KR20210125237A - System for removing photoresist and recycling filter and mixing and method performing thereof - Google Patents

Abstract

The present invention relates to system for removing photoresist and recycling and mixing a waste developer to compensate and manage the concentration of filtered waste developer stored in a mixing tank and an execution method thereof. According to the present invention, the system comprises: a recycling filter filtering photoresist from a developer introduced from a recovery tank and discharging the filtered waste developer; a mixing tank in which the filtered waste developer discharged from the recycling filter is stored; a concentration measurement device measuring the concentration of the filtered waste developer introduced from the mixing tank; a supply tank storing the filtered waste developer introduced from the mixing tank; a chemical filter filtering and discharging foreign substances from the filtered waste developer introduced from the supply tank; and a control unit determining whether the photoresist is removed from the filtered waste developer on the basis of information of the waste developer flowing into each of the recycling filters and information of the discharged waste developer to store the filtered waste developer in the recovery tank or the mixing tank, determining whether to correct the concentration of the filtered waste developer stored in the mixing tank according to the flow rate, pressure, and concentration values of the filtered waste developer flowing into the concentration measurement device from the mixing tank to allow the filtered waste developer to flow to the supply tank only when the concentration of the filtered waste developer is corrected or concentration verification is completed with the concentration measurement device, and using information on the filtered waste developer flowing into the chemical filter and information on the filtered waste developer discharged from the chemical filter to supply the filtered waste developer stored in the supply tank when a supply request is received from a development apparatus according to whether the foreign substances have been removed from the filtered waste developer.

Description

SYSTEM FOR REMOVING PHOTORESIST AND RECYCLING FILTER AND MIXING AND METHOD PERFORMING THEREOF

FIELD OF THE INVENTION The present invention relates to photoresist removal and regeneration, mixing systems and methods of practicing the same.

In today's information society, the role of an electronic display device becomes increasingly important, and various electronic display devices are widely used in various industrial fields. Such an electronic display field is continuously being developed as an electronic display device with a new function suitable for the needs of an information society that is continuously developing and diversifying.

In general, an electronic display device refers to a device that transmits various information to a human through vision. That is, it can be defined as an electronic device that converts electrical information signals output from various electronic devices into optical information signals that can be recognized by human eyes, and can also be defined as a device that plays a bridging role connecting humans and electronic devices. have.

Such an electronic display device is called an emissive display device when an optical information signal is displayed by a light emitting phenomenon, and a non-emissive display device when an optical information signal is displayed by light modulation by a reflection, scattering, interference phenomenon, etc. It is called an emissive displ ay) device.

The light emitting display device, also called an active display device, includes a cathode ray tube (CR T), a plasma display panel (PDP), a light emitting diode (LED), and an electroluminescent display (CRT). electroluminescent display (ELD); In addition, the light-receiving display device, which is a passive display device, includes a liquid crystal display (LCD) (electrochemical display; ECD), an electrophoretic image display (EPID), and the like.

Cathode ray tube (CRT), which is a display device with the longest history used in image display devices such as televisions and computer monitors, occupies the highest share in terms of display quality and economic feasibility, but has the highest share in terms of display quality and economy, but has a heavy weight, large capacity, and high consumption. It has many disadvantages such as power.

However, due to the rapid progress of semiconductor technology, an electronic display device suitable for a new environment is needed according to the reduction in size and weight of electronic devices along with solidification, low voltage, and low power of various electronic devices. That is, the demand for a flat panel type display device that is thin and light and has low driving voltage and low power consumption is rapidly increasing.

Among the various flat panel display devices currently developed, the liquid crystal display is thinner and lighter than other display devices, has low power consumption and low driving voltage, and at the same time can display an image close to that of a cathode ray tube, so it is widely used in various electronic devices. is being used In addition, since the liquid crystal display device is easy to manufacture, its application range is further expanded.

In the production of such a liquid crystal display device, a photoresist composition suitable for the conditions of a related process matching the conditions of the glass is applied according to the trend of increasing the size of the glass and the high resolution of the panel.

