KR20210154492A - Mask cell sheet for producing mask integrated frame and mask integrated frame - Google Patents

Abstract

The present invention relates to a mask cell sheet part for producing a frame integrated mask and a frame integrated mask. The present invention provides a mask cell sheet part for producing a frame integrated mask, which is used for producing a frame integrated mask by being attached to an edge frame part, the mask cell sheet part comprising: an edge sheet part; at least one first grid sheet part formed to extend in a first direction and having both ends connected to the edge sheet part; and at least one second grid sheet part formed to extend in a second direction perpendicular to the first direction and to intersect the first grid sheet part and having both ends connected to the edge sheet part, wherein the mask cell sheet part is provided with a plurality of mask cell regions in at least one between the first direction and the second direction, and forms a dummy pattern on at least a portion of the mask cell sheet part so as to be spaced apart from the edge of the mask cell regions by a predetermined distance. The present invention can clearly arrange the mask by preventing an arrangement position of the mask cell sheet part from being changed.

Description

Mask cell sheet for frame-integrated mask manufacturing and frame-integrated mask {MASK CELL SHEET FOR PRODUCING MASK INTEGRATED FRAME AND MASK INTEGRATED FRAME}

The present invention relates to a mask cell sheet part for manufacturing a frame-integrated mask and a frame-integrated mask. More specifically, when manufacturing the frame-integrated mask, the mask cell sheet part and the frame-integrated body for manufacturing a frame-integrated mask that can prevent an alignment error of the mask cell by changing the alignment position of the mask cell sheet to which the mask is attached It's about the mask.

As a technology for forming pixels in the OLED manufacturing process, the FMM (Fine Metal Mask) method is mainly used to deposit an organic material at a desired location by attaching a thin metal mask to the substrate.

In the existing OLED manufacturing process, a mask is manufactured in a stick shape or a plate shape, and then the mask is welded and fixed to the OLED pixel deposition frame. A plurality of cells corresponding to one display may be provided in one mask. In addition, for large-area OLED manufacturing, multiple masks can be fixed to the OLED pixel deposition frame, and in the process of fixing to the frame, each mask is stretched so that it is flat. Adjusting the tension so that the entire part of the mask is flat is a very difficult task. In particular, in order to align a mask pattern with a size of only a few to several tens of μm while flattening each cell, a high-level operation of checking the alignment state in real time while finely adjusting the tensile force applied to each side of the mask is required. do.

Nevertheless, in the process of fixing several masks to one frame, there is a problem in that the masks are not well aligned with each other and between the mask cells. In addition, in the process of welding and fixing the mask to the frame, since the thickness of the mask film is too thin and large, the mask is sagging or distorted by load, and wrinkles and burrs occurring in the welding part during welding There were problems such as misalignment of the alignment.

In the case of ultra-high-definition OLED, the current QHD image quality is 500-600 PPI (pixel per inch), with a pixel size of about 30-50 μm, and 4K UHD and 8K UHD high-definition are higher than this: ~860 PPI, ~1600 PPI, etc. has a resolution of As such, it is necessary to reduce the alignment error between cells by several μm in consideration of the pixel size of the ultra-high-definition OLED, and an error outside of this may lead to product failure, and thus the yield may be very low. Therefore, there is a need to develop a technology capable of preventing deformation such as sagging or twisting of the mask, and clarifying alignment, and a technology of fixing the mask to a frame.

Accordingly, the present invention has been devised to solve the problems of the prior art as described above, and when manufacturing a frame-integrated mask, a mask cell sheet for manufacturing a frame-integrated mask that can prevent the alignment position of the mask cell sheet part from being changed An object of the present invention is to provide a mask with an integral part and a frame.

Another object of the present invention is to provide a mask cell sheet part for manufacturing a frame-integrated mask and a frame-integrated mask that can prevent the alignment position of the mask cell sheet part from being changed in the frame to clarify the alignment of the mask. .

