KR20220068433A - transparent film with enhanced durabilit - Google Patents

transparent film with enhanced durabilit Download PDF

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KR20220068433A
KR20220068433A KR1020200155206A KR20200155206A KR20220068433A KR 20220068433 A KR20220068433 A KR 20220068433A KR 1020200155206 A KR1020200155206 A KR 1020200155206A KR 20200155206 A KR20200155206 A KR 20200155206A KR 20220068433 A KR20220068433 A KR 20220068433A
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layer
inorganic material
transparent film
refractive index
passivation layer
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KR1020200155206A
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KR102573582B1 (en
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이민수
박종천
정수현
한정협
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엠에스웨이 주식회사
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Priority to PCT/KR2020/016536 priority patent/WO2022107939A1/en
Priority to US17/622,751 priority patent/US20230273347A1/en
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Abstract

Disclosed is a transparent film with enhanced durability. The transparent film with enhanced durability of the present invention comprises: a substrate layer; a first inorganic material layer laminated on one side of the substrate layer; a metal layer laminated on one surface of the first inorganic material layer; a second inorganic material layer laminated on one surface of the metal layer; and a plurality of organic material layers laminated on one surface of the second inorganic material layer.

Description

내구성이 강화된 투명필름{transparent film with enhanced durabilit}Durability enhanced transparent film {transparent film with enhanced durabilit}

본 발명은 내구성이 강화된 투명필름에 관한 것이다.The present invention relates to a transparent film with enhanced durability.

최근 엘이디 티비(LED TV)를 포함하여 8K 이상의 고해상도 디스플레이 제품들이 많이 출시되고 있다. 그러나 해상도가 높아질수록 단일 면적의 픽셀(pixel)의 밀도는 높아진다. 픽셀의 밀도가 높아짐에 따라 TFT의개수도 증가하며 자연스럽게 열이 발생된다.Recently, many high-resolution display products of 8K or higher, including LED TVs, have been released. However, as the resolution increases, the density of pixels in a single area increases. As the density of pixels increases, the number of TFTs also increases and heat is generated naturally.

LED TV는 TFT 뿐만 아니라 LED자체에서도 열이 많이 발생되어 LCD/OLED 보다 많은 열과 전자파가 나오게 되어 열과 전자파를 동시에 차단하는 필요가 높아지고 있다.LED TV generates a lot of heat not only from TFT but also from the LED itself, which generates more heat and electromagnetic waves than LCD/OLED.

기존 ITO 전극과 같은 경우에는 우수한 전기전도도 및 높은 광투과도를 갖는 전극 재료로서 현재까지 광범위하게 사용되고 있다. 하지만, 열차단특성 및 전자파 차폐 성능이 현저하게 떨어져 사용이 불가능한 수준이다.In the case of the conventional ITO electrode, it is widely used as an electrode material having excellent electrical conductivity and high light transmittance. However, the thermal barrier properties and electromagnetic wave shielding performance are remarkably deteriorated to a level that cannot be used.

은나노와이어(AgNW)도 투명도가 높으나 열차단 능력 및 신뢰성의 문제를 극복하지 못하는 고질적 문제를 안고 있다.Although silver nanowire (AgNW) has high transparency, it has a chronic problem in that it cannot overcome the problems of heat blocking ability and reliability.

은(Ag) 또는 은의 합금에 대한 수 많은 연구가 진행이 되었으나 현재까지 은의 안정성이 확보된 해결책은 없었다.Numerous studies on silver (Ag) or silver alloys have been conducted, but there has been no solution that has secured the stability of silver so far.

그럼에도 불구하고 은은 전자기와 열의 차폐, 차단 특성이 다른 어떤 물질보다 탁월하여 은의 내구성을 확보하기 위한 연구가 지속되고 있다.Nevertheless, silver has superior electromagnetic and heat shielding and blocking properties than any other material, so research to secure the durability of silver is continuing.

특히 박막으로 형성된 Ag층은 두꺼운 막에 비하여 안정성이 훨씬 떨어진다는 점을 감안할 때 은 박막층의 안정성을 확보하는 것은 중요한 기술적 과제가 된다.In particular, considering that the Ag layer formed as a thin film has much lower stability than a thick film, securing the stability of the silver thin film is an important technical task.

한편, 디스플레이 기판으로 사용되는 플라스틱 필름은 유리 기판에 비해 광투과 특성이 떨어진다. 그러므로 플라스틱 기판으로 광특성을 향상시키는 것은 쉬운 작업이 아니며 미세한 투과율까지도 가능한 증가시키는 것이 중요하다.On the other hand, a plastic film used as a display substrate has inferior light transmission properties compared to a glass substrate. Therefore, it is not an easy task to improve optical properties with a plastic substrate, and it is important to increase the transmittance even as fine as possible.

그러므로 필름에 anti-reflection효과를 부여함과 동시에 기체 투과방지막 효과를 동시에 구현하여야 한다. 산소 또는 수분에 대한 투과도는 pinhole model로 설명이 되기도 하는데 이런 이유로 다층 구조로 제작되는 것이 층간 pinhole의 거리상 분리가 되어 산소, 수분 등의 침투를 막아주는 현저한 효과가 있다.Therefore, the anti-reflection effect must be applied to the film and the gas permeation barrier effect must be realized at the same time. The permeability to oxygen or moisture is sometimes explained by the pinhole model. For this reason, the multi-layer structure has a remarkable effect in preventing the penetration of oxygen, moisture, etc. due to separation in terms of the distance of the pinholes between layers.

그러나 무기 보호층만으로는 수분과 기체의 침투를 완벽하게 막아 주지는 못하는 한계가 존재하였다.However, there was a limitation that the inorganic protective layer alone could not completely prevent the penetration of moisture and gas.

본 발명이 해결하고자 하는 기술적 과제는 은 박막층의 산화를 방지하여 내구성을 확보하여 열차단과 전자기 차단이 동시에 구현 가능한 내구성이 강화된 투명필름을 제공하는 것이다.The technical problem to be solved by the present invention is to prevent oxidation of the silver thin film layer to secure durability, and to provide a transparent film with enhanced durability that can simultaneously implement heat blocking and electromagnetic blocking.

상기의 기술적 과제를 해결하기 위해 본 발명의 일실시예에 의한 내구성이 강화된 투명필름은 기재층; 상기 기재층 일면에 적층되는 제1 무기물층; 상기 제1 무기물층 일면에 적층되는 금속층; 상기 금속층 일면에 적층되는 제2 무기물층; 및 상기 제2 무기물층 일면에 적층되는 복수의 유기물층;을 포함할 수 있다.In order to solve the above technical problem, a transparent film with enhanced durability according to an embodiment of the present invention includes a base layer; a first inorganic material layer laminated on one surface of the base layer; a metal layer laminated on one surface of the first inorganic material layer; a second inorganic material layer laminated on one surface of the metal layer; and a plurality of organic material layers stacked on one surface of the second inorganic material layer.

본 발명의 일실시예에서, 상기 기재층의 양면에 각각 배치되는 하드코팅층;을 더 포함할 수 있다.In one embodiment of the present invention, a hard coating layer disposed on both sides of the base layer, respectively; may further include.

본 발명의 일실시예에서, 상기 기재층과상기 제1 무기물층 사이, 상기 제2 무기물층과 상기 패시베이션층 사이에 각각 배치되어 굴절률을 보강하는 굴절률 매칭층;을 더 포함할 수 있다.In one embodiment of the present invention, a refractive index matching layer that is respectively disposed between the base layer and the first inorganic material layer and between the second inorganic material layer and the passivation layer to reinforce the refractive index; may further include.

본 발명의 일실시예에서, 상기 패시베이션층은, 제1 유기물을 포함하는 제1 패시베이션층; 상기 제1 유기물과 다른 제2 유기물을 포함하는 제2 패시베이션층; 상기 제1, 2 유기물과 서로 다른 제3 유기물을 포함하는 제3 패시베이션층; 및 상기 제1, 2, 3 유기물과 서로 다른 제4 유기물을 포함하는 제4 패시베이션층;을 포함할 수 있다.In one embodiment of the present invention, the passivation layer, a first passivation layer comprising a first organic material; a second passivation layer including a second organic material different from the first organic material; a third passivation layer including a third organic material different from the first and second organic materials; and a fourth passivation layer including a fourth organic material different from the first, second, and third organic materials.

