JP2022118910A - Substrate processing apparatus, substrate processing method and computer readable recording medium - Google Patents

Abstract

To provide a substrate processing apparatus, a substrate processing method and a computer readable recording medium, in which abnormality of a nozzle can be detected, in the present disclosure.SOLUTION: A substrate processing apparatus comprises: a supply section that includes a nozzle; a liquid receiving section that includes an opening which receives a process liquid dummy-discharged from the nozzle; a driving section that is configured to drive a nozzle arm supporting the nozzle; a detection section that is arranged on the liquid receiving section; and a control section. The detection section is configured to detect whether or not the process liquid dummy-discharged from the nozzle passes through a detection space near an inner peripheral surface of the liquid receiving section. The control section is configured to perform: first processing for a nozzle arm to control the driving section to be positioned at an origin position preliminarily preset in an inside of the opening; and second processing for the nozzle arm to determine that the nozzle is in an abnormal state when the detection section detects that the process liquid dummy-discharged from the nozzle passes through the detection space in a state where the nozzle arm is positioned at the origin position.SELECTED DRAWING: Figure 3

Description

The present disclosure relates to substrate processing apparatuses, substrate processing methods, and computer-readable recording media.

Patent Literature 1 discloses a substrate processing apparatus. The substrate processing apparatus includes a suction spin chuck configured to hold a substrate in rotation; a nozzle configured to supply a processing liquid to the surface of the substrate held by the spin chuck; a moving mechanism configured to move the nozzle.

JP-A-11-005056

If an operator accidentally touches the nozzle during maintenance of the equipment, or if the nozzle accidentally touches another element of the equipment as the nozzle moves, the nozzle will become abnormal (for example, the nozzle may become deformed). , the orientation of the nozzle changes, etc.). At this time, the position of the processing liquid ejected from the nozzle onto the substrate may shift, and the substrate processing different from the setting may be executed.

Accordingly, the present disclosure describes a substrate processing apparatus, a substrate processing method, and a computer-readable recording medium capable of detecting abnormalities in nozzles.

An example of a substrate processing apparatus includes a holding portion configured to hold a substrate, a supply portion including a nozzle configured to supply a processing liquid to a surface of the substrate held by the holding portion, and By driving a liquid receiving section including an opening that is open upward to receive the dummy-discharged treatment liquid and a nozzle arm that supports the nozzle, the upper side of the substrate held by the holding section and the liquid are driven. A drive section configured to move the nozzle to and from the receiving section, a detection section arranged in the liquid receiving section, and a control section. The detection section is configured to detect whether or not the processing liquid dummy-discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid receiving section. The control unit performs a first process of controlling the drive unit so that the nozzle arm is positioned at a preset origin position inside the opening, and performs dummy ejection from the nozzle while the nozzle arm is positioned at the origin position. and a second process of determining that the nozzle is in an abnormal state when the detection unit detects that the processing liquid has passed through the detection space.

According to the substrate processing apparatus, substrate processing method, and computer-readable recording medium according to the present disclosure, it is possible to detect an abnormality in the nozzle.

FIG. 1 is a diagram schematically showing an example of a substrate processing apparatus. FIG. 2 is a top view schematically showing an example of the processing unit. FIG. 3 is a perspective view schematically showing an example of a liquid receiver. 4(a) is a cross-sectional view taken along line IVA-IVA of FIG. 3, and FIG. 4(b) is a cross-sectional view taken along line IVB-IVB of FIG. FIG. 5 is a block diagram showing an example of the main part of the substrate processing apparatus. FIG. 6 is a schematic diagram showing an example of the hardware configuration of the controller. FIG. 7 is a flowchart showing an example of the procedure of initial measurement processing. FIG. 8 is a diagram for explaining an example of the procedure of initial measurement processing. FIG. 9 is a flowchart illustrating an example of a procedure for detecting an abnormal state. FIG. 10 is a diagram for explaining an example of the procedure of abnormal state detection processing. FIG. 11 is a diagram for explaining a method of calculating the angle of the treatment liquid discharged obliquely from the nozzle. FIG. 12 is a diagram showing another example of the detection unit.

In the following description, the same reference numerals will be used for the same elements or elements having the same functions, and redundant description will be omitted. In this specification, the top, bottom, right, and left of the drawings are based on the directions of the symbols in the drawings.

[Substrate processing equipment]
First, the configuration of the substrate processing apparatus 1 will be described with reference to FIGS. 1 to 5. FIG. The substrate processing apparatus 1 is configured to process the substrate W by supplying the processing liquid L to the substrate W, for example. The processing liquid L may be, for example, a cleaning liquid for cleaning the surface of the substrate W, or a rinsing liquid for washing away liquid, dissolved components, residues, etc. remaining on the surface of the substrate W. , a coating liquid for forming a film on the surface of the substrate W, or a developer for developing a resist film. That is, the substrate processing apparatus 1 may be a substrate cleaning apparatus or a coating/developing apparatus.

The cleaning liquid may contain, for example, an alkaline or acidic chemical solution, or may contain an organic solvent. The alkaline chemical solution may contain, for example, SC-1 solution (a mixed solution of ammonia, hydrogen peroxide and pure water). Acidic chemicals include, for example, SC-2 liquid (mixture of hydrochloric acid, hydrogen peroxide and pure water), SPM (mixture of sulfuric acid and hydrogen peroxide), HF/HNO ₃ (hydrofluoric acid and nitric acid). mixture) and the like. The organic solvent may contain IPA (isopropyl alcohol), for example. The rinse liquid may contain, for example, pure water (DIW: deionized water), ozone water, carbonated water ( _CO2 water), ammonia water, and the like. Among the above examples, SC-1 liquid, SC-2 liquid, SPM, carbonated water, etc. exhibit conductivity. On the other hand, IPA, pure water, etc. do not exhibit conductivity.