The above object of the present invention is a mask cell sheet part used to manufacture a frame-integrated mask by attaching to the edge frame part, the mask cell sheet part comprising: an edge sheet part; at least one first grid sheet portion extending in a first direction and having both ends connected to the edge sheet portion; and at least one second grid sheet portion extending in a second direction perpendicular to the first direction, intersecting the first grid sheet portion, and having both ends connected to the edge sheet portion, wherein the mask cell sheet portion includes: A mask cell sheet portion having a plurality of mask cell regions along at least one of a first direction and a second direction, and a dummy pattern formed on at least a portion of the mask cell sheet portion so as to be spaced apart from an edge of the mask cell region by a predetermined distance is achieved by

The dummy pattern may include: a first dummy pattern formed on at least a portion of the first grid sheet portion and the second grid sheet portion; and a second dummy pattern formed on at least a portion of the edge sheet portion.

The dummy pattern may be formed in at least a portion of the remaining area of the mask cell sheet portion except for the area to which the mask is attached.

When a tension is applied to a portion of the mask cell sheet portion around the mask cell region by the mask, the dummy pattern may cancel the tension so that a less tension than the corresponding tension is transmitted to the mask cell sheet portion.

Each dummy pattern is formed along the first direction or the second direction, and the length of each dummy pattern may be equal to or smaller than one side of the mask cell region.

A width perpendicular to the longitudinal direction of each dummy pattern may be 0.1 mm to 2 mm.

The dummy pattern may include a plurality of unit dummy patterns.

The dummy pattern may be in the form of being penetrated along the thickness direction of the mask cell sheet portion, or may be partially etched.

A third dummy pattern may be further formed in an intersecting region in a direction in which the first dummy pattern and the second dummy pattern are formed.

In addition, the above object of the present invention is a frame-integrated mask in which a plurality of masks and a frame supporting the mask are integrally formed, the frame comprising: an edge frame portion including a hollow region; a mask cell sheet portion having a plurality of mask cell regions along at least one of the first direction and the second direction and connected to the edge frame portion, each mask being connected to an upper portion of the mask cell sheet portion; , The mask cell sheet portion, the edge sheet portion; at least one first grid sheet portion extending in a first direction and having both ends connected to the edge sheet portion; and at least one second grid sheet part extending in a second direction perpendicular to the first direction, intersecting the first grid sheet part, and having both ends connected to the edge sheet part; This is achieved by a frame-integrated mask in which a dummy pattern is formed on at least a portion of the mask cell sheet portion to be spaced apart by a predetermined distance.

The dummy pattern may include: a first dummy pattern formed on at least a portion of the first grid sheet portion and the second grid sheet portion; and a second dummy pattern formed on at least a portion of the edge sheet portion.

The second dummy pattern may be formed on the inside of the edge frame part on a planar basis.

According to the present invention configured as described above, there is an effect of preventing the alignment position of the mask cell sheet portion from being changed when manufacturing the frame-integrated mask.

In addition, according to the present invention, the alignment position of the mask cell sheet portion in the frame is prevented from being changed, thereby making it possible to clarify the alignment of the mask.

