KR20210108904A - Substrate processing apparatus - Google Patents

Abstract

A purpose is to provide a substrate treatment apparatus capable of properly exhausting gas from a treatment housing. To achieve the purpose, a substrate treatment apparatus (1) includes a treatment housing (23A1), a holding part (31) and a liquid supply part (33). The holding part (31) is housed in the treatment housing (23A1). The holding part (31) holds a substrate (W). The liquid supply part (33) is housed in the treatment housing (23A1). The liquid supply part (33) supplies a treatment solution to the substrate (W) held by the holding part (31). The substrate treatment apparatus (1) includes exhaust pipes (41A, 42A). Each of the exhaust pipes (41A, 42A) is placed on a side of the treatment housing (23A1). Each of the exhaust pipes (41A, 42A) discharges gas. The substrate treatment apparatus (1) includes a switching tool (51A1). The switching tool (51A1) is placed on a position at the same height as the treatment housing (23A1). The switching tool (51A1) switches an exhaust path of the treatment housing (23A1) to one of the exhaust pipes (41A, 42A).

Description

Substrate processing apparatus {SUBSTRATE PROCESSING APPARATUS}

The present invention relates to a substrate processing apparatus for processing a substrate. Substrates include, for example, semiconductor wafers, substrates for liquid crystal displays, substrates for organic EL (Electroluminescence), substrates for flat panel displays (FPD), substrates for optical displays, substrates for magnetic disks, substrates for optical disks, and substrates for magneto-optical disks. It is a board|substrate, the board|substrate for photomasks, and the board|substrate for solar cells.

Japanese Patent Laid-Open No. 2019-16818 discloses a substrate processing system. In the following, reference numerals described in Japanese Patent Application Laid-Open No. 2019-16818 are indicated in parentheses. The substrate processing system 1 includes a processing unit 16 that processes a wafer W . The processing unit 16 includes a chamber 20 , a substrate holding mechanism 30 , and a processing fluid supply unit 40 . The chamber 20 is a processing housing. The substrate holding mechanism 30 and the processing fluid supply unit 40 are installed inside the chamber 20 . The substrate holding mechanism 30 holds the wafer W. The processing fluid supply unit 40 supplies the processing fluid to the wafer W held by the substrate holding mechanism 30 . The treatment fluid is, for example, an alkaline treatment liquid, an acidic treatment liquid, and an organic treatment liquid.

The substrate processing system 1 includes a second exhaust pipe 200 , an exhaust switching unit 300 , and three separate exhaust pipes 101 , 102 , 103 . The second exhaust pipe 200 connects the chamber 20 and the exhaust switching unit 300 . The second exhaust pipe 200 includes a horizontal portion 201 and a rising portion 202 . The horizontal part 201 is connected to the chamber 20 . The horizontal portion 201 extends horizontally from the chamber 20 . The rising portion 202 extends upward from the horizontal portion 201 . The rising part 202 has an upper end. The upper end of the rising part 202 is connected to the exhaust switching unit 300 . The exhaust switching unit 300 also connects with three individual exhaust pipes 101 , 102 , 103 . The exhaust switching unit 300 connects the second exhaust pipe 200 to one of the three individual exhaust pipes 101 , 102 , 103 . The gas of the chamber 20 flows through the second exhaust pipe 200 into one of the three individual exhaust pipes 101 , 102 , 103 .

For example, when the treatment fluid supply unit 40 supplies the alkaline treatment liquid, the exhaust switching unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 101 . When the treatment fluid supply unit 40 supplies the acid treatment liquid, the exhaust conversion unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 102 . When the processing fluid supply unit 40 supplies the organic processing liquid, the exhaust switching unit 300 connects the second exhaust pipe 200 to the individual exhaust pipe 103 . As a result of these, when the alkaline treatment liquid is used in the chamber 20 , the individual exhaust pipe 101 exhausts the gas in the chamber 20 . When the acid treatment liquid is used in the chamber 20 , a separate exhaust pipe 102 exhausts the gas from the chamber 20 . When the organic treatment liquid is used in the chamber 20 , a separate exhaust pipe 103 exhausts the gas of the chamber 20 .

The exhaust switching unit 300 is disposed at a higher position than the processing unit 16 . The raised portion 202 of the second exhaust pipe 200 extends to a position higher than the processing unit 16 . For this reason, it is difficult for the mist contained in base|substrate to raise the rising part 202. As shown in FIG. The mist hardly rises to the exhaust switching unit 300 . Therefore, the exhaust switching unit 300 can be protected from mist.

As described above, the exhaust switching unit 300 is disposed at a higher position than the processing unit 16 . For this reason, the individual exhaust pipes 101 , 102 , 103 are also disposed at a higher position than the processing unit 16 .

However, the coating and developing apparatus 1 disclosed in Japanese Patent Laid-Open No. 2019-16818 has the following problems. The chamber 20 and the exhaust switching unit 300 are connected by a second exhaust pipe 200 . Since the exhaust switching unit 300 is disposed at a higher position than the processing unit 16 , the second exhaust pipe 200 has a rising portion 202 . For this reason, the second exhaust pipe 200 is relatively long.

The gas in the chamber 20 always flows through the second exhaust pipe 200 . For example, even when any of the alkaline treatment liquid, the acid treatment liquid and the organic treatment liquid is used in the chamber 20 , the second exhaust pipe 200 exhausts the gas of the chamber 20 .

As described above, since the second exhaust pipe 200 is relatively long and discharges various gases, the second exhaust pipe 200 is liable to be contaminated. For example, crystals (salts) are likely to occur inside the second exhaust pipe 200 . For example, crystals are likely to be deposited inside the second exhaust pipe 200 .

When the second exhaust pipe 200 is contaminated, the gas does not flow smoothly through the second exhaust pipe 200 . That is, the second exhaust pipe 200 may not smoothly discharge the gas of the chamber 20 . For this reason, it is necessary to perform maintenance of the 2nd exhaust pipe 200 regularly. The maintenance of the second exhaust pipe 200 is, for example, cleaning the second exhaust pipe 200 or replacing the second exhaust pipe 200 .

When performing the maintenance of the second exhaust pipe 200 , the processing unit 16 cannot process the wafer W. When performing maintenance of the second exhaust pipe 200 , the substrate processing system 1 stops processing the wafer W . For this reason, the throughput of the substrate processing system 1 falls.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing apparatus capable of appropriately evacuating gas from a processing housing.

The present invention, in order to achieve the above object, takes the following configuration. That is, the present invention provides a substrate processing apparatus, comprising: a first processing housing; a first holding part installed inside the first processing housing and holding a substrate; a first liquid supply unit for supplying a processing liquid to the substrate held in the first holding unit; a first exhaust pipe provided on a side of the first processing housing and discharging gas; and a side of the first processing housing; , a second exhaust pipe for discharging gas, and a first switching mechanism disposed at the same height as the first processing housing and switching an exhaust path of the first processing housing to one of the first exhaust pipe and the second exhaust pipe; It is a substrate processing apparatus equipped with.

The substrate processing apparatus includes a first processing housing, a first holding unit, and a first liquid supply unit. The substrate processing apparatus supplies a processing liquid to the substrate inside the first processing housing. That is, the substrate processing apparatus performs a liquid process on the substrate inside the first processing housing.

The substrate processing apparatus includes a first exhaust pipe, a second exhaust pipe, and a first switching mechanism. The first switching mechanism switches the exhaust path of the first processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the first switching mechanism includes a state in which the first processing housing communicates with the first exhaust pipe, the first processing housing is cut off from the second exhaust pipe, and the first processing housing communicates with the second exhaust pipe; Further, the first processing housing is switched to a state in which it is isolated from the first exhaust pipe. When the exhaust path of the first processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the first processing housing, and the second exhaust pipe does not exhaust gas from the first processing housing. When the exhaust path of the first processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the first processing housing, and the second exhaust pipe does not exhaust gas from the first processing housing.

The first switching mechanism is disposed at the same height as the first processing housing. For this reason, the flow path between the 1st processing housing and the 1st switching mechanism can be shortened suitably. Therefore, it is possible to suitably suppress fouling of the flow path between the first processing housing and the first switching mechanism. Accordingly, the gas flows smoothly from the first processing housing to the first switching mechanism. As a result, the gas of the first processing housing can be properly exhausted.

The first exhaust pipe is disposed on the side of the first processing housing. For this reason, the 1st switching mechanism can be easily connected with the 1st exhaust pipe. The second exhaust pipe is disposed on the side of the first processing housing. For this reason, the 1st switching mechanism can be easily connected to the 2nd exhaust pipe.

As described above, the present substrate processing apparatus can appropriately exhaust the gas of the first processing housing.

The above-mentioned substrate processing apparatus WHEREIN: It is preferable that the said 1st switching mechanism is arrange|positioned at the position equal to or lower than the upper end of the said 1st holding part. The size of the first switching mechanism is relatively small. Therefore, the enlargement of a substrate processing apparatus can be suppressed suitably.

The above-mentioned substrate processing apparatus WHEREIN: It is preferable that the said 1st switching mechanism is arrange|positioned at the position which does not overlap with the said 1st holding part in planar view. Interference between the first switching mechanism and the first holding portion can be easily avoided.

In the above-described substrate processing apparatus, it is preferable that the first exhaust pipe extends in the vertical direction, and the second exhaust pipe extends in the vertical direction. The installation space of the 1st exhaust pipe and the 2nd exhaust pipe in planar view can be made small suitably.

In the above-described substrate processing apparatus, the substrate processing apparatus extends in a horizontal first direction and is provided in a conveyance space adjacent to the first processing housing and the conveyance space, and conveys a substrate to the first holding unit and a conveying mechanism adjacent to the first processing housing, and a first piping space accommodating the first exhaust pipe and the second exhaust pipe, wherein the first processing housing and the first piping space include the first direction, and the first exhaust pipe and the second exhaust pipe are preferably aligned in a second direction perpendicular to the first direction and horizontal. A substrate processing apparatus is provided with a conveyance space and a conveyance mechanism. The carrying space is adjacent to the first processing housing. For this reason, the conveyance mechanism can convey a board|substrate easily to a 1st holding part. A substrate processing apparatus is provided with a 1st piping space. Therefore, the first exhaust pipe and the second exhaust pipe can be suitably installed. The first piping space is adjacent to the first processing housing. For this reason, the first exhaust pipe and the second exhaust pipe can be provided in the vicinity of the first processing housing. The conveyance space extends in the first direction. The first processing housing and the first piping space are arranged in a first direction. For this reason, the conveyance space adjacent to the 1st processing housing and the 1st piping space adjacent to the 1st processing housing can each be arrange|positioned suitably, respectively. Accordingly, it is possible to suitably prevent the conveying mechanism from interfering with the first exhaust pipe and the second exhaust pipe. The first piping space and the first processing housing are arranged in a first direction. The first exhaust pipe and the second exhaust pipe are arranged in a second direction. For this reason, the first exhaust pipe and the second exhaust pipe can be provided in the vicinity of the first processing housing, respectively.

In the above-mentioned substrate processing apparatus, it is preferable that at least a part of the said 1st switching mechanism is provided in the said 1st piping space. A first switching mechanism may be provided in the vicinity of the first processing housing.

In the above-described substrate processing apparatus, the first switching mechanism includes a first movable first switch mechanism to a position for communicating the first processing housing with the first exhaust pipe and a position for blocking the first processing housing from the first exhaust pipe. an opening/closing unit and a second opening/closing unit movable independently of the first opening/closing unit to a position for communicating the first processing housing with the second exhaust pipe and a position for blocking the first processing housing from the second exhaust pipe; It is preferable to do The first opening/closing unit and the second opening/closing unit are movable independently of each other. For this reason, the first switching mechanism can individually communicate the first exhaust pipe and the second exhaust pipe to the first processing housing. The switching mechanism may separate the first exhaust pipe and the second exhaust pipe from the first processing housing.

In the substrate processing apparatus described above, the first switching mechanism preferably includes a switching housing connected to the first processing housing and accommodating the first opening/closing part and the second opening/closing part. The switching housing can suitably form a flow path from the first processing housing to the first opening/closing unit and the second opening/closing unit.

In the substrate processing apparatus described above, the switching housing includes an introduction part connected to the first processing housing and extending in the first direction, connected to the introduction part and extending in the second direction, and the first exhaust pipe and a distribution part connected to both of the second exhaust pipe and accommodating both of the first opening/closing part and the second opening/closing part. The inlet is connected to the first processing housing. For this reason, the gas can be easily introduced into the conversion housing from the first processing housing. The introduction portion extends in a first direction. As described above, the conveyance space extends in the first direction. For this reason, the conveyance space adjacent to the 1st processing housing and the introduction part connected to the 1st processing housing can each be arrange|positioned suitably, respectively. Accordingly, it is possible to suitably prevent the conveying mechanism from interfering with the introduction portion. The distribution unit is connected to the introduction unit. The distribution unit is connected to the first exhaust pipe and the second exhaust pipe. For this reason, gas can be easily sent out from the switching housing to a 1st exhaust pipe and a 2nd exhaust pipe. The distribution unit accommodates both the first opening and closing unit and the second opening and closing unit. Accordingly, the first switching mechanism can easily switch the exhaust path of the first processing housing between the first exhaust pipe and the second exhaust pipe. The distribution portion extends in the second direction. As described above, the first exhaust pipe and the second exhaust pipe are aligned in the second direction. Accordingly, the distribution unit can be easily connected to the first exhaust pipe and the second exhaust pipe.

The above-mentioned substrate processing apparatus WHEREIN: In planar view, it is preferable that the separation distance of the said introduction part and the said conveyance space is smaller than the separation distance of the said 1st holding part and the said conveyance space. The introduction part is arrange|positioned in the position relatively close|similar to a conveyance space. Accordingly, it is possible to smoothly introduce gas from the first processing housing to the conversion housing.

In the above-described substrate processing apparatus, the substrate processing apparatus includes an air supply pipe for supplying a gas to the first processing housing, and a second piping space adjacent to the first processing housing and accommodating the air supply pipe; It is preferable that the said 1st piping space, the said 1st process housing, and the said 2nd piping space are arranged in this order in the said 1st direction. The substrate processing apparatus includes an air supply pipe and a second piping space. The second piping space is adjacent to the first processing housing. Accordingly, the air supply pipe can easily supply the gas to the first processing housing. The first piping space, the first processing housing, and the second piping space are arranged in this order in the first direction. For this reason, the 1st piping space and the 2nd piping space are spaced apart by the 1st process housing. Therefore, the arrangement of the first exhaust pipe and the second exhaust pipe is not limited by the air supply pipe. That is, the degree of freedom in the arrangement of the first exhaust pipe and the second exhaust pipe can be appropriately increased.

In the above-described substrate processing apparatus, the substrate processing apparatus includes: the second processing housing disposed below the first processing housing; and a second holding unit installed inside the second processing housing and holding a substrate; , a second liquid supply unit installed inside the second processing housing and supplying a processing liquid to a substrate held by the second holding unit, and disposed at the same height as the second processing housing, It is preferable to include a second switching mechanism for switching the exhaust path of the housing to one of the first exhaust pipe and the second exhaust pipe.

The substrate processing apparatus includes a second processing housing, a second holding unit, and a second liquid supply unit. For this reason, liquid processing can be performed on the substrate inside the second processing housing. Therefore, the throughput of a substrate processing apparatus can be improved suitably.

The second processing housing is disposed below the first processing housing. Therefore, increase in the footprint of a substrate processing apparatus can be suppressed suitably.

The substrate processing apparatus includes a second switching mechanism. The second switching mechanism switches the exhaust path of the second processing housing to one of the first exhaust pipe and the second exhaust pipe. Specifically, the second switching mechanism includes a state in which the second processing housing communicates with the first exhaust pipe and the second processing housing is cut off from the second exhaust pipe, and the second processing housing communicates with the second exhaust pipe; Further, the second processing housing is switched to a state in which it is isolated from the first exhaust pipe. When the exhaust path of the second processing housing is the first exhaust pipe, the first exhaust pipe exhausts gas from the second processing housing, and the second exhaust pipe does not exhaust gas from the second processing housing. When the exhaust path of the second processing housing is the second exhaust pipe, the second exhaust pipe exhausts gas from the second processing housing, and the first exhaust pipe does not exhaust gas from the second processing housing. Accordingly, the first exhaust pipe discharges the gas from the second processing housing in addition to the gas from the first processing housing. The second exhaust pipe also exhausts the gas from the second processing housing in addition to the gas from the first processing housing. Therefore, the structure of the substrate processing apparatus can be simplified.

The second switching mechanism is disposed at the same height as the second processing housing. For this reason, the flow path between the second processing housing and the second switching mechanism can be suitably shortened. Accordingly, it is possible to suitably suppress fouling of the flow path between the second processing housing and the second switching mechanism. Accordingly, the gas flows smoothly from the second processing housing to the second switching mechanism. As a result, the gas in the second processing housing can be properly exhausted.

As described above, the present substrate processing apparatus can appropriately exhaust the gas of the second processing housing in addition to the gas of the first processing housing.

In the substrate processing apparatus described above, the second processing housing is disposed at the same position as the first processing housing in plan view, and the second switching mechanism includes the first switching mechanism and the first switching mechanism in a plan view. It is preferable that the first exhaust pipe extends in the vertical direction, and the second exhaust pipe extends in the vertical direction. The second processing housing is disposed at the same position as the first processing housing in a plan view. The 2nd switching mechanism is arrange|positioned at the same position as the 1st switching mechanism in planar view. For this reason, the relative positions of the second processing housing and the second switching mechanism are approximately equal to the relative positions of the first processing housing and the first switching mechanism. Therefore, the conditions for discharging gas between the first processing housing and the second processing housing can be easily made equal. As a result, the quality of the processing performed on the substrate between the first processing housing and the second processing housing can be suitably equalized. The first exhaust pipe extends in the vertical direction. Accordingly, the first switching mechanism and the second switching mechanism can be easily connected to the first exhaust pipe, respectively. The second exhaust pipe extends in the vertical direction. Accordingly, the first switching mechanism and the second switching mechanism can each be easily connected to the second exhaust pipe.

In the above-described substrate processing apparatus, the substrate processing apparatus includes a third processing housing disposed at the same height as the first processing housing, and a third holding part provided inside the third processing housing and holding a substrate. a third liquid supply part installed inside the third processing housing and supplying a processing liquid to the substrate held by the third holding part; a third exhaust pipe, a fourth exhaust pipe provided on a side of the third processing housing for discharging gas, and disposed at the same height as the third processing housing, the exhaust path of the third processing housing is connected to the third exhaust pipe and a third switching mechanism for switching to one of the fourth exhaust pipes.

The substrate processing apparatus includes a third processing housing, a third holding unit, and a third liquid supply unit. For this reason, liquid processing can be performed on the substrate inside the third processing housing. Therefore, the throughput of a substrate processing apparatus can be improved suitably.

The third processing housing is disposed at the same height as the first processing housing. The substrate processing apparatus includes a third switching mechanism, a third exhaust pipe, and a fourth exhaust pipe. The third switching mechanism switches the exhaust path of the third processing housing to one of the third exhaust pipe and the fourth exhaust pipe. Specifically, the third switching mechanism includes a state in which the third processing housing communicates with the third exhaust pipe, the third processing housing is cut off from the fourth exhaust pipe, and the third processing housing communicates with the fourth exhaust pipe; Further, the third processing housing is switched to a state in which it is isolated from the third exhaust pipe. When the exhaust path of the third processing housing is the third exhaust pipe, the third exhaust pipe exhausts gas from the third processing housing, and the fourth exhaust pipe does not exhaust gas from the third processing housing. When the exhaust path of the third processing housing is the fourth exhaust pipe, the fourth exhaust pipe exhausts gas from the third processing housing, and the third exhaust pipe does not exhaust gas from the third processing housing.

The third switching mechanism is disposed at the same height as the third processing housing. For this reason, the flow path between the 3rd processing housing and the 3rd switching mechanism can be shortened suitably. Accordingly, it is possible to suitably suppress fouling of the flow path between the third processing housing and the third switching mechanism. Accordingly, the gas flows smoothly from the third processing housing to the third switching mechanism. As a result, the gas of the third processing housing can be properly exhausted.

The third exhaust pipe is disposed on the side of the third processing housing. For this reason, the 3rd switching mechanism can be easily connected with the 3rd exhaust pipe. The fourth exhaust pipe is disposed on the side of the third processing housing. For this reason, the 3rd switching mechanism can be easily connected to the 4th exhaust pipe.

As described above, the present substrate processing apparatus can appropriately exhaust the gas of the third processing housing.