본 발명의 일실시예에서, 상기 금속층은 은(Ag)을 포함하고, 상기 제1 무기물층 및 제2 무기물층은 구리산화물(CuOx)을 포함할 수 있다.In an embodiment of the present invention, the metal layer may include silver (Ag), and the first inorganic material layer and the second inorganic material layer may include copper oxide (CuOx).

본 발명의 일실시예에서, 상기 금속층은 은(Ag)을 포함하고, 상기 제1 무기물층 및 제2 무기물층은 구리질화물(CuNx)을 포함할 수 있다.In an embodiment of the present invention, the metal layer may include silver (Ag), and the first inorganic material layer and the second inorganic material layer may include copper nitride (CuNx).

본 발명은 유기물 및 무기물층이 다층으로 복합되어 은 박막층의 산화를 방지하는 효과가 있다.The present invention has an effect of preventing oxidation of the silver thin film layer by compounding the organic and inorganic layers into multiple layers.

본 발명은 은 박막층의 내구성이 강화된 결과 높은 열차단과 전자기 차단 성능이 구현되는 내구성이 강화된 투명필름을 제공할 수 있는 효과가 있다.The present invention has the effect of being able to provide a durable transparent film in which the durability of the silver thin film layer is strengthened and thus high heat blocking and electromagnetic blocking performance are realized.

도 1은 본 발명의 일실시예에 따른 내구성이 강화된 투명필름을 나타낸 것이다.
도 2는 본 발명의 일실시예에 따른 내구성이 강화된 투명필름의 파장에 따른 투과율을 측정한 실험결과이다.
도 3은 비교실시예1의 신뢰성 실험 전후를 비교한 사진이다.
도 4는 비교실시예2의 신뢰성 실험 전후를 비교한 사진이다.
도 5는 본 발명의 실시예의 신뢰성 실험 전후를 비교한 사진이다.
도 6은 본 발명의 실시예의 따른 내구성이 강화된 투명필름의 시간에 따른 투습도 측정결과를 나타낸 것이다.
도 7은 본 발명의 실시예의 따른 내구성이 강화된 투명필름의 주파수에 따른 전파방해잡음의 수준을 나타낸 것이다.
도 8은 본 발명의 실시예의 따른 내구성이 강화된 투명필름과 비교실시예들의 차열성능을 평가하기 위한 적외선 촬영 사진이다.
1 shows a transparent film with enhanced durability according to an embodiment of the present invention.
2 is an experimental result of measuring transmittance according to wavelength of a transparent film with enhanced durability according to an embodiment of the present invention.
3 is a photograph comparing before and after the reliability test of Comparative Example 1.
4 is a photograph comparing before and after the reliability test of Comparative Example 2.
5 is a photograph comparing before and after a reliability test of an embodiment of the present invention.
6 shows the measurement results of moisture permeability over time of the durable transparent film according to an embodiment of the present invention.
7 shows the level of radio interference noise according to the frequency of the durable transparent film according to the embodiment of the present invention.
8 is an infrared photograph for evaluating the heat shielding performance of the transparent film with enhanced durability according to the embodiment of the present invention and the comparative examples.

본 발명은 다양한 변환을 가할 수 있고 여러 가지 실시예를 가질 수 있는 바, 특정 실시예들을 도면에 예시하고 상세한 설명에 상세하게 설명하고자 한다. 그러나, 이는 본 발명을 특정한 실시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변환, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다.Since the present invention can apply various transformations and can have various embodiments, specific embodiments are illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention.

본 발명을 설명함에 있어서 관련된 공지 기술에 대한 구체적인 설명이 본 발명의 요지를 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.In describing the present invention, if it is determined that a detailed description of a related known technology may obscure the gist of the present invention, the detailed description thereof will be omitted.

이하, 본 발명의 실시예를 첨부한 도면들을 참조하여 상세히 설명하기로 한다. Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 1은 본 발명의 일실시예에 따른 내구성이 강화된 투명필름(100)을 나타낸 것이다.1 shows a transparent film 100 with enhanced durability according to an embodiment of the present invention.

도 1을 참조하면, 본 발명의 일실시예에 따른 내구성이 강화된 투명필름(100)은 제1 하드코팅층(110), 기재층(120), 제2 하드코팅층(130), 제1 굴절률매칭층(140), 제1 무기물층(150), 금속층(160), 제2 무기물층(170), 제2 굴절률매칭층(180), 제1 패시베이션층(192), 제2 패시베이션층(194), 제3 패시베이션층(196) 및 제4 패시베이션층(198)을 포함한다.Referring to FIG. 1 , the transparent film 100 with enhanced durability according to an embodiment of the present invention has a first hard coating layer 110 , a base layer 120 , a second hard coating layer 130 , and a first refractive index matching. Layer 140, first inorganic material layer 150, metal layer 160, second inorganic material layer 170, second refractive index matching layer 180, first passivation layer 192, second passivation layer 194 , a third passivation layer 196 and a fourth passivation layer 198 .

제1 하드코팅층(110) 및 제2 하드코팅층(130)은 고경도의 투명 필름으로 투과성 및 강도확보를 위하여 구비될 수 있다. 제1 하드코팅층(110) 및 제2 하드코팅층(130)은 고경도 및 내마모성 특성을 확보하면서 다른 기재와의 굴절률 매칭을 위하여도 사용될 수 있다. 또한, 제2 하드코팅층(130)은 상부로 무기물 층이 증착될 때 층간 부착력을 향상시키기도 한다.The first hard coating layer 110 and the second hard coating layer 130 are transparent films of high hardness and may be provided to secure transmittance and strength. The first hard coating layer 110 and the second hard coating layer 130 may be used for refractive index matching with other substrates while ensuring high hardness and wear resistance characteristics. In addition, the second hard coating layer 130 also improves interlayer adhesion when the inorganic layer is deposited thereon.

제1 하드코팅층(110) 및 제2 하드코팅층(130)의 굴절률은 비교적 낮은 것으로 선택하는 것이 바람직하다.The refractive index of the first hard coating layer 110 and the second hard coating layer 130 is preferably selected to be relatively low.

제1 하드코팅층(110) 및 제2 하드코팅층(130)은 바코팅 방식, 나이프 코팅방식, 롤 코팅방식, 블레이드 코팅 방식, 다이 코팅방식, 마이크로 그라비아 코팅방식, 콤마코팅 방식, 슬롯다이 코팅방식, 립 코팅방식, 또는 솔루션 캐스팅(solution casting)방식으로 수행되는 하드코팅 필름의 제조방법으로 제조될 수 있다.The first hard coating layer 110 and the second hard coating layer 130 are a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, a micro gravure coating method, a comma coating method, a slot die coating method, It may be manufactured by a lip coating method or a method for manufacturing a hard coating film performed by a solution casting method.

제1 하드코팅층(110)의 상부에는 기재층(120)이 적층되며, 기재층(120) 상부에는 다시 제2 하드코팅층(130)이 적층될 수 있다.A base layer 120 may be stacked on the first hard coating layer 110 , and a second hard coating layer 130 may be stacked on the base layer 120 again.

