KR20220112185A - Substrate treatment apparatus, substrate treatment method and computer readable storage medium - Google Patents

Abstract

The present invention provides a substrate treatment apparatus, a substrate treatment method and a computer-readable storage medium, which can detect an abnormality of a nozzle. The substrate treatment apparatus comprises: a supply unit including a nozzle; a liquid accommodation unit including an opening accommodating a treatment liquid dummy-discharged from the nozzle; a driving unit configured to drive a nozzle arm supporting the nozzle; a detection unit arranged on the liquid accommodation unit; and a control unit. The detection unit is configured to detect whether the treatment liquid dummy-discharged from the nozzle has passed through a detection space near the inner circumferential surface of the liquid accommodation unit. The control unit is configured to execute a first treatment of controlling the driving unit to position the nozzle arm at a preset origin position on the inside of the opening, and a second treatment of determining that the nozzle is in an abnormal state if the detection unit detects that the treatment liquid dummy-discharged from the nozzle has passed through the detection space while the nozzle arm is positioned at the origin position.

Description

Substrate processing apparatus, substrate processing method, and computer-readable recording medium

The present disclosure relates to a substrate processing apparatus, a substrate processing method, and a computer-readable recording medium.

Patent Document 1 discloses a substrate processing apparatus. The substrate processing apparatus includes a suction-type spin chuck configured to rotate and hold a substrate, a nozzle configured to supply a processing liquid to a surface of the substrate held by the spin chuck, and a movement configured to move the nozzle above the substrate includes instruments.

Japanese Patent Laid-Open No. 11-005056

During the maintenance of the device, an error occurs in the nozzle (for example, the nozzle is deformed or the nozzle posture change, etc.). At this time, the liquid landing position with respect to the board|substrate of the process liquid discharged from a nozzle shifts, and the board|substrate process different from the setting may be performed.

Thus, the present disclosure describes a substrate processing apparatus, a substrate processing method, and a computer-readable recording medium capable of detecting abnormality in a nozzle.

An example of a substrate processing apparatus includes a holding part configured to hold a substrate, a supply part including a nozzle configured to supply a processing liquid to a surface of the substrate held by the holding part, and a processing liquid discharged dummy from the nozzle. a liquid accommodating part having an opening opened upward to do so; and a driving part configured to move the nozzle between the liquid accommodating part and the upper side of the substrate held by the holding part by driving a nozzle arm for supporting the nozzle; A detection unit disposed in the liquid receiving unit and a control unit are provided. The detection unit is configured to detect whether the processing liquid dummy discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid container. The control unit includes a first process of controlling the driving unit so that the nozzle arm is positioned at a preset origin position inside the opening, and the processing liquid dummy discharged from the nozzle passes through the detection space while the nozzle arm is positioned at the origin position It is comprised so that the 2nd process of determining that the nozzle is in an abnormal state may be performed when the detection part detects what has been done.

According to the substrate processing apparatus, the substrate processing method, and the computer-readable recording medium according to the present disclosure, it becomes possible to detect abnormality of the nozzle.

1 is a diagram schematically illustrating an example of a substrate processing apparatus.
2 is a top view schematically showing an example of a processing unit.
3 is a perspective view schematically illustrating an example of a liquid container.
Fig. 4(a) is a cross-sectional view taken along line IVA-IVA of Fig. 3, and Fig. 4(b) is a cross-sectional view taken along line IVB-IVB of Fig. 3 .
5 is a block diagram showing an example of a main part of the substrate processing apparatus.
6 is a schematic diagram showing an example of the hardware configuration of the controller.
7 is a flowchart showing an example of the procedure of the initial measurement process.
8 : is a figure for demonstrating an example of the procedure of an initial stage measurement process.
9 is a flowchart showing an example of a procedure of an abnormal state detection process.
FIG. 10 is a diagram for explaining an example of a procedure of an abnormal state detection process.
11 is a view for explaining a method of calculating the angle of the processing liquid obliquely discharged from the nozzle.
12 is a diagram illustrating another example of a detection unit.

In the following description, the same reference numerals are used for the same elements or elements having the same functions, and overlapping descriptions are omitted. In addition, in this specification, when referring to the top, bottom, right, and left of a drawing, the direction of the code|symbol in a drawing shall be taken as a reference|standard.

[Substrate processing unit]

First, with reference to FIGS. 1-5, the structure of the substrate processing apparatus 1 is demonstrated. The substrate processing apparatus 1 is configured to process the substrate W by supplying the processing liquid L to the substrate W, for example. The treatment liquid L may be, for example, a cleaning liquid for cleaning the surface of the substrate W, or a rinse liquid for washing away liquids, dissolved components, residues, etc. remaining on the surface of the substrate W, the substrate The coating liquid for forming a film on the surface of (W) may be sufficient, and the developer for developing a resist film may be sufficient. That is, the substrate processing apparatus 1 may be a substrate cleaning apparatus or a coating/developing apparatus.

The washing liquid may contain, for example, an alkaline or acidic chemical, or may contain an organic solvent. The alkaline chemical liquid may contain, for example, SC-1 liquid (a mixture of ammonia, hydrogen peroxide and pure water) or the like. The acidic chemical liquid may contain, for example, SC-2 liquid (a mixture of hydrochloric acid, hydrogen peroxide, and pure water), SPM (a mixture of sulfuric acid and hydrogen peroxide), and HF/HNO ₃ liquid (a mixture of hydrofluoric acid and nitric acid). do. The organic solvent may contain IPA (isopropyl alcohol), for example. The rinse liquid may contain, for example, pure water (DIW: deionized water), ozone water, carbonated water (CO ₂ water), ammonia water, or the like. In addition, among the above examples, for example, SC-1 liquid, SC-2 liquid, SPM, carbonated water, etc. exhibit conductivity. On the other hand, IPA, pure water, etc. do not exhibit conductivity.