The substrate processing apparatus mentioned above WHEREIN: The substrate processing apparatus is a 1st switch based on the detection result of the 1st pressure sensor which measures the gas pressure of the primary side of the said 1st switching mechanism, and the said 1st pressure sensor. A first pressure regulating mechanism for adjusting the pressure of the gas on the primary side of the mechanism, a third pressure sensor for measuring the pressure of the gas on the primary side of the third switching mechanism, and a detection result of the third pressure sensor It is preferable to provide a 3rd pressure adjustment mechanism which adjusts the pressure of the gas of the primary side of the said 3rd switching mechanism. The substrate processing apparatus includes a first pressure sensor and a first pressure adjusting mechanism. For this reason, the pressure of the primary side of a 1st switching mechanism can be adjusted suitably. Similarly, the substrate processing apparatus includes a third pressure sensor and a third pressure adjusting mechanism. For this reason, the pressure of the primary side of a 3rd switching mechanism can be adjusted suitably.

The above-mentioned substrate processing apparatus WHEREIN: The said 1st pressure adjustment mechanism and the said 3rd pressure adjustment mechanism make the pressure of the gas on the primary side of the said 1st switching mechanism equal to the pressure of the gas on the primary side of the said 3rd switching mechanism. It is preferable to do Between the first processing housing and the third processing housing, the quality of the processing performed on the substrate can be suitably equalized.

In the above-described substrate processing apparatus, the substrate processing apparatus includes: a fifth exhaust pipe connected to the first exhaust pipe and the third exhaust pipe and exhausting the gas of the first exhaust pipe and the gas of the third exhaust pipe; It is preferable to include a sixth exhaust pipe connected to the exhaust pipe and the fourth exhaust pipe and for discharging the gas of the second exhaust pipe and the gas of the fourth exhaust pipe. The structure of the substrate processing apparatus can be simplified.

In the above-described substrate processing apparatus, the substrate processing apparatus includes a fifth pressure sensor for measuring the pressure of gas inside the fifth exhaust pipe, and the interior of the fifth exhaust pipe based on a detection result of the fifth pressure sensor. a fifth pressure regulating mechanism for adjusting the gas pressure of the It is preferable to provide a 6th pressure adjustment mechanism which adjusts the pressure of the gas inside. The substrate processing apparatus includes a fifth pressure sensor and a fifth switching mechanism. For this reason, the pressure inside the 5th exhaust pipe can be suitably adjusted. Similarly, the substrate processing apparatus includes a sixth pressure sensor and a sixth switching mechanism. For this reason, the pressure inside the 6th exhaust pipe can be adjusted suitably.

In the substrate processing apparatus described above, the fifth pressure sensor is provided downstream from a connection position of the first exhaust pipe and the fifth exhaust pipe and a connection position between the third exhaust pipe and the fifth exhaust pipe, It is preferable that the 6 pressure sensor be provided downstream from a connection position of the second exhaust pipe and the sixth exhaust pipe, and a connection position of the fourth exhaust pipe and the sixth exhaust pipe. The fifth pressure sensor can suitably detect the exhaust pressure of the entire first exhaust pipe and the third exhaust pipe. The sixth pressure sensor can appropriately detect the exhaust pressures of the entire second exhaust pipe and the fourth exhaust pipe.

In the above-described substrate processing apparatus, the first liquid supply unit is capable of supplying a first processing liquid and a second processing liquid, and when the first liquid supply unit supplies the first processing liquid, the first switching mechanism is , when the exhaust path of the first processing housing is switched to the first exhaust pipe, and the first liquid supply unit supplies the second processing liquid, the first switching mechanism is configured to switch the exhaust path of the first processing housing to the exhaust path. It is preferred to switch to a second exhaust pipe. When the first liquid supply unit supplies the first processing liquid, the first exhaust pipe exhausts the gas of the first processing housing. When the first liquid supply unit supplies the second treatment liquid, the first exhaust pipe does not exhaust the gas of the first treatment housing. Therefore, it can suppress suitably that the inside of a 1st exhaust pipe is contaminated. Similarly, when the first liquid supply unit supplies the second processing liquid, the second exhaust pipe exhausts the gas of the first processing housing. When the first liquid supply unit supplies the first treatment liquid, the second exhaust pipe does not exhaust the gas of the first treatment housing. Therefore, it can suppress suitably that the inside of a 2nd exhaust pipe is contaminated. As a result, the gas of the first processing housing can be exhausted more appropriately.

While there are shown several forms which are presently considered suitable for the purpose of illustrating the invention, it is to be understood that the invention is not limited to the constructions and arrangements as shown.
1 : is a top view which shows the inside of the substrate processing apparatus of embodiment.
It is a right side view which shows the structure of the center part of the substrate processing apparatus in the width direction.
3 is a front view of a processing block.
4 is a right side view showing the configuration of a right part of the substrate processing apparatus.
5 is a left side view showing the configuration of a left part of the substrate processing apparatus.
6 is a plan view of the processing unit.
7 is a side view of the processing unit.
Fig. 8 is a front view of the switching mechanism.
9 is a schematic diagram of an exhaust path from the processing housing.
10 is a plan view showing an upper portion of a processing block.
11 is a control block diagram of the substrate processing apparatus.
12 is a flowchart showing the procedure of an operation for performing a process on a substrate.
13 is a plan view of a processing unit in a modified embodiment.
14 is a plan view of a processing unit in a modified embodiment.
15 is a plan view of a processing unit in a modified embodiment.
16 is a plan view of a processing unit in a modified embodiment.
17 is a plan view showing the inside of the substrate processing apparatus according to the modified embodiment.
It is a front view of the switching mechanism of a modified embodiment.
19A is a side view of a switching mechanism according to a modified embodiment.
It is a side view of the switching mechanism of a modified embodiment.
It is a top view which shows the arrangement example of the wind speed sensor of a modified embodiment.
It is a top view which shows the arrangement example of the wind speed sensor of a modified embodiment.
It is a top view which shows the arrangement example of the wind speed sensor of a modified embodiment.
It is a top view which shows the example of arrangement|positioning of the wind speed sensor of a modified embodiment.

EMBODIMENT OF THE INVENTION Hereinafter, the substrate processing apparatus of this invention is demonstrated with reference to drawings.

<Outline of substrate processing apparatus>

1 : is a top view which shows the inside of the substrate processing apparatus of embodiment. The substrate processing apparatus 1 processes a substrate (eg, a semiconductor wafer) W .

The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for organic EL (Electroluminescence), a substrate for a flat panel display (FPD), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, an optical They are a substrate for magnetic disks, a substrate for a photomask, and a substrate for solar cells. The substrate W has a thin flat plate shape. The board|substrate W has a substantially circular shape in planar view.

The substrate processing apparatus 1 includes an indexer unit 3 and a processing block 11 . The processing block 11 is connected to the indexer unit 3 . The indexer unit 3 and the processing block 11 are arranged in a horizontal direction. The indexer unit 3 supplies the substrate W to the processing block 11 . The processing block 11 performs processing on the substrate W. The indexer unit 3 recovers the substrate W from the processing block 11 .

In this specification, for convenience, the horizontal direction in which the indexer part 3 and the processing block 11 are lined up is called "back-and-forth direction X". Among the front-back directions X, the direction from the processing block 11 toward the indexer unit 3 is called "front". The direction opposite to the front is called "rear". The horizontal direction orthogonal to the front-back direction X is called "the width direction Y." One direction of the "width direction (Y)" is appropriately called "right". The direction opposite to the right is called “left”. A direction perpendicular to the horizontal direction is called a "vertical direction Z". In each figure, as reference, the front, back, right, left, top, and bottom are shown suitably.

When "front", "rear", "right" and "left" are not specifically distinguished, they are called "side".

The indexer unit 3 includes a plurality of (for example, four) carrier mounting units 4 . The carrier mounting parts 4 are arranged in a line in the width direction Y. Each carrier mounting unit 4 mounts one carrier C, respectively. The carrier C accommodates a plurality of substrates W. The carrier C is, for example, a FOUP (front opening unified pod).

The indexer unit 3 includes a conveyance space 5 . The conveyance space 5 is arrange|positioned behind the carrier mounting part 4 . The conveyance space 5 extends in the width direction Y.

The indexer unit 3 includes a conveying mechanism 6 . The conveyance mechanism 6 is provided in the conveyance space 5 . The conveyance mechanism 6 is arrange|positioned behind the carrier mounting part 4 . The conveyance mechanism 6 conveys the board|substrate W. The conveyance mechanism 6 is accessible to the carrier C mounted on the carrier mounting part 4 .

The processing block 11 is provided with the conveyance space 12A. The conveyance space 12A is arrange|positioned at the center part of the process block 11 in the width direction Y. As shown in FIG. 12 A of conveyance spaces extend in the front-back direction X. The front part of the conveyance space 12A is connected with the conveyance space 5 of the indexer part 3 .

The processing block 11 is provided with the board|substrate mounting part 14A. The board|substrate mounting part 14A is provided in 12 A of conveyance spaces. The board|substrate mounting part 14A is arrange|positioned at the front part of 12 A of conveyance spaces. The conveyance mechanism 6 of the indexer part 3 is also accessible to the board|substrate mounting part 14A. The board|substrate mounting part 14A mounts the board|substrate W.

The processing block 11 is provided with the conveyance mechanism 16A. The conveyance mechanism 16A is provided in the conveyance space 12A. The conveyance mechanism 16A conveys the board|substrate W. The conveyance mechanism 16A is accessible to the board|substrate mounting part 14A.

The processing block 11 includes processing units 21A1 , 21B1 , 21C1 , and 21D1 . The processing units 21A1 and 21B1 are disposed on the right side of the conveyance space 12A. The processing units 21A1 and 21B1 are arranged in the front-back direction X. The processing unit 21B1 is disposed behind the processing unit 21A1 . The processing units 21C1 and 21D1 are disposed on the left side of the conveyance space 12A. The processing units 21C1 and 21D1 are arranged in the front-back direction X. The processing unit 21D1 is disposed behind the processing unit 21C1 .

When the processing units 21A1 , 21B1 , 21C1 , and 21D1 are not distinguished, they are called processing units 21 . Each processing unit 21 performs a processing on the substrate W. The processing performed by each processing unit 21 is the same.

The structure of the processing unit 21 will be briefly described. Each processing unit 21 includes a processing housing 23 .

Each processing unit 21 includes a holding unit 31 . The holding part 31 is provided inside the processing housing 23 . The holding part 31 holds the board|substrate W. 1 shows the board|substrate W hold|maintained by the holding|maintenance part 31 by the broken line.

The processing unit 21 includes a liquid supply unit 33 . The liquid supply part 33 is provided inside the processing housing 23 . The liquid supply unit 33 supplies the processing liquid to the substrate W held by the holding unit 31 .

The conveyance mechanism 16A is accessible to each processing unit 21 . Specifically, the conveying mechanism 16A is accessible to the holding unit 31 of each processing unit 21 .

Hereinafter, the processing housing 23 of the processing unit 21A1 is appropriately referred to as the processing housing 23A1 . Similarly, the processing housings 23 of the processing units 21B1, 21C1, and 21D1 are appropriately referred to as processing housings 23B1, 23C1, and 23D1. The processing housings 23A1 , 23B1 , 23C1 , and 23D1 are arranged at the same height.

The processing block 11 is provided with exhaust pipes 41A, 42A, and 43A. The exhaust pipes 41A, 42A, and 43A are all provided outside the processing housing 23 . The exhaust pipes 41A-43A are respectively provided on the side of the processing housing 23A1. The exhaust pipes 41A-43A pass through positions on the sides of the processing housing 23A1, respectively. The exhaust pipes 41A-43A discharge gas, respectively. The exhaust pipes 41A-43A do not communicate with each other. The exhaust pipes 41A-43A have exhaust passages separated from each other, respectively.

Similarly, the processing block 11 is provided with exhaust pipes 41B-43B, 41C-43C, and 41D-43D. The exhaust pipes 41B-43B, 41C-43C, and 41D-43D are provided on the sides of the processing housings 23B1, 23C1, and 23D1, respectively. The exhaust pipes 41B-43B, 41C-43C, and 41D-43D discharge gas, respectively.

The processing block 11 includes switching mechanisms 51A1 , 51B1 , 51C1 , and 51D1 . The switching mechanism 51A1 is disposed at a position substantially flush with the processing housing 23A1 . Similarly, the switching mechanisms 51B1 , 51C1 , and 51D1 are respectively disposed at approximately the same height as the processing housings 23B1 , 23C1 , 23D1 .

The switching mechanism 51A1 switches the exhaust path of the processing housing 23A1 to one of the exhaust pipes 41A-43A. The switching mechanism 51A1 switches the exhaust path of the gas from the processing housing 23A1 between the exhaust pipes 41A-43A.

Specifically, the switching mechanism 51A1 switches between the first state, the second state, and the third state. In the first state, the switching mechanism 51A1 connects the processing housing 23A1 with the exhaust pipe 41A and blocks the processing housing 23A1 from the exhaust pipes 42A and 43A. In the second state, the switching mechanism 51A1 connects the processing housing 23A1 with the exhaust pipe 42A and blocks the processing housing 23A1 from the exhaust pipes 41A and 43A. In the third state, the switching mechanism 51A1 connects the processing housing 23A1 with the exhaust pipe 43A, and further blocks the processing housing 23A1 from the exhaust pipes 41A and 42A. In this way, the switching mechanism 51A1 is configured to individually communicate the exhaust pipes 41A-43A with the processing housing 23A1 and separate the exhaust pipes 41A-43A from the processing housing 23A1.

Similarly, the switching mechanism 51B1 switches the exhaust path of the processing housing 23B1 to one of the exhaust pipes 41B-43B. The switching mechanism 51C1 switches the exhaust path of the processing housing 23C1 to one of the exhaust pipes 41C-43C. The switching mechanism 51D1 switches the exhaust path of the processing housing 23D1 to one of the exhaust pipes 41D-43D.

In FIG. 1 , the switching mechanism 51A1 switches the exhaust path of the processing housing 23A1 to the exhaust pipe 41A. The switching mechanism 51B1 switches the exhaust path of the processing housing 23B1 to the exhaust pipe 41B. The switching mechanism 51C1 switches the exhaust path of the processing housing 23C1 to the exhaust pipe 42C. The switching mechanism 51D1 switches the exhaust path of the processing housing 23D1 to the exhaust pipe 43D.

Specifically, the switching mechanism 51A1 connects the processing housing 23A1 with the exhaust pipe 41A, and blocks the processing housing 23A1 from the exhaust pipes 42A and 43A. The exhaust pipe 41A exhausts gas from the processing housing 23A1 . The exhaust pipes 42A and 43A do not exhaust gas from the processing housing 23A1.

The switching mechanism 51B1 connects the processing housing 23B1 with the exhaust pipe 41B and blocks the processing housing 23B1 from the exhaust pipes 42B and 43B. The exhaust pipe 41B exhausts gas from the processing housing 23B1. The exhaust pipes 42B and 43B do not exhaust gas from the processing housing 23B1.

The switching mechanism 51C1 connects the processing housing 23C1 with the exhaust pipe 42C, and further blocks the processing housing 23C1 from the exhaust pipes 41C and 43C. The exhaust pipe 42C exhausts gas from the processing housing 23C1. The exhaust pipes 41C and 43C do not exhaust gas from the processing housing 23C1.

The switching mechanism 51D1 connects the processing housing 23D1 with the exhaust pipe 43D, and also blocks the processing housing 23D1 from the exhaust pipes 41D and 42D. The exhaust pipe 43D exhausts gas from the processing housing 23D1. The exhaust pipes 41D and 42D do not exhaust gas from the processing housing 23D1.

Here, the processing housing 23A1 is an example of the first processing housing in the present invention. The holding part 31 of the processing unit 21A1 is an example of the 1st holding part in this invention. The liquid supply unit 33 of the processing unit 21A1 is an example of the first liquid supply unit in the present invention. The exhaust pipe 41A is an example of the first exhaust pipe in the present invention. The exhaust pipe 42A is an example of the second exhaust pipe in the present invention. The switching mechanism 51A1 is an example of the 1st switching mechanism in this invention.

The processing housing 23B1 is an example of the third processing housing in the present invention. The holding part 31 of the processing unit 21B1 is an example of the 3rd holding part in this invention. The liquid supply unit 33 of the processing unit 21B1 is an example of the third liquid supply unit in the present invention. The exhaust pipe 41B is an example of the third exhaust pipe in the present invention. The exhaust pipe 42B is an example of the fourth exhaust pipe in the present invention. The switching mechanism 51B1 is an example of the 3rd switching mechanism in this invention.

The substrate processing apparatus 1 operates as follows, for example. The conveyance mechanism 6 conveys the board|substrate W from the carrier C on the carrier mounting part 4 to 14 A of board|substrate mounting parts. The transfer mechanism 16A transfers the substrate W from the substrate mounting unit 14A to the processing unit 21 . Specifically, the transfer mechanism 16A places the substrate W on the holding unit 31 . The processing unit 21 performs liquid processing on the substrate W inside the processing housing 23 . Each processing unit 21 processes one board|substrate W at a time. Specifically, the liquid supply unit 33 supplies the processing liquid to the substrate W held by the holding unit 31 . After the substrate W is processed, the transfer mechanism 16A transfers the substrate W from the processing unit 21 to the substrate mounting unit 14A. The conveyance mechanism 6 conveys the board|substrate W to the carrier C on the carrier mounting part 4 from 14A of board|substrate mounting parts.

When one processing unit 21 processes the substrate W, another processing unit 21 may process the other substrate W. The number of processing units 21 to which each substrate W is conveyed is, for example, one.

When processing is performed on the substrate W inside the processing housing 23 , the switching mechanism 51 switches the exhaust path of the processing housing 23 . For example, when processing the substrate W, the switching mechanism 51A1 switches the exhaust path one or more times. For example, the period during which the processing is performed on one substrate W in one processing housing 23 may include two or more of the first period, the second period, and the third period. Here, the first period is a period during which the first exhaust pipe exhausts the gas of the processing housing 23 . The second period is a period during which the second exhaust pipe exhausts the gas of the processing housing 23 . The third period is a period during which the third exhaust pipe exhausts the gas of the processing housing 23 .

According to the above-mentioned substrate processing apparatus 1, the following effects can be acquired. That is, the switching mechanism 51A1 is disposed at a position substantially flush with the processing housing 23A1 . For this reason, the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be suitably shortened.

In other words, the processing housing 23A1 and the switching mechanism 51A1 are connected without passing through the piping. For this reason, the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be suitably shortened.

Since the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be suitably shortened, it is possible to suitably suppress the flow path between the processing housing 23A1 and the switching mechanism 51A1 from being dirty. Accordingly, the gas flows smoothly from the processing housing 23A1 to the switching mechanism 51A1 . As a result, the gas in the processing housing 23A1 can be properly exhausted.

By the way, the switching timing is determined according to the gas change timing and the delay time, for example. Here, the switching timing is the timing at which the switching mechanism 51 switches the exhaust path. The gas change timing is a timing at which the gas component of the processing housing 23 changes. The delay time is the time required for the gas to reach the switching mechanism 51 from the processing housing 23 . The shorter the flow path between the processing housing 23 and the switching mechanism 51, the shorter the delay time. The shorter the flow path between the processing housing 23 and the switching mechanism 51, the smaller the non-uniformity of the delay time. As described above, according to the substrate processing apparatus 1 , the flow path between the processing housing 23A1 and the switching mechanism 51A1 can be suitably shortened. For this reason, the delay time can be shortened suitably. Moreover, the nonuniformity of a delay time can be suppressed suitably. Accordingly, the switching timing can be accurately determined. Accordingly, the switching mechanism 51A1 can switch the exhaust path of the processing housing 23A1 at an accurate timing.

Since the switching mechanism 51A1 is disposed at a position substantially flush with the processing housing 23A1 , the flow path between the processing housing 23A1 and the switching mechanism 51A1 extends in a substantially horizontal direction. Accordingly, the gas flows more smoothly from the processing housing 23A1 to the switching mechanism 51A1. As a result, the gas in the processing housing 23A1 can be exhausted more appropriately.

Similarly, the switching mechanisms 51B1 , 51C1 , and 51D1 are respectively disposed at approximately the same height as the processing housings 23B1 , 23C1 , 23D1 . For this reason, the gases in the processing housings 23A1, 23C1, and 23D1 can be properly exhausted.

The exhaust pipe 41A is disposed on the side of the processing housing 23A1 . For this reason, the switching mechanism 51A1 can be easily connected to the exhaust pipe 41A. The exhaust pipes 42A and 43A are also disposed on the side of the processing housing 23A1. For this reason, the switching mechanism 51A1 can be easily connected to the exhaust pipes 42A and 43A.

Similarly, the exhaust pipes 41B-43B are disposed on the side of the processing housing 23B1. For this reason, the switching mechanism 51B1 can be easily connected with the exhaust pipes 41B-43B. The exhaust pipes 41C-43C are disposed on the side of the processing housing 23C1. For this reason, the switching mechanism 51C1 can be easily connected to the exhaust pipes 41C-43C. The exhaust pipes 41D-43D are disposed on the side of the processing housing 23D1. For this reason, the switching mechanism 51D1 can be easily connected to the exhaust pipes 41D-43D.

