KR20220096139A - Evaporating source and apparatus for processing substrate having the same - Google Patents

Abstract

The present invention relates to an evaporation source and a substrate processing apparatus including the same and, more specifically, to an evaporation source and a substrate processing apparatus including the same, which can uniformly supply a deposition material. According to an embodiment of the present invention, the evaporation source comprises: a crucible having an internal space extended laterally to store a deposition material, wherein at least a portion of the upper surface thereof is opened; a nozzle member having a plurality of injection ports arranged laterally, and coupled to the opened upper surface of the crucible; and a guide member installed in the internal space to be positioned between the bottom of the crucible and the nozzle member. The guide member includes: a first guide member extended laterally to be installed in the internal space and having a plurality of opening parts arranged in the lateral direction; and a second guide member installed in the internal space to be arranged above the plurality of opening parts.

Description

Evaporation source and substrate processing apparatus including the same

The present invention relates to an evaporation source and a substrate processing apparatus including the same, and more particularly, to an evaporation source capable of uniformly supplying a deposition material, and a substrate processing apparatus including the same.

In general, in manufacturing an organic light emitting device (OLED), the most important process is a process of forming an organic thin film, and a vacuum deposition method is mainly used to form the organic thin film.

In this vacuum deposition method, an organic thin film is formed on one surface of the substrate by arranging an evaporation source containing a deposition material and a substrate to face each other in a chamber, evaporating the deposition material contained in the evaporation source, and spraying the evaporated deposition material.

The evaporation source is divided into a point type evaporation source and a linear evaporation source according to the shape of the outer space and the internal space in which the deposition raw material is stored. Here, the use of the point evaporation source and the linear evaporation source is determined in consideration of the conditions of the deposition process, the conditions of the substrate, or the shape of the deposition film to be formed, but the linear evaporation source is mainly used to deposit the thin film on the substrate having a large area, have.

However, such a linear evaporation source has a problem in that, due to a structural characteristic of extending in one direction, the amount of spraying of the evaporated deposition material is non-uniformly distributed along the extending direction. That is, when uniform heating is not performed in the process of heating the linear evaporation source, a portion of the deposition material having a relatively large amount of heating is consumed first, so that the amount of the deposition material evaporated from the deposition source becomes non-uniform. In addition, there is a problem in that the deposition raw material is locally denatured because the pressure is non-uniformly distributed in the internal space of the linear evaporation source.

KR 10-2017-0041310 A

The present invention provides an evaporation source capable of uniformly supplying a deposition material having a uniform internal pressure and a substrate processing apparatus including the same.

An evaporation source according to an embodiment of the present invention includes: a crucible having an inner space extending laterally to store a deposition material, and having at least a portion of an upper surface open; a nozzle member having a plurality of injection holes arranged in a lateral direction and coupled to an open upper surface of the crucible; and a guide member installed in the inner space so as to be positioned between the bottom of the crucible and the nozzle member, wherein the guide member extends in a lateral direction and is installed in the inner space and is arranged in a lateral direction a first guide member having an opening of and a plurality of second guide members installed in the inner space so as to be respectively disposed above the plurality of openings.

The first guide member may include a plurality of shielding portions spaced apart from each other in a lateral direction to form the plurality of opening portions.

The plurality of shielding units may be spaced apart from each other to have different intervals along the lateral direction.

The plurality of shielding portions may be arranged such that the separation distance decreases from the center side to the end side in the lateral direction.

The plurality of second guide members may include a plurality of blocking parts spaced apart from each other to overlap the plurality of opening parts.

The plurality of second guide members may further include at least one through hole provided in each of the plurality of blocking units.

The at least one through hole may be provided to extend in a lateral direction.

The at least one through hole may be provided in different sizes of the plurality of blocking parts.

The at least one through hole may be provided to decrease in size from the blocking portion disposed on the central side in the lateral direction toward the blocking portion disposed on the end side.

The at least one through hole may be provided in a different number to the plurality of blocking parts.

The at least one through hole may be provided such that the number decreases from the blocking portion disposed on the central side in the lateral direction to the blocking portion disposed on the end side in the lateral direction.

