JP2938376B2 - Liquid for forming titania film, titania film and method for producing the same - Google Patents

Liquid for forming titania film, titania film and method for producing the same

Info

Publication number
JP2938376B2
JP2938376B2 JP24838495A JP24838495A JP2938376B2 JP 2938376 B2 JP2938376 B2 JP 2938376B2 JP 24838495 A JP24838495 A JP 24838495A JP 24838495 A JP24838495 A JP 24838495A JP 2938376 B2 JP2938376 B2 JP 2938376B2
Authority
JP
Japan
Prior art keywords
liquid
titania film
heat treatment
film
titanium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP24838495A
Other languages
Japanese (ja)
Other versions
JPH0971418A (en
Inventor
弘道 一ノ瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAGAKEN
Original Assignee
SAGAKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAGAKEN filed Critical SAGAKEN
Priority to JP24838495A priority Critical patent/JP2938376B2/en
Publication of JPH0971418A publication Critical patent/JPH0971418A/en
Application granted granted Critical
Publication of JP2938376B2 publication Critical patent/JP2938376B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、チタン溶液と塩基性溶
液から作製した水酸化チタンゲルに過酸化水素水を作用
させ合成することを特徴とするチタニア膜形成用液体の
製法、その液体を80℃以上の加熱処理することにより
合成した酸化チタンを含む液体の製法及びそれらの液体
を塗布乾燥あるいは加熱処理をして作製することを特徴
とするチタニア膜に関するものである。本発明のチタニ
ア膜は各種材料の保護被膜、光触媒、紫外線カット被
膜、着色コ−ティングなどの分野に利用され得る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a liquid for forming a titania film, characterized in that a hydrogen peroxide solution is applied to a titanium hydroxide gel prepared from a titanium solution and a basic solution for synthesis. The present invention relates to a method for producing a liquid containing titanium oxide synthesized by heat treatment at a temperature of not less than ° C., and a titania film characterized by being prepared by applying and drying or heating the liquid. The titania film of the present invention can be used in fields such as protective coatings of various materials, photocatalysts, ultraviolet cut coatings, and colored coatings.

【0002】[0002]

【従来の技術】チタニア膜形成方法は、酸化チタン粉体
スラリ−あるいは塩化チタンや硫酸チタンの水溶液を基
体に塗布後焼成する塗布法、金属アルコキシドの加水分
解で作製したゾルを基体に塗布後焼成するゾルゲル法、
高真空中で酸化物のタ−ゲットをスパッタリングし基体
上に成膜するスパッタ法、有機金属やハロゲン化物を揮
発させ電気炉の中で分解して基体上に膜を作製するCV
D法、固体粒子を大気中で発生させたプラズマ中で溶融
し基体表面にたたき付けるプラズマ溶射等がある。
2. Description of the Related Art A titania film is formed by applying a titanium oxide powder slurry or an aqueous solution of titanium chloride or titanium sulfate to a substrate, followed by firing, or by applying a sol produced by hydrolysis of a metal alkoxide to the substrate, followed by firing. Sol-gel method,
A sputtering method in which an oxide target is sputtered in a high vacuum to form a film on a substrate, and a CV in which an organic metal or halide is volatilized and decomposed in an electric furnace to form a film on the substrate.
Method D includes plasma spraying in which solid particles are melted in plasma generated in the atmosphere and beaten to the substrate surface.

【0003】[0003]

【発明が解決しようとする課題】酸化チタン粉末の塗布
法は簡単であるが、緻密で密着性良好な膜は得られ難
く、合成温度が一般に高いため基体の種類にかなりの制
限がある。塩化チタンや硫酸チタン等の水溶液を塗布焼
成する方法は有害なハロゲン化合物を生成し、また、焼
成温度も数百度以上を必要とし、前記の産業上の利用分
野には利用されない。
The method of applying titanium oxide powder is simple, but it is difficult to obtain a dense and good-adhesion film, and the synthesis temperature is generally high, so that the type of the substrate is considerably limited. The method of applying and sintering an aqueous solution of titanium chloride or titanium sulfate generates a harmful halogen compound and requires a sintering temperature of several hundred degrees or more, and is not used in the above-mentioned industrial application fields.

【0004】プラズマ溶射は固体をプラズマ中で溶融し
基体表面にたたき付ける成膜法で成膜速度は速いが、緻
密な膜が得られ難く、均一で密着性に富んだ酸化物膜を
作製することができなかった。
[0004] Plasma spraying is a film forming method in which a solid is melted in plasma and is beaten to the surface of a substrate. The film forming rate is high, but a dense film is hardly obtained, and a uniform and highly adherent oxide film is produced. I couldn't do that.

【0005】また、スパッタ法やCVD法などは減圧下
でなければ良好な膜が得られず、真空排気できる反応容
器が必要であり、一般に成膜速度が遅く、緻密な膜を得
るためには数百度以上に基体を加熱しなければならない
欠点がある。
[0005] Further, in the sputtering method, the CVD method, and the like, a good film cannot be obtained unless the pressure is reduced, and a reaction vessel capable of evacuating is required. There is a disadvantage that the substrate must be heated to several hundred degrees or more.