Hereinafter, the structure of the substrate processing apparatus 1 is demonstrated in more detail.

<Indexer (3)>

See Figures 1 and 2. 2 : is a right side view which shows the structure of the center part of the substrate processing apparatus 1 in the width direction Y. As shown in FIG. The structure of the conveyance mechanism 6 is demonstrated. The conveying mechanism 6 includes a hand 7 and a hand drive unit 8 . The hand 7 supports one board|substrate W in a horizontal attitude|position. The hand drive unit 8 is connected to the hand 7 . The hand drive unit 8 moves the hand 7 . The hand drive unit 8 moves the hand 7 in the front-rear direction (X), the width direction (Y), and the vertical direction (Z).

The structure of the hand drive unit 8 is exemplified. The hand drive part 8 is provided with the rail 8a, the horizontal movement part 8b, the vertical movement part 8c, the rotation part 8d, and the forward/backward movement part 8e, for example. The rail 8a is fixedly provided. The rail 8a is arranged at the bottom of the conveyance space 5 . The rail 8a extends in the width direction Y. The horizontal moving part 8b is supported by the rail 8a. The horizontal moving part 8b moves in the width direction Y with respect to the rail 8a. The vertical moving part 8c is supported by the horizontal moving part 8b. The vertical moving part 8c moves in the vertical direction Z with respect to the horizontal moving part 8b. The rotating part 8d is supported by the vertical moving part 8c. The rotating part 8d rotates with respect to the vertical moving part 8c. The rotating part 8d rotates around a rotation axis parallel to the vertical direction Z. The forward/backward moving part 8e moves with respect to the rotating part 8d. The forward/backward movement unit 8e reciprocates in one horizontal direction determined by the direction of the rotation unit 8d. The forward/backward moving part 8e is connected to the hand 7 . Since the hand drive part 8 is provided with such a structure, the hand 7 can move in parallel in the vertical direction Z. The hand 7 can move in parallel in any horizontal direction. The hand 7 is rotatable in a horizontal plane.

<Outline of processing block 11>

See Figures 2 and 3. 3 is a front view of the processing block 11 . In FIG. 3, illustration of 14 A of board|substrate mounting parts etc. is abbreviate|omitted. The processing block 11 is provided with the conveyance space 12B in addition to the conveyance space 12A. The conveyance space 12B is arrange|positioned below the conveyance space 12A. The conveyance space 12B is also connected with the conveyance space 5 of the indexer part 3 . Although illustration is abbreviate|omitted, the conveyance space 12B is arrange|positioned at the same position as the conveyance space 12A in planar view.

When the conveyance space 12A, 12B is not distinguished, it is called the conveyance space 12.

The processing block 11 includes one partition 13 . The partition wall 13 is arrange|positioned below the conveyance space 12A and above the conveyance space 12B. The partition wall 13 has a horizontal plate shape. The partition 13 separates the conveyance space 12A and the conveyance space 12B.

See FIG. 2 . The processing block 11 is provided with the board|substrate mounting part 14B in addition to the board|substrate mounting part 14A. The board|substrate mounting part 14B mounts the board|substrate W. The board|substrate mounting part 14B is arrange|positioned below the board|substrate mounting part 14A. The board|substrate mounting part 14B is provided in the conveyance space 12B. The board|substrate mounting part 14B is arrange|positioned at the front part of the conveyance space 12B. The conveyance mechanism 6 of the indexer part 3 is accessible also to the board|substrate mounting part 14B. The conveyance mechanism 6 conveys the board|substrate W alternately to the board|substrate mounting parts 14A, 14B, for example.

The processing block 11 is provided with the conveyance mechanism 16B in addition to the conveyance mechanism 16A. The conveyance mechanism 16B is provided in the conveyance space 12B. The conveyance mechanism 16B conveys the board|substrate W. The conveyance mechanism 16B is accessible to the board|substrate mounting part 14B.

When the conveyance mechanisms 16A and 16B are not distinguished, they are called conveyance mechanisms 16. As shown in FIG.

See Figures 1, 2 and 3. The structure of the conveyance mechanism 16 is demonstrated. The conveying mechanism 16 includes a hand 17 and a hand drive unit 18 . The hand 17 supports one board|substrate W in a horizontal attitude|position. The hand drive unit 18 is connected to the hand 17 . The hand drive unit 18 moves the hand 17 . The hand drive unit 18 moves the hand 17 in the front-rear direction (X), the width direction (Y), and the vertical direction (Z).

The structure of the hand drive unit 18 is exemplified. The hand drive unit 18 includes, for example, two posts 18a, a vertical moving unit 18b, a horizontal moving unit 18c, a rotating unit 18d, and a forward/backward moving unit 18e. The post 18a is fixedly installed. The post 18a is arrange|positioned at the side of the conveyance space 12. As shown in FIG. The two struts 18a are arranged in the front-rear direction (X). Each post 18a extends in the vertical direction Z. The vertical moving part 18b is supported by the support|pillar 18a. The vertical moving part 18b extends in the front-back direction X between the two posts 18a. The vertical moving part 18b moves in the vertical direction Z with respect to the post 18a. The horizontal moving part 18c is supported by the vertical moving part 18b. The horizontal moving part 18c moves in the front-back direction X with respect to the vertical moving part 18b. The rotating part 18d is supported by the horizontal moving part 18c. The rotating part 18d rotates with respect to the horizontal moving part 18c. The rotating part 18d rotates around a rotation axis parallel to the vertical direction Z. The forward/backward moving part 18e moves with respect to the rotating part 18d. The forward/backward movement unit 18e reciprocates in one horizontal direction determined by the direction of the rotation unit 18d. The forward/backward movement unit 18e is connected to the hand 17 . Since the hand drive unit 18 is configured in this way, the hand 17 can move in parallel in the vertical direction Z. As shown in FIG. The hand 7 can move in parallel in any horizontal direction. The hand 7 is rotatable in a horizontal plane.

4 is a right side view showing the configuration of the right part of the substrate processing apparatus 1 . The processing block 11 includes, in addition to the processing unit 21A1 , five processing units 21A2-21A6 . Each of the processing units 21A2-21A6 is provided with a processing housing 23A2-23A6. The processing housings 23A2-23A6 are disposed below the processing housing 23A1. The processing housings 23A1-23A6 are arranged in a row from top to bottom. The processing housings 23A1-23A6 are arranged in one row in the vertical direction Z. Although not shown, the processing housings 23A2-23A6 are respectively arranged at the same position as the processing housing 23A1 in plan view. The processing housings 23A1-23A6 are stacked on each other.

Similarly, processing block 11 includes processing units 21B2-21B6 in addition to processing unit 21B1. Each of the processing units 21B2-21B6 includes a processing housing 23B2-23B6. The relative positions of the processing housings 23B1-23B6 are the same as the relative positions of the processing housings 23A1-23A6.

5 : is a left side view which shows the structure of the left side of the substrate processing apparatus 1. As shown in FIG. The processing block 11 includes processing units 21C2-21C6 and 21D2-21D6 in addition to the processing units 21C1 and 21D1 . The processing units 21C2-21C6 and 21D2-21D6 are provided with processing housings 23C2-23C6 and 23D2-23D6, respectively. The processing housings 23C1-23C6 and 23D1-23D6 are respectively arranged in the same manner as the processing housings 23A1-23A6.

See Figures 3, 4 and 5. As described above, the processing housings 23A1 , 23B1 , 23C1 , and 23D1 are disposed at the same height position. The processing housings 23A2-23A6, 23B2-23B6, 23C2-23C6, and 23D2-23D6 are also arranged in the same manner. That is, the processing housings 23An, 23Bn, 23Cn, and 23Dn are arranged at the same height. Here, "n" is an integer from 1 to 6.

See FIG. 3 . The processing housings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3 are respectively disposed at the same height as the transport space 12A. For this reason, the conveying mechanism 16A can access the processing housings 23A1-23A3, 23B1-23B3, 23C1-23C3, and 23D1-23D3.

The processing housings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6 are disposed at the same height as the transport space 12B. For this reason, the conveyance mechanism 16B can access the processing housings 23A4-23A6, 23B4-23B6, 23C4-23C6, and 23D4-23D6.

When the processing units 21A1-21A6 are not distinguished, they are called processing units 21A. When the processing units 21B1-21B6 are not distinguished, they are called processing units 21B. When the processing units 21C1-21C6 are not distinguished, they are called processing units 21C. When the processing units 21D1-21D6 are not distinguished, they are called processing units 21D. When the processing units 21A, 21B, 21C, and 21D are not distinguished, they are called processing units 21 .

When the processing housings 23A1-23A6 are not distinguished, they are called processing housings 23A. When the processing housings 23B1-23B6 are not distinguished, they are called processing housings 23B. When the processing housings 23C1-23C6 are not distinguished, they are referred to as processing housings 23C. When the processing housings 23D1-23D6 are not distinguished, they are referred to as processing housings 23D. When the processing housings 23A, 23B, 23C, and 23D are not distinguished, they are referred to as processing housings 23 .

See FIG. 1 . Each processing housing 23 adjoins the conveyance space 12, respectively. Each of the processing housings 23A and 23B is disposed on the right side of the transport space 12 , respectively. Each of the processing housings 23C and 23D is disposed on the left side of the transport space 12 , respectively.

The processing block 11 is provided with 1st piping space 44A, 44B and 2nd piping space 46A, 46B. 1st piping space 44A, 44B and 2nd piping space 46A, 46B adjoin the conveyance space 12, respectively. 1st piping space 44A, 44B and 2nd piping space 46A, 46B are arrange|positioned at the right side of the conveyance space 12. As shown in FIG.

The first piping space 44A, the processing housing 23A, and the second piping space 46A are aligned in the front-rear direction X. The first piping space 44A, the processing housing 23A, and the second piping space 46A are arranged in this order. The first piping space 44A is disposed in front of the processing housing 23A. The first piping space 44A is adjacent to the processing housing 23A. The second piping space 46A is disposed behind the processing housing 23A. The second piping space 46A is adjacent to the processing housing 23A.

The relative positions of the processing housing 23B, the first piping space 44B, and the second piping space 46B are the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. same as The 1st piping space 44B is arrange|positioned behind the 2nd piping space 46A. The first piping space 44B is adjacent to the second piping space 46A.

The processing block 11 is provided with 1st piping space 44C, 44D and 2nd piping space 46C, 46D. 1st piping space 44C, 44D and 2nd piping space 46C, 46D adjoin the conveyance space 12, respectively. 1st piping space 44C, 44D and 2nd piping space 46C, 46D are arrange|positioned at the left side of the conveyance space 12. As shown in FIG. The relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. Wow, it's just a different direction. The relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. corresponds to a 180 degree rotation around an axis parallel to the vertical direction Z. For this reason, the first piping space 44C is disposed behind the processing housing 23C. The second piping space 46C is disposed in front of the processing housing 23C. As described above, the relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the processing housing 23A, the first piping space 44A, and the second piping space 46A. equal to the relative position of The processing housing 23C, the first piping space 44C, and the second piping space 46C have a direction in which they are provided with the processing housing 23A, the first piping space 44A, and the second piping space 46A. only different The relative positions of the processing housing 23D, the first piping space 44D, and the second piping space 46D are also relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. same as The processing housing 23D, the first piping space 44D, and the second piping space 46D have a direction in which they are provided with the processing housing 23A, the first piping space 44A, and the second piping space 46A. only different

The first piping space 44A accommodates the exhaust pipes 41A-43A. In other words, the exhaust pipes 41A-43A are provided in the first piping space 44A. Similarly, the first piping space 44B accommodates the exhaust pipes 41B-43B. The first piping space 44C accommodates the exhaust pipes 41C-43C. The first piping space 44D accommodates the exhaust pipes 41D-43D.

The exhaust pipes 41A-43A are disposed in front of the processing housing 23A. The exhaust pipes 41B-43B are disposed in front of the processing housing 23B. The exhaust pipes 41C-43C are disposed behind the processing housing 23C. The exhaust pipes 41D-43D are disposed behind the processing housing 23D.

The exhaust pipes 41A-43A are aligned in the width direction Y. The exhaust pipes 41A-43A are respectively adjacent to the processing housing 23A. Similarly, the exhaust pipes 41B-43B are aligned in the width direction Y. The exhaust pipes 41B-43B are adjacent to the processing housing 23B, respectively. The exhaust pipes 41C-43C are arranged in the width direction Y. The exhaust pipes 41C-43C are adjacent to the processing housing 23C, respectively. The exhaust pipes 41D-43D are arranged in the width direction Y. The exhaust pipes 41D-43D are respectively adjacent to the processing housing 23C.

The processing block 11 is provided with air supply pipes 48A, 48B, 48C, and 48D. The air supply pipe 48A is provided in 46A of 2nd piping space. The air supply pipe 48A supplies gas (eg, clean air) to the processing housing 23A. Similarly, the air supply pipes 48B, 48C, and 48D are accommodated in the second piping spaces 46B, 46C, and 46D, respectively. The air supply pipes 48B, 48C, and 48D supply gas to the processing housings 23B, 23C, and 23D, respectively.

See Figures 3, 4 and 5. The exhaust pipes 41A-43A extend in the vertical direction Z, respectively. The exhaust pipes 41A-43A extend from a height position of the processing housing 23A1 to a height position of the processing housing 23A6, respectively. Similarly, the exhaust pipes 41B-43B, 41C-43C, and 41D-43D extend in the vertical direction Z, respectively.

See Figures 4 and 5. The air supply pipes 48A-48D respectively extend in the vertical direction. The air supply pipes 48A-48D are provided on the sides of the processing housings 23A-23D, respectively.

The front-back direction X is an example of the 1st direction in this invention. The width direction Y is an example of the 2nd direction in this invention.

When the exhaust pipes 41A-41D are not distinguished, they are called exhaust pipes 41 . When the exhaust pipes 42A-42D are not distinguished, they are called exhaust pipes 42 . When the exhaust pipes 43A-43D are not distinguished, they are called exhaust pipes 43 . When 1st piping space 44A, 44B, 44C, 44D is not distinguished, it is called the 1st piping space 44. As shown in FIG. When the 2nd piping space 46A, 46B, 46C, 46D is not distinguished, it is called the 2nd piping space 46. As shown in FIG. When the air supply pipes 48A-48D are not distinguished, they are called air supply pipes 48 .

The first pipe space 44 does not accommodate a pipe for supplying gas to the processing housing 23 . The first piping space 44 does not accommodate a pipe for supplying the processing liquid to the processing unit 21 (the liquid supply unit 33 ). The first piping space 44 does not accommodate the piping for discharging the processing liquid from the processing unit 21 .

The second piping space 46 may house, for example, a pipe for supplying the processing liquid to the processing unit 21 (the liquid supply unit 33 ). The second piping space 46 may accommodate, for example, piping for discharging the processing liquid from the processing unit 21 .

See Figures 3 and 4. As described above, the switching mechanism 51A1 is disposed at a position substantially flush with the processing housing 23A1. The switching mechanism 51A1 overlaps the processing housing 23A1 when viewed from the front. Specifically, the entire switching mechanism 51A1 overlaps the processing housing 23A1 when viewed from the front. The relative positions of the switching mechanism 51B1 and the processing housing 23B1 are the same as the relative positions of the switching mechanism 51A1 and the processing housing 23A1 . The relative positions of the switching mechanisms 51C1 and 51D1 and the processing housings 23C1 and 23D1 are also the same as the relative positions of the switching mechanisms 51A1 and the processing housing 23A1.

The processing block 11 is provided with switching mechanisms 51A2-51A6 in addition to the switching mechanism 51A1. The relative positions of the switching mechanism 51A2 and the processing housing 23A2 are the same as the relative positions of the switching mechanism 51A1 and the processing housing 23A1 . Specifically, the switching mechanism 51A2 is disposed at a position substantially flush with the processing housing 23A2. The switching mechanism 51A2 overlaps the processing housing 23A2 when viewed from the front. Similarly, the relative positions of the switching mechanism 51A3-51A6 and the processing housing 23A3-23A6 are the same as the relative positions of the switching mechanism 51A1 and the processing housing 23A1 .

The switching mechanism 51A2 switches the exhaust path of the processing housing 23A2 to one of the exhaust pipes 41A-43A. Similarly, the switching mechanisms 51A3-51A6 respectively switch the exhaust path of the processing housing 23A3-23A6 to one of the exhaust pipes 41A-43A. Accordingly, the exhaust pipes 41A-43A exhaust gas from the processing housings 23A1-23A6, respectively.

See FIG. 4 . The processing block 11 is provided with switching mechanisms 51B2-51B6 in addition to the switching mechanism 51B1. The relative positions of the switching mechanism 51B2-51B6 and the processing housing 23B2-23B6 are the same as the relative positions of the switching mechanism 51B1 and the processing housing 23B1. The switching mechanisms 51B2-51B6 respectively switch the exhaust path of the processing housing 23B2-23B6 to one of the exhaust pipes 41B-43B. Accordingly, the exhaust pipes 41B-43B exhaust gas from the processing housings 23B1-23B6, respectively.

See FIG. 5 . The processing block 11 includes, in addition to the switching mechanism 51C1 , switching mechanisms 51C2-51C6 . The relative positions of the switching mechanism 51C2-51C6 and the processing housing 23C2-23C6 are the same as the relative positions of the switching mechanism 51C1 and the processing housing 23C1. The switching mechanisms 51C2-51C6 respectively switch the exhaust path of the processing housing 23C2-23C6 to one of the exhaust pipes 41C-43C. Accordingly, the exhaust pipes 41C-43C exhaust gas from the processing housings 23C1-23C6, respectively.

The processing block 11 includes, in addition to the switching mechanism 51D1 , switching mechanisms 51D2-51D6 . The relative positions of the switching mechanism 51D2-51D6 and the processing housing 23D2-23D6 are the same as the relative positions of the switching mechanism 51D1 and the processing housing 23D1. The switching mechanisms 51D2-51D6 respectively switch the exhaust path of the processing housing 23D2-23D6 to one of the exhaust pipes 41D-43D. Accordingly, the exhaust pipes 41D-43D exhaust gas from the processing housings 23D1-23D6.

Although illustration is abbreviate|omitted, each of the switching mechanisms 51A2-51A6 is arrange|positioned at the same position as the switching mechanism 51A1 in planar view. Similarly, each of the switching mechanisms 51B2-51B6 is arranged at the same position as the switching mechanism 51B1 in plan view. Each of the switching mechanisms 51C2-51C6 is arranged at the same position as the switching mechanism 51C1 in plan view. Each of the switching mechanisms 51D2-51D6 is arranged at the same position as the switching mechanism 51D1 in plan view.

When the switching mechanisms 51A1-51A6 are not distinguished, they are called switching mechanisms 51A. When the switching mechanisms 51B1-51B6 are not distinguished, they are called switching mechanisms 51B. When the switching mechanisms 51C1-51C6 are not distinguished, they are called switching mechanisms 51C. When the switching mechanisms 51D1-51D6 are not distinguished, they are called switching mechanisms 51D. When the switching mechanisms 51A, 51B, 51C, and 51D are not distinguished, they are called switching mechanisms 51 .

See FIG. 1 . The switching mechanism 51 is provided in the position which does not overlap with the holding part 31 in planar view. At least a part of the switching mechanism 51 is provided outside the processing housing 23 . At least a part of the switching mechanism 51 is provided on the side of the processing housing 23 . At least a part of the switching mechanism 51 is provided in the first piping space 44 . At least a part of each switching mechanism 51A is provided in the first piping space 44A. At least a part of each switching mechanism 51B is provided in the 1st piping space 44B. At least a part of each switching mechanism 51C is provided in the first piping space 44C. At least a part of each switching mechanism 51D is provided in the first piping space 44D.

<Structure of processing unit 21>

6 is a plan view of the processing unit 21 . 7 is a side view of the processing unit 21 . Each processing unit 21 includes the processing housing 23 , the holding unit 31 , and the liquid supply unit 33 , as described above. In addition, since the liquid supply part 33 is shown briefly in FIG. 1 for convenience, the liquid supply part 33 shown in FIG. 6 is slightly different from the liquid supply part 33 shown in FIG.

The structure of the processing housing 23 will be described. The processing housing 23 has a substantially box shape. The processing housing 23 has a substantially rectangular shape in a plan view, a front view, and a side view.

Each processing housing 23 has four side walls 25a, 25b, 25c, 25d, a top plate 25e, and a bottom plate 25f. Each of the side walls 25a-25d has a substantially vertical plate shape. The top plate 25e and the bottom plate 25f have a substantially horizontal plate shape.

Each processing housing 23 has a processing space 24 therein. The substrate W is processed in the processing space 24 . The processing space 24 is partitioned by side walls 25a-25d, a top plate 25e, and a bottom plate 25f.