The substrate W may have a disk shape, or may have a plate shape other than a circular shape such as a polygon. The substrate W may have a cutout portion that is partially cut out. The notch may be, for example, a notch (a U-shaped, V-shaped groove, etc.) or a linear portion extending linearly (so-called orientation flat). The substrate W may be, for example, a semiconductor substrate (silicon wafer), a glass substrate, a mask substrate, an FPD (Flat Panel Display) substrate, or other various substrates. The diameter of the substrate W may be, for example, approximately 200 mm to 450 mm.

The substrate processing apparatus 1, as illustrated in FIG. 1, includes a processing unit 2 and a controller Ctr (control section). The processing unit 2 includes a holding section 10 , a supply section 20 , a driving section 30 , a liquid receiving section 40 and a plurality of detection sections 50 .

The holding portion 10 includes a rotary drive portion 11 , a shaft 12 and an adsorption portion 13 . The rotation drive unit 11 is configured to operate based on an operation signal from the controller Ctr to rotate the shaft 12 . The rotation drive unit 11 may be a power source such as an electric motor, for example. The adsorption part 13 is provided at the tip of the shaft 12 . The adsorption unit 13 is configured to operate based on an operation signal from the controller Ctr, and to adsorb and hold a part or the entire back surface of the substrate W. As shown in FIG. That is, the holding unit 10 is configured to rotate the substrate W around a central axis (rotational axis) perpendicular to the surface of the substrate W while holding the substrate W in a substantially horizontal posture. may be

The supply unit 20 is configured to supply the processing liquid L to the surface of the substrate W held by the holding unit 10 . Supply unit 20 includes liquid source 21 , pump 22 , valve 23 , nozzle 24 and pipe 25 . The liquid source 21 is configured to store the processing liquid L. As shown in FIG. The pump 22 operates based on an operation signal from the controller Ctr, and is configured to send the treatment liquid L sucked from the liquid source 21 to the nozzle 24 via the pipe 25 and the valve 23 .

The valve 23 operates based on an operation signal from the controller Ctr, and is configured to transition between an open state that allows the flow of fluid in the pipe 25 and a closed state that prevents the flow of fluid in the pipe 25. there is The nozzle 24 has a discharge port open downward. The nozzle 24 is configured to discharge the processing liquid L sent out by the pump 22 toward the surface of the substrate W or dummy discharge to the liquid receiving section 40 . The pipe 25 connects the liquid source 21, the pump 22, the valve 23 and the nozzle 24 in order from the upstream side.

The driving section 30 is configured to move the nozzle 24 between the liquid receiving section 40 and the substrate W held by the holding section 10 . The drive unit 30 includes a rotary drive unit 31, a pivot shaft 32, a nozzle arm 33, an encoder 34, and a position sensor 35, as illustrated in FIGS.

The rotation drive unit 31 is configured to operate based on an operation signal from the controller Ctr to rotate the turning shaft 32 . The rotation drive unit 31 may be a power source such as an electric motor, for example. The turning shaft 32 is a columnar member (for example, a columnar member) extending in the vertical direction, and is configured to rotate around a rotation axis extending along the vertical direction.

Nozzle arm 33 is configured to support nozzle 24 . A base end portion of the nozzle arm 33 is connected to the outer peripheral surface of the swivel shaft 32 . A tip of the nozzle arm 33 supports the nozzle 24 . The nozzle arm 33 extends horizontally along the radial direction of the swivel shaft 32 . As exemplified in FIG. 2 , the rotary drive unit 31 rotates the swivel shaft 32 so that the nozzle 24 located at the tip of the nozzle arm 33 moves to the substantially central portion of the substrate W held by the holding unit 10 . and an opening 41 (described later) of the liquid receiver 40 in an arc. As illustrated in FIG. 2, the turning direction of the nozzle 24 when the nozzle 24 turns above the liquid receiver 40 is called the "X direction", and the longitudinal direction of the nozzle arm 33 is called the "Y direction". It is sometimes called

The encoder 34 is configured to detect the rotational position (rotational angle) of the rotary drive section 31 . The encoder 34 is configured to output the detected rotational position to the controller Ctr. The position sensor 35 is configured to detect the origin position (reference position) of the turning shaft 32 . The position sensor 35 may include, for example, a detection piece 35a and a photoelectric sensor 35b. The detection piece 35 a may be connected to the outer peripheral surface of the turning shaft 32 and configured to rotate together with the turning shaft 32 . The photoelectric sensor 35b may be a light projecting and receiving device that includes a light receiving section and a light projecting section that emits light toward the light receiving section. When the detecting piece 35a rotates, if the detecting piece 35a is positioned between the light receiving portion and the light projecting portion, the light receiving portion cannot receive the light from the light projecting portion, and the presence of the detecting piece 35a is detected. The rotational position of the rotary drive unit 31 when the photoelectric sensor 35b detects the presence of the detection piece 35a may be set to the origin position of the turning shaft 32. FIG. Note that the nozzle 24 may be positioned above the opening 41 of the liquid receiver 40 when the turning shaft 32 is at the origin position.

The liquid receiving portion 40 functions as a liquid collecting container that receives the treatment liquid L dummy-discharged from the nozzle 24 . The liquid receiver 40 is a bottomed cylindrical body with an open top, and includes an opening 41 for receiving the processing liquid L dummy-discharged from the nozzle 24, as illustrated in FIGS. A drainage pipe (not shown) is provided on the bottom wall of the liquid receiving portion 40, and the processing liquid L discharged into the liquid receiving portion 40 is discharged from the drainage pipe. The liquid receiver 40 may be arranged outside a cup (not shown) surrounding the substrate W held by the holder 10 (at a position not overlapping the cup in the vertical direction).

A plurality of detection units 50 are arranged in the liquid receiving unit 40 . The detection unit 50 includes a pair of terminals 51 and a measuring device 52, as illustrated in FIGS. The pair of terminals 51 are made of a conductive material. The pair of terminals 51 may be made of, for example, a metal material having corrosion resistance to the treatment liquid L, or may be made of a resin material containing a conductive material. In these cases, it is possible to suppress generation of particles accompanying corrosion of the terminal 51 . The resin material containing the conductive material may be, for example, a fluorine resin containing a carbon material (PTFE, PFA, etc.), a PEEK resin containing a carbon material, or the like.