기재층(120)은 기판은 무기물 또는 유기물을 포함할 수 있다. 무기물은 유리, 석영(Quartz), Al2O3, SiC, Si, GaAs, 및 InP 중 어느 하나 또는 이들의 조합일 수 있으며 이에 제한되는 것은 아니다. 유기물은 켑톤 호일, 폴리이미드(Polyimide, PI), 폴리에테르술폰(polyethersulfone, PES), 폴리아크릴레이트(polyacrylate, PAR), 폴리에테르 이미드(polyetherimide, PEI), 폴리에틸렌 나프탈레이트(polyethylene naphthalate, PEN), 폴리에틸렌 테레프탈레이트(polyethyleneterephthalate, PET), 폴리페닐렌 설파이드(polyphenylene sulfide, PPS), 폴리아릴레이트(polyarylate), 폴리카보네이트(polycarbonate, PC), 셀룰로오스 트리 아세테이트(cellulose triacetate, CTA), 셀룰로오스 아세테이트 프로피오네이트(cellulose acetate propionate, CAP)로부터 선택되는 것일 수 있으며, 이에 제한되는 것은 아니다.The substrate layer 120 may include an inorganic material or an organic material. The inorganic material may be any one or a combination of glass, quartz, Al2O3, SiC, Si, GaAs, and InP, but is not limited thereto. Organic material is Kepton foil, polyimide (PI), polyethersulfone (PES), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN) , polyethyleneterephthalate (PET), polyphenylene sulfide (PPS), polyarylate (polyarylate), polycarbonate (PC), cellulose triacetate (CTA), cellulose acetate propio It may be selected from nate (cellulose acetate propionate, CAP), but is not limited thereto.

본 발명의 일실시예서 기재층(120)은 광학용으로 사용되는 폴리에틸렌 테레프탈레이트(polyethyleneterephthalate, PET)를 재료로 할 수 있다.In an embodiment of the present invention, the base layer 120 may be made of polyethylene terephthalate (PET) used for optics.

기재층(120)은 유기물로 구성될 패시베이션 층(192, 194, 196, 198)의 두께로 인하여 휨(curl)이 발생되기 쉬우므로 두께를 최소한 100μm 이상으로 형성하는 것이 바람직할 수 있다.Since the base layer 120 is prone to curvature due to the thickness of the passivation layers 192, 194, 196, and 198 to be composed of an organic material, it may be preferable to form a thickness of at least 100 μm.

제2 하드코팅층(130)은 기재층(120) 상에 적층될 수 있다.The second hard coating layer 130 may be laminated on the base layer 120 .

제1 굴절률매칭층(140)은 제2 하드코팅층(130) 상에 적층될 수 있다.The first refractive index matching layer 140 may be laminated on the second hard coating layer 130 .

제1 굴절률매칭층(140)은 상부에 적층되는 층들의 굴절율과 차이가 있는 절연 소재를 포함할 수 있다.The first refractive index matching layer 140 may include an insulating material that is different from the refractive index of the layers stacked thereon.

제1 굴절률매칭층(140)은 굴절율이 2.0이상의 큰 물질을 사용하는 것이 바람직하다. 굴절률 매칭에 사용되는 세라믹 재료로는 TiOx, Nb2Ox, 등이 사용된다. 제1 굴절률매칭층(140)은 금속산화물을 포함할 수 있으며, 금속산화물로는 양친성을 가지는 모든종류의 금속산화물을 포함할 수 있다. 예를 들어, 타이타늄 산화물 (Titanium sub-oxide, TiOx 및 Titanium oxide, TiO2), 아연 산화물 (Zinc oxide, ZnO), 텅스텐 산화물 (Tungsten oxide, W2O3, WO2, WO3), 몰리브덴 산화물 (Molybdenum oxide, MoO2, MoO3 및 Molybdenum sub-oxide, MoOX) 및 이들의 조합으로부터 선택되는 1종 이상을 들 수 있다.For the first refractive index matching layer 140 , it is preferable to use a material having a large refractive index of 2.0 or more. As a ceramic material used for refractive index matching, TiOx, Nb2Ox, or the like is used. The first refractive index matching layer 140 may include a metal oxide, and the metal oxide may include any type of metal oxide having an amphiphilic property. For example, titanium sub-oxide (TiOx and Titanium oxide, TiO2), zinc oxide (Zinc oxide, ZnO), tungsten oxide (Tungsten oxide, W2O3, WO2, WO3), molybdenum oxide (MoO2, MoO2, and at least one selected from MoO3 and Molybdenum sub-oxide (MoOX) and combinations thereof.

제1 굴절률매칭층(140)은 바람직하게는 적외선 및 가시광선 영역에서 투과성 및 전기전도성과 플라스마에 대한 내구성이 우수하며 낮은 온도에서 공정이 가능하고 원료 가격이 저렴하다는 점에서 아연 산화물(Zinc oxide, ZnO)을 포함할 수 있다.The first refractive index matching layer 140 is preferably zinc oxide (Zinc oxide, ZnO) may be included.

제1 무기물층(150)은 제1 굴절률매칭층(140) 상부에 적층될 수 있다. 제1 무기물층(150) 상부에는 금속층(160)이 적층되며, 제2 무기물층(170)은 금속층(160)의 다른 일면에 적층될 수 있다. 이러한 구조로서 금속층(160)은 두 개의 무기물 층에 의하여 둘러쌓일 수 있다.The first inorganic material layer 150 may be stacked on the first refractive index matching layer 140 . A metal layer 160 may be stacked on the first inorganic material layer 150 , and the second inorganic material layer 170 may be stacked on the other surface of the metal layer 160 . With this structure, the metal layer 160 may be surrounded by two inorganic material layers.

은(Ag)을 금속층으로 포함하는 투명필름은 신뢰성 테스트를 하는 동안 은(Ag) 원소가 계면으로 확산되어 새로운 확산 방지막을 자가생성하거나, 은(Ag) 박막 내 잔류하는 합금원소에 의한 비저항이 증가할 수 있어 이를 방지하기 위한 대책이 필요하였다.For transparent films containing silver (Ag) as a metal layer, during the reliability test, the silver (Ag) element diffuses to the interface to self-generate a new diffusion barrier, or the specific resistance due to the remaining alloying elements in the silver (Ag) thin film increases. Measures were needed to prevent this.

제1 무기물층(150) 및 제2 무기물층(170)은 열적 또는 화학적으로 안정적인 확산방지막의 기능을 할 수 있도록 구성된다. 은(Ag)의 확산방지막 기능을 하기 위해서, 제1 무기물층(150) 및 제2 무기물층(170)은 은(Ag)과의 상호 고용도가 낮은 Cu 및 Ti 등의 전이 금속을 포함하는 것이 바람직할 수 있다.The first inorganic material layer 150 and the second inorganic material layer 170 are configured to function as a thermally or chemically stable diffusion barrier layer. In order to function as a diffusion barrier of silver (Ag), the first inorganic material layer 150 and the second inorganic material layer 170 include transition metals such as Cu and Ti having low mutual solubility with silver (Ag). may be desirable.

제1 무기물층(150) 및 제2 무기물층(170)은 스퍼터를 이용하여 증착된 CuNx 또는 SiNx 박막으로 구성될 수 있다. 여기서, x는 정해지거나 알려진 질소량이 없다는 의미로 쓰인다. 이는 금속질화물을 제조할 때 금속에 질소를 공급하더라도 그 정확한 결합비율까지는 알 수 없기 때문이다.The first inorganic material layer 150 and the second inorganic material layer 170 may be formed of a CuNx or SiNx thin film deposited using sputtering. Here, x is used to mean that there is no fixed or known amount of nitrogen. This is because even if nitrogen is supplied to the metal when manufacturing the metal nitride, the exact bonding ratio cannot be known.

제1 무기물층(150) 및 제2 무기물층(170)은 그 증착 두께가 증가함에 따라 패시베이션 특성이 향상된다. 건식 산화법으로 형성된 SiNx 박막은 습식 산화법으로 형성된 것 보다 치밀한 계면 구조를 가짐으로 인하여 약 20배 이상 우수한 패시베이션 특성을 나타내었다.The passivation characteristics of the first inorganic material layer 150 and the second inorganic material layer 170 are improved as the deposition thickness thereof increases. The SiNx thin film formed by the dry oxidation method exhibited about 20 times or more excellent passivation characteristics because it had a denser interfacial structure than that formed by the wet oxidation method.

[표 1]은 제1 무기물층(150) 및 제2 무기물층(170)의 재질에 따른 성능을 비교한 것이다.[Table 1] compares the performances according to the materials of the first inorganic material layer 150 and the second inorganic material layer 170 .