In particular, among the manufacturing processes of microcircuits, the photolithography process is an important process that determines the line production. The sensitivity characteristics of the photoresist film, the developing contrast, the resolution, the adhesion to the substrate, the remaining film characteristics, etc. are followed by the etching process. The quality of the manufactured microcircuit has a direct impact.

Therefore, there is a need for a system for regenerating the developer by filtering the photoresist contained in the developer.

According to the present invention, the photoresist is stored in the mixing tank only when the photoresist is removed from the filtering developer solution flowing into each of the regeneration filters. An object of the present invention is to provide a photoresist removal and regeneration, mixing system and a method for implementing the same.

In addition, the present invention supplies TMAH stock solution or ultrapure water (DIW) to the mixing tank according to the information of the filtering developer flowing into the concentration measuring device from the mixing tank so that the concentration of the filtering developer stored in the mixing tank is corrected and managed. An object of the present invention is to provide a resist removal and regeneration, mixing system and method for implementing the same.

In addition, according to the present invention, the filtering developer stored in the mixing tank is transferred to the supply tank only when the concentration verification is completed by the concentration measuring device, and foreign substances (Particles) are always removed from the filtering developer stored in the supply tank to receive a supply request from the developer. An object of the present invention is to provide a photoresist removal, regeneration, and mixing system for supplying a filtering developer solution from a supply tank, and a method for implementing the same.

The objects of the present invention are not limited to the above-mentioned objects, and other objects and advantages of the present invention not mentioned may be understood by the following description, and will be more clearly understood by the examples of the present invention. Moreover, it will be readily apparent that the objects and advantages of the present invention may be realized by the means and combinations thereof indicated in the claims.

A photoresist removal, regeneration and mixing system for achieving this purpose includes a regeneration filter that filters the photoresist from the developer solution introduced from the recovery tank and discharges the filtered developer solution, and mixing in which the filtering developer solution discharged from the regeneration filter is stored. a tank, a concentration measuring device for measuring the concentration of the filtered developer solution introduced from the mixing tank, a supply tank for storing the filtered developer solution introduced from the mixing tank, and filtering foreign substances from the filtering developer solution introduced from the supply tank Based on the information on the developer solution flowing into each of the chemical filter and the regeneration filter and the information on the discharged developer solution, it is determined whether the photoresist has been removed from the filtering developer solution, and the filtering developer solution is collected in a recovery tank or control to be stored in the mixing tank, and determine whether to correct the concentration of the filtering developer stored in the mixing tank according to the flow rate, pressure, and concentration values of the filtering developer flowing from the mixing tank to the concentration measuring device control to flow into the supply tank only when the concentration of the concentration of and a control device for controlling the filtering developer stored in the supply tank to be supplied when receiving a supply request from the developer according to whether foreign matter is removed from the filtering developer.

In addition, in the photoresist removal, regeneration, and mixing method performed in the photoresist removal and regeneration and mixing system for achieving this purpose, when the developer solution stored in the recovery tank flows into the regeneration filter, the regeneration filter removes the photoresist from the developer solution. filtering the resist to discharge the filtering developer solution, determining whether the photoresist is removed from the filtering developer solution based on information on the developer solution flowing into the regeneration filter and the discharged developer solution information; Storing the filtering developer in a recovery tank or in a mixing tank according to the result of the check; filtering phenomenon stored in the mixing tank according to the flow rate, pressure, and concentration value of the filtering developer flowing into the concentration measuring device from the mixing tank determining whether to correct the concentration of the waste solution, correcting the concentration of the filtering developing solution, or controlling to flow into the supply tank only when the concentration verification is completed with a concentration measuring device, and information of the filtering developing solution flowing into the chemical filter and the and supplying when receiving a supply request from a developer according to whether foreign substances have been removed from the filtering developer using information on the filtering developer discharged from the chemical filter.

According to the present invention as described above, the photoresist is stored in the mixing tank only when the photoresist is removed from the developing waste solution flowing into each of the regeneration filters. The advantage is that it allows the resist to be filtered.

In addition, according to the present invention, TMAH stock solution or ultrapure water (DIW) is supplied to the mixing tank according to the information of the filtering developer flowing into the concentration measuring device from the mixing tank so that the concentration of the filtering developer stored in the mixing tank is corrected and managed. There are advantages.