【0006】ゾルゲル法で作製された市販のTiO2ゾルは
塗布や含浸処理が可能で、大面積コーティング、低温合
成が可能で工業的な利点が多いが、チタンテトライソプ
ロポキサイドやテトラブチルチタネイトなどの有機金属
を利用して合成しなければならなかったため、原料が高
価で、しかも原料が化学的に不安定で温度制御や雰囲気
に影響されやすく取り扱い難いという課題があった。ま
た、ゾルゲル法は原料ゾル中に酸や有機物質を含むので
焼成除去するのに400℃以上の加熱が必要であり、酸
に侵されやすい材料には不向きで、低温焼成では多孔質
になりやすい。また、ゾルゲル法は工程が煩雑で、有害
な有機溶媒を使用しなければならない。また、ゾルゲル
法によって作製したTiO2ゾル中には酸やアルカリあるい
は有機物が加えられており、被コーティング材の腐蝕の
問題や有機物消却のための温度(400℃以上)が必要
で、加熱焼成中に有害なハロゲン化物や窒素酸化物など
が副成する等の欠点があった。
[0006] Commercial TiO2 sol produced by the sol-gel method can be applied and impregnated, can be coated over a large area, can be synthesized at low temperatures, and has many industrial advantages. However, titanium tetraisopropoxide, tetrabutyl titanate, etc. Therefore, there is a problem that the raw material is expensive, and the raw material is chemically unstable, is easily affected by temperature control and atmosphere, and is difficult to handle. In addition, the sol-gel method requires heating at 400 ° C. or higher to remove by baking because it contains an acid or an organic substance in the raw material sol, and is not suitable for a material that is easily attacked by an acid, and easily becomes porous when baking at a low temperature. . In addition, the sol-gel method requires complicated steps and requires the use of harmful organic solvents. The TiO2 sol prepared by the sol-gel method contains an acid, alkali or organic substance, which requires a problem of corrosion of the material to be coated and a temperature (400 ° C. or higher) for eliminating the organic substance. There are drawbacks such as harmful halides and nitrogen oxides being formed as by-products.

【0007】以上のように、従来の方法では密度の高い
結晶性チタニア膜を低温で作製することが困難であり、
比較的低温で作製できるゾルゲル法では有機物質や酸等
を熱処理で分解消失させることが必要で、そのことが多
孔質化しやすくする原因にもなり、密度の高い膜を作製
するには熱処理温度を比較的高くしなければならなかっ
た。また、それらの助剤が熱処理によって窒素酸化物や
有機気体等の有害物質を生成する欠点もあった。比較的
低温合成ができるゾルゲル法でも、1回の塗布では0.
1から0.3μm程度の膜厚のものしか密着性良く形成
できなかった。
As described above, it is difficult to produce a high-density crystalline titania film at a low temperature by the conventional method.
In the sol-gel method, which can be formed at a relatively low temperature, it is necessary to decompose and eliminate organic substances, acids, and the like by heat treatment. Had to be relatively high. There is also a disadvantage that these auxiliaries generate harmful substances such as nitrogen oxides and organic gases by heat treatment. Even in the sol-gel method, which can be synthesized at a relatively low temperature, it is possible to obtain 0.1% by one application.
Only those having a thickness of about 1 to 0.3 μm could be formed with good adhesion.

【0008】[0008]

【課題を解決するための手段】前述のような問題点を解
決するために、本発明では以下のような全く新しい手段
によってチタニア膜形成用の塗布液体を合成した。ま
ず、塩化チタンや硫酸チタン水溶液とアンモニアや苛性
ソーダ等のアルカリ溶液からオルトチタン酸と呼ばれる
水酸化チタンゲルを沈殿させる。水を用いたデカンテー
ションによって水洗し、水酸化チタンゲルを分離する。
さらに過酸化水素水を加え、余分な過酸化水素を分解除
去することにより、請求項1の黄色の透明粘性液体を得
ることができる。この液体は、後述するように、過酸化
状態の水酸化チタンを含んでいると考えられ、市販のTi
O2ゾルとは本質的に異なるものである。一方、請求項2
の発明では、請求項1の液体を80℃以上で加熱処理を
行うと結晶化した酸化チタンの超微粒子を含む液体が得
られる。この液体は中性で、チタン、酸素及び水素以外
の物質を含まないので、市販のTiO2ゾルとは本質的に異
なるものである。これらの2つの液体を基体上に塗布乾
燥、または低温で加熱処理することにより付着性に優れ
た緻密なチタニア膜を形成できる。また、1回の塗布で
1μm以上のチタニア膜を剥離することなく密着性よく
形成できる。
In order to solve the above-mentioned problems, in the present invention, a coating liquid for forming a titania film is synthesized by completely new means as follows. First, a titanium hydroxide gel called orthotitanic acid is precipitated from an aqueous solution of titanium chloride or titanium sulfate and an alkaline solution such as ammonia or caustic soda. Wash with water by decantation with water to separate the titanium hydroxide gel.
Further, by adding aqueous hydrogen peroxide to decompose and remove excess hydrogen peroxide, the yellow transparent viscous liquid of claim 1 can be obtained. This liquid is considered to contain peroxidized titanium hydroxide, as will be described later.
It is essentially different from O2 sol. On the other hand, claim 2
According to the invention, when the liquid of claim 1 is subjected to a heat treatment at 80 ° C. or higher, a liquid containing crystallized ultrafine particles of titanium oxide can be obtained. This liquid is essentially different from commercial TiO2 sols because it is neutral and free of substances other than titanium, oxygen and hydrogen. By coating and drying these two liquids on a substrate or performing heat treatment at a low temperature, a dense titania film having excellent adhesion can be formed. In addition, it is possible to form a titania film having a thickness of 1 μm or more with a single coating with good adhesion without peeling.