1 is a schematic diagram showing a process of attaching a conventional mask to a frame.
2 is a front view and a side cross-sectional view showing a frame-integrated mask according to an embodiment of the present invention.
3 is a front view and a side cross-sectional view showing a frame according to an embodiment of the present invention.
4 is a schematic diagram illustrating deformation of a mask cell sheet portion according to a comparative example.
5 is a schematic diagram illustrating deformation of a mask cell sheet part according to an embodiment of the present invention.
6 is a schematic diagram illustrating a deformation of a mask cell sheet part according to another embodiment of the present invention.
7 is a schematic diagram illustrating an OLED pixel deposition apparatus using a frame-integrated mask according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [0012] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [0010] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [0010] Reference is made to the accompanying drawings, which show by way of illustration specific embodiments in which the present invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the present invention. It should be understood that the various embodiments of the present invention are different but need not be mutually exclusive. For example, certain shapes, structures, and characteristics described herein with respect to one embodiment may be implemented in other embodiments without departing from the spirit and scope of the invention. In addition, it should be understood that the location or arrangement of individual components within each disclosed embodiment may be changed without departing from the spirit and scope of the present invention. Accordingly, the detailed description set forth below is not intended to be taken in a limiting sense, and the scope of the present invention, if properly described, is limited only by the appended claims, along with all scope equivalents as those claimed. In the drawings, like reference numerals refer to the same or similar functions in various aspects, and the length, area, thickness, and the like may be exaggerated for convenience.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those of ordinary skill in the art can easily practice the present invention.

1 is a schematic diagram illustrating a process of attaching a conventional mask 10 to a frame 20 .

The conventional mask 10 is a stick-type or a plate-type, and the stick-type mask 10 of FIG. 1 can be used by welding and fixing both sides of the stick to the OLED pixel deposition frame. A plurality of display cells C are provided in the body of the mask 10 (or the mask film 11 ). One cell C corresponds to one display such as a smart phone. A pixel pattern P is formed in the cell C to correspond to each pixel of the display.

Referring to (a) of FIG. 1 , the stick mask 10 is loaded on the frame 20 in the form of a square frame in a flat state by applying tensile forces F1 to F2 in the long axis direction of the stick mask 10 . The cells C1 to C6 of the stick mask 10 are located in the blank area inside the frame 20 of the frame 20 .

Referring to FIG. 1 (b), after aligning while finely adjusting the tensile force (F1 to F2) applied to each side of the stick mask 10, a part of the side of the stick mask 10 is welded (W). Accordingly, the stick mask 10 and the frame 20 are interconnected. Figure 1 (c) shows a cross-section of the stick mask 10 and the frame interconnected.

Although the tensile forces F1 to F2 applied to each side of the stick mask 10 are finely adjusted, there is a problem in that the mask cells C1 to C3 are not well aligned with each other. For example, the distance between the patterns of the cells C1 to C6 is different from each other, or the patterns P are skewed, for example. Since the stick mask 10 has a large area including a plurality of cells C1 to C6 and has a very thin thickness of several tens of μm, it is easily sagged or twisted by a load. In addition, it is very difficult to check the alignment between the cells C1 to C6 in real time through a microscope while controlling the tensile force F1 to F2 to flatten all the cells C1 to C6. In order to prevent the mask pattern P having a size of several to several tens of μm from adversely affecting the pixel process of the ultra-high-definition OLED, it is preferable that the alignment error does not exceed 3 μm. This alignment error between adjacent cells is referred to as PPA (pixel position accuracy).

In addition to this, while connecting the plurality of stick masks 10 to one frame 20 , respectively, the alignment state between the plurality of stick masks 10 and between the plurality of cells C to C6 of the stick mask 10 . It is also a very difficult task to clarify, and the processing time according to alignment is inevitably increased, which is a significant reason for reducing productivity.

Meanwhile, after the stick mask 10 is connected and fixed to the frame 20 , the tensile forces F1 to F2 applied to the stick mask 10 may reversely act on the frame 20 . Such tension may slightly deform the frame 20 , and a problem of misalignment between the plurality of cells C to C6 may occur.

Accordingly, the present invention proposes a frame 200 and a frame-integrated mask that allows the mask 100 to form an integrated structure with the frame 200 . The mask 100 integrally formed with the frame 200 is prevented from being deformed such as sagging or twisting, and can be clearly aligned with the frame 200 .

2 is a front view [FIG. 2 (a)] and a side cross-sectional view [FIG. 2 (b)] showing a frame-integrated mask according to an embodiment of the present invention. 3 is a front view and a side cross-sectional view showing the frame 200 according to an embodiment of the present invention.