The pair of terminals 51 are provided on the liquid receiving portion 40 with their distal ends projecting from the inner peripheral surface of the liquid receiving portion 40 and separated from each other. A screw thread is provided on the outer peripheral surface of the base end of the terminal 51 , and the terminal 51 is attached to the liquid receiver section 40 by screwing the screw thread onto the peripheral wall of the liquid receiver section 40 . good too. In this case, the position of the tip of the terminal 51 can be adjusted. A sealing member may be interposed between the thread and the liquid receiver 40 to prevent liquid leakage.

Base ends of the pair of terminals 51 are electrically connected to a measuring instrument 52 via a lead wire or the like. The measuring instrument 52 may be, for example, a resistance meter (tester). As illustrated in FIG. 4, when the treatment liquid L is a conductive liquid, a closed circuit is formed when the liquid column of the treatment liquid L dummy-discharged from the nozzle 24 comes into contact with the pair of terminals 51. A current is detected in meter 52 . Therefore, the detection unit 50 is configured to detect whether or not the treatment liquid L contacts the tip portions of the pair of terminals 51 . That is, it can be detected whether or not the processing liquid L has passed through the detection space near the inner peripheral surface of the liquid receiving portion 40 by the pair of terminals 51 whose tip portions are located near the inner peripheral surface of the liquid receiving portion 40 .

As illustrated in FIGS. 3 and 4A, two detection units 50 are arranged above the liquid receiving unit 40 . These two detection units 50 (hereinafter sometimes referred to as "detection units 50A") face each other with respect to the center of the liquid receiving unit 40, and along the X direction (turning direction of the nozzle 24) lined up. The terminals 51 of the two detection parts 50A may be moved to substantially the same height position on the inner peripheral surface of the liquid receiving part 40 . With these two detectors 50A, it is possible to detect the displacement of the dummy ejection position in the turning direction of the nozzles 24 .

As illustrated in FIGS. 3 and 4B, four detection units 50 are arranged below the liquid receiving unit 40 . Two of these detection units 50 (hereinafter sometimes referred to as “detection units 50B”) face each other with respect to the center of the liquid receiving unit 40, and extend in the X direction (turning direction of the nozzle 24). lined up along These two detectors 50B can detect the displacement of the dummy ejection position in the turning direction of the nozzle 24 . On the other hand, the remaining two detection units 50 (hereinafter sometimes referred to as “detection units 50C”) face each other with respect to the center of the liquid receiving unit 40 and are arranged in the Y direction (longitudinal direction of the nozzle arm 33). ) are aligned. It is possible to detect the displacement of the dummy ejection position in the longitudinal direction of the nozzle arm 33 by these two detection units 50C. The terminals 51 of these four detection portions 50B and 50C may be moved to substantially the same height position on the inner peripheral surface of the liquid receiving portion 40 .

[Controller details]
As shown in FIG. 5, the controller Ctr has, as functional modules, a reading unit M1, a storage unit M2, a processing unit M3, and an instruction unit M4. These functional modules are simply the functions of the controller Ctr divided into a plurality of modules for convenience, and do not necessarily mean that the hardware constituting the controller Ctr is divided into such modules. Each functional module is not limited to being realized by executing a program, but is realized by a dedicated electric circuit (for example, a logic circuit) or an integrated circuit (ASIC: Application Specific Integrated Circuit) that integrates this. may

The reading unit M1 is configured to read a program from a computer-readable recording medium RM. The recording medium RM records a program for operating each part of the substrate processing apparatus 1 including the processing unit 2 . The recording medium RM may be, for example, a semiconductor memory, an optical recording disk, a magnetic recording disk, or a magneto-optical recording disk. In addition, below, each part of the substrate processing apparatus 1 can include the holding part 10 , the supply part 20 , and the drive part 30 .

The storage unit M2 is configured to store various data. The storage unit M2 may store, for example, a program read from the recording medium RM by the reading unit M1, setting data input by an operator via an external input device (not shown), and the like. The storage unit M2 may store data regarding the rotational position from the encoder 34 of the driving unit 30, data regarding the origin position from the position sensor 35 of the driving unit 30, detection data of the processing liquid L from the detecting unit 50, and the like. . The storage unit M2 may store processing conditions for processing the substrate W and the like.

The processing unit M3 is configured to process various data. The processing unit M3 may generate a signal for operating each unit of the substrate processing apparatus 1 based on various data stored in the storage unit M2, for example.

The instruction part M4 is configured to transmit the operation signal generated in the processing part M3 to each part of the substrate processing apparatus 1 .

The hardware of the controller Ctr may be composed of, for example, one or more control computers. The controller Ctr may include a circuit C1 as a hardware configuration, as shown in FIG. Circuit C1 may be comprised of electrical circuitry. Circuit C1 may include, for example, processor C2, memory C3, storage C4, driver C5, and input/output port C6.

The processor C2 is configured to cooperate with at least one of the memory C3 and the storage C4 to execute a program and input/output signals via the input/output port C6, thereby realizing each functional module described above. may have been The memory C3 and storage C4 may function as the storage unit M2. The driver C5 may be a circuit configured to drive each part of the substrate processing apparatus 1, respectively. The input/output port C6 may be configured to mediate input/output of signals between the driver C5 and each part of the substrate processing apparatus 1 .

The substrate processing apparatus 1 may include one controller Ctr, or may include a controller group (control unit) composed of a plurality of controllers Ctr. When the substrate processing apparatus 1 includes a controller group, each of the above functional modules may be realized by one controller Ctr, or may be realized by a combination of two or more controllers Ctr. . When the controller Ctr is composed of a plurality of computers (circuit C1), each of the above functional modules may be realized by one computer (circuit C1), or may be realized by two or more computers (circuit C1 ) may be realized by a combination of The controller Ctr may have multiple processors C2. In this case, each of the above functional modules may be implemented by one processor C2, or may be implemented by a combination of two or more processors C2.