【0009】チタン原料は安価で取扱が容易な硫酸塩や
塩化物、しゅう酸塩等が望ましく、また、水酸化物の沈
殿を起こす塩基性物質はアンモニア水、苛性ソーダ等が
望ましい。反応によって副成する塩は安定で無害な塩化
ナトリウム、硫酸ナトリウムあるいは塩化アンモニウム
等になるような組み合わせが 望ましい。原料溶液の濃
度は特に制限はない。沈殿させるpHは2程度で行い、Fe
等の不純物が共沈しないようにすることが望ましい。
The raw material of titanium is desirably inexpensive and easy to handle, such as sulfates, chlorides, oxalates, and the like. The basic substance that causes precipitation of hydroxide is preferably aqueous ammonia, caustic soda, or the like. The salt by-produced by the reaction is desirably in a combination that forms stable and harmless sodium chloride, sodium sulfate or ammonium chloride. The concentration of the raw material solution is not particularly limited. The precipitation pH is about 2 and
It is desirable that impurities such as are not coprecipitated.

【0010】沈殿した水酸化チタン(オルトチタン酸と
呼ばれる場合もある)はOH同志の重合や水素結合によっ
て高分子化したゲル状態にあり、このままではチタニア
膜の塗布液としては使用できない。このゲルに過酸化水
素水を添加するとOHの一部が過酸化状態になりペルオキ
ソチタン酸イオンとして溶解、あるいは高分子鎖が低分
子に分断された一種のゾル状態になり、余分な過酸化水
素は水と酸素になって分解し、チタニア膜形成用の粘性
液体として使用ができるようになる。このゾルは、チタ
ン以外に酸素と水素しか含まないので、乾燥や焼成によ
って酸化チタンに変化する場合に水と酸素しか発生しな
いため、ゾルゲル法や硫酸塩等の熱分解法に必要な炭素
成分やハロゲン成分の除去が必要でなく、従来より低温
でも比較的密度の高い結晶性のチタニア膜を作製するこ
とができる。また、pHは中性なので、使用における人体
への影響や基体の腐食などを考慮する必要がない。さら
に、過酸化水素はゾル化剤としてだけではなく安定化剤
として働き、ゾルの室温域で安定性が極めて高く長期の
保存に耐える。さらに、この液体を80℃以上に加熱す
ると酸化チタンの超微粒子が生成した液体に変性させる
ことができる。80℃以下では十分にチタニアの結晶化
が進まない。塗布乾燥あるいは加熱処理することによ
り、さらに低い温度で結晶性のチタニア膜を形成できる
が、密着性を良くするためには200℃以上の処理温度
が必要である。
The precipitated titanium hydroxide (sometimes referred to as orthotitanic acid) is in a gel state polymerized by polymerization of OH and hydrogen bonds, and cannot be used as a coating solution for the titania film as it is. When hydrogen peroxide solution is added to this gel, a part of OH becomes a peroxide state and dissolves as peroxotitanate ion, or it becomes a kind of sol in which the polymer chain is divided into low molecules, and excess hydrogen peroxide is added. Is decomposed into water and oxygen and can be used as a viscous liquid for forming a titania film. Since this sol contains only oxygen and hydrogen in addition to titanium, only water and oxygen are generated when it is changed to titanium oxide by drying or baking, the carbon component necessary for the thermal decomposition method such as the sol-gel method or sulfate is used. It is not necessary to remove a halogen component, and a crystalline titania film having a relatively high density can be manufactured even at a lower temperature than in the past. Also, since the pH is neutral, there is no need to consider the effects on the human body during use and corrosion of the substrate. In addition, hydrogen peroxide acts not only as a sol agent but also as a stabilizer, and has extremely high stability in the room temperature range of the sol and withstands long-term storage. Further, when this liquid is heated to 80 ° C. or higher, it can be denatured to a liquid in which ultrafine particles of titanium oxide have been generated. If the temperature is lower than 80 ° C., crystallization of titania does not proceed sufficiently. A crystalline titania film can be formed at a lower temperature by coating and drying or heating, but a processing temperature of 200 ° C. or higher is required to improve the adhesion.

【0011】チタニア膜形成用の液体を基体に塗布する
場合には、基体との濡れ性を向上させるために、適当な
界面活性剤を添加することができる。しかし、加熱処理
をしていないチタニア膜形成用液体は、他の遷移金属イ
オンやAgイオン等を含む溶液あるいは強い酸やアルカリ
を添加すると、ゾル状態にあったチタン溶液からチタン
酸を遊離し、ゲル化することがあるので注意を要する。
When a liquid for forming a titania film is applied to a substrate, an appropriate surfactant can be added in order to improve wettability with the substrate. However, the titania film-forming liquid that has not been subjected to heat treatment, when adding a solution containing other transition metal ions or Ag ions or a strong acid or alkali, liberates titanic acid from the titanium solution in the sol state, Care must be taken as gelation may occur.