The substrate W may have a disk shape, or may have a plate shape other than a circular shape such as a polygon. The board|substrate W may have the cutout part which was cut out. The cutout may be, for example, a notch (a groove such as a U-shape or a V-shape) or a straight-line portion (so-called orientation flat) extending in a straight line. The substrate W may be, for example, a semiconductor substrate (silicon wafer), a glass substrate, a mask substrate, a flat panel display (FPD) substrate, or other various substrates. The diameter of the board|substrate W may be 200 mm - about 450 mm, for example.

As illustrated in FIG. 1 , the substrate processing apparatus 1 includes a processing unit 2 and a controller Ctr (control unit). The processing unit 2 includes a holding unit 10 , a supply unit 20 , a driving unit 30 , a liquid receiving unit 40 , and a plurality of detection units 50 .

The holding unit 10 includes a rotation drive unit 11 , a shaft 12 , and an adsorption unit 13 . The rotation drive unit 11 operates based on an operation signal from the controller Ctr, and is configured to rotate the shaft 12 . The rotation drive unit 11 may be a power source such as an electric motor, for example. The adsorption|suction part 13 is provided in the front-end|tip part of the shaft 12. As shown in FIG. The adsorption|suction part 13 operates based on the operation signal from the controller Ctr, and is comprised so that part or all of the back surface of the board|substrate W may be adsorbed and held. That is, the holding part 10 holds the substrate W in a state where the posture of the substrate W is substantially horizontal, and the substrate W is rotated around a central axis (rotation axis) perpendicular to the surface of the substrate W. ) may be configured to rotate.

The supply unit 20 is configured to supply the processing liquid L to the surface of the substrate W held by the holding unit 10 . The supply unit 20 includes a liquid source 21 , a pump 22 , a valve 23 , a nozzle 24 , and a pipe 25 . The liquid source 21 is configured to store the processing liquid L. The pump 22 operates based on an operation signal from the controller Ctr, and transfers the processing liquid L sucked from the liquid source 21 to the nozzle 24 through the pipe 25 and the valve 23 . It is designed to be transmitted.

The valve 23 operates based on an operation signal from the controller Ctr, and has an open state that allows the flow of the fluid in the pipe 25 and an open state that prevents the flow of the fluid in the pipe 25 . and is configured to transition between closed states. As for the nozzle 24, the discharge port is opened downward. The nozzle 24 is configured to discharge the processing liquid L delivered by the pump 22 toward the surface of the substrate W or dummy discharge to the liquid container 40 . The pipe 25 connects the liquid source 21 , the pump 22 , the valve 23 , and the nozzle 24 in this order from the upstream side.

The driving unit 30 is configured to move the nozzle 24 between the liquid storage unit 40 and the upper side of the substrate W held by the holding unit 10 . As illustrated in FIGS. 1 and 2 , the driving unit 30 includes a rotational driving unit 31 , a turning shaft 32 , a nozzle arm 33 , an encoder 34 , and a position sensor 35 . include

The rotation drive part 31 operates based on the operation signal from the controller Ctr, and is comprised so that the turning shaft 32 may be rotated. The rotation drive part 31 may be a power source, such as an electric motor, for example. The turning shaft 32 is a columnar member (for example, a columnar member) extending in an up-down direction, and is comprised so that it may rotate about the rotation axis extending along a perpendicular direction.

The nozzle arm 33 is configured to support the nozzle 24 . The proximal end of the nozzle arm 33 is connected to the outer peripheral surface of the revolving shaft 32 . The tip end of the nozzle arm 33 supports the nozzle 24 . The nozzle arm 33 extends horizontally along the radial direction of the revolving shaft 32 . As illustrated in FIG. 2 , when the rotation drive unit 31 rotates the turning shaft 32 , the nozzle 24 positioned at the tip of the nozzle arm 33 is a substrate held by the holding unit 10 . It rotates in an arc shape between the upper part of the substantially central part of W and the upper part of the opening 41 (described later) of the liquid accommodating part 40 . In addition, as illustrated in FIG. 2 , the turning direction of the nozzle 24 when the nozzle 24 pivots above the liquid container 40 is referred to as “X direction”, and the length of the nozzle arm 33 is referred to as “X direction”. The side direction is sometimes referred to as a "Y direction".

The encoder 34 is configured to detect the rotation position (rotation angle) of the rotation drive unit 31 . The encoder 34 is configured to output the detected rotational position to the controller Ctr. The position sensor 35 is configured to detect the origin position (reference position) of the turning shaft 32 . The position sensor 35 may include the detection piece 35a and the photoelectric sensor 35b, for example. The detection piece 35a is connected to the outer peripheral surface of the revolving shaft 32 , and may be configured to rotate together with the revolving shaft 32 . The photoelectric sensor 35b may be a light-transmitting unit including a light receiving unit and a light projecting unit that irradiates light toward the light receiving unit. When the detection piece 35a is positioned between the light receiving portion and the light projecting portion during rotation of the detection piece 35a, the light receiving portion cannot receive the light from the light projecting portion, and the presence of the detection piece 35a is detected. The rotational position of the rotation drive unit 31 when the photoelectric sensor 35b detects the presence of the detection piece 35a may be set to the origin position of the revolving shaft 32 . In addition, when the turning shaft 32 is at the origin position, the nozzle 24 may be located above the opening 41 of the liquid container 40 .

The liquid container 40 functions as a liquid collection container that receives the processing liquid L dummy discharged from the nozzle 24 . The liquid accommodating part 40 is a cylindrical body with an open top, and has an opening 41 for receiving the processing liquid L dummy discharged from the nozzle 24 as illustrated in FIGS. 3 and 4 . include A drain pipe (not shown) is provided on the bottom wall of the liquid accommodating part 40 , and the processing liquid L discharged into the liquid accommodating part 40 is discharged from the drain pipe. The liquid accommodating part 40 is disposed outside the cup (not shown) surrounding the substrate W held by the holding part 10 (a position not overlapping the cup in the vertical direction). there may be

The plurality of detection units 50 are arranged in the liquid container 40 . The detection unit 50 includes a pair of terminals 51 and a measuring instrument 52 , as illustrated in FIGS. 3 and 4 . The pair of terminals 51 are made of a conductive material. The pair of terminals 51 may be composed of, for example, a metal material having corrosion resistance to the processing liquid L, or may be composed of a resin material containing a conductive material. In these cases, it becomes possible to suppress the generation of particles accompanying corrosion of the terminal 51 . The resin material containing the conductive material may be, for example, a fluororesin (PTFE, PFA, etc.) containing a carbon material, PEEK resin containing a carbon material, or the like.