The evaporation source may include: a side wall extending to surround the first guide member; and a reinforcing pin extending in a direction crossing the lateral direction and having one end and the other end coupled to both inner wall surfaces of the side wall, respectively.

The reinforcing pins may be coupled to inner wall surfaces of both sides of the side wall at positions not overlapping the plurality of openings and the plurality of second guide members.

A step recessed inwardly is provided at an upper end of the crucible, and at least a portion of the upper end of the sidewall may be bent outwardly so as to be supported by the depression.

The first guide member and the sidewall may be integrally formed so that the first guide member is detachable.

The evaporation source may further include a protrusion protruding from an inner wall surface of the sidewall to support the plurality of second guide members.

In addition, a substrate processing apparatus according to an embodiment of the present invention may include: a chamber providing a process space; a substrate holder provided in the process space to fix the substrate loaded into the process space; any one of the above-described evaporation sources provided in the process space to heat the deposition material to evaporate it into a deposition material; and a transfer unit for moving at least one of the substrate holder and the evaporation source.

The transfer unit may move at least one of the substrate holder and the evaporation source in a direction crossing the lateral direction.

According to the evaporation source and the substrate processing apparatus including the same according to an embodiment of the present invention, by installing a first guide member having a plurality of openings arranged in the lateral direction in the inner space of the crucible extending in the lateral direction, the deposition material It is possible to maintain a uniform internal pressure by concentrating it in a plurality of regions along the lateral direction.

In addition, by arranging a plurality of second guiding members on top of the plurality of openings, the deposition material passing through the first guiding member may be smoothly guided in the lateral direction, and the induced deposition material may be induced to be spaced apart between the second guiding members. enough to pass through the area.

Thereby, the deposition raw material can be consumed in a uniform amount in the inner space of the crucible, and the stored deposition raw material can be prevented from being denatured locally, and the thickness of the thin film formed on the substrate can be maintained uniformly.

1 is a view schematically showing components of an evaporation source according to an embodiment of the present invention.
2 is a view showing a state in which the evaporation source according to an embodiment of the present invention is cut along the XZ plane.
3 is a diagram showing the internal pressure of an evaporation source having a single opening;
4 is a view showing an internal pressure of an evaporation source having a plurality of openings according to an embodiment of the present invention.
5 is a diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various different forms, only the embodiments of the present invention allow the disclosure of the present invention to be complete, and the scope of the invention to those of ordinary skill in the art It is provided to fully inform the In order to describe the invention in detail, the drawings may be exaggerated, and like reference numerals refer to like elements in the drawings.

1 is a view schematically showing components of an evaporation source according to an embodiment of the present invention, and FIG. 2 is a view showing a state in which an evaporation source according to an embodiment of the present invention is cut along the X-Z plane.

1 and 2 , the evaporation source 100 according to an embodiment of the present invention has an internal space extending laterally to store a deposition raw material, and a crucible 110 in which at least a portion of its upper surface is opened, in the lateral direction. has a plurality of injection holes 162 arranged as a first guiding member 120 including a guiding member installed in a space, the guiding member extending laterally and installed in the inner space, the first guiding member 120 having a plurality of openings 124 arranged along the lateral direction; and a plurality of second guide members 130 installed in the inner space so as to be respectively disposed above the plurality of openings 124 . In addition, the evaporation source 100 according to an embodiment of the present invention may further include a heater (not shown) installed to surround at least a portion of the outer surface of the crucible 110 to heat the deposition material.

The crucible 110 has an internal space for storing the deposition material, and at least a portion of the upper surface is opened to supply the deposition material heated and evaporated from the deposition material to the substrate. Accordingly, the crucible 110 has an internal space extending in the lateral direction, for example, the X-axis direction so that the deposition raw material is stored. That is, the crucible 110 may include a bottom extending in the X-axis direction and an outer wall extending upward from an edge of the bottom part. In this case, the crucible 110 may have, for example, a box shape with an open top surface. As described above, a thin film can be more easily formed on a large substrate by the crucible 110 having a linear inner space extending in the X-axis direction.

