KR20220124620A - Liquid supply apparatus, coating apparatus, aging apparatus, and liquid supply method - Google Patents

Abstract

Provided is a technique for properly grasping the service life or a degree of aging of a filter to be applied to filtration of a treatment liquid having high viscosity. A liquid supply unit (10) is a device for supplying a treatment liquid of high viscosity. The liquid supply unit (10) includes: a supply tank (11); a liquid supply port (19); a first liquid supply pipeline (12) and a second liquid supply pipeline (14); a pressurizing mechanism (15); a second filter (F2); and a measurement module (174). In the liquid supply unit (10), a treatment liquid of high viscosity can be retained. The liquid supply port (19) supplies a treatment liquid to a supply destination. The first liquid supply pipeline (12) and the second liquid supply pipeline (14) connect the supply tank (11) to the liquid supply port (19). The pressurizing mechanism (15) feeds the treatment liquid from the supply tank (11) toward the liquid supply port (19). The second filter (F2) is arranged in the second liquid supply pipeline (14) and filters the treatment liquid. The measurement module (174) measures the amount of particles in the treatment liquid having passed the second filter (F2), at a position on a downstream side rather than the second filter (F2).

Description

Liquid supply apparatus, applicator, aging apparatus, and liquid supply method

The present invention relates to a liquid supply apparatus, an application apparatus, an aging apparatus, and a liquid supply method.

Conventionally, glass substrates for liquid crystal display devices, semiconductor substrates, glass substrates for PDPs, glass substrates for photomasks, substrates for color filters, substrates for recording disks, substrates for solar cells, substrates for precision electronic devices such as substrates for electronic paper, rectangles In the manufacturing process of a glass substrate, the flexible board|substrate for film liquid crystals, and the board|substrate for organic electroluminescent (henceforth simply a "substrate"), the coating apparatus which apply|coats liquids, such as a photoresist, to the surface of a board|substrate is used. About the conventional coating apparatus, it describes in patent document 1, for example. The coating apparatus of patent document 1 discharges the coating liquid from the slit die which has a slit-shaped discharge port with respect to the board|substrate adsorbed and held by the stage which is movable in a horizontal direction.

Japanese Patent Laid-Open No. 2017-23990

In this type of coating device, before discharging and applying the processing liquid, a filter for removing foreign substances contained in the coating liquid may be used. Since it is difficult to specify an appropriate replacement time for the filter for filtering the high-viscosity treatment liquid, the filter is replaced, for example, during use time or when the total flow rate reaches a constant value. For this reason, when the service period of a filter is shorter than the original life, the cost of a filter will become relatively high. Moreover, when the usage time of a filter was longer than the original life, since a process liquid could not be fully purified, there existed a possibility that application|coating failure may generate|occur|produce. Accordingly, there is a demand for a technology capable of easily grasping the lifespan of a filter.

In addition, a new filter is generally previously washed with a washing|cleaning liquid. However, when a treatment liquid having a higher viscosity than the cleaning liquid is passed through the filter of the cleaning agent, dust (particles) may be separated from the filter. For this reason, so-called aging in which a high-viscosity processing liquid flows through the filter may be performed. However, since it is not easy to ascertain whether the filter is in a state suitable for filtration of the high-viscosity treatment liquid, the aging is completed at a stage in which the aging is performed for a certain period of time. Therefore, when the time of aging was not enough, when a filter was applied to the coating apparatus, the dust which detach|departed from a filter mixes in the process liquid, and there exists a possibility that coating failure may arise. Therefore, there is a demand for a technique capable of easily grasping the degree of aging of the filter.

It is an object of the present invention to provide a technique that can appropriately grasp the lifespan of a filter or the degree of aging of a filter applied to filtration of a high-viscosity treatment liquid.

In order to solve the above problem, a first aspect is a liquid supply device for supplying a processing liquid, a tank capable of storing a high-viscosity processing liquid, a liquid supply port for supplying the processing liquid, and a liquid supply connecting the tank and the liquid supply port (送液) a pipe, a liquid-sending part for sending the processing liquid from the tank toward the liquid supply port through the liquid-supplying piping, and a filter disposed in the liquid-supplying piping for filtering the processing liquid; A measuring unit for measuring the amount of particles in the processing liquid that has passed through the filter is provided at a position on the side.

A second aspect is the liquid supply device of the first aspect, further comprising: a measuring pipe connected to the liquid feeding pipe at a position downstream from the filter in the liquid feeding pipe, and wherein the measuring unit includes the measuring pipe The amount of particles in the treatment liquid in the inside is measured.

A third aspect is the liquid supply device of the second aspect, further comprising an on/off valve for turning on/off the flow of the processing liquid from the liquid supply pipe to the measurement pipe.

A fourth aspect is the liquid supply device according to the second or third aspect, wherein an inner area of the measurement pipe is smaller than an inner area of the liquid feed pipe.

A fifth aspect is the liquid supply device according to any one of the second to fourth aspects, further comprising a liquid delivery pump disposed in the liquid delivery pipe and pressure-feeding the processing liquid.

A sixth aspect is the liquid supply device of the fifth aspect, wherein the measurement pipe is connected to the liquid feed pipe at a position downstream from the liquid feed pump in the liquid feed pipe.

A seventh aspect is the liquid supply apparatus of the fifth aspect, wherein the measurement pipe is connected to the liquid feed pipe at a position upstream of the liquid feed pump in the liquid feed pipe.

An eighth aspect is the liquid supply apparatus according to any one of the second to seventh aspects, further comprising a degassing module disposed on an upstream side of the measurement unit to degas the treatment liquid.

A ninth aspect is the liquid supply apparatus of the eighth aspect, wherein the deaeration module is disposed in the measurement pipe.

A tenth aspect is the liquid supply device according to any one of the first to ninth aspects, comprising: a determination unit which determines the state of the filter based on the amount of particles measured by the measurement unit; and a determination result output by the determination unit; An output unit for outputting to the outside is further provided.

An eleventh aspect is an applicator for applying a treatment liquid to a target, comprising the supply device according to any one of the first to tenth aspects, and a nozzle for discharging the treatment liquid supplied from the liquid supply port of the supply device. do.

A twelfth aspect is an aging apparatus for treating a filter with a treatment liquid having a high viscosity, a first tank capable of storing the treatment liquid, a second tank capable of storing the treatment liquid, and the first tank and the second tank in parallel a first liquid supply pipe and a second liquid supply pipe connected to each other; a first liquid supply unit for supplying liquid from the first tank to the second tank through the first liquid supply pipe; and a second liquid supply pipe through the second liquid supply pipe a second liquid supply unit for supplying liquid from the tank to the first tank; a control unit for alternately operating the first liquid supply unit and the second liquid supply unit; and a filter mounting unit for mounting a filter to filter the processing liquid flowing through the first liquid supply pipe. and a measuring unit for measuring the amount of particles in the treatment liquid that has passed through the filter.

