KR20230011946A - Conductive particle, conductive material and connection structure using the same - Google Patents

Abstract

To provide conductive particles having excellent storage stability, excellent corrosion resistance and low connection resistance, in which a nickel plating layer as a conductive layer is formed on the surface of core material particles, measured by a scanning type Auger electron spectrometer The molar ratio of carbon to the total of nickel and phosphorus within 5 nm in the depth direction from the surface of the conductive layer (C/(Ni+P)), or the molar ratio of carbon to the total of nickel and boron (C/(Ni +B)) is 0.0002 or more and 1.65 or less, the molar ratio of oxygen to the sum of nickel and phosphorus (O/(Ni+P)), or the molar ratio of oxygen to the sum of nickel and boron (O/(Ni+B)) is 0.0001 or more and 1.8 or less, and the molar ratio of phosphorus to nickel (P/Ni) or boron to nickel (B/Ni) is 0.003 or more and 0.7 or less.

Description

Conductive particle, conductive material and connection structure using the same

The present invention relates to conductive particles, a conductive material containing the same, and a connection structure using the same.

As conductive particles that can be used as a conductive material of an anisotropic conductive material such as an anisotropic conductive film or an anisotropic conductive paste, it is generally known that a conductive layer containing a metal is formed on the surface of a core material particle, and this conductive layer forms an electrode. or electrical connection between wires.

As the conductive layer of the conductive particles, a nickel plating film by an electroless plating method is often used, but various studies have been made in order to express target characteristics. As an example thereof, Patent Literature 1 describes treating the surface of conductive particles with a treatment liquid containing a radically polymerizable compound, an acidic compound and water in order to obtain conductive particles having excellent storage stability, thereby resulting in conductive particles. It is described that the activity of the conductive layer is suppressed by forming a uniform resin film on the surface of. Further, Patent Literature 2 describes providing coated conductive particles excellent in storage stability and the like by conductive particles provided with an organometallic complex that covers at least a part of the surface of the conductive particles.

Moreover, in order to obtain electroconductive particle which has excellent storage stability, it is also necessary for a conductive layer to have high corrosion resistance. As such a technique, for example, Patent Literature 3 describes conductive particles in which a phosphorus-containing hydrophobic group is introduced into the surface of a conductive layer. It is said that oxidation of the conductive layer can be suppressed by this, and corrosion resistance can be improved. In addition, Patent Document 4 describes conductive particles in which, in a conductive layer containing nickel, phosphorus, and tungsten, phosphorus is contained in an inner region of the thickness of the conductive layer and tungsten is contained in an outer region in an amount within a specific range. As a result, it has been reported that corrosion hardly progresses even when exposed to the presence of an acid. In these patent documents, an attempt is made to impart corrosion resistance by modifying the conductive layer.

Japanese Unexamined Patent Publication No. 2003-77335 Japanese Unexamined Patent Publication No. 2017-134902 Japanese Unexamined Patent Publication No. 2010-278026 Japanese Unexamined Patent Publication No. 2015-110834

In general, since the storage stability of conductive particles can be achieved by suppressing deterioration of the surface of the conductive layer such as oxidation of metal, the surface of the conductive layer and its vicinity are protected by the same method as in Patent Literatures 1 to 4 above. However, when an anisotropic conductive material such as an anisotropic conductive film or an anisotropic conductive paste is used, it has been a problem that connection resistance increases due to the surface of the conductive layer being protected.

Accordingly, an object of the present invention is to provide conductive particles having excellent storage stability, excellent corrosion resistance and low connection resistance.

The present inventors have found that storage stability and corrosion resistance are excellent when a specific element present in the surface layer of a conductive layer including a nickel plating layer is present in a constant ratio relative to the total amount of nickel and phosphorus or boron, and completed the present invention. did

That is, in the present invention, in the conductive particles in which a nickel plating layer as a conductive layer is formed on the surface of the core material particle, the nickel within 5 nm in the depth direction from the surface of the conductive layer as measured by a scanning type Auger electron spectrometer. The molar ratio of carbon to the sum of nickel and phosphorus (C/(Ni+P)) or the molar ratio of carbon to the sum of nickel and boron (C/(Ni+B)) is 0.0002 or more and 1.65 or less, and The molar ratio of oxygen to (O/(Ni+P)) or the molar ratio of oxygen to the total of nickel and boron (O/(Ni+B)) is 0.0001 or more and 2.0 or less, and the molar ratio of phosphorus to nickel (P /Ni), or the molar ratio of boron to nickel (B/Ni) is 0.003 or more and 0.7 or less.

Further, in the present invention, in the conductive particles in which a nickel plating layer as a conductive layer is formed on the surface of core material particles, the depth from the surface of the conductive layer measured by a time-of-flight secondary ion mass spectrometer (TOF-SIMS) The count intensity of CH ₄ N ⁺ cations relative to the count intensity of Ni ⁺ cations within 1 nm in the direction (CH ₄ N ⁺ /Ni ⁺ ) is 0.1 or less, or C ₂ H relative to the count intensity of Ni ^- anions ₃ The count intensity of the anion of O ₂ ^- (C ₂ H ₃ O ₂ ^- /Ni ^- ) is 10.0 or less, or the count intensity of the anion of PO ₂ ^- relative to the count intensity of the anion of Ni ^- (PO ₂ ^- /Ni ^- ) is 10.0 or less, or the count intensity of anions of B ₂ O ₄ H ₃ ^- and B ₃ O ₆ H ₄ ^- relative to the count intensity of anions of Ni ^- ((B ₂ O ₄ H ₃ ^- +B ₃ O ₆ H ₄ ^- )/Ni ^- ) is to provide conductive particles of 10.0 or less.

Moreover, this invention provides the manufacturing method of electroconductive particle which has the process of heating the electroconductive particle obtained by forming a conductive layer on the surface of a core material particle at a temperature of 200-600 degreeC under the vacuum of 1000 Pa or less.

According to the present invention, it is possible to provide conductive particles having excellent storage stability, excellent corrosion resistance and low connection resistance.

1 : is a SEM image of the electroconductive particle obtained in Example 1.
2 : is a SEM image of the electroconductive particle obtained in Example 4.

In the conductive particles of the present invention, a nickel plating layer as a conductive layer is formed on the surface of core material particles, and the molar ratio of carbon to the total of nickel and phosphorus within 5 nm from the surface of the conductive layer (C/(Ni+P)) , or the molar ratio of carbon to the sum of nickel and boron (C/(Ni+B)) is 0.0002 or more and 1.65 or less, preferably 0.0005 or more and 1.55 or less, and the molar ratio of oxygen to the total of nickel and phosphorus (O/(Ni +P)), or the molar ratio of oxygen to the total of nickel and boron (O/(Ni+B)) is 0.0001 or more and 2.0 or less, preferably 0.0003 or more and 1.8 or less, and the molar ratio of phosphorus to nickel (P/(Ni+B)) Ni), or the molar ratio of boron to nickel (P/Ni) is 0.003 or more and 0.7 or less, preferably 0.005 or more and 0.5.

In the present invention, the molar ratio of each element described above is determined using a scanning type Auger electron spectroscopy device (hereinafter sometimes referred to as an AES analyzer) to obtain carbon, oxygen, and carbon within 5 nm from the surface of the conductive layer. The atomic % of nickel and phosphorus or boron is measured, the measured value of each element of carbon and oxygen relative to the total of the measured values of nickel and phosphorus or nickel and boron, and the measured value of phosphorus or boron relative to the measured value of nickel it was calculated As an AES analyzer, for example, PHI-710 manufactured by Albec Pyro Corporation can be used.

If the molar ratio of each element of carbon and oxygen to the sum of nickel and phosphorus or nickel and boron, and the molar ratio of phosphorus or boron to nickel are less than the lower limit of the above range, the crystal structure portion becomes too large and becomes the starting point of corrosion Storage stability deteriorates from the above, and when the upper limit of the above range is exceeded, the amorphous structure portion becomes too large and the connection resistance increases.

In the conductive particles of the present invention, a nickel plating layer as a conductive layer is formed on the surface of the core material particle, and the conductivity measured by a time-of-flight secondary ion mass spectrometer (hereinafter sometimes referred to as TOF-SIMS) The count intensity of CH ₄ N ⁺ cations relative to the count intensity of Ni ⁺ cations within 1 nm from the surface of the layer (CH ₄ N ⁺ /Ni ⁺ ) is 0.1 or less, preferably 0.05 or less, or Ni ⁻ The count intensity of the anion of C ₂ H ₃ O ₂ ^- relative to the count intensity of the anion (C ₂ H ₃ O ₂ ^- /Ni ^- ) is 10.0 or less, preferably 9.0 or less, or the count intensity of the anion of Ni ^- The count intensity of the anion of PO ₂ ^- (PO ₂ ^- /Ni ^- ) is 10.0 or less, preferably 9.0 or less, or the count intensity of the anion of Ni ^- B ₂ O ₄ H ₃ ^- and B ₃ O ₆ H The count intensity of the anion of ₄ ^- ((B ₂ O ₄ H ₃ ^- +B ₃ O ₆ H ₄ ^- )/Ni ^- ) is 10.0 or less, preferably 9.0 or less. As TOF-SIMS, TOF-SIMS5 type manufactured by ION-TOF can be used, for example.

The count intensity of cations of CH ₄ N ⁺ relative to the count intensity of cations of Ni ⁺ (CH ₄ N ⁺ /Ni ⁺ ), the count intensity of anions of C ₂ H ₃ O ₂ ⁻ relative to the count intensity of anions of Ni ⁻ ( C ₂ H ₃ O ₂ ^- /Ni ^- ), count intensity of anion of PO ₂ ^- against count intensity of anion of Ni ^- (PO ₂ ^- /Ni ^- ), or B ₂ against count intensity of anion of Ni ^- When the count intensity of the anions of O ₄ H ₃ ^- and B ₃ O ₆ H ₄ ^- ((B ₂ O ₄ H ₃ ^- +B ₃ O ₆ H ₄ ^- )/Ni ^- ) is less than the above range, corrosion is suppressed. , which is preferable because the connection resistance after pressure connection becomes low. Conversely, when the above range is exceeded, the conductive layer is liable to corrode, which affects the connection reliability after pressure connection.

The CH ₄ N ⁺ is a cation derived from an amine compound, the C ₂ H ₃ O ₂ ^- is an anion derived from an organic acid, and the PO ₂ ^- is an anion derived from a phosphoric acid compound, and the B ₂ O ₄ H ₃ ^- and B ₃ O ₆ H ₄ ^- is an anion derived from a boric acid compound.

The amine compound, the organic acid, the phosphoric acid compound, and the boric acid compound are a complexing agent, a dispersing agent, a reducing agent, a pH buffering agent, and an interface contained in an electroless plating solution when performing the method for producing conductive particles of the present invention described later. It is derived from an activator, etc.