At this time, the inner space of the crucible 110 may have a length in the X-axis direction 5 to 30 times longer than the length in the Y-axis direction. For example, the inner space of the crucible 110 may have a length of 50 to 500 cm in the X-axis direction, and may have a length of 5 to 30 cm in the Y-axis direction. In addition, the inner space of the crucible 110 may have a height of 10 to 60 cm. However, the size of the inner space of the crucible 110 is not limited thereto, and may have various sizes as needed by extending in the X-axis direction.

At the upper end of the crucible 110 , that is, the upper end of the outer wall of the crucible 100 , a step 112 may be formed to support the first guide member 120 , which will be described later. That is, the inner edge of the upper end of the outer wall of the crucible 110 may be recessed to form a step 112 , and the bent edge of the side wall connected to the first induction member 120 is formed at the step 112 . By being seated, the first guide member 120 may be supported in the inner space of the crucible 110 . The depth of the step 112 may be controlled so that the first guide member 120 may be disposed downward by a predetermined length from the top of the crucible 110 .

The first guide member 120 may extend in a lateral direction, for example, an X-axis direction, and may be installed above the inner space of the crucible 110 . That is, the first guide member 120 may be formed to have a relatively long length in the X-axis direction compared to a length in the Y-axis direction. In this case, the first guide member 120 has a plurality of openings 124 arranged along the lateral direction. Here, the opening 124 may expose the entire inner space of the crucible 110 in one direction, for example, the Y-axis direction.

Conventionally, an inner plate having a plurality of through-holes formed therein is used to uniformly evaporate the deposition raw material stored in the inner space of the crucible 110 . However, when using the inner plate having a plurality of through-holes as described above, when the crucible 110 is not heated uniformly, the amount of deposition material evaporated from the deposition material through the plurality of through-holes is non-uniform along the X-axis direction. There was a problem being

As such, in order to solve the problem that the amount of the deposition material becomes non-uniform, a method of reducing the size of the through hole may be considered. However, when the size of the through hole is reduced, the pressure in the inner space of the crucible 110 increases more than necessary under the inner plate, thereby causing a problem in that the deposition material is denatured.

In addition, in order to solve the problem that the amount of deposition material becomes non-uniform, a plurality of inner plates are provided, a through hole is formed only in the center of the inner plate disposed at the bottom, and the inner plate disposed at the top has the inner plate at the bottom. A method of forming the through-hole at a position that does not overlap the formed through-hole may be considered. In this case, the crucible 110 is not heated uniformly by concentrating the deposition material evaporated from the deposition raw material to the center through the inner plate at the bottom, and discharging the deposition material concentrated in the center to the top through the inner plate at the top Relatively uniform deposition can also be achieved.

However, when the through hole is formed only in the center of the lower inner plate as described above, the deposition material is concentrated to the center through the lower inner plate and has a Gaussian distribution in which the evaporation amount increases toward the center. That is, when the through hole is formed only in the center of the lower inner plate, the residence time of the deposition material in the inner space of the crucible 110 is locally changed, so that the consumption of the deposition material increases in the center, and the internal pressure also increases in the center This causes a problem in that the deposition material is denatured.

Accordingly, in the evaporation source 100 according to the embodiment of the present invention, the first induction member 120 has a large-area open portion 124 exposing all of the inner space of the crucible 110 in the Y-axis direction, By lowering the internal pressure of the crucible 110, it is possible to prevent the evaporation raw material from being denatured. In addition, in the evaporation source 100 according to the embodiment of the present invention, the first guide member 120 passes through the first guide member 120 by having a plurality of openings 124 arranged along the X-axis direction. The deposition material is prevented from being concentrated to the center so that uniform deposition is achieved. Hereinafter, a detailed configuration of the first guide member 120 will be described in more detail.

The first guide member 120 may include a plurality of shielding portions 122 spaced apart from each other in a lateral direction such that a plurality of opening portions 124 are formed. Here, the shielding part 122 may have a plate-like shape having a length in the X-axis direction longer than a length in the Y-axis direction and having a predetermined thickness. For example, the shielding part 122 may include a rectangular plate in which the length in the X-axis direction is longer than the length in the Y-axis direction.