【0012】請求項1のチタニア膜形成用液体は、20
0℃未満でOH基を若干含む非晶質のチタニア膜、200
℃以上では結晶性の緻密なチタニア膜を作製できる。こ
れらの膜は耐酸性に優れ、各種の防蝕コーティングに利
用できる。また、80℃以上の加熱処理をしたチタニア
膜形成用液体は塗布するだけで結晶性のチタニア膜が形
成できるため、加熱処理をできない材料のコーティング
材として有用である。このような方法において、保護被
膜や光触媒等種々の用途に利用可能であり、しかも比較
的密度が高く密着性の良いものを比較的低温で得ること
ができる。
The liquid for forming a titania film according to claim 1 is 20
An amorphous titania film slightly containing OH groups at a temperature lower than 0 ° C., 200
At a temperature of not less than ° C., a crystalline dense titania film can be produced. These films have excellent acid resistance and can be used for various corrosion-resistant coatings. Further, a titania film-forming liquid which has been subjected to heat treatment at 80 ° C. or higher can form a crystalline titania film only by being applied, and thus is useful as a coating material of a material which cannot be subjected to heat treatment. In such a method, a material having a relatively high density and good adhesion can be obtained at a relatively low temperature, which can be used for various uses such as a protective film and a photocatalyst.

【0013】乾燥しただけの膜は耐水性があるが含侵性
もあり、他の溶液を含侵させ焼成することにより、チタ
ニア膜の中に他の物質を担持あるいは分散した複合体を
作成することも可能である。
[0013] The dried membrane is water-resistant but impregnable, and impregnated with another solution and baked to form a composite in which the titania film carries or disperses another substance. It is also possible.

【0014】基体はセラミックス、陶磁器、金属、プラ
スチックス、繊維、建材等、用途に応じた加熱処理に耐
え得る素材であればあらゆるものにコーティング可能で
あり、多孔体の内部や粉体の表面処理を行なうことも可
能である。特に中性であるために金属のチタニアコーテ
ィングを有効に行うことができる。
The substrate can be coated on any material, such as ceramics, porcelain, metal, plastics, fibers, and building materials, which can withstand heat treatment according to the intended use. It is also possible to perform In particular, since it is neutral, titania coating of metal can be effectively performed.

【0015】[0015]

【実施例1】原料として四塩化チタン60%溶液5cc
を蒸留水で500ccとした溶液にアンモニア水(1:
9)を滴下し、水酸化チタンを沈殿させた。蒸留水で洗
浄後、過酸化水素水30%溶液を10cc加えかき混
ぜ、チタンを含む黄色粘性液体(ゾル溶液)70ccを
作製することができた。過酸化水素を加えた直後は酸素
が発生し発泡するが、余分な過酸化水素が分解した後は
発泡はおさまり、常温常圧の下で6カ月たっても変化が
なかった。pHは6.4で中性であった。基板として研
磨したアルミナを用い、ゾル溶液に侵漬乾燥後、各種温
度で熱処理した。1回の塗布で得られた膜の厚みは1μ
m程度であった。得られたチタニア膜の物性を次に示
す。 熱処理温度(℃) 生成相 密度(%) 乾燥のみ 無定型 100 無定型 200 アナターゼ 71 300 アナターゼ 72 400 アナターゼ 74 500 アナターゼ 85 600 アナターゼ 92 200℃以上で緻密な結晶性のチタニア膜が密着性よく
得られた。
Example 1 5 cc of a 60% titanium tetrachloride solution as a raw material
To 500 cc of distilled water with ammonia water (1:
9) was added dropwise to precipitate titanium hydroxide. After washing with distilled water, 10 cc of a 30% aqueous solution of hydrogen peroxide was added and stirred to prepare 70 cc of a yellow viscous liquid (sol solution) containing titanium. Immediately after the addition of the hydrogen peroxide, oxygen was generated and foaming occurred, but after the excess hydrogen peroxide was decomposed, the foaming subsided, and there was no change even after 6 months at normal temperature and normal pressure. The pH was neutral at 6.4. Polished alumina was used as a substrate, immersed and dried in a sol solution, and then heat-treated at various temperatures. The thickness of the film obtained by one application is 1μ.
m. The physical properties of the obtained titania film are shown below. Heat treatment temperature (° C.) Generated phase density (%) Dry only Amorphous 100 Amorphous 200 Anatase 71 300 Anatase 72 400 Anatase 74 500 Anatase 85 600 Anatase 92 At 200 ° C. or higher, a dense crystalline titania film can be obtained with good adhesion. Was.