The complexing agent is an effective component for preventing precipitation of a nickel compound such as nickel hydroxide by forming a stable complex with nickel ions, and also for speeding up the nickel precipitation reaction, in a known electroless nickel plating solution. Various complexing agents that are used can be used. Specific examples of such a complexing agent include monocarboxylic acids and soluble salts thereof such as acetic acid, propionic acid and butyric acid, dicarboxylic acids and soluble salts thereof such as oxalic acid and adipic acid, oxycarboxylic acids such as malic acid and tartaric acid, and soluble salts thereof. Soluble salts, aminocarboxylic acids such as glycine and alanine, and soluble salts thereof, ethylenediaminetetraacetic acid, versenol (N-hydroxyethylethylenediamine-N,N',N'-triacetic acid), quadrol (N, ethylenediamine derivatives and soluble salts thereof such as N,N',N'-tetrahydroxyethylethylenediamine), phosphonic acids such as 1-hydroxyethane-1,1-diphosphonic acid, ethylenediaminetetramethylenephosphonic acid, and the like; soluble salts thereof, pyrophosphoric acid and soluble salts thereof, and the like. These complexing agents can be used individually by 1 type or in mixture of 2 or more types.

Examples of the amine compound include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, ethylenediamine, triethanolamine, N,N-diisopropylethylamine, tetramethylethylenediamine, hexamethylenediamine, aliphatic amines such as phenylamine, benzylamine, N-phenylhydroxylamine, aromatic amines such as O-methylhydroxylamine, O-carboxyhydroxylamine, hydroxylamines such as pyrrole, pyrazole, Heterocyclic amines such as dazole, pyridine, oxazole, thiazole, benzothiazole, triazole, and benzotriazole and their alkali metal salts, alanine, arginine, glutamine, glutamic acid, glycine, leucine, phenylalanine, cystine, histidine, glutathione, and amino acids such as methionine, asparagine, and aspartic acid.

Examples of the organic acids include saturated fatty carboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, lauric acid, tridecylic acid, paltimic acid, and stearic acid, and alkali metal salts thereof, acrylic acid, methacrylic acid, oleic acid, and linoleic acid. , α-linolenic acid, unsaturated fatty carboxylic acids and alkali metal salts thereof, saturated dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, and alkali metal salts thereof, maleic acid, fumaric acid, etc. of unsaturated dicarboxylic acids and alkali metal salts thereof, aconitic acid and alkali metal salts thereof, aromatic carboxylic acids such as benzoic acid, salicylic acid, phthalic acid, and alkali metal salts thereof, lactic acid, glyceric acid, malic acid, tartaric acid, 2-hydroxybutyric acid , hydroxycarboxylic acids such as 3-hydroxybutyric acid, 4-hydroxybutyric acid, citric acid, leucic acid, pantoic acid, pantothenic acid, and cerebonic acid, and alkali metal salts thereof, ethylenediaminetetraacetic acid, and ethylenediaminetetraacetic acid disodium. can

Examples of the phosphoric acid compound include oxyphosphoric acids such as phosphorous acid, hypophosphorous acid, phosphoric acid, and soluble salts thereof, pyrophosphoric acid and soluble salts thereof, phosphoric acid esters and soluble salts thereof such as phosphoric acid monododecyl ester, phosphorous acid esters and soluble salts thereof, phosphite phonic acid and its derivatives. This phosphoric acid compound originates from a phosphorus-based compound such as sodium hypophosphite or potassium hypophosphite as a reducing agent contained in the electroless plating solution.

Examples of the boric acid compound include anhydrous boric acid, pyroboric acid, orthoboric acid, and derivatives thereof. This boric acid compound is methylhexaborane, dimethylamine borane, diethylamine borane, morpholine borane, pyridineamine borane, piperidine borane, ethylenediamine borane, ethylenediaminebisborane, t- It is derived from boron-type compounds, such as butylamine borane, imidazole borane, methoxyethylamine borane, sodium borohydride, and potassium borohydride.

The conductive particles of the present invention are obtained by forming a conductive layer on the surface of core material particles.

As the core material particles, as long as they are particulate, inorganic or organic materials can be used without particular limitation. Examples of inorganic core material particles include metal particles such as gold, silver, copper, nickel, palladium, and solder, alloys, glass, ceramics, silica, oxides of metals or nonmetals (including hydrated compounds), and metals containing aluminosilicates. silicates, metal carbides, metal nitrides, metal carbonates, metal sulfates, metal phosphates, metal sulfides, metal acid salts, metal halides, and carbon. On the other hand, as organic core material particles, for example, natural fiber, natural resin, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polybutene, polyamide, polyacrylic acid ester, polyacrylonitrile, polyacetal, ionomer, and thermosetting resins such as thermoplastic resins such as polyester, alkyd resins, phenol resins, urea resins, benzoguanamine resins, melamine resins, xylene resins, silicone resins, epoxy resins, and diallylphthalate resins. These may be used independently and may be used in combination of 2 or more type.

The core material particles may be made of a material containing both inorganic and organic substances instead of the above-described material containing either inorganic or organic substances. When the core material particles are composed of a material containing both inorganic and organic substances, examples of the presence of the inorganic and organic substances in the core material particles include a core containing an inorganic substance and covering the surface of the core core-shell type configurations, such as an aspect including a shell containing an inorganic substance, or an aspect including a core containing an organic substance and a shell containing an inorganic substance covering the surface of the core. In addition to these, a blend type configuration in which inorganic substances and organic substances are mixed or randomly fused in one core material particle, and the like are exemplified.

The core material particles are preferably composed of an organic substance or a material containing both an inorganic substance and an organic substance, and more preferably a material containing both an inorganic substance and an organic substance. The inorganic material is glass, ceramic, silica, metal or non-metal oxide (including a hydrous compound), metal silicate including aluminosilicate, metal carbide, metal nitride, metal carbonate, metal sulfate, metal phosphate, metal sulfide, metal Acid salts, metal halides and carbon are preferred. In addition, the organic material is a thermoplastic resin such as natural fiber, natural resin, polyethylene, polypropylene, polyvinyl chloride, polystyrene, polybutene, polyamide, polyacrylic acid ester, polyacrylonitrile, polyacetal, ionomer, and polyester. desirable. By using a core material containing such a material, dispersion stability between particles can be improved, and conduction can be enhanced by developing appropriate elasticity at the time of electrical connection of electronic circuits.

In the case of using an organic material as the core material particle, the core material particle does not have a glass transition temperature or has a glass transition temperature of more than 100 ° C., so that the shape of the core material particle is easily maintained or in the process of forming a metal film. It is preferable in that it is easy to maintain the shape of The glass transition temperature can be obtained, for example, as a tangential intersection between an original baseline and an inflection point in a baseline shift portion of a DSC curve obtained by differential scanning calorimetry (DSC).

In the case of using an organic substance as the core material particle, when the organic substance is a highly crosslinked resin, even if the glass transition temperature is measured up to 200 DEG C by the above method, almost no baseline shift is observed. In this specification, such particles are also referred to as particles having no glass transition temperature, and in the present invention, such core material particles may be used. As a specific example of the core material particulate material having no glass transition temperature, it can be obtained by copolymerizing a monomer constituting the above-exemplified organic substance in combination with a crosslinkable monomer. Examples of crosslinkable monomers include tetramethylene di(meth)acrylate, ethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, and ethylene oxide di(meth)acrylate. rate, tetraethylene oxide (meth) acrylate, 1,6-hexanedi (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, trimetelol Propane tri(meth)acrylate, tetramethylolmethane di(meth)acrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, tetramethylolpropanetetra(meth)acrylate Polyfunctional (meth)acrylates such as lactate, dipentaerythritol penta(meth)acrylate, glycerol di(meth)acrylate, and glycerol tridi(meth)acrylate, polyfunctional such as divinylbenzene and divinyltoluene Vinyl monomers, vinyl trimethoxysilane, trimethoxysilyl styrene, silane-containing monomers such as γ-(meth)acryloxypropyltrimethoxysilane, triallyl isocyanurate, diallyl phthalate, diallyl acrylamide , monomers such as diallyl ether. In particular, in the COG (Chip on Glass) field, core material particles made of such hard organic materials are widely used.

The shape of the core material particles is not particularly limited. Generally, the core material particles are spherical. However, the core material particles may be in a shape other than spherical, for example, fibrous, hollow, plate-like or needle-like, and may have a large number of projections on their surface or may be irregular. In the present invention, spherical core material particles are preferable from the viewpoint of excellent filling properties and easy coating of metal.

The conductive layer formed on the surface of the core material particle contains a metal having conductivity. Examples of the metal constituting the conductive layer include gold, platinum, silver, copper, iron, zinc, nickel, tin, lead, antimony, bismuth, cobalt, indium, titanium, germanium, aluminum, chromium, palladium, tungsten, Metals such as molybdenum, calcium, magnesium, rhodium, sodium, iridium, beryllium, ruthenium, potassium, cadmium, osmium, lithium, rubidium, gallium, thallium, tantalum, cesium, thorium, strontium, polonium, zirconium, barium, manganese, or these In addition to the alloy of , metal compounds such as ITO and solder are exemplified. Among them, gold, silver, copper, nickel, palladium, rhodium, or solder is preferable because of its low electrical resistance, and nickel, gold, nickel alloys, or gold alloys are particularly suitably used. 1 type of metal may be sufficient as it, and it can also use it in combination of 2 or more types.

The conductive layer may have a single layer structure or a laminated structure including a plurality of layers. In the case of a laminated structure including a plurality of layers, it is preferable that the outermost layer is at least one selected from nickel, gold, silver, copper, palladium, nickel alloys, gold alloys, silver alloys, copper alloys, and palladium alloys.

As for the electroconductive particle of this invention, the outermost layer of a conductive layer is a nickel- phosphorus plating layer or a nickel- boron plating layer.

In addition, the conductive layer does not have to cover the entire surface of the core material particles, and may cover only a part thereof. In the case where only a part of the surface of the core material particle is covered, the covered portion may be continuous or, for example, may be discontinuously coated in an island shape.

It is preferable that they are 5 nm or more and 2,000 nm or less, and, as for the thickness of a conductive layer, it is more preferable that they are 10 nm or more and 1,500 nm or less. When the thickness of the conductive layer is within the above range, the electrical properties are excellent and the storage stability is also excellent. When electroconductive particle has a processus|protrusion mentioned later, the height of a processus|protrusion shall not be included in the thickness of the conductive layer here. In the present invention, the thickness of the conductive layer can be measured by cutting a particle to be measured into two pieces and observing a cross section of the cut portion with a scanning electron microscope (SEM).

The average particle diameter of the conductive particles is preferably 0.1 μm or more and 50 μm or less, more preferably 1 μm or more and 30 μm or less. When the average particle diameter of the conductive particles is within the above range, it is easy to secure conduction between the counter electrodes without generating a short circuit in a direction different from that between the counter electrodes. In addition, in this invention, the average particle diameter of electroconductive particle is a value measured by SEM observation. Specifically, the average particle diameter of conductive particles is measured by the method described in Examples. In addition, the particle diameter is the diameter of the circular conductive particle phase. When the conductive particles are not spherical, the particle diameter refers to the largest length (maximum length) among the line segments crossing the conductive particle top.