구조rescue 측정모드measurement mode L*L* a*a* b*b* YY 550nm550nm 면저항
(Ω/sq)
sheet resistance
(Ω/sq)
CuOx/Ag/CuOxCuOx/Ag/CuOx 투과penetration 93.9893.98 -0.84-0.84 1.361.36 85.2285.22 85.2485.24 10.9410.94 반사reflect 25.7425.74 -0.95-0.95 -4.68-4.68 4.664.66 4.824.82 CuNx/Ag/CuNxCuNx/Ag/CuNx 투과penetration 93.1693.16 -1.16-1.16 0.70.7 83.3383.33 83.5883.58 11.6611.66 반사reflect 24.624.6 1.681.68 -2.3-2.3 4.294.29 4.344.34

[표 1]에서, a* 및 b*는 CIE(국제조명위원회) LAB 색공간에서 정의된 좌표로서, a*는 적색(Red)과 녹색(Green)의 정도, b*는 노란색(Yellow)과 파란색(Blue)의 정도를 나타낸다. Y는 휘도를 나타내며, L*은 명도를 나타내며, 투과율은 550nm에서 측정되었다.In [Table 1], a* and b* are coordinates defined in CIE (International Commission on Illumination) LAB color space, a* is the degree of red and green, b* is yellow and Indicates the degree of blue. Y represents luminance, L* represents brightness, and transmittance was measured at 550 nm.

본 발명에서는 구리산화물과 구리질화물을 비교 분석하여 본 결과 구리산화물의 경우에는 투과율 상승면에서 유리하였으나 패시베이션(passivation) 특성은 질화물이 우수한 것으로 나타났다.In the present invention, copper oxide and copper nitride were compared and analyzed. As a result, copper oxide was advantageous in terms of increase in transmittance, but it was found that nitride was excellent in passivation characteristics.

제1 무기물층(150) 및 제2 무기물층(170)은 투과율을 고려하여 5nm 내지 10nm 내외로 형성될 수 있다.The first inorganic material layer 150 and the second inorganic material layer 170 may be formed in a range of 5 nm to 10 nm in consideration of transmittance.

금속층(160)을 이루는 금속으로는 금속층(160)은 APC, Cu, Cu alloy, Ag, Ag alloy, Mo/Ag, Mo/APC 등 전도성 물질을 포함할 수 있다.As a metal forming the metal layer 160 , the metal layer 160 may include a conductive material such as APC, Cu, Cu alloy, Ag, Ag alloy, Mo/Ag, or Mo/APC.

바람직하게는 본 발명의 일실시예에서 금속층(160)은 은(Ag)을 포함할 수 있다.Preferably, in an embodiment of the present invention, the metal layer 160 may include silver (Ag).

금속층(160)은 두께가 증가할수록 다층 박막의 성막 시, 금속층(160) 박막이 흡수나 산란에 의해 투과도가 저하되기 때문에 10nm 내외로 형성될 수 있다.As the thickness of the metal layer 160 increases, the transmittance of the metal layer 160 decreases due to absorption or scattering when the multilayer thin film is formed.

제2 굴절률매칭층(180)은 제2 무기물층(170) 상부에 적층될 수 있다.The second refractive index matching layer 180 may be stacked on the second inorganic material layer 170 .

제2 굴절률매칭층(180)에 대한 재료는 제1 굴절률매칭층(140)과는 그 굴절률에 차이가 있는 재료일 수 있다.The material for the second refractive index matching layer 180 may be a material having a refractive index different from that of the first refractive index matching layer 140 .

제2 굴절률매칭층(180)은 굴절율이 2.0이상의 큰 물질을 사용하는 것이 바람직하다. 제2 굴절률매칭층(180)에 사용되는 세라믹 재료로는 TiOx, Nb2Ox, 등이 사용된다. 제2 굴절률매칭층(180)은 금속산화물을 포함할 수 있으며, 금속산화물로는 양친성을 가지는 모든종류의 금속산화물을 포함할 수 있다. 예를 들어, 타이타늄 산화물 (Titanium sub-oxide, TiOx 및 Titanium oxide, TiO2), 아연 산화물 (Zinc oxide, ZnO), 텅스텐 산화물 (Tungsten oxide, W2O3, WO2, WO3), 몰리브덴 산화물 (Molybdenum oxide, MoO2, MoO3 및 Molybdenum sub-oxide, MoOX) 및 이들의 조합으로부터 선택되는 1종 이상을 들 수 있다. 바람직하게는 적외선 및 가시광선 영역에서 투과성 및 전기전도성과 플라스마에 대한 내구성이 우수하며 낮은 온도에서 공정이 가능하고 원료 가격이 저렴하다는 점에서 제2 굴절률매칭층(180)은 아연 산화물(Zinc oxide, ZnO)을 포함할 수 있다.The second refractive index matching layer 180 is preferably made of a material having a large refractive index of 2.0 or more. As a ceramic material used for the second refractive index matching layer 180 , TiOx, Nb2Ox, or the like is used. The second refractive index matching layer 180 may include a metal oxide, and the metal oxide may include any type of metal oxide having an amphiphilic property. For example, titanium sub-oxide (TiOx and Titanium oxide, TiO2), zinc oxide (Zinc oxide, ZnO), tungsten oxide (Tungsten oxide, W2O3, WO2, WO3), molybdenum oxide (MoO2, MoO2, and at least one selected from MoO3 and Molybdenum sub-oxide (MoOX) and combinations thereof. Preferably, the second refractive index matching layer 180 is zinc oxide (Zinc oxide, ZnO) may be included.

제1 패시베이션층(192)은 제2 굴절률매칭층(180) 상부에 적층될 수 있다.The first passivation layer 192 may be stacked on the second refractive index matching layer 180 .

제1 패시베이션층(192)은 제1 유기물을 포함할 수 있다. 제1 패시베이션층(192)은 적층된 다른 박막들과 상호 보완하여 금속층(160) 즉, 은 박막의 산화를 방지하여 투명 차열필름의 내구성을 강화할 수 있다.The first passivation layer 192 may include a first organic material. The first passivation layer 192 may complement the other laminated thin films to prevent oxidation of the metal layer 160 , that is, the silver thin film, thereby strengthening the durability of the transparent heat shielding film.

제1 패시베이션층(192)은 제2 굴절률매칭층(180)과 부착력을 가지면서 굴절률에서는 차이가 있는 소재로 형성될 수 있다. 제1 패시베이션층(192)은 제2 굴절률매칭층(180)보다 낮은 굴절률을 갖는 고분자로 형성될 수 있으며, 그 굴절률은 1.5인 물질로 형성될 수 있다.The first passivation layer 192 may be formed of a material having an adhesive force and a refractive index different from that of the second refractive index matching layer 180 . The first passivation layer 192 may be formed of a polymer having a lower refractive index than that of the second refractive index matching layer 180 , and may be formed of a material having a refractive index of 1.5.

제1 패시베이션층(192)은, 폴리비닐피로리돈 (Polyvinylpyrrolidone, PVP), 폴리카보네이트 (Polycarbonate, PC), 폴리메틸메타아크릴레이트 (Poly(methyl methacrylate), PMMA), 폴리스타이렌 (Polystyrene, PS), 폴리바이닐 알코올 (Polyvinyl alcohol, PVA) 및 셀룰로오스 (Cellulose) 중 선택된 어느 하나로 형성될 수 있다.The first passivation layer 192 is, polyvinylpyrrolidone (Polyvinylpyrrolidone, PVP), polycarbonate (Polycarbonate, PC), polymethyl methacrylate (Poly (methyl methacrylate), PMMA), polystyrene (Polystyrene, PS), poly It may be formed of any one selected from among vinyl alcohol (Polyvinyl alcohol, PVA) and cellulose (Cellulose).

