KR20200062010A - Treatment System of The Wastewater Containing Silica Capable of removing nitrogen and Phosphorus - Google Patents

Treatment System of The Wastewater Containing Silica Capable of removing nitrogen and Phosphorus Download PDF

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KR20200062010A
KR20200062010A KR1020190057870A KR20190057870A KR20200062010A KR 20200062010 A KR20200062010 A KR 20200062010A KR 1020190057870 A KR1020190057870 A KR 1020190057870A KR 20190057870 A KR20190057870 A KR 20190057870A KR 20200062010 A KR20200062010 A KR 20200062010A
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KR102250903B1 (en
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김규열
윤종호
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주식회사 두현이엔씨
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/58Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • C02F1/60Silicon compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D21/00Separation of suspended solid particles from liquids by sedimentation
    • B01D21/0039Settling tanks provided with contact surfaces, e.g. baffles, particles
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/20Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/40Devices for separating or removing fatty or oily substances or similar floating material
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
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    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/02Aerobic processes
    • C02F3/12Activated sludge processes
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    • C02F3/1273Submerged membrane bioreactors
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    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/02Aerobic processes
    • C02F3/12Activated sludge processes
    • C02F3/20Activated sludge processes using diffusers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/30Aerobic and anaerobic processes
    • C02F3/302Nitrification and denitrification treatment
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    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00General aspects of water treatment
    • C02F2301/10Temperature conditions for biological treatment
    • C02F2301/106Thermophilic treatment
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

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  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
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Abstract

The present invention relates to an apparatus for processing silica-containing wastewater capable of simultaneously processing nitrogen and phosphorus, which comprises: a first gravitational precipitation tank (10) receiving the silica-containing wastewater to firstly precipitate and remove silica; a second gravitational precipitation tank (20) installed at the rear end of the first gravitational precipitation tank and precipitating and removing the remaining silica included in the processed water; an aerobic membrane separation tank (30) installed at the rear end of the second gravitational precipitation tank and aerating the inflow processed water to perform solid-liquid separation and nitrification of the processed water; a deaeration tank (40) installed at the rear end of the aerobic tank to reduce dissolved oxygen included in the inflow processed water; and a reaction tank (50) receiving the processed water transferred from the deaeration tank to denitrify nitride and nitrogen included in the processed water. According to the present invention, the apparatus can effectively process silica generated from a semiconductor, particularly a wafer process, and can simultaneously process nitrogen and phosphorous, which are nutrient salts, and organic materials included in the wastewater.

Description

질소와 인의 동시처리가 가능한 실리카 함유 폐수의 처리장치{Treatment System of The Wastewater Containing Silica Capable of removing nitrogen and Phosphorus}{Treatment System of The Wastewater Containing Silica Capable of removing nitrogen and Phosphorus}

본 발명은 실리카 함유 폐수의 처리장치에 관한 것으로, 더욱 상세하게는 반도체 공정, 특히 웨이퍼 공정에서 발생되는 실리카를 함유한 폐수를 효과적으로 처리하는 것은 물론, 이와 함께 각종 오수 중에 함유된 유기물질과 영양염류인 질소와 인을 동시에 처리할 수 있는 실리카 함유 폐수의 처리장치에 관한 것이다.The present invention relates to an apparatus for treating silica-containing wastewater, and more specifically, to effectively treat wastewater containing silica generated in a semiconductor process, particularly a wafer process, as well as organic substances and nutrients contained in various sewage. The present invention relates to a treatment device for silica-containing wastewater capable of simultaneously treating phosphorus nitrogen and phosphorus.

산업시설에서 발생하는 폐수의 처리를 위해 다양한 공법과 설비들이 연구 및 현장에서 운용되고 있다. 반도체 제조공정에서 발생하는 폐수와 오수의 처리를 위한 종래 기술로는 특허 제0385706호가 참조될 수 있다.Various methods and facilities are being researched and operated in the field for the treatment of wastewater from industrial facilities. Patent No. 0385706 may be referred to as a conventional technique for treating wastewater and sewage generated in a semiconductor manufacturing process.