A thirteenth aspect is a liquid supply method for supplying a high-viscosity treatment liquid to a supplier, comprising: a) sending the treatment liquid in a tank to the supplier; b) the treatment liquid sent from the tank to the supplier by the step a); A step of filtration with a filter;

According to the liquid supply device of the first aspect, the life of the filter or the degree of aging of the filter can be easily grasped based on the amount of particles contained in the processing liquid that has passed through the filter.

According to the liquid supply device of the second aspect, since it is provided in the branch piping, it is possible to suppress the influence on the supply piping.

According to the liquid supply device of the third aspect, it is possible to turn on/off the liquid supply from the liquid supply pipe to the measurement pipe.

According to the liquid supply device of the fourth aspect, the amount of particles can be measured with a small amount of the treatment liquid.

According to the liquid supply device of the fifth aspect, the processing liquid can be sent to the liquid supply port by the liquid supply pump.

According to the liquid supply device of the sixth aspect, it is possible to supply the liquid to the measurement pipe by the liquid feeding pump.

According to the liquid supply device of the seventh aspect, the processing liquid can also be sent to the measuring pipe of the processing liquid sent to the supply destination.

According to the liquid supply apparatus of an 8th aspect, it can suppress that the measurement of a particle amount is inhibited by a bubble.

According to the liquid supply apparatus of the ninth aspect, degassing is performed with respect to the measurement part in the measurement piping closer than the liquid supply piping. For this reason, it is possible to measure the amount of particles in a state where there are fewer bubbles than in the case of degassing through the liquid feeding pipe.

According to the liquid supply device of the tenth aspect, the determination result of the filter state based on the amount of particles in the processing liquid is output to the outside. For this reason, the operator can grasp|ascertain the state of a filter easily.

According to the coating device of the eleventh aspect, the high-viscosity treatment liquid filtered by the filter of the liquid supply device can be applied to the object.

According to the aging apparatus of the twelfth aspect, it is possible to easily determine the aging of the filter based on the measurement result of the amount of particles.

According to the liquid supply method of the thirteenth aspect, the life of the filter or the degree of aging of the filter can be easily grasped based on the amount of particles contained in the processing liquid that has passed through the filter.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the structure of the coating apparatus which concerns on 1st Embodiment.
FIG. 2 is a cross-sectional view showing the structure of the degassing module shown in FIG. 1 .
3 : is a perspective view of the application|coating unit shown in FIG.
4 : is a block diagram which showed the connection of a 1st control part and each part in an application|coating apparatus.
5 : is a figure which shows the structure of the coating apparatus which concerns on 2nd Embodiment.
6 is a diagram showing the configuration of an aging apparatus according to a third embodiment.
7 : is sectional drawing of the 1st attachment part shown in FIG. 6, and the 1st filter attached to the 1st attachment part.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described, referring an accompanying drawing. In addition, the component described in this embodiment is an illustration to the last, and it is not the meaning of limiting the scope of the present invention only to them. In the drawings, in some cases, the dimensions and numbers of each part are exaggerated or simplified as necessary for ease of understanding.

<1. 1st Embodiment>

1 : is a figure which shows the structure of the application|coating apparatus 1 which concerns on 1st Embodiment. The coating apparatus 1 is applied to the manufacturing process of the polyimide film used as a base material of a flexible display, for example. In the manufacturing process of a polyimide film, in the coating apparatus 1, the varnish which is a high-viscosity processing liquid containing a polyimide precursor (polyamic acid) is apply|coated to the upper surface of the glass-made carrier substrate C. Thereafter, in another apparatus, processing such as heating, depressurization, and firing of the varnish is performed.

As shown in FIG. 1 , the coating device 1 of the present embodiment includes a liquid supply unit 10 (liquid supply device), an application unit 20 , and a first control unit 30 . Hereinafter, each structure of the application|coating apparatus 1 is demonstrated.

The liquid supply unit 10 is a device that supplies a high-viscosity processing liquid to the application unit 20 that is a supply destination. The liquid supply unit 10 includes a supply tank 11 , a first liquid supply pipe 12 , a degassing tank 13 , a second liquid supply pipe 14 , a pressurization mechanism 15 , a pressure reduction mechanism 16 , and a measuring mechanism. (17).

The supply tank 11 is a container which stores the varnish before supply. The varnish stored in the supply tank 11 may be unused, or may be regenerated after being used once. As described above, the varnish is a high-viscosity treatment liquid. The viscosity of the varnish is, for example, about 1000 to 10000 cP (1 to 10 Pa·s). In the following description, "high viscosity" indicates a viscosity of 1000 cP (1 Pa·s) or more. In addition, the high-viscosity processing liquid supplied by the liquid supply unit 10 is not limited to the varnish containing a polyimide precursor, A high-viscosity processing liquid other than a varnish may be sufficient. In the following description, the side close to the supply tank 11 is called an upstream side, and the side opposite to the supply tank 11 is called a downstream side.

The liquid supply unit 10 has one supply tank 11 , but may have a plurality of supply tanks 11 . In that case, the plurality of supply tanks 11 may be connected to the first liquid supply pipe 12 so that they can be switched.

The first liquid supply pipe 12 is a pipe connecting the supply tank 11 and the degassing tank 13 . The upstream end of the first liquid supply pipe 12 is connected to the supply tank 11 . The downstream end of the first liquid supply pipe 12 is connected to the degassing tank 13 . Moreover, on the path|route of the 1st liquid supply piping 12, the 1st liquid supply valve V11 and the 1st filter F1 are provided. When the first liquid supply valve V11 and the first pressurization valve V21 described later are opened, the varnish in the supply tank 11 is fed by the pressure of the gas supplied from the pressurization mechanism 15 to the first liquid supply pipe 12 . ) and sent to the degassing tank 13 . At that time, the varnish is filtered by the 1st filter F1. Thereby, the fine dust contained in the varnish is collected and removed by the 1st filter F1.

In addition, in the example of FIG. 1, the liquid supply unit 10 has one 1st filter F1. However, the liquid supply unit 10 may have the some 1st filter F1. In that case, on the path|route of the 1st liquid supply piping 12, the some 1st filter F1 should just be connected in parallel.

The degassing tank 13 is a container for reducing the amount of gas dissolved in the varnish. The degassing tank 13 is connected to a pressure reducing mechanism 16, which will be described later. When the pressure reducing valve V23 of the pressure reducing mechanism 16 is opened to operate the pressure reducing pump 162, the internal space of the degassing tank 13 is depressurized, and the air pressure in the degassing tank 13 becomes a negative pressure lower than the atmospheric pressure. . Thereby, the dissolved gas contained in the varnish in the degassing tank 13 becomes a bubble. In addition, a stirring mechanism 131 is provided in the degassing tank 13 . When the stirring mechanism 131 is rotated, the varnish in the degassing tank 13 is stirred, and bubbles in the varnish float toward the liquid level of the varnish. The bubbles after floating are removed by being sucked from the degassing tank 13 to the pressure reducing mechanism 16 . Thereby, the dissolved amount of gas in the varnish is reduced.