제1 패시베이션층(192)은, 용액 공정을 사용하여 30nm ~ 300nm의 두께로 형성될 수 있다. 제1 패시베이션층(192)은 30nm 이하로 형성하면 용액 공정 코팅 시 어려움이 있고, 300nm 이상으로 형성하면 굴절률 매칭층과의 부착에 어려움이 생길 수 있다. 또한, 해당 범위에서 벗어나면 투과율이 낮아질 수 있다.The first passivation layer 192 may be formed to a thickness of 30 nm to 300 nm using a solution process. If the first passivation layer 192 is formed to be less than 30 nm, there may be difficulties during solution coating, and if it is formed to be more than 300 nm, it may be difficult to attach to the refractive index matching layer. In addition, if it is out of the corresponding range, the transmittance may be lowered.

제2 패시베이션층(194)은 제1 패시베이션층(192) 상부에 적층될 수 있다.The second passivation layer 194 may be stacked on the first passivation layer 192 .

제2 패시베이션층(194)은 제2 유기물을 포함할 수 있다. 제2 패시베이션층(194)은 적층된 다른 박막들과 상호보완하여 금속층(160) 즉, 은 박막의 산화를 방지하여 투명 차열필름의 내구성을 강화할 수 있다.The second passivation layer 194 may include a second organic material. The second passivation layer 194 may complement the other laminated thin films to prevent oxidation of the metal layer 160 , that is, the silver thin film, thereby enhancing the durability of the transparent heat shielding film.

제2 패시베이션층(194)은 제1 패시베이션층(192)과 부착력을 가지면서 굴절률에서는 차이가 있는 소재로 형성될 수 있다.The second passivation layer 194 may be formed of a material having an adhesive force and a refractive index different from that of the first passivation layer 192 .

제2 패시베이션층(194)은 굴절률이 1.55인 물질로 형성될 수 있다.The second passivation layer 194 may be formed of a material having a refractive index of 1.55.

제2 패시베이션층(194)은, 우레탄아크릴레이트 계, 실리콘아크릴레이트 계 및 에폭시아크릴레이트 계 중 어느 하나의 군에서 선택된 고분자를 포함하여 형성될 수 있다.The second passivation layer 194 may be formed by including a polymer selected from any one group of urethane acrylate-based, silicone acrylate-based, and epoxy acrylate-based polymers.

제2 패시베이션층(194)은 경화가 가능한 고분자가 선택되는 것이 바람직하다. 제2 패시베이션층(194)은 또한 성능의 향상을 위해 수지 첨가물 또는 무기 필러등의 첨가제가 적용되어 형성될 수 있다. 이러한 첨가물은 발림성을 높이거나 굴절률을 원하는 정도로 조절하는 기능을 할 수 있다.The second passivation layer 194 is preferably a polymer that can be cured. The second passivation layer 194 may also be formed by applying an additive such as a resin additive or an inorganic filler to improve performance. These additives may serve to increase the spreadability or to adjust the refractive index to a desired degree.

제2 패시베이션층(194)은 용액 공정을 사용하여 50nm ~ 300nm의 두께로 형성될 수 있다. 또한, 해당 범위에서 벗어나면 투과율이 낮아질 수 있다.The second passivation layer 194 may be formed to a thickness of 50 nm to 300 nm using a solution process. In addition, when it is out of the corresponding range, the transmittance may be lowered.

제3 패시베이션층(196)은 제2 패시베이션층(194) 상부에 적층될 수 있다.The third passivation layer 196 may be stacked on the second passivation layer 194 .

제3 패시베이션층(196)은 제3 유기물을 포함할 수 있다. 제3 패시베이션층(196)은 적층된 다른 박막들과 상호보완하여 금속층(160) 즉, 은 박막의 산화를 방지하여 투명 차열필름의 내구성을 강화할 수 있다.The third passivation layer 196 may include a third organic material. The third passivation layer 196 may complement the other laminated thin films to prevent oxidation of the metal layer 160 , that is, the silver thin film, thereby strengthening the durability of the transparent heat shielding film.

제3 패시베이션층(196)은 제2 패시베이션층(194)과 부착력을 가지면서 굴절률에서는 차이가 있는 소재로 형성될 수 있다. 제3 패시베이션층(196)은 제2 패시베이션층(194)보다 낮은 굴절률을 갖는 고분자로 형성될 수 있으며, 그 굴절률은 1.5인 물질로 형성될 수 있다.The third passivation layer 196 may be formed of a material having an adhesive force and a refractive index different from that of the second passivation layer 194 . The third passivation layer 196 may be formed of a polymer having a lower refractive index than that of the second passivation layer 194 , and may be formed of a material having a refractive index of 1.5.

제3 패시베이션층(196)은, 폴리비닐피로리돈 (Polyvinylpyrrolidone, PVP), 폴리카보네이트 (Polycarbonate, PC), 폴리메틸메타아크릴레이트 (Poly(methyl methacrylate), PMMA), 폴리스타이렌 (Polystyrene, PS), 폴리바이닐 알코올 (Polyvinyl alcohol, PVA) 및 셀룰로오스 (Cellulose) 중 선택된 어느 하나로 형성될 수 있다.The third passivation layer 196 is, polyvinylpyrrolidone (Polyvinylpyrrolidone, PVP), polycarbonate (Polycarbonate, PC), polymethyl methacrylate (Poly (methyl methacrylate), PMMA), polystyrene (Polystyrene, PS), poly It may be formed of any one selected from among vinyl alcohol (Polyvinyl alcohol, PVA) and cellulose (Cellulose).

제3 패시베이션층(196)은, 용액 공정을 사용하여 30nm ~ 300nm의 두께로 형성될 수 있다.The third passivation layer 196 may be formed to a thickness of 30 nm to 300 nm using a solution process.

제4 패시베이션층(198)은 제3 패시베이션층(196) 상부에 적층될 수 있다.The fourth passivation layer 198 may be stacked on the third passivation layer 196 .

제4 패시베이션층(198)은 제4 유기물을 포함할 수 있다. 제4 패시베이션층(198)은 적층된 다른 박막들과 상호보완하여 금속층(160) 즉, 은 박막의 산화를 방지하여 투명 차열필름의 내구성을 강화할 수 있다.The fourth passivation layer 198 may include a fourth organic material. The fourth passivation layer 198 may complement the other laminated thin films to prevent oxidation of the metal layer 160 , that is, the silver thin film, thereby strengthening the durability of the transparent heat shielding film.

제4 패시베이션층(198)은 제3 패시베이션층(196)과 부착력을 가지면서 굴절률에서는 차이가 있는 소재로 형성될 수 있다.The fourth passivation layer 198 may be formed of a material having an adhesive force and a refractive index different from that of the third passivation layer 196 .

제4 패시베이션층(198)은 굴절률이 1.55인 물질로 형성될 수 있다.The fourth passivation layer 198 may be formed of a material having a refractive index of 1.55.

제4 패시베이션층(198)은, 우레탄아크릴레이트 계, 실리콘아크릴레이트 계 및 에폭시아크릴레이트 계 중 어느 하나의 군에서 선택된 고분자를 포함하여 형성될 수 있다.The fourth passivation layer 198 may be formed by including a polymer selected from any one group of urethane acrylate-based, silicone acrylate-based, and epoxy acrylate-based polymers.

제4 패시베이션층(198)은 경화가 가능한 고분자가 선택되는 것이 바람직하다. 제4 패시베이션층(198)은 또한 성능의 향상을 위해 수지 첨가물 또는 무기 필러등의 첨가제가 적용되어 형성될 수 있다.The fourth passivation layer 198 is preferably a polymer that can be cured. The fourth passivation layer 198 may also be formed by applying an additive such as a resin additive or an inorganic filler to improve performance.

제4 패시베이션층(198)은 용액 공정을 사용하여 500nm ~ 4㎛의 두께로 형성될 수 있다.The fourth passivation layer 198 may be formed to a thickness of 500 nm to 4 μm using a solution process.

이하에서는, 본 발명의 일실시예에 따른 투명필름과 비교실시예에서의 투명필름에 관한 실험 및 그 결과에 대하여 설명하기로 한다.Hereinafter, experiments and results of the transparent film according to an embodiment of the present invention and the transparent film in a comparative example will be described.