상기 특허 제0385706호는 다량의 폐수로부터 실리카를 제거하기 위한 방법 및 시스템을 개시하고 있다. 동 방법에 의하면, 실리카를 함유하는 폐수 스트림은 에피클로로히드인/디메틸아민 중합체와 같은 응집제로 처리되어, 5미크론 이상의 직경을 갖는 송이모양(cluster)으로 덩어리진 구형 입자가 생성된다. 이때, 처리된 폐수는 동 폐수로부터 실리카 오염물 입자를 물리적으로 분리하는 미량여과 막(microfiltration membrane)에 통과된다. 이에 0.5 미크론 내지 5 미크론의 공극 크기를 갖는 상업적으로 이용가능한 미량여과막이 사용될 수 있다. 미량여과막에 통과되는 처리된 폐수의 유속은 150 GFD(gallons per square foot of membrane per day) 내지 600 GFD 이며, 이를 유지하여 주기 위해서는 미량여과 막을 주기적으로 역류 세척하고 막이 배치된 여과 용기를 간헐적으로 배수시킴으로써 막의 표면으로부터 고체가 제거되도록 해야한다.The patent No. 0385706 discloses a method and system for removing silica from large amounts of wastewater. According to this method, the wastewater stream containing silica is treated with a flocculant such as an epichlorohydrin/dimethylamine polymer, producing spherical particles clumped in clusters with a diameter of 5 microns or more. At this time, the treated wastewater is passed through a microfiltration membrane that physically separates silica contaminant particles from the wastewater. Thus, commercially available microfiltration membranes having pore sizes of 0.5 microns to 5 microns can be used. The flow rate of the treated wastewater passing through the microfiltration membrane is 150 GFD (gallons per square foot of membrane per day) to 600 GFD. This should ensure that solids are removed from the surface of the membrane.

하지만, 일반적으로 반도체 제조공정에서 발생하는 폐수는 부유물질(SS)의 농도가 높고, 또한 처리과정에서의 막오염으로 인해 차압이 높아지는 현상이 발생하는 문제가 지적된다. 이러한 현상은 반도체 웨이퍼(Wafer) 공정에서 배출되는 실리카(SiO2)에 기인된다.However, it is generally pointed out that the wastewater generated in the semiconductor manufacturing process has a high concentration of suspended solids (SS) and a high pressure difference due to membrane contamination in the treatment process. This phenomenon is due to silica (SiO 2 ) discharged from the semiconductor wafer process.

하지만, 기존의 실리카 함유 폐수는 상기와 같이 막오염 등의 문제로 인해 수시로 역세정 등의 방법을 이용해 청소 내지 교체를 해주어야 하는 등 실제 운용에 있어 많은 비용과 시간이 소요되는 등 어려움이 따른다. 더욱이 산업단지내 여러사업장에서 발생되는 폐수에는 실리카를 함유한 폐수뿐만 아니라, 각종 오수로부터 유기물질과 질소나 인과 같이 부영양화를 일으켜 수질환경을 오염시키는 물질이 포함되지만, 이들 오염물의 처리는 위와 같은 종래의 시설만으로는 해결할 수 없고 별도의 처리시설이 요구된다. 이 또한 추가적인 비용의 투입과 시간이 요구되는 일이다.However, the existing silica-containing wastewater has difficulties such as time-consuming and time-consuming in actual operation, such as the need to clean or replace using a method such as backwashing from time to time due to problems such as membrane contamination. Moreover, wastewater generated at various sites in the industrial complex includes not only wastewater containing silica, but also substances that pollute the water environment by causing eutrophication such as organic matter and nitrogen or phosphorus from various sewage, but the treatment of these pollutants Facilities cannot be solved alone, and separate treatment facilities are required. This also requires additional cost and time.