[Initial measurement processing]
Next, the initial measurement process will be described with reference to FIGS. 7 and 8. FIG. At this time, it is assumed that the nozzle 24 is in an initial state properly attached to the nozzle arm 33 by the operator. In other words, it is assumed that the nozzle 24 has no abnormality.

First, the controller Ctr instructs the drive unit 30 to move the turning shaft 32 to the origin position (see step S11 in FIG. 7). At this time, the nozzle 24 is positioned above the opening 41 of the liquid receiver 40, as illustrated in FIG. 8(a). Next, the controller Ctr instructs the supply unit 20 to dummy-discharge the processing liquid L from the nozzles 24 (see step S12 in FIG. 7).

In this state, the controller Ctr instructs the drive unit 30 to turn the nozzle arm 33 until the liquid column of the treatment liquid L dummy-discharged from the nozzle 24 is detected by one detection unit 50A (FIG. 7). (see step S13 of and arrow Ar1 in FIG. 8B). Based on the data received from the encoder 34, the controller Ctr calculates the distance a from the origin position to the detection position where the liquid column of the treatment liquid L is detected in one detection section 50A (see step S13 in FIG. 7). ). By similarly turning the nozzle arm 33 of the other detection unit 50A (see arrow Ar2 in FIG. 8B), the controller Ctr moves the liquid column of the treatment liquid L from the origin position to the other detection unit 50A. A distance b to the detection position detected in may be calculated. Note that the distance from the origin position to the detection position where the treatment liquid L is detected by the detection unit 50B may be calculated instead of the detection unit 50A.

[Abnormality detection method]
Next, a method of detecting an abnormal state of nozzles (substrate processing method) will be described with reference to FIGS. 9 and 10. FIG. At this time, as exemplified in FIG. 10, an abnormality occurs in the nozzle 24 in which the position and attitude of the nozzle 24 change, and the treatment liquid L dummy-discharged from the nozzle 24 is inclined with respect to the vertical direction. It is assumed that there is

First, the controller Ctr instructs the drive unit 30 to move the turning shaft 32 to the origin position (see step S21 in FIG. 9). As described above, since the nozzle 24 is in an abnormal state, even if the turning shaft 32 is positioned at the origin position, the dummy discharge position of the processing liquid L from the nozzle 24 (see FIG. 10A) is the nozzle 24 is different from the dummy ejection position in the initial state (see FIG. 8A). Next, the controller Ctr instructs the supply unit 20 to dummy-discharge the processing liquid L from the nozzles 24 (see step S22 in FIG. 9).

In this state, the controller Ctr determines whether or not the detection unit 50C has detected the treatment liquid L (see step S23 in FIG. 9). If the detection unit 50C detects the processing liquid L (see YES in step S23 of FIG. 9), it means that the dummy ejection position is shifted in the longitudinal direction of the nozzle arm 33. FIG. That is, the controller Ctr determines that the nozzle 24 is in an abnormal state. Generally, the nozzle arm 33 is not configured to move back and forth in its longitudinal direction, and it is not possible to correct the deviation of the dummy ejection position in the Y direction. Therefore, in this case, maintenance such as replacement of the nozzle 24 is performed by the operator (see step S24 in FIG. 9), and the abnormal state detection process ends.

On the other hand, if the detection unit 50C does not detect the processing liquid L (see NO in step S23 of FIG. 9), the controller Ctr instructs the driving unit 30 to The nozzle arm 33 is swung until the liquid column is detected by one detecting portion 50A (see step S25 in FIG. 9 and arrow Ar3 in FIG. 10B). Based on the data received from the encoder 34, the controller Ctr calculates the distance a' from the origin position to the detection position where the liquid column of the treatment liquid L is detected by one of the detection units 50A (step S26 in FIG. 9). ). By similarly turning the nozzle arm 33 of the other detection unit 50A (see arrow Ar4 in FIG. 10B), the controller Ctr moves the liquid column of the treatment liquid L from the origin position to the other detection unit 50A. A distance b' to the detection position detected in may be calculated.

Next, the controller Ctr calculates a difference value δ between the distance a calculated in step S13 and the distance a' calculated in step S26 (see step S27 in FIG. 9). The closer the difference value δ is to 0, the smaller the deviation from the dummy ejection position of the nozzle 24 in the initial state. Therefore, the controller Ctr determines whether or not the difference value δ exceeds a predetermined allowable range (for example, whether or not the difference value δ is outside the ±3 mm range) (see step S28 in FIG. 9). If it is determined that the difference value δ exceeds the predetermined allowable range (see YES in step S28 of FIG. 9), the correction described below tends to become difficult. Therefore, in this case, maintenance such as replacement of the nozzle 24 is performed by the operator (see step S24 in FIG. 9), and the abnormal state detection process ends.

On the other hand, when it is determined that the difference value δ is within the predetermined allowable range (see NO in step S28 of FIG. 9), the controller Ctr corrects the origin position based on the difference value δ (step S29). Specifically, the controller Ctr regards a position shifted by the difference value δ from the origin position as a new origin position, and performs subsequent processing (for example, processing for supplying the processing liquid L to the substrate W). conduct. Thus, the abnormal state detection processing ends.

[Action]
According to the above example, the controller Ctr detects that the nozzle 24 is abnormal when the detection unit 50C detects the processing liquid L dummy-discharged from the nozzle 24 even though the nozzle arm 33 is positioned at the origin position. It becomes possible to

According to the above example, the detection unit 50 is composed of the pair of terminals 51 and the measuring device 52 . Therefore, it is possible to accurately detect an abnormality of the nozzle 24 using the detection unit 50 having a simple configuration.