본 발명의 실시예에서는, 투명필름은 제1 하드코팅층(110), 기재층(120), 제2 하드코팅층(130), 제1 굴절률매칭층(140), 제1 무기물층(150), 금속층(160), 제2 무기물층(170), 제2 굴절률매칭층(180), 제1 패시베이션층(192), 제2 패시베이션층(194), 제3 패시베이션층(196) 및 제4 패시베이션층(198)으로 구성된다.In an embodiment of the present invention, the transparent film includes a first hard coating layer 110 , a base layer 120 , a second hard coating layer 130 , a first refractive index matching layer 140 , a first inorganic material layer 150 , and a metal layer. (160), the second inorganic material layer 170, the second refractive index matching layer 180, the first passivation layer 192, the second passivation layer 194, the third passivation layer 196 and the fourth passivation layer ( 198) is composed.

본 발명의 실시예에서, 제1 하드코팅층(110) 및 제2 하드코팅층(130)은 3 ㎛의 두께로 형성하였고, 기재층(120)은 PET를 사용하여 100㎛ 두꼐로 형성하였다. 제1 굴절률매칭층(140)은 Nb2O5로 35nm 두께로 형성하였고, 제1 무기물층(150) 및 제2 무기물층(170)은 CuNx로 5nm 두께로 형성하였고, 금속층(160)은 은(Ag)으로 10nm 두께로 형성하였다. 제2 굴절률매칭층(180)은 Nb2O5로 35nm 두께로 형성하였고, 제1 패시베이션층(192)은 PMMA로 100nm 두께로 형성하고, 제2 패시베이션층(194)은 에폭시 아크릴레이트로 180nm 두께로 형성하고, 제3 패시베이션층(196)은 PMMA로 80nm 두께로 형성하고, 제4 패시베이션층(198)은 우레탄 아크릴레이트로 1.5㎛두께로 형성하였다.In an embodiment of the present invention, the first hard coating layer 110 and the second hard coating layer 130 were formed to a thickness of 3 μm, and the base layer 120 was formed to a thickness of 100 μm using PET. The first refractive index matching layer 140 was formed of Nb2O5 to a thickness of 35 nm, the first inorganic material layer 150 and the second inorganic material layer 170 were formed to a thickness of 5 nm with CuNx, and the metal layer 160 was formed of silver (Ag). was formed to a thickness of 10 nm. The second refractive index matching layer 180 was formed of Nb2O5 to a thickness of 35 nm, the first passivation layer 192 was formed to a thickness of 100 nm with PMMA, and the second passivation layer 194 was formed to a thickness of 180 nm with epoxy acrylate, , the third passivation layer 196 was formed of PMMA with a thickness of 80 nm, and the fourth passivation layer 198 was formed with a thickness of 1.5 μm with urethane acrylate.

비교실시예 1에서 투명필름은 제1 하드코팅층, 기재층, 제2 하드코팅층, 굴절률매칭층, 금속층으로 구성된다.In Comparative Example 1, the transparent film was composed of a first hard coating layer, a base layer, a second hard coating layer, a refractive index matching layer, and a metal layer.

비교실시예 1에서, 제1 하드코팅층 및 제2 하드코팅층은 3 ㎛의 두께로 형성하였고, 기재층은 PET를 사용하여 100㎛ 두꼐로 형성하였다. 제1 굴절률매칭층은 Nb2O5로 35nm 두께로 형성하였고, 금속층은 은(Ag)으로 10nm 두께로 형성하였다.In Comparative Example 1, the first hard coating layer and the second hard coating layer were formed to a thickness of 3 μm, and the base layer was formed to a thickness of 100 μm using PET. The first refractive index matching layer was formed of Nb2O5 to a thickness of 35 nm, and the metal layer was formed of silver (Ag) to a thickness of 10 nm.

비교실시예 2에서 투명필름은 제1 하드코팅층, 기재층, 제2 하드코팅층, 굴절률매칭층, 제1 무기물층, 금속층, 제2 무기물층 및 제2 굴절률매칭층으로 구성된다.In Comparative Example 2, the transparent film consists of a first hard coating layer, a base layer, a second hard coating layer, a refractive index matching layer, a first inorganic material layer, a metal layer, a second inorganic material layer, and a second refractive index matching layer.

비교실시예 2에서, 제1 하드코팅층 및 제2 하드코팅층은 3 ㎛의 두께로 형성하였고, 기재층은 PET를 사용하여 100㎛ 두꼐로 형성하였다. 제1 굴절률매칭층은 Nb2O5로 35nm 두께로 형성하였고, 제1 무기물층 및 제2 무기물층은 CuNx로 5nm 두께로 형성하였고, 금속층은 은(Ag)으로 10nm 두께로 형성하였고, 제2 굴절률매칭층은 Nb2O5로 35nm 두께로 형성하였다.In Comparative Example 2, the first hard coating layer and the second hard coating layer were formed to a thickness of 3 μm, and the base layer was formed to a thickness of 100 μm using PET. The first refractive index matching layer was formed of Nb2O5 to a thickness of 35 nm, the first inorganic material layer and the second inorganic material layer were formed to a thickness of 5 nm with CuNx, the metal layer was formed of silver (Ag) to a thickness of 10 nm, and the second refractive index matching layer Silver was formed with Nb2O5 to a thickness of 35 nm.

비교실시예 1은 본 발명의 일실시예에 비하여, 금속층을 보호하기 위한 무기층과 유기층이 모두 존재하지 않는 것을 조건으로 하며 그 외의 구성요소들의 조건(재질 및 두께)은 동일하다.In Comparative Example 1, compared to the embodiment of the present invention, the condition that neither the inorganic layer nor the organic layer for protecting the metal layer exists, and the conditions (material and thickness) of other components are the same.

비교실시예 2는 본 발명의 일실시예에 비하여, 금속층을 보호하기 위한 무기층만을 구성하고 유기층은 구성하지 않은 것으로 그 외의 구성요소들의 조건(재질 및 두께)은 동일하다.Comparative Example 2 constitutes only an inorganic layer for protecting the metal layer and does not constitute an organic layer, and the conditions (material and thickness) of other components are the same as compared to an embodiment of the present invention.

[표 2]는 휘도 Y와 파장 550nm에서의 투과율을 나타낸 것이다.[Table 2] shows the luminance Y and transmittance at a wavelength of 550 nm.

평가 항목evaluation item 비교실시예 1Comparative Example 1 비교실시예 2Comparative Example 2 본 발명의 실시예embodiment of the present invention 투과율transmittance YY 65.465.4 77.377.3 88.188.1 @ 550 nm@ 550 nm 76.976.9 77.677.6 88.488.4

여기서 Y는 평균 투과율이고, @ 550nm는 550nm 파장에서의 투과율을 의미한다.Here, Y is the average transmittance, and @ 550 nm means transmittance at a wavelength of 550 nm.

가시광선 영역에서 파장에 따른 투과율은 도 2에서와 같다. 비교 실시예 1은 파장이 커질 수록 투과율이 낮아졌고, 비교실시예 2는 적외선 쪽으로 가까워질 수록 투과율이 비교적 높았으나 짧은 파장 영역에서는 투과율이 오히려 낮아지는 영역도 존재하였다.The transmittance according to wavelength in the visible ray region is the same as in FIG. 2 . In Comparative Example 1, the transmittance was lower as the wavelength increased, and in Comparative Example 2, the transmittance was relatively high as it approached the infrared ray.

이에 비해, 본 발명의 실시예에서는 전 가시광선 영역에 걸쳐 높은 투과율이 나타나 투과율 면에 있어서 비교실시예들에 비해 우수하였다.On the other hand, the Examples of the present invention showed high transmittance over the entire visible ray region, which was superior to those of Comparative Examples in terms of transmittance.