이에 반도체 공정, 특히 웨이퍼 공정에서 발생되는 실리카를 함유한 폐수를 효과적으로 처리하는 것은 물론 동 폐수와 혼합되어지는 각종 오수 중에 함유된 유기물질과 영양염류인 질소와 인을 동시에 처리할 수 있는 기술의 개발이 절실히 요구되고 있다.Accordingly, as well as effectively treating wastewater containing silica generated in a semiconductor process, especially a wafer process, development of a technology capable of simultaneously treating organic substances and nutrient salts nitrogen and phosphorus contained in various wastewater mixed with the wastewater This is urgently required.

[선행기술문헌][Advanced technical literature]

[특허문헌][Patent Document]

국내공개특허 제10-0385706호 (2003.05.16) Domestic Publication Patent No. 10-0385706 (2003.05.16)

이에 본 발명은 상기와 같은 문제점들을 해소하기 위해 안출된 것으로써, 반도체 공정, 특히 웨이퍼 공정에서 발생되는 실리카를 함유한 폐수를 효과적으로 처리하는 것은 물론, 이와 함께 각종 오수 중에 함유된 유기물질과 영양염류인 질소와 인을 동시에 처리할 수 있는 실리카 함유 폐수의 처리장치를 제공하는 것이 목적이다.Accordingly, the present invention has been devised to solve the above problems, as well as effectively treating wastewater containing silica generated in a semiconductor process, particularly a wafer process, as well as organic materials and nutrients contained in various sewage. It is an object to provide a treatment device for silica-containing wastewater capable of treating phosphorus nitrogen and phosphorus simultaneously.

상기한 바와 같은 본 발명의 기술적 과제는 다음과 같은 수단에 의해 달성되어진다.The technical problem of the present invention as described above is achieved by the following means.

(1) 실리카 함유 폐수가 유입되어 실리카를 1차 침전제거하는 제1중력침전조; 상기 제1중력침전조의 후단에 설치되고, 처리수내 함유된 잔류 실리카를 침전제거하는 제2중력침전조; 상기 제2중력침전조의 후단에 설치되고, 유입된 처리수를 포기처리하여 처리수의 고액분리 및 질산화를 수행하는 막분리 호기조; 상기 호기조의 후단에 설치되어, 유입된 처리수내 함유된 용존산소를 저감하는 탈기조; 및 상기 탈기조에서 반송된 처리수를 유입받아 처리수내 함유된 질산화 및 탈질을 수행하는 반응조를 포함하는 실리카 함유 폐수의 처리장치.(1) a first gravity sedimentation tank in which silica-containing wastewater is introduced to firstly remove silica; A second gravity sedimentation tank installed at a rear end of the first gravity sedimentation tank and sedimenting and removing residual silica contained in the treated water; A membrane separation aerobic tank installed at a rear end of the second gravity sedimentation tank and performing a solid-liquid separation and nitrification of the treated water by aeration treatment; A degassing tank installed at a rear end of the exhalation tank to reduce dissolved oxygen contained in the treated water introduced; And a reaction tank that receives the treated water returned from the degassing tank and performs nitrification and denitrification contained in the treated water.

(2) 상기 (1)에 있어서,(2) In the above (1),

반응조는 탈기조를 거친 반류된 처리수를 유입받아, 간헐포기 방식을 이용하여 혐기, 호기, 혐기의 순으로 교대로 운영되는 것을 특징으로 하는 실리카 함유 폐수의 처리장치.The reaction tank is a device for treating silica-containing wastewater, which receives inflow of the treated water that has passed through the deaeration tank, and alternately operates in the order of anaerobic, aerobic, and anaerobic using an intermittent aeration method.

(3) 상기 (1)에 있어서,(3) In the above (1),

실리카 함유 폐수의 처리장치는 한쌍으로 병렬적으로 설치되며, 이를 위해 폐수가 유입되는 최전단에는 분배조가 설치되고, 분배조는 외부에서 유입되는 원수(혹은 전처리를 거친 처리수)를 유입받아 이를 좌우 한쌍의 제1중력침전조에 분배하는 것을 특징으로 하는 실리카 함유 폐수의 처리장치.The treatment device for silica-containing wastewater is installed in parallel in a pair, and for this purpose, a distribution tank is installed at the front end of which the wastewater flows, and the distribution tank receives raw water (or treated water that has been pre-treated) from the outside and a pair of left and right. Silica-containing wastewater treatment apparatus characterized in that it is distributed to the first gravity settling tank.