According to the above example, the liquid receiver 40 is provided with a pair of detectors 50A, a pair of detectors 50B, and a pair of detectors 50C positioned at approximately the same height on the inner peripheral surface of the liquid receiver 40. there is Therefore, it is possible to detect the displacement of the dummy ejection positions in a plurality of horizontal directions (X direction and Y direction). Therefore, it becomes possible to detect the abnormality of the nozzle 24 with higher accuracy.

According to the above example, by comparing the difference value .delta. Therefore, it becomes possible to detect the abnormality of the nozzle 24 with higher accuracy.

According to the above example, when the deviation of the dummy ejection position is not too large, the origin position is corrected using the difference value δ. can continue. Therefore, it is possible to increase the productivity of substrate processing.

[Modification]
The disclosure herein should be considered illustrative and not restrictive in all respects. Various omissions, substitutions, modifications, etc. may be made to the above examples without departing from the scope and spirit of the claims.

(1) The technique of the present disclosure can be applied not only when the processing liquid L dummy-discharged from the nozzle 24 is along the vertical direction, but also when it is tilted with respect to the vertical direction. For example, as exemplified in FIG. 3, by using the detection units 50A and 50B arranged side by side in the vertical direction, it is possible to determine whether the processing liquid L dummy-discharged from the nozzle 24 is tilted with respect to the vertical direction. can be detected. Specifically, when one of the detection units 50A and 50B detects the treatment liquid L but the other does not, it is determined that the treatment liquid L dummy-discharged from the nozzle 24 is tilted with respect to the vertical direction. can do. Alternatively, it is possible to determine whether or not the processing liquid L dummy-discharged from the nozzle 24 is at a predetermined angle by making the protrusion amounts of the terminals 51 of the detection units 50A and 50B different.

コントローラＣｔｒは、算出した角度θを用いて、ノズル２４からダミー吐出された処理液Ｌの傾きを考慮して、ノズル２４の位置を補正してもよい。 (2) As shown in FIG. 11, the treatment liquid L dummy-discharged from the nozzle 24 is tilted with respect to the vertical direction by using a pair of detection units 50A and 50B positioned vertically and opposed to each other when viewed from above. It is possible to calculate the angle θ when Specifically, the parameters A, B, and Y are respectively
A: The movement distance of the nozzle arm 33 from the origin position until the processing liquid L is detected by the detection unit 50A in the event of an abnormality. B: The processing liquid L is detected by the detection unit 50B from the origin position in the event of an abnormality. Movement distance of the nozzle arm 33 to Y: When defined as the separation distance between the detection units 50A and 50B, the angle θ is defined by the following formula.

The controller Ctr may use the calculated angle θ to correct the position of the nozzle 24 in consideration of the inclination of the treatment liquid L dummy-discharged from the nozzle 24 .

(3) In the above example, the nozzle 24 is configured to pivot around the pivot shaft 32, but the nozzle 24 may be configured to be movable in any horizontal direction. .

(4) The meter 52 may be, for example, a capacitance meter. In this case, when the treatment liquid L comes into contact with the pair of terminals 51, the charge previously stored in the capacitor is reduced. Therefore, it is possible to detect whether the treatment liquid L has passed through the detection space in the vicinity of the inner peripheral surface of the liquid receiver 40 depending on whether or not a change in potential accompanying the decrease in electrification is detected.

(5) A detector 50 illustrated in FIG. 12(a) may be used. The detecting portion 50 includes a displacement member 53 inserted through a through hole 40a provided in the peripheral wall of the liquid receiving portion 40, and an elastic membrane member 54 provided so as to seal between the displacement member 53 and the through hole 40a. and a mechanical switch 55 . When the treatment liquid L dummy-discharged from the nozzle 24 contacts the tip of the displacement member 53, the displacement member 53 is pushed downward, so that the mechanical switch 55 is turned on/off. Accordingly, the detection unit 50 can detect whether or not the processing liquid L dummy-discharged from the nozzle 24 has passed through the detection space. The detection unit 50 may include a load sensor 56 instead of or in addition to the mechanical switch 55 . When the treatment liquid L dummy-discharged from the nozzle 24 comes into contact with the tip of the displacement member 53, the displacement member 53 is pushed downward. be pulled. Therefore, a load acts on the load sensor 56 . Accordingly, the detection unit 50 can detect whether or not the processing liquid L dummy-discharged from the nozzle 24 has passed through the detection space based on the change in the load detected by the load sensor 56 .

(6) A detector 50 illustrated in FIG. 12(b) may be used. The detection unit 50 includes a light projector 57 and a light receiver 58 . When the light from the light projector 57 is blocked by the treatment liquid L and cannot be detected by the light receiver 58, the detection unit 50 detects whether or not the treatment liquid L dummy discharged from the nozzle 24 has passed through the detection space. can do.

(7) In the above example, the nozzle 24 was moved with respect to the detection section 50 by turning the nozzle arm 33, but the liquid receiving section 40 itself may be horizontally moved, and the detection section 50 may be moved. It can be moved horizontally. Also in these cases, it is possible to accurately detect the degree of displacement of the dummy ejection position according to the change in the amount of movement of the liquid receiving portion 40 or the detecting portion 50 .

(8) The controller Ctr may associate the difference value δ with the date and time when the difference value δ was calculated and store them as time-series data. The controller Ctr may estimate the type of abnormal state of the nozzle 24 based on the time-series data. Specifically, in the case of time-series data in which the difference value δ increases in one direction with the passage of time, factors such as deterioration of the nozzle 24 and the nozzle arm 33 and deformation of the nozzle 24, for example, It is presumed that the dummy ejection position is gradually displaced. If the difference value δ fluctuates (oscillates) over time, it is presumed that the nozzle 24, the nozzle arm 33, and the like are vibrating due to factors such as loose screws. If the types of these abnormal conditions can be estimated, maintenance policies can be predicted. Therefore, the time required for maintenance of the substrate processing apparatus 1 can be shortened. Therefore, it is possible to increase the productivity of substrate processing.