In this specification, the configuration of the frame-integrated mask will be briefly described below, but it can be understood that the structure and manufacturing process of the frame-integrated mask are included in the contents of Korean Patent Application No. 2018-0016186 as a whole.

2 and 3 , the frame-integrated mask may include a plurality of masks 100 and one frame 200 . In other words, a plurality of masks 100 are attached to the frame 200 one by one. Hereinafter, for convenience of explanation, the mask 100 having a rectangular shape will be described as an example, but the masks 100 may be in the form of a stick mask having protrusions clamped on both sides before being attached to the frame 200 , and the frame 200 . ) after being attached to the protrusion can be removed.

A plurality of mask patterns P may be formed on each mask 100 , and one cell C may be formed on one mask 100 . One mask cell C may correspond to one display such as a smart phone.

The mask 100 may be made of a material such as invar, super invar, nickel (Ni), or nickel-cobalt (Ni-Co). The mask 100 may use a metal sheet produced by a rolling process or electroforming.

The frame 200 is formed so that a plurality of masks 100 can be attached thereto. The frame 200 is preferably made of the same material as the mask in consideration of thermal deformation. The frame 200 may include an edge frame portion 210 having a substantially rectangular shape or a rectangular frame shape. The inside of the edge frame part 210 may have a hollow shape.

In addition, the frame 200 may include a plurality of mask cell regions CR, and may include a mask cell sheet unit 220 connected to the edge frame unit 210 . The mask cell sheet unit 220 may include an edge sheet unit 221 and first and second grid sheet units 223 and 225 formed along first and second directions. The edge sheet portion 221 and the first and second grid sheet portions 223 and 225 refer to partitioned portions of the same sheet, and they are integrally formed with each other.

The thickness of the edge frame portion 210 may be formed to a thickness of several mm to several cm thicker than the thickness of the mask cell sheet portion 220 . The mask cell sheet part 220 is thinner than the thickness of the edge frame part 210 , but may have a thickness of about 0.1 mm to 1 mm thicker than the mask 100 . The width of the first and second grid sheet parts 223 and 225 may be about 1 to 5 mm.

In the flat sheet, a plurality of mask cell regions CR: CR11 to CR56 may be provided except for regions occupied by the edge sheet part 221 and the first and second grid sheet parts 223 and 225 .

The frame 200 includes a plurality of mask cell regions CR, and each mask 100 may be attached such that one mask cell C corresponds to the mask cell region CR. The mask cell C corresponds to the mask cell region CR of the frame 200 , and a part or all of the dummy may be attached to the frame 200 (the mask cell sheet unit 220 ). Accordingly, the mask 100 and the frame 200 can form an integrated structure.

The mask cell sheet part 220 is manufactured by manufacturing a flat sheet using rolling, electroplating, or other film forming process, and then removing the mask cell region CR part through laser scribing, etching, etc. can do. In the present specification, a case in which 6 X 5 mask cell regions CR: CR11 to CR56 are formed will be described as an example. Five first grid sheet parts 223 and four second grid sheet parts 225 may exist.

4 is a schematic diagram illustrating deformation of a mask cell sheet portion according to a comparative example.

As described above, each mask 100 may be attached to correspond to the mask cell region CR. That is, a part or all of the dummy of the mask 100 may be attached to a part of the mask cell sheet 220 around the mask cell region CR. However, after the mask 100 is attached to the mask cell sheet unit 220 , the alignment position of the mask cell sheet unit 220 is changed.

Referring to FIG. 4 , each mask 100 needs to maintain a taut state in order to prevent deformation such as sagging after being attached to the frame 200 (or the mask cell sheet 220 ). Accordingly, the mask 100 may be attached to the frame 200 with a predetermined tension TS applied thereto. As the mask 100 is attached to the mask cell sheet 220 in an elongated state, or the mask 100 is attached to the mask cell sheet 220 in a state in which the mask 100 includes a tensile force, the mask 100 becomes the mask. A tension TS may be applied to the cell sheet unit 220 .