【0016】[0016]

【実施例2】実施例1の液体を80℃、100℃、12
0℃、160℃及び200℃で6時間加熱処理あるいは
オートクレーブ処理したゾル溶液の性状を次に示す。 熱処理温度(℃) 生成相 80 アナターゼ 薄黄色半透明の液体 100 アナターゼ 薄黄色半透明の液体 120 アナターゼ 白色不透明の液体 160 アナターゼ 白色不透明の液体 200 アナターゼ 白色不透明の液体 いずれも中性で結晶化したチタニア(アナターゼ型)を
含んだ液体が得られた。100℃で処理した液体に研磨
したアルミナを侵漬乾燥後、各種温度で熱処理した。得
られたチタニア膜の物性を次に示す。 熱処理温度(℃) 生成相 密度(%) 乾燥のみ アナターゼ 69 100 アナターゼ 70 200 アナターゼ 73 300 アナターゼ 75 400 アナターゼ 78 500 アナターゼ 87 600 アナターゼ 95 室温乾燥でも結晶性のチタニア膜が作製でき密着性にも
優れていた。
Example 2 The liquid of Example 1 was used at 80 ° C., 100 ° C., 12
The properties of the sol solution heat-treated or autoclaved at 0 ° C., 160 ° C., and 200 ° C. for 6 hours are shown below. Heat treatment temperature (° C) Product phase 80 Anatase Light yellow translucent liquid 100 Anatase Light yellow translucent liquid 120 Anatase White opaque liquid 160 Anatase White opaque liquid 200 Anatase White opaque liquid Both neutral and crystallized titania A liquid containing (anatase type) was obtained. Polished alumina was immersed and dried in a liquid treated at 100 ° C., and then heat-treated at various temperatures. The physical properties of the obtained titania film are shown below. Heat treatment temperature (° C) Produced phase Density (%) Dry only Anatase 69 100 Anatase 70 200 Anatase 73 300 Anatase 75 400 Anatase 78 500 Anatase 87 600 Anatase 95 A crystalline titania film can be produced even at room temperature and has excellent adhesion. Was.

【00017】[00017]

【比較例1】原料として水酸化チタンを水に分散させた
液体(0.2M、白色不透明液、分散剤含有)を用い、
研磨したアルミナをこの液体に侵漬乾燥後、各種温度で
熱処理した。1回の塗布で得られた膜の厚みは0.2μ
m程度であった。それ以上厚く塗布すると乾燥後、膜が
剥離しやすかった。得られたチタニア膜の物性を次に示
す。 熱処理温度(℃) 生成相 密度(%) 乾燥のみ 無定型 100 無定型 200 無定型 300 無定型 400 アナターゼ 49 500 アナターゼ 60 600 アナターゼ 81 400℃以上で結晶性のチタニア膜が得られ、結晶化温
度や緻密化温度は本発明の方法に比べ高い温度が必要で
あった。
Comparative Example 1 As a raw material, a liquid in which titanium hydroxide was dispersed in water (0.2 M, white opaque liquid, containing a dispersant) was used.
The polished alumina was immersed in the liquid and dried, and then heat-treated at various temperatures. The thickness of the film obtained by one application is 0.2μ
m. When the coating was thicker than that, the film was easily peeled off after drying. The physical properties of the obtained titania film are shown below. Heat treatment temperature (° C.) Generated phase density (%) Dry only Amorphous 100 Amorphous 200 Amorphous 300 Amorphous 400 Anatase 49 500 Anatase 60 600 Anatase 81 At 400 ° C. or higher, a crystalline titania film is obtained. The densification temperature required a higher temperature than the method of the present invention.

【0018】[0018]

【実施例3】実施例1のゾル溶液及び比較例1の水酸化
チタンを鉄板(99.9%)に塗布し、各種温度で熱処
理し、0.1N硝酸水溶液に常温で1時間侵積し耐酸性
試験を行った。膜厚は約0.3μmである。その結果を
以下に示す。 熱処理温度(℃) 実施例1の膜 実施例2の膜 水酸化チタンによる膜 乾燥のみ 腐蝕 腐蝕 腐蝕 100 一部腐蝕 一部腐蝕 腐蝕 200 良好 良好 腐蝕 300 良好 良好 腐蝕 400 良好 良好 一部腐蝕 500 良好 良好 良好 600 良好 良好 良好 本発明の方がより低温の熱処理で耐酸性を示すチタニア
膜を生成できたことが示された。
Example 3 The sol solution of Example 1 and the titanium hydroxide of Comparative Example 1 were applied to an iron plate (99.9%), heat-treated at various temperatures, and immersed in a 0.1N nitric acid aqueous solution at room temperature for 1 hour. An acid resistance test was performed. The thickness is about 0.3 μm. The results are shown below. Heat treatment temperature (° C.) Film of Example 1 Film of Example 2 Film with titanium hydroxide Dry only Corrosion Corrosion 100 Partial corrosion Partial corrosion Corrosion 200 Good Good Corrosion 300 Good Good Corrosion 400 Good Good Partial corrosion 500 Good Good Good 600 good good good It was shown that the present invention could produce a titania film exhibiting acid resistance by heat treatment at a lower temperature.