Also, according to the present invention, the filtering developer stored in the mixing tank is transferred to the supply tank only when the concentration verification is completed by the concentration measuring device, and foreign substances (particles) are always removed from the filtering developer stored in the supply tank to receive a supply request from the developer. When receiving, there is an advantage that the filtering developer of the supply tank is supplied.

1 is a configuration diagram for explaining a photoresist removal, regeneration, and mixing system according to an embodiment of the present invention.
2 is a flowchart for explaining an embodiment of a photoresist removal, regeneration, and mixing method according to the present invention.
3 is a flowchart for explaining another embodiment of the photoresist removal, regeneration, and mixing method according to the present invention.

The above-described objects, features and advantages will be described below in detail with reference to the accompanying drawings, and accordingly, those of ordinary skill in the art to which the present invention pertains will be able to easily implement the technical idea of the present invention. In describing the present invention, if it is determined that a detailed description of a known technology related to the present invention may unnecessarily obscure the gist of the present invention, the detailed description will be omitted. Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same reference signs are used to refer to the same or similar components.

As used herein, the term “recovery tank” is a storage container that collects the waste solution of the developer supplied to the developing process.

Among the terms used herein, “mixing tank” is a storage container that collects the filtered developer solution from which the photoresist has been removed, and continuously corrects and manages the concentration and verifies it.

As used herein, the term “supply tank” refers to a storage container that collects, from the mixing tank, the filtered developer solution whose concentration has been verified in the filtered developer solution from which the photoresist has been removed.

Among the terms used herein, the term “absorber” is a device that measures the intensity of light absorbed when the amount of absorbed light is different according to the concentration of the material, that is, when light passes through a liquid.

As used herein, the term “regeneration filter” refers to two or more regeneration filters that filter the photoresist from the developer solution to discharge the filtering developer solution. Among the terms used herein, the term “concentration measuring device” measures the concentration value of the filtering developer with conductivity and ultrasonic speed, and the concentration value is used to control the concentration of the filtering developer.

As used herein, the term “chemical filter” refers to a filter that filters and discharges particles from the filtering developer.

As used herein, the term “filtering developer solution” refers to a developer solution discharged after the photoresist is filtered from the developer solution.

Among the terms used herein, “photoresist” is a factor that lowers the alkali concentration of the developer, and clogs the filter due to the crosslinking agent component. In the present invention, by controlling and supplying the concentration of the regeneration solution removed therefrom in the developer waste solution, it is possible to reduce the cost by reducing the amount of the developer solution used.

1 is a configuration diagram for explaining a photoresist removal, regeneration, and mixing system according to an embodiment of the present invention.

1, the photoresist removal, regeneration, and mixing system includes a recovery tank 110, a regeneration filter 120, a regeneration filter inlet pressure meter 121, a regeneration filter outlet pressure meter 122, and a regeneration filter absorbance meter ( 123), mixing tank 130, concentration measurement device 140, concentration measurement device flow meter 141, concentration measurement device pressure gauge 142, supply tank 150, chemical filter 160, chemical filter inlet pressure It includes a measuring system 161 , a chemical filter discharge pressure measuring system 162 , and a control device 170 .

The developing waste solution collected in the recovery tank 110 is introduced into the regeneration filter 120 through a pump.

The regeneration filter 120 operates under the control of the control device 170 to filter the photoresist from the developer solution flowing in from the recovery tank to discharge the filtering developer solution, and according to the turbidity of the discharged filtering developer solution, the mixing tank 130 or stored in the recovery tank 110 . As described above, when the filtering developer solution is discharged from the regeneration filter 120 , the regeneration filter absorbance meter 123 measures the turbidity of the filtering developer solution.

At this time, the reason why the regeneration filter absorbance meter 123 measures the turbidity of the filtering developer is to check whether the regeneration filter 120 operates normally.

If the turbidity of the filtered developer solution measured by the regeneration filter absorbance meter 123 is within the set reference turbidity range, the regeneration filter 120 operates normally, and the filtering phenomenon measured by the regeneration filter absorbance meter 123 is When the turbidity of the waste liquid is outside the set reference turbidity range, the regeneration filter 120 does not operate normally.