The pair of terminals 51 are provided in the liquid container 40 in a state where a tip protrudes from the inner circumferential surface of the liquid container 40 and is spaced apart from each other. A screw thread may be provided on the outer peripheral surface of the base end of the terminal 51 , and the terminal 51 may be provided with respect to the liquid container 40 by screwing the screw thread with the peripheral wall of the liquid container 40 . In this case, the position of the tip of the terminal 51 may be adjusted. In addition, a sealing member for preventing leakage may be interposed between the screw thread and the liquid container 40 .

The base ends of the pair of terminals 51 are electrically connected to the measuring instrument 52 via a conducting wire or the like. The measuring instrument 52 may be, for example, an ohmmeter (tester). As illustrated in FIG. 4 , when the treatment liquid L is a conductive liquid, when the liquid column of the treatment liquid L dummy discharged from the nozzle 24 comes into contact with the pair of terminals 51 , a closed circuit is formed. configured, and the current is detected by the measuring instrument 52 . Therefore, the detection unit 50 is configured to detect whether the processing liquid L has contacted the tip portions of the pair of terminals 51 . That is, whether or not the processing liquid L has passed through the detection space near the inner peripheral surface of the liquid container 40 is detected by the pair of terminals 51 positioned near the inner peripheral surface of the liquid container 40 . can do.

As illustrated in FIGS. 3 and 4A , two detection units 50 are disposed above the liquid receiving unit 40 . These two detection units 50 (hereinafter, sometimes referred to as "detection unit 50A") face each other with respect to the center of the liquid container 40 and in the X direction (the direction of rotation of the nozzle 24). are arranged according to The terminals 51 of the two detection units 50A may be located at substantially the same height on the inner peripheral surface of the liquid container 40 . With these two detection units 50A, it is possible to detect a shift in the dummy discharge position in the turning direction of the nozzle 24 .

As illustrated in FIGS. 3 and 4 ( b ) , four detection units 50 are disposed below the liquid receiving unit 40 . Among these, two detection units 50 (hereinafter, sometimes referred to as “detection units 50B”) face each other with respect to the center of the liquid container 40 , and in the X direction (the turning direction of the nozzle 24 ). ) are arranged along the With these two detection parts 50B, it is possible to detect the shift|offset|difference of the dummy discharge position in the turning direction of the nozzle 24. As shown in FIG. On the other hand, the two remaining detection units 50 (hereinafter referred to as "detection unit 50C" in some cases) face each other with respect to the center of the liquid container 40 and in the Y direction (nozzle arm 33). are arranged along the long side of the With these two detection parts 50C, it is possible to detect the shift|offset|difference of the dummy discharge position in the longitudinal direction of the nozzle arm 33. As shown in FIG. The terminals 51 of these four detection units 50B and 50C may be located at substantially the same height position on the inner peripheral surface of the liquid container 40 .

[Details of the controller]

As shown in FIG. 5 , the controller Ctr has, as a function module, a reading unit M1 , a storage unit M2 , a processing unit M3 , and an instruction unit M4 . These function modules are nothing more than dividing the functions of the controller Ctr into a plurality of modules for convenience, and do not necessarily mean that the hardware constituting the controller Ctr is divided into these modules. Each function module is not limited to being realized by execution of a program, and may be realized by a dedicated electric circuit (eg, a logic circuit) or an integrated circuit (ASIC: Application Specific Integrated Circuit) integrating the same. .

The reading unit M1 is configured to read a program from the computer-readable recording medium RM. The recording medium RM records a program for operating each unit of the substrate processing apparatus 1 including the processing unit 2 . The recording medium RM may be, for example, a semiconductor memory, an optical recording disk, a magnetic recording disk, or a magneto-optical recording disk. In addition, below, each part of the substrate processing apparatus 1 may include the holding part 10 , the supply part 20 , and the driving part 30 .

The storage unit M2 is configured to store various types of data. The storage unit M2 may store, for example, a program read from the recording medium RM in the reading unit M1, setting data input from an operator via an external input device (not shown), and the like. The storage unit M2 includes data regarding the rotational position from the encoder 34 of the driving unit 30 , data regarding the origin position from the position sensor 35 of the driving unit 30 , and processing liquid from the detection unit 50 . The detection data of (L) and the like may be stored. The storage unit M2 may store processing conditions for processing the substrate W and the like.

The processing unit M3 is configured to process various data. The processing unit M3 may generate, for example, a signal for operating each unit of the substrate processing apparatus 1 based on various data stored in the storage unit M2 .

The instruction unit M4 is configured to transmit the operation signal generated by the processing unit M3 to each unit of the substrate processing apparatus 1 .

The hardware of the controller Ctr may be configured by, for example, one or a plurality of control computers. The controller Ctr may include the circuit C1 as a configuration on hardware, as shown in FIG. 6 . The circuit C1 may be constituted by an electric circuit element (circuitry). The circuit C1 may include, for example, a processor C2 , a memory C3 , a storage C4 , a driver C5 , and an input/output port C6 .

The processor C2 executes a program in cooperation with at least one of the memory C3 and the storage C4, and executes input/output of signals through the input/output port C6, so as to realize each of the above-described functional modules, there may be The memory C3 and the storage C4 may function as the storage unit M2 . The driver C5 may be a circuit configured to respectively drive each unit of the substrate processing apparatus 1 . The input/output port C6 may be configured to mediate input/output of signals between the driver C5 and each unit of the substrate processing apparatus 1 .