【0019】[0019]

【実施例4】実施例1のゾル溶液をスライドガラスに塗
布乾燥し、0.04N硝酸銀水溶液に1分間侵積し、水
洗後300℃で焼成した。その結果、酸化銀約3wt%
含有の緻密なチタニア膜が得られた。この被膜は銀の抗
菌性被膜として使用可能である。
Example 4 The sol solution of Example 1 was applied to a slide glass and dried, immersed in a 0.04 N silver nitrate aqueous solution for 1 minute, washed with water and fired at 300 ° C. As a result, about 3 wt% of silver oxide
The resulting dense titania film was obtained. This coating can be used as a silver antimicrobial coating.

【0020】[0020]

【実施例5】実施例1のゾル溶液及び比較例1の水酸化
チタンをスライドガラスに塗布し、各種温度で熱処理
し、100ppmの酢酸溶液中に侵積し、6Wの紫外線ラ
ンプ照射下(1時間)で酢酸分解試験を行い光触媒活性
テストを行った。膜厚は約0.3μmである。その結果
を以下に示す。 熱処理温度(℃) 実施例1の膜 実施例2の膜 水酸化チタンによる膜 乾燥のみ 不活性 活性 不活性 100 不活性 活性 不活性 200 活性 活性 不活性 300 活性 活性 不活性 400 活性 活性 活性 500 活性 活性 活性 600 活性 活性 活性 本発明の方がより低温の熱処理で結晶性のチタニアを生
成するため、光触媒特性を示すチタニア膜がより低温で
生成できた。
Example 5 The sol solution of Example 1 and the titanium hydroxide of Comparative Example 1 were applied to a slide glass, heat-treated at various temperatures, immersed in a 100 ppm acetic acid solution, and irradiated with a 6 W ultraviolet lamp (1). ), An acetic acid decomposition test was performed and a photocatalytic activity test was performed. The thickness is about 0.3 μm. The results are shown below. Heat treatment temperature (° C.) Film of Example 1 Film of Example 2 Film with titanium hydroxide Dry only Inactive Inactive 100 Inactive Active Inactive 200 Active Active Inactive 300 Active Active Inactive 400 Active Active 500 Active Active Activity 600 Activity Activity Activity In the present invention, crystalline titania was generated by a lower temperature heat treatment, and thus a titania film exhibiting photocatalytic properties could be generated at a lower temperature.

【0021】[0021]

【発明の効果】本発明の方法を使用することにより、安
定なチタニア膜形成用溶液が作成可能であり、従来より
も比較的密度の高い密着性に優れた結晶性チタニア膜が
低温で作成可能となる。また、本発明の液体は従来のTi
O2ゾルとは本質的に異なるものであり、焼成によって有
害な副生成物が出ず、中性なので取り扱いやすく、ま
た、1回の塗布で1μm以上の緻密な膜を形成できるな
ど膜の作製工程上の利点が多数ある。このような利点の
ために、塗布法により酸化物膜を作製する上でこれまで
問題になっていた原料液体の安定性やpH、低温合成等
の課題を解決することができる。したがって、低温コー
ティングが要求される金属のチタニアコーティングや様
々な材料への低温チタニアコーティングによる光触媒活
性の付与など、産業上において与える効果も大きい。
By using the method of the present invention, a stable titania film forming solution can be prepared, and a crystalline titania film having a relatively high density and excellent adhesion can be formed at a low temperature. Becomes Further, the liquid of the present invention is a conventional Ti
It is essentially different from O2 sol, and it does not produce harmful by-products by baking, it is neutral and easy to handle, and it can form a dense film of 1 μm or more in one application. There are many advantages above. Due to such advantages, problems such as stability of raw material liquid, pH, low-temperature synthesis, and the like, which have been a problem in producing an oxide film by a coating method, can be solved. Therefore, there are great industrial effects such as the application of photocatalytic activity to metal by titania coating which requires low-temperature coating and low-temperature titania coating to various materials.