The regeneration filter inlet pressure measuring meter 121 is installed on the inlet side of the regeneration filter 120 , and measures the inlet pressure of the developer and provides it to the control device 170 .

The regeneration filter discharge pressure gauge 122 is installed on the outlet side of the regeneration filter 120 , measures the discharge pressure of the filtering developer discharged from the regeneration filter 120 and provides it to the control device 170 .

The regeneration filter absorbance meter 123 is installed at the outlet side of the regeneration filter 120 , and measures the turbidity of the filtering developer discharged from the regeneration filter 120 and provides it to the control device 170 .

The pressure difference between the inlet pressure of the developer solution measured by the regeneration filter inlet pressure meter 121 and the outlet pressure of the developer solution measured by the regeneration filter outlet pressure meter 122 and the regeneration filter absorbance meter 123 The measured turbidity is used to determine whether or not the photoresist has been removed from the filtering developer.

That is, the pressure difference between the inlet pressure measured by the regeneration filter inlet pressure gauge 121 and the outlet pressure measured by the regeneration filter outlet pressure gauge 122 is less than or equal to a certain pressure, and the When the measured turbidity is within the set reference turbidity range, the photoresist is removed from the filtering developer because the regeneration filter 120 operates normally.

The mixing tank 130 collects the filtered developer solution discharged from the regeneration filter 120 , and the concentration of the filtered developer solution collected in the mixing tank 130 is corrected and managed by the control device 170 .

That is, if the concentration value of the filtering developer stored in the mixing tank 130 is lower than the set concentration management range, the TMAH stock solution is supplied by the control device 170 to correct and manage the concentration of the filtering developer solution, and the mixing tank ( If the concentration value of the filtering developer stored in 130) is higher than the set concentration management range, ultrapure water (DIW) is supplied by the control device 170, and the concentration of the filtering developer is corrected and managed.

In addition, the filtered developing solution stored in the mixing tank 130 is introduced into the supply tank 150 only when the concentration verification is completed by the concentration measuring device. Particles of the filtering developer solution stored in the supply tank 150 are always removed through the chemical filter 160 , and the filtering developer solution is supplied to the developer under the control of the control device 170 .

The concentration measuring device flow meter 141 is installed on the inlet side of the concentration measuring device 140 , and measures the flow rate of the filtering developer flowing into the concentration measuring device 140 , and provides it to the control device 170 .

The concentration measuring device pressure measuring device 142 is installed on the inlet side of the concentration measuring device 140 to measure the inlet pressure of the filtered developing solution flowing into the concentration measuring device 140 and provide it to the control device 170 .

In the supply tank 150 , the filtered current waste liquid discharged from the mixing tank 130 under the control of the control device 170 is collected. At this time, the concentration of the filtered current waste liquid stored in the mixing tank 130 is corrected and managed by the control device 170 , and is controlled to flow into the supply tank 150 only when the concentration verification is completed by the concentration measuring device.

The particles of the filtering developer stored in the supply tank 150 are always removed through the chemical filter 160 , and the filtering developer solution is supplied to the developer under the control of the control device 170 .

The chemical filter 160 filters and discharges foreign substances (Particles) from the filtering developing solution introduced from the supply tank 150 .

The chemical filter inlet pressure measuring meter 161 is installed on the inlet side of the chemical filter 160 to measure the inlet pressure of the filtering developer flowing into the chemical filter 160 and provide it to the control device 170 .

The chemical filter discharge pressure measuring meter 162 is installed on the outlet side of the chemical filter 160 to measure the discharge pressure of the filtering developer discharged from the chemical filter 160 and provide it to the control device 170 .

The difference in pressure between the inlet pressure measured by the chemical filter inlet pressure gauge 161 and the outlet pressure measured by the chemical filter outlet pressure gauge 162 above determines whether or not foreign substances (Particles) have been removed from the filtering developer. used to do

The control device 170 determines whether or not the photoresist has been removed from the filtering developer based on the information on the developer liquid flowing into each of the regeneration filters 120 and the information on the developer waste discharged, so that the filtering developer liquid is collected in the recovery tank. Control to be stored in the (110) or the mixing tank (130).