Thus, in the coating apparatus 1 of this embodiment, the dissolved gas contained in the varnish before application|coating is removed beforehand. Thereby, when the varnish apply|coated to the carrier substrate C is heated and baked in a post process, it can prevent that foam|bubble generation|occurrence|production in the varnish is carried out.

In addition, in the example of FIG. 1 , the liquid supply unit 10 has one deaeration tank 13 . However, the liquid supply unit 10 may have a plurality of degassing tanks 13 . In that case, a plurality of degassing tanks 13 may be switched between the first liquid supply pipe 12 and the second liquid supply pipe 14 .

The second liquid supply pipe 14 is a pipe connecting the degassing tank 13 and the application unit 20 . The upstream end of the second liquid supply pipe 14 is connected to the lower portion of the degassing tank 13 . The downstream end of the second liquid supply pipe 14 is connected to the third liquid supply pipe 23 of the application unit 20 . Moreover, in the 2nd liquid supply piping 14, the 2nd liquid supply valve V12, the 2nd filter F2, and the assist pump P1 are arrange|positioned.

When the pressure reducing valve V23 is closed and the second liquid supply valve V12 and a second pressure valve V22 described later are opened, the pressure of the gas supplied from the pressure mechanism 15 causes the inside of the degassing tank 13 to The varnish passes through the second liquid supply pipe 14 and is sent to the slit nozzle 22 of the application unit 20 . The pressurization mechanism 15 is an example of a liquid delivery unit that sends a high-viscosity processing liquid from the supply tank 11 toward the liquid supply port 19 . Moreover, by driving the assist pump P1, the liquid feeding force of the varnish is assisted. The assist pump P1 is an example of a liquid feeding pump.

The assist pump P1 may be, for example, a fixed-quantity discharge pump that discharges a fixed amount of liquid per one time. In this case, the quantity of the varnish which the assist pump P1 sends per one time may be made equal to the quantity of the varnish which the slit nozzle 22 apply|coats to the carrier board|substrate C of 1 sheet, for example. In addition, it is preferable that the assist pump P1 is a so-called tube fram pump, which discharges the processing liquid in the tube when the pressure of the fluid is applied to the outer peripheral surface of the contractible tube. By employing the tube fram pump, it is possible to suppress the generation of particles in the assist pump P1 by discharging the varnish.

The 2nd filter F2 is a filter with a smaller hole diameter than the 1st filter F1 (thick). The varnish flowing through the second liquid supply pipe 14 is filtered by the second filter F2. Thereby, the fine dust contained in the varnish is collected and removed by the 2nd filter F2.

Although the liquid supply unit 10 has one 2nd filter F2, it may have the some 2nd filter F2. In this case, on the path|route of the 2nd liquid supply piping 14, the some 2nd filter F2 may be connected in parallel.

The pressurization mechanism 15 is a mechanism for supplying a pressure for liquid feeding to the supply tank 11 and the degassing tank 13 . As shown in FIG. 1 , the pressurization mechanism 15 includes a high-pressure gas supply source 151 , a pressurization pipe 152 , a regulator 153 , a first pressurization valve V21 , and a second pressurization valve V22 . . The high-pressure gas supply source 151 is filled with a high-pressure gas (eg, nitrogen). An upstream end of the pressure pipe 152 is connected to a high-pressure gas supply source 151 . The regulator 153 is provided on the path of the pressure pipe 152 . The downstream end of the pressure pipe 152 is branched into two and is respectively connected to the supply tank 11 and the degassing tank 13 . The 1st pressurization valve V21 and the 2nd pressurization valve V22 are respectively provided in the two pressurization piping 152 after a branch.

The gas supplied from the high-pressure gas supply source 151 is pressure-regulated by the regulator 153 to a predetermined pressure higher than atmospheric pressure. When the second pressure valve V22 is closed and the first pressure valve V21 is opened, the gas of the predetermined pressure is supplied from the pressure pipe 152 to the supply tank 11 . As a result, the varnish is pushed out from the supply tank 11 to the first liquid supply pipe 12 . Further, when the first pressure valve V21 is closed and the second pressure valve V22 is opened, the gas of the predetermined pressure is supplied from the pressure pipe 152 to the degassing tank 13 . Thereby, the varnish is pushed out from the deaeration tank 13 to the 2nd liquid supply pipe 14. As shown in FIG.

The pressure reducing mechanism 16 is a mechanism for depressurizing the inside of the degassing tank 13 . As shown in FIG. 1 , the pressure reducing mechanism 16 includes a pressure reducing pipe 161 , a pressure reducing pump 162 , and a pressure reducing valve V23 . One end of the pressure reducing pipe 161 is connected to the degassing tank 13 . The other end of the pressure reducing pipe 161 is connected to an exhaust line in the factory. The pressure reducing valve V23 and the pressure reducing pump 162 are provided on the path of the pressure reducing pipe 161 . When the pressure reducing valve V23 is opened and the pressure reducing pump 162 is operated, the gas in the degassing tank 13 passes through the pressure reduction pipe 161 and is sucked into the exhaust line. Thereby, the atmospheric pressure in the deaeration tank 13 falls.

<Measuring Instrument>

The measuring mechanism 17 is a mechanism for measuring the amount of particles in the varnish. As shown in FIG. 1 , the measuring device 17 includes a measuring pipe 171 , an on/off valve 172 , a degassing module 173 , and a measuring module 174 .

The measurement pipe 171 is connected to a position downstream of the assist pump P1 in the second liquid supply pipe 14 . The on/off valve 172 is provided in the measurement pipe 171 . The opening/closing valve 172 turns on/off the supply of the varnish from the second liquid supply pipe 14 to the measurement module 174 by opening and closing the measurement pipe 171 . The second liquid supply pipe 14 is provided with a switching valve 18 . The switching valve 18 is located on the downstream side of the position to which the measurement pipe 171 in the second liquid supply pipe 14 is connected. The switching valve 18 turns on/off the liquid feeding toward the liquid supply port 19 . The on-off valve 172 and the switching valve 18 are switched between an open state and a closed state based on the control signal of the 1st control part 30. As shown in FIG.

The degassing module 173 is a device for removing air bubbles (microbubbles) existing in the varnish flowing through the measurement pipe 171 . The degassing module 173 is installed in the measurement pipe 171 and is located between the on-off valve 172 and the measurement module 174 .

