KR20200078335A - 착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스 - Google Patents

착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스 Download PDF

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Publication number
KR20200078335A
KR20200078335A KR1020190159790A KR20190159790A KR20200078335A KR 20200078335 A KR20200078335 A KR 20200078335A KR 1020190159790 A KR1020190159790 A KR 1020190159790A KR 20190159790 A KR20190159790 A KR 20190159790A KR 20200078335 A KR20200078335 A KR 20200078335A
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KR
South Korea
Prior art keywords
meth
colorant
acrylate
resin composition
photosensitive resin
Prior art date
Application number
KR1020190159790A
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English (en)
Korean (ko)
Inventor
김승근
이규철
Original Assignee
롬엔드하스전자재료코리아유한회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 롬엔드하스전자재료코리아유한회사 filed Critical 롬엔드하스전자재료코리아유한회사
Priority to US16/710,554 priority Critical patent/US20200201180A1/en
Priority to JP2019226126A priority patent/JP7402667B2/ja
Priority to CN201911321487.2A priority patent/CN111352299A/zh
Priority to TW108146639A priority patent/TWI832940B/zh
Publication of KR20200078335A publication Critical patent/KR20200078335A/ko
Priority to US17/548,709 priority patent/US20220100090A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041Optical brightening agents, organic pigments
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/01Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3462Six-membered rings
    • C08K5/3465Six-membered rings condensed with carbocyclic rings
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020190159790A 2018-12-21 2019-12-04 착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스 KR20200078335A (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US16/710,554 US20200201180A1 (en) 2018-12-21 2019-12-11 Colored photosensitive resin composition and black matrix prepared therefrom
JP2019226126A JP7402667B2 (ja) 2018-12-21 2019-12-16 着色感光性樹脂組成物及びそれから作製されたブラックマトリックス
CN201911321487.2A CN111352299A (zh) 2018-12-21 2019-12-19 着色光敏树脂组合物以及由其制备的黑色矩阵
TW108146639A TWI832940B (zh) 2018-12-21 2019-12-19 著色光敏樹脂組成物及由其製備的黑色矩陣
US17/548,709 US20220100090A1 (en) 2018-12-21 2021-12-13 Colored photosensitive resin composition and black matrix prepared therefrom

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20180166998 2018-12-21
KR1020180166998 2018-12-21

Publications (1)

Publication Number Publication Date
KR20200078335A true KR20200078335A (ko) 2020-07-01

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ID=71601662

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190159790A KR20200078335A (ko) 2018-12-21 2019-12-04 착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스

Country Status (2)

Country Link
KR (1) KR20200078335A (zh)
TW (1) TWI832940B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114539850A (zh) * 2020-11-24 2022-05-27 爱思开希高科技材料有限公司 颜料分散液及包含其的着色光敏树脂组合物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318699B2 (zh) 1979-11-13 1988-04-19 Sumitomo Electric Industries

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI543993B (zh) * 2010-03-25 2016-08-01 富士軟片股份有限公司 黑色硬化型組成物、用於固態攝像元件的遮光彩色濾光片及其製造方法、固態攝像元件、晶圓級透鏡及攝影模組
WO2013051805A2 (en) * 2011-10-02 2013-04-11 Kolon Industries, Inc Photosensitive resin composition
CN103946747B (zh) * 2011-11-11 2018-06-05 旭硝子株式会社 负型感光性树脂组合物、分隔壁、黑色矩阵以及光学元件
KR101897937B1 (ko) * 2017-01-20 2018-09-12 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치
KR101980062B1 (ko) * 2017-02-15 2019-05-17 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
KR20180135375A (ko) * 2017-06-12 2018-12-20 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318699B2 (zh) 1979-11-13 1988-04-19 Sumitomo Electric Industries

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114539850A (zh) * 2020-11-24 2022-05-27 爱思开希高科技材料有限公司 颜料分散液及包含其的着色光敏树脂组合物
CN114539850B (zh) * 2020-11-24 2023-08-04 爱思开迈克沃解决方案有限公司 颜料分散液及包含其的着色光敏树脂组合物

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TWI832940B (zh) 2024-02-21
TW202034081A (zh) 2020-09-16

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