That is, the control device 170 controls the pressure difference between the inlet pressure of the developer solution received from the regeneration filter inlet pressure gauge 121 and the outlet pressure of the developer solution received from the regeneration filter outlet pressure gauge 122 and the regeneration filter It is determined whether the photoresist has been removed from the filtering developer according to the turbidity received from the absorbance meter 123 .

In an embodiment, the control device 170 determines that the photoresist is removed from the filtering developer when the pressure difference is equal to or less than a specific pressure and the turbidity is within a set value range.

In another embodiment, if the pressure difference is equal to or greater than a specific pressure and the turbidity does not fall within a set value range, the control device 170 determines that the photoresist has not been removed from the filtering developer.

At this time, if the photoresist is removed from the developing solution, the control device 170 controls the filtering developer to flow into the mixing tank 130, and if the photoresist is not removed from the developing solution, the waste filtering solution is removed from the recovery tank ( 110) to control the inflow.

Thereafter, the control device 170 corrects and manages the concentration of the filtered developing solution stored in the mixing tank 130 according to the information on the filtered developing solution flowing into the concentration measuring device 140 from the mixing tank 130 . .

To this end, the control device 170 determines that the flow rate and pressure of the filtering developer flowing into the concentration measuring device 140 from the mixing tank 130 correspond to the set conditions, and the concentration value of the filtering developer is set. It is judged whether it falls within the concentration control range.

Thereafter, the control device 170 controls the mixing tank 130 according to whether the flow rate and pressure of the filtering developer correspond to the set conditions and the concentration value of the filtering developer corresponds to the set concentration management range. TMAH stock solution or ultrapure water (DIW) is supplied and the concentration of the filtered developing solution stored in the mixing tank 130 is corrected and controlled to be managed.

In an embodiment, when the concentration of the filtering developer is lower than the set concentration management range, the control device 170 supplies the TMAH stock solution to the mixing tank 130 to correct the concentration of the filtered developer and manage it.

In another embodiment, the control device 170 supplies ultrapure water (DIW) to the mixing tank 130 when the concentration of the filtering developing solution is higher than the set concentration management range, and the filtering developing solution stored in the mixing tank 130 . It is controlled to be managed by correcting the concentration of

In the above embodiment, the control device 170 transmits the filtered developing solution stored in the mixing tank 130 to the supply tank ( 150) to control the inflow.

In addition, the control device 170 checks whether the foreign substances have been removed from the developing solution by using the information on the filtering developing solution flowing into the chemical filter 160 and the filtering developing solution discharged from the chemical filter 160 . .

To this end, the control device 170 receives the discharge pressure of the filtering developer received from the chemical filter discharge pressure gauge 162 .

Then, the control device 170 determines that the foreign material has been removed from the filtering developer according to the pressure difference between the inlet pressure and the outlet pressure.

After going through the above process, when receiving a supply request from the developer, the control device 170 controls the filtering waste developer stored in the supply tank 150 to be supplied.

2 is a flowchart for explaining an embodiment of a photoresist removal, regeneration, and mixing method according to the present invention.

Referring to FIG. 2 , the photoresist removal, regeneration, and mixing system determines whether the water level in the mixing tank corresponds to a set condition while the regeneration filter is in a standby state (step S200). (Step S205)

The photoresist removal, regeneration and mixing system allows the regeneration filter to remain on standby if the water level in the mixing tank does not meet the set conditions. Let it flow into the regeneration filter. (Step S210)

In the photoresist removal, regeneration, and mixing system, when the developer solution stored in the recovery tank flows into the regeneration filter, the photoresist is filtered from the developer solution through the regeneration filter to discharge the filtered developer solution. (Step S215)

The photoresist removal, regeneration, and mixing system checks whether the photoresist is removed from the filtering developer based on the information on the developer liquid flowing into the regeneration filter and the information on the developer liquid discharged. (Step S220)

In one embodiment for step S220, the photoresist removal and regeneration, mixing system receives the inlet pressure received from the regeneration filter inlet pressure gauge installed on the inlet side of the regeneration filter and the regeneration filter outlet pressure gauge installed on the outlet side of the regeneration filter It is determined that the photoresist has been removed from the filtering developer according to the pressure difference between the exhaust pressures and the turbidity received from the regenerative filter absorbance meter.