It is preferable that all the masks 100 have the same tension TS applied to the mask cell sheet 220 and the directions of the tension TS applied from the neighboring masks 100 are offset in opposite directions. . However, since it is not easy to completely and identically control the tension TS of all the masks 100 , a state in which the tension TS is greater than that of other masks 100 may exist in some masks 100 .

Referring to the enlarged portion of FIG. 4 , in the mask 100 including the mask cell C1 , a greater tension (TS1 > TS2) than the mask 100 including the neighboring mask cell C2 is applied to the mask cell sheet portion ( 220') (or the second grid sheet part 225') may be assumed. In this case, since the tensions TS1 and TS2 on both sides of the second grid sheet part 225 ′ do not cancel each other, the second grid sheet portion 225 ′ may be deformed and biased toward the mask cell C1 portion having a high tension (TS1 > TS2). Since the mask cell sheet portion 220 ′, particularly the first and second grid sheet portions 223 ′ and 225 ′, has a very thin and narrow width, it is more easily deformed even by a slight difference in tensile force than the edge sheet portion 221 ′. can be Even if the deformation amount is a very small value of several μm, there may be a problem in that the mask 100 including the mask cell C2 is also skewed to the left due to the bias of the second grid sheet portion 225 ′. . Accordingly, the mask cell C2 and the mask patterns P inside the mask cell C2 may be all out of alignment along the bias of the second grid sheet part 225 ′.

Accordingly, in the present invention, a dummy pattern is formed on at least a portion of the mask cell sheet 220 to suppress deformation of the mask cell sheet 220 from the tensile forces TS: TS1 and TS2 applied by the mask 100 . (230: 231, 233, 235). The dummy patterns 230 : 231 , 233 , and 235 are spaced apart from the edge of the mask cell region CR by a predetermined distance in the mask cell sheet part 220 (the border sheet part 221 , the first and second grid sheet parts 223 , 225)].

5 is a schematic diagram illustrating a deformation of the mask cell sheet unit 220 according to an embodiment of the present invention.

Again, referring to FIGS. 2, 3, and 5, the dummy patterns 230: 231, 233, 235 include first dummy patterns 231: 231a, 231b, and second dummy patterns 233a, 233b. , a third dummy pattern 235 may be further included.

The first dummy pattern 231 may be formed on a portion of the first and second grid sheet portions 223 and 225 . The first dummy pattern 231 formed on the first grid sheet part 223 is denoted by 231a, and the first dummy pattern 231 formed on the second grid sheet part 225 is denoted by 231b.

The second dummy pattern 233 may be formed on a portion of the edge sheet portion 221 . The second dummy pattern 233 formed along the first direction (x-axis direction) of the edge sheet part 221 is denoted by 233a, and the second dummy pattern 233 formed along the second direction (y-axis direction) is denoted by 233b. do. In particular, since a part of the edge sheet part 221 is attached to the edge frame part 210 , on a planar basis, the second dummy pattern 233 is formed on the edge sheet part 221 , of the edge frame part 210 . It may be formed in the inner part.

Referring to FIG. 2 , in the mask 100 , a mask cell C including mask patterns P is disposed in a mask cell region CR, and a dummy portion of the mask 100 is disposed on the mask cell sheet part 220 . Therefore, the dummy patterns 230 ( 231 , 233 , and 235 ) are preferably formed on at least a portion of the mask cell sheet 220 , excluding the area to which the mask 100 is attached. That is, it may be formed in the area of the mask cell sheet 220 between the mask 100 and the neighboring mask 100 .