The measurement module 174 is disposed downstream of the degassing module 173 . The measurement module 174 measures the amount of minute particles contained in the varnish. The measurement module 174 is a particle counter that measures the size and number of particles. The measurement module 174 is configured to measure the amount of particles by irradiating light on the varnish and detecting the light scattered from the particles with a sensor. Further, the measurement module 174 may be configured to measure the size and number of particles by irradiating the varnish with light and detecting light blocking by the particles with a sensor.

The particle size measured by the measurement module 174 is, for example, 10 µm or less, and more preferably, 5 µm or less. For every particle of some size, it is configured to be able to count the number.

When the amount of particles is measured by the measurement module 174, the on/off valve 172 is in an open state and the switching valve 18 is in a closed state. Thereafter, by the driving of the assist pump P1 , the varnish flows from the second liquid supply pipe 14 into the measurement pipe 171 , and is sent to the degassing module 173 . Then, the varnish degassed by the degassing module 173 is sent to the measuring module 174 .

As shown in FIG. 1 , the end of the measurement pipe 171 is connected to a drain line. The varnish that has passed through the measurement module 174 is sent to a drainage line and discarded. Moreover, piping for returning the varnish which has passed through the measurement module 174 to the 2nd liquid supply piping 14 etc. again may be provided.

The inner area of the measurement pipe 171 is smaller than the inner area of the second liquid supply pipe 14 . For this reason, the amount of varnish sent to the measurement pipe 171 can be reduced. Thereby, since the particle amount can be measured with a small amount of varnish, the consumption amount of varnish can be reduced. In addition, when the measurement module 174 is configured to measure the amount of particles using a small amount of varnish, by making the inner area of the measurement pipe 171 small, the amount of particles can be appropriately measured by the measurement module 174 . can

FIG. 2 is a cross-sectional view showing the structure of the degassing module 173 shown in FIG. 1 . The deaeration module 173 is a so-called hollow fiber membrane deaeration module. As shown in FIG. 2 , the degassing module 173 includes a cylindrical casing 41 , a plurality of hollow fiber membranes 42 , and a pressure reducing mechanism 43 .

The casing 41 has an inlet 411 , an outlet 412 , and two exhaust ports 413 . The inlet 411 is provided at one end of the casing 41 , and the outlet 412 is provided at the other end of the casing 41 . The degassing module 173 is connected to the measurement pipe 171 through the inlet 411 and the outlet 412 . The exhaust port 413 is provided on the side of the casing 41 and is connected to the pressure reducing mechanism 43 .

The hollow fiber membrane 42 is a thin cylindrical membrane. One end of each of the hollow fiber membranes 42 is connected to an inlet 411 by a flow path. In addition, the other ends of all the hollow fiber membranes 42 are respectively connected to the outlet ports 412 by flow passages. Accordingly, when a flow of varnish occurs in the measurement pipe 171 , the varnish is supplied to the hollow fiber membrane 42 from the inlet 411 , and the varnish is discharged from the outlet 412 .

Since this hollow fiber membrane 42 is used for a degassing process, it does not pass a liquid, and is formed of the gas-permeable membrane which can permeate gas. The inner diameter of the hollow fiber membrane 42 used in the degassing module 173 is 0.5 mm - 3 mm. Moreover, the number of the hollow fiber membranes 42 used for the degassing module 173 is about 100-1000 pieces. In addition, the inner diameter and number of the hollow fiber membranes 42 used in the degassing module 173 may be appropriately changed according to the type or flow rate of the varnish.

The pressure reduction mechanism 43 includes a pressure reduction pipe 431 and a pressure reduction pump 432 . One end of the pressure reducing pipe 431 is branched into two and is connected to an exhaust port 413 of the casing 41 . In addition, the other end of the pressure reducing pipe 431 is connected to a pressure reducing pump 432 . When the pressure reducing pump 432 is driven, gas is sucked from the space in the casing 41 through the pressure reducing pipe 431 and the two exhaust ports 413 . Thereby, the atmospheric pressure of the space in the casing 41 falls. That is, the atmospheric pressure in the space outside the hollow fiber membrane 42 decreases. In addition, in the example of FIG. 2, although the exhaust port 413 was two, the number of the exhaust port 413 may be one, and three or more may be sufficient as it.

In this way, by making the space outside of the hollow fiber membrane 42 at a pressure lower than the inside of the hollow fiber membrane 42, bubbles in the liquid passing through the inside of the hollow fiber membrane 42 and gas dissolved in the liquid, It can be discharged to the space outside the hollow fiber membrane (42). Thereby, the liquid in the hollow fiber membrane 42 can be degassed.

As shown in FIG. 1 , the downstream end of the second liquid supply pipe 14 serves as a liquid supply port 19 . The liquid supply port 19 is connected to the third liquid supply pipe 23 of the application unit 20 . The liquid supply port 19 supplies the varnish to the application unit 20 which is a supply destination.

3 : is a perspective view of the application|coating unit 20 shown in FIG. 1 and 3 , the application unit 20 includes a stage 21 , a slit nozzle 22 , a third liquid supply pipe 23 , a nozzle holder 24 , and a travel mechanism 25 . have In addition, below, for convenience of description, the moving direction of the slit nozzle 22 in the application|coating unit 20 is called "front-back direction", and the horizontal direction orthogonal to a front-back direction is called "left-right direction."

The stage 21 is a substantially rectangular parallelepiped-shaped holding table which mounts and holds the carrier substrate C. As shown in FIG. The stage 21 is formed of, for example, an integral stone. The upper surface of the stage 21 is a flat substrate holding surface 211 . A large number of vacuum suction holes (not shown) are provided in the substrate holding surface 211 . When the carrier substrate C is placed on the substrate holding surface 211 , the lower surface of the carrier substrate C is attracted to the substrate holding surface 211 by the suction force of the vacuum suction hole. Thereby, the carrier substrate C is fixed on the stage 21 in a horizontal attitude|position. In addition, a plurality of lift pins (not shown) are provided inside the stage 21 . When carrying out the carrier substrate C from the stage 21 , a plurality of lift pins protrude on the substrate holding surface 211 . Thereby, the carrier substrate C is removed from the substrate holding surface 211 .

The slit nozzle 22 is a nozzle for discharging varnish. The slit nozzle 22 has a nozzle body 221 extending in the left-right direction. A slit-shaped discharge port 223 extending in the left-right direction is provided at the lower end of the nozzle body 221 . The discharge port 223 opposes the upper surface of the carrier substrate C mounted on the stage 21 .

