KR20230005326A - 다공성 전극을 제조하기 위한 방법 및 그러한 전극을 포함하는 마이크로배터리 - Google Patents

다공성 전극을 제조하기 위한 방법 및 그러한 전극을 포함하는 마이크로배터리 Download PDF

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KR20230005326A
KR20230005326A KR1020227041806A KR20227041806A KR20230005326A KR 20230005326 A KR20230005326 A KR 20230005326A KR 1020227041806 A KR1020227041806 A KR 1020227041806A KR 20227041806 A KR20227041806 A KR 20227041806A KR 20230005326 A KR20230005326 A KR 20230005326A
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layer
electrode
substrate
porous
coating
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파비앙 갸벵
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이-뗀
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    • H—ELECTRICITY
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    • H01M4/0402—Methods of deposition of the material
    • H01M4/0404—Methods of deposition of the material by coating on electrode collectors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
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    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
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    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
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KR1020227041806A 2020-04-28 2021-04-28 다공성 전극을 제조하기 위한 방법 및 그러한 전극을 포함하는 마이크로배터리 Pending KR20230005326A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR2004187A FR3109672B1 (fr) 2020-04-28 2020-04-28 Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode
FR2004187 2020-04-28
PCT/IB2021/053497 WO2021220174A1 (fr) 2020-04-28 2021-04-28 Procédé de fabrication d'une électrode poreuse, et microbatterie contenant une telle électrode

Publications (1)

Publication Number Publication Date
KR20230005326A true KR20230005326A (ko) 2023-01-09

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KR1020227041806A Pending KR20230005326A (ko) 2020-04-28 2021-04-28 다공성 전극을 제조하기 위한 방법 및 그러한 전극을 포함하는 마이크로배터리

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Country Link
US (1) US20230238502A1 (https=)
EP (1) EP4143899A1 (https=)
JP (1) JP2023523339A (https=)
KR (1) KR20230005326A (https=)
CN (1) CN115997296A (https=)
CA (1) CA3174836A1 (https=)
FR (1) FR3109672B1 (https=)
IL (1) IL296894A (https=)
WO (1) WO2021220174A1 (https=)

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KR20240128033A (ko) 2021-12-23 2024-08-23 이-뗀 다공성 전극의 제조방법 및 이러한 전극을 포함하는 배터리
FR3131449B1 (fr) 2021-12-23 2023-12-22 I Ten Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode
FR3131450B1 (fr) 2021-12-23 2025-05-02 Hfg Procede de fabrication d’une electrode poreuse, et batterie contenant une telle electrode
FR3150644B1 (fr) 2023-06-28 2026-04-24 I Ten Procede de fabrication d’une electrode poreuse, et batterie contenant une telle electrode
FR3150645A1 (fr) 2023-06-28 2025-01-03 I-Ten Procede de fabrication d’une electrode poreuse, et batterie contenant une telle electrode
FR3160967B1 (fr) 2024-04-04 2026-04-03 I Ten Oxyde mixte de titane, niobium et lanthane, matériau d’anode, anode comprenant ce matériau et batterie comprenant cette anode
CN120717448B (zh) * 2025-08-18 2025-11-04 河北科技大学 一种闭孔硬碳材料及其制备方法和应用

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AU5731400A (en) * 1999-06-09 2000-12-28 Moltech Corporation Methods of preparing electrochemical cells
CA2320661A1 (fr) * 2000-09-26 2002-03-26 Hydro-Quebec Nouveau procede de synthese de materiaux limpo4 a structure olivine
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IL296894A (en) 2022-12-01
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TW202147669A (zh) 2021-12-16
FR3109672A1 (fr) 2021-10-29
CA3174836A1 (fr) 2021-11-04
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