(4) 상기 (3)에 있어서,(4) In the above (3),

한쌍의 반응조 중 하나는 탈기조로부터 혐기 상태로 처리수를 유입받는 시간으로 설정하고, 다른 하나는 유입된 처리수를 혐기, 호기, 혐기의 교대반응을 수행하도록 하여 반응조의 공정 사이클을 교대로 할 수 있도록 구성된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.One of the pair of reactors is set to the time of receiving the treated water in an anaerobic state from the degasser, and the other is to alternate the process cycle of the reactor by allowing the introduced treated water to perform an alternate reaction of anaerobic, aerobic and anaerobic. Silica-containing wastewater treatment device, characterized in that configured to be.

(5) 상기 (3)에 있어서,(5) In the above (3),

탈기조의 후단에 스컴저류조를 두어, 최종 처리수의 방류이전에 스컴을 제거하도록 구성된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.A treatment device for silica-containing wastewater, characterized in that a scum reservoir is disposed at the rear end of the deaeration tank to remove scum before discharge of the final treated water.

(6) 상기 (1)에 있어서,(6) In the above (1),

상기 반응조는 혐기, 호기 공정을 위한 제1반응실과, 후속하여 혐기 공정을 위한 제2반응실이 분리설치된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.The reaction tank is a device for treating silica-containing wastewater, characterized in that a first reaction chamber for an anaerobic and aerobic process and a second reaction chamber for an anaerobic process are separately installed.

(7) 상기 (6)에 있어서,(7) In the above (6),

상기 제1반응실과 제2반응실 사이에 연결관로를 두고, 상기 연결관로에는 열공급수단이 추가로 장착된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.Silica-containing wastewater treatment apparatus, characterized in that a connecting conduit is disposed between the first and second reaction chambers, and a heat supply means is additionally mounted on the conduit.

(8) 상기 (6)에 있어서,(8) In the above (6),

상기 제2반응실의 상부에는 진공감압을 위한 밀폐형 구조와 함께 외부에 진공펌프가 연결된 것을 특징으로 하는 실리카 함유 폐수의 처리장치. A treatment device for silica-containing wastewater, characterized in that a vacuum pump is connected to the outside of the second reaction chamber along with a closed structure for vacuum decompression.

(9) 상기 (8)에 있어서,(9) In the above (8),

상기 탈기조와 막분리 호기조의 연결관로에 열공급수단이 장착되어 처리수에 열을 공급하고, 탈기조의 상부에는 진공감압을 위한 밀폐형 구조와 함께 외부에 진공펌프가 연결된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.Silica-containing wastewater, characterized in that a heat supply means is installed in the connection line between the deaeration tank and the membrane separation exhalation tank to supply heat to the treated water, and a vacuum pump is connected to the outside of the deaeration tank with a closed structure for vacuum decompression. Processing device.

(10) 상기 (9)에 있어서,(10) In the above (9),

제1중력침전조 및 제2중력침전조의 내부에 표면에 반구형의 돌기가 형성된 배플이 장착된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.A device for treating silica-containing wastewater, wherein a baffle having a hemispherical protrusion is formed on the surface of the first gravity settling tank and the second gravity settling tank.

상기한 바와 같이, 본 발명에 의한 장치는 반도체 특히 웨이퍼 공정에서 발생되는 실리카를 효과적으로 처리하는 것은 물론 오수 중에 함유된 유기물질과 영양염류인 질소와 인을 동시에 처리할 수 있는 매우 유용하고 효과적인 발명이다.As described above, the device according to the present invention is a very useful and effective invention capable of effectively treating silica generated in a semiconductor, especially a wafer process, as well as simultaneously treating organic substances and nutrients nitrogen and phosphorus contained in sewage. .