When the conductive particles have projections on their surfaces, that is, when the outer surface of the conductive layer has projections, the height of the projections is preferably 20 nm or more and 1,000 nm or less, more preferably 50 nm or more and 800 nm or less. to be. The number of protrusions varies depending on the particle size of the conductive particles, but per conductive particle, preferably 1 or more and 20,000 or less, more preferably 5 or more and 5,000 or less, from the point of further improving the conductivity of the conductive particles. It is advantageous. Further, the length of the base of the protrusion is preferably 5 nm or more and 1,000 nm or less, more preferably 10 nm or more and 800 nm or less. The length of the base of the projection refers to the length along the surface of the conductive particle in the portion where the projection is formed when the cross section of the particle is observed by SEM, and the height of the projection is the shortest distance from the base of the projection to the apex of the projection. say In addition, when one protrusion has a plurality of vertices, the highest apex is set as the height of the protrusion. The length of the base of the protrusion and the height of the protrusion are taken as the arithmetic average values of values measured for 20 different particles observed with an electron microscope.

The shape of the conductive particles varies depending on the shape of the core material particles, but is not particularly limited. For example, it may be fibrous, hollow, plate-like or needle-like, and may have many protrusions on its surface or may be irregular. In the present invention, it is preferable to have a spherical shape or a shape having a large number of projections on the outer surface from the point of being excellent in fillability and connectivity.

Examples of the method for forming a conductive layer on the surface of the core material particles include a dry method using a vapor deposition method, a sputtering method, a mechanochemical method, a hybridization method, and the like, and a wet method using an electrolytic plating method and an electroless plating method. Moreover, you may form a conductive layer on the surface of a core material particle by combining these methods.

In the present invention, it is preferable to form a nickel-phosphorus plating layer or a nickel-boron plating layer as a conductive layer on the surface of the core material particles by an electroless plating method because it is easy to obtain conductive particles having desired particle characteristics.

Hereinafter, the method of forming a nickel plating layer as a conductive layer is demonstrated.

When the conductive layer is formed on the surface of the core material particle by the electroless plating method, the surface of the core material particle has a noble metal ion trapping ability or is preferably surface-modified to have a noble metal ion trapping capability. The noble metal ion is preferably an ion of palladium or silver. Having noble metal ion trapping ability means being able to trap noble metal ions as a chelate or a salt. For example, when an amino group, an imino group, an amide group, an imide group, a cyano group, a hydroxyl group, a nitrile group, a carboxyl group, etc. are present on the surface of the core material particle, the surface of the core material particle has a noble metal ion trapping ability. have In the case of surface modification so as to have noble metal ion trapping ability, the method described in Japanese Unexamined Patent Publication No. 61-64882 can be used, for example.

Using these core material particles, a noble metal is supported on the surface. Specifically, the core material particles are dispersed in a dilute acidic aqueous solution of a noble metal salt such as palladium chloride or silver nitrate. In this way, noble metal ions are trapped on the surface of the particles. The concentration of the noble metal salt is sufficient within the range of 1×10 ^-7 to 1×10 ^-2 mol per 1 m 2 of particle surface area. The core material particles in which noble metal ions have been captured are separated from the system and washed with water. Subsequently, the core material particles are suspended in water, and a reducing agent is added thereto to perform reduction treatment of noble metal ions. As a result, the noble metal is supported on the surface of the core material particles. As the reducing agent, for example, sodium hypophosphite, sodium borohydride, potassium borohydride, dimethylamine borane, hydrazine, formalin, etc. are used, and it is preferable to select from these based on the material of the target conductive layer.

Prior to trapping noble metal ions on the surface of the core material particle, a sensitization treatment may be performed in which tin ions are adsorbed on the surface of the particle. In order to adsorb tin ions to the surface of the particles, for example, the surface-modified core material particles may be put into an aqueous solution of stannous chloride and stirred for a predetermined time.

In this way, the conductive layer formation treatment is performed on the core material particles subjected to the pretreatment. As the conductive layer formation process, there are two types of processes: a process for forming a conductive layer with projections and a process for forming a conductive layer with a smooth surface. First, the process for forming a conductive layer with projections will be described.

In the process of forming the conductive layer having protrusions, the following first step and second step are performed.

The first step is an electroless nickel plating step in which an aqueous slurry of core material particles is mixed with an electroless nickel plating bath containing a dispersant, a nickel salt, a reducing agent, a complexing agent, and the like. In this first step, self-decomposition of the plating bath occurs simultaneously with the formation of the conductive layer on the core material particles. Since this self-decomposition occurs in the vicinity of the core material particles, at the time of formation of the conductive layer, when the self-decomposed product is captured on the surface of the core material particle, nuclei of micro projections are generated, and at the same time, the conductive layer is formed. . The projections grow from the nuclei of the generated microprojections as a starting point.

In the first step, an aqueous slurry is prepared by sufficiently dispersing the aforementioned core material particles in water, preferably in the range of 0.1 to 500 g/L, more preferably 1 to 300 g/L. The dispersing operation can be usually carried out using agitation, high-speed stirring, or a shear dispersing device such as a colloid mill or homogenizer. In addition, ultrasonic waves may be used in combination with the dispersing operation. As needed, a dispersing agent such as a surfactant may be added in the dispersing operation. Next, the aqueous slurry of core material particles subjected to the dispersion operation is added to an electroless nickel plating bath containing a nickel salt, a reducing agent, a complexing agent, and various additives, and a first electroless plating step is performed.

Examples of the above dispersing agent include nonionic surfactants, zwitterionic surfactants and/or water-soluble polymers. As the nonionic surfactant, polyoxyalkylene ether surfactants such as polyethylene glycol, polyoxyethylene alkyl ether, and polyoxyethylene alkyl phenyl ether can be used. As the zwitterionic surfactant, betaine-based surfactants such as alkyldimethylacetate betaine, alkyldimethylcarboxymethylacetate betaine, and alkyldimethylaminoacetic acid betaine can be used. As the water-soluble polymer, polyvinyl alcohol, polyvinylpyrrolidinone, hydroxyethyl cellulose and the like can be used. These dispersants can be used individually by 1 type or in combination of 2 or more types. The amount of the dispersant used varies depending on the type, but is generally 0.5 to 30 g/L with respect to the volume of the liquid (electroless nickel plating bath). In particular, when the amount of the dispersant is in the range of 1 to 10 g/L with respect to the volume of the liquid (electroless nickel plating bath), it is preferable from the viewpoint of further improving the adhesion of the conductive layer.

As the nickel salt, for example, nickel chloride, nickel sulfate or nickel acetate is used, and the concentration thereof is preferably in the range of 0.1 to 50 g/L. As the reducing agent, for example, those similar to those used for the reduction of noble metal ions described above can be used, and are selected based on the constituent material of the target underlying film. When using a phosphorus compound such as sodium hypophosphite as the reducing agent, the concentration thereof is preferably in the range of 0.1 to 50 g/L. Moreover, when using a boron compound, for example, dimethylamine borane, as a reducing agent, it is preferable that the range of its concentration is 0.01-100 g/L.

As the complexing agent, for example, citric acid, hydroxyacetic acid, tartaric acid, malic acid, lactic acid, gluconic acid or carboxylic acids (salts) such as alkali metal salts and ammonium salts thereof, amino acids such as glycine, amine acids such as ethylenediamine and alkylamines , other compounds having a complexing action for nickel ions, such as ammonium, EDTA or pyrophosphoric acid (salt), are used. These can be used individually by 1 type or in combination of 2 or more types. Its concentration is preferably in the range of 1 to 100 g/L, more preferably 5 to 50 g/L. A preferable pH of the electroless nickel plating bath at this stage is in the range of 3 to 14. The electroless nickel plating reaction starts rapidly when the aqueous slurry of core material particles is added, and is accompanied by the generation of hydrogen gas. The first step ends with the point at which generation of the hydrogen gas is completely invisible.

Subsequently, in the second step, following the first step described above, (i) a first aqueous solution containing one of a nickel salt, a reducing agent and an alkali and a second aqueous solution containing the other two are used, or ( ii) using a first aqueous solution containing a nickel salt, a second aqueous solution containing a reducing agent, and a third aqueous solution containing an alkali, and adding these aqueous solutions simultaneously and over time to the liquid in the first step, respectively, Electroless nickel plating is performed. When these liquids are added, the plating reaction starts again, but by adjusting the addition amount, the formed conductive layer can be controlled to a desired film thickness. After completion of the addition of the electroless nickel plating solution, after generation of hydrogen gas is completely invisible, stirring is continued while maintaining the liquid temperature for a while to complete the reaction.

In the case of (i) described above, it is preferable to use a first aqueous solution containing a nickel salt and a second aqueous solution containing a reducing agent and an alkali, but it is not limited to this combination. In this case, the first aqueous solution does not contain a reducing agent and alkali, and the second aqueous solution does not contain a nickel salt. As the nickel salt and the reducing agent, those described above can be used. As the alkali, for example, an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide can be used. The same applies to the case of (ii) above.

In the case of (ii) described above, the first to third aqueous solutions contain a nickel salt, a reducing agent, and an alkali, respectively, and each aqueous solution contains no other two components other than the components concerned.

In either case of (i) and (ii), the concentration of the nickel salt in the aqueous solution is preferably 10 to 1,000 g/L, particularly 50 to 500 g/L. The concentration of the reducing agent is preferably 100 to 1,000 g/L, particularly 100 to 800 g/L, when a phosphorus compound is used as the reducing agent. When using a boron compound as a reducing agent, it is 5-200 g/L, It is preferable that it is 10-100 g/L especially. In the case of using hydrazine or a derivative thereof as the reducing agent, it is preferably 5 to 200 g/L, particularly 10 to 100 g/L. The alkali concentration is preferably 5 to 500 g/L, particularly 10 to 200 g/L.

Although the 2nd process is performed continuously after completion|finish of the 1st process, you may intermittently perform the 1st process and the 2nd process instead of this. In this case, after the first step is finished, the core material particles and the plating solution are separated by a method such as filtration, the core material particles are newly dispersed in water to prepare an aqueous slurry, and a complexing agent is preferably 1 to 100 g/L, more preferably 5 to 50 g/L, and adding a dispersant dissolved in a concentration range of preferably 0.5 to 30 g/L, more preferably 1 to 10 g/L to form an aqueous solution. A method of preparing a slurry and performing a second step of adding each of the above aqueous solutions to the aqueous slurry may be used. In this way, a conductive layer having protrusions can be formed.

Continuing, below, the process of forming the conductive layer with a smooth surface is demonstrated.

The formation of the conductive layer with a smooth surface can be performed by reducing the concentration of the nickel salt in the electroless nickel plating bath in the first step of the treatment for forming the conductive layer having the protrusions. That is, as the nickel salt, for example, nickel chloride, nickel sulfate or nickel acetate is used, and the concentration is preferably in the range of 0.01 to 0.5 g/L. A conductive layer with a smooth surface can be formed by a method of performing the first step and the second step other than reducing the concentration of the nickel salt in the electroless nickel plating bath.