That is, the photoresist removal, regeneration, and mixing system determines that the photoresist has been removed from the filtering developer when the pressure difference is less than or equal to a specific pressure value and the turbidity measured by the regeneration filter absorptometer falls within the set reference turbidity range.

The photoresist removal, regeneration and mixing system stores the filtered developer solution in the mixing tank or in the recovery tank depending on whether the photoresist has been removed or not. (Step S225)

In one embodiment for step S225, the photoresist removal, regeneration, and mixing system determines that the regeneration filter operates normally when the turbidity value of the filtering developer introduced from the regeneration filter falls within the set reference turbidity range, and removes the filtering developer solution Let it flow into the mixing tank.

In another embodiment of step S225, the photoresist removal, regeneration, and mixing system determines that the regeneration filter does not operate normally if the turbidity value of the filtering developer introduced from the regeneration filter does not fall within the set reference turbidity range, and filtering Allow the developer waste to flow back into the recovery tank.

3 is a flowchart for explaining another embodiment of the photoresist removal, regeneration, and mixing method according to the present invention.

Referring to FIG. 3 , the photoresist removal, regeneration, and mixing system measures the flow rate, pressure, and concentration value of the filtering developer flowing into the concentration measuring device from the mixing tank. (Step S310)

The photoresist removal, regeneration and mixing system determines whether the flow rate and pressure of the filtering developer meet the set conditions. (Step S320)

If, in the photoresist removal, regeneration, and mixing system, the flow rate and pressure of the filtering developer do not correspond to the set conditions, the flow rate, pressure, and concentration value of the filtering developer flowing from the mixing tank to the concentration measuring device returns to step S310 again. measure

On the other hand, the photoresist removal, regeneration, and mixing system determines whether the concentration value of the filtering developer corresponds to the set concentration management range when the flow rate and pressure of the filtering developer correspond to the set conditions. (Step S330)

The photoresist removal, regeneration and mixing system causes the filtering developer solution stored in the mixing tank to flow into the supply tank when the concentration value of the filtering developer solution falls within the set concentration management range (step S340), and the concentration value of the filtering developer solution becomes If it does not fall within the set concentration control range, correct the concentration by supplying TMAH stock solution (or ultrapure water) to the mixing tank. (Step S350)

In the photoresist removal, regeneration and mixing system, the filtering developer solution whose concentration has been verified from the mixing tank is stored in the supply tank, and foreign substances (particles) are removed from the filtering developer solution through a chemical filter (step S360) to receive a supply request from the developer. supply when

As described above, although the present invention has been described with reference to the limited examples and drawings, the present invention is not limited to the above examples, which are various modifications and Transformation is possible. Accordingly, the spirit of the present invention should be understood only by the claims set forth below, and all equivalents or equivalent modifications thereof will fall within the scope of the spirit of the present invention.

100: developer
110: recovery tank
120: regeneration filter
121: regenerative filter inlet pressure gauge
122: regenerative filter outlet pressure gauge
123: regenerative filter absorbance meter
130: mixing tank
140: concentration measuring device
141: concentration measuring device flow meter
142: concentration measuring device pressure measuring instrument
150: supply tank
160: chemical filter
161: chemical filter inlet pressure gauge
162: chemical filter outlet pressure gauge
170: control device
V1, V2, V3, V4: developer waste flow control valve