The substrate processing apparatus 1 may be equipped with one controller Ctr, and may be equipped with the controller group (control part) comprised by the some controller Ctr. When the substrate processing apparatus 1 is provided with a controller group, each of the above-mentioned function modules may be realized by one controller Ctr, or may be realized by a combination of two or more controllers Ctr. . When the controller Ctr is composed of a plurality of computers (circuit C1), each of the above function modules may be realized by one computer (circuit C1), or two or more computers (circuit C1). It may be realized by a combination of C1)). The controller Ctr may have a plurality of processors C2. In this case, each of the above functional modules may be realized by one processor C2, or may be realized by a combination of two or more processors C2.

[Initial measurement processing]

Next, with reference to FIG.7 and FIG.8, the initial stage measurement process is demonstrated. At this time, the nozzle 24 shall be in the initial state suitably installed in the nozzle arm 33 by an operator. That is, it is assumed that no abnormality has occurred in the nozzle 24 .

First, the controller Ctr instructs the driving unit 30 to position the turning shaft 32 to the origin position (refer to step S11 in Fig. 7). At this time, as illustrated in FIG. 8A , the nozzle 24 is located above the opening 41 of the liquid receiving part 40 . Next, the controller Ctr instructs the supply unit 20 to dummy discharge the processing liquid L from the nozzle 24 (refer to step S12 in FIG. 7 ).

In this state, the controller Ctr instructs the driving unit 30 and the nozzle arm until the liquid column of the processing liquid L dummy discharged from the nozzle 24 is detected by one detection unit 50A. (33) is turned (refer to step S13 of FIG. 7 and arrow Ar1 of FIG. 8(b)). The controller Ctr calculates the distance a from the origin position to the detection position where the liquid column of the processing liquid L is detected in one detection unit 50A based on the data received from the encoder 34 . (refer to step S13 of FIG. 7). Similarly, by rotating the nozzle arm 33 with respect to the other detection unit 50A (refer to arrow Ar2 in FIG. 8B ), the controller Ctr moves the liquid column of the processing liquid L from the origin position. You may calculate the distance b to the detection position detected in 50A of this other detection part. In addition, instead of the detection part 50A, you may calculate the distance from the origin position to the detection position where the process liquid L was detected in the detection part 50B.

[Anomaly detection method]

Next, with reference to FIG.9 and FIG.10, the detection method (substrate processing method) of the abnormal state of a nozzle is demonstrated. At this time, as illustrated in FIG. 10 , an abnormality that the position and posture of the nozzle 24 change occurs in the nozzle 24 , and the processing liquid L dummy discharged from the nozzle 24 is oblique with respect to the vertical direction. It is assumed that it is tilted sharply.

First, the controller Ctr instructs the drive unit 30 to position the turning shaft 32 at the origin position (refer to step S21 in Fig. 9). As described above, since the nozzle 24 is in an abnormal state, even if the turning shaft 32 is located at the origin position, the dummy discharge position of the processing liquid L from the nozzle 24 (FIG. ) is different from the dummy discharge position when the nozzle 24 is in the initial state (refer to FIG. 8A ). Next, the controller Ctr instructs the supply unit 20 to dummy discharge the processing liquid L from the nozzle 24 (refer to step S22 in FIG. 9 ).

In this state, the controller Ctr determines whether the detection unit 50C has detected the processing liquid L (refer to step S23 in FIG. 9 ). When the detection unit 50C detects the processing liquid L (refer to “Yes” in step S23 of FIG. 9 ), the dummy discharge position is shifted in the longitudinal direction of the nozzle arm 33 . That is, the controller Ctr determines that the nozzle 24 is in an abnormal state. In general, the nozzle arm 33 is not configured to move forward and backward in the longitudinal direction thereof, and the displacement of the dummy discharge position in the Y direction cannot be corrected. Therefore, in this case, maintenance by an operator, such as replacement|exchange of the nozzle 24, is performed (refer step S24 of FIG. 9), and the detection process of an abnormal state is complete|finished.

On the other hand, when the detection unit 50C does not detect the processing liquid L (refer to “No” in step S23 of FIG. 9 ), the controller Ctr instructs the driving unit 30 to output the dummy from the nozzle 24 . The nozzle arm 33 is rotated until the liquid column of the discharged processing liquid L is detected by one detection unit 50A (see step S25 in Fig. 9 and arrow Ar3 in Fig. 10B). Reference). The controller Ctr calculates, based on the data received from the encoder 34 , the distance a' from the origin position to the detection position where the liquid column of the processing liquid L is detected by one detection unit 50A. (refer to step S26 of FIG. 9). Similarly for the other detection unit 50A, by rotating the nozzle arm 33 (refer to arrow Ar4 in FIG. 10B ), the controller Ctr moves the liquid column of the processing liquid L from the origin position. You may calculate the distance b' to the detection position detected in 50A of this other detection part.

Next, the controller Ctr calculates the difference value δ between the distance a calculated in step S13 and the distance a' calculated in step S26 (refer to step S27 in FIG. 9 ). The closer the difference value δ is to 0, the smaller the deviation from the dummy discharge position in the initial state of the nozzle 24 is. Then, the controller Ctr determines whether or not the difference value δ exceeds a predetermined allowable range (for example, whether the difference value δ is outside the range of ±3 mm) (refer to step S28 in FIG. 9 ). When it is determined that the difference value ? exceeds a predetermined allowable range (refer to "Yes" in step S28 of Fig. 9), the correction described later tends to become difficult. Therefore, in this case, maintenance by an operator, such as replacement|exchange of the nozzle 24, is performed (refer step S24 of FIG. 9), and the abnormal state detection process is complete|finished.

On the other hand, when it is determined that the difference value δ is within the predetermined allowable range (refer to “No” in step S28 of FIG. 9 ), the controller Ctr corrects the origin position based on the difference value δ (see FIG. 9 ). see step S29). Specifically, the controller Ctr regards a position shifted from the origin position by the magnitude of the difference value δ as a new origin position, and supplies the processing liquid L to the substrate W for subsequent processing (eg, supplying the processing liquid L to the substrate W). processing) is performed. Due to the above, the abnormal state detection process ends.