Each dummy pattern 230 has a first direction (x-axis direction) or a second direction (y-axis direction) corresponding to the direction in which the mask 100 is disposed or the direction in which the mask cell region CR is disposed. can be formed according to That is, the dummy pattern 230 is formed at an interval corresponding to the interval of the plurality of mask cell regions CR, and tensile forces TS: TS1 and TS2 are applied in correspondence to the row and column in which each mask cell region CR is formed. can be offset

Each of the dummy patterns 230 may have a length equal to or smaller than that of one side of the mask cell region CR. In addition, the length of each dummy pattern 230 may have a length of several mm to several cm to macro-offset/distribute the tensile force applied to the mask cell sheet unit 220 . For example, the first dummy pattern 231a has a length equal to or smaller than the horizontal width of the mask cell area CR, and the first dummy pattern 231b has a length equal to or smaller than the vertical width of the mask cell area CR. can have a length. The second dummy patterns 233a and 233b are also the same. Accordingly, tensions TS: TS1 and TS2 applied from the mask 100 attached to the adjacent mask cell region CR to the mask cell sheet unit 220 can be canceled.

In addition, the width perpendicular to the longitudinal direction of the dummy pattern 230 , for example, the vertical width of the first dummy pattern 231a and the horizontal width of the first dummy pattern 231b is the mask 100 and the adjacent mask ( 100) may be smaller than the interval. The width of the first and second grid sheet parts 223 and 225 is about 1 to 5 mm, and the width at which the dummy part of the mask 100 is attached to the first and second grid sheet parts 223 and 225 is about 1 mm. Considering that , the width perpendicular to the longitudinal direction of the dummy pattern 230 is preferably about 0.1 mm to 2 mm.

On the other hand, although the dummy pattern 230 is shown in the form of a slit, a rectangle, or a line, as long as it is within a range capable of offsetting/dispersing the tensile force TS, there is no restriction on the shape, spacing, and size of the dummy pattern 230 , of course. to be.

The dummy pattern 230 may be simultaneously formed in the process of removing the mask cell region CR portion through laser scribing, etching, or the like after the mask cell sheet part 220 is manufactured by a film forming process. Alternatively, the mask cell sheet portion 220 formed up to the mask cell region CR may be formed by performing a separate process such as laser scribing and etching.

As the dummy pattern 230 first deforms with respect to the tension (TS: TS1, TS2) applied by the mask 100 to the first and second grid sheet parts 223 and 225 or the edge sheet part 221 , the mask (100) or allow the alignment position of the mask cell (C) to be maintained.

For example, the dummy pattern 230 may be deformed, such as open or wrinkled, thereby canceling/dispersing the tensions TS: TS1 and TS2. Referring to the example shown in FIG. 5 , among the tensile forces TS1 and TS2 acting on both sides of the second grid sheet part 225 , the strength of TS1 is large, so that the first formed on the second grid sheet part 225 . The left side of the dummy pattern 231b is deformed and biased by the tensile force TS1. That is, since the first dummy pattern 231b is not a part filled with a sheet, but a part that has been penetrated or etched to some depth, the entirety is not deformed and only the left side of the first dummy pattern 231b is slightly spread apart and deformed. The alignment of the mask cell C12 disposed on the right side is not affected. In addition, since the tensile force TS1 of the mask 100 disposed on the left side of the first dummy pattern 231b is also offset/distributed in the first dummy pattern 231b, the alignment state of the mask cell C11 is hardly affected. will not

At the same time, offset/dispersion of tensile force in the first and second dummy patterns 231 and 233 is applied to the entire mask cell sheet portion 220 along the edge sheet portion 221 and the first and second grid sheet portions 223 and 225 . can be made uniformly throughout.

As such, the dummy pattern 230 is formed between the mask 100 and the mask 100 , and a tension TS is applied to the portion of the mask cell sheet 220 around the mask cell region CR by the mask 100 . When this is applied, as a slight deformation occurs in the dummy pattern 230 before the entire mask cell sheet 220, the tension is offset/ It has a dispersive effect. As a result, the tensile force TS applied by the mask 100 to the surrounding mask cell sheet portion 220 may be suppressed to a minimum enough to maintain the mask 100 in a taut state.