[표 3]은 본 발명의 실시예와 비교실시예1 및 비교실시예2를 각각 고온 고습도 조건 하에서 전후의 성능을 측정하여 비교한 것이다.[Table 3] compares the before and after performances of Examples of the present invention and Comparative Examples 1 and 2 under high temperature and high humidity conditions, respectively.

실험은 온도 60 ℃, 습도 90% (R.H) 하에서 3,000 시간을 경과시킨 후 전 후의 광학적 특성을 각각 측정하도록 진행되었다.The experiment was conducted to measure the optical properties before and after 3,000 hours had elapsed under a temperature of 60 °C and a humidity of 90% (R.H).

평가 항목evaluation item 비교실시예 1Comparative Example 1 비교실시예 2Comparative Example 2 본 발명의 실시예embodiment of the present invention I'm after I'm after I'm after 투과율transmittance YY 65.465.4 72.772.7 77.677.6 78.678.6 88.188.1 88.488.4 @ 550 nm@ 550 nm 65.665.6 73.273.2 77.677.6 79.579.5 87.287.2 89.489.4

실험결과, 비교실시예1과 2에 비해 본 발명의 실시예에서 투과율이 월등히 높게 나타났다.As a result of the experiment, the transmittance was significantly higher in Examples of the present invention compared to Comparative Examples 1 and 2.

도 3a는 비교실시예1의 실험 전 사진이고, 도 3b는 비교실시예1의 실험 후 사진이다.3A is a photograph before the experiment of Comparative Example 1, and FIG. 3B is a photograph after the experiment of Comparative Example 1.

도 4a는 비교실시예2의 실험 전 사진이고, 도 4b는 비교실시예2의 실험 후 사진이다.4A is a photograph before the experiment of Comparative Example 2, and FIG. 4B is a photograph after the experiment of Comparative Example 2.

도 5a는 본 발명의 실시예의 실험 전 사진이고, 도 5b는 본 발명의 실시예의 실험 후 사진이다.5A is a photograph before the experiment of the embodiment of the present invention, and FIG. 5B is a photograph after the experiment of the embodiment of the present invention.

한편, 도 4b와 도 5b는 외관 변화를 보다 뚜렷이 확인하기 위하여 뒷면에 흑판을 댄 후 촬영한 것이다.On the other hand, Figures 4b and 5b are taken after applying a blackboard to the back in order to more clearly confirm the change in appearance.

비교실시예1의 경우 24시간 이내에 필름 색상이 변하였으며, 외관 변화 뿐만 아니라 투과율 변화도 큰 것으로 나타나 신뢰성 실험 전후 성능 변화가 큰 것을 알 수 있었다.In the case of Comparative Example 1, the film color changed within 24 hours, and the change in transmittance as well as the appearance change was large, indicating that the performance change before and after the reliability test was large.

비교실시예2의 경우 무기물층의 기능에 의하여 신뢰성은 다소 향상되었으나 외관에 반점이 생기는 변화를 보였다.In the case of Comparative Example 2, although reliability was somewhat improved by the function of the inorganic material layer, a change in appearance was observed.

이에 비해, 본 발명의 실시예에서는 투과율과 색 변화가 거의 일어나지 않아 비교실시예들에 비해 신뢰성이 크게 향상되었음을 알 수 있다.In contrast, in the embodiment of the present invention, it can be seen that the transmittance and color change hardly occurred, so that the reliability was greatly improved compared to the comparative examples.

본 발명의 실시예에 따른 투명필름의 투습도가 측정되었으며, 비교실시예1의 투명필름과의 투습도(WVTR, Water Vapor Transmission Rate)가 비교되었다. 금속층의 산화에 가장 큰 영향을 주는 것은 습기에 의한 것으로 수증기가 통과하는 정도의 차이 비교는 신뢰성을 측정하는 하나의 척도가 될 수 있다.The water vapor transmission rate of the transparent film according to the embodiment of the present invention was measured, and the water vapor transmission rate (WVTR, Water Vapor Transmission Rate) with the transparent film of Comparative Example 1 was compared. Moisture has the greatest influence on the oxidation of the metal layer. Comparing the difference in the degree of passing of water vapor can be a measure of reliability.

비교실시예1Comparative Example 1 본 발명의 실시예embodiment of the present invention 투습도(mg/m2·day)Water vapor permeability (mg/m2·day) 52005200 210210

[표 4]는 본 발명의 실시예와 비교실시예1의 투습도를 비교한 것이다.[Table 4] compares the moisture permeability of Examples and Comparative Example 1 of the present invention.

투습도에 관한 실험결과, 비교실시예1에서의 투습도는 5200mg/m2·day이었고 본 발명의 실시예에서의 투습도는 210mg/m2·day로 측정되어 본 발명의 실시예가 비교실시예1에 비해 투습도가 1/25 수준으로 줄어든 것을 알 수 있었다.As a result of the experiment on the moisture permeability, the moisture permeability in Comparative Example 1 was 5200 mg/m2·day, and the water vapor transmission rate in the Example of the present invention was measured to be 210 mg/m2·day, so that the Example of the present invention had a higher water vapor transmission rate compared to Comparative Example 1. It was found that it was reduced to 1/25 level.

결국 본 발명의 실시예의 투명필름에 따르면 투습도가 낮아지는 효과가 있어 고온 및 고습도 조건에서의 신뢰성이 향상되는 효과가 있는 것이다.As a result, according to the transparent film of the embodiment of the present invention, there is an effect of lowering the moisture permeability, thereby improving the reliability under high temperature and high humidity conditions.

시간에 따른 투습도의 측정결과는 도 6과 같다.The measurement result of moisture permeability according to time is shown in FIG. 6 .

본 발명의 실시예에 따른 투명필름의 전자방해잡음(EMI, Electro-Magnetic Interference)에 대한 차폐성능이 측정되었다.Shielding performance against electromagnetic interference (EMI) of the transparent film according to an embodiment of the present invention was measured.

실험은 30 MHz - 1000 MHz 주파수 범위에서 차폐성능을 dB로 측정하였다.The test measured the shielding performance in dB in the frequency range of 30 MHz - 1000 MHz.

실험결과 본 발명의 실시예에서 전자파가 약 30dB 감소한 것을 알 수 있었다. 이는 ITO 필름에 대비하여 약 10dB 정도 낮은 수준이다.As a result of the experiment, it was found that the electromagnetic wave was reduced by about 30 dB in the embodiment of the present invention. This is about 10dB lower than the ITO film.

주파수에 따른 전파방해잡음의 수준(level)은 도 7에 도시되었다.The level of jamming noise according to frequency is shown in FIG. 7 .

마지막으로, 본 발명의 실시예에 따른 투명필름의 차열성능이 평가되었다. 본 발명의 실시예는 ITO(Indium Tin Oxide) 필름과 은나노와이어(AgNWs) 필름과 각각 비교되었다.Finally, the heat shielding performance of the transparent film according to the embodiment of the present invention was evaluated. Examples of the present invention were compared with ITO (Indium Tin Oxide) film and silver nanowire (AgNWs) film, respectively.

비교실시예 3에서 투명필름은 제1 하드코팅층, 기재층, 제2 하드코팅층, 굴절률매칭층, ITO 층으로 구성된다.In Comparative Example 3, the transparent film was composed of a first hard coating layer, a base layer, a second hard coating layer, a refractive index matching layer, and an ITO layer.

비교실시예 4에서 투명필름은 제1 하드코팅층, 기재층, 제2 하드코팅층, 굴절률매칭층, 은나노와이어 층으로 구성된다.In Comparative Example 4, the transparent film was composed of a first hard coating layer, a base layer, a second hard coating layer, a refractive index matching layer, and a silver nanowire layer.

차열에 관한 실험은 70℃의 열원을 준비한 후 각 실시예에서의 투명필름의 일면과 열원을 마주보게 하고 타면에 적외선(IR)를 배치하여 온도를 측정하는 방식으로 진행하였다.After preparing a heat source at 70° C., the heat shielding experiment was conducted in such a way that one side of the transparent film and the heat source in each example were facing each other, and infrared (IR) was placed on the other side to measure the temperature.