[Action]

According to the above example, when the detection unit 50C detects the processing liquid L dummy discharged from the nozzle 24 despite the nozzle arm 33 being positioned at the origin position, the controller Ctr 24) can be detected.

According to the above example, the detection unit 50 includes a pair of terminals 51 and a measuring instrument 52 . Therefore, it becomes possible to detect the abnormality of the nozzle 24 with high precision using the detection part 50 of a simple structure.

According to the above example, the pair of detection units 50A, the pair of detection units 50B, and the pair of detection units 50C positioned at substantially the same height on the inner peripheral surface of the liquid containing unit 40 include the liquid containing unit 40 . ) is provided. Therefore, it is possible to detect a shift in the dummy discharge position in a plurality of horizontal directions (X direction and Y direction). Therefore, it becomes possible to detect the abnormality of the nozzle 24 more accurately.

According to the above example, by comparing the difference value ? with a predetermined allowable range, a state in which the degree of deviation of the dummy discharge position is relatively large can be identified as an abnormal state. Therefore, it becomes possible to detect the abnormality of the nozzle 24 more accurately.

According to the above example, since the origin position is corrected using the difference value δ when the displacement of the dummy discharge position is not too large, the substrate processing can be continued without stopping the substrate processing apparatus 1 and performing maintenance. Therefore, it becomes possible to improve the productivity of a substrate processing.

[Variation]

It should be considered that the indication in this specification is an illustration and is not restrictive in every point. Various abbreviations, substitutions, changes, etc. may be made with respect to the above example in the range which does not deviate from a claim and its summary.

(1) The technique of the present disclosure can be applied not only when the processing liquid L dummy discharged from the nozzle 24 is along the vertical direction but also when it is inclined with respect to the vertical direction. For example, as illustrated in FIG. 3 , by using the detection units 50A and 50B arranged side by side in the vertical direction, whether the processing liquid L dummy discharged from the nozzle 24 is inclined with respect to the vertical direction. whether or not it can be detected. Specifically, when one of the detection units 50A and 50B detects the processing liquid L but the other does not, the processing liquid L dummy discharged from the nozzle 24 is inclined with respect to the vertical direction. It can be judged that there is Alternatively, by varying the protrusion amount of the terminal 51 of the detection units 50A and 50B, it may be determined whether the processing liquid L dummy discharged from the nozzle 24 is at a predetermined angle.

(2) As shown in FIG. 11 , the processing liquid L dummy discharged from the nozzle 24 is disposed in the vertical direction by using a pair of detection units 50A and 50B located at the top and bottom and facing each other when viewed from above. You may calculate the angle (theta) in the case of inclination with respect to . Specifically, parameters A, B, Y are each,

A: In an abnormal case, the movement distance of the nozzle arm 33 from the origin position until the processing liquid L is detected by the detection unit 50A.

B: the movement distance of the nozzle arm 33 from the origin position until the processing liquid L is detected by the detection unit 50B in an abnormal case

Y: the separation distance between the detection units 50A and 50B

When defined as , the angle θ is defined by the following equation.

The controller Ctr may use the calculated angle θ to correct the position of the nozzle 24 in consideration of the inclination of the processing liquid L dummy discharged from the nozzle 24 .

(3) In the above example, the nozzle 24 was configured to swing and move around the swing shaft 32 as a central axis, but the nozzle 24 may be configured to be movable in any direction along the horizontal.

(4) The measuring instrument 52 may be, for example, a capacitance meter. In this case, when the processing liquid L comes into contact with the pair of terminals 51 , the charge previously accumulated in the capacitor decreases. Therefore, whether or not the processing liquid L has passed through the detection space in the vicinity of the inner peripheral surface of the liquid container 40 can be detected by whether or not a change in electric potential accompanying the decrease in the inversion is detected.

(5) You may use the detection part 50 illustrated in Fig.12 (a). The detection unit 50 is provided so as to seal between the displacement member 53 inserted into the through hole 40a provided in the peripheral wall of the liquid container 40 and the displacement member 53 and the through hole 40a. The elastic film material 54 and the mechanical switch 55 may be included. When the processing liquid L dummy discharged from the nozzle 24 comes into contact with the distal end of the displacement member 53 , the displacement member 53 is pushed down, so that the on/off of the mechanical switch 55 is switched. Accordingly, the detection unit 50 can detect whether the processing liquid L dummy discharged from the nozzle 24 has passed through the detection space. The detection unit 50 may include a load sensor 56 instead of the mechanical switch 55 or in addition to the mechanical switch 55 . When the processing liquid L dummy discharged from the nozzle 24 comes into contact with the distal end of the displacement member 53 , the displacement member 53 is pushed down, so that the displacement member 53 and the load sensor 56 are connected. The elastic member (spring member) 56a is tensioned. Therefore, a load acts on the load sensor 56 . Accordingly, the detection unit 50 can detect whether the processing liquid L dummy discharged from the nozzle 24 has passed through the detection space due to a change in the load detected by the load sensor 56 .

(6) You may use the detection part 50 illustrated in FIG.12(b). The detection unit 50 includes a light emitter 57 and a light receiver 58 . When the light from the light emitter 57 is obstructed by the processing liquid L and cannot be detected by the light receiver 58, whether the processing liquid L dummy discharged from the nozzle 24 has passed through the detection space Whether or not, the detection unit 50 may detect.

(7) In the above example, the nozzle 24 is moved with respect to the detection unit 50 by turning the nozzle arm 33 , but the liquid container 40 itself may be horizontally moved or the detection unit 50 may be horizontally moved. may be moved. Also in these cases, it is possible to detect the degree of displacement of the dummy discharge position with high accuracy in accordance with a change in the amount of movement of the liquid container 40 or the detection unit 50 .