The third liquid supply pipe 23 is a pipe for supplying varnish to the slit nozzle 22 . The upstream end of the third liquid supply pipe 23 is connected to the liquid supply port 19 described above. The downstream end of the third liquid supply pipe 23 is connected to the slit nozzle 22 . Moreover, on the path|route of the 3rd liquid supply piping 23, the main pump P2 is provided. When the main pump P2 is operated, the varnish supplied from the second liquid supply pipe 14 is introduced into the slit nozzle 22 . And the varnish is discharged toward the upper surface of the carrier substrate C from the discharge port 223 of the slit nozzle 22. As shown in FIG.

The nozzle holding unit 24 is a mechanism for holding the slit nozzle 22 above the substrate holding surface 211 . The nozzle holding part 24 has a bridge part 241 extending in the left-right direction above the stage 21 , and a pair of support parts 242 for supporting both ends of the bridge part 241 . Moreover, the nozzle holding part 24 has the raising/lowering mechanism 243. When the lifting mechanism 243 is operated, the height of the bridge portion 241 changes. Thereby, the height of the slit nozzle 22 can be adjusted.

The traveling mechanism 25 is a mechanism for moving the slit nozzle 22 in the front-rear direction. The traveling mechanism 25 has a pair of rails 251 and a pair of linear motors 252 . The pair of rails 251 extend in the front-rear direction in the vicinity of the left and right side portions of the stage 21 . The pair of rails 251 functions as a linear guide that regulates the moving direction of the pair of support parts 242 in the front-rear direction. The pair of linear motors 252 move the pair of support parts 242 in the front-rear direction along the rail 251 by magnetic power. Thereby, the slit nozzle 22 moves with the nozzle holding part 24 in a front-back direction.

When performing the application process, the application unit 20 discharges the varnish from the discharge port 223 while moving the slit nozzle 22 in the front-rear direction above the carrier substrate C. Thereby, the varnish is apply|coated to the upper surface of the carrier substrate C. As shown in FIG.

4 : is a block diagram which showed the connection of the 1st control part 30 and each part in the coating device 1 . The first control unit 30 includes a processor 31 such as a CPU, a memory 32 such as a RAM, and a storage unit 33 such as a hard disk drive. The 1st control part 30 is electrically connected with the application|coating units 20, such as a lift pin, the traveling mechanism 25, and the main pump P2, respectively. Further, the first control unit 30 is electrically connected to the valve provided in the liquid supply unit 10 , the assist pump P1 , the pressure reducing pump 162 , and the moving mechanism 244 . The first control unit 30 temporarily reads the computer program and data stored in the storage unit 33 into the memory 32, and based on the computer program and data, the processor 31 performs arithmetic processing. By doing so, each part in the coating device 1 is operated and controlled. Thereby, the application|coating process with respect to the carrier substrate C advances. The first control unit 30 is electrically connected to a display 311 for displaying an image and an input device 312 . The input device 312 is a mouse, keyboard, or touch panel.

The first control unit 30 includes the above-described stirring mechanism 131 , the regulator 153 , the pressure reducing pump 162 , the first liquid supply valve V11 , the second liquid supply valve V12 , and the first pressure valve V21 . , the second pressure valve V22, the assist pump P1, and each part in the liquid supply unit 10, such as the measurement module 174, is electrically connected. Moreover, the 1st control part 30 is electrically connected also with each part in the application|coating unit 20, such as the above-mentioned lift pin, the main pump P2, the lifting mechanism 243, and the linear motor 252, have.

The first control unit 30 temporarily reads the computer program and data stored in the storage unit 33 into the memory 32, and based on the computer program and data, the processor 31 performs arithmetic processing. By doing so, each part in the coating device 1 is operated and controlled. Thereby, the application|coating process with respect to the carrier substrate C advances.

For example, the first control unit 30 performs lifetime determination processing for determining the lifetime of the second filter F2 based on the amount of particles measured by the measurement module 174 . Specifically, the first control unit 30 determines whether the amount of particles exceeds a preset threshold. And the 1st control part 30 determines with the lifetime determination process that the 2nd filter F2 has reached the lifetime, when it determines with the particle amount exceeding a threshold value. The first control unit 30 is an example of a determination unit.

The 1st control part 30 may cause the display 311 to display an image, when it determines with the lifetime determination process that the 2nd filter F2 has reached the lifetime. The image that the first control unit 30 causes the display 311 to display may be, for example, an image indicating that the second filter F2 has reached the end of its service life, or may prompt replacement of the second filter F2. It may be an image. When such a display is performed, an operator can grasp|ascertain that the 2nd filter F2 is in the state which should be replaced|exchanged. The display 311 functions as an output unit for outputting the determination result of the first control unit 30 . In addition, the output part is not limited to the display 311, For example, a lamp which displays a warning, a speaker which emits a warning sound, a printer which outputs printed matter, etc. may be sufficient.

When the measurement module 174 can measure the number for each size of the particle, a threshold value for each size of the particle may be set in advance. In this case, the 1st control part 30 may make it judge that the 2nd filter F2 has reached|attained the lifetime, when it determines with the particle quantity exceeding the threshold value with respect to some all of the sizes of all the particles.

<Aging>

As for the new 2nd filter F2, there exists a possibility that a foreign material may separate|separate from the 2nd filter F2 when a high-viscosity varnish passes. For this reason, in the liquid supply unit 10, you may age the 2nd filter F2 by making a varnish pass through the new 2nd filter F2. When the second filter F2 is aged, the varnish may be discarded by connecting the liquid supply port 19 to the drain line. Moreover, you may make it pass through the 2nd filter F2 again by returning the varnish discharged|emitted from the liquid supply port 19 to the upstream side rather than the 2nd filter F2.

While the second filter F2 is aging, the first control unit 30 causes the measurement module 174 to measure the amount of particles in the varnish. Then, the first control unit 30 performs aging determination processing based on the amount of particles measured by the measurement module 174 . Specifically, the first control unit 30 determines whether or not the amount of particles measured by the measurement module 174 is less than a predetermined threshold. When the amount of particles is less than a predetermined threshold, the first control unit 30 determines that aging is complete. When it is determined that the aging is completed, the first control unit 30 causes the display 311 to display an image indicating that the aging of the second filter F2 is completed. By performing such a display, the operator can grasp|ascertain that the aging of the 2nd filter F2 was completed.

<Effect>

As described above, in the liquid supply unit 10, based on the measurement result of the amount of particles, whether the second filter F2 has reached the end of its life can be appropriately determined. Therefore, it can suppress that a defect generate|occur|produces in a product by use of the 2nd filter F2 beyond the lifetime.

Moreover, in the liquid supply unit 10, when performing aging of the 2nd filter F2, whether aging should be completed can be judged suitably based on the amount of particles. Therefore, it can suppress that the 2nd filter F2 ages excessively or that the aging of the 2nd filter F2 runs short.