(9) The nozzle 24 abnormality detection process (at least steps S21, S22, and S24 to S29 in FIG. 9) may be performed periodically. At this time, step S24 may be included in the periodic processing. Periodically may be, for example, every time several to several tens of substrates W are processed, or every predetermined time interval. In this case, it is possible to continuously monitor whether or not the nozzle 24 is in an abnormal state. Therefore, it is possible to detect an abnormal state of the nozzle 24 at an early stage without greatly impairing the productivity of substrate processing.

(10) The controller Ctr may issue an alarm when determining that the nozzle 24 is in an abnormal state. Therefore, the substrate processing apparatus 1 may further include a notification device that performs notification by means of sound, character display on the screen, light, or the like. In this case, the operator can quickly recognize that the nozzle 24 is in an abnormal state.

[Other examples]
Example 1. An example of a substrate processing apparatus includes a holding portion configured to hold a substrate, a supply portion including a nozzle configured to supply a processing liquid to a surface of the substrate held by the holding portion, and By driving a liquid receiving section including an opening that is open upward to receive the dummy-discharged treatment liquid and a nozzle arm that supports the nozzle, the upper side of the substrate held by the holding section and the liquid are driven. A drive section configured to move the nozzle to and from the receiving section, a detection section arranged in the liquid receiving section, and a control section. The detection section is configured to detect whether or not the processing liquid dummy-discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid receiving section. The control unit performs a first process of controlling the drive unit so that the nozzle arm is positioned at a preset origin position inside the opening, and performs dummy ejection from the nozzle while the nozzle arm is positioned at the origin position. and a second process of determining that the nozzle is in an abnormal state when the detection unit detects that the processing liquid has passed through the detection space. Normally, in the initial state in which the nozzle is properly set with respect to the nozzle arm, the processing liquid dummy ejected from the nozzle when the nozzle arm is positioned at the origin position is located inside the detection space in the opening of the liquid receiver. The origin position is adjusted by the operator so as to pass through the inner space of the . Therefore, when the detection unit detects that the processing liquid dummy-discharged from the nozzle has passed through the detection space even though the nozzle arm is positioned at the origin position, the dummy discharge position of the processing liquid from the nozzle is It means that it is misaligned. In other words, the ejection openings of the nozzles are oriented in a direction different from that in the initial state, or the ejection openings of the nozzles are misaligned from the initial state. Therefore, the controller determines the state of the nozzles based on the detection signal from the detector, thereby making it possible to detect an abnormality in the nozzles.

Example 2. In the apparatus of Example 1, the detection unit measures current or voltage between a pair of terminals projecting from the inner peripheral surface of the liquid receiving part and provided on the liquid receiving part so as to be spaced apart from each other. and a measuring device configured to detect the processing liquid dummy discharged from the nozzle based on the change in the value in the measuring device when the processing liquid dummy discharged from the nozzle electrically connects the pair of terminals. It may be configured to detect whether or not it has passed through space. In this case, it is possible to detect an abnormality in the nozzle using a detection unit with a simple configuration.

Example 3. In the apparatus of Example 1, the detection unit includes a displacement member provided on the liquid receiving portion so as to project from the inner peripheral surface of the liquid receiving portion and be displaceable in the vertical direction, and configured to detect the displacement of the displacement member. whether the processing liquid dummy discharged from the nozzle has passed through the detection space based on the detection result of the displacement detector when the processing liquid dummy discharged from the nozzle comes into contact with the displacement member. It may be configured to detect whether or not. In this case, effects similar to those of the device of Example 2 can be obtained.

Example 4. In the apparatus of Example 1, the detection unit includes a light projector configured to irradiate light into the liquid receiving part, and a light receiver arranged at a position facing the light projector and capable of receiving the light from the light projector, It may be configured to detect whether or not the treatment liquid dummy-discharged from the nozzle has passed through the detection space based on whether or not the light receiver receives light from the light emitter. In this case, effects similar to those of the device of Example 2 can be obtained.

Example 5. The device of any one of Examples 1 to 4 may further include another detection section arranged in the liquid receiving section so as to be positioned at substantially the same height as the detection section on the inner peripheral surface of the liquid receiving section. . In this case, it is possible to detect the displacement of the dummy ejection positions in a plurality of horizontal directions using a plurality of detection units. Therefore, it becomes possible to detect the abnormality of the nozzle with higher accuracy.

Example 6. The device according to any one of Examples 1 to 5 further comprises another driving section configured to change the horizontal position of the liquid receiving section or the amount of protrusion of the detection section from the inner peripheral surface of the liquid receiving section. may be In this case, the deviation of the dummy ejection position can be detected by horizontally moving the liquid receiving portion or changing the protrusion amount of the detection portion until the detection portion detects the treatment liquid that has been dummy ejected. Therefore, it is possible to accurately detect the degree of displacement of the dummy ejection position according to the amount of movement of the liquid receiving portion or the amount of protrusion of the detection portion.

Example 7. In the apparatus according to any one of Examples 1 to 6, the control unit controls the supply unit so that the processing liquid is discharged from the nozzle, and the processing liquid discharged from the nozzle passes through the detection space from the origin position. a third process of controlling the drive unit so as to move the nozzle arm to the detection position where the detection unit detects the , and a fourth process of calculating the movement distance of the nozzle arm from the origin position to the detection position. a fifth process of calculating a difference value between the distance from the origin position to the detection position when the nozzle is in the initial state and the movement distance; It may be configured to further execute a sixth process of determining that it is in the state. In this case, by comparing the difference value and the allowable range, a state in which the degree of deviation of the dummy ejection position is relatively large can be identified as an abnormal state. Therefore, it becomes possible to detect the abnormality of the nozzle with higher accuracy.

Example 8. In the apparatus of Example 7, the control unit may be configured to further execute a seventh process of correcting the origin position based on the difference value when the movement distance is within the allowable range. By correcting the origin position when the deviation of the dummy ejection position is not too large, substrate processing can be continued without stopping the apparatus for maintenance. Therefore, it is possible to increase the productivity of substrate processing.