The conductive particles of the present invention, the conductive particles obtained by the method described above, 1,000Pa or less, preferably 0.01 to 900Pa, particularly preferably 0.01 to 500Pa under a vacuum of 200 to 600 ℃, preferably 250 to 500 ℃ °C, particularly preferably obtained by heat treatment at a temperature of 300 to 450 °C. By heating the conductive particles while maintaining such a vacuum state, the ratio of carbon and oxygen present on the surface of the conductive layer can be reduced, and the molar ratio of phosphorus to carbon, oxygen and nickel is appropriate. In addition, the degree of vacuum in the present invention is an absolute pressure, that is, a value when absolute vacuum is set to zero.

The heat treatment time is preferably 0.1 to 10 hours, more preferably 0.5 to 5 hours. By employing this processing time, an increase in manufacturing cost can be suppressed, and deterioration of the core material particles and the conductive layer due to thermal history can be suppressed, and the influence on quality can be reduced. This heat treatment time is the time from when the target treatment temperature is reached until the heat treatment is completed.

The heat treatment may be performed in a state in which the conductive particles are left still, or may be performed while stirring. When heat-processing is performed in the state which left electroconductive particle still, it is preferable to leave it still with the thickness of 0.1 mm - 100 mm. By leaving it still at this thickness, heat treatment to a conductive layer is performed smoothly, and manufacturing cost can be held down.

The heat treatment is performed in a stationary state or while stirring after vacuuming the container in which the conductive particles are placed. At this time, the vapor phase of the container containing the conductive particles may be evacuated after being substituted with an inert gas such as nitrogen, or may be evacuated as it is. In addition, you may perform heat treatment multiple times as needed.

In this way, the electroconductive particle of this invention is obtained.

When the conductive particles of the present invention are used as conductive fillers for conductive adhesives as described later, their surfaces can be further coated with an insulating resin in order to prevent short circuit between the conductive particles. The coating of the insulating resin is destroyed by the heat and pressure applied when bonding the two electrodes using a conductive adhesive so that the surface of the conductive particles is not exposed as much as possible in a state where no pressure or the like is applied, and the conductive particles are damaged. It is formed so that at least a protrusion of the surface is exposed. The thickness of the insulating resin may be about 0.1 to 0.5 μm. The insulating resin may cover the entire surface of the conductive particles, or may only cover a part of the surface of the conductive particles.

As the insulating resin, those known in the art can be widely used. Examples thereof include phenol resins, urea resins, melamine resins, allyl resins, furan resins, polyester resins, epoxy resins, silicone resins, polyamide-imide resins, polyimide resins, polyurethane resins, fluororesins, and polyolefin resins. (e.g. polyethylene, polypropylene, polybutylene), polyalkyl(meth)acrylate resin, poly(meth)acrylic acid resin, polystyrene resin, acrylonitrile-styrene-butadiene resin, vinyl resin, polyamide resin, polycar resins containing organic polymers such as bonate resins, polyacetal resins, ionomer resins, polyethersulfone resins, polyphenyloxide resins, polysulfone resins, polyvinylidene fluoride resins, ethylcellulose resins and cellulose acetate resins; can

As a method of forming an insulating coating layer on the surface of conductive particles, chemical methods such as coacervation method, interfacial polymerization method, in situ polymerization method and submerged curing coating method, spray drying method, suspension coating method in air, vacuum deposition Physio-mechanical methods such as coating method, dry blend method, hybridization method, electrostatic coalescence method, fusion dispersion cooling method and inorganic encapsulation method, and physicochemical methods such as interfacial precipitation method are exemplified.

The organic polymer constituting the insulating resin may contain, as a monomer component, a compound containing an ionic group in the structure of the polymer, provided that it is non-conductive. The compound containing an ionic group may be a crosslinkable monomer or a non-crosslinkable monomer. That is, it is preferable that the organic polymer is formed using a compound in which at least one of the crosslinkable monomer and the non-crosslinkable monomer has an ionic group. A "monomer component" refers to a structure derived from a monomer in an organic polymer, and is a component derived from a monomer. By subjecting a monomer to polymerization, an organic polymer containing the monomer component as a constituent unit is formed.

It is preferable that the ionic group exists in the interface of the organic polymer constituting the insulating resin. Moreover, it is preferable that the ionic group is chemically bonded to the monomer component constituting the organic polymer. Whether or not the ionic group exists at the interface of the organic polymer can be determined by observing the insulating resin on the surface of the conductive particle when an insulating resin containing an organic polymer having an ionic group is formed on the surface of the conductive particle. It can be judged by whether or not it is attached.

As an ionic group, onium-type functional groups, such as a phosphonium group, an ammonium group, and a sulfonium group, are mentioned, for example. Among these, it is preferably an ammonium group or a phosphonium group, more preferably a phosphonium group, from the viewpoint of enhancing the adhesion between the conductive particles and the insulating resin and forming conductive particles having both insulation and conduction reliability at a high level.

As the onium-based functional group, those represented by the following general formula (1) are preferably exemplified.

(Wherein, X is a phosphorus atom, a nitrogen atom, or a sulfur atom, R may be the same or different, and is a hydrogen atom, a linear, branched or cyclic alkyl group, or an aryl group. In n, X is nitrogen It is 1 when it is an atom or a phosphorus atom, and 0 when X is a sulfur atom. * is a bond.)

As a counter ion to an ionic group, a halide ion is mentioned, for example. Examples of halide ions include Cl ⁻ , F ⁻ , Br ⁻ , and I ⁻ .

In Formula (1), as a linear alkyl group represented by R, a C1-C20 linear alkyl group is mentioned, for example, Specifically, a methyl group, an ethyl group, n-propyl group, n-butyl group , n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, n-tridecyl group, n-tetra A decyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecyl group, n-icosyl group, etc. are mentioned.

In formula (1), examples of the branched chain alkyl group represented by R include a branched chain alkyl group having 3 or more and 8 or less carbon atoms, specifically, an isopropyl group, an isobutyl group, a s-butyl group, t-butyl group, isopentyl group, s-pentyl group, t-pentyl group, isohexyl group, s-hexyl group, t-hexyl group, ethylhexyl group, etc. are mentioned.

Examples of the cyclic alkyl group represented by R in formula (1) include cycloalkyl groups such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, and cyclooctadecyl group. can

In Formula (1), as an aryl group represented by R, a phenyl group, a benzyl group, a tolyl group, an o-xylyl group, etc. are mentioned.

In general formula (1), R is preferably an alkyl group of 1 to 12 carbon atoms, more preferably an alkyl group of 1 to 10 carbon atoms, and still more preferably an alkyl group of 1 to 8 carbon atoms. Moreover, in general formula (1), it is more preferable that R is a linear alkyl group. When the onium-based functional group has such a structure, the adhesion between the insulating resin and the conductive particles is improved to ensure insulation, and the conduction reliability during thermal compression bonding can be further improved.

From the viewpoint of facilitating the acquisition of monomers and synthesis of polymers and increasing the production efficiency of insulating resins, organic polymers having ionic groups constituting insulating resins are represented by the following general formula (2) or general formula (3). It is preferable to have the constituent units displayed.

(In the formula, X, R and n have the same meaning as in the above general formula (1). m is an integer of 0 or more and 5 or less. An ^- represents a monovalent anion.)

(In the formula, X, R and n have the same meaning as in the above general formula (1). An ^- represents a monovalent anion. m ¹ is an integer of 1 or more and 5 or less. R ⁵ is a hydrogen atom or a methyl group. )

As an example of R in formulas (2) and (3), the description of the functional group of R in the above-described general formula (1) is appropriately applied. The ionic group may be bonded to any of the para-position, ortho-position, and meta-position with respect to the CH group of the benzene ring of formula (2), and it is preferably bonded to the para-position. In formulas (2) and (3), suitable examples of monovalent An ^- include halide ions. Examples of halide ions include Cl ⁻ , F ⁻ , Br ⁻ , and I ⁻ .

In the general formula (2), m is preferably an integer of 0 or more and 2 or less, more preferably 0 or 1, and particularly preferably 1. In general formula (3), 1 or more and 3 or less are preferable, as for m< ¹ >, 1 or 2 is more preferable, and 2 is the most preferable.

The organic polymer having an ionic group is preferably composed of a monomer component having, for example, an onium-based functional group and an ethylenically unsaturated bond. It is also preferable that the organic polymer having an ionic group contains a non-crosslinkable monomer component from the viewpoints of facilitating acquisition of monomers and synthesis of polymers and increasing production efficiency of insulating resins.

Examples of the non-crosslinkable monomer having an onium-based functional group and an ethylenically unsaturated bond include N,N-dimethylaminoethyl methacrylate, N,N-dimethylaminopropyl acrylamide, and N,N,N-trimethyl - Ammonium group-containing monomers such as N-2-methacryloyloxyethylammonium chloride; monomers having sulfonium groups such as methacrylic acid phenyldimethylsulfonium methyl sulfate; 4-(vinylbenzyl)triethylphosphonium chloride, 4-(vinylbenzyl)trimethylphosphonium chloride, 4-(vinylbenzyl)tributylphosphonium chloride, 4-(vinylbenzyl)trioctylphosphonium chloride, 4-( Vinylbenzyl) triphenylphosphonium chloride, 2- (methacroyloxyethyl) trimethylphosphonium chloride, 2- (methacroyloxyethyl) triethylphosphonium chloride, 2- (methacroyloxyethyl) tributylphos and monomers having phosphonium groups such as phonium chloride, 2-(methacroyloxyethyl)trioctylphosphonium chloride, and 2-(metacroyloxyethyl)triphenylphosphonium chloride. Two or more types of non-crosslinkable monomer components may be contained in the organic polymer having an ionic group.

In the organic polymer constituting the insulating resin, ionic groups may be bonded to all of the monomer components, or ionic groups may be bonded to a part of all constituent units of the organic polymer. When an ionic group is partly bonded to all structural units of the organic polymer, the ratio of the monomer component to which the ionic group is bonded is preferably 0.01 mol% or more and 99 mol% or less, and more preferably 0.02 mol% or more and 95 mol% or less. Do. Here, the number of monomer components in an organic polymer counts a structure derived from one ethylenically unsaturated bond as a structural unit of one monomer. When the ionic group is contained in both the crosslinkable monomer and the non-crosslinkable monomer, the ratio of the monomer components is the total amount thereof.

Examples of the form of coating with insulating resin include a form in which a plurality of insulating fine particles are arranged in a layered form, or an insulating continuous coating.

When the insulating resin contains insulating fine particles, by thermally compressing the conductive particles coated with the insulating fine particles between electrodes, the insulating fine particles are melted, deformed, peeled off, or moved on the surface of the conductive particles. The metal surface is exposed, thereby enabling conduction between the electrodes, and connectivity is obtained. On the other hand, since the surface portion of the conductive particles facing in directions other than the direction of thermal compression bonding is substantially maintained in the state of covering the surface of the conductive particles with the insulating fine particles, conduction in directions other than the direction of thermal compression bonding is prevented. .

