572810 A7 B7 五、發明説明（1 ) 【發明所屬之技術領域】 (請先閲讀背面之注意事項再填寫本頁} 本發明係關於硏磨液的製造裝置，詳細而言，例如係 針對在半導體元件製造過程的硏磨加工中，所使用之化學 機械硏磨用的硏磨液，將其加以調製之硏磨液的製造裝置 ，關於能夠以線內（i η -1 i n e)連續地管理在硏磨液中的一定 粒徑以上的硏磨顆粒的發生之硏磨液的製造裝置。 【習知技術】 經濟部智慧財產局員工消費合作社印製 半導體元件，一直被要求更加地高集積化、高速化以 及低耗電化，對於其製造過程，由於在中間製程中，爲了 使形成在晶圓上的金屬配線或層間絕緣膜的表面更加平坦 化，例如使用二氧化矽系的硏磨液（C Μ P泥狀硏磨漿） ，對晶圓的表面施以化學機械硏磨。又，近來，從元件的 量產化以及硏磨劑的組成管理問題來考量，將上述的硏磨 液在硏磨製程中以連續作業加以製造。製造硏磨液時，爲 了得到正確的拋光率，必須嚴格地管理硏磨顆粒的濃度。 而且，對於硏磨液，由於硏磨顆粒逐漸地凝集，而凝集成 粒徑大的硏磨顆粒會成爲晶圓發生劃痕（scratch)的原因之 一，於是硏磨液中的硏磨顆粒的粒徑的管理，更加地重要 〇 在硏磨液的製造中，將所得到的硏磨液加以採樣，以 純水稀釋後，照射一定波長的光，藉由測定其透過光或散 射光的強度，測量硏磨液中之粒徑大的硏磨顆粒的數量。 亦即，若在生產線上直接測定硏磨液中硏磨顆粒，則由於 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -4- 572810 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（2 ) 泵的脈動等，影響流量的變動，無法正確地測量硏磨顆粒 的數量。又，上述的二氧化矽系的硏磨液，例如，平均粒 徑爲0 · 2 //m左右的二氧化矽粒子爲1 〇23個/ m 1 時，濃度非常高且會產生問題之粒徑大的硏磨顆粒的數量 少。因此，假設即使是要檢測凝集成粒徑爲3 // m以上的 硏磨顆粒的情況，由於適當粒徑的硏磨顆粒所造成之光的 減衰，藉由直接測定，難以檢測出由於粒徑大的硏磨顆粒 所造成的減衰。 【發明所欲解決之課題】 可是，當要檢測出上述硏磨液中的粒徑大的硏磨顆粒 時，由於需要比較長的時間，實際上，正在使用中的硏磨 液與採樣的硏磨液之間，會產生差異。亦即，所使用的硏 磨液，比採樣時會更進一步地凝集，而含有更多粒徑大的 硏磨顆粒；結果，在硏磨加工中，在晶圓上，會發生預料 外的劃痕。 本發明係爲了解決上述情況而發明出來，其目的爲提 供一種硏磨液的製造裝置，係針對在半導體元件製造過程 的硏磨加工中，所使用之化學機械硏磨用的硏磨液等，將 其加以調製之硏磨液的製造裝置，能夠以線內（in-line)連 續且高精度地管理在硏磨液中之一定粒徑以上的硏磨顆粒 的發生。 【解決課題所用的手段】 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -5- 572810 A7 _____B7_ 五、發明説明（3 ) (請先閲讀背面之注意事項再填寫本頁) 爲了解決上述課題，關於本發明之硏磨液的製造裝置 ’係針對調製主要由水以及硏磨顆粒所組成的硏磨液之硏 磨液的製造裝置，其特徵爲： 具備：將所供給的泥狀硏磨劑原液和純水混合，調製 成一定的硏磨顆粒濃度之硏磨液的調製槽；以及使調製後 的硏磨液循環，維持該硏磨液的懸浮狀態之硏磨液循環裝 置；而且， 前述硏磨液循環裝置，包含硏磨液循環用的管路以及 可調整流量的旁通管路；而在前述旁通管路中，設置用來 檢測出規定粒徑以上之粒徑的硏磨顆粒以及計算其數量之 硏磨液監視用的微粒檢測器；該微粒檢測器，係對有硏磨 液通過的流槽，照射一定波長的光，檢測出由於前述規定 粒徑以上之粒徑的硏磨顆粒所造成之透過光的減衰之光遮 斷方式的檢測器；前述流槽則藉由旁通管路的流量調整， 構成可以使硏磨液以一定的流速通過。 經濟部智慧財產局員工消費合作社印製 亦即，在上述製造裝置中，以調製槽混合調製一定硏 磨顆粒濃度的硏磨液之後，藉由硏磨液循環裝置一邊使硏 磨液循環一邊維持其懸浮狀態。又，設置在硏磨液循環用 的管路之旁通管路中的硏磨液監視用的微粒檢測器，係對 有硏磨液通過的流槽，照射一定波長的光，檢測出由於規 定粒徑以上之粒徑的硏磨顆粒所造成之透過光的減衰。此 時，微粒檢測器被設置在可調整流量之旁通管路中的構造 、以及藉由旁通管路的流量調整而可以使硏磨液以一定的 流速通過之流槽的構造，限制在流槽中之硏磨液的流量， 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -6 - 572810 A7 B7 五、發明説明（4) (請先閱讀背面之注意事項再填寫本頁) 同時不會受到在硏磨液循環用的管路中所產生之脈動等的 影響，而且，由於在流槽中流動之硏磨液中之比規定粒徑 小之硏磨顆粒的絕對數量降低，所以能夠將由於比規定粒 徑小之粒徑的硏磨顆粒所造成之透過光的減衰、以及由於 規定粒徑以上之粒徑的硏磨顆粒所造成之透過光的減衰’ 加以分離。 又，對於上述製造裝置，在微粒檢測器中，理想爲具 備校正機能，當要檢測出由於規定粒徑以上之粒徑的硏磨 顆粒所造成之透過光的減衰時，修正由於硏磨液中之比規 定粒徑小之硏磨顆粒所造成的靈敏度降低；此種校正機能 ，可以提高對於由於規定粒徑以上之粒徑的硏磨顆粒所造 成之透過光的減衰的檢測靈敏度。 經濟部智慧財產局員工消費合作社印製 又，對於上述製造裝置之更理想的形態，爲了將更高 品質的硏磨液提供給硏磨裝置，係在硏磨液循環裝置的後 段，具備：將藉由硏磨液循環裝置而循環的硏磨液，供給 至硏磨裝置中的硏磨液供給裝置；而且，該硏磨液供給裝 置，包含：硏磨液供給用的管路以及可以調整流量的旁通 管路；而在前述旁通管路中，設置用來檢測出規定粒徑以 上之粒徑的硏磨顆粒且計算其數量之硏磨液監視用的微粒 檢測器；該微粒檢測器，係對有硏磨液通過之流槽，照射 一定波長的光，然後檢測出由於前述規定粒徑以上之粒徑 的硏磨顆粒所造成之透過光的減衰之光遮斷方式的檢測器 ;前述流槽，係藉由旁通管路的流量調整，構成可以使硏 磨液以一定的流速通過。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29*7公釐） 572810 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（5) 亦即，在上述製造裝置中，以硏磨液供給裝置，將藉 由硏磨液循環裝置而循環的硏磨液，供給至硏磨裝置中； 又，設置在硏磨液供給用的管路之旁通管路中之與上述同 樣的硏磨液監視用的微粒檢測器，係對有硏磨液通過的流 槽，照射一定波長的光，檢測出由於規定粒徑/以上之粒徑 的硏磨顆粒所造成之透過光的減衰。此時，與上述同樣地 ，微粒檢測器被設置在可調整硏磨液供給用的流量之旁通 管路中的構造、以及藉由旁通管路的流量調整而可以使硏 磨液以一定的流速通過之流槽的構造，限制在流槽中之硏 磨液的流量，同時不會受到在硏磨液供給用的管路中所產 生之脈動等的影響，而且，由於在流槽中流動之硏磨液中 之比規定粒徑小之硏磨顆粒的絕對數量降低，所以能夠將 由於比規定粒徑小之粒徑的硏磨顆粒所造成之透過光的減 衰、以及由於規定粒徑以上之粒徑的硏磨顆粒所造成之透 過光的減衰，加以分離。 又，對於上述製造裝置，在硏磨液監視用的微粒檢測 器中，理想爲具備校正機能，當要檢測出由於規定粒徑以 上之粒徑的硏磨顆粒所造成之透過光的減衰時，修正由於 硏磨液中之比規定粒徑小之硏磨顆粒所造成的靈敏度降低 ;此種校正機能，可以提高對於由於規定粒徑以上之粒徑 的硏磨顆粒所造成之透過光的減衰的檢測靈敏度。 【本發明之實施形態】 根據圖面來說明關於本發明之硏磨液的製造裝製之一 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) -8- 572810 A7 ___ B7_ 五、發明説明（6 ) (請先閲讀背面之注意事項再填寫本頁) 實施形態。第1圖係表示關於本發明之硏磨液的製造裝置 之槪要的系統圖。第2圖係表示關於被應用在本發明之硏 磨液的製造裝置中之微粒檢測器的原理的部分剖面圖；圖 (a )爲側視圖、圖（b )爲俯視圖。又，第3圖係表示 從微粒檢測器的感測元件傳送來的輸出以及變換後之控制 用的脈波訊號之例的圖。再者，在第1圖的系統圖中，省 略閥類或儀表機器等。又，在以下實施形態的說明中，爲 了說明方便，將硏磨液的製造裝置以「製造裝置」加以簡 略地表不。 本發明的製造裝置，係用來調製主要由純水以及硏磨 顆粒所組成的硏磨液，其中具有代表性的，爲被應用在半 導體元件之硏磨中的化學機械硏磨用之例如二氧化矽系硏 .磨液（C Μ P泥狀硏磨劑）之硏磨液的製造裝置；係一種 在現場（on-site)能夠製造出高品質的硏磨液的裝置。 經濟部智慧財產局員工消費合作社印製 二氧化矽系硏磨液的情況，其主要成分，爲熱解二氧 化矽（f.umed silica)的硏磨顆粒和純水；硏磨顆粒的粒徑通 常不到5//m，理想爲不到3/zm，更理想爲〇 · 1〜2 //m ;又，硏磨顆粒的含有量，一般爲1 〇〜3 0重量％ 。又，在上述硏磨液中，根據需要，也可以加入添加劑。 作爲添加劑，當要硏磨金屬配線的表面的情況或是除去針 形接點（plug)的情況，只要可以將其氧化的成分即可，一 般是使用過氧化氫。又，當硏磨矽層的情況，係使用氫氧 化鉀等的鹼性物質作爲添加劑。這些酸或鹼，係通過後述 的添加劑供給裝置（L 3 )，以水溶液的形態添加。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29?公釐） _ ' -9 - 572810 A7 ___^_B7 ___ 五、發明説明（7 ) (請先閲讀背面之注意事項再填寫本頁) 本發明的製造裝置，如第1圖所示，具備：調製槽（ 2 )，此槽係用來將所供給的泥狀硏磨劑原液亦即含有粒 徑不到3 // m的硏磨顆粒之泥狀硏磨劑與純水混合；以及 使調製後的硏磨液循環，維持該硏磨液的懸浮狀態之硏磨 液循環裝置（L 4 )。 通常，調製槽（2 )，係藉由原液供給裝置（L 1 ) 供給一定濃度的泥狀硏磨劑原液、且藉由純水供給裝置（ L 2 )供給純水。又，在調製槽（2 )的後段，具備用來 貯存調製完成後的硏磨液之硏磨液槽（3 );上述硏磨液 循環裝置（L 4 )，係構成可以使硏磨液槽（3 )內的硏 磨液循環。進而，硏磨液槽（3 )，係構成可以藉由添加 劑供給裝置（L 3 )而被供給上述的各種添加劑。 經濟部智慧財產局員工消費合作社印製 原液供給裝置（L 1 )，係將泥狀硏磨劑從原液槽（ 1 )壓送至調製槽（2 )內的裝置；係由從原液槽（1 ) 到調製槽（2 )的配管（5 1 )、以及風箱式等型式的泵 (bellows pump)(未圖示）等所構成。原液槽（1 )係用 來將泥狀硏磨劑原液供給至調製槽（2 )內的貯槽，係由 具耐腐蝕性的固定式容器或是可搬式容器所構成。 原液槽（1 )，具備可以與從系統外搬入的泥狀硏磨 劑原液的搬送用容器連接的配管（省略圖示），經由此配 管，利用氮氣等的非活性氣體將泥狀硏磨劑原液從搬送用 容器壓送至原液槽（1)內。又，在原液槽（1)中，爲 了防止與空氣接觸，附設非活性氣體的供給配管（省略圖 示）。 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇><297公釐） -10- 572810 A7 B7 五、發明説明（8) (請先閲讀背面之注意事項再填寫本頁) 調製槽（2 )，係用來將硏磨液的濃度調整至規定濃 度且貯存濃度調整後的硏磨液的貯槽。例如，調製槽（2 )，爲了提高其耐腐蝕性，係由利用含氟樹脂加以加襯的 容器所構成。在調製槽（2 )中，設置：用來測量所接收 的泥狀硏磨劑原液或純水的重量的測量器、用來測量液量 的光式、導電率式、靜電容量式等的點測量可能的液面計 (省略圖示）。又，爲了防止與空氣接觸，在調製槽（2 )中，附設非活性氣體的供給配管（省略圖示）。 純水供給裝置（L 2 )，係將稀釋用的純水供給至調 製槽（2)內的裝置；具備：從藉由離子交換樹脂等而分 離精製出超純水之一般的純水製造裝置，連到調製槽（2 )的管路（5 2 ):通常，利用附設在純水製造裝置中的 泵，將利用純水製造裝置所製造出來的純水，壓送至調製 槽（2 )內。 經濟部智慧財產局員工消費合作社印製 當製造量小時，雖然也可以直接將在調製槽（2 )中 所調製出來的硏磨液，藉由硏磨液循環裝置（L 4 )使其 循環而供給至硏磨裝置（9 )(磨盤裝置）中，但是爲了 將硏磨液安定地供給至複數台硏磨裝置（9 )中，通常係 在調製槽（2 )的後段，配置上述的硏磨液槽（3 )。在 第1圖所示的裝置中，係作成能夠將利用調製槽（2 )混 合調製成的硏磨液，藉由泵（4 1 )以及管路（5 3 )， 移送至硏磨液槽（3)內。再者，圖中的管路（54)， 係根據需要，用來監控硏磨液的濃度且將硏磨液送回調製 槽（2 )內的回流用的管路。 本纸張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -11 - 572810 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（9) 硏磨液槽（3 )，係用來將調整後的硏磨液供給至外 部的硏磨裝置中的貯槽；而且，由於上述的酸性或是鹼性 的添加劑，係以水溶液狀態供給至此槽內，所以係由利用 含氟樹脂加以加襯的耐腐蝕性容器所構成。在硏磨液槽（ 3 )中，爲了測量硏磨液的液量或是添加劑的添加量，設 置光式、導電率式、靜電容量式等的點測量可能的液面計 (省略圖示）。又，爲了防止與空氣接觸，在硏磨液槽（ 3 )中，附設非活性氣體的供給配管（省略圖示）。 用來將添加劑供給至硏磨液槽（3 )內的添加劑供給 裝置（L 3 )，係將添加劑從另外設置的添加劑槽（省略 圖示）壓送至硏磨液槽（3 )內的裝置；係由：用來將添 加劑從添加劑槽取出的管路（省略圖示）、可以改變流量 且控制流量將其保持一定的電磁泵等的送液用定流量泵（ 省略圖示）、以及將添加劑供給至硏磨液槽（3 )內的管 路（5 5 )所構成。 進而，在硏磨液槽（3)中，爲了防止硏磨顆粒成分 的沉降或凝集，設計利用噴流將硏磨液經常攪拌的攪拌機 構。攪拌機構，可以利用攪拌翼等的旋轉裝置來構成，例 如，攪拌機構係藉由附設在後述的硏磨液循環裝置（L 4 )中的管路（5 6 )的回流側的前端，亦即被插入硏磨液 槽（3 )內之配管前端部處的噴嘴（未圖示）所構成。此 噴嘴係利用從管路（5 6 )之回流側前端所噴出之作爲驅 動加壓流體的硏磨液的噴出能量，能夠在硏磨液槽（3 ) 的底部附近，產生噴流。 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -12- 572810 A7 B7 五、發明説明（10) (請先閱讀背面之注意事項再填寫本頁) 再者，雖然未加以圖示出來，在本發明的製造裝置中 ，爲了提高硏磨液和添加劑之間的混合效率，也可以作成 :在調製槽（2 )和硏磨液槽（3 )之間配置混合槽，在 混合槽內，預先將從調製槽（2 )所供給的硏磨液和從添 加劑供給裝置（L 3 )所供給的添加劑，加以混合後，將 添加入添加劑的硏磨液，貯存在硏磨液槽（3 )中。 硏磨液循環裝置（L 4 )，係爲了將所調製的硏磨液 的懸浮狀態保持一定且降低硏磨液中的硏磨顆粒的凝集， 同時直接將硏磨液供給至後述的硏磨液供給裝置（L 5 ) 中而設置，構成可以使硏磨液槽（3 )內的硏磨液循環。 亦即，硏磨液循環裝置（L 4 )，係由：用來將硏磨液從 硏磨液槽（3 )取出且將硏磨液送回硏磨液槽（3 )內的 硏磨液循環用的管路（5 6 )、以及輸送硏磨液的泵（ 4 2 )等的構件所構成。 經濟部智慈財產局員工消費合作社印製 硏磨液，如前所示，係使粒徑例如不到3 // m的硏磨 顆粒分散開來的液體，然而隨著時間的經過，硏磨顆粒開 始進行凝集，而成長至粒徑爲3 // m以上的大硏磨顆粒（ 以下，稱爲「大粒徑的硏磨顆粒」）。因此，在硏磨裝置 (9 )中使用硏磨液時，爲了防止大粒徑的硏磨顆粒在晶 圓上產生劃痕，在硏磨液循環用的管路（5 6 )中，於後 述的微粒檢測器（7 )的上游側，配置用來捕捉預先設定 一定粒徑以上的硏磨顆粒，具體而言，例如捕捉3 // m以 上粒徑的硏磨顆粒之循環管路用的過濾器（6 1 )。 作爲此種過濾器（6 1 )，係使用具備孔徑設計爲 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -13- 572810 A7 B7 五、發明説明（11) 1 · 0〜5 · 0//m左右之聚丙烯製的深度過濾型式 請 先 閲 讀 背 面 i 事 項 (depth-type filtration)的濾材之通常的流體用過濾器。再 者，硏磨液循環裝置（L4)，爲了管理硏磨液槽（3) 的添加劑濃度，也可以構成通過旁通管（省略圖示），將 硏磨液供給至濃度測量裝置（省略圖示）中。 本發明的製造裝置，在硏磨液循環裝置（L4)中， 爲了管理硏磨液中的大粒徑的硏磨顆粒的發生以及其數量 ，在硏磨液循環裝置（L 4 )的硏磨液循環用的管路（ 5 6 )中’具備由流量調整閥（省略圖示）或孔口 (orifice)所組成之可調整流量的旁通管路（5 6 1 );而 且，在此種旁通管路（5 6 1 )中，設置前述的硏磨液監 視用的微粒檢測器（7 )，用來檢測出一定粒徑以上的硏 .磨顆粒亦即預先所設定粒徑以上的硏磨顆粒，例如檢測出 3 // m以上粒徑的硏磨顆粒以及其數量。 經濟部智慈財產局員工消費合作社印製 如前所述，在二氧化矽系硏磨液中之適當的硏磨顆粒 的平均粒徑，例如爲3 // m以下的情況，由於凝集的進行 ，粒徑會成爲3 /zm以上，甚至是數//m以上，但是如此 的大粒徑的硏磨顆粒的數量，與硏磨液中之適當的粒徑的 硏磨顆粒的數量相比，僅佔極少部分。例如，硏磨液中之 適當硏磨顆粒的平均粒徑爲〇 . 2 // m左右的情況，其數 量爲1 0 2 3個/m 1 ，相對於此，會造成劃痕之大粒徑 的硏磨顆粒的數量，則爲1 〇〜1 〇 0 0個/ m 1左右。 因此，作爲微粒檢測器（7 )，係使用對有硏磨液通過的 流槽（flow cell) ( 7 4 )，照射一定波長的光，然後檢測 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -14- 572810 A7 B7 五、發明説明（12) 出由於規定粒徑以上之硏磨顆粒所造成的透過光的減衰之 光遮斷方式的檢測器。 (請先閱讀背面之注意事項再填寫本頁) 光遮斷方式的檢測器的基本構造爲一般技術，如此的 檢測器，係具備：對在透明的流槽中流動的流體（泥狀硏 磨劑）照射光，利用受光元件檢測出透過光之光量的構造 ;根據通過流槽中的粒子所造成之光的吸收、反射或是由 於散射所造成之光量的減少，來測量粒子的大小；又，作 成根據以脈波所得到之光量的變化次數，能夠測量粒子的 數量。 具體而言，如第2圖所示，微粒檢測器（7 )的主要 部分，係由··利用由電源電路（7 1 )所供給的電力，而 發出一定波長的鎢絲燈、發光二極體、半導體雷射等的光 源（7 2 );將從光源（7 2 )照射出來的光，聚光成扁 平狀的光束之聚光透鏡（7 3 );由石英玻璃等的透明性 材料所形成之例如剖面正方形的筒狀流槽（7 4 );檢測 出通過流槽（7 4 )之光源（7 2 )的透過光強度的光電 二極管、光陣列等的受光元件（7 5 ):將受光元件（ 經濟部智慧財產局員工消費合作社印製 7 5 )的輸出訊號加以放大的放大器（7 6 );以及將該 受光元件的訊號加以運算處理的運算處理手段（包含記憶 •運算元件的運算電路）等所構成。 一般而言，對於硏磨液中之大粒徑的硏磨顆粒的測量 ’如前所述，必須檢測出硏磨顆粒濃度例如爲1 0〜3 0 重量％之硏磨液中的極少數的硏磨顆粒。因此，根據檢測 對象之大粒徑的硏磨顆粒之粒徑的下限値的設定，由於適 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -15- 572810 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（13) 當的硏磨顆粒所造成之光的吸收、反射或是由於散射所造 成的影響（雜訊）大，難以正確地檢測出大粒徑的硏磨顆 粒。進而，當有由於泵等的機器所產生之流體的脈動的情 況，無法正確地測量粒子數。 相對於此，在本發明中，係藉由將微粒檢測器（7 ) 設置在利用旁通管路（5 6 1 )而流量被限制之旁通管路 (5 6 1 )中，來防止在硏磨液循環用的管路（5 6 )中 的脈動的影響，且降低由於適當的粒徑之硏磨顆粒所造成 的影響（雜訊），而作成可以正確地檢測出數量少之大粒 徑的硏磨顆粒。