Example 9. In the apparatus of Example 8, the control unit performs an eighth process of associating the difference value with the date and time when the difference value was calculated and storing it as time-series data, and based on the time-series data, determines the type of abnormal state of the nozzle. It may be configured to further execute a ninth process of estimating . In this case, a maintenance plan can be predicted according to the type of the estimated abnormal state of the nozzle. Therefore, the time required for maintenance of the apparatus can be shortened. Therefore, it is possible to increase the productivity of substrate processing.

Example 10. In any one of the devices of Examples 7 to 9, the controller may be configured to periodically execute a series of processes including the first process, the third process, and the fourth process. In this case, it is possible to continuously monitor whether or not the nozzle is in an abnormal state. Therefore, it is possible to detect an abnormal state of the nozzle at an early stage without greatly impairing the productivity of substrate processing.

Example 11. In the apparatus of any one of Examples 1 to 10, the controller may be configured to further execute a tenth process of issuing an alarm when determining that the nozzle is in an abnormal state. In this case, the operator can quickly recognize that an abnormal state has occurred in the nozzle.

Example 12. The device according to any one of Examples 1 to 11 may further include another detection section arranged in the liquid receiving section so as to be positioned at a height different from that of the detection section on the inner peripheral surface of the liquid receiving section. . In this case, whether or not the processing liquid is tilted with respect to the vertical direction and the angle of the tilt can be grasped according to the detection state of the processing liquid dummy discharged from the nozzles in these two detection units. becomes possible.

Example 13. In the apparatus of Example 12, the detection unit and the further detection unit are arranged side by side in the vertical direction, and the control unit detects that the processing liquid dummy-discharged from the nozzle has passed through the detection space. It is configured to execute an eleventh process of determining that the processing liquid dummy discharged from the nozzle is tilted with respect to the vertical direction when one of the separate detection units detects but the other does not. may be

Example 14. In one example of the substrate processing method, a nozzle arm supporting a nozzle configured to supply the processing liquid to the surface of the substrate held by the holding section is placed in the opening of the liquid receiving section and dummy discharge is performed from the nozzle. a first step of arranging the processing liquid at a predetermined origin position set in advance inside an upwardly opened opening to receive the processing liquid; A second method for judging that the nozzle is in an abnormal state when the detection unit arranged in the liquid receiving unit detects that the discharged processing liquid has passed through the detection space near the inner peripheral surface of the liquid receiving unit. and a step. In this case, effects similar to those of the device of Example 1 are obtained.

Example 15. The method of Example 14 moves the nozzle arm from the origin position to the detection position where the detection unit detects that the treatment liquid ejected from the nozzle has passed through the detection space while ejecting the treatment liquid from the nozzle. a fourth step of calculating the movement distance of the nozzle arm from the origin position to the detection position; A fifth step of calculating and a sixth step of determining that the nozzle is in an abnormal state if the difference value exceeds a predetermined allowable range. In this case, effects similar to those of the device of Example 7 are obtained.

Example 16. The method of Example 15 may further include a seventh step of correcting the origin position based on the difference value when the movement distance is within the allowable range. In this case, effects similar to those of the device of Example 8 can be obtained.

Example 17. The method of Example 16 includes an eighth step of correlating the difference value and the date and time when the difference value was calculated and storing it as time-series data, and an eighth step of estimating the type of abnormal state of the nozzle based on the time-series data. 9 steps may be further included. In this case, effects similar to those of the device of Example 9 are obtained.

Example 18. The method of any of Examples 15-17 may periodically perform a series of steps comprising a first step, a third step and a fourth step. In this case, effects similar to those of the device of Example 10 are obtained.

Example 19. The method of any of Examples 14-18 may further include a tenth step of issuing an alarm if the nozzle is determined to be in an abnormal condition. In this case, effects similar to those of the device of Example 11 can be obtained.

Example 20. In any one of the methods of Examples 14 to 19, one of the detection unit and the further detection unit detects that the processing liquid dummy-discharged from the nozzle has passed through the detection space while the nozzle arm is positioned at the origin position. an eleventh step of determining that the processing liquid dummy discharged from the nozzle is tilted with respect to the vertical direction when the detection is made but the other is not detected; may be arranged in the liquid receiving part so as to be positioned at a height different from that of the detection part on the inner peripheral surface of the liquid receiving part and to be aligned with the detection part in the vertical direction. In this case, effects similar to those of the device of Example 13 can be obtained.

Example 21. An example of a computer-readable recording medium may record a program for causing the substrate processing apparatus to execute any of the methods of Examples 14-20. In this case, effects similar to those of the device of Example 1 are obtained. As used herein, a computer-readable recording medium refers to a non-transitory computer recording medium (e.g., various main or auxiliary storage devices) or a transitory computer recording medium ( For example, a data signal that can be provided over a network).

DESCRIPTION OF SYMBOLS 1... Substrate processing apparatus 2... Processing unit 10... Holding part 20... Supply part 24... Nozzle 30... Driving part 33... Nozzle arm 40... Liquid receiving part 41... Opening 50... Detecting part 51... Terminal, 52... Measuring instrument, Ctr... Controller (control unit), L... Treatment liquid, RM... Recording medium, W... Substrate.