Insulating fine particles are easily adhered to conductive particles by including the ionic groups on their surface, and thereby the coating ratio of the insulating fine particles on the surface of the conductive particles can be made sufficient, and the insulating fine particles from the conductive particles peeling and the like are effectively prevented. For this reason, the short-circuit prevention effect in the direction other than between the opposing electrodes by the insulating fine particles is easily exhibited, and improvement in insulation in the direction can be expected.

The shape of the insulating fine particles is not particularly limited, and may be spherical or non-spherical. Examples of shapes other than spheres include fibrous, hollow, plate, and needle shapes. Also, the insulating fine particles may have a large number of protrusions on their surface or may be of irregular shape. Spherical insulating fine particles are preferable from the viewpoint of adhesion to conductive particles and ease of synthesis.

The average particle diameter (D) of the insulating fine particles is preferably 10 nm or more and 3,000 nm or less, more preferably 15 nm or more and 2,000 nm or less. When the average particle size of the insulating fine particles is within the above range, the obtained coated particles do not generate a short circuit in a direction different from that between the opposing electrodes, and conduction between the opposing electrodes is easily ensured. In the present invention, the average particle size of the insulating fine particles is a value measured by observation using a scanning electron microscope, and is specifically measured by the method described in Examples described later.

The particle size distribution of the insulating fine particles measured by the above method has a width. In general, the width of the particle size distribution of powder is expressed by a coefficient of variation (Coefficient of Variation, hereinafter also referred to as "C.V.") expressed by the following formula (1).

C.V. (%) = (Standard Deviation/Average Particle Diameter) x 100... (One)

A large C.V. indicates a wide particle size distribution, while a small C.V. indicates a sharp particle size distribution. For the coated particles of the present embodiment, it is preferable to use insulating fine particles having a C.V. of preferably 0.1% or more and 20% or less, more preferably 0.5% or more and 15% or less, and most preferably 1% or more and 10% or less. . When C.V. is within this range, there is an advantage that the thickness of the coating layer made of insulating fine particles can be made uniform.

Further, as the insulating resin, instead of containing the above-described insulating fine particles, a continuous film containing a polymer and having an ionic group may be used. When the insulating resin is a continuous film having an ionic group, the continuous film is melted, deformed or peeled off by thermally compressing the conductive particles between the electrodes, thereby exposing the metal surface of the conductive particles, thereby enabling conduction between the electrodes. Thus, connectivity is obtained. In particular, the metal surface is exposed in many cases when the continuous film is torn by thermally compressing the conductive particles between the electrodes. On the other hand, on the surface portion facing in a direction different from the thermal compression bonding direction in the conductive particles, since the state of covering the conductive particles with the continuous film is substantially maintained, conduction in directions other than the thermal compression bonding direction is prevented. It is preferable that the continuous film also has an ionic group on the surface.

The thickness of the continuous film is preferably 10 nm or more from the viewpoint of improving the insulating properties between the counter electrodes and in other directions, and is preferably 3,000 nm or less from the viewpoint of facilitating conduction between the counter electrodes. In this respect, the thickness of the continuous film is preferably 10 nm or more and 3,000 nm or less, and more preferably 15 nm or more and 2,000 nm or less.

Similar to the insulating fine particles, the ionic group in the continuous film is a part of the material constituting the continuous film, and preferably forms a part of the chemical structure of the material. In the continuous film, it is preferable that the ionic group is contained in at least one structure of the structural units of the polymer constituting the continuous film. The ionic group is preferably chemically bonded to the polymer constituting the continuous film, and more preferably bonded to the side chain of the polymer.

When the insulating resin is a continuous film, it is preferably a continuous film obtained by coating conductive particles with insulating fine particles having ionic groups on their surfaces and then heating the insulating fine particles. Alternatively, it is preferably a continuous film obtained by dissolving the insulating fine particles in an organic solvent. As described above, the insulating fine particles having an ionic group tend to adhere closely to the conductive particles, and as a result, the coating ratio of the insulating fine particles on the surface of the conductive particles is sufficient, and the insulating fine particles can be separated from the conductive particles. easier to prevent For this reason, the continuous film obtained by heating or melting the insulating fine particles that cover the conductive particles can have a uniform thickness and a high coverage ratio on the surface of the conductive particles.

In addition, the conductive particles according to the production method of the present invention may be treated with a surface treatment agent for the purpose of enhancing affinity with the insulating resin and making them excellent in adhesion.

Examples of the surface treatment agent include benzotriazole-based compounds, titanium-based compounds, higher fatty acids or derivatives thereof, phosphoric acid esters, and phosphorous acid esters. These may be used independently and may be used combining plurality as needed.

The surface treatment agent may or may not be chemically bonded to the metal on the surface of the conductive particles. The surface treatment agent should just exist on the surface of electroconductive particle, and in that case, it may exist on the whole surface of electroconductive particle, and may exist only in part of the surface.

As said triazole type compound, the compound which has a nitrogen-containing heterocyclic structure which has 3 nitrogen atoms in a 5-membered ring is mentioned.

Examples of the triazole-based compound include compounds having a ring structure in which a triazole ring and other rings are condensed, in addition to compounds having a monocyclic triazole ring structure that is not condensed with another ring. As another ring, a benzene ring and a naphthalene ring are mentioned.

Among them, a compound having a ring structure in which a triazole ring and another ring are condensed is preferable in terms of excellent adhesion to an insulating resin, and a benzotriazole-based compound, which is a compound having a structure in which a triazole ring and a benzene ring are condensed, is particularly preferable. .

As a benzotriazole type compound, what is represented by the following general formula (I) is mentioned.

(Wherein, R ¹¹ is a negative charge, a hydrogen atom, an alkali metal, an optionally substituted alkyl group, an amino group, a formyl group, a hydroxyl group, an alkoxy group, a sulfonic acid group, or a silyl group, and R ¹² , R ¹³ , R ¹⁴ and R ¹⁵ is each independently a hydrogen atom, a halogen atom, an optionally substituted alkyl group, a carboxyl group, a hydroxyl group, or a nitro group.)

Lithium, sodium, potassium, etc. are mentioned as an alkali metal represented by R< ¹¹ > in Formula (I). The alkali metal represented by R ¹¹ is an alkali metal cation, and when R ¹¹ in Formula (I) is an alkali metal, the bond between R ¹¹ and a nitrogen atom may be an ionic bond.

Examples of the alkyl group represented by R ¹¹ , R ¹² , R ¹³ , R ¹⁴ and R ¹⁵ in the formula (I) include those having 1 to 20 carbon atoms, and those having 1 to 12 carbon atoms are particularly preferred. The alkyl group may be substituted, and examples of the substituent include an amino group, an alkoxy group, a carboxyl group, a hydroxyl group, an aldehyde group, a nitro group, a sulfonic acid group, a quaternary ammonium group, a sulfonium group, a sulfonyl group, a phosphonium group, a cyano group, and a fluoro group. an alkyl group, a mercapto group, and a halogen atom.

As the alkoxy group represented by R ¹¹ , those having 1 to 12 carbon atoms are preferably used.

In addition, it is preferable that the number of carbon atoms of the alkoxy group as a substituent of the alkyl group represented by R ¹² , R ¹³ , R ¹⁴ and R ¹⁵ is 1 to 12. Examples of the halogen atom represented by R ¹² , R ¹³ , R ¹⁴ and R ¹⁵ in Formula (I) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

Specific triazole-based compounds include 1,2,3-triazole, 1,2,4-triazole, 3-amino-1H-1,2,4-triazole, 5-mer as a compound having a triazole monocyclic structure. Sodium capto-1H-1,2,3-triazole, 4-amino-3-hydrazino-5-mercapto-1,2,4-triazole, 3-amino-5-mercapto-1,2, Benzotriazoles, 1-methyl-1H-benzotriazoles, 4-methyl-1H-benzotriazoles, and 5-methyl-, which have ring structures in which a triazole ring and other rings are condensed, in addition to 4-triazoles. 1H-benzotriazole, 4-carboxy-1H-benzotriazole, 5-carboxy-1H-benzotriazole, 5-ethyl-1H-benzotriazole, 5-propyl-1H-benzotriazole, 5,6- Dimethyl-1H-benzotriazole, 1-aminobenzotriazole, 5-nitrobenzotriazole, 5-chlorobenzotriazole, 4,5,6,7-tetrabromobenzotriazole, 1-hydroxybenzotriazole sol, 1-(methoxymethyl)-1H-benzotriazole, 1H-benzotriazole-1-methanol, 1H-benzotriazole-1-carboxaldehyde, 1-(chloromethyl)-1H-benzotriazole, 1-Hydroxy-6-(trifluoromethyl)benzotriazole, benzotriazole butyl ester, 4-carboxyl-1H-benzotriazole butyl ester, 4-carboxyl-1H-benzotriazole octyl ester, 1 -[N,N-bis(2-ethylhexyl)aminomethyl]methylbenzotriazole, 2,2'-[[(methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol, tetra Butylphosphonium benzotriazolate, 1H-benzotriazol-1-yloxytris(dimethylamino)phosphonium hexafluorophosphate, 1H-benzotriazol-1-yloxytripyrrolidinophosphonium hexafluorophosphate, 1-(formamidemethyl)-1H-benzotriazole, 1-[bis(dimethylamino)methylene]-1H-benzotriazolium 3-oxide hexafluorophosphate, 1-[bis(dimethylamino)methylene]- 1H-benzotriazolium 3-oxidetetrafluoroborate, (6-chloro-1H-benzotriazol-1-yloxy)tripyrrolidinophosphonium hexafluorophosphate, O-(benzotriazole-1- yl)-N,N,N',N'-bis(tetramethylene)uronium hexafluorophosphate, O-(6-chlorobenzotriazol-1-yl) -N,N,N',N'-tetramethyluronium tetrafluoroborate, O-(6-chlorobenzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexa Fluorophosphate, O-(benzotriazol-1-yl)-N,N,N',N'-bis(pentamethylene)uronium hexafluorophosphate, 1-(trimethylsilyl)-1H-benzotriazole , 1-[2-(trimethylsilyl)ethoxycarbonyloxy]benzotriazole, 1-(trifluoromethanesulfonyl)-1H-benzotriazole, (trifluoroacetyl)benzotriazole, tris(1H -Benzotriazol-1-yl)methane, 9-(1H-benzotriazol-1-ylmethyl)-9H-carbazole, [(1H-benzotriazol-1-yl)methyl]triphenylphosphonium chloride , 1-(isocyanomethyl)-1H-benzotriazole, 1-[(9H-fluoren-9-ylmethoxy)carbonyloxy]benzotriazole, 1,2,3-benzotriazole sodium salt, Naphthotriazole etc. are mentioned.

As the titanium-based compound, for example, when a compound having a structure represented by general formula (II) is present on the surface of conductive particles, affinity between insulating resin and conductive particles is easily obtained, and it is easy to disperse in a solvent. It is particularly preferable from the viewpoint that the surface of the conductive particles can be treated uniformly.