Meanwhile, in addition to the first and second dummy patterns 231 and 233 , third dummy patterns 235 and 237 may be further formed in a cross region in a direction in which the first and second dummy patterns 231 and 233 are formed. The third dummy pattern 235 may further offset/distribute the degree of deformation of the first and second dummy patterns 231 and 233 and further contribute to offset/dispersion of the tensile force acting on the edge of the mask cell region CR. can

The first, second, and third dummy patterns 231 , 233 , and 235 may be formed to penetrate in the thickness direction of the mask cell sheet 220 , but may not be completely penetrated and may be etched to a partial depth. .

6 is a schematic diagram illustrating a deformation of a mask cell sheet part according to another embodiment of the present invention.

Referring to FIG. 6 , the first and second dummy patterns 231 and 233 may be formed to include a plurality of unit dummy patterns. For example, the first dummy pattern 231b includes three unit dummy patterns 231ba, 231bb, and 231bc, and the second dummy pattern 233a includes three unit dummy patterns 233aa, 233ab, and 233ac. can do. Since the first and second dummy patterns 231 and 233 are divided into smaller sizes, the tensile forces TS1 and TS2 transmitted to the first and second dummy patterns 231 and 233 are divided for each region to be offset/distributed. can have an effect. Referring to the example shown in FIG. 6 , among the tensile forces TS1 and TS2 acting on both sides of the second grid sheet part 225 , the strength of TS1 is large, so the unit dummy formed on the second grid sheet part 225 . The left side of each of the patterns 231ba, 231bb, and 231bc is deformed by the tensile force TS1 to be biased. By dividing the tensile force TS1 into three, deformation may appear in each of the unit dummy patterns 231ba, 231bb, and 231bc.

As described above, in the present invention, when the mask 100 is attached to the frame 200 , the tensile force is uniformly improved through structural improvement of the mask cell sheet 220 , even if the tensile force TS is not precisely controlled to the same size. and can be properly controlled.

7 is a schematic diagram illustrating an OLED pixel deposition apparatus 1000 using the frame-integrated masks 100 and 200 according to an embodiment of the present invention.

Referring to FIG. 7 , the OLED pixel deposition apparatus 1000 includes a magnet plate 300 in which a magnet 310 is accommodated and a coolant line 350 is disposed, and an organic material source 600 from a lower portion of the magnet plate 300 . ) includes a deposition source supply unit 500 for supplying the .

A target substrate 900 such as glass on which the organic source 600 is deposited may be interposed between the magnet plate 300 and the source deposition unit 500 . The frame-integrated masks 100 and 200 [or FMMs] that allow the organic material source 600 to be deposited for each pixel may be disposed in close contact with or very close to each other on the target substrate 900 . The magnet 310 may generate a magnetic field and adhere to the target substrate 900 by the magnetic field.

The deposition source supply unit 500 may supply the organic material source 600 while reciprocating in a left and right path, and the organic material sources 600 supplied from the deposition source supply unit 500 may include patterns P formed on the frame-integrated masks 100 and 200 . ) and may be deposited on one side of the target substrate 900 . The deposited organic material source 600 passing through the pattern P of the frame-integrated masks 100 and 200 may act as the pixel 700 of the OLED.

In order to prevent non-uniform deposition of the pixel 700 due to the shadow effect, the pattern of the frame-integrated masks 100 and 200 may be inclined (S) (or formed in a tapered shape (S)). . Since the organic material sources 600 passing through the pattern in a diagonal direction along the inclined surface may also contribute to the formation of the pixel 700 , the pixel 700 may be deposited to have a uniform thickness as a whole.