The shielding part 122 is provided in plurality, and the plurality of shielding parts 122 are arranged to be spaced apart from each other in the lateral direction, for example, the X-axis direction so that an open part 124 is formed between the shielding parts 122, respectively. can be For example, three or more shielding parts 122 may be provided, and as shown in FIGS. 1 and 2 , four shielding parts 122 may be provided. Four shielding parts 122 are provided, and by arranging the four shielding parts 122 to be spaced apart from each other, the opening parts 124 may be formed in the center of the inner space along the X-axis direction and on both sides of the center, respectively. . In this way, by forming a plurality of openings 124 including the central portion of the inner space and both sides of the central portion, the deposition material passing through the first guide member 120 is concentrated in a plurality of regions along the X-axis direction, respectively. can

In this case, the plurality of shielding parts 122 may be spaced apart from each other to have different intervals along the X-axis direction. That is, the plurality of shielding parts 122 may be spaced apart from each other to have different intervals along the X-axis direction so that the plurality of opening parts 124 are formed in different sizes between the shielding parts 122 . In this case, the plurality of shielding parts 122 may be disposed such that the separation distance decreases from the center side along the X-axis direction toward the end side. That is, as shown in FIGS. 1 and 2 , a first shielding part 122A, a second shielding part 122B, and a third shielding part ( 122C) and the fourth shielding part 122D, the distance between the second shielding part 122B and the third shielding part 122C is between the first shielding part 122A and the second shielding part 122B. may be formed to be longer than a separation distance of , and a separation distance between the third shielding part 122C and the fourth shielding part 122D. In this way, by disposing the plurality of shielding parts 122 so that the separation distance decreases from the central side along the X-axis direction toward the end side, the area of the open part 124 located on the central side can be formed relatively large, Accordingly, it is possible to control the evaporation material to be uniformly distributed over the plurality of shielding parts 122 .

Meanwhile, the evaporation source 100 according to an embodiment of the present invention may further include a side wall 140 extending to surround the first guide member 120 . The sidewall 140 may be formed to extend upward from the edge of the region formed by the plurality of shielding portions 122 and the plurality of opening portions 124 . At this time, the first guide member 120 and the side wall 140 may be integrally formed so that the first guide member 120 is detachable, and the side wall 140 is provided to face each other in the Y-axis direction. The first sidewall 140A and the second sidewall 140B may include a third sidewall 140C and a fourth sidewall 140D that are provided to face each other in the X-axis direction.

The upper end of the side wall 140 may be bent outwardly. That is, the first sidewall 140A, the second sidewall 140B, the third sidewall 140C, and the fourth sidewall 140D may be formed by bending their upper ends to the outside, respectively, and each sidewall 140 is bent. The portion is seated on the step 112 formed at the top of the side wall of the crucible 110 described above. Accordingly, the first guide member 120 may be installed in the inner space of the crucible (110).

In addition, the sidewall 140 may be formed so that the inner surface protrudes inwardly at a predetermined height. The protrusion 142 is for seating the second guiding member 130 to be described later, and the second guiding member 130 is located on the protruding portion of the inner surface of the sidewall 140 of the first guiding member 120 . It may be seated and installed in the inner space of the crucible 110 . Here, the height of the protrusion 142 may be controlled so that the second guide member 130 may be disposed to be upwardly spaced apart from the shielding part 122 by a predetermined length.

Here, the evaporation source 100 according to the embodiment of the present invention may further include a reinforcing pin 150 connecting the first sidewall 140A and the second sidewall 140B. That is, the first sidewall 140A includes the first sidewall 140A and the plurality of shielding parts ( 122) and a second sidewall 140B that extends upwardly from the other edge along the lateral direction of the plurality of openings 124, and the reinforcing pin 150 includes the first sidewall 140A and the second sidewall. The rigidity of the first guide member 120 may be supplemented by connecting 140B. As will be described later, the second guiding member 130 is disposed above the plurality of openings 124 , respectively, and in a position where the second guiding member 130 is not disposed, the first sidewall 140A and the second Since the upper end of the sidewall 140B is not supported, the first sidewall 140A and the second sidewall 140B may be inclined inwardly or outwardly. Therefore, in order to prevent this, a reinforcing pin ( 150) may be installed to supplement the rigidity of the first guide member 120 .