(R ²¹ is a divalent or trivalent group, R ²² is an aliphatic hydrocarbon group having 2 to 30 carbon atoms, an aryl group having 6 to 22 carbon atoms, or an arylalkyl group having 7 to 23 carbon atoms, p and r are each an integer of 1 or more and 3 or less, satisfies p+r=4, q is an integer of 1 or 2, when R ²¹ is a divalent group, q is 1, and R ²¹ is a trivalent group In this case, q is 2. When q is 2, a plurality of R ²² may be the same or different. * indicates a bond.)

Examples of the aliphatic hydrocarbon group having 4 or more and 28 or less carbon atoms represented by R ²² include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, Tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, icosyl group, henicosyl group, docosyl group, etc. are mentioned. Examples of the unsaturated aliphatic hydrocarbon group include an alkenyl group, dodecenyl group, tridecenyl group, tetradecenyl group, pentadecenyl group, hexadecenyl group, heptadecenyl group, nonadecenyl group, icocenyl group, eico A cenyl group, a henicocenyl group, and a dococenyl group are mentioned. Examples of the aryl group having 6 to 22 carbon atoms include a phenyl group, a tolyl group, a naphthyl group and an anthryl group.

Examples of the arylalkyl group having 7 to 23 carbon atoms include a benzyl group, a phenethyl group, and a naphthylmethyl group.

As the hydrophobic group, a linear or branched aliphatic hydrocarbon group is particularly preferred, and a linear aliphatic hydrocarbon group is particularly preferred.

From the viewpoint of enhancing the affinity between the insulating resin and the conductive particles, the aliphatic hydrocarbon group as the hydrophobic group is more preferably 4 or more and 28 or less carbon atoms, and most preferably 6 or more and 24 or less carbon atoms.

Examples of the divalent group represented by R ²¹ include -O-, -COO-, -OCO-, and -OSO ₂ -. Examples of the trivalent group represented by R ²¹ include -P(OH)(O-) ₂ , -OPO(OH)-OPO(O-) ₂ , and the like.

In the general formula (II), * is a bond, and the bond may be bonded to the metal film of the conductive particles, or may be bonded to other groups or the like. As another group etc. in that case, a hydrocarbon group is mentioned, for example, and, specifically, a C1-C12 alkyl group is mentioned.

As a titanium-based compound having a structure represented by general formula (II), a compound having a structure in which R ²¹ in general formula (II) is a divalent group is treated without impairing availability or the electrical conductivity of conductive particles. It is desirable in that it can be done. The structure in which R ²¹ is a divalent group in the general formula (II) is represented by the following general formula (III).

(R ²¹ is a group selected from -O-, -COO-, -OCO-, and -OSO ₂ -, and p, r and R ²² are synonymous with General Formula (II).)

In the general formulas (II) and (III), r is preferably 2 or 3 from the viewpoint of increasing the adhesion between the insulating resin and the conductive layer, and most preferably r is 3.

As specific examples of the titanate-based coupling agent used in the present invention, isopropyltriisostearoyltitanate, isopropyltridodecylbenzenesulfonyltitanate, isopropyltris(dioctylpyrophosphate)titanate, tetraiso Propyl (dioctylphosphite) titanate, tetraisopropylbis (dioctylphosphite) titanate, tetraoctylbis (ditridecylphosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl ) Bis (ditridecyl) phosphite titanate, bis (dioctyl pyrophosphate) oxyacetate titanate, bis (dioctyl pyrophosphate) ethylene titanate and the like, these are one or two or more can be used

In addition, these titanate-type coupling agents are marketed from Ajinomoto Fine Techno Co., Ltd., for example.

The higher fatty acids are preferably saturated or unsaturated straight-chain or branched monocarboxylic acids, more preferably saturated or unsaturated straight-chain or branched monocarboxylic acids, and saturated or unsaturated straight-chain monocarboxylic acids. It is more preferable. A fatty acid preferably has 7 or more carbon atoms. In addition, a derivative refers to the salt or amide of the said fatty acid.

The higher fatty acid or its derivative used in the present invention has preferably 7 to 23 carbon atoms, more preferably 10 to 20 carbon atoms. Examples of such higher fatty acids or derivatives thereof include saturated fatty acids such as capric acid, lauric acid, myristic acid, palmitic acid, and stearic acid; unsaturated fatty acids such as oleic acid, linoleic acid, linolenic acid, and arachidonic acid; A metal salt or an amide etc. are mentioned. Examples of metal salts of higher fatty acids include salts of alkali metals, alkaline earth metals, transition metals such as Zr, Cr, Mn, Fe, Co, Ni, Cu, and Ag, and metals other than transition metals such as Al and Zn. and preferably polyvalent metal salts such as Al, Zn, W, and V. The higher fatty acid metal salt may be a mono-, di-, tri-, or tetra-type, depending on the valency of the metal. The higher fatty acid metal salt may be any combination thereof.

As the phosphoric acid ester and the phosphorous acid ester, those having an alkyl group having 6 to 22 carbon atoms are preferably used.

As phosphoric acid ester, for example, hexyl phosphate ester, heptyl phosphate ester, monooctyl phosphate ester, monononyl phosphate ester, monodecyl phosphate ester, monoundecyl phosphate ester, monododecyl phosphate, monotridecyl phosphate ester, phosphoric acid Monotetradecyl ester, phosphoric acid monopentadecyl ester, etc. are mentioned.

Examples of the phosphite ester include hexyl ester of phosphite, heptyl ester of phosphite, monooctyl ester of phosphite, monononyl ester of phosphite, monodecyl ester of phosphite, monodecyl ester of phosphite, monododecyl ester of phosphite, and monotridecyl ester of phosphite. , phosphorous acid monotetradecyl ester, phosphorous acid monopentadecyl ester, and the like.

In the present invention, the surface treatment agent is preferably a triazole-based compound or a titanium-based compound, particularly benzotriazole, from the viewpoint of having excellent affinity with the insulating resin and a high effect of increasing the coverage of the insulating resin; 4-Carboxybenzotriazole, isopropyl triisostearoyl titanate, and tetraisopropyl (dioctylphosphite) titanate are particularly preferred.

The method of treating electroconductive particle with a surface treatment agent is obtained by filtering after disperse|distributing electroconductive particle in the solution of a surface treatment agent. Before the treatment with the surface treatment agent, the conductive particles may be treated with another treatment agent or untreated.

The concentration of the surface treatment agent in the solution of the surface treatment agent for dispersing the conductive particles (solution containing the conductive particles) is 0.01% by mass or more and 10.0% by mass or less. In addition, the solvent in the solution of the surface treatment agent is alcohol such as water, methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, isobutyl alcohol, isopentyl alcohol, cyclohexanol, Ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, methyl-n-butyl ketone, esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether and ethylene glycol monoethyl ether, normal hexane, Cyclohexanone, toluene, 1,4-dioxane, N,N-dimethylformamide, tetrahydrofuran, etc. are mentioned. It is preferable to disperse|distribute the electroconductive particle after surface treatment after dispersion|distribution and filtration in a solvent again, and to remove excess surface treatment agent.

The surface treatment by the surface treatment agent of electroconductive particle can be processed by mixing electroconductive particle, a surface treatment agent, and a solvent at room temperature. Alternatively, after mixing the conductive particles and the surface treatment agent in a solvent, the reaction may be promoted by heating. As for heating temperature, 30 degreeC or more and 50 degreeC or less are mentioned, for example.

Since the conductive particles of the present invention have low connection resistance, they are used, for example, as a conductive material for connecting an anisotropic conductive film (ACF), a heat seal connector (HSC), or an electrode of a liquid crystal display panel to a circuit board of an LSI chip for driving. used appropriately. As the said conductive material, use as it is of the conductive particle of this invention, or what is made by dispersing the conductive particle of this invention in binder resin is mentioned. Other forms of the conductive material are not particularly limited, and forms other than those described above include, for example, anisotropic conductive paste, conductive adhesive, and anisotropic conductive ink.

As said binder resin, a thermoplastic resin or a thermosetting resin is mentioned. Examples of the thermoplastic resin include acrylic resins, styrene resins, ethylene-vinyl acetate resins, and styrene-butadiene block copolymers. Examples of the thermosetting resins include epoxy resins, phenol resins, urea resins, poly Ester resin, urethane resin, polyimide resin, etc. are mentioned.

The conductive material, in addition to the conductive particles and the binder resin of the present invention, as necessary, a tackifier, a reactive auxiliary agent, an epoxy resin curing agent, a metal oxide, a photoinitiator, a sensitizer, a curing agent, a vulcanizing agent, a deterioration inhibitor, a heat resistant additive, and a thermal conductivity Enhancers, softeners, colorants, various coupling agents or metal deactivators may be incorporated.

In the above conductive material, the amount of conductive particles used may be appropriately determined depending on the application, but from the viewpoint of making it easy to obtain electrical conduction without contact between the conductive particles, for example, 0.01 part by mass or more with respect to 100 parts by mass of the conductive material. It is preferably 50 parts by mass or less, particularly preferably 0.03 parts by mass or more and 40 parts by mass or less.

The conductive particles of the present invention are particularly suitably used as conductive fillers for conductive adhesives among the forms of the conductive materials described above.

The above-described conductive adhesive is preferably used as an anisotropic conductive adhesive that is disposed between two substrates on which a conductive substrate is formed and adheres the conductive substrate to conduction by heating and pressing. This anisotropic conductive adhesive contains the conductive particle of this invention and adhesive resin. As the adhesive resin, as long as it is insulating and is used as an adhesive resin, it can be used without particular limitation. Any of a thermoplastic resin and a thermosetting resin may be used, and it is preferable that adhesive performance is developed by heating. Such an adhesive resin includes, for example, a thermoplastic type, a thermosetting type, and an ultraviolet curing type. In addition, there is a so-called semi-thermosetting type, a composite type of a thermosetting type and an ultraviolet curing type, etc., which exhibit intermediate properties between the thermoplastic type and the thermosetting type. These adhesive resins can be appropriately selected according to the surface characteristics of the circuit board or the like to be adhered and the form of use. In particular, an adhesive resin composed of a thermosetting resin is preferable in terms of excellent material strength after bonding.

As the adhesive resin, specifically, ethylene-vinyl acetate copolymer, carboxyl-modified ethylene-vinyl acetate copolymer, ethylene-isobutyl acrylate copolymer, polyamide, polyimide, polyester, polyvinyl ether, polyvinylbuty Ral, polyurethane, SBS block copolymer, carboxyl-modified SBS copolymer, SIS copolymer, SEBS copolymer, maleic acid-modified SEBS copolymer, polybutadiene rubber, chloroprene rubber, carboxyl-modified chloroprene rubber, styrene-butadiene rubber, Selected from isobutylene-isoprene copolymer, acrylonitrile-butadiene rubber (hereinafter referred to as NBR), carboxyl-modified NBR, amine-modified NBR, epoxy resin, epoxy ester resin, acrylic resin, phenol resin, or silicone resin. What was prepared with the main thing obtained by 1 type or a combination of 2 or more types is mentioned. Among these, as a thermoplastic resin, styrene-butadiene rubber, SEBS, etc. are preferable since they are excellent in reworkability. As a thermosetting resin, an epoxy resin is preferable. Among these, epoxy resins are most preferred because of their high adhesive strength, excellent heat resistance and electrical insulation properties, and low melt viscosity, enabling connection at low pressure.