도 1은 본 발명에 따른 실시카 함유 폐수의 처리장치를 도시한 도면이고,
도 2는 본 발명에 따른 중력침전조의 구성을 도시한 도면이며.
도 3은 본 발명에 따른 반응조의 바람직한 실시예를 보여주는 도면이다.
1 is a view showing an apparatus for treating wastewater containing real car according to the present invention,
2 is a view showing the configuration of the gravity settling tank according to the present invention.
3 is a view showing a preferred embodiment of the reactor according to the present invention.

이하, 본 발명에 따른 바람직한 실시 형태를 첨부된 도면을 참조하여 상세하게 설명한다. 첨부된 도면과 함께 이하에 개시될 상세한 설명은 본 발명의 예시적인 실시형태를 설명하고자 하는 것이며, 본 발명이 실시될 수 있는 유일한 실시형태를 나타내고자 하는 것이 아니다. 이하의 상세한 설명은 본 발명의 완전한 이해를 제공하기 위해서 구체적 세부사항을 포함한다. 그러나, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자는 본 발명이 이러한 구체적 세부사항 없이도 실시될 수 있음을 안다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. DETAILED DESCRIPTION The following detailed description, together with the accompanying drawings, is intended to describe exemplary embodiments of the present invention, and is not intended to represent the only embodiments in which the present invention may be practiced. The following detailed description includes specific details to provide a thorough understanding of the present invention. However, one of ordinary skill in the art to which the present invention pertains knows that the present invention may be practiced without these specific details.

몇몇 경우, 본 발명의 개념이 모호해지는 것을 피하기 위하여 공지의 구조 및 장치는 생략되거나, 각 구조 및 장치의 핵심기능을 중심으로 한 블록도 형식으로 도시될 수 있다.In some cases, in order to avoid obscuring the concept of the present invention, well-known structures and devices may be omitted, or block diagrams centered on the core functions of each structure and device may be illustrated.

명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함(comprising 또는 including)"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다. 또한, 명세서에 기재된 "…부"의 용어는 적어도 하나의 기능이나 동작을 처리하는 단위를 의미한다. 또한, "일(a 또는 an)", "하나(one)", "그(the)" 및 유사 관련어는 본 발명을 기술하는 문맥에 있어서(특히, 이하의 청구항의 문맥에서) 본 명세서에 달리 지시되거나 문맥에 의해 분명하게 반박되지 않는 한, 단수 및 복수 모두를 포함하는 의미로 사용될 수 있다.Throughout the specification, when a part "comprising or including" a certain component, it means that other components may be further included rather than excluding other components, unless otherwise specified. do. In addition, the term "… part" described in the specification means a unit that processes at least one function or operation. In addition, "a (a or an)", "one (one)," "the (the)" and similar related terms in the context of describing the present invention (especially in the context of the following claims) is different herein. It may be used in a sense including both singular and plural unless indicated or clearly contradicted by context.

본 발명의 실시예들을 설명함에 있어서 공지 기능 또는 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우에는 그 상세한 설명을 생략할 것이다. 그리고 후술되는 용어들은 본 발명의 실시예에서의 기능을 고려하여 정의된 용어들로서 이는 사용자, 운용자의 의도 또는 관례 등에 따라 달라질 수 있다. 그러므로 그 정의는 본 명세서 전반에 걸친 내용을 토대로 내려져야 할 것이다.In describing embodiments of the present invention, when it is determined that a detailed description of known functions or configurations may unnecessarily obscure the subject matter of the present invention, the detailed description will be omitted. In addition, terms to be described later are terms defined in consideration of functions in an embodiment of the present invention, which may vary according to a user's or operator's intention or practice. Therefore, the definition should be made based on the contents throughout this specification.