The second guide member 130 is installed in the inner space of the crucible 110 so as to be respectively disposed on the upper portions of the plurality of openings 124 . That is, the second guiding member 130 is disposed on each of the plurality of openings 124 to guide the deposition material passing through the plurality of openings 124 in the lateral direction, for example, in the X-axis direction. do.

In this case, the second guide member 130 may include a plurality of blocking portions 132 spaced apart from each other to overlap the plurality of opening portions 124 . Here, the blocking part 132 may have a plate-like shape having a length in the X-axis direction longer than a length in the Y-axis direction and having a predetermined thickness. For example, the blocking part 132 may include a rectangular plate having a length in the X-axis direction longer than a length in the Y-axis direction and having an area equal to or larger than the open part 124 . At this time, the blocking part 132 may be provided to have the same area as the opening part 124 , and in this case, the area where the plurality of blocking parts 132 are spaced apart can be secured to the maximum, so that the first induction member ( The deposition material that has passed through 120 may be smoothly moved to the upper portion of the second guide member 130 .

On the other hand, two or more blocking parts 132 may be provided to overlap the plurality of opening parts 124 , respectively, and as shown in FIGS. 1 and 2 , the blocking parts 132 are located at the center of the inner space and the Three openings 124 formed on both sides of the center may be provided to overlap each other. In this way, by arranging the blocking portion 132 to be spaced apart from the upper portion of the opening 124 so as to overlap the plurality of openings 124 , respectively, the deposition material passing through the first induction member 120 is directed in the lateral direction, for example, X It may be guided in the axial direction, and may be moved to the upper portion of the second guide member 130 through the spaced area between the blocking parts 132 .

At least one through hole 134 may be provided in each of the plurality of blocking parts 132 . As described above, the deposition material passing through the first guide member 120 by the blocking part 132 is guided in the X-axis direction. If the through-hole 134 is not provided in the blocking part 132 , a larger amount of the deposition material is supplied onto the spaced area between the second guide members 130 , and on the second guide member 130 , A relatively small amount of deposition material is supplied. Accordingly, at least one through hole 134 may be provided in each of the plurality of blocking parts 132 in order to uniformly supply the deposition material onto the second guide member 130 .

At this time, at least one through hole 134 formed in each of the plurality of blocking parts 132 may be provided to extend in a lateral direction. As such, when the through hole 134 is provided in a shape extending in the lateral direction, the amount of the deposition material passing through the through hole 134 may be increased. In addition, the at least one through hole 134 may be provided in the plurality of blocking parts 132 in different sizes. As described above, the area of the opening 124 may be formed to have different sizes along the X-axis direction. At this time, the plurality of blocking portions 132 are provided to overlap the opening 124 , and the plurality of blocking portions 132 may have different sizes, and thus the plurality of blocking portions 132 may have different sizes along the X-axis. The at least one through hole 134 respectively formed to extend in the direction may be provided in different sizes. At this time, the first blocking part 132A and the third blocking part 132C disposed on the end side along the X-axis direction among the plurality of blocking parts 132 are the second blocking parts disposed on the center side along the X-axis direction. Since it may have a size smaller than that of 132B, at least one through hole 134 formed in each of the plurality of blocking portions 132 is formed in the second blocking portion 132B disposed on the central side in the lateral direction. The size of the through hole 134A formed in the first blocking portion 132A disposed on the end side of the through hole 134B and the through hole 134C formed in the third blocking portion 132C may be reduced. .

In addition, the at least one through hole 134 may be provided in different numbers in the plurality of blocking parts 132 . At this time, the at least one through-hole 134 extends from the second blocking part 132B disposed on the central side in the lateral direction to the first blocking part 132A and the third blocking part 132C disposed on the end side. It may be provided so that the number gradually decreases. As described above, among the plurality of blocking parts 132 , the first blocking part 132A and the third blocking part 132C disposed on the end side along the X-axis direction are the first blocking parts 132A and the third blocking part 132C disposed on the center side along the X-axis direction. 2 may have a smaller size than the blocking portion 132B. In this case, when the same number of through holes 134 extending in the X-axis direction are formed in the plurality of blocking portions 132 , the rigidity of the second blocking portions 132B disposed on the central side having a relatively large area is lowered. can be Accordingly, by providing a relatively large number of through holes 134B formed in the second blocking portion 132B disposed on the central side along the X-axis direction, the second blocking portion disposed on the central side having a relatively large area. The rigidity of (132B) can be reinforced.