(8) The controller Ctr may associate the difference value δ with the date and time when the difference value δ was calculated and store it as time series data. The controller Ctr may estimate the kind of the abnormal state of the nozzle 24 based on the said time series data. Specifically, in the case of time series data in which the difference value δ increases in one direction with the passage of time, factors such as deterioration of the nozzle 24 or the nozzle arm 33 or deformation of the nozzle 24, for example. , it is estimated that the dummy discharge position is gradually shifted. When the difference value δ increases or decreases (vibrates) with the passage of time, it is estimated that the nozzle 24, the nozzle arm 33, or the like vibrated, for example, due to factors such as loosening of the screw. If the kind of these abnormal states can be estimated, the maintenance policy can be predicted. Therefore, the time required for the maintenance of the substrate processing apparatus 1 can be shortened. Accordingly, it becomes possible to increase the productivity of substrate processing.

(9) You may periodically perform the process of detecting abnormality of the nozzle 24 (at least steps S21, S22, S24 to S29 in FIG. 9). At this time, step S24 may be included in the periodic process. Periodicity may be, for example, every time several thru|or several dozen sheets of the board|substrate W are processed, and every predetermined time interval may be sufficient as it. In this case, it is possible to continuously monitor whether an abnormal state has occurred in the nozzle 24 . Therefore, it becomes possible to detect the abnormal state of the nozzle 24 early, without greatly impairing the productivity of a substrate processing.

(10) When the controller Ctr determines that the nozzle 24 is in an abnormal state, it may notify an alarm. Therefore, the substrate processing apparatus 1 may further be provided with the notification device which performs notification by sound, character display on a screen, light, etc., for example. In this case, the operator can grasp early that an abnormal state has occurred in the nozzle 24 .

[Another example]

Example 1. An example of a substrate processing apparatus includes a holding unit configured to hold a substrate, a supply unit including a nozzle configured to supply a processing liquid to the surface of the substrate held by the holding unit, and a process dummy discharged from the nozzle configured to move the nozzle between the liquid accommodating part and the upper side of the substrate held by the holding part by driving a liquid accommodating part including an opening opened upwardly to receive a liquid, and a nozzle arm which supports the nozzle. A driving unit, a detection unit disposed in the liquid receiving unit, and a control unit are provided. The detection unit is configured to detect whether the processing liquid dummy discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid container. The control unit includes a first process of controlling the driving unit so that the nozzle arm is positioned at a preset origin position inside the opening, and the processing liquid dummy discharged from the nozzle passes through the detection space while the nozzle arm is positioned at the origin position It is configured to execute a second process for determining that the nozzle is in an abnormal state, when the detection unit detects one. In general, in the initial state in which the nozzle is properly set with respect to the nozzle arm, when the nozzle arm is positioned at the origin position, the processing liquid dummy discharged from the nozzle passes through the inner space inside the detection space among the openings of the liquid accommodating part; The origin position is adjusted by the operator. Therefore, when the detection unit detects that the processing liquid dummy discharged from the nozzle has passed through the detection space even though the nozzle arm is positioned at the origin position, the dummy discharge position of the processing liquid from the nozzle is shifted. That is, the discharge port of the nozzle faces in a direction different from the initial state, or the discharge port of the nozzle is positioned deviated from the initial state. Therefore, it becomes possible to detect abnormality of a nozzle by a control part determining the state of a nozzle based on the detection signal from a detection part.

Example 2. The apparatus of Example 1, wherein the detection unit includes a pair of terminals provided in the liquid container to protrude from the inner circumferential surface of the liquid container and to be spaced apart from each other, and a measuring device configured to measure a current or voltage between the pair of terminals. and detecting whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on a change in a value in the measuring instrument when the pair of terminals are electrically connected to the processing liquid discharged from the nozzle. may be composed. In this case, it becomes possible to detect abnormality of a nozzle using the detection part of a simple structure.

Example 3. The apparatus of Example 1, wherein the detection unit includes a displacement member provided in the liquid container to protrude from the inner peripheral surface of the liquid container and to be displaceable in the vertical direction, and a displacement detector configured to detect the displacement of the displacement member, , may be configured to detect whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on a detection result of the displacement detector when the processing liquid dummy discharged from the nozzle comes into contact with the displacement member. In this case, the same effect as that of the device of Example 2 is obtained.

Example 4. The apparatus of example 1, wherein the detecting unit includes a light projector configured to irradiate light into the liquid receiving unit, and a light receiving unit facing the light transmitting unit and disposed at a position capable of receiving light from the light transmitting unit, and the light receiving unit includes: It may be configured to detect whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on the presence or absence of light reception from the light projector. In this case, the same effect as that of the device of Example 2 is obtained.

Example 5. The apparatus according to any of Examples 1 to 4 may further include another detection unit disposed in the liquid container so as to be positioned at substantially the same height as the detection part on the inner peripheral surface of the liquid container. In this case, shifts in the dummy discharge positions in a plurality of directions along the horizontal can be detected by using the plurality of detection units. Therefore, it becomes possible to detect the abnormality of a nozzle with more high precision.

Example 6. The apparatus according to any of Examples 1 to 5 may further include another driving unit configured to change the horizontal position of the liquid container or the amount of protrusion of the detection part from the inner peripheral surface of the liquid container. In this case, the displacement of the dummy discharge position can be detected by horizontally moving the liquid accommodating unit or changing the amount of protrusion of the detection unit until the detection unit detects the dummy discharge processing liquid. Therefore, it is possible to accurately detect the degree of displacement of the dummy discharge position in accordance with a change in the amount of movement of the liquid container or the amount of protrusion of the detection portion.

Example 7. The apparatus according to any one of Examples 1 to 6, wherein the detection unit detects that the processing liquid discharged from the nozzle has passed through the detection space from the origin position while the control unit controls the supply unit to discharge the processing liquid from the nozzle. a third process for controlling the drive unit to move the nozzle arm to the detection position, a fourth process for calculating the movement distance of the nozzle arm from the origin position to the detection position, and the origin position when the nozzle is in the initial state and a fifth process for calculating a difference value between the distance to the detection position and the movement distance, and a sixth process for determining that the nozzle is in an abnormal state when the difference value exceeds a predetermined allowable range; there may be In this case, by comparing the difference value with the allowable range, a state in which the degree of deviation of the dummy discharge position is relatively large can be identified as an abnormal state. Therefore, it becomes possible to detect the abnormality of a nozzle with more high precision.