As the above-described epoxy resin, a generally used epoxy resin can be used as long as it is a polyhydric epoxy resin having two or more epoxy groups in one molecule. Specifically, novolak resins such as phenol novolak and cresol novolac, polyhydric phenols such as bisphenol A, bisphenol F, bisphenol AD, resorcin, and bishydroxydiphenyl ether, ethylene glycol, neopentyl glycol, glycerin, and trimethyl Polyhydric alcohols such as allpropane and polypropylene glycol, polyamino compounds such as ethylenediamine, triethylenetetramine and aniline, polyhydric carboxylic compounds such as adipic acid, phthalic acid and isophthalic acid, etc. A glycidyl-type epoxy resin obtained by reacting chlorohydrin is exemplified. Moreover, aliphatic and alicyclic epoxy resins, such as dicyclopentadiene epoxide and a butadiene dimer diepoxide, etc. are mentioned. These can be used individually by 1 type or in mixture of 2 or more types.

In addition, as the various adhesive resins described above, it is preferable to use a high-purity product in which impurity ions (such as Na or Cl) and hydrolyzable chlorine are reduced from the viewpoint of preventing ion migration.

The amount of conductive particles used in the anisotropic conductive adhesive is usually 0.1 to 30 parts by mass, preferably 0.5 to 25 parts by mass, and more preferably 1 to 20 parts by mass, based on 100 parts by mass of the adhesive resin component. When the usage-amount of electroconductive particle exists in this range, it is suppressed that connection resistance and melt viscosity become high, connection reliability is improved, and connection anisotropy can fully be ensured.

In addition to the above-mentioned conductive particles and adhesive resin, additives known in the art can be blended with the anisotropic conductive adhesive described above. The blending amount can also be within a range known in the art. Examples of other additives include tackifiers, reactive auxiliary agents, epoxy resin curing agents, metal oxides, photoinitiators, sensitizers, curing agents, vulcanizing agents, deterioration inhibitors, heat resistance additives, thermal conductivity improvers, softeners, colorants, various coupling agents or metals. An inactive agent etc. can be illustrated.

Examples of the tackifier include rosin, rosin derivatives, terpene resins, terpene phenol resins, petroleum resins, coumarone-indene resins, styrene-based resins, isoprene-based resins, alkylphenol resins, and xylene resins. Examples of the reactive auxiliary agent, that is, the crosslinking agent, include polyols, isocyanates, melamine resins, urea resins, utropins, amines, acid anhydrides, and peroxides. As the epoxy resin curing agent, any one having two or more active hydrogens per minute can be used without particular limitation. Specific examples thereof include polyamino compounds such as diethylenetriamine, triethylenetetramine, metaphenylenediamine, dicyandiamide, and polyamideamine; organic acid anhydrides such as phthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride, and pyromellitic anhydride; Novolak resins, such as a phenol novolak and a cresol novolak, etc. are mentioned. These can be used individually by 1 type or in mixture of 2 or more types. Moreover, you may use a latent hardener as needed. Examples of the latent curing agent that can be used include imidazole-based, hydrazide-based, boron trifluoride-amine complexes, sulfonium salts, amineimides, salts of polyamines, dicyandiamide, and the like, and modified products thereof. there is. These can be used individually by 1 type or in mixture of 2 or more types.

The above anisotropic conductive adhesive is manufactured using a manufacturing apparatus commonly used in the art. For example, conductive particles and an adhesive resin and, if necessary, a curing agent or various additives are mixed, and when the adhesive resin is a thermosetting resin, by mixing in an organic solvent, in the case of a thermoplastic resin, at a temperature equal to or higher than the softening point of the adhesive resin, specifically is preferably prepared by melt kneading at about 50 to 130°C, more preferably about 60 to 110°C. The anisotropic conductive adhesive obtained in this way may be applied or may be applied in the form of a film.

The connection structure according to the present invention is obtained by connecting two circuit boards using the conductive particles according to the present invention or the conductive material according to the present invention. As a form of the said connection structure, the connection structure of a flexible printed circuit board and a glass substrate, the connection structure of a semiconductor chip and a flexible printed board, the connection structure of a semiconductor chip and a glass substrate, etc. are mentioned, for example.

Example

Hereinafter, the present invention will be further explained by examples. However, the scope of the present invention is not limited to these examples.

The properties in the examples were measured by the following methods.

(1) Elemental analysis of the surface of the conductive layer

The atomic percentages of carbon, oxygen, phosphorus, boron, and nickel within 5 nm in the depth direction from the surface of the conductive particles were calculated using a scanning type Auger electron spectroscopic analyzer (PHI710, manufactured by Woolbek-Pi Co., Ltd.).

(2) Ion analysis on the surface of the conductive layer

Using a time-of-flight secondary ion mass spectrometer (TOF-SIMS5 type manufactured by ION-TOF), conductive particles are uniformly and flatly spread on a substrate, and a primary ion source is applied to a 200 μm square around the center thereof. Bi ³⁺ , under the condition of an accelerating voltage of 30 kV, cations derived from amine compounds ⁽ CH ₄ N ⁺ : Phosphoric acid compound for count intensity of organic acid-derived anion (C ₂ H ₃ O ₂ ^- : mass number 59.01) and Ni anion (Ni ^- : mass number 57.94) for count intensity of Ni anion (mass number 57.94) anion derived from a boric acid compound (PO ₂ ^- : mass number 62.96), and anion derived from a boric acid compound relative to the count intensity of anion of Ni ^- (B ₂ O ₄ H ₃ ^- : mass number 89.02 and B ₃ O ₆ H ₄ ^- : mass number 133.03) was measured.

(3) Average particle diameter

From a scanning electron microscope (SEM) photograph of the measuring object, 200 particles were arbitrarily extracted, and the particle diameter was measured at a magnification of 10,000, and the arithmetic average value thereof was taken as the average particle diameter.

(4) thickness of conductive layer

The conductive particles were cut into two pieces, and the cross section of the cut portion was observed and measured with a scanning electron microscope (SEM).

[Example 1]

(1) Pretreatment

Spherical styrene-acrylate-silica composite resin particles having an average particle diameter of 3.0 µm were used as core material particles. 9 g of this was injected into 200 mL of an aqueous conditioner solution ("Cleaner Conditioner 231" manufactured by Rohm and Haas Denshi Gyryo) while stirring. The concentration of the conditioner aqueous solution was 40 mL/L. Subsequently, it was stirred for 30 minutes at a liquid temperature of 60°C while applying ultrasonic waves to perform surface modification and dispersion treatment of the core material particles. This aqueous solution was filtered, and the core material particles repulped and washed once with water were used as a slurry of 200 mL. To this slurry was added 0.1 g of stannous chloride. The mixture was stirred at room temperature for 5 minutes to perform a sensitization treatment in which tin ions were adsorbed on the surface of the core material particles. Subsequently, this aqueous solution was filtered, and the core material particles repulped and washed once with water were used as a slurry of 200 mL, which was maintained at 60°C. 1.5 mL of 0.11 mol/L palladium chloride aqueous solution was added to this slurry. The mixture was stirred at 60°C for 5 minutes, and an activation treatment was performed to trap palladium ions on the surface of the core material particles. Subsequently, this aqueous solution was filtered, and the core material particles subjected to repulping and washed once were made into a slurry of 100 mL, 10 mL of 0.5 g/L dimethylamine borane aqueous solution was added, and stirred for 2 minutes while applying ultrasonic waves to pretreated core material particles of slurry was obtained.

(2) Preparation of plating bath

Electroless nickel-containing aqueous solution containing 5 g/L sodium tartrate, 2 g/L nickel sulfate hexahydrate, 10 g/L trisodium citrate, 0.1 g/L sodium hypophosphite, and 2 g/L polyethylene glycol 3 L of a phosphorus plating bath was prepared and heated to 70°C.

(3) Electroless plating treatment

Into this electroless plating bath, the slurry of the pretreated core material particles was introduced and stirred for 5 minutes, confirming that hydrogen effervescence stopped.

To this slurry, 420 mL of a 224 g/L nickel sulfate aqueous solution and 420 mL of a mixed aqueous solution containing 210 g/L sodium hypophosphite and 80 g/L sodium hydroxide were added at a rate of 2.5 mL/min by a metering pump. The fractional addition was continuously carried out, and electroless plating was started.

After adding the nickel sulfate aqueous solution and the mixed aqueous solution of sodium hypophosphite and sodium hydroxide respectively in whole amounts, stirring was continued for 5 minutes, maintaining the temperature of 70 degreeC. Then, the liquid was filtered, and after washing the filtrate three times, it was dried with a vacuum dryer at 110°C to obtain conductive particles having a nickel-phosphorus alloy coating. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion.

(4) vacuum heat treatment

The obtained conductive particles were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a vacuum heating furnace (KDF-75, manufactured by Denken Heidental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under a vacuum of 10 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Example 2]

(4) Vacuum heat treatment in Example 1 was performed by the following operation. The electroconductive particles obtained by the (3) electroless plating treatment of Example 1 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Heidental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under a vacuum of 100 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Example 3]

(4) Vacuum heat treatment in Example 1 was performed by the following operation. The electroconductive particles obtained by the (3) electroless plating treatment of Example 1 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 320°C for 2 hours under a vacuum of 10 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Comparative Example 1]

The conductive particles obtained by the (3) electroless plating treatment of Example 1 were used as the conductive particles of Comparative Example 1. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Comparative Example 2]

Instead of (4) vacuum heat treatment in Example 1, the following operation was performed. The electroconductive particles obtained by the (3) electroless plating treatment of Example 1 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 260° C. for 2 hours under normal pressure in a nitrogen atmosphere. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Comparative Example 3]

Instead of (4) vacuum heat treatment in Example 1, the following operation was performed. The electroconductive particles obtained by the (3) electroless plating treatment of Example 1 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under normal pressure in a nitrogen atmosphere. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Example 4]

(1) Pretreatment

Spherical styrene-acrylate-silica composite resin particles having an average particle diameter of 3.0 µm were used as core material particles. 9 g of this was injected into 200 mL of an aqueous conditioner solution ("Cleaner Conditioner 231" manufactured by Rohm and Haas Denshi Gyryo) while stirring. The concentration of the conditioner aqueous solution was 40 mL/L. Subsequently, it was stirred for 30 minutes at a liquid temperature of 60°C while applying ultrasonic waves to perform surface modification and dispersion treatment of the core material particles. This aqueous solution was filtered, and the core material particles repulped and washed once with water were used as a slurry of 200 mL. To this slurry was added 0.1 g of stannous chloride. The mixture was stirred at room temperature for 5 minutes to perform a sensitization treatment in which tin ions were adsorbed on the surface of the core material particles. Subsequently, this aqueous solution was filtered, and the core material particles repulped and washed once with water were used as a slurry of 200 mL, which was maintained at 60°C. 1.5 mL of 0.11 mol/L palladium chloride aqueous solution was added to this slurry. The mixture was stirred at 60°C for 5 minutes, and an activation treatment was performed to trap palladium ions on the surface of the core material particles. Subsequently, this aqueous solution was filtered, and the core material particles subjected to repulping and washed once were made into a slurry of 100 mL, 10 mL of 0.5 g/L dimethylamine borane aqueous solution was added, and stirred for 2 minutes while applying ultrasonic waves to pretreated core material particles of slurry was obtained.