In addition, in the liquid supply unit 10 , the particle amount is measured by the measurement module 174 disposed on the measurement pipe 171 . For this reason, compared with the case of taking out the varnish to the outside and measuring the amount of particles, the work load related to the measurement of the amount of particles can be reduced. In addition, when taking out the varnish from the device to the outside, there is a risk that the varnish itself may be contaminated due to incorporation of particles from the outside during taking out or during measurement. can be reduced.

<2. Second embodiment>

Next, the second embodiment will be described. In addition, in the following description, about the element which has the same function as the element already demonstrated, the same code|symbol or the code|symbol added with an alphabetic character may be attached|subjected, and detailed description may be abbreviate|omitted.

5 : is a figure which shows the structure of 1 A of application|coating apparatuses which concern on 2nd Embodiment. 1 A of coating apparatuses are provided with the structure substantially similar to the coating apparatus 1 shown in FIG. However, in the application device 1A, the upstream end of the measurement pipe 171 of the measuring mechanism 17 is the second filter F2 and the assist pump P1 in the second liquid supply pipe 14 . It is connected to a position between In the coating apparatus 1A, when measuring the amount of particles, the pressure mechanism 15 pressurizes the supply tank 11 , so that the varnish of the second liquid supply pipe 14 is sent to the measurement pipe 171 . In this case, the assist pump P1 can send the amount of varnish required for application to the carrier substrate C while sending the varnish required for the measurement of the particle amount to the measurement pipe 171 . Therefore, the amount of particles can be measured without interrupting the coating process. In addition, when measuring the amount of particles, supply of the varnish to the slit nozzle 22 may be stopped by controlling the on-off valve 172 and the switching valve 18 .

<3. Third embodiment>

6 : is a figure which shows the structure of the aging apparatus 2 which concerns on 3rd Embodiment. The aging apparatus 2 is an apparatus for aging the 2nd filter F2 attached to the liquid supply unit 10 of the application apparatus 1 . As shown in FIG. 6 , the aging device 2 includes a first tank 51 , a second tank 52 , a piping unit 60 , a pressurization mechanism 70 , and a second control unit 80 , have.

The 1st tank 51 and the 2nd tank 52 are containers which store the high-viscosity varnish for aging the 1st filter F1 and the 2nd filter F2. The first tank 51 and the second tank 52 are separate tanks from each other. Moreover, the 1st tank 51 and the 2nd tank 52 are pressure-resistant sealed containers which can withstand the pressurization by the pressurization mechanism 70 mentioned later. The first tank 51 is connected to a varnish supply source 54 through a supply pipe 53 . When the supply valve V30 provided on the path of the supply pipe 53 is opened, the varnish is supplied from the varnish supply source 54 to the first tank 51 through the supply pipe 53 .

The varnish supplied from the varnish supply source 54 is the same treatment liquid as the varnish used in the application devices 1 and 1A. Accordingly, the viscosity of the varnish supplied from the varnish supply source 54 is the same as the viscosity of the varnish used in the application device 1 . In addition, the aging may be performed using a high-viscosity processing liquid different from that of the varnish.

The piping unit 60 includes a first main pipe 61 , a second main pipe 62 , a first branch pipe 63 , and a second branch pipe 64 . One end of the first main pipe 61 is connected to the lower portion of the first tank 51 . One end of the first branch pipe 63 and one end of the second branch pipe 64 are respectively connected to the other end of the first main pipe 61 . The other end of the first branch pipe 63 and the other end of the second branch pipe 64 are connected to one end of the second main pipe 62 , respectively. The other end of the second main pipe 62 is connected to the lower portion of the second tank 52 . That is, the first branch pipe 63 and the second branch pipe 64 extend in parallel between the first tank 51 and the second tank 52 . The first branch pipe 63 is an example of the first liquid feeding pipe in the present invention. The second branch pipe 64 is an example of the second liquid feeding pipe in the present invention.

A selector valve V31 and a selector valve V32 are provided in the first branch pipe 63 . The 1st branch piping 63 has the 1st attachment part 65 which can attach the 1st filter F1 between the selector valve V31 and the selector valve V32. A switching valve V33 and a switching valve V34 are provided in the second branch pipe 64 . The 2nd branch piping 64 has the 2nd mounting part 66 which can attach the 2nd filter F2 between the selector valve V33 and the selector valve V34.

The pressurization mechanism 70 is a mechanism that supplies pressure for liquid feeding to the first tank 51 and the second tank 52 . As shown in FIG. 6 , the pressurization mechanism 70 includes a high-pressure gas supply source 71 , a pressurization pipe 72 , a regulator 73 , a selector valve V35 , and a selector valve V36 . The high-pressure gas supply source 71 is filled with a high-pressure gas (eg, nitrogen). An upstream end of the pressure pipe 72 is connected to a high-pressure gas supply source 71 . The regulator 73 is provided on the path of the pressure pipe 72 . The downstream end of the pressure pipe 72 is branched into two and is connected to the first tank 51 and the second tank 52 , respectively. The switching valve V35 and the switching valve V36 are respectively provided in the two pressure pipes 72 after branching.

The gas supplied from the high-pressure gas supply source 71 is pressure-regulated by the regulator 73 to a predetermined pressure higher than atmospheric pressure. When the selector valve V36 is closed and the selector valve V35 is opened, the gas of the predetermined pressure is supplied from the pressurization pipe 72 to the first tank 51 . As a result, the varnish is pushed out from the first tank 51 to the first main pipe 61 . Moreover, when the selector valve V35 is closed and the selector valve V36 is opened, the gas of the said predetermined|prescribed pressure is supplied to the 2nd tank 52 from the pressurization piping 72. As shown in FIG. As a result, the varnish is pushed out from the second tank 52 to the second main pipe 62 . The pressurization mechanism 70 has a function of a first liquid supply unit for sending varnish from the first tank 51 to the second tank 52 , and a second function for sending varnish from the second tank 52 to the first tank 51 . It has the function of the liquid sending part.

FIG. 7 : is sectional drawing of the 1st attachment part 65 shown in FIG. 6, and the 1st filter F1 attached to the 1st attachment part 65. As shown in FIG. In addition, the structure of the 1st filter F1 and the 1st attachment part 65 is not limited to what is shown in FIG. 7, You may have a structure different from FIG. As shown in FIG. 7, the 1st attachment part 65 has the holder 650 which can connect the 1st filter F1.

The first filter F1 has a housing 91 , a filter cartridge 92 , and a cover 93 . The housing 91 is a cylindrical housing extending in the vertical direction. The filter cartridge 92 is accommodated in the housing 91 . The cover 93 covers the outer surface of the housing 91 . The cover 93 is formed of a material having a higher rigidity than the housing 91 , such as metal, for example. Thereby, deformation of the housing 91 is suppressed.