Meanwhile, the evaporation source 100 according to an embodiment of the present invention may further include a nozzle member 160 provided to cover the open upper surface of the crucible 110 . The nozzle member 160 may be coupled to the open upper surface of the crucible 110 so as to be spaced apart from the second guide member 130 on the upper portion of the second guide member 130 . A plurality of injection holes 162 may be formed in such a nozzle member 160 in a lateral direction, for example, an X-axis direction. 1 and 2 , a structure in which the plurality of injection holes 162 have the same size and shape and are formed at the same interval in the X-axis direction is illustrated as an example, but the size, shape and spacing of the injection holes 162 are various It is of course subject to change.

In addition, although not shown, the evaporation source 100 according to an embodiment of the present invention is installed to surround at least a portion of the outer surface of the crucible 110 and may further include a heater for heating the deposition material. For example, the heater may be disposed along an outer wall of the crucible 110 on the outside of the crucible 110 , and may include a plurality of heating plates or heating coils. Such a heating member may heat the crucible 110 by providing heat for heating the crucible 110 , for example, radiant heat. The deposition raw material accommodated in the crucible 110 by the heating member is evaporated as a deposition material, and a thin film may be formed on the substrate by the deposition material deposited on the substrate.

3 is a diagram illustrating the internal pressure of an evaporation source having a single opening, and FIG. 4 is a diagram illustrating an internal pressure of an evaporation source having a plurality of openings according to an embodiment of the present invention.

In FIG. 3 , the internal pressure of the evaporation source 100 ′ having a single opening 124 is simulated in order to compare the internal pressure with the evaporation source 100 according to the embodiment of the present invention. More specifically, FIG. 3(a) shows the internal pressure of the evaporation source 100' having a single opening 124 in color, and FIG. 3(b) is an evaporation source having a single opening 124. The pressure distribution in the region on the first guiding member 120 of 100' is graphically shown. In this case, the evaporation source 100 ′ having a single opening 124 includes two shielding parts 122 included in the first induction member 120 , and only a single opening 124 in the center along the X-axis direction. ) was configured to be formed, and thus the second guide member 130 disposed to overlap the opening 124 was also configured as a single unit.

As such, in the case of the evaporation source 100 ′ having a single opening 124 , the overall internal pressure was measured to have a value of 8.136 Pa. In addition, in the case of the evaporation source 100 ′ having a single opening 124 , it can be seen that the pressure is non-uniformly distributed in the region on the first guide member 120 as shown in FIG. 3 . That is, in the case of the evaporation source 100 ′ having a single opening 124 , when the pressure ratio of the area on the first induction member 120 is 1 at the center along the X-axis direction, at the end along the X-axis direction It can be seen that the pressure ratio of the region on the first guide member 120 decreases to 0.8 or less.

Accordingly, in the case of the evaporation source 100 ′ having a single opening 124 , the deposition material has a Gaussian distribution concentrated to the center on the first induction member 120 , and the consumption of the deposition material increases at the center, The internal pressure also increases at the center, causing a problem in which the deposition material is denatured.

In contrast, in FIG. 4 , the internal pressure of the evaporation source 100 according to the embodiment of the present invention is simulated. In more detail, FIG. 4(a) shows the internal pressure of the evaporation source 100 having the center and three openings 124 on both sides of the center in color, and FIG. 4(b) is the same as the present invention. The pressure distribution in the region on the first guide member 120 of the evaporation source 100 according to the embodiment of the graph is shown.