Claims (13)

a regeneration filter that filters the photoresist from the developer solution introduced from the recovery tank and discharges the filtered developer solution;
a mixing tank in which the filtering developer discharged from the regeneration filter is stored;
a concentration measuring device for measuring the concentration of the filtering developing solution introduced from the mixing tank;
a supply tank for storing the filtering developing solution introduced from the mixing tank;
a chemical filter for filtering and discharging foreign substances from the filtering developing solution introduced from the supply tank; and
It is determined whether the photoresist has been removed from the filtering developer based on the information of the developer liquid flowing into each of the regeneration filters and the information of the developer waste discharged, and the filtering developer liquid is stored in a recovery tank or a mixing tank. and determining whether to correct the concentration of the filtering developer stored in the mixing tank according to the flow rate, pressure, and concentration values of the filtering developer flowing into the concentration measuring device from the mixing tank to correct the concentration of the filtering developer or the concentration Control to flow into the supply tank only when the concentration verification is completed with a measuring device, and use information on the filtering developer flowing into the chemical filter and the filtering developer solution discharged from the chemical filter to remove foreign substances from the filtering developer and a control device for controlling the filtering waste solution stored in the supply tank to be supplied when receiving a supply request from the developer according to whether or not the developer has been removed.
Photoresist removal and regeneration, mixing system.
According to claim 1,
a regeneration filter absorbance meter for measuring the turbidity of the filtering developer discharged from the regeneration filter;
a regeneration filter inlet pressure measuring meter installed on the inlet side of the regeneration filter to measure and transmit the inlet pressure of the developer waste flowing into the regeneration filter;
a regeneration filter discharge pressure measuring meter installed at the outlet side of the regeneration filter to measure and transmit the discharge pressure of the developer waste discharged from the regeneration filter;
a concentration measuring device inflow flow meter installed at the inlet side of the concentration measuring device to measure and transmit the flow rate of the filtering developer flowing into the concentration measuring device;
a concentration measuring device inlet pressure measuring meter installed on the inlet side of the concentration measuring device to measure and transmit the pressure of the filtering developer flowing into the concentration measuring device;
a chemical filter inlet pressure measuring meter installed on the inlet side of the chemical filter to measure and transmit the pressure of the filtering developing solution flowing into the chemical filter; and
It is installed on the outlet side of the chemical filter, characterized in that it comprises a chemical discharge pressure measuring meter for measuring and transmitting the discharge pressure of the filtering developing waste discharged from the chemical filter
Photoresist removal and regeneration, mixing system.
3. The method of claim 2,
the control device
In the filtering developer according to the pressure difference between the inlet pressure of the developer received from the regeneration filter inlet pressure meter and the outlet pressure of the developer liquid received from the regeneration filter outlet pressure meter and the turbidity received from the regeneration filter absorbance meter It is determined whether the photoresist has been removed, and if the photoresist is removed as a result of the determination, the filtering developer solution is controlled to flow into the mixing tank. characterized in that it is controlled to flow into
Photoresist removal and regeneration, mixing system.
3. The method of claim 2,
the control device
It is determined whether the flow rate and pressure of the filtering developer flowing into the concentration measuring device from the mixing tank correspond to a set condition and the concentration value of the filtering developer falls within a set concentration management range, and the determination result TMAH stock solution or ultrapure water (DIW) is supplied to the mixing tank according to
Photoresist removal and regeneration, mixing system.
5. The method of claim 4,
the control device
When the concentration of the filtering developer is lower than the set concentration management range, the TMAH stock solution is supplied to the mixing tank, and when the concentration of the filtering developer solution is higher than the set concentration management range, ultrapure water (DIW) is supplied to the mixing tank. Characterized in correcting the concentration of the filtering developer stored in the mixing tank
Photoresist removal and regeneration, mixing system.
3. The method of claim 2,
the control device
calculating a pressure difference between the inlet pressure of the filtering developer received from the chemical filter inlet pressure gauge and the outlet pressure of the filtering developer received from the chemical filter outlet pressure gauge, and according to the pressure difference, in the filtering developer solution When it is determined that the foreign material has been removed and a supply request is received from the developer, the control valve automatically adjusts the flow rate.
Photoresist removal and regeneration, mixing system.
A photoresist removal and regeneration, mixing method performed in a photoresist removal and regeneration, mixing system, the method comprising:
when the developer solution stored in the recovery tank flows into the regeneration filter, the regeneration filter filters the photoresist from the waste developer solution to discharge the filtered developer solution;
