KR20230030537A - 임프린트 장치, 물품의 제조 방법, 및 컴퓨터 프로그램 - Google Patents

임프린트 장치, 물품의 제조 방법, 및 컴퓨터 프로그램 Download PDF

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Publication number
KR20230030537A
KR20230030537A KR1020220104836A KR20220104836A KR20230030537A KR 20230030537 A KR20230030537 A KR 20230030537A KR 1020220104836 A KR1020220104836 A KR 1020220104836A KR 20220104836 A KR20220104836 A KR 20220104836A KR 20230030537 A KR20230030537 A KR 20230030537A
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KR
South Korea
Prior art keywords
mold
actuator
pressure
displacement
imprint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020220104836A
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English (en)
Korean (ko)
Inventor
히로토시 도리이
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230030537A publication Critical patent/KR20230030537A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H01L21/0273—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020220104836A 2021-08-25 2022-08-22 임프린트 장치, 물품의 제조 방법, 및 컴퓨터 프로그램 Withdrawn KR20230030537A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021137299A JP7703397B2 (ja) 2021-08-25 2021-08-25 インプリント装置、物品の製造方法、及びコンピュータプログラム
JPJP-P-2021-137299 2021-08-25

Publications (1)

Publication Number Publication Date
KR20230030537A true KR20230030537A (ko) 2023-03-06

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ID=85288511

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220104836A Withdrawn KR20230030537A (ko) 2021-08-25 2022-08-22 임프린트 장치, 물품의 제조 방법, 및 컴퓨터 프로그램

Country Status (3)

Country Link
US (1) US12449727B2 (https=)
JP (1) JP7703397B2 (https=)
KR (1) KR20230030537A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7712832B2 (ja) * 2021-09-21 2025-07-24 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08332646A (ja) * 1995-06-06 1996-12-17 Meiki Co Ltd 真空積層装置および真空積層方法
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US8025829B2 (en) * 2006-11-28 2011-09-27 Nanonex Corporation Die imprint by double side force-balanced press for step-and-repeat imprint lithography
US8043085B2 (en) 2008-08-19 2011-10-25 Asml Netherlands B.V. Imprint lithography
JP6304934B2 (ja) * 2012-05-08 2018-04-04 キヤノン株式会社 インプリント装置および物品の製造方法
US20150368417A1 (en) * 2013-02-15 2015-12-24 Tufts University Silk-based nanoimprinting
JP2019079875A (ja) 2017-10-23 2019-05-23 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
JP7254564B2 (ja) 2019-03-05 2023-04-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

Also Published As

Publication number Publication date
US20230066484A1 (en) 2023-03-02
US12449727B2 (en) 2025-10-21
JP2023031670A (ja) 2023-03-09
JP7703397B2 (ja) 2025-07-07

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PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PC1202 Submission of document of withdrawal before decision of registration

St.27 status event code: N-1-6-B10-B11-nap-PC1202

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000