The side walls 25a and 25c extend in the front-rear direction X in a plan view. The side wall 25c is provided opposite to the side wall 25a. The side walls 25b and 25d extend in the width direction Y in a plan view. The sidewalls 25b and 25d extend from the sidewall 25a to the sidewall 25c, respectively. The side wall 25d is provided opposite to the side wall 25b.

The processing housing 23B has the same structure as the processing housing 23A. The processing housings 23C and 23D also have the same structure as the processing housing 23A. The processing housings 23C and 23D differ only in the direction in which they are installed from the processing housing 23A. The processing housings 23C and 23D correspond to rotating the processing housing 23A by 180 degrees about an axis parallel to the vertical direction Z. Accordingly, in any of the processing housings 23A-23D, the side wall 25a is in contact with the conveyance space 12 . In any of the processing housings 23A-23D, the side wall 25b abuts the first piping space 44 . In any of the processing housings 23A-23D, the side wall 25d is in contact with the second piping space 46 .

The processing housing 23 has a substrate transfer port 27 . The substrate transfer port 27 is formed in the side wall 25a. The substrate W can pass through the substrate transfer port 27 . The substrate W moves between the outside of the processing housing 23 and the inside of the processing housing 23 through the substrate transfer port 27 . Specifically, the substrate W moves between the transfer space 12 and the processing space 24 via the substrate transfer port 27 .

Each processing unit 21 may be provided with a shutter (not shown). The shutter is mounted on the side wall 25a. The shutter opens and closes the substrate transfer port 27 .

The holding part 31 holds the board|substrate W of 1 sheet in a horizontal attitude|position. The holding part 31 has an upper surface 31a. The upper surface 31a is substantially horizontal. The board|substrate W is mounted on the upper surface 31a.

6 and 7 show the central point G. As shown in FIG. The center point G is the position of the center of the substrate W when the substrate W is held by the holding unit 31 .

See FIG. 7 . Each processing unit 21 further includes a rotation drive unit 32 . The rotation driving unit 32 is provided inside the processing housing 23 . The rotation driving unit 32 is connected to the holding unit 31 . The rotation driving unit 32 rotates the holding unit 31 . The substrate W held by the holding unit 31 rotates integrally with the holding unit 31 . The holding part 31 and the board|substrate W rotate around the rotation axis Aw. The rotation axis Aw is, for example, an imaginary line parallel to the vertical direction Z. The rotation axis Aw passes through the center point G, for example.

See FIG. 6 . The liquid supply unit 33 supplies the first processing liquid, the second processing liquid, and the third processing liquid. The first processing liquid, the second processing liquid, and the third processing liquid are different from each other. That is, the liquid supply unit 33 supplies a plurality (three) types of processing liquids.

The first processing liquid is classified into, for example, an acidic liquid. The first treatment liquid contains, for example, at least one of hydrofluoric acid (hydrofluoric acid), hydrochloric acid aqueous hydrogen peroxide, sulfuric acid, sulfuric acid hydrogen peroxide solution, hydrofluoric nitric acid (a mixture of hydrofluoric acid and nitric acid), and hydrochloric acid.

The second processing liquid is classified into, for example, an alkaline liquid. The second treatment liquid contains, for example, at least one of ammonia hydrogen peroxide (SC1), aqueous ammonia, ammonium fluoride solution, and tetramethylammonium hydroxide (TMAH).

The third processing liquid is classified into, for example, an organic liquid. The organic liquid contains at least one of isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), and acetone.

The liquid supply unit 33 includes nozzles 34A, 34B, and 34C. The nozzles 34A, 34B, and 34C discharge the processing liquid, respectively. The nozzle 34A discharges the first processing liquid, for example. The nozzle 34B discharges the second processing liquid, for example. The nozzle 34C discharges the third processing liquid, for example.

Each of the nozzles 34A, 34B, and 34C has a linearly extending tubular shape. The nozzles 34A, 34B, and 34C have tip ends 35A, 35B, and 35C and proximal ends 36A, 36B, and 36C, respectively. The tip portions 35A, 35B, and 35C each have a discharge port (not shown) for discharging the processing liquid.

The liquid supply part 33 is provided with base parts 37A, 37B, 37C. The base portions 37A, 37B, and 37C support the nozzles 34A, 34B, and 34C, respectively. Specifically, the base portions 37A, 37B, and 37C are connected to the base ends 36A, 36B, and 36C.

The base portion 37A further moves the nozzle 34A. For example, passing through the base portion 37A and about a rotation axis parallel to the vertical direction Z, the base portion 37A rotates the nozzle 34A. Similarly, the base portions 37B and 37C move the nozzles 34B and 34C, respectively.

By means of the base portion 37A, the nozzle 34A is movable to the treatment position and the retracted position. When the nozzle 34A is in the processing position, the tip portion 35A (discharge port) is located above the substrate W held by the holding portion 31 . When the nozzle 34A is in the processing position, the tip portion 35A (discharge port) overlaps the substrate W held by the holding portion 31 in plan view. When the nozzle 34A is in the retracted position, the whole of the nozzle 34A does not overlap with the board|substrate W hold|maintained by the holding part 31 in planar view. Similarly, the nozzles 34B and 34C are movable to the processing position and the retracted position, respectively. 6 shows the nozzles 34A, 34B, and 34C in the retracted position.

The base portions 37A-37C are respectively disposed in the vicinity of the side wall 25c. The base part 37A is arrange|positioned at the edge part where the side wall 25c and the side wall 25b connect. The base portions 37B and 37C are disposed at corner portions where the sidewall 25c and the sidewall 25d are connected.

Each processing unit 21 is provided with a cup 38 . The cup 38 is arranged around the holding part 31 . The cup 38 surrounds the side of the substrate W held by the holding part 31 . The cup 38 receives the processing liquid scattered from the substrate W held by the holding unit 31 .

See FIG. 7 . Each processing unit 21 is provided with a take-out unit 39 . The blowing unit 39 supplies the gas to the processing space 24 . The take-out unit 39 is attached to the upper plate 25e. The take-out unit 39 is disposed above the holding unit 31 . The blowing unit 39 blows out gas (for example, clean air) downward.

The blowing unit 39 is connected to the air supply pipe 48 . The air supply pipe 48 supplies gas to the blowout unit 39 .

The relative positions of the processing housing 23 , the holding part 31 , and the liquid supply part 33 are the same between the processing units 21A-21D. The relative positions of the processing housing 23 , the holding part 31 , and the liquid supply part 33 in the processing units 21C and 21D are the processing housing 23 and the holding part 31 in the processing unit 21A. ) and the relative positions and directions of the liquid supply part 33 are different.

<Structure of the switching mechanism 51>

See Figures 6 and 7. The switching mechanism 51 includes a switching housing 53 . The size of the switching housing 53 is smaller than that of the processing housing 23 . The switching housing 53 is connected to the processing housing 23 . The switching housing 53 is also connected to the exhaust pipes 41-43. Each switching housing 53 extends in the horizontal direction. Each switch housing 53 bends in a planar view to a substantially L-shape. The switching housing 53 has a switching space 54 therein.

Each switching housing 53 is provided with an introduction part 55 . The introduction part 55 is connected to the processing housing 23 . The introduction part 55 is connected to the side wall 25b of the processing housing 23 .

The introduction portion 55 extends from the processing housing 23 in the front-rear direction X. The introduction portion 55 has a first end 55a and a second end 55b. The first stage 55a corresponds to an upstream end of the switching space 54 . The switching space 54 is opened to the processing space 24 in the first stage 55a. In this way, the switching housing 53 communicates with the processing housing 23 at the introduction part 55 . The gas flows into the diverting space 54 from the processing housing 23 through the first stage 55a.

The introduction portion 55 passes through the processing housing 23 . The first stage 55a is disposed inside the processing housing 23 . That is, the first stage 55a is disposed in the processing space 24 . The second stage 55b is disposed outside the processing housing 23 . Specifically, the second stage 55b is disposed in the first piping space 44 .

The introduction part 55 is arrange|positioned at the position close to the side wall 25a. On the other hand, the base parts 37A-37C are arrange|positioned at the position close|similar to the side wall 25c. In other words, the introduction part 55 is arrange|positioned at the position close|similar to the conveyance space 12. As shown in FIG. The base parts 37A-37C are arranged at a position far from the conveyance space 12 .

The position of the introduction part 55 etc. is demonstrated with reference to the side wall 25a. 6 shows distances D1, D2, D3, and D4. The distance D1 is the separation distance between the introduction part 55 and the side wall 25a in planar view. The distance D2 is the separation distance between the holding part 31 and the side wall 25a in a planar view. The distance D3 is the separation distance between the center point G and the side wall 25a in plan view. The distance D4 is the separation distance between the base part 37A and the side wall 25a in planar view. The distance D1 is smaller than the distance D2. The distance D2 is smaller than the distance D3. The distance D3 is smaller than the distance D4.

Here, the side wall 25a is in contact with the conveyance space 12 . For this reason, the distance D1-D4 mentioned above approximates the distance on the basis of the conveyance space 12. As shown in FIG. That is, the distance D1 approximates the separation distance between the introduction part 55 and the conveyance space 12 in planar view. The distance D2 approximates the separation distance of the holding|maintenance part 31 and the conveyance space 12 in planar view. The distance D3 approximates the separation distance between the center point G and the conveyance space 12 in planar view. Distance D4 approximates the separation distance between 37A of base part and the conveyance space 12 in planar view. Therefore, in planar view, the separation distance between the introduction part 55 and the conveyance space 12 is smaller than the separation distance between the holding part 31 and the conveyance space 12 . In planar view, the separation distance between the holding part 31 and the conveyance space 12 is smaller than the separation distance between the center point G and the conveyance space 12 . In a planar view, the separation distance between the central point G and the conveyance space 12 is smaller than the separation distance between the base portion 37A and the conveyance space 12 .

Each switching housing 53 includes a distribution section 56 . The distribution unit 56 is connected to the introduction unit 55 . The distribution unit 56 is connected to the second end 55b of the introduction unit 55 . The distribution part 56 extends in the width direction Y.

The distribution unit 56 is disposed outside the processing housing 23 . The distribution part 56 is arrange|positioned in the 1st piping space 44. As shown in FIG. The distribution part 56 is arrange|positioned in the vicinity of the exhaust pipe 41-43.

The exhaust pipes 41 - 43 abut against the processing housing 23 , respectively. The exhaust pipes 41 - 43 are disposed between the processing housing 23 and the distribution unit 56 in plan view. Specifically, the exhaust pipes 41 - 43 are in contact with the sidewall 25b of the processing housing 23 , respectively. The exhaust pipes 41 - 43 are disposed between the side wall 25b and the distribution portion 56 .

The distribution unit 56 is connected to the exhaust pipe 41-43. The distribution part 56 is connected to the outer surface of the exhaust pipe 41-43. The switching housing 53 communicates with the exhaust pipes 41 - 43 in the distribution section 56 .

Specifically, the exhaust pipe 41 has an opening 41k. The opening 41k is formed on the outer surface of the exhaust pipe 41 . The opening 41k communicates with the flow path in the exhaust pipe 41 . The distribution unit 56 is connected to a portion of the exhaust pipe 41 positioned around the opening 41k. Thereby, the switching space 54 communicates with the flow path in the exhaust pipe 41 through the opening 41k. Similarly, the exhaust pipes 42 and 43 have openings 42k and 43k, respectively. The distribution unit 56 is connected to the exhaust pipes 42 and 43 around the openings 42k and 43k.

See Figures 6 and 8. 8 is a front view of the switching mechanism 51 . 8 shows the conversion housing 53 by broken lines for convenience. Each switching housing 53 is provided with three opening-and-closing parts 61, 62, 63. The opening/closing portions 61-63 are respectively provided inside the switching housing 53 . That is, the switching housing 53 accommodates the opening/closing parts 61-63. Specifically, the opening/closing parts 61-63 are provided inside the distribution part 56, respectively. The opening and closing portions 61 - 63 are provided outside the processing housing 23 . The opening/closing portions 61 - 63 are provided in the first piping space 44 . The opening-and-closing portions 61, 62, and 63 are disposed at positions opposite to the openings 41k, 42k, and 43k, respectively. The opening/closing portions 61, 62, and 63 are movable to a position in which the openings 41k, 42k, and 43k are opened and a position in which the openings 41k, 42k, and 43k are closed, respectively.

6 and 8, the opening/closing portion 61 is at a position to open the opening 41k, and the opening/closing units 62 and 63 are located at a position to close the openings 42k and 43k, respectively.

When the opening/closing portion 61 opens the opening 41k, the exhaust pipe 41 communicates with the processing housing 23 . When the opening/closing portion 61 closes the opening 41k, the exhaust pipe 41 is blocked from the processing housing 23 . In this way, the position of the opening/closing unit 61 that opens the opening 41k corresponds to the position of the opening/closing unit 61 that communicates the processing housing 23 with the exhaust pipe 41 . The position of the opening/closing unit 61 that closes the opening 41k corresponds to the position of the opening/closing unit 61 that blocks the processing housing 23 from the exhaust pipe 41 .

Similarly, when the opening/closing portions 62 and 63 open the openings 42k and 43k, respectively, the exhaust pipes 42 and 43 communicate with the processing housing 23, respectively. When the opening/closing portions 62 and 63 close the openings 42k and 43k, respectively, the exhaust pipes 42 and 43 are blocked from the processing housing 23, respectively. In this way, the positions of the opening and closing portions 62 and 63 that open the openings 42k and 43k correspond to the positions of the opening and closing portions 62 and 63 that communicate the processing housing 23 with the exhaust pipes 42-43, respectively. The positions of the opening and closing portions 62 and 63 for closing the openings 42k and 43k correspond to positions of the opening and closing portions 62 and 63 for blocking the processing housing 23 from the exhaust pipes 42-43, respectively.

The opening/closing portions 61, 62, 63 are movable independently of each other. For this reason, the exhaust pipes 41 , 42 , 43 can communicate with the processing housing 23 individually. The exhaust pipes 41 , 42 , 43 are individually blockable from the processing housing 23 .

The opening/closing portions 61, 62, and 63 have, for example, the following structures. The opening/closing portion 61 has a substantially vertical flat plate shape. The opening/closing part 61 is provided so as to be able to swing around the rotation axis A1. The rotation axis A1 is an imaginary line parallel to the vertical direction Z. The rotation axis A1 passes through the first end of the opening/closing portion 61 . The opening/closing part 61 swings around the rotation axis A1. The opening/closing parts 62 and 63 also have the same structure as the opening/closing part 61 . The opening/closing portions 62 and 63 swing around the rotation axes A2 and A3, respectively.

The opening-and-closing parts 61, 62, 63 are moved by a power source (for example, an electric motor) which is not shown in figure. Here, the power source is not an element of the switching mechanism 51 . The power source is an external element of the switching mechanism 51 . The power source may be disposed outside the switching housing 53 , for example.

The opening/closing part 61 is an example of the 1st opening/closing part in this invention. The opening/closing part 62 is an example of the 2nd opening/closing part in this invention.

As mentioned above, the switching mechanism 51 is arrange|positioned at the position which does not overlap with the holding part 31 in planar view. The planar view position of the switching mechanism 51 is demonstrated in detail.

6 : shows the virtual circle E3r with a dashed-dotted line. The virtual circle E3r is centered on the central point G. The radius of the virtual circle E3r is three times the radius of the substrate W. The switching mechanism 51 is arrange|positioned outside the virtual circle E3r in planar view. That is, the distance from the center point G to the switching mechanism 51 is larger than three times the radius of the board|substrate W in planar view.

6 : shows the virtual circle E5r with a dashed-dotted line. The virtual circle E5r is centered on the central point G. The radius of the virtual circle E5r is 5 times the radius of the board|substrate W. The switching mechanism 51 is arrange|positioned in planar view inside the virtual circle E5r. That is, the distance from the center point G to the switching mechanism 51 is smaller than 5 times the radius of the board|substrate W in planar view.

As described above, the switching mechanism 51 is disposed at a position substantially flush with the processing housing 23 . The height position of the switching mechanism 51 will be described in more detail.

See FIG. 7 . The switching mechanism 51 has an upper end P1 and a lower end Q1. The upper end P1 and the lower end Q1 correspond to the upper end and the lower end of the switching housing 53, respectively. The processing housing 23 has an upper end P2 and a lower end Q2. The upper end P2 corresponds to the upper surface of the upper plate 25e. The lower end Q2 corresponds to the lower surface of the bottom plate 25f. The upper end P1 is arranged at a position equal to or lower than the upper end P2. Specifically, the upper end P1 is disposed at a position lower than the upper end P2. The lower end Q1 is disposed at a position equal to or higher than the lower end Q2. Specifically, the lower end Q1 is disposed at a position higher than the lower end Q2.

The switching mechanism 51 is disposed at a position equal to or lower than the upper surface 31a of the holding part 31 . That is, the upper end P1 is arranged at a position equal to or lower than the upper surface 31a. Specifically, the upper end P1 is disposed at a position lower than the upper surface 31a. Here, the upper surface 31a of the holding part 31 is an example of the upper end of the holding part 31 in this invention.

<Configuration of exhaust path>

9 is a system diagram of an exhaust path from the processing housing 23 . The substrate processing apparatus 1 includes a pressure sensor 71A1 . The pressure sensor 71A1 detects an exhaust pressure. Specifically, the pressure sensor 71A1 measures the pressure of the gas on the primary side (upstream side) of the switching mechanism 51A1 . The pressure sensor 71A1 measures the pressure of the gas flowing into the switching mechanism 51A1 from the processing housing 23A1 .

The substrate processing apparatus 1 includes a pressure adjusting mechanism 73A1 . The pressure adjusting mechanism 73 adjusts the exhaust pressure. Specifically, the pressure adjusting mechanism 73A1 adjusts the pressure of the gas on the primary side of the switching mechanism 51A1. More specifically, the pressure adjustment mechanism 73A1 adjusts the pressure of the gas on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71A1 .

Similarly, the substrate processing apparatus 1 includes pressure sensors 71A2-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6. When the pressure sensors 71A1-71A6, 71B1-71B6, 71C1-71C6, and 71D1-71D6 are not distinguished, they are called a pressure sensor 71. Each pressure sensor 71 detects an exhaust pressure, respectively. Each pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51, respectively.

The substrate processing apparatus 1 includes pressure adjusting mechanisms 73A2-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6. When the pressure adjustment mechanisms 73A1-73A6, 73B1-73B6, 73C1-73C6, and 73D1-73D6 are not distinguished, they are called the pressure adjustment mechanism 73. Each pressure adjusting mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71 .

The substrate processing apparatus 1 is provided with exhaust pipes 81A, 82A, and 83A. The exhaust pipe 81A is connected to the exhaust pipes 41A and 41B. The exhaust pipe 81A discharges the gas of the exhaust pipe 41A and the gas of the exhaust pipe 41B. The exhaust pipe 82A is connected to the exhaust pipes 42A and 42B. The exhaust pipe 82A discharges the gas of the exhaust pipe 42A and the gas of the exhaust pipe 42B. The exhaust pipe 83A is connected to the exhaust pipes 43A and 43B. The exhaust pipe 83A discharges the gas of the exhaust pipe 43A and the gas of the exhaust pipe 43B.

Similarly, the substrate processing apparatus 1 includes exhaust pipes 81B, 82B, and 83B. The connection relationship between the exhaust pipes 81B-83B and the exhaust pipes 41C-43C and 41D-43D is the same as the connection relationship between the exhaust pipes 81A-83A and the exhaust pipes 41A-43A and 41B-43B.

The substrate processing apparatus 1 includes a pressure sensor 84A. The pressure sensor 84A detects an exhaust pressure. Specifically, the pressure sensor 84A measures the pressure of the gas inside the exhaust pipe 81A.

The substrate processing apparatus 1 includes a pressure adjusting mechanism 87A. The pressure adjusting mechanism 87A adjusts the exhaust pressure. Specifically, the pressure adjusting mechanism 87A adjusts the pressure of the gas inside the exhaust pipe 81A. More specifically, the pressure adjusting mechanism 87A adjusts the pressure of the gas inside the exhaust pipe 81A based on the detection result of the pressure sensor 84A.

Similarly, the substrate processing apparatus 1 includes pressure sensors 85A, 86A, 84B, 85B, and 86B. The pressure sensors 85A-86A and 84B-86B respectively detect exhaust pressure. The pressure sensors 85A-86A, 84B-86B measure the pressure of the gas inside the exhaust pipes 82A-83A, 81B-83B, respectively.

The substrate processing apparatus 1 includes pressure adjusting mechanisms 88A, 89A, 87B, 88B, and 89B. The pressure adjusting mechanisms 88A-89A, 87B-89B adjust the pressure of the gas inside the exhaust pipes 82A-83A, 81B-83B, respectively, based on the detection results of the pressure sensors 85A-86A, 84B-86B. Adjust.