Example 8. The apparatus of example 7, wherein, when the movement distance is within the allowable range, the control unit may be configured to further execute a seventh process of correcting the origin position based on the difference value. By correcting the origin position when the displacement of the dummy discharge position is not too large, the substrate processing can be continued without stopping the apparatus and performing maintenance. Therefore, it becomes possible to improve the productivity of a substrate processing.

Example 9. In the apparatus of Example 8, the control unit estimates the type of abnormal state of the nozzle based on the eighth process of storing the difference value as time series data in association with the date and time the difference value was calculated, and the time series data You may be comprised so that the ninth process may further be performed. In this case, the maintenance policy can be predicted according to the kind of the estimated abnormal state of a nozzle. Therefore, the time required for the maintenance of the apparatus can be shortened. Accordingly, it becomes possible to increase the productivity of substrate processing.

Example 10. The apparatus according to any one of Examples 7 to 9, wherein the control unit may be configured to periodically execute a series of processes including the first process, the third process, and the fourth process. In this case, it is possible to continuously monitor whether an abnormal state has occurred in the nozzle. Therefore, it becomes possible to detect the abnormal state of a nozzle early, without impairing the productivity of a substrate processing significantly.

Example 11. The apparatus according to any one of Examples 1 to 10, wherein the control unit may be configured to further execute a tenth process of notifying an alarm when it is determined that the nozzle is in an abnormal state. In this case, the operator can early recognize that an abnormal state has occurred in the nozzle.

Example 12. The apparatus according to any of Examples 1 to 11 may include another detection unit disposed in the liquid container so as to be positioned at a different height from the detection part on the inner peripheral surface of the liquid container. In this case, according to the detection state of the processing liquid dummy discharged from the nozzles in these two detection units, it is possible to determine whether the processing liquid is inclined with respect to the vertical direction and the angle of the inclination thereof.

Example 13. In the apparatus of example 12, the detection unit and the other detection unit are arranged side by side in the vertical direction, and the control unit determines whether the processing liquid dummy discharged from the nozzle has passed through the detection space, either the detection unit or the other detection unit. If this is detected but the other does not, the eleventh process of determining that the processing liquid dummy discharged from the nozzle is inclined with respect to the vertical direction may be executed.

Example 14 In one example of the substrate processing method, a nozzle arm supporting a nozzle configured to supply a processing liquid to a surface of a substrate held by the holding unit is an opening of the liquid receiving unit, and receives the processing liquid discharged from the nozzle dummy. a first step of arranging at a predetermined origin position inside the opening opened upward so that, with the nozzle arm positioned at the origin position, the processing liquid dummy discharged from the nozzle is detected in the vicinity of the inner peripheral surface of the liquid container and a second step of determining that the nozzle is in an abnormal state when the detection unit disposed in the liquid container detects that it has passed through the space. In this case, the same effect as that of the device of Example 1 is obtained.

Example 15. The method of Example 14 includes a third step of moving the nozzle arm from the origin position to a detection position where the detection unit detects that the processing liquid discharged from the nozzle has passed through the detection space while discharging the processing liquid from the nozzle; , a fourth step of calculating the movement distance moved by the nozzle arm from the origin position to the detection position, and a fifth step of calculating a difference value between the distance from the origin position to the detection position when the nozzle is in the initial state and the movement distance and a sixth step of determining that the nozzle is in an abnormal state when the difference value exceeds a predetermined allowable range. In this case, the same operational effects as those of the device of Example 7 are obtained.

Example 16. The method of Example 15 may further include a seventh step of correcting the origin position based on the difference value when the movement distance is within the allowable range. In this case, the same operation and effect as the apparatus of Example 8 is obtained.

Example 17. The method of Example 16 includes an eighth step of storing the difference value as time series data in association with the date and time the difference value was calculated, and a ninth step of estimating the type of abnormal state of the nozzle based on the time series data may contain more. In this case, the same effect as the apparatus of Example 9 is obtained.

Example 18. In the method of any one of Examples 15 to 17, a series of steps including the first step, the third step, and the fourth step may be periodically performed. In this case, the same effects as those of the device in Example 10 are obtained.

Example 19. The method in any one of Examples 14-18 may further include the 10th process of notifying an alarm when it is judged that a nozzle is in an abnormal state. In this case, the same operational effects as the apparatus of Example 11 are obtained.

Example 20. In the method of any of Examples 14 to 19, one of the detection unit and the other detection unit detects that the processing liquid discharged dummy from the nozzle has passed through the detection space with the nozzle arm positioned at the origin position, but the other The method further includes an eleventh step of determining that the processing liquid discharged dummy from the nozzle is inclined with respect to the vertical direction when not detected, and the other detection unit is located at a different height from the detection unit on the inner circumferential surface of the liquid container. Moreover, it may be arrange|positioned in the liquid accommodating part so that it may be arranged in an up-down direction with a detection part. In this case, the same effects as those of the device in Example 13 are obtained.

Example 21. As an example of the computer-readable recording medium, a program for causing the substrate processing apparatus to execute any method of Examples 14 to 20 may be recorded. In this case, the same effect as that of the device of Example 1 is obtained. In the present specification, a computer-readable recording medium is a non-transitory computer recording medium (eg, various main memory devices or auxiliary storage devices) or a radio signal (transitory computer recording medium) (eg, a non-transitory computer recording medium) For example, a data signal that can be provided through a network) may be included.