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 チタニア膜形成用液体において、チタン
を含む水溶液と塩基性物質から作製した水酸化チタンゲ
ルに過酸化水素水を作用させた後に、80℃以上におい
て加熱処理あるいはオートクレーブ中において加熱処理
したことによってアナターゼからなる酸化チタン微粒子
を生成させたことを特徴とするチタニア膜形成用液体。
In a liquid for forming a titania film, a hydrogen peroxide solution is allowed to act on a titanium hydroxide gel prepared from an aqueous solution containing titanium and a basic substance, and then subjected to a heat treatment at 80 ° C. or higher or a heat treatment in an autoclave. 1. A liquid for forming a titania film, wherein titanium oxide fine particles comprising anatase are produced.
【請求項2】 チタニア膜形成用液体の製造方法におい
て、チタンを含む水溶液と塩基性物質から作製した水酸
化チタンゲルに過酸化水素水を作用させた後に、80℃
以上において加熱処理あるいはオートクレーブ中におい
て加熱処理したことによってアナターゼからなる酸化チ
タン微粒子を生成させたことを特徴とするチタニア膜形
成用液体の製造方法。
2. A method for producing a liquid for forming a titania film, wherein a hydrogen peroxide solution is allowed to act on a titanium hydroxide gel prepared from an aqueous solution containing titanium and a basic substance.
A method for producing a liquid for forming a titania film, characterized in that titanium oxide fine particles comprising anatase are generated by the above heat treatment or heat treatment in an autoclave.
【請求項3】 チタニア膜において、チタンを含む水溶
液と塩基性物質から作製した水酸化チタンゲルに過酸化
水素水を作用させた後に、80℃以上において加熱処理
あるいはオートクレーブ中において加熱処理したことに
よって得られたアナターゼからなる酸化チタン微粒子を
分散した液体を、基体に塗布あるいは含浸させた後に、
乾燥あるいは加熱処理して作製することを特徴とするチ
タニア膜。
3. A titania film obtained by subjecting a titanium hydroxide gel prepared from an aqueous solution containing titanium and a basic substance to a hydrogen peroxide solution, followed by heat treatment at 80 ° C. or higher or heat treatment in an autoclave. After applying or impregnating a liquid in which titanium oxide fine particles comprising anatase are dispersed,
A titania film produced by drying or heat treatment.
【請求項4】 チタニア膜形成方法において、チタンを
含む水溶液と塩基性物質から作製した水酸化チタンゲル
に過酸化水素水を作用させた後に、80℃以上において
加熱処理あるいはオートクレーブ中において加熱処理し
たことによって得られたアナターゼからなる酸化チタン
微粒子を分散した液体を、基体に塗布あるいは含浸させ
た後に、乾燥あるいは加熱処理して作製することを特徴
とするチタニア膜形成方法。
4. A method for forming a titania film, wherein a hydrogen peroxide solution is allowed to act on a titanium hydroxide gel prepared from an aqueous solution containing titanium and a basic substance, followed by heat treatment at 80 ° C. or higher or heat treatment in an autoclave. A method for forming a titania film, comprising applying or impregnating a substrate with a liquid in which titanium oxide fine particles of anatase obtained by the above method are dispersed, and then drying or heating the substrate.
JP24838495A 1995-08-31 1995-08-31 Liquid for forming titania film, titania film and method for producing the same Expired - Lifetime JP2938376B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24838495A JP2938376B2 (en) 1995-08-31 1995-08-31 Liquid for forming titania film, titania film and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24838495A JP2938376B2 (en) 1995-08-31 1995-08-31 Liquid for forming titania film, titania film and method for producing the same

Publications (2)

Publication Number Publication Date
JPH0971418A JPH0971418A (en) 1997-03-18
JP2938376B2 true JP2938376B2 (en) 1999-08-23

Family

ID=17177307

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24838495A Expired - Lifetime JP2938376B2 (en) 1995-08-31 1995-08-31 Liquid for forming titania film, titania film and method for producing the same

Country Status (1)

Country Link
JP (1) JP2938376B2 (en)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3690864B2 (en) * 1996-03-29 2005-08-31 株式会社ティオテクノ Production method of photocatalyst
JPH10237352A (en) * 1997-02-24 1998-09-08 Tao:Kk Polyfunctional coating agent
JP4672822B2 (en) * 1997-02-24 2011-04-20 株式会社ティオテクノ Hydrophilic coating agent and surface hydrophilic substrate
WO2000018686A1 (en) * 1998-09-28 2000-04-06 Tao Inc. Method for production of amorphous titanium peroxide solution and anatase titanium oxide sol
JP3223450B2 (en) 1999-06-07 2001-10-29 モリオキ産業株式会社 Ultra high magnetic fluid processing equipment
GB2350841B (en) * 1999-06-08 2001-12-19 Kansai Paint Co Ltd Inorganic film-forming coating composition, preparation method therof and inorganic film-forming method
US6733580B2 (en) 1999-06-08 2004-05-11 Kansei Paint Co., Ltd Inorganic film-forming coating composition, preparation method thereof and inorganic film-forming method
JP3122432B1 (en) 1999-07-05 2001-01-09 モリオキ産業株式会社 Method for producing solution for forming titanium oxide film
TWI279254B (en) 1999-10-29 2007-04-21 Sumitomo Chemical Co Titanium oxide, and photocatalyst and photocatalyst coating composition using the same
GB9928865D0 (en) * 1999-12-07 2000-02-02 Univ South Bank Improved ceramic material
JP2001335321A (en) * 2000-05-24 2001-12-04 Sumitomo Chem Co Ltd Titanium hydroxide, and photocatalyst and coating agent prepared therewith
DE10196405B4 (en) * 2000-07-03 2008-01-24 Kansai Paint Co., Ltd., Amagasaki Gas barrier film
JP3949374B2 (en) 2000-07-17 2007-07-25 住友化学株式会社 Titanium oxide, photocatalyst and photocatalyst coating using the same
KR100381921B1 (en) * 2000-07-21 2003-04-26 김정환 Titania coating solution and Method for manufacturing the same
TW575523B (en) 2001-05-22 2004-02-11 Kansai Paint Co Ltd Inorganic film-forming coating composition and inorganic film-forming method by use of the same
EP1398146A1 (en) * 2001-06-11 2004-03-17 Murakami Corporation Antifogging element and method for forming the same
KR100436240B1 (en) * 2001-11-01 2004-06-16 김대승 Titanium dioxide photocatalyst comprising an antimicrobial metallic component and method of preparation thereof
KR20020031359A (en) * 2002-01-28 2002-05-01 김영도 A Titania Moistness Gel And Method Manufacturing The Same
JP2003246622A (en) * 2002-02-25 2003-09-02 Sumitomo Chem Co Ltd Titanium oxide precursor, method of producing the same and method of producing titanium oxide using the precursor
JP4269621B2 (en) * 2002-10-04 2009-05-27 住友化学株式会社 Method for producing titanium oxide
JP2004196626A (en) * 2002-12-20 2004-07-15 Sumitomo Chem Co Ltd Method for producing titanium oxide
JP4287695B2 (en) * 2003-05-15 2009-07-01 株式会社ティオテクノ Photocatalyst
JP2005008707A (en) * 2003-06-17 2005-01-13 Sustainable Titania Technology Inc Dispersion for forming photocatalytic coating film having excellent transparency and stability, method for producing the same and method for producing structure using the same
JP3584312B1 (en) * 2003-12-02 2004-11-04 株式会社四国総合研究所 Method for forming titanium oxide film
JP4804720B2 (en) * 2004-04-09 2011-11-02 日鉄鉱業株式会社 Titanium oxide film-coated powder and method for producing the same
GB2416165B (en) * 2004-07-15 2008-07-09 Wen-Chuan Liu Method for manufacturing nanometer scale crystal titanium dioxide photo-catalyst sol-gel
KR100623675B1 (en) * 2004-08-30 2006-09-19 (주)에이엠티기술 Synthesizing Process for High Efficiency Titanium Dioxide Nanosol
JP4755408B2 (en) * 2004-11-01 2011-08-24 東洋工業株式会社 Method for manufacturing wall-use decorative block
JP4613154B2 (en) * 2005-10-26 2011-01-12 日本メンテナスエンジニヤリング株式会社 Photocatalyst coating agent and method for producing coating film
JP4531797B2 (en) * 2006-09-01 2010-08-25 勇仁 藤田 Method for producing metal oxide-supported porous body
US7659226B2 (en) 2007-02-26 2010-02-09 Envont Llc Process for making photocatalytic materials
WO2010122661A1 (en) * 2009-04-24 2010-10-28 長宗産業株式会社 Metal-compound-containing gel, metal-compound-containing liquid, and method for producing metal compounds and metal compound films
JP2021006652A (en) * 2019-06-28 2021-01-21 株式会社イリス Method for coating peroxotitanium
CN114105193A (en) * 2021-11-30 2022-03-01 重庆英诺维节能环保科技有限公司 Preparation method of ultraviolet shielding nano titanium dioxide material