When the exhaust pipes 81A and 81B are not distinguished, they are called exhaust pipes 81 . When the exhaust pipes 82A and 82B are not distinguished, they are called exhaust pipes 82 . When the exhaust pipes 83A and 83B are not distinguished, they are called exhaust pipes 83 . When the pressure sensors 84A and 84B are not distinguished, they are called a pressure sensor 84 . When the pressure sensors 85A and 85B are not distinguished, they are called pressure sensors 85 . When the pressure sensors 86A and 86B are not distinguished, they are referred to as pressure sensors 86 . When the pressure adjustment mechanisms 87A and 87B are not distinguished, they are called the pressure adjustment mechanisms 87 . When the pressure adjustment mechanisms 88A and 88B are not distinguished, they are called the pressure adjustment mechanisms 88 . When the pressure adjustment mechanisms 89A and 89B are not distinguished, they are called the pressure adjustment mechanisms 89 .

See FIG. 6 . The pressure sensor 71 is provided in a flow path between the processing housing 23 and the switching mechanism 51 , for example. The pressure sensor 71 is provided in the inside of the switching housing 53 (that is, the switching space 54), for example. The pressure sensor 71 is provided in the introduction part 55, for example. The pressure sensor 71 is provided on the primary side of the distribution part 56, for example. The pressure sensor 71 is provided on the primary side of the opening/closing parts 61-63, for example.

The pressure adjusting mechanism 73 is provided, for example, in a flow path between the processing housing 23 and the switching mechanism 51 . The pressure adjusting mechanism 73 is provided in the inside of the switching housing 53 (that is, the switching space 54), for example. The pressure adjusting mechanism 73 is provided in the introduction part 55 , for example. The pressure adjustment mechanism 73 is provided on the primary side of the distribution part 56, for example. The pressure adjusting mechanism 73 is provided on the primary side of the opening/closing parts 61-63, for example. The pressure adjusting mechanism 73 is provided in the vicinity of the pressure sensor 71 , for example. The pressure adjusting mechanism 73 is disposed on the secondary side (downstream side) of the pressure sensor 71 , for example. The pressure adjusting mechanism 73 is disposed on the primary side of the pressure sensor 71 , for example.

The pressure adjusting mechanism 73 may adjust the pressure of the gas by, for example, adjusting the flow rate of the gas. The pressure adjusting mechanism 73 is, for example, a damper or a fan.

In addition, illustration of the pressure sensor 71 and the pressure adjustment mechanism 73 is abbreviate|omitted in FIG.

See Figures 3, 4 and 5. The exhaust pipes 81 - 83 are respectively disposed at a position higher than the processing housing 23 . Each exhaust pipe 81 is connected to two exhaust pipes 41 at a position higher than the processing housing 23 . Each exhaust pipe 82 is connected to two exhaust pipes 42 at a position higher than the processing housing 23 . Each exhaust pipe 83 is connected to two exhaust pipes 43 at a position higher than the processing housing 23 .

The exhaust pipes 41 - 43 each extend to a position higher than the processing housing 23 . The gas flows upward through the exhaust pipe 41-43. The exhaust pipes 41-43 each have a lower end. The lower ends of the exhaust pipes 41-43 are closed, respectively.

See FIG. 3 . The exhaust pipes 81A-83A are disposed above the processing housings 23A and 23B. The exhaust pipes 81A-83A are arranged in the width direction Y. The exhaust pipes 81A-83A are arranged at the same height. The exhaust pipes 81B-83B are disposed above the processing housings 23C and 23D. The exhaust pipes 81B-83B are arranged in the width direction Y. The exhaust pipes 81B-83B are arranged at the same height. The exhaust pipes 81B-83B are disposed at the same height as the exhaust pipes 81A-83A.

10 is a plan view showing an upper portion of the processing block 11 . The exhaust pipes 81A-83A and 81B-83B extend in the front-rear direction X, respectively. The exhaust pipes 81A-83A have the same length. The exhaust pipes 81B-83B have the same length. The exhaust pipes 81B-83B are shorter than the exhaust pipes 81A-83A.

The exhaust pipes 81A, 82A, and 83A have front ends 81Af, 82Af, and 83Af, respectively. The exhaust pipes 81B, 82B, and 83B have front ends 81Bf, 82Bf, and 83Bf, respectively. The front ends 81Af - 83Af are disposed in front of the front ends 81Bf - 83Bf. The front ends 81Af - 83Af are arranged behind the indexer part 3 .

The exhaust pipe 81 extends to a position later than the processing block 11 and is communicated with a first exhaust treatment facility (not shown). The first exhaust treatment facility recovers gas from the exhaust pipe 81 . Similarly, the exhaust pipes 82 and 83 each extend to a position rearward from the processing block 11 and are communicatedly connected to second and third exhaust treatment facilities (not shown). The second and third exhaust treatment facilities recover gas from the exhaust pipes 82 and 83, respectively. All of the first to third exhaust treatment facilities are external elements of the substrate processing apparatus 1 . Each of the first through third exhaust treatment facilities is installed, for example, in a factory where the substrate processing apparatus 1 is installed.

The gas flows backward through the exhaust pipe 81-83. The front ends 81Af-83Af and 81Bf-83Bf correspond to the upstream ends of the exhaust pipes 81A-83A and 81B-83B, respectively.

The front ends 81Af - 83Af and 81Bf - 83Bf are open to the outside of the substrate processing apparatus 1 . For example, the front stages 81Af - 83Af and 81Bf - 83Bf are opened to a clean room in which the substrate processing apparatus 1 is installed.

The pressure sensor 84 is provided in the exhaust pipe 81 . The pressure sensor 84 is provided downstream from the connection position of the exhaust pipe 81 and the exhaust pipe 41 . For example, the pressure sensor 84A is provided downstream from the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. The pressure sensor 84A is provided behind the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B.

Similarly, the pressure sensors 85 and 86 are provided in the exhaust pipes 82 and 83, respectively.

The pressure adjusting mechanism 87 is provided in the exhaust pipe 81 . The pressure adjusting mechanism 87 is provided upstream of the pressure sensor 84 . The pressure adjusting mechanism 87 is provided upstream from the connection position of the exhaust pipe 81 and the exhaust pipe 41 . For example, the pressure adjustment mechanism 87A is provided upstream from the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. The pressure regulating mechanism 87A is provided in front of the connection position of the exhaust pipe 81A and the exhaust pipe 41A and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. The pressure adjusting mechanism 87A is provided at the front end 81Af of the exhaust pipe 81A. The pressure adjusting mechanism 87A adjusts the flow rate of the gas flowing into the exhaust pipe 81A from the outside of the substrate processing apparatus 1 through the front end 81Af of the exhaust pipe 81A.

Similarly, the pressure adjusting mechanisms 88 and 89 are provided in the exhaust pipes 82 and 83, respectively.

The pressure adjusting mechanism 87-89 may adjust the pressure of the gas by, for example, adjusting the flow rate of the gas. The pressure adjusting mechanism 87-89 is, for example, a damper or a fan.

<Control of the substrate processing apparatus 1>

See FIG. 1 . The substrate processing apparatus 1 includes a control unit 91 . The control part 91 is provided in the indexer part 3, for example. The control unit 91 controls the substrate processing apparatus 1 .

11 is a control block diagram of the substrate processing apparatus 1 . The control unit 91 controls the conveyance mechanisms 6 and 16 . Specifically, the control unit 91 controls the hand drive units 8 and 18 . The control unit 91 controls the processing unit 21 . Specifically, the control unit 91 controls the holding unit 31 , the rotation driving unit 32 , the liquid supply unit 33 , the cup 38 , and the ejection unit 39 . The control unit 91 controls the switching mechanism 51 . Specifically, the control unit 91 controls the opening/closing units 61-63. The control unit 91 acquires the detection results of the pressure sensors 71 , 84 , 85 , and 86 . The control unit 91 controls the pressure adjusting mechanisms 73 , 87 , 88 , and 89 . The control unit 91 is communicatively connected to these elements.

The control unit 91 is realized by a central arithmetic processing unit (CPU) that executes various processes, a random-access memory (RAM) serving as a work area for arithmetic processing, and a storage medium such as a fixed disk. The storage medium stores various kinds of information in advance. The storage medium stores, for example, information (process recipe) that stipulates operating conditions related to the processing performed by each processing unit 21 . The storage medium stores, for example, information that stipulates operating conditions related to switching to exhaust gas performed by the switching mechanism 51 . The storage medium stores information stipulating operating conditions related to the adjustment of the exhaust pressure performed by the pressure adjusting mechanisms 73 and 87-89.

Here, the processing housing 23A2 is an example of the second processing housing in the present invention. The holding part 32 of the processing unit 21A2 is an example of the 2nd holding part in this invention. The liquid supply unit 33 of the processing unit 21A2 is an example of the second liquid supply unit in the present invention. The switching mechanism 51A2 is an example of the second switching mechanism in the present invention.

The pressure sensor 71A1 is an example of the 1st pressure sensor in this invention. The pressure sensor 71B1 is an example of the 3rd pressure sensor in this invention. The pressure adjustment mechanism 73A1 is an example of the 1st pressure adjustment mechanism in this invention. The pressure adjustment mechanism 73B1 is an example of the 3rd pressure adjustment mechanism in this invention.

The exhaust pipe 81A is an example of the fifth exhaust pipe in the present invention. The exhaust pipe 82A is an example of the sixth exhaust pipe in the present invention. The pressure sensor 84A is an example of the 5th pressure sensor in this invention. The pressure sensor 85A is an example of the 6th pressure sensor in this invention. The pressure adjustment mechanism 87A is an example of the 5th pressure adjustment mechanism in this invention. The pressure adjustment mechanism 88A is an example of the 6th pressure adjustment mechanism in this invention.

<Example of operation of substrate processing apparatus 1>

12 is a flowchart showing the procedure of an operation for performing a process on the substrate W. As shown in FIG. An operation example related to one processing unit 21 will be described. It is assumed that the substrate W is already held by the holding unit 31 . It is assumed that each element operates under control by the control unit 91 .

<<Step S1>>

The liquid supply unit 33 supplies the first processing liquid. Specifically, the nozzle 34A moves from the retracted position to the processing position. The nozzle 34A supplies the first processing liquid to the substrate W held by the holding part 31 . The gas in the processing housing 23 contains a component derived from the first processing liquid.

The switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 41 . Specifically, the switching mechanism 51 causes the processing housing 23 to communicate with the exhaust pipe 41 . The gas flows from the processing housing 23 to the exhaust pipe 41 through the switching mechanism 51 . The exhaust pipe 41 exhausts the gas of the processing housing 23 . The gas also flows from the exhaust pipe 41 to the exhaust pipe 81 . The exhaust pipe 81 discharges gas from the exhaust pipe 41 .

In addition, when the step S1 is executed, at least one of the exhaust pipes 42 and 43 may discharge the gas of the other processing housing 23 . It is the same also in steps S2 and S3 mentioned later.

The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51 . The pressure adjusting mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71 .

A more detailed operation of the pressure adjusting mechanism 73 is exemplified below. Also in steps S2 and S3 to be described later, the pressure adjusting mechanism 73 may perform the following operation examples. Each pressure adjusting mechanism 73 adjusts so that, for example, exhaust pressure may become constant, respectively. Each pressure adjustment mechanism 73 adjusts, for example, so that the detection result of the pressure sensor 71 may become constant. The pressure adjustment mechanisms 73A1 and 73A2 make the pressure of the gas on the primary side of the switching mechanism 51A1 and the pressure of the gas on the primary side of the switching mechanism 51A2 equal to each other, for example. The pressure adjustment mechanisms 73A1-73A6 equalize the pressure of the gas on the primary side of the switching mechanisms 51A1-51A6, for example. The pressure adjustment mechanisms 73A1 and 73B1 make the pressure of the gas on the primary side of the switching mechanism 51A1 equal to the pressure of the gas on the primary side of the switching mechanism 51B1, for example. The pressure adjusting mechanisms 73A1, 73B1, 73C1, and 73D1 equalize the pressure of the gas on the primary side of the switching mechanisms 51A1, 51B1, 51C1, and 51D1, for example. The pressure adjustment mechanism 73 equalizes the pressure of the gas on the primary side of each switching mechanism 51 , for example.

The pressure sensors 84-86 measure the pressure of the gas inside the exhaust pipe 81-83, respectively. The pressure adjusting mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipe 81-83, respectively, based on the detection result of the pressure sensor 84-86.

A more detailed operation of the pressure adjusting mechanism 87-89 is exemplified below. In addition, also in steps S2 and S3 mentioned later, the pressure adjustment mechanism 87-89 may perform the following operation example. Each of the pressure adjusting mechanisms 87-89 respectively adjusts, for example, so that the exhaust pressure becomes constant. For example, the pressure adjustment mechanism 87A adjusts so that the detection result of the pressure sensor 84A becomes constant. The pressure adjusting mechanisms 87A-89A make, for example, the pressure of gas inside the exhaust pipe 81A, the pressure of gas inside the exhaust pipe 82B, and the pressure of gas inside the exhaust pipe 83A equal to each other, for example. . The pressure adjusting mechanisms 87A and 87B make the pressure of the gas inside the exhaust pipe 81A equal to the pressure of the gas inside the exhaust pipe 81B, for example. The pressure adjusting mechanisms 87A-89A, 87B-89B equalize the pressure of the gas inside the exhaust pipes 81A-83A, 81B-83B, for example.

<<Step S2>>

The liquid supply unit 33 supplies the second processing liquid. Specifically, the nozzle 34A moves from the treatment position to the retracted position, and the nozzle 34B moves from the retracted position to the treatment position. The nozzle 34B supplies the second processing liquid to the substrate W held by the holding part 31 . The gas in the processing housing 23 contains a component derived from the second processing liquid.

The switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 42 . Specifically, the switching mechanism 51 causes the processing housing 23 to communicate with the exhaust pipe 42 . The gas flows from the processing housing 23 to the exhaust pipe 42 through the switching mechanism 51 . The exhaust pipe 42 exhausts the gas of the processing housing 23 . The gas also flows from the exhaust pipe 42 to the exhaust pipe 82 . The exhaust pipe 82 discharges gas from the exhaust pipe 42 .

The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51 . The pressure adjusting mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71 .

The pressure sensors 84-86 measure the pressure of the gas inside the exhaust pipe 81-83, respectively. The pressure adjusting mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipe 81-83, respectively, based on the detection result of the pressure sensor 84-86.

<<Step S3>>

The liquid supply unit 33 supplies the third processing liquid. Specifically, the nozzle 34B moves from the treatment position to the retracted position, and the nozzle 34C moves from the retracted position to the treatment position. The nozzle 34C supplies the third processing liquid to the substrate W held by the holding part 31 . The gas in the processing housing 23 contains a component derived from the third processing liquid.

The switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 43 . Specifically, the switching mechanism 51 causes the processing housing 23 to communicate with the exhaust pipe 43 . The gas flows from the processing housing 23 to the exhaust pipe 43 through the switching mechanism 51 . The exhaust pipe 43 discharges the gas of the processing housing 23 . The gas also flows from the exhaust pipe 43 to the exhaust pipe 83 . The exhaust pipe 83 discharges gas from the exhaust pipe 43 .

The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51 . The pressure adjusting mechanism 73 adjusts the pressure on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71 .

The pressure sensors 84-86 measure the pressure of the gas inside the exhaust pipe 81-83, respectively. The pressure adjusting mechanisms 87-89 adjust the pressure of the gas inside the exhaust pipe 81-83, respectively, based on the detection result of the pressure sensor 84-86.

<Effect of embodiment>

As described above, according to the substrate processing apparatus 1 , the switching mechanism 51 is disposed at a position substantially flush with the processing housing 23 . Accordingly, the flow path between the switching mechanism 51 and the processing housing 23 can be suitably shortened. As a result, the gas can be properly discharged from the processing housing 23 .

Moreover, the substrate processing apparatus 1 can acquire the following effects.

At least a part of the switching mechanism 51 is disposed on the side of the processing housing 23 . For this reason, the overall height of the processing housing 23 and the switching mechanism 51 can be reduced. For this reason, the height of the substrate processing apparatus 1 can be suppressed low. In addition, the number of processing housings 23 arranged in the vertical direction Z can be easily increased. In this way, the throughput of the substrate processing apparatus 1 can be suitably improved while suppressing the enlargement of the substrate processing apparatus 1 . Here, "height" is the length of the vertical direction Z.

The upper end P1 of the switching mechanism 51 is equal to or lower than the upper end P2 of the processing housing 23 . The lower end Q1 of the switching mechanism 51 is equal to or higher than the lower end Q2 of the processing housing 23 . In this way, the entire switching mechanism 51 is disposed at a position equal to or lower than the upper end P2 and equal to or higher than the lower end Q2. For this reason, the flow path between the switching mechanism 51 and the processing housing 23 can be suitably shortened.

The switching housing 53 is disposed at a position equal to or lower than the upper surface 31a of the holding part 31 . For this reason, the size of the switching mechanism 51 is relatively small. Specifically, the height of the switching mechanism 51 is smaller than the height of the processing housing 23 . Therefore, the enlargement of the substrate processing apparatus 1 can be suppressed suitably.

The switching mechanism 51 is arrange|positioned at the position which does not overlap with the holding part 31 in planar view. For this reason, the interference of the holding|maintenance part 31 and the switching mechanism 51 can be avoided easily.

The distance from the center point G to the switching mechanism 51 is larger than three times the radius of the board|substrate W in planar view. That is, the switching mechanism 51 is arrange|positioned in the area where the distance from the center point G is larger than three times the radius of the board|substrate W in planar view. Therefore, interference of the holding part 31 and the switching mechanism 51 can be avoided reliably.

The distance from the center point G to the switching mechanism 51 is smaller than 5 times the radius of the board|substrate W in planar view. That is, the switching mechanism 51 is arrange|positioned in the area where the distance from the center point G is smaller than 5 times of the radius of the board|substrate W in planar view. For this reason, the flow path between the switching mechanism 51 and the processing housing 23 can be effectively shortened. Moreover, the switching mechanism 51 is relatively small in planar view. Therefore, increase in the footprint of the substrate processing apparatus 1 can be suppressed suitably.

The exhaust pipes 41 to 43 extend in the vertical direction Z, respectively. For this reason, the installation area of the exhaust pipe 41-43 at the time of planar view can be made small suitably. Therefore, the increase in the footprint of the substrate processing apparatus 1 can be suppressed suitably.

The substrate processing apparatus 1 includes a first piping space 44 . For this reason, the exhaust pipes 41-43 can be provided suitably.

The conveyance mechanism 16 conveys the board|substrate W to the holding part 31 . The conveyance mechanism 16 is provided in the conveyance space 12 . The transport space 12 is adjacent to the processing housing 23 . Therefore, the conveyance mechanism 16 can convey the board|substrate W to the holding part 31 easily.

The substrate processing apparatus 1 includes a first piping space 44 . For this reason, the exhaust pipes 41-43 can be provided suitably.

The first piping space 44 is adjacent to the processing housing 23 . For this reason, the exhaust pipes 41 - 43 can be provided in the vicinity of the processing housing 23 .

The conveyance space 12 extends in the front-back direction X. The processing housing 23 and the first piping space 44 are arranged in the front-rear direction X. For this reason, the conveyance space 12 adjacent to the process housing 23 and the 1st piping space 44 adjacent to the process housing 23 can each be suitably arrange|positioned, respectively. Therefore, it is possible to suitably prevent the conveyance mechanism 16 from interfering with the exhaust pipes 41-43.

The first piping space 44 and the processing housing 23 are aligned in the front-back direction X. The exhaust pipes 41-43 are arranged in the width direction Y. For this reason, the exhaust pipes 41 - 43 can be provided in the vicinity of the processing housing 23 , respectively.

At least a part of the switching mechanism 51 is provided in the first piping space 44 . For this reason, the switching mechanism 51 can be provided in the vicinity of the processing housing 23 . In addition, the switching mechanism 51 can be easily connected to the exhaust pipes 41 - 43 .

The switching mechanism 51 includes opening and closing portions 61 , 62 , 63 . The opening/closing part 61 is movable to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is cut off from the exhaust pipe 41 . The opening/closing part 62 is movable to a position in which the processing housing 23 communicates with the exhaust pipe 42 and a position in which the processing housing 23 is blocked from the exhaust pipe 42 . The opening/closing part 63 is movable to a position where the processing housing 23 communicates with the exhaust pipe 43 and a position where the processing housing 23 is cut off from the exhaust pipe 43 . The opening/closing portions 61, 62, 63 are movable independently of each other. For this reason, the switching mechanism 51 can make the exhaust pipes 41 - 43 individually communicate with the processing housing 23 . The switching mechanism 51 can separate the exhaust pipes 41 - 43 from the processing housing 23 .