Although the present invention has been illustrated and described with reference to preferred embodiments as described above, it is not limited to the above-described embodiments and is not limited to the above-mentioned embodiments, and various methods can be made by those of ordinary skill in the art to which the invention pertains within the scope that does not depart from the spirit of the present invention. Transformation and change are possible. Such modifications and variations are intended to fall within the scope of the present invention and the appended claims.

100: mask
110: mask film, mask metal film
200: frame
210: border frame portion
220: mask cell sheet portion
221: border sheet portion
223: first grid sheet portion
225: second grid sheet portion
230: dummy pattern
231: first dummy pattern
233: second dummy pattern
235: third dummy pattern
C: cell, mask cell
CR: mask cell area
P: mask pattern
TS, TS1, TS2: tension, tension

Claims (12)

A mask cell sheet part used to manufacture a frame-integrated mask by attaching to the edge frame part,
The mask cell sheet part,
edge sheet portion;
at least one first grid sheet portion extending in a first direction and having both ends connected to the edge sheet portion; and
at least one second grid sheet portion extending in a second direction perpendicular to the first direction, intersecting the first grid sheet portion, and having both ends connected to the edge sheet portion;
including,
The mask cell sheet unit includes a plurality of mask cell regions along at least one of a first direction and a second direction,
A mask cell sheet portion in which a dummy pattern is formed on at least a portion of the mask cell sheet portion so as to be spaced apart from the edge of the mask cell region by a predetermined distance. According to claim 1,
The dummy pattern is,
a first dummy pattern formed on at least a portion of the first grid sheet portion and the second grid sheet portion;
a second dummy pattern formed on at least a portion of the edge sheet portion;
Including, the mask cell sheet portion. According to claim 1,
The dummy pattern is formed in at least a portion of the remaining area except for the area to which the mask is attached in the mask cell sheet portion. According to claim 1,
When a tension is applied to a portion of the mask cell sheet portion around the mask cell region by the mask, the dummy pattern cancels the tension so that a tension less than the tension is transmitted to the mask cell sheet portion. According to claim 1,
Each dummy pattern is formed along the first direction or the second direction,
The length of each dummy pattern is equal to or smaller than one side of the mask cell region, the mask cell sheet portion. 6. The method of claim 5,
The width perpendicular to the longitudinal direction of each dummy pattern is 0.1 mm to 2 mm, the mask cell sheet part. According to claim 1,
The dummy pattern includes a plurality of unit dummy patterns, the mask cell sheet unit. According to claim 1,
The dummy pattern is a form that penetrates along the thickness direction of the mask cell sheet unit, or a form in which only a portion of the mask cell sheet unit is etched. 3. The method of claim 2,
The mask cell sheet part, wherein a third dummy pattern is further formed in a cross region in a direction in which the first dummy pattern and the second dummy pattern are formed. A frame-integrated mask in which a plurality of masks and a frame supporting the masks are integrally formed,
frame is,
an edge frame unit including a hollow region;
a mask cell sheet portion having a plurality of mask cell regions along at least one of the first direction and the second direction and connected to the edge frame portion;
including,
Each mask is connected to the upper part of the mask cell sheet,
The mask cell sheet part,
edge sheet portion;
at least one first grid sheet portion extending in a first direction and having both ends connected to the edge sheet portion; and
at least one second grid sheet portion extending in a second direction perpendicular to the first direction, intersecting the first grid sheet portion, and having both ends connected to the edge sheet portion;
including,
A frame-integrated mask in which a dummy pattern is formed on at least a portion of the mask cell sheet portion so as to be spaced apart by a predetermined distance from the edge of the mask cell region. 11. The method of claim 10,
The dummy pattern is,
a first dummy pattern formed on at least a portion of the first grid sheet portion and the second grid sheet portion;
a second dummy pattern formed on at least a portion of the edge sheet portion;
Including, frame-integrated mask. 12. The method of claim 11,
The second dummy pattern is formed on the inside of the edge frame part on a planar basis,
Frame all-in-one mask.

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