이하, 본 발명의 바람직한 실시 예를 첨부된 도면을 참조하여 설명한다.Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

도 1은 본 발명에 따른 실리카 함유 폐수의 처리장치를 도시한 도면이고, 도 2는 본 발명에 따른 중력침전조의 구성을 도시한 도면이며, 도 3은 본 발명에 따른 반응조의 바람직한 실시예를 보여주는 도면이다.1 is a view showing a device for treating silica-containing wastewater according to the present invention, FIG. 2 is a view showing a configuration of a gravity sedimentation tank according to the present invention, and FIG. 3 shows a preferred embodiment of a reaction tank according to the present invention It is a drawing.

도면에서 도시한 바와 같이, 실리카 함유 폐수의 처리장치(100)는 실리카 함유 폐수가 유입되어 실리카를 1차 침전제거하는 제1중력침전조(10); 상기 제1중력침전조의 후단에 설치되고, 처리수내 함유된 잔류 실리카를 침전제거하는 제2중력침전조(20); 상기 제2중력침전조의 후단에 설치되고, 유입된 처리수를 포기처리하여 처리수의 고액분리 및 질산화를 수행하는 막분리 호기조(30); 상기 호기조의 후단에 설치되어, 유입된 처리수내 함유된 용존산소를 저감하는 탈기조(40); 및 상기 탈기조에서 반송된 처리수를 유입받아 처리수내 함유된 질산화 및 탈질을 수행하는 반응조(50)를 포함한다.As shown in the figure, the apparatus 100 for treating silica-containing wastewater includes: a first gravity sedimentation tank 10 in which silica-containing wastewater is introduced to firstly remove and remove silica; A second gravity settling tank 20 installed at a rear end of the first gravity settling tank and sedimenting and removing residual silica contained in the treated water; A membrane separation aerobic tank 30 installed at a rear end of the second gravity sedimentation tank and performing a solid-liquid separation and nitrification of the treated water by abandoning the introduced treated water; A degassing tank 40 installed at the rear end of the exhalation tank to reduce dissolved oxygen contained in the treated water introduced; And a reaction tank 50 that receives the treated water returned from the degassing tank and performs nitrification and denitrification contained in the treated water.

바람직하게는 상기 본 발명에 따른 실리카 함유 폐수의 처리장치(100)는 한쌍으로 병렬적으로 설치되어진다. 이를 위해 폐수가 유입되는 최전단에는 분배조(60)가 설치된다. 분배조(60)는 외부에서 유입되는 원수(혹은 전처리를 거친 처리수)를 유입받아 이를 좌우 한쌍의 제1중력침전조(10)에 분배한다. 상기 분배조(60)의 전단에는 전처리를 위해 가압부상조(미도시)가 설치되어 원수내 함유된 유지를 포함한 각종 부유물을 사전에 제거하여도 좋다.Preferably, the silica-containing wastewater treatment apparatus 100 according to the present invention is installed in parallel in a pair. To this end, a distribution tank 60 is installed at the forefront where wastewater flows. The distribution tank 60 receives raw water (or treated water that has undergone pre-treatment) flowing from outside and distributes it to a pair of left and right first gravity sedimentation tanks 10. A pressurized flotation tank (not shown) may be installed at the front end of the distribution tank 60 for pretreatment to remove various suspended substances including oil and fat contained in the raw water in advance.

이때 분배는 각 장치의 처리용량 및 설비의 가동상태를 고려하여 이루어지도록 할 수 있으며, 이는 제어기(미도시)를 통해 자동으로 제어될 수 있도록 하는 것이 바람직하다. 예를 들어, 분배조(60)는 한 쪽의 설비가 교체 혹은 수리 등의 요인이 발생할 경우 다른 한쪽으로 원수를 유입시키도록 제어한다.At this time, the distribution can be made in consideration of the processing capacity of each device and the operating state of the equipment, and it is desirable to be automatically controlled through a controller (not shown). For example, the distribution tank 60 controls one facility to introduce raw water to the other when a factor such as replacement or repair occurs.

상기 제1중력침전조(10)의 내부에는 배플(11)이 형성되어, 상기 배플에 의해 실리카를 포함한 입자들이 중력에 의해 침강하도록 유도한다. 이때, 제거되는 실리카는 대략 30~60% 정도이다.A baffle 11 is formed inside the first gravity settling tank 10 to induce particles containing silica to settle by gravity. At this time, the removed silica is about 30 to 60%.