checking whether the photoresist has been removed from the filtering developer based on the information on the developer liquid flowing into the regeneration filter and the information on the developer waste liquid being discharged;
storing the filtering developing solution in a recovery tank or a mixing tank according to the result of the check;
According to the flow rate, pressure, and concentration value of the filtering developer flowing into the concentration measuring device from the mixing tank, it is determined whether the concentration of the filtering developer stored in the mixing tank is corrected to correct the concentration of the filtering developer or use the concentration measuring device controlling to flow into the supply tank only when the concentration verification is completed; and
The step of supplying when receiving a supply request from a developer according to whether foreign matter has been removed from the filtering developer using the information on the filtering developer liquid flowing into the chemical filter and the information on the filtering developer liquid discharged from the chemical filter Photoresist removal and regeneration, characterized in that the mixing method.
8. The method of claim 7,
The step of determining whether the photoresist has been removed from the filtering developer based on the information on the developer liquid flowing into the regeneration filter and the information on the developer waste liquid discharged may include:
receiving an inlet pressure of the developer solution flowing into the regeneration filter and a discharge pressure of the developer solution discharged from the regeneration filter;
calculating a pressure difference between the inlet pressure and the outlet pressure;
receiving and calculating turbidity from the regenerative filter absorbance meter; and
and determining that the photoresist is removed from the filtering developer according to the pressure difference and turbidity.
Photoresist removal, regeneration, and mixing methods.
9. The method of claim 8,
The step of storing the filtering developing waste solution in a mixing tank or in a recovery tank according to the confirmation result is
controlling the filtering developer to flow into the mixing tank when the photoresist is removed as a result of the check; and
and controlling the filtering developer to flow into a recovery tank if the photoresist is not removed as a result of the check.
Photoresist removal, regeneration, and mixing methods.
8. The method of claim 7,
The step of correcting the concentration of the filtering developer by determining whether to correct the concentration of the filtering developer stored in the mixing tank according to the flow rate, pressure, and concentration value of the filtering developer flowing into the concentration measuring device from the mixing tank
receiving a flow rate, a pressure, and a concentration value of the filtering developing solution flowing from the mixing tank into the concentration measuring device;
determining whether the flow rate and pressure of the filtering developer flowing into the concentration measuring device from the mixing tank correspond to a set condition and whether the concentration value of the filtering developer falls within a set concentration management range; and
Comprising the step of supplying TMAH stock solution or ultrapure water (DIW) to the mixing tank according to the determination result to correct the concentration of the filtering developer solution stored in the mixing tank
Photoresist removal, regeneration, and mixing methods.
11. The method of claim 10,
Correcting the concentration of the filtering developer stored in the mixing tank by supplying TMAH stock solution or ultrapure water (DIW) to the mixing tank according to the determination result
correcting the concentration of the filtering developer stored in the mixing tank by supplying the TMAH stock solution to the supply tank when the concentration of the filtering developer is lower than a set concentration management range; and
Compensating the concentration of the filtering developer stored in the mixing tank by supplying ultrapure water (DIW) to the mixing tank when the concentration of the filtering developer is higher than a set concentration management range
Photoresist removal, regeneration, and mixing methods.
8. The method of claim 7,
The step of determining whether to correct the concentration of the filtering developer stored in the mixing tank according to the concentration value and controlling the concentration to flow into the supply tank only when the concentration verification is completed with the concentration measuring device
Measuring the water level in the supply tank when the concentration of the filtering developing solution is corrected and verifying within the set concentration management range, and transferring the filtering developing solution to the supply tank by the value automatically set by the control valve characterized
Photoresist removal, regeneration, and mixing methods.
8. The method of claim 7,
The step of confirming whether the foreign substances are removed from the filtering developing solution stored in the supply tank based on the information of the filtering developing solution flowing into the chemical filter and the discharged filtering developing solution information
receiving an inlet pressure of the filtering developer flowing into the chemical filter and a discharge pressure of the filtering developer discharged from the chemical filter;
calculating a pressure difference between the inlet pressure and the outlet pressure;
and allowing the control valve to automatically adjust the flow rate when it is determined that the foreign material has been removed from the filtering developer according to the pressure difference and a supply request is received from the developer.
Photoresist removal, regeneration, and mixing methods.

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