The switching mechanism 51 includes a switching housing 53 . The switching housing 53 is connected to the processing housing 23 . The switching housing 53 accommodates the opening/closing parts 61-63. For this reason, the switching housing 53 can suitably form the flow path from the processing housing 23 to the opening and closing parts 61-63.

The switching housing 53 is connected to the processing housing 23 and the exhaust pipe 41 . For this reason, the switching housing 53 can suitably form the flow path from the processing housing 23 to the exhaust pipe 41 . Further, the switching housing 53 is connected to the exhaust pipes 42 and 43 . For this reason, the switching housing 53 can suitably form the flow path from the processing housing 23 to the exhaust pipes 42 and 43 .

The opening/closing portions 61-63 are provided in one switching housing 53 . For this reason, the flow path from the processing housing 23 to the opening/closing parts 61-63 can be further shortened.

The opening/closing parts 61 - 63 are provided in one switching space 54 . For this reason, the opening and closing parts 61-63 can open and close the openings 41k-43k of the exhaust pipe 41-43 under the same conditions. Accordingly, the conditions for discharging gas from the processing housing 23 between the exhaust pipes 41 - 43 can be easily equalized. For example, it can suppress that the exhaust pressure becomes non-uniform among the exhaust pipes 41-43. For example, it can suppress that the exhaust flow rate becomes non-uniform among the exhaust pipes 41-43. Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be appropriately improved.

The switching housing 53 has an introduction part 55 . The introduction part 55 is connected to the processing housing 23 . For this reason, gas can be easily introduced into the switching housing 53 from the processing housing 23 .

The introduction part 55 extends in the front-back direction X. As mentioned above, the conveyance space 12 extends in the front-back direction X. For this reason, the conveyance space 12 adjacent to the processing housing 23 and the introduction part 55 connected to the processing housing 23 can each be conveniently arrange|positioned. Therefore, it is possible to suitably prevent the conveyance mechanism 16 from interfering with the introduction part 55 .

The switching housing 53 has a distribution section 56 . The distribution unit 56 is connected to the introduction unit 55 . The distribution unit 56 is connected to the exhaust pipe 41-43. For this reason, gas can be sent out easily from the switching housing 53 to the exhaust pipes 41-43.

The distribution unit 56 is connected to the exhaust pipe 41-43. The distribution part 56 accommodates the opening and closing parts 61-63. Accordingly, the switching mechanism 51 can easily switch the exhaust path of the processing housing 23 between the exhaust pipes 41 - 43 .

The distribution part 56 extends in the width direction Y. As described above, the exhaust pipes 41-43 are aligned in the width direction Y. In this way, the direction in which the distribution part 56 extends is parallel to the direction in which the exhaust pipes 41-43 are arranged. Therefore, the distribution part 56 can be easily connected with the exhaust pipes 41-43.

The introduction part 55 is arrange|positioned at the position relatively close|similar to the conveyance space 12. As shown in FIG. Specifically, in a plan view, the separation distance between the introduction part 55 and the conveyance space 12 is smaller than the separation distance between the holding part 31 and the conveyance space 12 . For this reason, the introduction part 55 can be easily prevented from interfering with the member (for example, the base parts 37A-37C) provided in the processing housing 23. As shown in FIG. Accordingly, gas can be smoothly introduced from the processing housing 23 into the introduction portion 55 . For example, it is possible to suitably avoid disturbing the flow of gas entering the introduction part 55 from the processing housing 23 by a member provided in the processing housing 23 .

The air supply pipe 48 supplies gas to the processing housing 23 . The second piping space 46 accommodates the air supply pipe 48 . The second piping space 46 is adjacent to the processing housing 23 . Accordingly, the air supply pipe 48 can easily supply the gas to the processing housing 23 .

The first piping space 44A, the processing housing 23A, and the second piping space 46 are arranged in this order in the front-back direction X. For this reason, the 1st piping space 44 and the 2nd piping space 46 are spaced apart by the processing housing 23. As shown in FIG. Therefore, the arrangement of the exhaust pipes 41-43 is not limited by the air supply pipe 48 . That is, the degree of freedom in the arrangement of the exhaust pipes 41-43 can be appropriately increased. For example, the exhaust pipes 41 - 43 can be easily installed in the vicinity of the processing housing 23 .

The processing housing 23A will be described as an example. The substrate processing apparatus 1 includes a processing housing 23A2 . The processing housing 23A2 is disposed below the processing housing 23A1 . For this reason, the installation area of processing housing 23A1, 23A2 in planar view can be made small suitably. Therefore, increase in the footprint of the substrate processing apparatus 1 can be suppressed suitably.

The substrate processing apparatus 1 is provided with the switching mechanism 51A2. The switching mechanism 51A2 switches the exhaust path of the processing housing 23A2 to one of the exhaust pipes 41A-43A. Accordingly, the exhaust pipes 41A-43A discharge gas from the processing housing 23A2 in addition to the gas from the processing housing 23A1, respectively. Therefore, the structure of the substrate processing apparatus 1 can be simplified.

The switching mechanism 51A2 is disposed at a position substantially flush with the processing housing 23A2 . For this reason, the flow path between the processing housing 23A2 and the switching mechanism 51A2 can be suitably shortened. As a result, the gas can be properly discharged from the processing housing 23A2.

The processing housing 23A2 is arranged at the same position as the processing housing 23A1 in a plan view. The switching mechanism 51A2 is arrange|positioned at the same position as the switching mechanism 51A1 in planar view. For this reason, the relative positions of the processing housing 23A2 and the switching mechanism 51A2 are substantially the same as the relative positions of the processing housing 23A1 and the switching mechanism 51A1 . Accordingly, the flow path between the processing housing 23A2 and the switching mechanism 51A2 has the same length and the same shape as the flow path between the processing housing 23A1 and the switching mechanism 51A1 . Therefore, the conditions for discharging the gas between the processing housings 23A1 and 23A2 can be easily made the same. For example, it is possible to suppress the exhaust pressure from becoming non-uniform between the processing housings 23A1 and 23A2. For example, it is possible to suppress a non-uniform exhaust flow rate between the processing housings 23A1 and 23A2. As a result, the quality of the processing performed on the substrate W between the processing housings 23A1 and 23A2 can be suitably equalized.

The switching mechanism 51A2 is arrange|positioned at the same position as the switching mechanism 51A1 in planar view. The exhaust pipe 41A extends in the vertical direction Z. Accordingly, the switching mechanisms 51A1 and 51A2 can be easily connected to the exhaust pipe 41A, respectively. Similarly, the exhaust pipes 42A and 43A extend in the vertical direction Z, respectively. Accordingly, the switching mechanisms 51A1 and 51A2 can be easily connected to the exhaust pipes 42A and 43A, respectively.

Similarly, the substrate processing apparatus 1 includes processing housings 23A3-23A6. The processing housings 23A3-23A6 are respectively disposed below the processing housing 23A1. Therefore, the increase in the footprint of the substrate processing apparatus 1 can be suppressed further suitably.

The substrate processing apparatus 1 is provided with switching mechanisms 51A3-51A6. The switching mechanisms 51A3-51A6 respectively switch the exhaust path of the processing housing 23A3-23A6 to one of the exhaust pipes 41A-43A. Accordingly, the exhaust pipes 41A-43A exhaust gas from the processing housings 23A1-23A6, respectively. Accordingly, the structure of the substrate processing apparatus 1 can be further simplified.

The processing housing 23A3-23A6 is arranged at the same position as the processing housing 23A1 in a plan view. Each of the switching mechanisms 51A3-51A6 is arranged at the same position as the switching mechanism 51A1 in plan view. For this reason, the relative positions of the processing housing 23A3-23A6 and the switching mechanism 51A3-51A6 are substantially the same as the relative positions of the processing housing 23A1 and the switching mechanism 51A1 . As a result, the quality of the processing performed on the substrate W among the processing housings 23A1-23A6 can be suitably equalized.

Each of the switching mechanisms 51A3-51A6 is arranged at the same position as the switching mechanism 51A1 in plan view. The exhaust pipes 41A-43A extend in the vertical direction Z, respectively. Accordingly, the switching mechanisms 51A3-51A6 can be easily connected to the exhaust pipes 41A-43A, respectively.

The pressure sensor 71 measures the pressure of the gas on the primary side of the switching mechanism 51 . The pressure adjusting mechanism 73 adjusts the pressure of the gas on the primary side of the switching mechanism 51 based on the detection result of the pressure sensor 71 . For this reason, the pressure of the primary side of the switching mechanism 51 can be adjusted suitably. Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be appropriately improved.

The pressure adjusting mechanism 73 adjusts, for example, so that the exhaust pressure becomes constant. Accordingly, it is possible to suppress fluctuations in exhaust pressure when processing is performed on the substrate W in the processing housing 23 . Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be appropriately improved.

The pressure adjustment mechanisms 73A1 and 73A2 make the pressure of the gas on the primary side of the switching mechanism 51A1 equal to the pressure of the gas on the primary side of the switching mechanism 51A2, for example. Accordingly, the exhaust pressure when the processing is performed on the substrate W in the processing housing 23A1 and the exhaust pressure when the processing is performed on the substrate W in the processing housing 23A2 can be suitably equalized. have. Therefore, between the processing housings 23A1 and 23A2 arranged in the vertical direction Z, the quality of the processing performed on the substrate W can be suitably equalized.

The pressure adjustment mechanisms 73A1-73A6 equalize the pressure of the gas on the primary side of the switching mechanisms 51A1-51A6, for example. Thereby, the quality of the process performed to the board|substrate W can be suitably made equal among all the process housings 23A1-23A6 arranged in the vertical direction Z.

The pressure adjustment mechanisms 73A1 and 73B1 make the pressure of the gas on the primary side of the switching mechanism 51A1 equal to the pressure of the gas on the primary side of the switching mechanism 51B1, for example. Thereby, between the processing housings 23A1 and 23B1 disposed at the same height, the quality of the processing performed on the substrate W can be suitably equalized.

The pressure adjusting mechanisms 73A1, 73B1, 73C1, and 73D1 equalize the pressure of the gas on the primary side of the switching mechanisms 51A1, 51B1, 51C1, and 51D1, for example. Thereby, among all the processing housings 23A1 , 23B1 , 23C1 , and 23D1 arranged at the same height, the quality of the processing performed on the substrate W can be suitably equalized.

The pressure adjustment mechanism 73 equalizes the pressure of the gas on the primary side of each switching mechanism 51 , for example. Thereby, in all the processing housings 23 , the quality of the processing performed on the substrate W can be suitably equalized.

The exhaust pipe 81A is connected to the exhaust pipes 41A and 41B. The exhaust pipe 81A discharges gas from the exhaust pipes 41A and 41B. In this way, the two exhaust pipes 41A and 41B are integrated into one exhaust pipe 81A. For this reason, the structure of the substrate processing apparatus 1 can be simplified.

Similarly, the exhaust pipe 82A is connected to the exhaust pipes 42A and 42B. The exhaust pipe 82A discharges gas from the exhaust pipes 42A and 42B. The exhaust pipe 83A is connected to the exhaust pipes 43A and 43B. The exhaust pipe 83A discharges gas from the exhaust pipes 43A and 43B. For this reason, the structure of the substrate processing apparatus 1 can be further simplified.

The pressure sensor 84 measures the pressure of the gas inside the exhaust pipe 81 . The pressure adjusting mechanism 87 adjusts the pressure of the gas inside the exhaust pipe 81 based on the detection result of the pressure sensor 84 . For this reason, the pressure inside the exhaust pipe 81 can be adjusted suitably. Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be further appropriately improved.

Similarly, the pressure sensors 85 and 86 measure the pressure of the gas inside the exhaust pipes 82 and 83 . The pressure adjusting mechanisms 88 and 89 adjust the pressure of the gas inside the exhaust pipes 82 and 83 based on the detection results of the pressure sensors 85 and 86 . For this reason, the pressure inside the exhaust pipes 82 and 83 can be suitably adjusted. Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be appropriately improved.

The exhaust pipe 81A will be described as an example. The pressure sensor 84A is provided downstream from the connection position of the exhaust pipe 81A and the exhaust pipe 41A, and the connection position of the exhaust pipe 81A and the exhaust pipe 41B. At a position downstream of the connection position between the exhaust pipe 81A and the exhaust pipe 41A and the connection position between the exhaust pipe 81A and the exhaust pipe 41B, both the gas from the exhaust pipe 41A and the gas from the exhaust pipe 41B everyone flows Accordingly, the pressure sensor 84A can suitably detect the exhaust pressure of the entire exhaust pipe 41A, 41B.

Similarly, the pressure sensor 85A is provided downstream from the connection position of the exhaust pipe 82A and the exhaust pipe 42A, and the connection position of the exhaust pipe 82A and the exhaust pipe 42B. Accordingly, the pressure sensor 85A can suitably detect the exhaust pressure of the entire exhaust pipe 42A, 42B. The pressure sensor 86A is provided at a position downstream from the connection position of the exhaust pipe 83A and the exhaust pipe 43A, and the connection position of the exhaust pipe 83A and the exhaust pipe 43B. Accordingly, the pressure sensor 86A can suitably detect the exhaust pressure of the entire exhaust pipe 43A, 43B.

For example, the pressure adjusting mechanism 87 adjusts the exhaust pressure to become constant. Similarly, the pressure adjustment mechanisms 88 and 89 adjust the exhaust pressure to become constant. Accordingly, it is possible to suppress fluctuations in exhaust pressure when processing is performed on the substrate W in the processing housing 23 . Accordingly, the quality of the processing performed on the substrate W in the processing housing 23 can be appropriately improved.

The pressure adjusting mechanisms 87A-89A make the pressure of the gas inside the exhaust pipe 81A equal to the pressure of the gas inside the exhaust pipe 82A and the pressure of the gas inside the exhaust pipe 83A, for example. Thereby, the exhaust pressure can be suitably made equal between the exhaust pipes 41A-43A and 41B-43B. Accordingly, it is possible to suppress fluctuations in the exhaust pressure when the exhaust paths of the processing housings 23A and 23B are switched. Accordingly, the quality of the processing performed on the substrate W in the processing housings 23A and 23B can be appropriately improved.

The pressure adjusting mechanisms 87A and 87B make the pressure of the gas inside the exhaust pipe 81A equal to the pressure of the gas inside the exhaust pipe 81B, for example. Thereby, even if the exhaust pipes 81A and 81B have different lengths, it is possible to suppress the exhaust pressure from becoming non-uniform between the exhaust pipes 81A and 81B. Accordingly, the exhaust pressure can be equalized between the exhaust pipes 41A and 41B and the exhaust pipes 41C and 41D. Accordingly, between the processing housings 23A and 23B and the processing housings 23C and 23D, the quality of the processing performed on the substrate W can be suitably equalized.

The pressure adjusting mechanisms 87A-89A, 87B-89B equalize the pressure of the gas inside the exhaust pipes 81A-83A, 81B-83B, for example. Thereby, even if the exhaust pipes 81A-83A, 81B-83B have different lengths, it is possible to suppress non-uniform exhaust pressure between the exhaust pipes 81A-83A, 81B-83B. Accordingly, the exhaust pressure can be equalized among the exhaust pipes 41A-43A, 41B-43B, 41C-43C, and 41D-43D. Accordingly, the quality of the processing performed on the substrate W among the processing housings 23A, 23B, 23C, and 23D can be made more suitable.

The liquid supply unit 33 can supply the first processing liquid, the second processing liquid, and the third processing liquid. The liquid supply unit 33 switches the processing liquid to be supplied between the first processing liquid, the second processing liquid, and the third processing liquid. According to the switching of the processing liquid used in the processing housing 23 , the switching mechanism 51 switches the exhaust path of the processing housing 23 between the exhaust pipes 41 - 43 . When the liquid supply unit 33 supplies the first processing liquid, the switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 41 . When the liquid supply unit 33 supplies the second processing liquid, the switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 42 . When the liquid supply unit 33 supplies the third processing liquid, the switching mechanism 51 switches the exhaust path of the processing housing 23 to the exhaust pipe 43 . As a result, when the liquid supply unit 33 supplies the first processing liquid, the exhaust pipe 41 discharges the gas from the processing housing 23 . When the liquid supply unit 33 supplies the second treatment liquid or the third treatment liquid, the exhaust pipe 41 does not discharge gas from the treatment housing 23 . Therefore, it can suppress suitably that the inside of the exhaust pipe 41 is contaminated. For the same reason, it is also possible to appropriately suppress the interior of the exhaust pipes 42 and 43 from being contaminated. Accordingly, the gas smoothly flows through the exhaust pipes 41-43. As a result, the gas in the processing housing 23 can be more appropriately discharged.

In addition, it is possible to suitably suppress the inside of the exhaust pipes 81-83 from being contaminated. Therefore, the gas smoothly flows through the exhaust pipes 81-83. As a result, the gas in the processing housing 23 can be more appropriately discharged.

The present invention is not limited to the embodiment, and can be modified as follows.

In the embodiment, the switching mechanism 51 switches the gas exhaust path of the processing housing 23 to one of the exhaust pipes 41 - 43 . That is, the switching mechanism 51 switches between the three exhaust pipes (specifically, the exhaust pipes 41-43). However, the present invention is not limited thereto. The switching mechanism 51 may switch between the two exhaust pipes. For example, the exhaust pipe 43 may be omitted. In this case, the switching mechanism 51 switches the exhaust path of the processing housing 23 to one of the exhaust pipes 41 and 42 . The switching mechanism 51 switches the exhaust path of the processing housing 23 between the exhaust pipes 41 and 42 . The switching mechanism 51 may switch between four or more exhaust pipes. For example, the substrate processing apparatus 1 may be provided with an additional exhaust pipe in addition to the exhaust pipes 41 - 43 . In this case, the switching mechanism 51 switches the exhaust path of the processing housing 23 to one of the exhaust pipes 41 - 43 and the additional exhaust pipe. The switching mechanism 51 switches the exhaust path of the processing housing 23 between the exhaust pipe 41 - 43 and the additional exhaust pipe.

In the embodiment, the exhaust pipes 41 - 43 are disposed between the processing housing 23 and the distribution unit 56 in a plan view. However, the present invention is not limited thereto. The distribution unit 56 may be disposed between the exhaust pipe 41 - 43 and the processing housing 23 in a plan view.

13 is a plan view of the processing unit 21 in the modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

The substrate processing apparatus 1 includes a switching mechanism 101 . The switching mechanism 101 includes a switching housing 103 . The conversion housing 103 has a distribution part 106 . The distribution unit 106 is provided outside the processing housing 23 . The distribution unit 106 is provided in the first piping space 44 . The distribution unit 106 is in contact with the processing housing 23 . The distribution unit 106 is disposed between the processing housing 23 and the exhaust pipes 41 - 43 in a plan view. Specifically, the distribution portion 106 abuts against the sidewall 25b of the processing housing 23 . The distribution unit 106 is disposed between the side wall 25b and the exhaust pipes 41-43.

In the embodiment, a part of the switching mechanism 51 (eg, the first stage 55a ) is disposed inside the processing housing 23 . However, the present invention is not limited thereto. All of the switching mechanism 51 may be disposed outside the processing housing 23 . Similarly, in the embodiment, a part of the conversion housing 53 (eg, the first end 55a ) is disposed inside the processing housing 23 . However, the present invention is not limited thereto. The entire conversion housing 53 may be disposed outside the processing housing 23 .

See FIG. 13 . The switching mechanism 101 has an introduction part 105 . The introduction part 105 extends in the front-rear direction (X). The introduction portion 105 has a first end 105a and a second end 105b. The first stage 105a corresponds to an upstream end of the switching space 54 . The first end 105a is disposed on the sidewall 25b of the processing housing 23 . The first end 105a is connected to the sidewall 25b of the processing housing 23 . The first stage 105a is not disposed inside the processing housing 23 . The second stage 105b is provided outside the processing housing 23 . For this reason, the whole of the introduction part 105 is provided outside the processing housing 23 . As a result, the entire switching housing 103 is provided outside the processing housing 23 . The entire switching mechanism 101 is provided outside the processing housing 23 . Here, the outside of the processing housing 23 is, specifically, the first piping space 44 .

In the embodiment, a part of the switching mechanism 51 (eg, the first stage 55a ) is provided inside the processing housing 23 . However, the present invention is not limited thereto. All of the switching mechanism 51 may be provided inside the processing housing 23 . Similarly, in the embodiment, a part of the switching housing 53 is disposed inside the processing housing 23 . However, the present invention is not limited thereto. The entire conversion housing 53 may be disposed inside the processing housing 23 . In the embodiment, the opening and closing portions 61 - 63 are disposed outside the processing housing 23 . However, the present invention is not limited thereto. The opening/closing portions 61 - 63 may be disposed inside the processing housing 23 .

14 is a plan view of the processing unit 21 in the modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment. 14 shows the liquid supply part 33 briefly for convenience.