The filter cartridge 92 has an upper cover 922 on the filter body 921 . The filter body 921 has a cylindrical shape extending in the vertical direction. The filter body 921 is formed of resin fibers such as polypropylene, polyethylene, and polytetrafluoroethylene (PTFE). However, the filter main body 921 may be formed of materials other than resin. The upper cover 922 covers the upper part of the filter body 921 .

An inlet 911 and an outlet 912 are formed at the bottom of the housing 91 . The inlet 911 communicates with a space outside the filter cartridge 92 in the inner space of the housing 91 . The outlet 912 communicates with the inner space of the filter cartridge 92 among the inner spaces of the housing 91 .

The holder 650 has an inflow connection hole 651 and an outflow connection hole 652 . The inflow connection hole 651 and the outflow connection hole 652 are through-holes penetrating the holder 650 in the vertical direction, respectively. The inflow connection hole 651 is connected to the first branch pipe 63 on the upstream side. The outflow connection hole 652 is connected to the first branch pipe 63 on the downstream side. In addition, when the first filter F1 is attached to the first mounting portion 65 , the inlet 911 described above is connected to the inflow connection hole 651 , and the outlet 912 described above is connected to the outflow connection hole 652 . ) is connected to

Accordingly, when the varnish flows through the first branch pipe 63 , the varnish is introduced into the housing 91 from the inlet connection hole 651 through the inlet port 911 . And the said varnish passes through the filter main body 921 like a broken-line arrow in FIG. Further, the varnish that has passed through the filter body 921 flows out from the inside of the filter body 921 through the outlet 912 and the outflow connection hole 652 to the first branch pipe 63 on the downstream side. .

Moreover, as shown in FIG. 7, the 1st exhaust pipe 94 is connected to the upper part of the housing 91. As shown in FIG. The bubbles collected in the upper part of the housing 91 pass through the first exhaust pipe 94 and are discharged to an exhaust line in the factory. In addition, a second exhaust pipe 95 is connected to the upper portion of the filter cartridge 92 . The air bubbles collected in the upper part of the filter cartridge 92 pass through the second exhaust pipe 95 and are discharged to an exhaust line in the factory.

About the structure of the 2nd attachment part 66 and the 2nd filter F2, since it is equivalent to the structure of the 1st attachment part 65 and the 1st filter F1, overlapping description is abbreviate|omitted.

As shown in FIG. 6 , the aging device 2 has a measuring mechanism 17 . The measuring mechanism 17 is provided with the measuring pipe 171, the on-off valve 172, the deaeration module 173, and the measuring module 174, like the measuring mechanism 17 shown in FIG. The measurement pipe 171 is connected to a position in the first branch pipe 63 between the switching valve V31 and the first mounting part 65 . The measurement module 174 measures the amount of particles in the varnish in the measurement pipe 171 . The measurement module 174 is electrically connected to the second control unit 80 , and transmits the measurement result of the amount of particles to the second control unit 80 .

In addition, the position to which the measurement pipe 171 is connected may be between the 1st mounting part 65 and the switching valve V32 in the 1st branch pipe 63 . In addition, the position to which the measurement pipe 171 is connected is between the selector valve V33 and the 2nd mounting part 66 in the 2nd branch pipe 64, or the 2nd mounting part 66 and the selector valve ( V34) may be in between. The measurement pipe 171 may be the first main pipe 61 or the second main pipe 62 .

The 2nd control part 80 is a means for operation-controlling each part in the aging apparatus 2 . The second control unit 80 has a processor such as a CPU, a memory such as a RAM, and a storage unit such as a hard disk drive. Moreover, the 2nd control part 80 is each part in the aging apparatus 2, such as the above-mentioned supply valve V30, the switching valves V31-V36, the on-off valve 172, and the regulator 73, and electrical is connected to

The second control unit 80 temporarily reads the computer program or data stored in the storage unit into the memory, and based on the computer program and data, the processor performs arithmetic processing, whereby each control the operation. Thereby, the aging (washing process) of the 1st filter F1 and the 2nd filter F2 advances.

<Operation of aging device>

When performing aging of the 1st filter F1 and the 2nd filter F2 in the aging apparatus 2, while an operator attaches the new 1st filter F1 to the 1st mounting part 65, A new second filter F2 is attached to the second attachment portion 66 .

With the first filter F1 and the second filter F2 mounted, the second control unit 80 opens the supply valve V30, thereby providing the first tank 51 from the varnish supply source 54, Supply varnish for cleaning. When a predetermined amount of varnish is stored in the first tank 51 , the second control unit 80 closes the supply valve V30 .

Next, when the second control unit 80 opens the selector valves V31 and V32 and the selector valve V35 , the high-pressure gas is supplied from the pressure pipe 72 to the first tank 51 . As a result, the varnish in the first tank 51 is pushed out to the first main pipe 61 . Then, as shown by the broken-line arrow A1 in FIG. 6 , the varnish is sent from the first main pipe 61 to the second tank 52 through the first branch pipe 63 and the second main pipe 62 . The varnish passes through the first filter F1. For this reason, when initial dust exists on the surface on the downstream side of the 1st filter F1, the initial dust separates from the surface on the downstream side of the 1st filter F1, and the 2nd tank 52 with varnish. ) flows to

Then, the 2nd control part 80 closes the selector valves V31, V32, and V35, and opens the selector valves V33, V34, and V36. Then, high-pressure gas is supplied from the pressure pipe 72 to the second tank 52 . As a result, the varnish in the second tank 52 is pushed out to the second main pipe 62 . Then, as shown by the broken-line arrow A2 in FIG. 6 , the varnish is sent from the second main pipe 62 to the first tank 51 through the second branch pipe 64 and the first main pipe 61 . The varnish passes through the second filter F2. For this reason, the dust which separated|separated from the 1st filter F1 is received by the upstream surface of the 2nd filter F2. Since the hole diameter of the 2nd filter F2 is sufficiently smaller than the particle diameter of the dust which detach|departed from the 1st filter F1, it is difficult for dust to pass through the 2nd filter F2. In addition, when initial dust adheres to the downstream surface of the second filter F2, the initial dust separates from the downstream surface of the second filter F2, and together with the varnish, the first tank ( 51) flows.

When the second control unit 80 finishes supplying the varnish from the second tank 52 to the first tank 51 , the second control unit 80 starts again supplying the varnish from the first tank 51 to the second tank 52 . do. In this way, the second control unit 80 alternately and repeatedly executes the liquid feeding from the first tank 51 to the second tank 52 and the liquid feeding from the second tank 52 to the first tank 51 .

The dust which detach|desorbs from the 2nd filter F2 is received by the upstream surface of the 1st filter F1. Since the hole diameter of the 1st filter F1 is sufficiently smaller than the particle diameter of the dust which detach|departs from the 2nd filter F2, it is difficult for the dust to pass through the 1st filter F1.