As such, in the case of the evaporation source 100 according to the embodiment of the present invention, the overall internal pressure has a value of 6.958 Pa, so that the internal pressure can be effectively reduced compared to the evaporation source 100 having a single opening 124 . can be known In addition, in the case of the evaporation source 100 according to the embodiment of the present invention, it can be seen that the pressure is uniformly distributed in the region on the first guide member 120 as shown in FIG. 4 . That is, in the case of the evaporation source 100 according to the embodiment of the present invention, when the pressure ratio of the region on the first induction member 120 at the end along the X-axis direction is 1, the first induction in the center along the X-axis direction The pressure ratio of the region on the member 120 also has a value of 0.9 or more, indicating that the pressure is uniformly distributed in the region on the first inducing member 120 . That is, in the case of the evaporation source 100 according to the embodiment of the present invention, the pressure difference in the region along the X-axis direction on the first induction member 120 occurs at a very small value within 5%, so that the deposition material can be uniformly supplied. It can be seen that

5 is a diagram schematically illustrating a substrate processing apparatus according to an embodiment of the present invention.

Referring to FIG. 5 , in the substrate processing apparatus according to an embodiment of the present invention, a chamber 10 providing a process space and a substrate holder provided in the process space to fix a substrate S loaded into the process space (20), a transfer unit (not shown) for moving the evaporation source 100 provided in the process space and at least one of the substrate holder 20 and the evaporation source 100 in order to heat the deposition material and evaporate it into a deposition material ) is included. In addition, the substrate processing apparatus according to an embodiment of the present invention may further include a mask 30 provided between the substrate holder 20 and the evaporation source 100 .

The chamber 10 is to provide a process space for performing a deposition process, and controls an entrance (not shown) for loading and exiting a substrate and a pressure inside the chamber 10, and depositing materials not deposited on the substrate. It may include an exhaust unit (not shown) connected to a vacuum pump (not shown) to exhaust the air. Here, the substrate S may include a substrate for an organic light emitting device, and the deposition material may include an organic material or a metal material for forming a thin film of the organic light emitting device.

The substrate holder 20 is for seating the substrate loaded into the process space of the chamber 10 , and may further include a separate fixing member for fixing the substrate while the deposition process is performed. In FIG. 5 , the substrate holder 20 is positioned at the upper portion of the process space to horizontally fix the substrate, but the substrate holder 20 is located on the side of the process space to prevent sagging of the substrate due to gravity. It goes without saying that the substrate may be fixed to have an inclination angle of a predetermined angle.

The evaporation source 100 heats the deposition raw material stored therein and evaporates it into a deposition material. The deposition material evaporated from the evaporation source 100 is deposited on a substrate to form a thin film, and the evaporation source 100 may be provided to extend in one direction, for example, the X-axis direction, and the evaporation source 100 is shown in FIGS. The evaporation source 100 according to the embodiment of the present invention described above with reference to FIG. 4 is included as it is, and a description overlapping with the above description will be omitted.

At least one of the substrate holder 20 and the evaporation source 100 may reciprocate by a transfer unit. For example, the transfer unit may reciprocate the evaporation source 100 in the Y-axis direction to supply the deposition material to the entire surface of the substrate. Such a transfer unit may include a ball screw, a motor for rotating the ball screw, and a guide for controlling the moving direction of the evaporation source 100 .

The mask 30 is disposed between the substrate holder 20 and the evaporation source 100 in the process space of the chamber 10 , and may be disposed to be in close contact with the substrate fixed by the substrate holder 20 . The mask 30 may have a pattern corresponding to the pattern of the thin film to be formed on the substrate. That is, the mask 30 may be formed through a pattern having the same shape as the pattern of the thin film to be formed on the substrate. By depositing the deposition material evaporated from the evaporation source 100 by the mask 30 at a desired position on the substrate, a thin film having a desired pattern can be formed on the substrate, and the mask 30 is a frame (not shown) installed in the process space. can be supported by

Although not shown, of course, a shielding plate may be disposed between the mask 30 and the evaporation source 100 . Such a shielding plate may include a plurality of openings, and the plurality of openings may guide the movement of the deposition material evaporated from the evaporation source 100 .

As such, according to the evaporation source and the substrate processing apparatus including the same according to an embodiment of the present invention, a first guide member having a plurality of openings arranged in the lateral direction is installed in the inner space of the crucible extending in the lateral direction, A uniform internal pressure may be maintained by concentrating the deposition material in a plurality of regions along the lateral direction.

In addition, by arranging a plurality of second guiding members on top of the plurality of openings, the deposition material passing through the first guiding member may be smoothly guided in the lateral direction, and the induced deposition material may be induced to be spaced apart between the second guiding members. enough to pass through the area.

Accordingly, the deposition raw material can be consumed in a uniform amount in the inner space of the crucible, and the stored deposition raw material can be prevented from being denatured locally, and the thickness of the thin film formed on the substrate can be maintained uniformly.

In the above, preferred embodiments of the present invention have been described and illustrated using specific terms, but such terms are only for clearly explaining the present invention, and the embodiments of the present invention and the described terms are the spirit of the following claims And it is obvious that various changes and changes can be made without departing from the scope. Such modified embodiments should not be individually understood from the spirit and scope of the present invention, but should be said to fall within the scope of the claims of the present invention.

10: chamber 20: substrate holder
30: mask 100: evaporation source
110: crucible 120: first guide member
122: shielding part 124: opening part
130: second guide member 132: blocking part
134: through hole 140: side wall
150: reinforcing pin 160: nozzle member
162: nozzle

Claims (18)

a crucible having an inner space extending laterally to store a deposition material and having at least a portion of its upper surface open;
a nozzle member having a plurality of injection holes arranged in a lateral direction and coupled to an open upper surface of the crucible; and
Including; and a guide member installed in the inner space so as to be positioned between the bottom of the crucible and the nozzle member,
The guide member is
a first guide member extending in a lateral direction and installed in the inner space and having a plurality of openings arranged in the lateral direction; and
Evaporation source comprising a; The method according to claim 1,
The first guide member,
Evaporation source comprising a; a plurality of shielding portions spaced apart along the lateral direction to form the plurality of openings. The method according to claim 1,
The plurality of shielding units are spaced apart from each other to have different intervals along the lateral direction. The method according to claim 1,
The evaporation source is disposed such that the separation distance of the plurality of shielding portions decreases from the center side to the end side in the lateral direction. The method according to claim 1,
The plurality of second guide members,
Evaporation source comprising a; a plurality of blocking portions spaced apart so as to overlap each of the plurality of openings. 6. The method of claim 5,
The plurality of second guide members,
Evaporation source further comprising; at least one through hole provided in each of the plurality of blocking parts. 7. The method of claim 6,
The at least one through-hole is provided to extend in a lateral direction. 7. The method of claim 6,
The at least one through-hole is provided in the plurality of blocking portions to have different sizes. 7. The method of claim 6,
The at least one through-hole is provided to decrease in size from the blocking portion disposed on the central side in the lateral direction to the blocking portion disposed on the end side in the lateral direction. 7. The method of claim 6,
The at least one through-hole is provided in a different number in the plurality of blocking units. 7. The method of claim 6,
The evaporation source is provided such that the number of the at least one through hole decreases from the blocking portion disposed on the central side in the lateral direction to the blocking portion disposed on the end side in the lateral direction. The method according to claim 1,
a side wall extending to surround the first guide member; and
The evaporation source further comprising a; reinforcing pins extending in a direction crossing the lateral direction and having one end and the other end respectively coupled to inner wall surfaces of both sides of the side wall. 13. The method of claim 12,
The reinforcing pin is an evaporation source coupled to the inner wall surfaces of both sides of the side wall at positions not overlapping the plurality of openings and the plurality of second guide members. 13. The method of claim 12,
A step recessed inward is provided at the top of the crucible,
An evaporation source in which at least a portion of the upper end of the side wall is bent outwardly so as to be supported by the step. 13. The method of claim 12,
The first induction member and the sidewall is an evaporation source that is integrally formed so that the first induction member is detachable. 13. The method of claim 12,
The evaporation source further comprising a; protrusion protruding from the inner wall surface of the side wall to support the plurality of second guide members. a chamber providing process space;
a substrate holder provided in the process space to fix the substrate loaded into the process space;
The evaporation source according to any one of claims 1 to 15 provided in the process space to heat the deposition material to evaporate it into a deposition material; and
and a transfer unit for moving at least one of the substrate holder and the evaporation source. 18. The method of claim 17,
The transfer unit moves at least one of the substrate holder and the evaporation source in a direction crossing a lateral direction.

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