본 발명의 실시예의 투명필름은 타면 온도가 35.4℃로 측정되어 차열성능이 매우 우수함을 알 수 있었다.The transparent film of the embodiment of the present invention had a temperature of 35.4° C. on the other side, so it was found that the heat shielding performance was very excellent.

이에 비해, 비교실시예 3에서의 투명필름은 타면의 온도가 69.6℃로 측정되어 그 변화가 미미하였고, 비교실시예4에서의 투명필름은 타면의 온도가 65.5℃를 나타내어 차열성능은 존재하나 본 발명의 실시예에 비해서는 미미한 것으로 나타났다.In contrast, the transparent film in Comparative Example 3 had a temperature of 69.6° C. on the other side, and the change was insignificant, and the transparent film in Comparative Example 4 had a temperature of 65.5° C. It was found to be insignificant compared to the examples of the invention.

도 8a는 본 발명의 실시예의 투명필름의 차열성능을 평가하기 위한 적외선 촬영 사진이다.Figure 8a is an infrared photograph for evaluating the heat shielding performance of the transparent film of the embodiment of the present invention.

도 8b는 비교실시예3의 투명필름의 차열성능을 평가하기 위한 적외선 촬영 사진이다.Figure 8b is an infrared photograph for evaluating the heat shielding performance of the transparent film of Comparative Example 3.

도 8c는 비교실시예4의 투명필름의 차열성능을 평가하기 위한 적외선 촬영 사진이다.Figure 8c is an infrared photograph for evaluating the heat shielding performance of the transparent film of Comparative Example 4.

본 출원에서 사용한 용어는 단지 특정한 실시예를 설명하기 위해 사용된 것으로, 본 발명을 한정하려는 의도가 아니다. 본 출원에서, "포함하다" 또는 "가지다" 등의 용어는 명세서상에 기재된 특징, 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것이 존재함을 지정하려는 것이지, 하나 또는 그 이상의 다른 특징들이나 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 미리 배제하지 않는 것으로 이해되어야 한다.The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. In the present application, terms such as “comprise” or “have” are intended to designate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, but one or more other features It is to be understood that this does not preclude the possibility of addition or existence of numbers, steps, operations, components, parts, or combinations thereof.

100: 내구성이 강화된 투명필름
110: 제1 하드코팅층
120: 기재층
130: 제2 하드코팅층
140: 제1 굴절률매칭층
150: 제1 무기물층
160: 금속층
170: 제2 무기물층
180: 제2 굴절률매칭층
192: 제1 패시베이션층
194: 제2 패시베이션층
196: 제3 패시베이션층
198: 제4 패시베이션층
100: transparent film with enhanced durability
110: first hard coating layer
120: base layer
130: second hard coating layer
140: first refractive index matching layer
150: first inorganic material layer
160: metal layer
170: second inorganic material layer
180: second refractive index matching layer
192: first passivation layer
194: second passivation layer
196: third passivation layer
198: fourth passivation layer

Claims (6)

기재층;
상기 기재층 일면에 적층되는 제1 무기물층;
상기 제1 무기물층 일면에 적층되는 금속층;
상기 금속층 일면에 적층되는 제2 무기물층; 및
상기 제2 무기물층 일면에 적층되는 복수의 유기물층을 포함하는 패시베이션층;을 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
base layer;
a first inorganic material layer laminated on one surface of the base layer;
a metal layer laminated on one surface of the first inorganic material layer;
a second inorganic material layer laminated on one surface of the metal layer; and
A transparent film with enhanced durability, comprising a; a passivation layer comprising a plurality of organic material layers laminated on one surface of the second inorganic material layer.
제1항에 있어서,
상기 기재층의 양면에 각각 배치되는 하드코팅층;을 더 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
The method of claim 1,
A transparent film with enhanced durability, characterized in that it further comprises; a hard coating layer disposed on both sides of the base layer, respectively.
제1항에 있어서,
상기 기재층과상기 제1 무기물층 사이, 상기 제2 무기물층과 상기 패시베이션층 사이에 각각 배치되어 굴절률을 보강하는 굴절률 매칭층;을 더 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
According to claim 1,
A transparent film with enhanced durability, characterized in that it further comprises; a refractive index matching layer disposed between the base layer and the first inorganic material layer and between the second inorganic material layer and the passivation layer, respectively, to reinforce the refractive index.
제1항에 있어서,
상기 패시베이션층은,
제1 유기물을 포함하는 제1 패시베이션층;
제2 유기물을 포함하는 제2 패시베이션층;
제3 유기물을 포함하는 제3 패시베이션층; 및
제4 유기물을 포함하는 제4 패시베이션층;을 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
According to claim 1,
The passivation layer,
a first passivation layer including a first organic material;
a second passivation layer including a second organic material;
a third passivation layer including a third organic material; and
A transparent film with enhanced durability comprising a; a fourth passivation layer comprising a fourth organic material.
제1항에 있어서,
상기 금속층은 은(Ag)을 포함하고,
상기 제1 무기물층 및 제2 무기물층은 구리산화물(CuOx)을 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
According to claim 1,
The metal layer contains silver (Ag),
The first inorganic material layer and the second inorganic material layer is a transparent film with enhanced durability, characterized in that it contains copper oxide (CuOx).
제1항에 있어서,
상기 금속층은 은(Ag)을 포함하고,
상기 제1 무기물층 및 제2 무기물층은 구리질화물(CuNx)을 포함하는 것을 특징으로 하는 내구성이 강화된 투명필름.
According to claim 1,
The metal layer contains silver (Ag),
The first inorganic material layer and the second inorganic material layer is a transparent film with enhanced durability, characterized in that it contains copper nitride (CuNx).
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002198688A (en) * 2000-10-19 2002-07-12 Nisshinbo Ind Inc See-through electromagnetic wave shield and near infrared ray cut material and method for manufacturing the same
KR20150135661A (en) * 2014-05-23 2015-12-03 (주)엘지하우시스 Anti static hard coating layer composition, anti static hard coating layer and transparent conductive film including the same
KR20160115849A (en) * 2015-03-27 2016-10-06 히다치 막셀 가부시키가이샤 Transparent heat-shield members having transparent screen function
KR102036253B1 (en) * 2019-04-22 2019-10-24 황태경 Environment-friendly Heating Shielding Film Using Non-radioactive Stable Isotope and Manufacturing Method Thereof
KR20200021938A (en) * 2017-06-28 2020-03-02 맥셀 홀딩스 가부시키가이샤 Transparent heat insulation insulation member and its manufacturing method
KR20200043824A (en) * 2018-10-18 2020-04-28 황태경 Heat Shielding Film and Manufacturing Method Thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI290328B (en) * 2002-05-23 2007-11-21 Nof Corp Transparent conductive laminated film and touch panel
JP6584187B2 (en) * 2015-07-22 2019-10-02 日東電工株式会社 Laminated body and method for producing the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002198688A (en) * 2000-10-19 2002-07-12 Nisshinbo Ind Inc See-through electromagnetic wave shield and near infrared ray cut material and method for manufacturing the same
JP4540883B2 (en) * 2000-10-19 2010-09-08 パナソニック電工株式会社 Translucent electromagnetic wave shield, near-infrared cut material, and manufacturing method thereof
KR20150135661A (en) * 2014-05-23 2015-12-03 (주)엘지하우시스 Anti static hard coating layer composition, anti static hard coating layer and transparent conductive film including the same
KR20160115849A (en) * 2015-03-27 2016-10-06 히다치 막셀 가부시키가이샤 Transparent heat-shield members having transparent screen function
KR20200021938A (en) * 2017-06-28 2020-03-02 맥셀 홀딩스 가부시키가이샤 Transparent heat insulation insulation member and its manufacturing method
KR20200043824A (en) * 2018-10-18 2020-04-28 황태경 Heat Shielding Film and Manufacturing Method Thereof
KR102036253B1 (en) * 2019-04-22 2019-10-24 황태경 Environment-friendly Heating Shielding Film Using Non-radioactive Stable Isotope and Manufacturing Method Thereof

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