Claims (20)

a holding portion configured to hold a substrate;
a supply unit including a nozzle configured to supply a processing liquid to the surface of the substrate held by the holding unit;
a liquid receiving portion including an opening opened upward to receive the processing liquid dummy-discharged from the nozzle;
a drive unit configured to move the nozzle between the liquid receiving unit and above the substrate held by the holding unit by driving a nozzle arm that supports the nozzle;
a detection unit arranged in the liquid receiving unit;
and a control unit,
The detection unit is configured to detect whether or not the processing liquid dummy-discharged from the nozzle has passed through a detection space in the vicinity of an inner peripheral surface of the liquid receiving unit,
The control unit
a first process of controlling the drive unit so that the nozzle arm is positioned at a preset origin position inside the opening;
It is determined that the nozzle is in an abnormal state when the detection unit detects that the processing liquid dummy-discharged from the nozzle passes through the detection space while the nozzle arm is positioned at the origin position. a substrate processing apparatus configured to perform a second process of The detection unit is
a pair of terminals projecting from the inner peripheral surface of the liquid receiving portion and provided on the liquid receiving portion so as to be spaced apart from each other;
a meter configured to measure the current or voltage between the pair of terminals;
The processing liquid dummy discharged from the nozzle passes through the detection space based on a change in the value in the measuring device when the processing liquid dummy discharged from the nozzle electrically connects the pair of terminals. 2. The device of claim 1, configured to detect whether the device has The detection unit is
a displacement member provided on the liquid receiving portion so as to protrude from the inner peripheral surface of the liquid receiving portion and be displaceable in the vertical direction;
a displacement detector configured to detect displacement of the displacement member;
Whether or not the treatment liquid dummy-discharged from the nozzle has passed through the detection space based on the detection result of the displacement detector when the treatment liquid dummy-discharged from the nozzle comes into contact with the displacement member. 2. The device of claim 1, configured to detect a The detection unit is
a light projector configured to irradiate light into the liquid receiver;
a light receiver facing the light projector and arranged at a position capable of receiving light from the light projector;
2. The apparatus according to claim 1, wherein it is configured to detect whether or not the processing liquid dummy-discharged from the nozzle has passed through the detection space based on whether or not the light receiver receives light from the light projector. equipment. 5. The liquid receiver according to any one of claims 1 to 4, further comprising another detector arranged in the liquid receiver so as to be positioned at substantially the same height as the detector on the inner peripheral surface of the liquid receiver. device. 6. The liquid receiver according to any one of claims 1 to 5, further comprising another drive unit configured to change the horizontal position of the liquid receiver or the amount of protrusion of the detector from the inner peripheral surface of the liquid receiver. A device according to claim 1. The control unit
A detection position where the detection unit detects that the treatment liquid ejected from the nozzle has passed through the detection space from the origin position while controlling the supply unit to eject the treatment liquid from the nozzle. a third process of controlling the drive unit to move the nozzle arm to
a fourth process of calculating a moving distance of the nozzle arm from the origin position to the detection position;
a fifth process of calculating a difference value between the distance from the origin position to the detection position when the nozzle is in the initial state and the movement distance;
and a sixth process of determining that the nozzle is in an abnormal state when the difference value exceeds a predetermined allowable range. 3. Apparatus according to paragraph. 8. The apparatus according to claim 7, wherein said control unit is configured to further execute a seventh process of correcting said origin position based on said difference value when said moving distance is within said allowable range. Apparatus as described. The control unit
an eighth process of associating the difference value with the date and time when the difference value was calculated and storing it as time-series data;
9. The device according to claim 8, further configured to perform a ninth process of estimating a type of abnormal state of said nozzle based on said time-series data. Any one of claims 7 to 9, wherein the control unit is configured to periodically execute a series of processes including the first process, the third process, and the fourth process. The apparatus described in . The device according to any one of claims 1 to 10, wherein the control unit is configured to further execute a tenth process of issuing an alarm when determining that the nozzle is in an abnormal state. . 12. The liquid receiver according to any one of claims 1 to 11, further comprising another detector disposed in the liquid receiver so as to be positioned at a height different from that of the detector on the inner peripheral surface of the liquid receiver. device. The detection unit and the further detection unit are arranged side by side in the vertical direction,
When one of the detection unit and the further detection unit detects that the processing liquid dummy-discharged from the nozzle has passed through the detection space, but the other detection unit does not, the control unit controls the 13. The apparatus according to claim 12, configured to execute an eleventh process of determining that the processing liquid dummy-discharged from a nozzle is tilted with respect to the vertical direction. A nozzle arm supporting a nozzle configured to supply the processing liquid to the surface of the substrate held by the holding section is positioned in the opening of the liquid receiving section to receive the processing liquid dummy-discharged from the nozzle. A first step of arranging at a predetermined origin position set in advance inside the opening opened upward so as to
With the nozzle arm positioned at the origin position, the liquid receiving portion detects that the processing liquid dummy discharged from the nozzle has passed through the detection space near the inner peripheral surface of the liquid receiving portion. and a second step of judging that the nozzle is in an abnormal state when the detection unit detects it. While ejecting the treatment liquid from the nozzle, the nozzle arm is moved from the origin position to a detection position where the detection unit detects that the treatment liquid ejected from the nozzle has passed through the detection space. a third step;
a fourth step of calculating a moving distance of the nozzle arm from the origin position to the detection position;
a fifth step of calculating a difference value between the distance from the origin position to the detection position when the nozzle is in the initial state and the movement distance;
15. The method of claim 14, further comprising a sixth step of determining that the nozzle is in an abnormal state if the difference value exceeds a predetermined acceptable range. 16. The method of claim 15, further comprising a seventh step of correcting the origin position based on the difference value when the moving distance is within the allowable range. an eighth step of associating the difference value with the date and time when the difference value was calculated and storing the difference value as time-series data;
17. The method of claim 16, further comprising a ninth step of estimating a type of abnormal condition of said nozzle based on said time-series data. The method according to any one of claims 15 to 17, wherein a series of steps including said first step, said third step and said fourth step are performed periodically. 19. The method of any one of claims 14-18, further comprising a tenth step of announcing an alarm if the nozzle is determined to be in an abnormal state. While the nozzle arm is positioned at the origin position, one of the detection unit and the further detection unit detects that the processing liquid dummy-discharged from the nozzle has passed through the detection space, but the other detection unit detects it. an eleventh step of determining that the processing liquid dummy-discharged from the nozzle is tilted with respect to the vertical direction if not,
The further detection section is arranged in the liquid receiving section so as to be positioned at a height different from that of the detection section on the inner peripheral surface of the liquid receiving section and to be vertically aligned with the detection section. 20. The method according to any one of Items 14-19.

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