Also Published As

Publication number Publication date
JPH0971418A (en) 1997-03-18

Similar Documents

Publication Publication Date Title
JP2938376B2 (en) Liquid for forming titania film, titania film and method for producing the same
JP4335446B2 (en) Titanium oxide sol, thin film and method for producing them
JP2875993B2 (en) Anatase dispersion and method for producing the same
EP1052224B1 (en) Particles, aqueous dispersion and film of titanium oxide, and preparation thereof
JP2783417B2 (en) Manufacturing method of rutile type titanium oxide sol
JP3524342B2 (en) Titanium dioxide sol and thin film for thin film formation
JPH1053437A (en) Coating with amorphous type titanium peroxide
WO2000010921A1 (en) Finely particulate titanium-containing substance, coating fluid containing the same, processes for producing these, and molded article having thin film comprising the substance
EP1153999B1 (en) Photocatalytic coating composition and product having thin photocatalytic film
JP3755852B2 (en) Coating liquid for forming transparent film having photocatalytic activity and substrate with transparent film
JP5118068B2 (en) PHOTOCATALYST THIN FILM, PHOTOCATALYST THIN FILM FORMATION METHOD, AND PHOTOCATALYST THIN FILM COATED PRODUCT
JP2005171029A (en) Coating composition, method of forming film having optical catalytic function, and optical catalytic member
JP3490012B2 (en) Method for producing crystalline titanium oxide particle dispersion liquid
GB2350841A (en) Titanium oxide precursor coating composition
US7547357B2 (en) Transparent film-forming composition
JPH06287467A (en) Weather-resistant fibrous pigment
JP4343335B2 (en) Titanium oxide coating film forming composition for photocatalyst and process for producing the same
JPH09217028A (en) Coating composition for forming transparent coating membrane having photocatalytic activity and base material with transparent coating membrane
JP4608042B2 (en) Coating agent for forming inorganic film, method for producing the same, and method for forming the inorganic film
JP2001058825A (en) Coating agent for forming inorganic film, its production and formation of the same inorganic film
JP2003012324A (en) Spherical particles with titanium oxide coating layer and their producing method
KR100381921B1 (en) Titania coating solution and Method for manufacturing the same
JP4571793B2 (en) Aqueous photocatalyst coating solution
JP4187632B2 (en) Method for forming titanium dioxide thin film and catalyst having the titanium dioxide thin film
JPH1060665A (en) Hydrophilic coating film and its production

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090611

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100611

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100611

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110611

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110611

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120611

Year of fee payment: 13

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120611

Year of fee payment: 13

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130611

Year of fee payment: 14

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term