The exhaust pipes 41 - 43 are provided in the first piping space 44 . The openings k1-k3 of the exhaust pipes 41-43 respectively contact the processing housing 23 (specifically, the side wall 25b).

The substrate processing apparatus 1 includes a switching mechanism 111 . The switching mechanism 111 includes opening and closing portions 113 , 114 , 115 . The opening and closing parts 113 - 115 are respectively installed inside the processing housing 23 . The opening/closing portions 113 to 115 are provided in the vicinity of the side wall 25b, respectively. The opening/closing portions 113 to 115 are disposed at positions opposite to the openings 41k to 43k, respectively.

Each of the opening/closing units 113-115 has the same structure as the opening/closing units 61-63, respectively. The opening/closing part 113 is movable to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is cut off from the exhaust pipe 41 . The opening/closing part 114 is movable to a position where the processing housing 23 communicates with the exhaust pipe 42 and a position where the processing housing 23 is cut off from the exhaust pipe 42 . The opening/closing part 115 is movable to a position in which the processing housing 23 communicates with the exhaust pipe 43 and a position in which the processing housing 23 is blocked from the exhaust pipe 43 .

In this way, all of the switching mechanism 111 is provided inside the processing housing 23 .

In the modified embodiment shown in FIG. 14, the switching mechanism 111 may be provided with a switching housing, and does not need to be equipped with a switching housing. When the switching mechanism 111 includes the switching housing, the entire switching housing of the switching mechanism 111 may be provided inside the processing housing 23 .

In the embodiment, the switching mechanism 51 includes a switching housing 53 . However, the present invention is not limited thereto. As illustrated in the modified embodiment of FIG. 14 , the switching housing 53 may be appropriately omitted.

In the embodiment, the switching housing 53 is not connected to the cup 38 . However, the present invention is not limited thereto. The switching housing 53 may be connected to the cup 38 . The switching housing 53 may form a flow path from the inside of the cup 38 to the exhaust pipes 41 - 43 .

In the embodiment, when the opening/closing unit 61 is in a position to communicate the processing housing 23 with the exhaust pipe 41 , the opening/closing unit 61 does not block the processing housing 23 from the exhaust pipes 42 , 43 . However, the present invention is not limited thereto. When the opening/closing unit 61 is at a position where the processing housing 23 communicates with the exhaust pipe 41 , the opening/closing unit 61 may block the processing housing 23 from the exhaust pipes 42 , 43 . Similarly, in the embodiment, when the opening/closing unit 62 is in a position to communicate the processing housing 23 with the exhaust pipe 42 , the opening/closing unit 62 does not block the processing housing 23 from the exhaust pipe 43 . However, the present invention is not limited thereto. When the opening/closing unit 62 is in a position where the processing housing 23 communicates with the exhaust pipe 42 , the opening/closing unit 62 may block the processing housing 23 from the exhaust pipe 43 .

15 is a plan view of the processing unit 21 in the modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

The substrate processing apparatus 1 includes a switching mechanism 121 . The switching mechanism 121 includes opening and closing portions 123 and 124 . The opening/closing parts 123 and 124 are provided inside the switching housing 53 . That is, the opening/closing parts 123 and 124 are provided in the switching space 54 . The opening/closing portions 123 and 124 are disposed at positions facing the openings 41k and 42k, respectively. The opening and closing part 123 opens and closes the opening 41k. The opening/closing part 124 opens and closes the opening 42k. In addition, the switching mechanism 121 is not provided with the member corresponding to the opening-and-closing part 63. As shown in FIG.

Gas flows through the switching space 54 in one direction. The gas flows from the introduction part 55 to the distribution part 56 . The openings 41k, 42k, and 43k communicate with the switching space 54, respectively. The position where the opening 42k and the switching space 54 communicate is downstream from the position where the opening 41k and the switching space 54 communicate. The position where the opening 43k and the switching space 54 communicate is downstream from the position where the opening 42k and the switching space 54 communicate.

Here, the transition space 54 is divided into a first zone 126 , a second zone 127 and a third zone 128 by imaginary boundaries B1 , B2 . Fig. 15 illustrates the positions of the boundaries B1 and B2 by dashed-dotted lines. The boundary B1 is located downstream from the position where the opening 41k and the switching space 54 communicate, and is located upstream from the position where the opening 42k and the switching space 54 communicate. The boundary B2 is located downstream from the position where the opening 42k and the switching space 54 communicate, and is located upstream from the position where the opening 43k and the switching space 54 communicate. The first zone 126 is a portion of the diversion space 54 located upstream of the boundary B1 . The second zone 127 is a portion of the transition space 54 located downstream of the boundary B1 and upstream of the boundary B2. The third zone 128 is a portion of the diversion space 54 located downstream of the boundary B2 .

The opening/closing part 123 is movable to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is cut off from the exhaust pipe 41 . FIG. 15 shows the opening/closing portion 123 at a position where the processing housing 23 communicates with the exhaust pipe 41 by a solid line. In FIG. 15 , the opening/closing portion 123 at a position to block the processing housing 23 from the exhaust pipe 41 is indicated by a broken line.

When the opening/closing portion 123 is in a position to communicate the treatment housing 23 to the exhaust pipe 41, the opening/closing portion 123, in addition to opening the opening 41k, opens the first zone 126 to the second zone ( 127). That is, when the opening/closing unit 123 connects the processing housing 23 to the exhaust pipe 41 , the opening/closing unit 123 blocks the processing housing 23 from the exhaust pipes 42 and 43 . When the opening/closing portion 123 is in a position to block the treatment housing 23 from the exhaust pipe 41, the opening/closing portion 123, in addition to closing the opening 41k, is configured to close the first zone 126 to the second zone ( 127). That is, when the opening/closing unit 123 blocks the processing housing 23 from the exhaust pipe 41 , the opening/closing unit 123 does not block the processing housing 23 from the exhaust pipes 42 and 43 .

The opening/closing part 124 is movable to a position in which the processing housing 23 communicates with the exhaust pipe 42 and a position in which the processing housing 23 is blocked from the exhaust pipe 42 . In FIG. 15 , the opening/closing portion 124 at a position for communicating the processing housing 23 with the exhaust pipe 42 is indicated by a solid line. In FIG. 15 , the opening/closing portion 124 in a position to block the processing housing 23 from the exhaust pipe 42 is indicated by a broken line.

When the opening/closing portion 124 is in a position that communicates the treatment housing 23 to the exhaust pipe 42, the opening/closing portion 124, in addition to opening the opening 42k, opens the second zone 127 to the third zone ( 128). That is, when the opening/closing unit 124 communicates the processing housing 23 with the exhaust pipe 42 , the opening/closing unit 124 blocks the processing housing 23 from the exhaust pipe 43 . When the opening/closing portion 124 is in a position to block the treatment housing 23 from the exhaust pipe 42, the opening/closing portion 124, in addition to closing the opening 42k, opens the second zone 127 to the third zone ( 128). That is, when the opening/closing unit 124 blocks the processing housing 23 from the exhaust pipe 42 , the opening/closing unit 124 does not block the processing housing 23 from the exhaust pipe 43 .

When the switching mechanism 121 switches the exhaust path of the processing housing 23 to the exhaust pipe 41 , the opening/closing unit 123 moves to a position where the processing housing 23 communicates with the exhaust pipe 41 . The opening/closing unit 124 may move to any of a position where the processing housing 23 communicates with the exhaust pipe 42 and a position where the processing housing 23 is cut off from the exhaust pipe 42 . In other words, the opening/closing portion 124 may open the opening 42k or close the opening 42k.

When the switching mechanism 121 switches the exhaust path of the processing housing 23 to the exhaust pipe 42 , the opening/closing unit 123 moves to a position that blocks the processing housing 23 from the exhaust pipe 41 . The opening/closing part 124 moves to a position where the processing housing 23 communicates with the exhaust pipe 42 .

When the switching mechanism 121 switches the exhaust path of the processing housing 23 to the exhaust pipe 43 , the opening/closing unit 123 moves to a position that blocks the processing housing 23 from the exhaust pipe 41 . The opening/closing unit 124 moves to a position that blocks the processing housing 23 from the exhaust pipe 42 .

According to this modified embodiment, the member corresponding to the opening-and-closing part 63 can be abbreviate|omitted. That is, the number of the opening/closing parts 123 and 124 is at least sufficient than the number of the exhaust pipes 41-43. Therefore, the structure of the switching mechanism 121 can be simplified.

When the switching mechanism 121 switches the exhaust path of the treatment housing 23 to the exhaust pipe 41 , it is possible to prevent the gas from flowing into the second zone 127 and the third zone 128 , and the gas can be Retention in the second zone 127 and the third zone 128 can be suitably prevented. Accordingly, the gas in the processing housing 23 can be more appropriately discharged.

When the switching mechanism 121 switches the exhaust path of the treatment housing 23 to the exhaust pipe 42 , it is possible to prevent the gas from flowing into the third zone 128 , and the gas to stay in the third zone 128 . can be appropriately prevented. Accordingly, the gas in the processing housing 23 can be more appropriately discharged.

In the embodiment, the rotation axis A1 of the opening/closing unit 61 passes through the first end of the opening/closing unit 61 . However, the present invention is not limited thereto. The position of the rotation axis A1 of the opening/closing portion 61 can be appropriately changed.

16 is a plan view of the processing unit 21 in the modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

The substrate processing apparatus 1 includes a switching mechanism 131 . The switching mechanism 131 includes opening and closing portions 133 and 134 . The opening/closing portions 133 and 134 are provided inside the switching housing 53 . The opening/closing portions 133 and 134 are disposed at positions opposite to the openings 41k and 42k, respectively. The opening and closing part 133 opens and closes the opening 41k. The opening/closing portion 134 opens and closes the opening 42k. In addition, the switching mechanism 131 is not provided with the member corresponding to the opening-and-closing part 63. As shown in FIG.

The opening/closing part 133 has a substantially T-shape in planar view. The opening/closing portion 133 includes a plate portion 133a and a base portion 133b. The plate 133a has a substantially vertical flat plate shape. The base part 133b is connected to the center part of the plate part 133a in planar view. The base 133b protrudes from the plate portion 133a in the horizontal direction. The opening/closing part 133 swings around the rotation axis A4. The rotation axis A4 is an imaginary line parallel to the vertical direction Z. The rotation axis A4 passes through the base 133b. The rotation axis A4 does not pass through the plate portion 133a. The opening/closing part 133 swings around the rotation axis A4.

The opening/closing unit 134 has the same structure as the opening/closing unit 133 . That is, the opening/closing portion 134 includes a plate portion 134a and a base portion 134b. The opening/closing part 134 swings around the rotation axis A5.

The opening/closing part 133 is movable to a position where the processing housing 23 communicates with the exhaust pipe 41 and a position where the processing housing 23 is cut off from the exhaust pipe 41 . In FIG. 16 , the opening/closing portion 133 at a position for communicating the processing housing 23 with the exhaust pipe 41 is indicated by a solid line. In FIG. 16 , the opening/closing portion 133 at a position to block the processing housing 23 from the exhaust pipe 41 is indicated by a broken line.

The opening/closing part 134 is movable to a position in which the processing housing 23 communicates with the exhaust pipe 42 and a position in which the processing housing 23 is cut off from the exhaust pipe 42 . In FIG. 16 , the opening/closing portion 134 at a position for communicating the processing housing 23 with the exhaust pipe 42 is indicated by a broken line. In FIG. 16 , the opening/closing portion 134 at a position to block the processing housing 23 from the exhaust pipe 42 is indicated by a solid line.

The opening-and-closing parts 133, 134 have the same function as the opening-and-closing parts 123, 124 shown in FIG. For example, when the opening/closing unit 133 is in a position to communicate the processing housing 23 with the exhaust pipe 41 , the opening/closing unit 133 blocks the processing housing 23 from the exhaust pipes 42 , 43 . When the opening/closing portion 134 is in a position to communicate the treatment housing 23 with the exhaust pipe 42 , the opening/closing portion 134 blocks the processing housing 23 from the exhaust pipe 43 .

In the embodiment, the liquid supply unit 33 supplies the first processing liquid, the second processing liquid, and the third processing liquid. That is, the number of types of the processing liquid that the liquid supply unit 33 can supply is three. However, the present invention is not limited thereto. The number of types of processing liquids that the liquid supply unit 33 can supply may be less than three. The number of types of processing liquids that the liquid supply unit 33 can supply may be greater than three.

For example, the liquid supply unit 33 may be capable of supplying the fourth processing liquid. The fourth treatment liquid is classified into, for example, a rinse liquid. The fourth treatment liquid contains, for example, at least one of pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water, and diluted hydrochloric acid water.

In an embodiment, the processing unit 21 may further include a processing gas supply unit. The processing gas supply unit is installed inside the processing housing 23 . The processing gas supply unit supplies the processing gas to the substrate W held by the holding unit 31 . The processing gas supply unit supplies at least one type of processing gas. The processing gas is, for example, a gas other than clean air.

When the processing unit 21 includes the processing gas supply unit, the switching mechanism 51 may operate as follows. The switching mechanism 51 may switch the exhaust path of the processing housing 23 according to switching between use and non-use of the processing gas in the processing housing 23 . When the processing gas used in the processing housing 23 is switched among the plurality of types of processing gases, the switching mechanism 51 switches the exhaust path of the processing housing 23 according to the type of processing gas being switched. You can do it. The switching mechanism 51 may switch the exhaust path of the processing housing 23 according to the switching between the supply of the processing liquid and the supply of the processing gas.

In the embodiment, the liquid supply unit 33 supplies the first processing liquid, the second processing liquid, and the third processing liquid to the substrate W held by the holding unit 31 in this order. However, the present invention is not limited thereto. The order of supplying the first processing liquid, the second processing liquid, and the third processing liquid may be appropriately changed.

In the embodiment, the number of processing housings 23 provided at substantially the same height is four. However, the present invention is not limited thereto. The number of processing housings 23 provided at substantially the same height position may be less than four or more than four. In the above-described embodiment, the number of processing housings 23 arranged in the vertical direction Z is six. However, the present invention is not limited thereto. The number of processing housings 23 arranged in the vertical direction Z may be less than six or more than six.

In embodiment, the substrate processing apparatus 1 is equipped with two conveyance spaces 12A, 12B. That is, the number of the conveyance spaces 12 is two. However, the present invention is not limited thereto. For example, the number of the conveyance spaces 12 may be one. For example, you may abbreviate|omit the conveyance space 12B. For example, the number of the conveyance spaces 12 may be three or more.

In embodiment, the number of the conveyance mechanisms 16 provided in one conveyance space 12 is one. However, the present invention is not limited thereto. For example, the number of the conveyance mechanisms 16 provided in one conveyance space 12 may be two or more.

In the embodiment, the first piping space 44A is disposed in front of the processing housing 23A. The second piping space 46A is disposed behind the processing housing 23A. However, the present invention is not limited thereto. The relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A may be appropriately changed.

17 : is a top view which shows the inside of the substrate processing apparatus 141 in a modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

In the substrate processing apparatus 141 , the first piping space 44A is disposed behind the processing housing 23A. The second piping space 46A is disposed in front of the processing housing 23A.

In addition, in the substrate processing apparatus 141 , the first piping space 44B is disposed behind the processing housing 23B. The second piping space 46B is disposed in front of the processing housing 23B. The first piping space 44C is disposed in front of the processing housing 23C. The second piping space 46C is disposed behind the processing housing 23C. The first piping space 44D is disposed in front of the processing housing 23D. The second piping space 46D is disposed behind the processing housing 23D.

Also in the substrate processing apparatus 141 , the relative positions of the processing housing 23B, the first piping space 44B, and the second piping space 46B are the processing housing 23A, the first piping space 44A, and the second piping space 44A. 2 It is the same as the relative position of the piping space 46A. The relative positions of the processing housing 23C, the first piping space 44C, and the second piping space 46C are the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. same as The relative positions of the processing housing 23D, the first piping space 44D, and the second piping space 46D are the relative positions of the processing housing 23A, the first piping space 44A, and the second piping space 46A. same as

In the embodiment, the exhaust pipes 41A-43A are disposed in front of the processing housing 23A. However, the present invention is not limited thereto.

See FIG. 17 . In the substrate processing apparatus 141 , the exhaust pipes 41A - 43A are disposed behind the processing housing 23A.

In addition, in the substrate processing apparatus 141 , the exhaust pipes 41B - 43B are disposed behind the processing housing 23B. The exhaust pipes 41C-43C are disposed in front of the processing housing 23C. The exhaust pipes 41D-43D are disposed in front of the processing housing 23D.

In embodiment, the structure of the conveyance mechanism 6 of the indexer part 3 is illustrated. However, the present invention is not limited thereto. You may change the structure of the conveyance mechanism 6 suitably.

See FIG. 17 . The indexer unit 3 includes a conveying mechanism 146 . The conveyance mechanism 146 includes a hand 147 and a hand drive unit 148 . The hand 147 holds the one board|substrate W in a horizontal attitude|position. The hand drive unit 148 is connected to the hand 147 . The hand drive unit 148 moves the hand 147 . The hand drive unit 148 moves the hand 147 in the front-rear direction (X), the width direction (Y), and the vertical direction (Z).

The hand drive unit 148 includes a first drive unit 148a and a second drive unit 148b. The second driving unit 148b is supported by the first driving unit 148a. The first driving unit 148a moves the second driving unit 148b in the vertical direction Z. The first driving unit 148a also rotates the second driving unit 148b around a rotation axis parallel to the vertical direction Z. However, the first driving unit 148a does not move the second driving unit 148b in the horizontal direction. The first driving unit 148a itself is not movable in the horizontal direction. The second driving unit 148b moves in the horizontal direction with respect to the first driving unit 148a. The 2nd drive part 148b is comprised with the articulated arm, for example. The second driving unit 148b is connected to the hand 147 . Since the hand drive unit 148 has such a configuration, the hand 147 can move in parallel in the vertical direction (Z). The hand 147 can move in parallel in any horizontal direction. The hand 147 is rotatable in a horizontal plane.

In the embodiment, the structure of the conveying mechanism 16 of the processing block 11 is exemplified. However, the present invention is not limited thereto. You may change the structure of the conveyance mechanism 16 suitably. For example, the conveyance mechanism 16 may have the same structure as the conveyance mechanism 146 mentioned above.

In embodiment, as shown in FIG. 8, the opening-and-closing part 61 has a substantially rectangular shape when seen from the front. However, the present invention is not limited thereto. The shape of the opening/closing portion 61 may be appropriately changed. Similarly, you may change the shape of the opening-and-closing parts 62 and 63 suitably.

It is a front view of the switching mechanism of a modified embodiment. 19A and 19B are side views of a switching mechanism according to a modified embodiment. In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

See FIG. 18 . The substrate processing apparatus 1 includes a switching mechanism 151 . The switching mechanism 151 includes opening/closing portions 152 , 153 , and 154 . The opening/closing portions 152-154 are respectively installed inside the conversion housing 53 . Each of the opening and closing portions 152-154 has a substantially circular shape.

The opening/closing part 152 is swingable around the rotation axis A6. The rotation axis A6 is a horizontal virtual line. The rotation axis A6 is parallel to the width direction Y. The rotation axis A6 is disposed above the opening/closing portion 152 . The rotation axis A6 does not pass through the center of the opening/closing portion 152 . By swinging the opening/closing unit 152 around the rotation axis A6, the opening/closing unit 152 is positioned at a position where the processing housing 23 communicates with the exhaust pipe 41 and the processing housing 23 is blocked from the exhaust pipe 41 move to location Similarly, the opening/closing portions 153 and 154 are swingable around the rotation axes A7 and A8, respectively.

In FIG. 18 , the opening/closing unit 152 is disposed at a position that blocks the processing housing 23 from the exhaust pipe 41 . Similarly, the opening/closing portions 153 and 154 are disposed at positions that block the processing housing 23 from the exhaust pipes 42 and 43, respectively.

In FIG. 19A , the opening/closing unit 152 is disposed at a position that blocks the processing housing 23 from the exhaust pipe 41 . The opening/closing part 152 closes the opening 41k of the exhaust pipe 41 . In FIG. 19B , the opening/closing part 152 is disposed at a position where the processing housing 23 communicates with the exhaust pipe 41 . The opening/closing part 152 opens the opening 41k.

See Figures 19a and 19b. The opening/closing part 152 is supported by the switching housing 53 . The opening/closing unit 152 is supported by the distribution unit 56 . Specifically, the switching mechanism 151 includes a stay 156 and a mounting member 157 . The stay 156 is fixed to the switching housing 53 . The stay 156 is fixed to the distribution unit 56 . The mounting member 157 is supported by the stay 156 . The mounting member 157 is rotatable about the rotation axis A6 with respect to the stay 156 . The mounting member 157 is fixed to the opening/closing part 152 .

See FIG. 18 . Similar to the opening and closing portions 152, the opening and closing portions 153 and 154 are fixed to the mounting members 158 and 159, respectively.

