 | |
| KR102501615B1 (ko) | 성막 장치, 성막 방법, 및 전자 디바이스의 제조방법 | |
| KR102520050B1 (ko) | 흡착 장치, 성막장치, 흡착방법, 성막방법 및 전자 디바이스의 제조방법 | |
| JP7262221B2 (ja) | 静電チャックシステム、成膜装置、吸着方法、成膜方法及び電子デバイスの製造方法 | |
| KR20230036047A (ko) | 성막 장치, 기판 반송 장치, 기판 반송 방법 및 전자 디바이스의 제조 방법 | |
| CN116288229A (zh) | 成膜装置以及成膜方法 | |
| CN111128835A (zh) | 吸附及对准方法、吸附系统、成膜方法及装置、电子器件的制造方法 | |
| WO2024176848A1 (ja) | 成膜装置、成膜方法及び電子デバイスの製造方法 | |
| JP2023183223A (ja) | 搬送装置、搬送方法、電子デバイスの製造方法及び成膜装置 | |
| CN113005398B (zh) | 成膜装置、成膜方法及电子器件的制造方法 | |
| CN115433916B (zh) | 输送装置以及成膜装置 | |
| CN115961255A (zh) | 成膜装置 | |
| CN114318283A (zh) | 成膜装置、调整装置、调整方法及电子器件的制造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |