KR20220072496A - Method for producing coating film using titanium dioxide photocatalyst composition - Google Patents

Abstract

The present invention provides a method for manufacturing a coating layer using a titanium dioxide photocatalyst composition. The method comprises the steps of surface treating a top surface of a substrate to have a texturing surface; and forming a coating layer on the texturing surface, wherein the coating layer is a titanium dioxide compound by mixing titanium tetraisopropoxide (TTIP) and an organic solvent in a ratio of 1: 9 to 5: 5 forming; It may include; adding water and an acid solution of 35% concentration to the titanium dioxide compound and stirring at a temperature of 80° C. at a speed of 100 rpm to 200 rpm to generate a sol-state titanium dioxide photocatalyst composition.

Description

Coating layer manufacturing method using titanium dioxide photocatalyst composition {METHOD FOR PRODUCING COATING FILM USING TITANIUM DIOXIDE PHOTOCATALYST COMPOSITION}

The present invention relates to a method for manufacturing a coating layer using a titanium dioxide photocatalyst composition, and more specifically, by coating a sol-state titanium dioxide photocatalyst on the texturing surface of a substrate to improve adhesion between the coating layer and the substrate, and curing the coating layer with ultraviolet light It relates to a method for manufacturing a coating layer using a titanium dioxide photocatalyst composition capable of preventing deformation and peeling of the coating layer.

Photocatalysis has been confirmed in various semiconductor materials, and the most widely used currently is titanium dioxide (TiO ₂ ). Titanium dioxide is widely used because it exhibits sufficient catalytic activity by ultraviolet rays contained in the sun or suitable artificial light, is chemically stable, is harmless to the environment and human body, and is economical due to its low price.

Titanium dioxide has three types of crystal structures: anatase type, rutile type, and brookite type. The rutile-type titanium dioxide is widely used in industrial paints and cosmetics, and titanium dioxide having the anatase-type crystal structure is suitable as a photocatalyst.

The anatase-type titanium dioxide has functions such as decomposition, deodorization, decomposition and removal of pollutants in water or air, etc., and is mainly used in the field of environmental purification.

As a representative method for preparing a titanium dioxide photocatalyst as described above, inorganic titanium such as titanium chloride or titanium sulfate is hydrolyzed to neutralize with a base, and then a water-soluble metal salt is added in a certain weight ratio and calcined at a high temperature to have a small particle size and a large specific surface area. A method for obtaining anatase-type titanium oxide is exemplified.

In terms of photocatalytic activity, powder with a large specific surface area is excellent, but there are not many methods that can effectively utilize it. Photocatalysts prepared by the conventional hydrolysis method by the sol-gel method have limitations in enhancing photoactivity and stability, and also have limitations in maintaining crystal growth and dispersibility.

Republic of Korea Patent Publication No. 10-2013-0000667

An object of the present invention is to provide a method for manufacturing a coating layer using a titanium dioxide photocatalyst composition.

The problems to be solved by the present invention are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

A method for manufacturing a coating layer using a titanium dioxide photocatalyst composition according to an embodiment of the present invention for solving the above-described problems includes the steps of: surface-treating an upper surface of a substrate to have a texturing surface; and forming a coating layer on the texturing surface, wherein the coating layer is a titanium dioxide compound by mixing titanium tetraisopropoxide (TTIP) and an organic solvent in a ratio of 1: 9 to 5: 5 forming; It may include; adding water and an acid solution of 35% concentration to the titanium dioxide compound and stirring at a temperature of 80° C. at a speed of 100 rpm to 200 rpm to generate a sol-state titanium dioxide photocatalyst composition.

In one embodiment of the present invention, in the forming of the titanium dioxide compound in the sol state, the titanium dioxide compound in the sol state may be aged for 10 to 60 minutes to produce a white titanium dioxide photocatalyst composition.

In one embodiment of the present invention, the step of irradiating the transparent titanium dioxide photocatalyst composition in ultraviolet light for 10 minutes to 8 hours; may further include.

In one embodiment of the present invention, in the step of forming the coating layer on the buffer layer, the sol-state titanium dioxide compound may be repeatedly coated 1 to 5 times on the buffer layer using a wet coating method.

In one embodiment of the present invention, after forming the coating layer on the buffer layer, drying the coating layer at a temperature of 50 ° C. to 100 ° C. for 30 minutes to 120 minutes; may include.

In one embodiment of the present invention, in the drying of the substrate, the coating layer may be dried in a chamber to which ultraviolet rays of a 300 watt to 500 watt light source are irradiated.

In one embodiment of the present invention, the organic solvent may include at least one of isopropyl alcohol (IPA), methyl alcohol (methanol) and ethyl alcohol (ethanol), and the acid solution may include hydrochloric acid (HCL). have.

In one embodiment of the present invention, the texturing surface may be formed in a concave-convex structure having a roughness of 0.5 microns.

In one embodiment of the present invention, forming a buffer layer between the substrate and the coating layer; may further include.

In an embodiment of the present invention, the composition may be prepared by a method for preparing a coating layer using a titanium dioxide photocatalyst composition.

Other specific details of the invention are included in the detailed description and drawings.

According to the present invention, it is possible to improve the adhesion between the coating layer and the substrate by coating a sol-state titanium dioxide photocatalyst on the texturing surface, and to prevent deformation and peeling of the coating layer by curing the coating layer with ultraviolet rays.

According to the present invention, it is possible to provide a titanium dioxide photocatalyst having excellent photolysis efficiency even under visible light and having high uniformity.

According to the present invention, by being applicable to the medical device field, the automobile field, the household goods field and the home appliance field, a photocatalytic coating layer is formed in various fields such as polymers, ceramics, and metals to provide safer products against virus and bacterial infections. can

Effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the following description.

1 is a view for explaining a coating layer using a titanium dioxide photocatalyst composition according to an embodiment of the present invention.
2 is a flowchart illustrating a method of forming a coating layer using a titanium dioxide photocatalyst composition according to an embodiment of the present invention.
3 is a detailed flowchart for explaining a method for preparing a titanium dioxide photocatalyst composition for forming the coating layer shown in FIG. 2 .
4 is a view for explaining a surface uniformly coated with a titanium dioxide photocatalyst composition according to an embodiment of the present invention.
5 is a view for explaining the uniformity of the titanium dioxide photocatalyst composition according to an embodiment of the present invention.

Advantages and features of the present invention and methods of achieving them will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms, and only the present embodiments allow the disclosure of the present invention to be complete, and those of ordinary skill in the art to which the present invention pertains. It is provided to fully understand the scope of the present invention to those skilled in the art, and the present invention is only defined by the scope of the claims.

The terminology used herein is for the purpose of describing the embodiments and is not intended to limit the present invention. In this specification, the singular also includes the plural unless specifically stated otherwise in the phrase. As used herein, “comprises” and/or “comprising” does not exclude the presence or addition of one or more other components in addition to the stated components. Like reference numerals refer to like elements throughout, and "and/or" includes each and every combination of one or more of the recited elements. Although "first", "second", etc. are used to describe various elements, these elements are not limited by these terms, of course. These terms are only used to distinguish one component from another. Accordingly, it goes without saying that the first component mentioned below may be the second component within the spirit of the present invention.

Unless otherwise defined, all terms (including technical and scientific terms) used herein will have the meaning commonly understood by those of ordinary skill in the art to which this invention belongs. In addition, terms defined in a commonly used dictionary are not to be interpreted ideally or excessively unless specifically defined explicitly.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a view for explaining a coating layer using a titanium dioxide photocatalyst composition according to an embodiment of the present invention.

1, in the present invention, the substrate 100, the buffer layer 200 formed on the upper surface of the substrate 100, and the coating layer 300 formed on the upper surface of the buffer layer 200 may be formed. Here, the buffer layer 200 may be omitted.

Specifically, the substrate 100 is subjected to a texturing process so that the front surface of the substrate 100 may be formed as a textured surface, which is a concave-convex surface having a plurality of protrusions 110 protruding above the periphery.

At this time, the plurality of protrusions 110 have a concave-convex structure, and may be formed to have a pyramid shape, but is not limited thereto, and may be deformed into various protrusion shapes of a concave-convex structure according to protrusions having a lens shape, such as a concave lens or a convex lens. Here, the roughness of the protrusion 110 is 0.5 micron, and the size, that is, the maximum width and the maximum height, may be about 5 μm to 15 μm, respectively, and the aspect ratio of the protrusion 110 may be about 1.0 to 1.5, but , but is not limited thereto.

Such a substrate 100 has a predetermined thickness, can maintain its shape at high/low temperature, and can be made of a material effective in preventing cracks or cracks. That is, the substrate 100 may be made of various materials such as plastic, metal, fiber, or a member having a plated surface, but is not limited thereto. For example, it may be a member including a mask, medical fibers, or medical devices such as a catheter, a tracheostomy tube, a scalpel in an operating room, scissors, and a fixing pin. That is, when the surface of the catheter tube is coated with a titanium dioxide (TIO ₂ ) photocatalytic composition after arthrotomy, the part exposed to the outside of the tracheostomy tube prevents the spread of bacteria and viruses by secretions or complications caused by bacteria and viruses can do.

The buffer layer 200 is a layer formed between the substrate 100 and the coating layer 300, and the lower surface in contact with the upper surface of the substrate 100 corresponds to the texturing surface of the upper surface of the substrate 100. It is formed as a texturing surface, The upper surface in contact with the coating layer 300 may be formed to have a flat surface.

According to an embodiment, the upper surface in contact with the coating layer 300 may be formed to have a texturing surface having a concave-convex structure or a concave structure.

The buffer layer 200 may be formed of at least one of Zn, Mn, Cu, and Fe, but is not limited thereto.

In some embodiments, the buffer layer 200 may be formed of an adhesive material having adhesive properties. For example, the adhesive material may be variously selected from a conductive paste, an insulating paste, a polymer adhesive, and the like, and is not particularly limited.

The coating layer 300 may be formed by coating a sol-state titanium dioxide (TIO ₂ ) photocatalyst composition on the upper surface of the buffer layer 200 using a wet coating method.

In some embodiments, the coating layer 300 may be formed by coating a sol-state titanium dioxide (TIO ₂ ) photocatalyst composition on the texturing surface of the substrate 100 .

In the present embodiment, the coating layer 300 has been disclosed as being coated using dip coating among the wet coating methods, but is not limited thereto and may be coated using roll coating, spray coating, spin coating, or the like.

In this way, the coating layer 300 is formed on the texturing surface of the substrate 100 or the flat surface of the buffer layer 200 , and between the coating layer 300 and the texturing surface of the substrate 100 or the flat surface of the buffer layer 200 . Since impurities do not exist, contact force with the substrate 100 or the buffer layer 200 may be improved.

In addition, there is no impurity between the texturing surface of the substrate 100 and the buffer layer 200 , so that the contact force with the substrate 100 or the buffer layer 200 is improved, and the contact force between the substrate 100 and the coating layer 300 is increased can be further improved.

The manufacturing and forming method of the coating layer using the titanium dioxide photocatalyst composition according to the present embodiment having such a structure is as follows. 2 is a flowchart for explaining a method of forming a coating layer using a titanium dioxide photocatalyst composition according to an embodiment of the present invention, and FIG. 3 is a method of preparing a titanium dioxide photocatalyst composition for forming the coating layer shown in FIG. It is a detailed flowchart for explanation, and FIG. 4 is a view for explaining a surface uniformly coated with a titanium dioxide photocatalyst composition according to an embodiment of the present invention, and FIG. 5 is a titanium dioxide photocatalyst composition according to an embodiment of the present invention. It is a diagram for explaining the uniformity of .

In the present embodiment, the production of the titanium dioxide (TIO ₂ ) photocatalyst composition and the production of the coating layer using the titanium dioxide photocatalyst composition are disclosed as being performed in a chamber, but the present invention is not limited thereto.

First, as shown in FIG. 2 , in the method of forming the coating layer using the titanium dioxide photocatalyst composition, the upper surface of the substrate 100 may be textured to form a texturing surface ( S10 ).

In this embodiment, the texturing surface has a plurality of protrusions 110 having a concave-convex structure, and the roughness of the protrusions 110 is 0.5 micron, and the size, that is, the maximum width and the maximum height, may be about 5 μm to 15 μm, respectively, and , the aspect ratio of the protrusion 110 may be about 1.0 to 1.5, but is not limited thereto

Specifically, one surface of the substrate 100 may be anisotropically etched. Such anisotropic etching is performed by wet etching using an alkali etchant, and potassium hydroxide (KOH) or isopropyl alcohol (IPA) may be used as the alkali etchant. Alternatively, the texturing process may be performed using a dry etching method such as reactive ion etching (RIE).

When the anisotropic etching is performed as described above, the surface of the substrate 100 may be textured to form a texturing surface including the plurality of protrusions 110 . Here, the material of the alkali etchant and the etching time may be variously determined.

In some embodiments, wet etching for etching back the plurality of protrusions 110 may be additionally performed.

Next, after washing the substrate 100 on which the texturing process has been performed using at least one of isopropyl alcohol (IPA), ethyl alcohol (ethanol), and acetone (acetone), a drying process may be performed, but may be omitted. have. At this time, by cleaning the substrate 100 using at least one of isopropyl alcohol (IPA), ethyl alcohol (ethanol), and acetone (acetone), impurities of the substrate 1 generated during the texturing process are completely removed and a buffer layer to be described later It is possible to improve the contact force with (200).

Next, the buffer layer 200 may be formed by coating a metal material on the texturing surface of the substrate 100 (S12).

The buffer layer 200 may be formed to have a predetermined thickness, but is not limited thereto. In this case, the buffer layer 200 is preferably formed to be smaller than the thickness of the substrate 100 .

Next, the coating layer 300 may be formed by repeatedly coating the upper surface of the buffer layer 200 using a dip coating method to coat the titanium dioxide photocatalyst composition in a sol state (S14). In this case, by coating the sol-state titanium dioxide photocatalyst composition on the buffer layer 200 , the contact force with the buffer layer 200 may be further improved.

Specifically, referring to FIG. 3 , titanium tetraisopropoxide (TTIP) and an organic solvent are mixed in a ratio of 1: 9 to 5: 5 to form a titanium dioxide (TIO ₂ ) compound (S100). ). Here, the organic solvent may include at least one of isopropyl alcohol (IPA), methyl alcohol (methanol), and ethyl alcohol (ethanol), but is not limited thereto.

Next, water and an acid solution having a concentration of 35% may be added to the titanium dioxide (TIO ₂ ) compound (S120).

By adding an acid solution composed of hydrochloric acid (HCL) having a concentration of 35%, an additional heat treatment process is not required to remove agglomerated powder, thereby reducing process time and cost.

Next, a titanium dioxide (TIO ₂ ) photocatalyst composition in a sol state may be produced by stirring at a temperature of 80° C. at a speed of 100 rpm to 200 rpm (S140).

In this embodiment, when the mixture is stirred at a temperature of 80° C. or higher or lower, a titanium dioxide (TIO ₂ ) photocatalyst composition produced in a sol state in which the particles are agglomerated and become cloudy may be produced.

Next, the titanium dioxide (TIO ₂ ) compound in the sol state may be aged for 10 to 60 minutes to produce a white titanium dioxide (TIO ₂ ) photocatalyst composition (S160).

Next, a color change can be confirmed by irradiating the white titanium dioxide (TIO ₂ ) photocatalyst composition with ultraviolet rays for 10 minutes to 8 hours (S180).

The titanium dioxide (TIO ₂ ) photocatalyst composition thus produced may have uniformity. For example, referring to FIG. 4 , when the titanium dioxide (TIO ₂ ) photocatalyst composition is coated, the surface may be uniformly coated.

Finally, the coating layer 300 may be dried in a chamber irradiated with ultraviolet rays of a 300 watt to 500 watt light source (S16).

Specifically, the coating layer 300 may be dried at a temperature of 50° C. to 100° C. and for 30 minutes to 120 minutes.

That is, when the coating layer 300 is dried at a temperature of 50° C. or less and 100° C. or more, 30 minutes or less, and 120 minutes or more, the coating layer 300 is deformed and peeled from the substrate 100 and/or the buffer layer 200. .

Accordingly, by drying the chamber coating layer 300 to which the ultraviolet light of the 300 watt ~ 500 watt light source is irradiated at an optimized temperature, the uniformity can be further improved. That is, referring to FIG. 5 , since the coating layer 300 is uniformly formed, even if cracks occur due to external impact or breakage of the substrate 100 , the uniformity is high and thus the photolysis efficiency may not be affected.

As mentioned above, although embodiments of the present invention have been described with reference to the accompanying drawings, those skilled in the art to which the present invention pertains know that the present invention may be embodied in other specific forms without changing the technical spirit or essential features thereof. you will be able to understand Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

100: substrate
200: buffer layer
300: coating layer

Claims (10)

surface-treating the upper surface of the substrate to have a texturing surface; and
Including; forming a coating layer on the texturing surface;
The coating layer is
Forming a titanium dioxide compound by mixing titanium tetraisopropoxide (TTIP) and an organic solvent in a ratio of 1: 9 to 5: 5;
A coating layer using a titanium dioxide photocatalyst composition comprising; adding water and a 35% acid solution to the titanium dioxide compound and stirring at a temperature of 80° C. at a speed of 100 rpm to 200 rpm to produce a sol-state titanium dioxide photocatalyst composition manufacturing method. According to claim 1,
The step of forming the titanium dioxide compound in the sol state,
A method for producing a coating layer using a titanium dioxide photocatalyst composition, wherein the sol-state titanium dioxide compound is aged for 10 to 60 minutes to produce a white titanium dioxide photocatalyst composition. 3. The method of claim 2,
The method of manufacturing a coating layer using the titanium dioxide photocatalyst composition further comprising; irradiating the white titanium dioxide photocatalyst composition in ultraviolet light for 10 minutes to 8 hours. According to claim 1,
The step of forming a coating layer on the buffer layer,
A method for producing a coating layer using a titanium dioxide photocatalyst composition, wherein the sol-state titanium dioxide compound is repeatedly coated 1 to 5 times on the buffer layer using a wet coating method. According to claim 1,
After forming a coating layer on the buffer layer,
Drying the coating layer at a temperature of 50° C. to 100° C. for 30 minutes to 120 minutes; comprising, a method for producing a coating layer using a titanium dioxide photocatalyst composition. 6. The method of claim 5,
The step of drying the substrate,
A method for manufacturing a coating layer using a titanium dioxide photocatalyst composition, wherein the coating layer is dried in a chamber irradiated with ultraviolet light of 300 watt to 500 watt light source. According to claim 1,
The organic solvent may include at least one of isopropyl alcohol (IPA), methyl alcohol (methanol), and ethyl alcohol (ethanol), and the acid solution includes hydrochloric acid (HCL), a coating layer using a titanium dioxide photocatalyst composition manufacturing method. According to claim 1,
The method for producing a coating layer using a titanium dioxide photocatalyst composition, wherein the texturing surface is formed in a concave-convex structure having a roughness of 0.5 microns. According to claim 1,
Forming a buffer layer between the substrate and the coating layer; further comprising, a coating layer manufacturing method using a titanium dioxide photocatalyst composition. A titanium dioxide photocatalyst composition prepared according to the method according to any one of claims 1 to 9.

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