Claims (20)

a holding portion configured to hold the substrate;
a supply unit including a nozzle configured to supply a processing liquid to the surface of the substrate held by the holding unit;
a liquid accommodating part including an opening opened upward to receive the processing liquid dummy discharged from the nozzle;
a driving unit configured to move the nozzle between the liquid accommodating unit and an upper side of the substrate held by the holding unit by driving a nozzle arm supporting the nozzle;
a detection unit disposed in the liquid receiving unit;
having a control unit,
The detection unit is configured to detect whether the processing liquid dummy discharged from the nozzle has passed through a detection space near the inner peripheral surface of the liquid container,
The control unit is
a first process of controlling the driving unit so that the nozzle arm is located at a preset origin position inside the opening;
a second process of determining that the nozzle is in an abnormal state when the detection unit detects that the processing liquid dummy discharged from the nozzle has passed through the detection space with the nozzle arm positioned at the origin position; A substrate processing apparatus, configured to be executed. According to claim 1, wherein the detection unit,
a pair of terminals protruding from the inner circumferential surface of the liquid receiving portion and provided in the liquid receiving portion to be spaced apart from each other;
a meter configured to measure a current or voltage between the pair of terminals;
Whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on a change in the value of the measuring device when the pair of terminals are electrically connected to the processing liquid discharged from the nozzle A device configured to detect whether According to claim 1, wherein the detection unit,
a displacement member provided in the liquid container to protrude from the inner circumferential surface of the liquid container and to be displaceable in the vertical direction;
a displacement detector configured to detect displacement of the displacement member;
to detect whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on a detection result of the displacement detector when the processing liquid dummy discharged from the nozzle comes into contact with the displacement member configured device. According to claim 1, wherein the detection unit,
a light projector configured to irradiate light into the liquid accommodating part;
and a light receiver facing the light emitter and disposed at a position capable of receiving light from the light emitter,
and detect whether or not the processing liquid dummy discharged from the nozzle has passed through the detection space, based on whether or not light is received from the light projector by the light receiver. The apparatus according to any one of claims 1 to 4, further comprising another detection unit disposed in the liquid container so as to be positioned at substantially the same height as the detection part on an inner peripheral surface of the liquid container. 5. The apparatus according to any one of claims 1 to 4, further comprising another drive unit configured to change a horizontal position of the liquid container or the amount of protrusion of the detection part from the inner peripheral surface of the liquid container. According to any one of claims 1 to 4, wherein the control unit,
While controlling the supply unit to discharge the processing liquid from the nozzle, the nozzle arm is moved from the origin position to a detection position where the detection unit detects that the processing liquid discharged from the nozzle has passed through the detection space. a third process of controlling the driving unit to
a fourth process of calculating a movement distance of the nozzle arm from the origin position to the detection position;
a fifth process of calculating a difference value between the distance from the origin position to the detection position and the movement distance when the nozzle is in the initial state;
and execute a sixth process for judging that the nozzle is in an abnormal state when the difference value exceeds a predetermined allowable range. The apparatus according to claim 7, wherein the control unit is configured to further execute a seventh process of correcting the origin position based on the difference value when the movement distance is within the allowable range. The method of claim 8, wherein the control unit,
an eighth process of storing the difference value as time series data in association with the date and time at which the difference value was calculated;
and perform a ninth process of estimating the type of the abnormal state of the nozzle based on the time series data. The apparatus according to claim 7, wherein the control unit is configured to periodically execute a series of processes including the first process, the third process, and the fourth process. The apparatus according to any one of claims 1 to 4, wherein the control unit is further configured to execute a tenth process of notifying an alarm when it is determined that the nozzle is in an abnormal state. 5. The apparatus according to any one of claims 1 to 4, further comprising another detection part disposed in the liquid container so as to be located at a different height from the detection part on the inner peripheral surface of the liquid container. The method according to claim 12, wherein the detection unit and the another detection unit are arranged side by side in the vertical direction,
The control unit may include, when one of the detection unit and the other detection unit detects that the processing liquid discharged dummy from the nozzle has passed through the detection space, but the other does not, the processing liquid discharged dummy from the nozzle An apparatus configured to execute an eleventh process for determining that the liquid is inclined with respect to the vertical direction. A nozzle arm for supporting a nozzle configured to supply a processing liquid to the surface of the substrate held by the holding portion is an opening of the liquid receiving portion, the opening opened upward to receive the processing liquid dummy discharged from the nozzle A first step of arranging at a predetermined origin position inside the
When the detection unit disposed in the liquid container detects that the processing liquid dummy discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid container while the nozzle arm is positioned at the origin, and a second step of determining that the nozzle is in an abnormal state. The nozzle arm according to claim 14, wherein while discharging the processing liquid from the nozzle, the nozzle arm is moved from the origin position to a detection position where the detection unit detects that the processing liquid discharged from the nozzle has passed through the detection space. a third process of making
a fourth step of calculating a movement distance of the nozzle arm from the origin position to the detection position;
a fifth step of calculating a difference value between the distance from the origin position to the detection position and the movement distance when the nozzle is in the initial state;
and a sixth step of determining that the nozzle is in an abnormal state when the difference value exceeds a predetermined allowable range. The method according to claim 15, further comprising a seventh step of correcting the origin position based on the difference value when the movement distance is within the allowable range. 17. The method according to claim 16, further comprising: an eighth step of storing the difference value as time series data in association with the date and time at which the difference value was calculated;
A method further comprising a ninth step of estimating the type of the abnormal state of the nozzle based on the time series data. The method according to any one of claims 15 to 17, wherein a series of steps including the first step, the third step, and the fourth step are periodically performed. The method according to any one of claims 14 to 17, further comprising a tenth step of notifying an alarm when it is determined that the nozzle is in an abnormal state. The detection unit and another detection unit according to any one of claims 14 to 17, wherein the detection unit and another detection unit detect that the processing liquid dummy discharged from the nozzle has passed through the detection space while the nozzle arm is positioned at the origin position. an eleventh step of determining that the treatment liquid dummy discharged from the nozzle is inclined with respect to a vertical direction when one detects it but the other does not,
The method in which the another detection unit is located on an inner circumferential surface of the liquid storage unit at a different height from the detection unit and is disposed in the liquid storage unit so as to be aligned with the detection unit in an up-down direction.

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