(2) Preparation of plating bath

Electroless nickel-containing aqueous solution containing 5 g/L sodium tartrate, 2 g/L nickel sulfate hexahydrate, 10 g/L trisodium citrate, 0.1 g/L dimethylamine borane, and 2 g/L polyethylene glycol A boron plating bath of 3 L was prepared and heated to 70°C.

(3) Electroless plating treatment

Into this electroless plating bath, the slurry of the pretreated core material particles was introduced and stirred for 5 minutes, confirming that hydrogen effervescence stopped.

To this slurry, 420 mL of a 224 g/L nickel sulfate aqueous solution and 420 mL of a mixed aqueous solution containing 120 g/L dimethylamine borane and 80 g/L sodium hydroxide were added at a rate of 2.5 mL/min by a metering pump. The fractional addition was continuously carried out, and electroless plating was started.

After adding the nickel sulfate aqueous solution and the mixed aqueous solution of dimethylamine borane and sodium hydroxide in each of the entire amounts, stirring was continued for 5 minutes while maintaining the temperature at 70°C. Then, the liquid was filtered, and after washing the filtrate three times, it was dried with a vacuum dryer at 110°C to obtain conductive particles having a nickel-boron alloy coating. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion.

(4) vacuum heat treatment

The obtained conductive particles were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a vacuum heating furnace (KDF-75, manufactured by Denken Heidental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under a vacuum of 10 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 1, and the ion analysis results are shown in Table 2.

[Example 5]

(4) Vacuum heat treatment in Example 4 was performed by the following operation. The electroconductive particles obtained by the (3) electroless plating treatment of Example 4 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Heidental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under a vacuum of 100 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 3, and the ion analysis results are shown in Table 4.

[Example 6]

(4) Vacuum heat treatment in Example 4 was performed by the following operation. The electroconductive particles obtained by the (3) electroless plating treatment of Example 4 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 320°C for 2 hours under a vacuum of 10 Pa. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 3, and the ion analysis results are shown in Table 4.

[Comparative Example 4]

The conductive particles obtained in the (3) electroless plating treatment of Example 4 were used as the conductive particles of Comparative Example 4. The elemental analysis results of the surface of the conductive layer are shown in Table 3, and the ion analysis results are shown in Table 4.

[Comparative Example 5]

Instead of (4) vacuum heat treatment in Example 4, the following operation was performed. The electroconductive particles obtained by the (3) electroless plating treatment of Example 4 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 260° C. for 2 hours under normal pressure in a nitrogen atmosphere. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 3, and the ion analysis results are shown in Table 4.

[Comparative Example 6]

Instead of (4) vacuum heat treatment in Example 4, the following operation was performed. The electroconductive particles obtained by the (3) electroless plating treatment of Example 4 were placed in a rectangular container so as to have a thickness of 5 mm. This was put into a heating furnace (KDF-75, manufactured by Denken Hedental Co., Ltd.), and heat treatment was performed at 390°C for 2 hours under normal pressure in a nitrogen atmosphere. After the heat treatment, it was allowed to cool to room temperature to obtain heat-treated conductive particles. The average particle diameter of the obtained electroconductive particle was 3.22 micrometers, and the thickness of the conductive layer was 110 nm, and had a processus|protrusion. The elemental analysis results of the surface of the conductive layer are shown in Table 3, and the ion analysis results are shown in Table 4.

[Evaluation of storage stability and corrosion resistance]

(1) Storage stability and corrosion resistance of conductive particles

Using the conductive particles of Examples and Comparative Examples, the storage stability and corrosion resistance of the conductive particles were evaluated by the following method.

After storing the conductive particles obtained in Examples and Comparative Examples under room temperature (25°C/50% RH) for the time shown in Table 2, 1.0 g of the conductive particles were placed in a resin cylinder with an inner diameter of 10 mm standing upright. , The volume resistance value between the upper and lower electrodes was determined under room temperature (25° C. 50% RH) and with a load of 2 kN applied. The results are shown in Table 5.

From this result, it can be seen that the conductive particles obtained in Examples have less increase in volume resistivity than the conductive particles obtained in Comparative Examples, and are excellent in storage stability and corrosion resistance.

(2) Storage stability of conductive materials

Using the conductive particles of Examples and Comparative Examples, conductive materials were produced by the following method, and storage stability of the conductive materials was evaluated by a pressure cooker test.

A paste was obtained by mixing an insulating adhesive obtained by mixing 100 parts by mass of an epoxy resin, 150 parts by mass of a curing agent, and 70 parts by mass of toluene, and 15 parts by mass of conductive particles obtained in Examples and Comparative Examples. This paste was applied on a silicone-treated polyester film using a bar coater, and then the paste was dried to form a thin film on the film. The obtained thin film forming film is disposed between a glass substrate on which aluminum is deposited on the entire surface and a polyimide film substrate on which a copper pattern is formed at a pitch of 50 μm to form a bonded structure to perform electrical connection, and the connection resistance of the bonded structure The value was measured under room temperature (25°C/50% RH). Then, a pressure cooker test was conducted in which the above-mentioned bonded structure was arranged in an airtight container and treated for 10 hours in an environment of a temperature of 121° C., a relative humidity of 100%, and a pressure of 2 atmospheres. After the pressure cooker test, the connection resistance value of the bonded structure was measured under room temperature (25°C/50% RH). It can be evaluated that the storage stability of the conductive material is so high that the difference between the connection resistance values before and after the pressure cooker test is small. The results are shown in Table 6.

From these results, it can be seen that the conductive material obtained in Examples has a smaller difference in connection resistance values before and after the pressure cooker test and excellent storage stability compared to the conductive materials obtained in Comparative Examples.

[Evaluation of connection resistance and connection reliability]

Evaluation of connection resistance and connection reliability was performed by the following method using the electroconductive particle of an Example and a comparative example.

1.0 g of conductive particles obtained in Examples and Comparative Examples were placed in a resin cylinder with an inner diameter of 10 mm standing upright, and the electrical resistance between the upper and lower electrodes was measured under room temperature (25 ° C. 50% RH) in a state where a load of 2 kN was applied. measured, and the initial volume resistance value was obtained. It can be evaluated that the oxide film currently formed in the electrode can be removed effectively, so that the initial volume resistance value is low, and the connection resistance of electroconductive particle is low.

In addition, the resistance value after holding for 24 hours under conditions of 85°C and 85% RH was also measured. It can evaluate that connection reliability of electroconductive particle is so excellent that a difference with connection resistance value in room temperature is small. The results are shown in Table 7.

From this result, compared with the electroconductive particle obtained by the comparative example, the electroconductive particle obtained by the Example has a low initial volume resistance value, and it turns out that connection resistance is low. Moreover, compared with the electroconductive particle obtained by the comparative example, the electroconductive particle obtained by the Example has a small difference between the initial volume resistance value and the resistance value after 24 hours at 85 degreeC/85%RH, and it turns out that connection reliability is high. In particular, comparing the conductive particles obtained in Examples 1 and 2 in which the nickel-phosphorus plating layer was formed and the conductive particles obtained in Comparative Example 3, by heating under vacuum, conductive particles having low connection resistance and excellent connection reliability were obtained. load can be known. Further, comparing the conductive particles obtained in Examples 4 and 5 in which the nickel-boron plating layer was formed with the conductive particles obtained in Comparative Example 6, by heating under vacuum, conductive particles having low connection resistance and excellent connection reliability were obtained. load can be known.

Claims (10)

In the conductive particle formed by forming a nickel plating layer as a conductive layer on the surface of the core material particle,
The molar ratio of carbon to the total of nickel and phosphorus within 5 nm in the depth direction from the surface of the conductive layer (C/(Ni+P)) or the total of nickel and boron, as measured by a scanning Auger electron spectrometer The molar ratio of carbon to (C/(Ni+B)) is 0.0002 or more and 1.65 or less, the molar ratio of oxygen to the sum of nickel and phosphorus (O/(Ni+P)), or the molar ratio of oxygen to the sum of nickel and boron Electroconductive particle whose molar ratio (O/(Ni+B)) is 0.0001 or more and 2.0 or less, and the molar ratio of phosphorus to nickel (P/Ni) or the molar ratio of boron to nickel (B/Ni) is 0.003 or more and 0.7 or less. In the conductive particle formed by forming a nickel plating layer as a conductive layer on the surface of the core material particle,
CH ₄ N ⁺ cation count intensity relative to Ni ⁺ cation count intensity within 1 nm in the depth direction from the surface of the conductive layer, as measured by a time-of-flight secondary ion mass spectrometer (TOF-SIMS) (CH ₄ N ⁺ /Ni ⁺ ) is 0.1 or less, or the count intensity of the anion of C ₂ H ₃ O ₂ ^- relative to the count intensity of the anion of Ni ^- (C ₂ H ₃ O ₂ ^- /Ni ^- ) is 10.0 or less , or the count intensity of the anion of PO ₂ ^- relative to the count intensity of the anion of Ni ^- (PO ₂ ^- /Ni ^- ) is 10.0 or less, or the count intensity of the anion of Ni ^- is B ₂ O ₄ H ₃ ^- and B ₃ O ₆ H ₄ ^- Anion count intensity ((B ₂ O ₄ H ₃ ^- +B ₃ O ₆ H ₄ ^- )/Ni ^- ) of conductive particles of 10.0 or less. Electroconductive particle of Claim 1 or 2 whose thickness of the said conductive layer is 5 nm or more and 2000 nm or less. The electroconductive particle of any one of Claims 1-3 whose average particle diameter is 0.1 micrometer or more and 50 micrometer or less. The electroconductive particle of any one of Claims 1-4 which has a processus|protrusion on the outer surface of the said conductive layer. Electroconductive particle according to any one of claims 1 to 4, wherein the outer surface of the conductive layer is smooth. An electroconductive material containing the electroconductive particle of any one of Claims 1-6 and binder resin. A connection structure in which members to be connected are connected to each other through the conductive material according to claim 7. The manufacturing method of the electroconductive particle of any one of Claims 1-6 which has the process of heating the electroconductive particle which has a conductive layer on the surface of a core material particle at a temperature of 200-600 degreeC under the vacuum of 1000 Pa or less. The method for producing conductive particles according to claim 9, wherein the conductive particles obtained by forming the conductive layer on the surface of the core material particles by an electroless plating method are heated.

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