亦即，流槽（7 4 )，係藉由旁通管路（ 5 6 1 )的流量調整，構成硏磨液能夠以一定的流速通過 。通常，在流槽（7 4 )中之硏磨液的流量，係設定成1 〜5 0 0 m 1 /分、流速則設定爲〇 · 1〜1 m /秒。又 ，爲了更正確地檢測出大粒徑的硏磨顆粒，在流槽（7 4 )中之光的透過距離，理想爲設定在0 . 1〜100mm 的範圍內。 進而，對於本發明的製造裝置，爲了更高精度地檢測 出循環中之硏磨液中的大粒徑的硏磨顆粒，在微粒檢測器 (7 )中，具備：當要檢測由於預先設定之規定粒徑以上 的粒徑之硏磨顆粒所造成之透過光的減衰之時，修正由於 硏磨液中之比規定粒徑小的硏磨顆粒（適當粒徑的硏磨顆 粒）所造成之靈敏度降低的校正機能。此種校正機能，通 常係設置在上述運算處理手段中。 亦即，在微粒檢測器（7 )中，如第3圖（a )所示 (請先閲讀背面之注意事項再填寫本頁) 本纸張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -16- 572810 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（14) ，受光元件（7 5 )，將所接受之光的訊號轉換成脈波訊 號而輸出；上述運算處理手段，係作成將所得到的脈波訊 號，波形處理成第3圖（b )所示形狀的波形之後，計算 出比根據標準試樣所預先設定之下限的臨界電壓高的訊號 。作爲上述標準試樣，係使用：含有一定量（例如1 5重 量％ )之比規定粒徑小的硏磨顆粒（例如粒徑不到3 // m 的硏磨顆粒），且將與要檢測出之粒徑（例如3 // m )相 同的粒徑之聚苯乙烯膠乳粒子作爲標準粒子，加以混合所 得到的硏磨液。 在本發明的製造裝置中，設置：原液供給裝置（L 1 )、調製槽（2 )、純水供給裝置（L 2 )、硏磨液槽（ 3 )、硏磨液循環裝置（L 4 )、以及進行後述的硏磨液 供給裝置（L 5 )的控制和根據上述微粒檢測器（7 )的 檢測訊號進行後述之警報的發出之控制裝置（1 0 )。此 種控制裝置（1 0 )，主要係由··將各機器的訊號變換成 數位訊號的輸入裝置、含有記憶手段之程式控制器或是電 腦等的運算處理裝置、以及將從運算處理裝置傳送來的控 制訊號變換成類比訊號的輸出裝置所構成。 接著，說明根據本發明的製造裝置之硏磨液的製造方 法。在本發明的製造裝置中，首先，從原液槽（1 )將一 定硏磨顆粒濃度的泥狀硏磨劑原液計量供給至調製槽（2 )內，且從純水供給裝置（L 2 )將純水計量供給至調製 槽（2 )內之後，在調製槽（2 )內，進行硏磨液的混合 調製。此時，經由泵（4 1 )以及管路（5 4 )，一邊使 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐）572810 A7 B7 V. Description of the invention (1) [Technical field to which the invention belongs] (Please read the precautions on the back before filling out this page} The present invention relates to a manufacturing apparatus for honing fluids. In the honing process of the element manufacturing process, a honing fluid for chemical-mechanical honing is used, and a manufacturing apparatus for the honing fluid can be continuously managed in-line (i η -1 ine). Honing fluid manufacturing equipment for the generation of honing particles with a certain particle size or more in the honing fluid. [Knowledge Technology] The Intellectual Property Bureau, Ministry of Economic Affairs, employee consumer cooperatives have printed semiconductor components, and have been required to achieve higher accumulation, For the high-speed and low-power consumption, in the manufacturing process, in order to flatten the surface of the metal wiring or interlayer insulating film formed on the wafer in the intermediate process, for example, a silicon dioxide-based honing liquid ( CMP mud-type honing slurry), chemical mechanical honing on the surface of the wafer. Recently, from the mass production of components and the composition management of honing agents, The honing fluid is manufactured in a continuous operation during the honing process. In order to obtain the correct polishing rate, the concentration of the honing particles must be strictly controlled. Ground agglomeration, and honing particles with a large particle size will become one of the reasons for scratches on the wafer. Therefore, the management of the particle size of the honing particles in the honing liquid is more important. In the production of liquids, the obtained honing liquid is sampled, diluted with pure water, and then irradiated with light of a certain wavelength, and the intensity of transmitted light or scattered light is measured to measure the large particle size of the honing liquid in the honing liquid. The number of abrasive particles. That is, if the honing particles in the honing fluid are directly measured on the production line, since this paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -4- 572810 A7 B7 Ministry of Economic Affairs wisdom Printed by the Consumer Cooperative of the Property Bureau. 5. Description of the invention (2) The pulsation of the pump affects the change of the flow rate, and the number of honing particles cannot be measured correctly. In addition, the above-mentioned silicon dioxide-based honing fluid, for example, When the average particle diameter is about 0 · 2 // m and the number of silicon dioxide particles is 1023 / m1, the number of honing particles with a large particle size which is very high in concentration and causes problems is small. Therefore, it is assumed that It is to detect the agglomeration of honing particles with a particle size of 3 // m or more. Due to the attenuation of the light caused by the honing particles of an appropriate particle size, it is difficult to detect the honing due to the large particle size by direct measurement. Attenuation caused by particles. [Problems to be Solved by the Invention] However, when honing particles having a large particle size in the above-mentioned honing liquid are to be detected, it takes a relatively long time. There is a difference between the grinding fluid and the honing fluid being sampled. That is, the honing fluid used will agglomerate more than when sampling and contain more honing particles with a larger particle size; as a result, in honing During grinding, unexpected scratches may occur on the wafer. The present invention has been invented in order to solve the above-mentioned situation, and an object thereof is to provide a honing liquid manufacturing device, which is directed to a honing liquid for chemical mechanical honing used in a honing process of a semiconductor element manufacturing process, The manufacturing apparatus for the honing liquid prepared by this method can continuously and accurately manage the generation of honing particles in a honing liquid with a certain particle size or more in-line. [Methods used to solve the problem] (Please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) -5- 572810 A7 _____B7_ V. Description of the invention (3 ) (Please read the precautions on the back before filling this page.) In order to solve the above-mentioned problems, the honing fluid manufacturing device of the present invention is a honing fluid for preparing a honing fluid mainly composed of water and honing particles. A manufacturing device for: is provided with a preparation tank for mixing the supplied mud-like honing agent stock solution and pure water to prepare a honing solution having a constant concentration of honing particles; and circulating the prepared honing solution. A honing liquid circulation device for maintaining the honing liquid in a suspended state; further, the honing liquid circulation device includes a honing liquid circulation pipeline and a bypass pipeline whose flow rate can be adjusted; and the bypass pipe In the road, a particle detector for detecting honing particles with a particle diameter larger than a predetermined particle size and calculating the number of the honing fluid is provided; the particle detector is a flow for the honing fluid passing through. A light-blocking detector that detects the attenuation of transmitted light due to honing particles having a particle diameter of a predetermined size or more by irradiating light of a certain wavelength; the flow channel uses the flow rate of the bypass pipe It is adjusted so that the honing fluid can pass through at a certain flow rate. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy Its suspended state. In addition, the particle detector for honing liquid monitoring installed in the bypass line of the honing liquid circulation line irradiates light of a certain wavelength to a flow cell through which the honing liquid passes, and detects that the Attenuation of transmitted light caused by honing particles with a particle size above the particle size. At this time, the structure in which the particle detector is installed in the bypass line with adjustable flow rate, and the structure in which the honing fluid can pass through the flow path by adjusting the flow rate of the bypass line, are limited to The flow of honing fluid in the flow tank. The paper size is applicable to the Chinese National Standard (CNS) A4 (210X 297 mm) -6-572810 A7 B7 V. Description of the invention (4) (Please read the precautions on the back before (Fill in this page) At the same time, it will not be affected by the pulsation and the like generated in the pipeline for circulating the honing fluid, and because the honing fluid flowing in the flow tank is smaller than the specified size of the honing particles The absolute number is reduced, so it is possible to reduce attenuation of transmitted light caused by honing particles having a particle size smaller than a predetermined particle size, and attenuation of transmitted light caused by honing particles having a particle size larger than a predetermined particle size. Separation. In the above-mentioned manufacturing apparatus, it is desirable that the particle detector has a correction function. When the attenuation of transmitted light caused by honing particles having a particle diameter larger than a predetermined particle diameter is detected, correction in the honing fluid is corrected. The sensitivity caused by the honing particles having a smaller particle size than the prescribed size is reduced; this correction function can improve the detection sensitivity for attenuation of transmitted light caused by the honing particles having a particle size larger than the prescribed particle size. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For the more ideal form of the above manufacturing device, in order to provide a higher quality honing liquid to the honing device, it is located at the back of the honing liquid circulation device. The honing liquid circulated by the honing liquid circulation device is supplied to the honing liquid supply device in the honing device; and the honing liquid supply device includes a pipe for honing liquid supply and the flow rate can be adjusted. The bypass line is provided with a particle detector for monitoring the honing liquid and detecting the number of honing particles having a particle size of a predetermined particle size or more; and the particle detector , Department of honing fluid through the flow slot, irradiate a certain wavelength of light, and then detect the attenuation of the transmitted light due to honing particles with a particle size above the prescribed particle size of the light blocking mode detector; The flow channel is configured to allow the honing liquid to pass at a constant flow rate by adjusting the flow rate of the bypass line. This paper size applies the Chinese National Standard (CNS) A4 specification (210X29 * 7 mm) 572810 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy The polishing liquid supply device supplies the honing liquid circulated by the honing liquid circulation device to the honing device; and a bypass line provided in the bypass line of the honing liquid supply line is the same as described above. The particle detector for honing fluid monitoring is used to irradiate a flow cell through which honing fluid passes, and irradiate light of a certain wavelength to detect the attenuation of transmitted light caused by honing particles of a predetermined particle size or more. At this time, as in the above, the structure of the particle detector provided in the bypass line capable of adjusting the flow rate of the honing liquid supply, and the flow rate of the bypass line can be adjusted to make the honing liquid constant. The structure of the flow passage through which the flow velocity passes restricts the flow of the honing liquid in the flow groove, and at the same time, it is not affected by the pulsation and the like generated in the pipeline for honing liquid supply. The absolute number of honing particles having a smaller particle size in the flowing honing liquid is reduced, so that the attenuation of transmitted light due to honing particles having a particle size smaller than the predetermined particle size can be reduced, and the predetermined particle size can be reduced. The attenuation of transmitted light caused by honing particles of the above particle size is separated. Moreover, in the manufacturing apparatus described above, it is desirable that the particle detector for honing liquid monitoring has a correction function. When the attenuation of transmitted light caused by honing particles having a particle diameter larger than a predetermined particle diameter is detected, Corrects the decrease in sensitivity caused by honing particles with a smaller particle size in the honing liquid; this correction function can improve the attenuation of transmitted light caused by honing particles with a particle size above the specified particle size. Detection sensitivity. [Embodiment of the present invention] One of the manufacturing methods of the honing fluid of the present invention is explained based on the drawing. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back first) Fill out this page again) -8- 572810 A7 ___ B7_ V. Description of the invention (6) (Please read the precautions on the back before filling this page) Implementation form. Fig. 1 is a system diagram showing the outline of the honing liquid manufacturing apparatus of the present invention. Fig. 2 is a partial cross-sectional view showing the principle of a particle detector used in a honing-fluid manufacturing apparatus of the present invention; Fig. (A) is a side view, and Fig. (B) is a plan view. Fig. 3 is a diagram showing an example of an output transmitted from a sensing element of the particle detector and a pulse signal for control after conversion. Furthermore, in the system diagram of Fig. 1, valves, instrumentation, etc. are omitted. In addition, in the following description of the embodiment, for convenience of explanation, the manufacturing apparatus of the honing liquid will be simply referred to as "manufacturing apparatus". The manufacturing device of the present invention is used to prepare a honing liquid mainly composed of pure water and honing particles. Among them, a representative example is a chemical mechanical honing used in the honing of semiconductor elements. Silicon oxide honing fluid (CMP mud type honing agent) honing fluid manufacturing device; an on-site device capable of producing high-quality honing fluid. The situation of the printing of silica dioxide honing fluid by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the main components of which are honing particles and pure water of pyrogenic silica (f.umed silica); It is usually less than 5 // m, preferably less than 3 / zm, and more preferably 0.1 to 2 // m; and the content of the honing particles is generally 10 to 30% by weight. Moreover, an additive may be added to the said honing liquid as needed. As an additive, when honing the surface of a metal wiring or removing a plug, as long as the component can be oxidized, hydrogen peroxide is generally used. In the case of honing the silicon layer, an alkaline substance such as potassium hydroxide is used as an additive. These acids or bases are added in the form of an aqueous solution through an additive supply device (L 3) described later. This paper size applies Chinese National Standard (CNS) A4 specification (210X29? Mm) _ '-9-572810 A7 ___ ^ _ B7 ___ V. Description of the invention (7) (Please read the precautions on the back before filling this page) This The manufacturing device of the invention, as shown in FIG. 1, includes a preparation tank (2), which is used to feed the supplied slurry-type honing agent stock solution, that is, honing particles having a particle size of less than 3 // m A mud-shaped honing agent is mixed with pure water; and a honing liquid circulation device (L 4) that circulates the prepared honing liquid and maintains the suspension state of the honing liquid. Generally, the preparation tank (2) is supplied with a mud-like honing agent stock solution of a certain concentration by a stock solution supply device (L1), and pure water is supplied by a pure water supply device (L2). In addition, a honing fluid tank (3) for storing the honing fluid after the preparation is provided at the rear stage of the conditioning tank (2); the honing fluid circulation device (L4) is configured to enable the honing fluid tank (3) The honing fluid is circulated. Furthermore, the honing liquid tank (3) is configured so that the various additives described above can be supplied by an additive supply device (L3). The original liquid supply device (L 1) printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is a device for pressure-feeding the mud-shaped honing agent from the original liquid tank (1) to the preparation tank (2); ) To piping (5 1) to the modulation tank (2), and bellows pumps (not shown). The stock solution tank (1) is a storage tank for supplying the mud-like honing agent stock solution into the preparation tank (2), and is composed of a fixed container or a portable container having corrosion resistance. The raw liquid tank (1) is provided with a pipe (not shown) which can be connected to a container for transferring a mud-shaped honing agent raw liquid carried from outside the system, and through this pipe, the mud-shaped honing agent is inactivated by an inert gas such as nitrogen. The stock solution is pressure-fed from the transfer container into the stock solution tank (1). In addition, in the raw liquid tank (1), in order to prevent contact with air, a supply pipe for inert gas is provided (not shown). This paper size applies Chinese National Standard (CNS) A4 specification (21〇 > < 297mm) -10- 572810 A7 B7 V. Description of the invention (8) (Please read the notes on the back before filling this page) Modulation The tank (2) is a storage tank for adjusting the concentration of the honing liquid to a predetermined concentration and storing the adjusted honing liquid. For example, the preparation tank (2) is composed of a container lined with a fluororesin to improve its corrosion resistance. In the modulation tank (2), there are provided: a measuring device for measuring the weight of the mud-type honing agent stock solution or pure water received, and a light type, a conductivity type, and a capacitance type point for measuring the liquid amount. Possible level gauges (not shown). In addition, in order to prevent contact with the air, an inactive gas supply pipe (not shown) is attached to the preparation tank (2). The pure water supply device (L 2) is a device for supplying pure water for dilution to the preparation tank (2); it is equipped with a general pure water production device that separates and refines ultrapure water by ion exchange resin or the like. The pipeline (5 2) connected to the modulation tank (2): Usually, the pure water produced by the pure water production device is pressure-fed to the modulation tank (2) by using a pump attached to the pure water production device. Inside. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints when the manufacturing volume is small, although the honing liquid prepared in the preparation tank (2) can also be directly circulated by the honing liquid circulation device (L 4). It is supplied to the honing device (9) (grinding plate device), but in order to stably supply the honing liquid to a plurality of honing devices (9), the honing device is usually arranged at the rear stage of the preparation tank (2). Liquid tank (3). In the device shown in FIG. 1, the honing liquid prepared by mixing in the preparation tank (2) is transferred to the honing liquid tank (4 1) and the pipeline (5 3). 3) Within. In addition, the pipeline (54) in the figure is a returning pipeline used to monitor the concentration of the honing liquid and return the honing liquid to the modulation tank (2) as needed. This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -11-572810 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (9) Honing tank (3) It is used to supply the adjusted honing liquid to the storage tank in the external honing device. In addition, since the above-mentioned acidic or alkaline additives are supplied into the tank as an aqueous solution, they are added by using a fluorine-containing resin. Lined with corrosion-resistant container. In the honing liquid tank (3), in order to measure the amount of the honing liquid or the amount of additives, a liquid level meter (optical type, optical conductivity type, electrostatic capacity type, etc.) for measuring points is provided (not shown) . In addition, in order to prevent contact with the air, an inert gas supply pipe (not shown) is attached to the honing liquid tank (3). An additive supply device (L 3) for supplying additives to the honing liquid tank (3) is a device for pressure-feeding the additives from an additional additive tank (not shown) to the honing liquid tank (3). ; By: a pipeline for removing additives from the additive tank (not shown), a constant flow pump (not shown) for liquid feeding, such as an electromagnetic pump, which can change the flow rate and control the flow rate to maintain a certain amount; and A pipeline (5 5) for supplying the additive to the honing liquid tank (3). Furthermore, in the honing liquid tank (3), in order to prevent sedimentation or agglomeration of the components of the honing particles, a stirring mechanism is designed to constantly stir the honing liquid by a jet. The stirring mechanism may be constituted by a rotating device such as a stirring blade. For example, the stirring mechanism is a front end on the return side of a pipe (5 6) provided in a honing liquid circulation device (L 4) described later, that is, It is constituted by a nozzle (not shown) at the tip of a pipe inserted into the honing liquid tank (3). This nozzle uses the ejection energy of the honing fluid as a driving pressurized fluid from the front end of the return side of the pipe (56), and can generate a jet near the bottom of the honing fluid tank (3). (Please read the precautions on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) -12- 572810 A7 B7 V. Description of the invention (10) (Please read the back Please fill in this page again.) Moreover, although it is not shown in the drawing, in order to improve the mixing efficiency between the honing liquid and the additive in the manufacturing apparatus of the present invention, it can also be prepared in the preparation tank (2) and 硏A mixing tank is arranged between the grinding tank (3). In the mixing tank, the honing liquid supplied from the preparation tank (2) and the additive supplied from the additive supply device (L3) are mixed, and then The honing liquid added with the additive is stored in the honing liquid tank (3). The honing liquid circulation device (L 4) is to directly maintain the suspension state of the prepared honing liquid and reduce the agglomeration of the honing particles in the honing liquid, and at the same time directly supply the honing liquid to the honing liquid described later. It is provided in the supply device (L 5), so that the honing liquid can be circulated in the honing liquid tank (3). That is, the honing fluid circulation device (L 4) is used to remove the honing fluid from the honing fluid tank (3) and return the honing fluid to the honing fluid in the honing fluid tank (3). The circulation pipeline (56) and the pump (42) for conveying the honing fluid are composed of components. The honing fluid is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. As shown above, it is a liquid in which honing particles with a particle size of less than 3 // m are dispersed. However, over time, honing The particles started to agglomerate and grew to large honing particles having a particle size of 3 // m or more (hereinafter referred to as "large-sized honing particles"). Therefore, when a honing liquid is used in the honing device (9), in order to prevent the large-sized honing particles from scratching on the wafer, a pipe (5 6) for honing liquid circulation is described later. The upstream side of the particle detector (7) is configured to capture honing particles with a preset particle size or more, specifically, for example, a filter for a circulation pipeline that captures honing particles with a particle size of 3 // m or more器 (6 1). As this type of filter (6 1), it is designed to have the pore size as the standard of the paper. The Chinese National Standard (CNS) A4 specification (210X297 mm) is used. -13- 572810 A7 B7 V. Description of the invention (11) 1 · 0 ~ 5 · 0 // m depth of polypropylene filter type, please read the i-side (depth-type filtration) filter media for general fluid filters. In addition, the honing liquid circulation device (L4) may also be configured to supply the honing liquid to the concentration measuring device (bypassing the pipe) (not shown) in order to manage the additive concentration of the honing liquid tank (3).示) 中。 In the). In the manufacturing apparatus of the present invention, in the honing liquid circulation device (L4), in order to manage the generation and the number of honing particles with a large particle size in the honing liquid, the honing is performed in the honing liquid circulation device (L4). The liquid circulation pipe (56) is provided with a bypass pipe (5 6 1) with an adjustable flow rate, which is composed of a flow adjustment valve (not shown) or an orifice. The bypass line (5 6 1) is provided with the aforementioned particle detector (7) for monitoring the honing fluid, and is used to detect hoes with a certain particle size or more. Abrasive particles, such as honing particles with a particle diameter of 3 // m or more, and the number thereof. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, as mentioned above, the average particle size of the appropriate honing particles in the silica dioxide honing fluid is, for example, less than 3 // m, due to the progress of agglomeration , The particle size will be 3 / zm or more, or even a number // m or more. However, the number of such large particle size honing particles is compared with the number of honing particles of appropriate particle size in the honing liquid. Only a very small part. For example, in the case where the average particle size of the appropriate honing particles in the honing liquid is about 0.2 // m, the number is 10 2 3 / m 1, in contrast to this, a large particle size will cause scratches. The number of honing particles is about 10 to 10000 / m1. Therefore, as the particle detector (7), a flow cell (74) through which the honing liquid passes is used to irradiate light of a certain wavelength, and then the paper size is tested to comply with the Chinese National Standard (CNS) A4 specification (210X297 mm) -14- 572810 A7 B7 V. Description of the invention (12) Detector of light blocking method of attenuation of transmitted light caused by honing particles with a particle size above a predetermined size. (Please read the precautions on the back before filling in this page.) The basic structure of the light-blocking detector is a general technology. Such a detector is equipped with a fluid (mud-like honing) flowing in a transparent flow cell. Agent) to irradiate light and use a light-receiving element to detect the amount of transmitted light; to measure the size of particles based on the absorption or reflection of light caused by particles in a flow cell, or the reduction of the amount of light caused by scattering; and It is possible to measure the number of particles based on the number of changes in the amount of light obtained by the pulse wave. Specifically, as shown in FIG. 2, the main part of the particle detector (7) emits a tungsten wire lamp and a light emitting diode with a certain wavelength by using the power supplied by the power supply circuit (7 1). Light source (7 2) such as a body, semiconductor laser, etc .; a condenser lens (7 3) that condenses light emitted from the light source (7 2) into a flat beam; made of a transparent material such as quartz glass For example, a cylindrical flow groove (7 4) having a square cross-section; and a light receiving element (7 5) such as a photodiode and a light array that detects the transmitted light intensity of the light source (7 2) passing through the flow groove (7 4): Amplifier (7 6) that amplifies the output signal of the light receiving element (printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 7 5); and an arithmetic processing method (including memory and computing element calculation) for processing the signal of the light receiving element Circuit). Generally speaking, the measurement of honing particles with a large particle size in the honing fluid, as described above, must detect a very small number of honing particles in the honing fluid having a concentration of, for example, 10 to 30% by weight. Honed particles. Therefore, according to the setting of the lower limit of the particle size of the abrasive particles with a large particle size to be detected, since the paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -15- 572810 A7 B7 Ministry of Economic Affairs wisdom Printed by the Consumer Cooperative of the Property Bureau V. Description of the invention (13) The absorption or reflection of light caused by the honing particles is large, and the influence (noise) caused by scattering is large, and it is difficult to accurately detect the large particle size. Honed particles. Furthermore, when there is a pulsation of a fluid generated by a device such as a pump, the number of particles cannot be accurately measured. On the other hand, in the present invention, the particle detector (7) is provided in the bypass line (5 6 1) whose flow rate is restricted by the bypass line (5 6 1) to prevent the The effect of pulsation in the circulation line (5 6) of the honing fluid, and reducing the influence (noise) caused by the honing particles of an appropriate particle size, so that the large number of small particles can be accurately detected Diameter of honing particles. That is, the flow groove (7 4) is adjusted by the flow rate of the bypass line (5 6 1), so that the honing liquid can pass at a certain flow rate. Generally, the flow rate of the honing fluid in the flow cell (7 4) is set to 1 to 500 m 1 / min, and the flow rate is set to 0 · 1 to 1 m / s. In addition, in order to more accurately detect honing particles having a large particle diameter, the light transmission distance in the flow channel (7 4) is preferably set within a range of 0.1 to 100 mm. Furthermore, for the manufacturing apparatus of the present invention, in order to more accurately detect honing particles with a large particle size in the honing fluid in circulation, the particle detector (7) includes: When the attenuation of transmitted light caused by honing particles with a particle size larger than a predetermined particle size is corrected, the sensitivity caused by honing particles having a smaller particle size in the honing liquid (honing particles with an appropriate particle size) is corrected. Reduced calibration performance. Such a correction function is usually provided in the above arithmetic processing means. That is, in the particle detector (7), as shown in Figure 3 (a) (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297) -16- 572810 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (14), the light receiving element (7 5), converts the received light signal into a pulse wave signal and outputs it; the above calculation The processing means is to prepare a pulse wave signal obtained by processing the waveform into a waveform as shown in FIG. 3 (b), and then calculate a signal higher than the threshold voltage set in advance by the lower limit of the standard sample. As the above-mentioned standard sample, a certain amount (for example, 15% by weight) of honing particles (for example, honing particles having a particle size of less than 3 // m) smaller than a predetermined particle size is used, and will be detected Polystyrene latex particles with the same particle diameter (for example, 3 // m) are used as standard particles, and the obtained honing liquid is mixed. In the manufacturing device of the present invention, a raw liquid supply device (L 1), a preparation tank (2), a pure water supply device (L 2), a honing liquid tank (3), and a honing liquid circulation device (L 4) are provided. And a control device (1 0) for controlling a honing liquid supply device (L5) described later and issuing an alarm described later based on a detection signal of the particle detector (7). Such a control device (10) is mainly an input device that converts the signals of various devices into digital signals, an arithmetic processing device such as a program controller or computer containing a memory means, and is transmitted from the arithmetic processing device The incoming control signal is converted into an analog signal output device. Next, a method for manufacturing a honing liquid in a manufacturing apparatus according to the present invention will be described. In the manufacturing apparatus of the present invention, first, a mud-shaped honing agent stock solution having a certain concentration of honing particles is metered into a preparation tank (2) from a stock solution tank (1), and the pure water supply device (L 2) After pure water is metered into the preparation tank (2), the honing liquid is mixed and prepared in the preparation tank (2). At this time, through the pump (4 1) and the pipeline (5 4), while adapting the paper size to the Chinese National Standard (CNS) A4 specification (210X297 mm)
-17- 572810 A7 一 _____B7 五、發明説明（15) (請先閲讀背面之注意事項再填寫本頁) 調製槽（2 )的硏磨液循環，一邊利用附設在管路（5 4 )中的濃度測量器來測量泥狀硏磨劑的濃度，同時根據測 量結果，藉由稍微調整泥狀硏磨劑原液或是純水的供給量 ，將硏磨液的硏磨顆粒濃度（泥狀硏磨劑濃度）例如調整 成1 5重量％ ° 在調製槽（2 )內所調製的硏磨液，通過管路（5 3 )，供給至硏磨液槽（3 )內。接著，相對於供給至硏磨 液槽（3 )內的硏磨液，從添加劑供給裝置（L 3 )，通 過管路（5 5 ) ’根據需要供給前述的添加劑。然後，藉 由設置在硏磨液槽（3 )內之上述的攪拌機構，混合攪拌 添加劑，調製出含有規定硏磨顆粒濃度且含有規定添加劑 濃度的硏磨液。再者，添加劑的濃度，係將在硏磨液循環 裝置（L 4 )之管路（5 6 )中流動的硏磨液的一部份供 給至濃度測量裝置中，根據其測量結果，藉由控制從添加 劑供給裝置（L 3 )來的添加劑之供給量或是從管路（ 5 3 )所供給之硏磨液的供給量，來進行調整。 經濟部智慧財產局員工消費合作社印製 在硏磨液槽（3 )中，最後所調製出來之規定組成的 硏磨液，係根據硏磨液循環裝置（L 4 )而循環。亦即， 使用硏磨液循環裝置（L4)的泵（4 2)以及管路（ 5 6)，藉由將從硏磨液槽（3 )取出的硏磨液使其再度 回流至硏磨液槽（3 )內，維持在硏磨液中之硏磨顆粒的 均勻懸浮狀態。又，此時，安裝在管路（5 6 )中的過濾 器（6 1 )，捕捉在循環中的硏磨液中，由於進行凝集而 變成規定粒徑以上之大粒徑的硏磨顆粒。藉由此手段，能 本紙張尺度適用中國國家標隼（CNS ) A4規格（210X297公釐） ' -18 - 572810 A7 B7 五、發明説明（16) 夠使大約沒有含有大粒徑的硏磨顆粒之硏磨液，在管路（ 5 6 )中循環。 (請先閲讀背面之注意事項再填寫本頁) 可是，硏磨液中之上述大粒徑的硏磨顆粒，隨著在硏 磨液槽（3 )以及硏磨液循環裝置（L 4 )中的滯留時間 變長而增加；又，由於過濾器（6 1 )之性能的降低也會 增加。相對於此，在本發明的製造裝置中，係將管路（ 5 6 )中的硏磨液的一部份供給至旁通管路（5 6 1 )中 ，藉由在旁通管路（5 6 1 )中之硏磨液監視用的微粒檢 測器（7 )，監視硏磨液。亦即，設置在旁通管路（ 5 6 1 )中的微粒檢測器（7 )，係對有硏磨液通過的流 槽（7 4 )照射一定波長的光，藉由檢測出由於規定粒徑 以上的粒徑之硏磨顆粒，例如粒徑爲3 // m以上之大粒徑 .的硏磨顆粒所造成之透過光的減衰，來測量硏磨液中之大 粒徑的硏磨顆粒的數量。 經濟部智慈財產局員工消費合作社印製 此時，將微粒檢測器（7 )設置在可調整流量的旁通 管路（561)中，藉由旁通管路（561)的流量調整 ，硏磨液能夠以一定的流速通過之流槽（7 4 )的構造， 係在流槽（7 4 )中之硏磨液的流量被限制，同時沒有受 到在硏磨液循環用的管路（5 6 )中所產生之泵等的機器 的脈動等的影響，而且，由於在流槽（7 4 )中流動之硏 磨液中的比規定粒徑小之硏磨顆粒的絕對數減少，所以當 藉由運算處理手段來處理利用受光元件（7 5 )來接收流 槽（7 4 )的透過光的情況，能夠將由於比規定粒徑小之 適當的硏磨顆粒（例如粒徑比3 // m小的硏磨顆粒）所造 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公廣Ί " -19- 572810 A 7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（17) 成之透過光的減衰、以及由於規定粒徑以上之粒徑的硏磨 顆粒（例如3 // m以上的硏磨顆粒）所造成之透過光的減 衰，加以分離，結果，能夠正確地測量規定粒徑以上之粒 徑的硏磨顆粒的數量。 又，具備在微粒檢測器（7 )中的校正機能，係當要 檢測出由於上述大粒徑的硏磨顆粒所造成之透過光的減衰 時，修正由於硏磨液中之比規定粒徑小的硏磨顆粒所造成 之靈敏度的降低，能夠更加提高對於由於大粒徑的硏磨顆 粒所造成之透過光的減衰之檢測靈敏度。因此，本發明的 製造裝置，對於在硏磨液循環裝置（L 4 )的管路（5 6 )中循環的硏磨液，能夠以線內（in-line)連續且高精度地 管理規定粒徑以上之大粒徑的硏磨顆粒的發生以及其數量 〇 關於本發明的製造裝置，將所得到的硏磨液，如上述 般地藉由以線內進行管理，能夠一直將高品質的硏磨液供 給硏磨裝置（9 )。