The second control unit 80 periodically causes the measuring module 174 of the measuring instrument 17 to measure the amount of particles while aging is in full swing. In detail, the second control unit 80 controls a part of the varnish flowing through the first branch pipe 63 by opening the on/off valve 172 while the varnish is flowing in the first branch pipe 63 in full. It is sent to the measurement module 174 of the measurement pipe 171 . Then, the measurement module 174 measures the amount of particles in the varnish, and transmits the measured amount of particles to the second control unit 80 .

The second control unit 80 performs aging determination processing based on the amount of particles transmitted by the measurement module 174 . Specifically, the second control unit 80 determines whether the amount of particles measured by the measurement module 174 is less than a threshold value indicating that aging is completed. When determining that the amount of particles is less than the predetermined threshold, the second control unit 80 determines that the aging of the first filter F1 and the second filter F2 has been completed.

When determining that the aging is completed, the second control unit 80 stops the operation of the aging apparatus 2 . Thereby, an operator can remove the aging 1st filter F1 from the 1st attachment part 65, and can remove the aging 2nd filter F2 from the 2nd attachment part 66. As shown in FIG. Further, when it is determined that the aging is completed, the second control unit 80 may cause the display to display an image indicating that the aging is completed.

<4. Modifications>

As mentioned above, although embodiment has been described, this invention is not limited to the above, and various deformation|transformation is possible.

In the first to third embodiments, the deaeration module 173 may be operated in a state in which deaeration is not performed (that is, in a state in which the pressure reducing pump 432 is off). By doing so, for example, the occurrence of a sudden bubble can be detected by the measurement module 174 . Moreover, in the said 1st - 3rd embodiment, it is not essential that the measuring mechanism 17 is equipped with the deaeration module 173, and the deaeration module 173 may be abbreviate|omitted.

In the coating apparatuses 1 and 1A which concern on 1st and 2nd embodiment, although lifetime determination or aging determination is performed with respect to the 2nd filter F2, lifetime determination or aging determination is performed also with respect to the 1st filter F1. you can make it In this case, the measuring mechanism 17 may be further provided in the downstream of the 1st filter F1. Specifically, the measuring pipe 171 of the measuring mechanism 17 may be connected to a position between the first filter F1 and the degassing tank 13 in the first liquid supply pipe 12 . Thereby, the varnish of the 1st liquid supply piping 12 which has passed through the 1st filter F1 can be sent to the measurement module 174 via the measurement piping 171 . Accordingly, the amount of particles in the varnish that has passed through the first filter F1 can be measured. Based on the amount of particles measured in this way, you may make it the 1st control part 30 perform lifetime determination or aging determination of the 1st filter F1.

While this invention has been described in detail, the foregoing description, in all respects, is illustrative and not restrictive of the invention. It is to be understood that numerous modifications not illustrated can be made without departing from the scope of the present invention. Each structure demonstrated in each said embodiment and each modified example can be combined suitably or abbreviate|omitted unless mutually contradictory.

1, 1A: applicator 10: liquid supply unit
11: supply tank 12: first supply pipe
13: degassing tank 14: second liquid supply pipe
15: pressure mechanism 17: measuring mechanism
171: measuring pipe 172: on-off valve
173: degassing module 174: measuring module
19: liquid supply port 2: aging device
20: application unit 22: slit nozzle
223: outlet 30: first control unit
311: display 51: first tank
52: second tank 54: varnish supply source
61: first main pipe 62: second main pipe
63: first branch pipe 65: first mounting part
70: pressure mechanism F1: first filter
F2: Second filter P1: Assist pump

Claims (13)

A liquid supply device for supplying a treatment liquid, comprising:
A tank capable of storing a high-viscosity treatment liquid;
a liquid supply port for supplying the treatment liquid;
a liquid supply pipe connecting the tank and the liquid supply port;
a liquid delivery unit that sends the processing liquid from the tank toward the liquid supply port through the liquid delivery pipe;
a filter disposed in the liquid supply pipe and filtering the treatment liquid;
A measurement unit that measures the amount of particles in the treatment liquid that has passed through the filter at a position downstream from the filter
A liquid supply device comprising a. The method according to claim 1,
a measurement pipe connected to the liquid feed pipe at a position downstream from the filter in the liquid feed pipe;
The measuring unit is configured to measure an amount of particles in the processing liquid in the measuring pipe. 3. The method according to claim 2,
and an on/off valve for turning on/off the flow of the processing liquid from the liquid supply pipe to the measurement pipe. 4. The method according to claim 2 or 3,
An inner area of the measuring pipe is smaller than an inner area of the liquid feeding pipe. 4. The method according to claim 2 or 3,
The liquid supply apparatus which is arrange|positioned in the said liquid delivery pipe and is further provided with the liquid delivery pump which pressure-feeds a process liquid. 6. The method of claim 5,
and the measurement pipe is connected to the liquid feed pipe at a position downstream from the liquid feed pump in the liquid feed pipe. 6. The method of claim 5,
and the measurement pipe is connected to the liquid feed pipe at a position upstream from the liquid feed pump in the liquid feed pipe. 4. The method according to claim 2 or 3,
The liquid supply device, which is disposed on an upstream side of the measurement unit and further includes a degassing module for degassing the treatment liquid. 9. The method of claim 8,
The liquid supply device in which the said degassing module is arrange|positioned in the said measuring pipe. 4. The method according to any one of claims 1 to 3,
a judging unit for judging the state of the filter based on the amount of particles measured by the measuring unit;
An output unit for outputting the determination result output by the determination unit to the outside
A liquid supply device further comprising a. An application device for applying a treatment liquid to a target, comprising:
The supply device according to any one of claims 1 to 3,
A nozzle for discharging the processing liquid supplied from the liquid supply port of the supply device
Equipped with, the application device. An aging device for treating a filter with a high-viscosity treatment liquid, comprising:
a first tank capable of storing the treatment liquid;
a second tank capable of storing the treatment liquid;
a first liquid delivery pipe and a second liquid delivery pipe connecting the first tank and the second tank in parallel;
a first liquid supply unit for supplying liquid from the first tank to the second tank through the first liquid supply pipe;
a second liquid supply unit for supplying liquid from the second tank to the first tank through the second liquid supply pipe;
a control unit configured to alternately operate the first liquid supply unit and the second liquid supply unit;
a filter mounting unit for mounting a filter to filter the treatment liquid flowing through the first liquid supply pipe;
A measuring unit that measures the amount of particles in the treatment liquid that has passed through the filter
Aging device comprising a. As a liquid supply method for supplying a high-viscosity treatment liquid to a supplier,
a) the process of sending the treatment liquid from the tank to the supplier;
b) filtering the treatment liquid sent from the tank to the supplier by the step a) with a filter;
c) a step of measuring the amount of particles in the treatment liquid that has passed through the filter in step b)
A method of replenishment, including.

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