In the embodiment, the mechanism for moving the opening/closing portions 61-63 is not specifically illustrated. So, with reference to FIGS. 19A and 19B, the mechanism for moving the opening/closing part 152 is illustrated.

The processing block 11 includes a driving unit 161 that moves the opening/closing unit 152 . In addition, the drive unit 161 is not an element of the switching mechanism 151 .

The driving unit 161 includes an actuator 161a. The actuator 161a generates power to move the opening/closing unit 152 . The actuator 161a is, for example, an air cylinder, a hydraulic cylinder, or an electric motor. The actuator 161a is disposed outside the switching housing 53 . The actuator 161a is arrange|positioned in the 1st piping space 44. As shown in FIG. The actuator 161a is disposed above the switching housing 53 . The actuator 161a is disposed above the distribution unit 56 .

The driving unit 161 includes a rod 161b. The rod 161b is connected to the actuator 161a. The rod 161b extends downward from the actuator 161a. The rod 161b passes through the switching housing 53 . At least a part of the rod 161b is disposed inside the conversion housing 53 . The actuator 161a moves the rod 161b in the vertical direction Z.

The driving unit 161 includes a link 161c. The link 161c is disposed inside the switching housing 53 . The link 161c connects the rod 161b and the mounting member 157 . The link 161c is rotatable about the axis A11 with respect to the rod 161b. The link 161c is rotatable about the axis A12 with respect to the mounting member 157 . The axes A11 and A12 are horizontal virtual lines, respectively. The axes A11 and A12 are parallel to the width direction Y, respectively.

When the actuator 161a moves the rod 161b in the vertical direction Z, the opening/closing part 152 rotates around the rotation axis A6. When the actuator 161a moves the rod 161b upward, the opening/closing part 152 moves to a position where the processing housing 23 communicates with the exhaust pipe 41 . When the actuator 161a moves the rod 161b downward, the opening/closing portion 152 moves to a position that blocks the processing housing 23 from the exhaust pipe 41 .

In the embodiment, it is also possible to detect a gas leak in the exhaust path of the processing housing 23 . For example, you may detect the gas leak from the opening-and-closing parts 61-63.

See Figures 18, 19a, 19b. The processing block 11 includes wind speed sensors 162 , 163 , and 164 . The wind speed sensor 162 is disposed in the vicinity of the opening/closing part 152 . The wind speed sensor 162 is disposed inside the switching housing 53 , for example. The wind speed sensor 162 is disposed inside the distribution unit 56 , for example. When the rotation axis A6 is disposed above the opening/closing unit 152 , the wind speed sensor 162 is preferably arranged below the opening/closing unit 152 . Similarly, the wind speed sensors 163 and 164 are disposed in the vicinity of the opening/closing portions 153 and 154 .

The wind speed sensor 162 detects the wind speed of the gas (specifically, the moving speed of the gas) in the vicinity of the opening/closing part 152 . Similarly, the wind speed sensors 163 and 164 detect the wind speed of the gas in the vicinity of the opening/closing parts 153 and 154 . The wind speed sensors 162-164 are, for example, a hot wire type anemometer.

The wind speed sensor 162 may further detect the wind direction of the gas (specifically, the moving direction of the gas) in the vicinity of the opening/closing part 152 . Similarly, the wind speed sensors 163 and 164 may further detect the wind direction of the gas in the vicinity of the opening-and-closing parts 153 and 154.

Although not illustrated, the control unit 91 is communicatively connected to the wind speed sensors 162-164. The control unit 91 acquires the detection result of the wind speed sensors 162-164.

The control part 91 determines the presence or absence of the leak of the gas from the opening/closing part 152 based on the detection result of the wind speed sensor 162. As shown in FIG. Leakage of gas from the opening/closing unit 152 is when the opening/closing unit 152 is disposed at a position that blocks the processing housing 23 from the exhaust pipe 41 , the opening/closing unit 152 moves from the processing housing 23 to the exhaust pipe 41 . Leaking the gas.

Specifically, the control unit 91 calculates the wind speed of the gas in the vicinity of the opening/closing unit 152 based on the detection result of the wind speed sensor 162 . The calculated wind speed of the gas in the vicinity of the opening/closing part 152 is called "measured value."

When the opening/closing unit 152 is disposed at a position that blocks the processing housing 23 from the exhaust pipe 41 , the control unit 91 monitors whether the measured value satisfies a predetermined condition. The predetermined condition is, for example, that the measured value is less than a preset first reference value. The predetermined condition is, for example, that the change in the measured value per unit time is less than the second reference value. When the opening/closing unit 152 is disposed at a position that blocks the processing housing 23 from the exhaust pipe 41, if the measured value does not satisfy a predetermined condition, gas leakage from the opening/closing unit 152 occurs. The control unit 91 determines.

Here, it is preferable that at least one of the first reference value and the second reference value is, for example, a variable. At least any one of the 1st reference value and the 2nd reference value may change according to the position of the other opening-and-closing parts 153 and 154, for example. At least any one of a 1st reference value and a 2nd reference value may change according to the position of the opening-and-closing part 152 which belongs to the other switching mechanism 151, for example. At least any one of a 1st reference value and a 2nd reference value may change according to the position of the opening-and-closing parts 152, 153, 154 belonging to the other switching mechanism 151, for example. According to this, even if it is a case where the wind speed of the gas in the vicinity of the opening/closing part 152 is easy to receive disturbance, the control part 91 can determine the presence or absence of the leak of the gas from the opening/closing part 152 with high precision.

Alternatively, at least one of the first reference value and the second reference value may be a constant.

Similarly, the control part 91 determines the presence or absence of the leak of the gas from the opening/closing parts 153 and 154 based on the detection result of the wind speed sensors 163 and 164.

According to this modified embodiment, it is possible to suitably monitor whether the exhaust path of the processing housing 23 is normally switched between the exhaust pipes 41 - 43 .

Moreover, the wind speed sensors 162-164 can detect the flow of a minute gas suitably. Accordingly, it is possible to monitor with high accuracy whether the exhaust path of the processing housing 23 is normally switched between the exhaust pipes 41 - 43 .

In the present modified embodiment, further, when the control unit 91 detects a gas leak in the exhaust passage, the control unit 91 issues an alarm and stops the operation of the liquid supply unit 33 . You may run at least one of them. When the control part 91 issues an alarm, the user of the substrate processing apparatus 1 can be informed of the leak of the gas in an exhaust path quickly. When the control unit 91 stops the operation of the liquid supply unit 33 , the amount of a component derived from the processing liquid included in the gas in the processing housing 23 can be quickly suppressed. In either case, it is possible to suitably suppress the inside of the exhaust pipes 41-43 from being contaminated. For example, generation of crystals (salts) inside the exhaust pipes 41-43 can be suitably suppressed. For example, it is possible to suitably suppress the deposition of crystals inside the exhaust pipes 41-43.

In the modified embodiment shown to FIGS. 18 , 19A , and 19B , the wind speed sensors 162-164 are disposed inside the switching housing 53 . However, the present invention is not limited thereto.

For example, the wind speed sensor 162 may be disposed inside the exhaust pipe 41 . Even when the wind speed sensor 162 is disposed inside the exhaust pipe 41 , an appropriate reference value included in a predetermined condition may be preset. Therefore, the control part 91 can determine suitably the presence or absence of the leak of the gas from the opening-and-closing part 152. You may change similarly also about arrangement|positioning of the wind speed sensors 163 and 164.

For example, the wind speed sensor 162 may be disposed inside the processing housing 23 . Even when the wind speed sensor 162 is disposed inside the processing housing 23 , an appropriate reference value included in a predetermined condition may be set in advance. Therefore, the control part 91 can determine suitably the presence or absence of the leak of the gas from the opening-and-closing part 152. You may change similarly also about arrangement|positioning of the wind speed sensors 163 and 164.

With reference to the drawings, the arrangement of the wind speed sensors 162-164 is illustrated. FIG. 20A is a plan view illustrating an arrangement example of a wind speed sensor in addition to FIG. 6 . Fig. 20B is a plan view illustrating an arrangement example of a wind speed sensor in addition to Fig. 13 . FIG. 21A is a plan view illustrating an arrangement example of a wind speed sensor in addition to FIG. 15 . Fig. 21B is a plan view illustrating an arrangement example of a wind speed sensor in addition to Fig. 16 . In addition, detailed description is abbreviate|omitted by attaching|subjecting the same code|symbol about the structure similar to embodiment.

See FIG. 20A. The wind speed sensor 162 includes at least one of the wind speed sensors 162a and 162b. The wind speed sensors 162a and 162b are arranged in the vicinity of the opening/closing part 61, respectively. The wind speed sensor 162a is disposed inside the exhaust pipe 41 . The wind speed sensor 162a is arrange|positioned in the vicinity of the opening 41k. The wind speed sensor 162b is disposed inside the switching housing 53 . Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163a and 163b. The wind speed sensor 164 includes at least one of the wind speed sensors 164a and 164b.

See Figure 20b. The wind speed sensor 162 includes at least one of the wind speed sensors 162c and 162d. The wind speed sensors 162c and 162d are arranged in the vicinity of the opening/closing part 113, respectively. The wind speed sensor 162c is disposed inside the processing housing 23 . The wind speed sensor 162d is disposed inside the exhaust pipe 41 . The wind speed sensor 162d is arrange|positioned in the vicinity of the opening 41k. Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163c and 163d. The wind speed sensor 164 includes at least one of the wind speed sensors 164c and 164d.

See Figure 21a. The wind speed sensor 162 includes at least one of the wind speed sensors 162e, 162f, and 162g. The wind speed sensors 162e - 162g are respectively arranged in the vicinity of the opening/closing portion 123 . The wind speed sensor 162e is disposed inside the exhaust pipe 41 . The wind speed sensor 162e is disposed in the vicinity of the opening 41k. The wind speed sensors 162f and 162g are respectively disposed inside the switching housing 53 . As described above, when the opening/closing portion 123 is disposed at a position that communicates the treatment housing 23 with the exhaust pipe 41 , the opening/closing portion 123 blocks the first zone 126 from the second zone 127 . . At this time, in order to detect the leak of the gas from the opening/closing part 123, the wind speed sensor 162g is provided. When the opening/closing portion 123 is disposed at a position that communicates the treatment housing 23 with the exhaust pipe 41 , the opening/closing portion 123 controls the amount of gas that leaks from the first zone 126 to the second zone 127 , The wind speed sensor 162g can detect suitably. Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163e, 163f, and 163g. The wind speed sensor 163g is provided for a similar purpose to the wind speed sensor 162g. The wind speed sensor 164 includes at least one of the wind speed sensors 164e and 164f.

See Figure 21b. The wind speed sensor 162 includes at least one of the wind speed sensors 162h, 162i, 162j, 162k, and 162l. The wind speed sensors 162h - 162l are respectively arranged in the vicinity of the opening/closing portion 133 . The wind speed sensors 162h and 162i are disposed inside the exhaust pipe 41 . The wind speed sensors 162h and 162i are disposed in the vicinity of the opening 41k. The wind speed sensors 162j - 162l are respectively disposed inside the switching housing 53 . As described above, when the opening/closing portion 133 is disposed at a position that communicates the treatment housing 23 with the exhaust pipe 41 , the opening/closing unit 133 blocks the treatment housing 23 from the exhaust pipes 42 , 43 . At this time, in order to detect the leak of the gas from the opening-and-closing part 133, wind speed sensor 162k, 162l is provided. When the opening/closing portion 133 is disposed at a position to communicate the processing housing 23 with the exhaust pipe 41 , the opening/closing unit 133 controls the amount of gas leaking from the processing housing 23 to the exhaust pipes 42 , 43 , the wind speed. Sensors 162k and 162l are capable of detecting suitably. Similarly, the wind speed sensor 163 includes at least one of the wind speed sensors 163h, 163i, 163j, 163k, and 163l. The wind speed sensors 163k and 163l are provided for a similar purpose to the wind speed sensors 162k and 162l. The wind speed sensor 164 includes at least one of the wind speed sensors 164h, 164i, and 164j.

About embodiment and each modified embodiment, you may change suitably by substituting or combining each structure with the structure of another modified embodiment, etc. further.

The present invention may be embodied in other specific forms without departing from the spirit or essence thereof, and therefore, reference should be made to the appended claims rather than the above description as indicating the scope of the invention.

1, 141 substrate processing unit
11 processing block
12A, 12B, 12 transfer space
16A, 16B, 16 conveying mechanism
21 processing units
23 processing housing
23A1 processing housing (first processing housing)
23A2 processing housing (second processing housing)
23B1 processing housing (third processing housing)
24 processing space
31 holding part (first holding part, second holding part, third holding part)
33 Liquid supply unit (first liquid supply unit, second liquid supply unit, and third liquid supply unit)
41, 42, 43 exhaust pipe
41A exhaust pipe (first exhaust pipe)
42A exhaust pipe (second exhaust pipe)
41B exhaust pipe (third exhaust pipe)
42B exhaust pipe (fourth exhaust pipe)
44 first piping space
46 2nd piping space
48 air supply pipe
51, 101, 111, 121, 131, 151 switching mechanism
51A1 switching mechanism (first switching mechanism)
51A2 switching mechanism (second switching mechanism)
51B1 switching mechanism (third switching mechanism)
53, 103 conversion housing
54 transition space
55, 105 Introduction
56, 106 distribution
61-63, 113-115, 123-124, 133-134, 152-154 switchgear
61, 113, 123, 133, 152 opening/closing part (first opening/closing part)
62, 114, 124, 134, 153 opening/closing part (second opening/closing part)
71 pressure sensor
71A1 pressure sensor (first pressure sensor)
71B1 pressure sensor (third pressure sensor)
73 pressure adjustment mechanism
73A1 pressure adjustment mechanism (first pressure adjustment mechanism)
73B1 pressure adjustment mechanism (third pressure adjustment mechanism)
81, 82, 83 exhaust pipe
81A exhaust pipe (5th exhaust pipe)
82A exhaust pipe (6th exhaust pipe)
84-86 pressure sensor
84A pressure sensor (fifth pressure sensor)
85A pressure sensor (6th pressure sensor)
87-89 pressure adjustment mechanism
87A pressure adjustment mechanism (fifth pressure adjustment mechanism)
88A pressure adjustment mechanism (6th pressure adjustment mechanism)
91 control
W board
X front-back direction (first direction)
Y width direction (second direction)
Z vertical direction

Claims (20)

A substrate processing apparatus comprising:
a first processing housing;
a first holding part installed inside the first processing housing and holding a substrate;
a first liquid supply unit installed inside the first processing housing and supplying a processing liquid to the substrate held by the first holding unit;
a first exhaust pipe installed on a side of the first processing housing and discharging gas;
a second exhaust pipe installed on a side of the first processing housing and discharging gas;
and a first switching mechanism disposed at the same height as the first processing housing and switching an exhaust path of the first processing housing to one of the first exhaust pipe and the second exhaust pipe. The method according to claim 1,
The said 1st switching mechanism is arrange|positioned at the position equal to or lower than the upper end of the said 1st holding part. The method according to claim 1,
The said 1st switching mechanism is arrange|positioned at the position which does not overlap with the said 1st holding part in planar view, The substrate processing apparatus. The method according to claim 1,
The first exhaust pipe extends in a vertical direction,
The second exhaust pipe extends in a vertical direction. The method according to claim 1,
Substrate processing apparatus,
a transport space extending in a first horizontal direction and adjacent to the first processing housing;
a conveying mechanism provided in the conveying space and conveying the substrate to the first holding unit;
a first piping space adjacent to the first processing housing and accommodating the first exhaust pipe and the second exhaust pipe;
The first processing housing and the first piping space are arranged in the first direction,
The substrate processing apparatus, wherein the first exhaust pipe and the second exhaust pipe are arranged in a second direction perpendicular to and horizontal to the first direction. 6. The method of claim 5,
At least a part of the first switching mechanism is provided in the first piping space. 6. The method of claim 5,
The first switching mechanism,
a first opening/closing part movable to a position for communicating the first processing housing with the first exhaust pipe and a position for blocking the first processing housing from the first exhaust pipe;
a second opening/closing part movable independently of the first opening/closing part to a position for communicating the first processing housing with the second exhaust pipe and a position for blocking the first processing housing from the second exhaust pipe; processing unit. 8. The method of claim 7,
The first switching mechanism,
and a switching housing connected to the first processing housing and accommodating the first opening/closing unit and the second opening/closing unit. 9. The method of claim 8,
The conversion housing,
an introduction portion connected to the first processing housing and extending in the first direction;
a distribution part connected to the introduction part, extending in the second direction, connected to both of the first exhaust pipe and the second exhaust pipe, and receiving both of the first opening/closing part and the second opening/closing part; which is a substrate processing apparatus. 10. The method of claim 9,
In planar view, the separation distance between the introduction part and the conveyance space is smaller than the separation distance between the first holding unit and the conveyance space. 6. The method of claim 5,
Substrate processing apparatus,
an air supply pipe for supplying gas to the first processing housing;
a second piping space adjacent to the first processing housing and accommodating the air supply pipe;
The first piping space, the first processing housing, and the second piping space are arranged in this order in the first direction. The method according to claim 1,
Substrate processing apparatus,
a second processing housing disposed below the first processing housing;
a second holding part installed inside the second processing housing and holding a substrate;
a second liquid supply unit installed inside the second processing housing and supplying a processing liquid to the substrate held by the second holding unit;
and a second switching mechanism disposed at the same height as the second processing housing and switching an exhaust path of the second processing housing to one of the first exhaust pipe and the second exhaust pipe. 13. The method of claim 12,
the second processing housing is disposed at the same position as the first processing housing in a plan view;
the second switching mechanism is arranged in the same position as the first switching mechanism in a plan view;
The first exhaust pipe extends in a vertical direction,
The second exhaust pipe extends in a vertical direction. The method according to claim 1,
Substrate processing apparatus,
a third processing housing disposed at the same height as the first processing housing;
a third holding part installed inside the third processing housing and holding a substrate;
a third liquid supply unit installed inside the third processing housing and supplying a processing liquid to the substrate held by the third holding unit;
a third exhaust pipe installed on a side of the third processing housing and discharging gas;
a fourth exhaust pipe installed on a side of the third processing housing and discharging gas;
and a third switching mechanism disposed at the same height as the third processing housing and switching an exhaust path of the third processing housing to one of the third exhaust pipe and the fourth exhaust pipe. 15. The method of claim 14,
Substrate processing apparatus,
a first pressure sensor for measuring the pressure of the gas on the primary side of the first switching mechanism;
a first pressure regulating mechanism that adjusts the pressure of the gas on the primary side of the first switching mechanism based on a detection result of the first pressure sensor;
a third pressure sensor for measuring the pressure of the gas on the primary side of the third switching mechanism;
A substrate processing apparatus comprising: a third pressure adjusting mechanism that adjusts the pressure of the gas on the primary side of the third switching mechanism based on a detection result of the third pressure sensor. 16. The method of claim 15,
The said 1st pressure adjustment mechanism and the said 3rd pressure adjustment mechanism make the pressure of the gas on the primary side of the said 1st switching mechanism equal to the pressure of the gas on the primary side of the said 3rd switching mechanism. 15. The method of claim 14,
Substrate processing apparatus,
a fifth exhaust pipe connected to the first exhaust pipe and the third exhaust pipe and for discharging the gas of the first exhaust pipe and the gas of the third exhaust pipe;
and a sixth exhaust pipe connected to the second exhaust pipe and the fourth exhaust pipe and configured to exhaust the gas of the second exhaust pipe and the gas of the fourth exhaust pipe. 18. The method of claim 17,
Substrate processing apparatus,
a fifth pressure sensor for measuring the pressure of the gas inside the fifth exhaust pipe;
a fifth pressure adjusting mechanism for adjusting the pressure of the gas inside the fifth exhaust pipe based on the detection result of the fifth pressure sensor;
a sixth pressure sensor for measuring the pressure of the gas inside the sixth exhaust pipe;
and a sixth pressure adjusting mechanism for adjusting the pressure of the gas inside the sixth exhaust pipe based on a detection result of the sixth pressure sensor. 19. The method of claim 18,
The fifth pressure sensor is installed downstream from a connection position of the first exhaust pipe and the fifth exhaust pipe, and a connection position of the third exhaust pipe and the fifth exhaust pipe,
The sixth pressure sensor is provided downstream from a connection position of the second exhaust pipe and the sixth exhaust pipe, and a connection position between the fourth exhaust pipe and the sixth exhaust pipe. The method according to claim 1,
The first liquid supply unit may supply a first processing liquid and a second processing liquid,
when the first liquid supply unit supplies the first processing liquid, the first switching mechanism switches the exhaust path of the first processing housing to the first exhaust pipe;
When the first liquid supply unit supplies the second processing liquid, the first switching mechanism switches the exhaust path of the first processing housing to the second exhaust pipe.

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