例如，在本發明的製造裝置中，也可 以具備：當由微粒檢測器（7 )檢測出每單位流量中之規 定粒徑以上的粒徑的硏磨顆粒的數量超過規定界線時，便 會發生警報的功能。此種硏磨顆粒數量的管理功能以及警 報的發出功能，通常係設置在上述控制裝置（1 〇 )中。 又，隨著上述的發出警報，也可以作成停止將硏磨液供給 至硏磨裝置（9 )中。進而，藉由以線內來管理硏磨液， 當過濾器（6 1 )的性能降低時，能夠立即交換過濾器的 濾材，而能夠一直將供給至硏磨裝置（9 )中的硏磨液， (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -20- 572810 A7 B7 五、發明説明（18) 維持在高品質。 又’雖然未加以圖示出來，本發明的製造裝置，也可 以作成：在循環用的管路（5 6 )中，配置與過濾器（ 6 1 )並聯的循環用的第2過濾器；當由微粒檢測器（7 )檢測出每單位流量中之規定粒徑以上的粒徑的硏磨顆粒 白勺數量超過規定界線時，能夠將流路切換至第2過濾器側 。亦即’藉由在管路（5 6 )中，並聯地插入用來過濾規 定粒徑以上的硏磨顆粒之過濾器，當過濾器（6 1 )的功 能下降時’能夠將流路立即切換至功能未降低之第2過濾 器側’使運轉不會停止，能夠一直將高品質的硏磨液供給 至硏磨裝置（9)中。 可是，在上述硏磨液循環裝置（L4)中，通常設置 複數條用來將硏磨液供給至硏磨裝置中的管路，此種硏磨 液供給用的管路，藉由對應硏磨裝置的運轉而控制管路中 的切換閥，能夠將硏磨液供給至硏磨裝置中。因此，由於 硏磨裝置的停止時間，滯留在硏磨液供給用的管路中之硏 磨液中的硏磨顆粒進行凝集，結果，儘管從硏磨液循環裝 置（L 4 )所供給的硏磨液沒有含有大粒徑的硏磨顆粒， 含有進行凝集的硏磨顆粒也會供給至硏磨裝置中，則晶圓 表面會有發生劃痕的可能。 因此，本發明的製造裝置，爲了將更高品質的硏磨液 提供給硏磨裝置，也可以具備以下之特定的硏磨液供給裝 置（L 5 )。亦即，如第1圖所示，在硏磨液循環裝置（ L 4 )的後段，構成可以與在硏磨液循環裝置（L 4 )中 本纸張尺度適用中國國家標準（CNS ) A4規格（210X297公釐〉 (請先閱讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 -21 - 572810 A7 B7 五、發明説明（19) (請先閲讀背面之注意事項再填寫本頁) 同樣地管理硏磨液中之大粒徑的硏磨顆粒的發生，且具備 將藉由硏磨液循環裝置（L 4 )而循環的硏磨液供給至硏 磨裝置（9 )中的硏磨液供給裝置（L 5 )。 具體而言，硏磨液供給裝置（L 5 )，通常係藉由用 來將硏磨液供給至各硏磨裝置（9 )中的複數條供給線所 構成；各供給線，具備：硏磨液供給用的管路（5 7 )以 及其旁通管路（571)。而且，旁通管路（571)， 係藉由流量調整閥（省略圖示）或孔口（〇riflce)等，構成 可以調整流量；而且，在此種旁通管路（5 7 1 )中，設 置用來檢測出規定粒徑以上的粒徑的硏磨顆粒且計算其數 量之硏磨液監視用的微粒檢測器（8 )。又，在各硏磨液 供給用的管路（5 7 )中，在微粒檢測器（8 )的上游側 ，配置與用來捕捉規定粒徑以上之粒徑的硏磨顆粒之前述 過濾器（6 1 )同樣的過濾器（6 2 )。 經濟部智慧財產局員工消費合作社印製 作爲前述微粒檢測器（8 )，與前述微粒檢測器（7 )同樣地，係使用對有硏磨液通過的流槽（flow cell)，照 射一定波長的光，然後檢測出由於規定粒徑以上之粒徑的 硏磨顆粒所造成的透過光的減衰之光遮斷方式的檢測器。 而且，理想爲，微粒檢測器（8 )的流槽，將光的透過距 離設定在0 · 1〜1 0 0 m m的範圍內。而且，微粒檢測 器（8 )的流槽，係構成藉由旁通管路（5 7 1 )之流量 調整，硏磨液能夠以一定的流速通過。 微粒檢測器（8 )的構造，與第2圖所示之前述的微 粒檢測器（7 )的構造相同。而且，在此種微粒檢測器（ 本紙張尺度適用中國國家標準( CNS ) A4規格（210X 297公釐） -22 - 572810 經濟部智慧財產局員工消費合作社印製 A7 B7___五、發明説明（20) 8 )中，具備：當要檢測由於規定粒徑以上的粒徑之硏磨 顆粒所造成之透過光的減衰之時，修正由於硏磨液中之比 規定粒徑小的硏磨顆粒所造成之靈敏度降低的校正機能。 又，此種校正機能，與前述之微粒檢測器（7 )中的機能 同樣地，係設置在微粒檢測器（8 )的運算處理手段中。 對於上述般的硏磨液供給裝置（L 5 )，每當要將在 硏磨液循環裝置（L 4 )中流動的硏磨液供給至硏磨裝置 (9 )中之時，設置在旁通管路（5 7 1 )中的微粒檢測 器（8 )，對有硏磨液通過的流槽，照射一定波長的光， 藉由檢測出由於規定粒徑以上之粒徑，例如粒徑爲3 // m 以上之大粒徑的硏磨顆粒所造成的透過光的減衰，來測量 硏磨液中之大粒徑的硏磨顆粒的數量。 此時，與前述微粒檢測器（7 )的情況同樣地，將微 粒檢測器（8 )設置在可調整流量的旁通管路（5 7 1 ) 中的構造；以及藉由旁通管路（5 7 1 )的流量調整，硏 磨液能夠以一定的流速通過之流槽的構造，係在流槽中之 硏磨液的流量被限制，同時沒有受到在硏磨液循環用的管 路（5 7 )中所產生之機器的脈動等的影響，而且，由於 在流槽中流動之硏磨液中的比規定粒徑小之硏磨顆粒的絕 對數減少，所以當藉由運算處理手段來處理流槽的透過光 的情況，能夠將由於比規定粒徑小之適當的硏磨顆粒所造 成之透過光的減衰、以及由於規定粒徑以上之粒徑的硏磨 顆粒所造成之透過光的減衰，加以分離，結果，能夠正確 地測量規定粒徑以上之粒徑的硏磨顆粒的數量。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐) " -23 - (請先閱讀背面之注意事項再填寫本頁) 572810 A7 B7 五、發明説明（21) 又，具備在微粒檢測器（8 )中的校正機能，係當要 檢測出由於上述大粒徑的硏磨顆粒所造成之透過光的減衰 時，修正由於硏磨液中之比規定粒徑小的硏磨顆粒所造成 之靈敏度的降低，能夠更加提高對於由於大粒徑的硏磨顆 粒所造成之透過光的減衰之檢測靈敏度。因此，具備硏磨 液供給裝置（L 5 )之本發明的製造裝置，對於通過管路 (5 7 )而供給至硏磨裝置（9 )中的硏磨液，能夠以線 內（in-line)連續且高精度地管理規定粒徑以上之大粒徑的 硏磨顆粒的發生以及其數量。 經濟部智慧財產局員工消费合作社印製 如上所述，在管路（5 7 )中，藉由以線內管理硏磨 液，本發明的製造裝置，能夠將更高品質的硏磨液提供給 硏磨裝置（9 )。例如，在本發明的製造裝置中，與前述 形態同樣的，也可以具備：當由微粒檢測器（8 )檢測出 每單位流量中之規定粒徑以上的粒徑的硏磨顆粒的數量超 過規定界線時，便會發生警報的功能。警報功能係設置在 前述控制裝置（1 0)中。而且，本發明的製造裝置，也 可以作成隨著上述的發出警報，同時停止由硏磨液供給裝 置（L 5 )所進行之硏磨液的供給；結果，能夠防止含有 大粒徑的硏磨顆粒之硏磨液供給至硏磨裝置（9 )中，有 效地防止在晶圓表面上產生劃痕等在硏磨裝置（9 )中所 發生之加工不良的情況。 進而，雖然未加以圖示出來，本發明的製造裝置，也 可以作成：在硏磨液供給用的管路（5 7 )中，配置與過 濾器（6 2 )並聯的供給路用的第2過濾器；當由微粒檢 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） '~ -24- 572810 A7 B7 五、發明説明（22) ^ 測器（8 )檢測出每單位流量中之規定粒徑以上的粒徑的 硏磨顆粒的數量超過規定界線時，能夠將流路切換至第2 過濾器側。亦即，與在硏磨液循環裝置（L 4 )中的情況 相同，藉由在管路（5 7 )中，並聯地插入用來過濾規定 粒徑以上的硏磨顆粒之過濾器，當過濾器（6 2 )的功能 下降時，能夠將流路立即切換至功能未降低之第2過濾器 側，使運轉不會停止，能夠一直將高品質的硏磨液供給至 硏磨裝置（9 )中。 再者，在本發明中，所要管理之硏磨顆粒的粒徑，可 以根據硏磨條件而加以適當地設定。又，藉由設置上述的 微粒檢測器（7 )以及微粒檢測器（8 )，不僅是硏磨顆 粒，也可以管理在泵、閥等的機器或是管路中所產生之微 粒（異物）。 【發明之效果】 若根據本發明之硏磨液的製造裝置，由於光遮斷方式 之特定的微粒檢測器設置在硏磨液循環用的管路之旁通管 路中，能夠確實地測量規定粒徑以上之粒徑的硏磨顆粒， 所以對於在調製槽中所調製之在硏磨液循環裝置的管路中 / 循環的硏磨液，能夠在線內連續且高精度地管理規定粒徑 以上之粒徑的硏磨顆粒的發生以及其數量，一直將高品質 的硏磨液提供給硏磨裝置。進而，當具備有特定之校正機 能的微粒檢測器的情況，能夠更加提高規定粒徑以上之粒 徑的硏磨顆粒的檢測靈敏度。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） (請先閱讀背面之注意事項再填寫本頁) b 、-! 經濟部智慧財產局員工消費合作社印製 -25- 572810 A7 _B7 五、發明説明（23) (請先閲讀背面之注意事項再填寫本頁) 又，若根據具備特定之硏磨液供給裝置的本發明的製 造裝置，由於光遮斷方式之特定的微粒檢測器設置在硏磨 液供給用的管路之旁通管路中，能夠確實地測量規定粒徑 以上之粒徑的硏磨顆粒，所以對於通過硏磨液供給用的管 路而要供給至硏磨裝置中的硏磨液，能夠在線內連續且高 精度地管理規定粒徑以上之粒徑的硏磨顆粒的發生以及其 數量，而能夠將更高品質的硏磨液提供給硏磨裝置。結果 ，能夠有效地防止在晶圓表面上發生劃痕等的在硏磨裝置 中所發生之加工不良的情況。進而，當在微粒檢測器中具 備有特定的校正機能時，能夠更加提高規定粒徑以上之粒 徑的硏磨顆粒的檢測靈敏度。 【圖面之簡單說明】 第1圖係表示關於本發明之硏磨液的製造裝置之槪要 的系統圖。 第2圖係表示關於被應用在本發明之硏磨液的製造裝 置中之微粒檢測器的原理的部分剖面之側視圖以及俯視圖 經濟部智慧財產局員工消費合作社印製 出 輸 的 來 送 傳 件 。 元圖 測的 感例 的之 器號 測訊 檢波 粒脈 微的 從用 示制 表控 係之 圖後 3 換 第變 及 以 槽 槽液 1製磨 明調硏 說：： 號 2 3 符 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -26- 572810 A7 B7五、發明説明（24) 5 6 :管路 5 6 1 :旁通管路 5 7 :管路 5 7 1 :旁通管路 61:過濾器 6 2 :過濾器 7 :微粒檢測器 7 4 :流槽 8 :微粒檢測器 9 :硏磨裝置 L 1 :原液供給裝置 L 2 :純水供給裝置 L 3 :添加劑供給裝置 L 4 :硏磨液循環裝置 L 5 :硏磨液供給裝置 (請先閲讀背面之注意事項再填寫本頁) •裝· 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -27--17- 572810 A7 _____B7 V. Description of the invention (15) (Please read the precautions on the back before filling out this page) The circulation of the honing fluid in the modulation tank (2), while using the attachment in the pipeline (5 4) The concentration measuring device measures the concentration of the mud-like honing agent, and at the same time, according to the measurement result, by adjusting the supply amount of the mud-like honing agent stock solution or pure water, The abrasive concentration is adjusted to, for example, 15% by weight. The honing liquid prepared in the preparation tank (2) is supplied to the honing liquid tank (3) through a pipeline (53). Next, the aforementioned additives are supplied from the additive supply device (L 3) through the pipeline (5 5) 'to the honing liquid supplied into the honing liquid tank (3) as needed. Then, by using the above-mentioned stirring mechanism provided in the honing liquid tank (3), the additives are mixed and stirred to prepare a honing liquid containing a predetermined concentration of honing particles and a predetermined additive concentration. In addition, the concentration of the additive is to supply a part of the honing liquid flowing in the pipe (56) of the honing liquid circulation device (L4) to the concentration measuring device. According to the measurement result, The adjustment is performed by controlling the supply amount of the additive from the additive supply device (L 3) or the supply amount of the honing liquid supplied from the pipeline (5 3). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The honing fluid prepared in the honing fluid tank (3) at the end is circulated according to the honing fluid circulation device (L4). That is, using the pump (4 2) and the pipeline (5 6) of the honing liquid circulation device (L4), the honing liquid taken out from the honing liquid tank (3) is returned to the honing liquid again. In the tank (3), a uniform suspension state of the honing particles in the honing liquid is maintained. At this time, the filter (6 1) installed in the pipeline (5 6) captures the honing liquid in the circulation and aggregates to become honing particles having a large particle size of a predetermined particle size or more. By this means, the paper size can be applied to the Chinese National Standard (CNS) A4 specification (210X297 mm) '-18-572810 A7 B7 V. Description of the invention (16) It is enough to make sure that there are no honing particles with large particle size. The honing fluid is circulated in the pipeline (56). (Please read the precautions on the reverse side before filling out this page) However, the above-mentioned large-sized honing particles in the honing liquid will follow the honing liquid tank (3) and the honing liquid circulation device (L4). The dwell time of the filter becomes longer and longer, and the performance of the filter (6 1) is reduced. On the other hand, in the manufacturing apparatus of the present invention, a part of the honing liquid in the pipeline (5 6) is supplied to the bypass pipeline (5 6 1). 5 6 1) The particle detector (7) for monitoring the honing fluid monitors the honing fluid. That is, the particle detector (7) provided in the bypass line (561) irradiates light of a certain wavelength to the flow groove (74) through which the honing liquid passes, and detects a particle due to a predetermined particle. Honed particles with a particle size above the diameter, such as the attenuation of transmitted light caused by honing particles with a particle size of 3 // m or more, to measure the large-sized honing particles in the honing liquid quantity. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. At this time, the particle detector (7) is set in the bypass line (561) whose flow can be adjusted. By adjusting the flow of the bypass line (561), 硏The structure of the flow tank (7 4) through which the polishing liquid can pass at a certain flow rate. The flow rate of the honing liquid in the flow tank (7 4) is limited, and at the same time, it is not subject to the pipeline (5 6) The influence of pulsation of pumps and other equipment generated in 6), and since the absolute number of honing particles in the honing fluid flowing in the flow groove (7 4) smaller than the predetermined particle size is reduced, The arithmetic processing means is used to process the case where the light receiving element (7 5) is used to receive the transmitted light of the flow channel (7 4), and it is possible to reduce the size of the appropriate honing particles (for example, the particle size is 3 //) The size of the paper produced by m small honing particles is in accordance with the Chinese National Standard (CNS) A4 specification (210X297 public broadcasting " -19- 572810 A 7 B7. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 17) The attenuation of the transmitted light, and Diameter of honing particles (for example, honing particles of 3 // m or more) is used to reduce the attenuation of transmitted light and separate them. As a result, it is possible to accurately measure the number of honing particles having a particle size of a predetermined size or more. Equipped with a correction function in the particle detector (7), when the attenuation of transmitted light caused by the above-mentioned large-sized honing particles is to be detected, the correction is made because the honing liquid is smaller than the predetermined particle size. The decrease in sensitivity caused by abrasive particles can further increase the detection sensitivity for attenuation of transmitted light caused by large-sized honing particles. Therefore, the manufacturing device of the present invention is suitable for the honing liquid circulation device (L 4 The honing fluid circulating in the pipeline (5 6) can continuously and accurately manage the generation and quantity of honing particles with a large particle size above a predetermined particle size in-line. The manufacturing apparatus of the invention can continuously supply a high-quality honing solution to the honing apparatus (9) by managing the obtained honing solution in-line as described above. For example, in the manufacturing apparatus of the present invention in, It can be equipped with a function that an alarm occurs when the number of honing particles with a particle size larger than a predetermined particle size per unit flow rate is detected by the particle detector (7). The management function and the alarm issuing function are usually provided in the above-mentioned control device (10). With the above-mentioned alarm, the supply of the honing liquid to the honing device (9) may be stopped. Furthermore, By managing the honing fluid in-line, when the performance of the filter (6 1) is reduced, the filter medium of the filter can be immediately exchanged, and the honing fluid in the honing device (9) can be continuously supplied, ( Please read the notes on the back before filling in this page) This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X 297 mm) -20- 572810 A7 B7 V. Description of the invention (18) Maintain high quality. Also, although not shown, the manufacturing apparatus of the present invention can also be configured as: a second filter for circulation is arranged in parallel with the filter (6 1) in the circulation pipeline (56); when When the particle detector (7) detects that the number of honing particles having a particle diameter larger than a predetermined particle diameter per unit flow rate exceeds a predetermined boundary, the flow path can be switched to the second filter side. That is, 'by inserting in parallel in the pipeline (5 6) a filter for filtering honing particles of a predetermined size or more, when the function of the filter (6 1) is reduced, the flow path can be switched immediately. To the second filter side where the function is not reduced, the operation is not stopped, and a high-quality honing liquid can be continuously supplied to the honing device (9). However, in the above-mentioned honing liquid circulation device (L4), a plurality of lines for supplying the honing liquid to the honing device are usually provided. The switching valve in the pipeline is controlled by the operation of the device, and the honing liquid can be supplied to the honing device. Therefore, due to the stop time of the honing device, the honing particles in the honing liquid in the honing liquid supply line are aggregated. As a result, the honing liquid supplied from the honing liquid circulation device (L 4) is aggregated. The polishing liquid does not contain honing particles with a large particle size, and honing particles containing aggregates are also supplied to the honing device, so that there may be scratches on the wafer surface. Therefore, the manufacturing apparatus of the present invention may be provided with the following specific honing liquid supply device (L 5) in order to supply a higher-quality honing liquid to the honing device. That is, as shown in FIG. 1, in the rear section of the honing liquid circulating device (L 4), the constitution can be adapted to the Chinese paper standard (CNS) A4 standard in the honing liquid circulating device (L 4). (210X297 mm) (Please read the precautions on the back before filling out this page)-Binding and printing Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-21-572810 A7 B7 V. Description of the invention (19) (Please read the back first (Please fill in this page again for the matters needing attention.) It also manages the generation of honing particles with large particle size in the honing liquid, and it is equipped to supply the honing liquid circulated by the honing liquid circulation device (L 4) to the honing. The honing liquid supply device (L 5) in the device (9). Specifically, the honing liquid supply device (L 5) is usually used to supply the honing liquid to each honing device (9). Each supply line is provided with a pipe (57) for honing liquid supply and a bypass line (571). The bypass line (571) is based on a flow rate. Adjustment valve (not shown) or orifice (〇riflce), etc., can be configured to adjust the flow rate; A particle detector (8) for monitoring the honing liquid for detecting honing particles having a particle size of a predetermined particle size or more and calculating the number is provided in the through-line (5 7 1). In the liquid supply pipe (5 7), the same filter as the aforementioned filter (6 1) is arranged on the upstream side of the particle detector (8) to capture honing particles having a particle diameter larger than a predetermined particle diameter. The detector (6 2) is printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as the aforementioned particle detector (8), similarly to the aforementioned particle detector (7), using a flow cell through which honing fluid passes. ), Which is a light-blocking type detector that detects the attenuation of transmitted light due to honing particles having a particle size of a predetermined particle size or more by irradiating light of a certain wavelength. Also, a particle detector (8) is desirable The flow channel of the light set the light transmission distance in the range of 0 · 1 ~ 100 mm. Moreover, the flow channel of the particle detector (8) constitutes the flow rate by the bypass line (5 7 1). Adjust so that the honing fluid can pass at a certain flow rate. The structure is the same as that of the aforementioned particle detector (7) shown in Figure 2. In addition, the particle detector (this paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) -22- 572810 Printed by A7 B7___ of the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (20) 8): It is necessary to detect the attenuation of transmitted light caused by honing particles with a particle size above the specified particle size. At this time, the correction function of reducing the sensitivity caused by the honing particles having a smaller particle size than the predetermined size in the honing liquid is corrected. This correction function is provided in the arithmetic processing means of the particle detector (8) in the same manner as the function of the particle detector (7). The honing liquid supply device (L 5) as described above is provided in the bypass whenever the honing liquid flowing in the honing liquid circulation device (L 4) is supplied to the honing device (9). The particle detector (8) in the pipeline (5 7 1) irradiates a flow cell with a honing fluid through a certain wavelength of light, and detects a particle diameter due to a particle diameter greater than a predetermined particle diameter, for example, the particle diameter is 3 // Decay of transmitted light caused by honing particles with a large particle size above m to measure the number of honing particles with a large particle size in the honing liquid. At this time, as in the case of the aforementioned particle detector (7), the structure in which the particle detector (8) is provided in the bypass line (5 7 1) whose flow rate can be adjusted, and the bypass line ( 5 7 1) Flow rate adjustment. The structure of the flow tank through which the honing fluid can pass at a certain flow rate. The flow of the honing fluid in the flow tank is restricted, and at the same time, it is not subject to the pipeline for honing fluid circulation ( The influence of the pulsation of the machine generated in 5 7), etc., and the absolute number of the honing particles in the honing liquid flowing in the flow tank smaller than the predetermined particle size are reduced, so it should be calculated by processing methods. When processing the transmitted light of the flow cell, the attenuation of transmitted light caused by appropriate honing particles smaller than a predetermined particle diameter and the transmitted light caused by honing particles having a particle diameter of a predetermined diameter or more can be reduced. Attenuation is reduced and separated, and as a result, the number of honing particles having a particle diameter of a predetermined particle diameter or more can be accurately measured. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) " -23-(Please read the precautions on the back before filling out this page) 572810 A7 B7 5. Description of the invention (21) The correction function in the detector (8) is to correct the honing particles due to the honing particles in the honing liquid having a smaller particle size than the prescribed particle size when the attenuation of the transmitted light caused by the honing particles having a large particle size is detected. The decrease in sensitivity can further improve the detection sensitivity for attenuation of transmitted light caused by large-sized honing particles. Therefore, the manufacturing apparatus of the present invention including the honing liquid supply device (L 5) can in-line the honing liquid supplied to the honing device (9) through the pipeline (5 7). ) The occurrence and number of honing particles having a large particle diameter that is larger than a predetermined particle diameter are continuously and accurately managed. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, as described above, in the pipeline (5 7), the honing fluid is managed in-line. The manufacturing device of the present invention can provide a higher-quality honing fluid to Honing device (9). For example, in the manufacturing apparatus of the present invention, as in the foregoing embodiment, it may be provided that when the number of honing particles having a particle diameter larger than a predetermined particle diameter per unit flow rate is detected by the particle detector (8), the number of honing particles exceeds a predetermined number. When the boundary is reached, an alarm function will occur. The alarm function is provided in the aforementioned control device (10). In addition, the manufacturing apparatus of the present invention can be configured to stop the supply of the honing liquid by the honing liquid supply device (L 5) in accordance with the above-mentioned alarm; as a result, honing including a large particle size can be prevented The honing liquid of the particles is supplied to the honing device (9), which effectively prevents the occurrence of processing defects in the honing device (9), such as the occurrence of scratches on the wafer surface. Furthermore, although not shown, the manufacturing apparatus of the present invention may be configured such that a second supply path for the supply path in parallel with the filter (6 2) is arranged in the pipe (5 7) for honing liquid supply. Filter; when the paper size is checked by particles, the Chinese national standard (CNS) A4 specification (210X297 mm) is used ~~ -24- 572810 A7 B7 V. Description of the invention (22) ^ The detector (8) detects the flow rate per unit When the number of honing particles having a particle diameter of a predetermined diameter or more exceeds a predetermined boundary, the flow path can be switched to the second filter side. That is, as in the case of the honing-liquid circulating device (L 4), a filter for filtering honing particles having a particle size of a predetermined size or more is inserted in parallel in the pipeline (5 7). When the function of the filter (6 2) is reduced, the flow path can be immediately switched to the second filter side without reducing the function, so that the operation does not stop, and the high-quality honing fluid can be continuously supplied to the honing device (9). in. In addition, in the present invention, the particle size of the honing particles to be managed can be appropriately set according to the honing conditions. Furthermore, by providing the above-mentioned particle detector (7) and particle detector (8), it is possible to manage not only honing particles, but also particles (foreign matter) generated in equipment such as pumps, valves, and pipelines. [Effects of the Invention] According to the honing fluid manufacturing apparatus of the present invention, since a specific particle detector of the light interruption method is provided in the bypass line of the honing fluid circulation pipe, it is possible to reliably measure and specify Honing particles with a particle size of more than the particle size, so that the honing liquid prepared / circulated in the pipeline of the honing liquid circulation device in the preparation tank can continuously and accurately manage the particle size above the predetermined size on the line. The generation and number of honing particles with a large particle size have always provided high-quality honing liquids to the honing device. Furthermore, when a particle detector having a specific correction function is provided, it is possible to further increase the detection sensitivity of honing particles having a particle diameter of a predetermined particle diameter or more. This paper size applies to China National Standard (CNS) A4 specification (210X 297 mm) (Please read the precautions on the back before filling out this page) b,-! Printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economics -25- 572810 A7 _B7 V. Description of the invention (23) (Please read the precautions on the reverse side before filling out this page) Also, if the manufacturing device of the present invention is equipped with a specific honing liquid supply device, due to the specific particle detection of the light blocking method The device is installed in the bypass line of the honing liquid supply pipe, and can accurately measure the honing particles with a particle diameter larger than a predetermined particle diameter. The honing liquid in the grinding device can continuously and accurately manage the generation and number of honing particles having a particle size of a predetermined particle size or more in a line, and can provide a higher-quality honing liquid to the honing device. As a result, it is possible to effectively prevent processing defects such as scratches from occurring on the wafer surface, which occur in the honing apparatus. Furthermore, when the particle detector has a specific correction function, it is possible to further increase the detection sensitivity of honing particles having a particle diameter of a predetermined particle diameter or more. [Brief Description of Drawings] Fig. 1 is a system diagram showing the main points of the manufacturing apparatus for the honing liquid of the present invention. FIG. 2 is a side view and a plan view showing a partial cross-section of the principle of a particle detector used in the manufacturing apparatus of a honing fluid of the present invention, and a plan view of a printout from an employee consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs . The elementary measurement of the sense of the device, the signal detection, the detection of the pulse and the pulse of the micro-slave control system, after the 3rd change of the chart and the use of the tank fluid 1 made by the tone adjustment: No. 2 3 Rune Paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm) -26- 572810 A7 B7 V. Description of invention (24) 5 6: Pipe 5 6 1: Bypass pipe 5 7: Pipe 5 7 1: bypass line 61: filter 6 2: filter 7: particle detector 7 4: flow cell 8: particle detector 9: honing device L 1: raw liquid supply device L 2: pure water supply device L 3 : Additive supply device L 4: Honing liquid circulation device L 5: Honing liquid supply device (Please read the precautions on the back before filling out this page) Applicable to China National Standard (CNS) A4 specification (210X297 mm) -27-