바람직하게는 상기 배플의 표면에는 반구형의 돌기(미도시)가 일정간격을 두고 형성된다. 반구형의 돌기는 폐수내 부유물이 표면에 응집되는 것을 막아주어 케이크가 형성되는 것을 방지해 주어 실리카가 케이크에 흡착되는 것을 방지하고, 결과적으로 실리카의 회수 내지 제거효율을 높일 수 있다.Preferably, a hemispherical protrusion (not shown) is formed on the surface of the baffle at a predetermined interval. The hemispherical protrusion prevents the formation of a cake by preventing agglomeration of suspended solids in the wastewater, thereby preventing silica from being adsorbed on the cake, and consequently, recovery or removal efficiency of silica can be improved.

제1중력침전조(10)를 거친 처리수는 제2중력침전조(20)로 유입된다. 제2중력침전조(20)는 내부에 배플(21)이 처리수의 진행방향과 수직하게 상부에 장착된다. 따라서, 이동 중인 처리수 내 함유된 잔류하는 실리카 입자들이 대부분 상기 배플(21)에 막혀 중력에 의해 침전되어 제거될 수 있다.The treated water that has passed through the first gravity settling tank 10 flows into the second gravity settling tank 20. The second gravity sedimentation tank 20 has a baffle 21 therein mounted on the top perpendicular to the direction in which the treated water proceeds. Therefore, most of the remaining silica particles contained in the moving water being moved are blocked by the baffle 21 and can be removed by precipitation by gravity.

상기 제2중력침전조(20)를 거친 처리수는 실리카 입자가 거의 제거된 상태이다. 따라서, 본 발명에 의하면 후단에 설치된 막분리 호기조(30)에 설치된 분리막을 오염시키는 일을 방지할 수 있게 된다.The treated water that has passed through the second gravity settling tank 20 is in a state where silica particles are almost removed. Therefore, according to the present invention, it is possible to prevent contamination of the separation membrane installed in the membrane separation exhalation tank 30 installed at the rear end.

막분리 호기조(30)는 처리수의 고액분리 및 질산화를 수행하고, 이와 함께 인의 섭취가 일어난다. 내부에 침지되는 분리막(31)은 바람직하게는 중공사 정밀여과막이 이용되며, 물, 공기, 약품의 역세정 과정이 필요없이 포기공기만을 이용하여 세정할 수 있어 6개월 이상 막을 운영하는 것이 가능하다.The membrane separation aerobic tank 30 performs solid-liquid separation and nitrification of the treated water, and phosphorus intake occurs therewith. The separation membrane 31 immersed in the interior is preferably a hollow fiber microfiltration membrane, and it is possible to operate the membrane for more than 6 months because it can be cleaned using only aeration air without the need for a backwashing process of water, air, or chemicals. .

또한, 본 발명에서는 상기와 같이 질산화 및 인제거를 위해 기존의 침전조, 여과조 및 소독조를 대신하여 흡입여과방식의 중공사 정밀여과막이 이용되므로 7,000~13,000mg/L 정도의 MLSS 농도에서 공정의 운영이 가능하게 되어 인제거에 약품의 별도 투입이 필요없고, 동절기에도 안정된 질산화가 가능하다.In addition, in the present invention, since the hollow filtration microfiltration membrane of the suction filtration method is used in place of the existing sedimentation tank, filtration tank and disinfection tank for nitrification and phosphorus removal as described above, the operation of the process is performed at an MLSS concentration of about 7,000 to 13,000 mg/L. Since it is possible, there is no need to input additional chemicals to remove phosphorus, and stable nitrification is possible even in winter.

탈기조(40)는 전단의 막분리 호기조(30)를 거친 처리수내 함유된 용존산소를 저감한다. 탈기조(40)는 별도의 압축공기가 투입되지 않고, 교반을 통해 간단하게 수행될 수 있다. 막분리 호기조(30)를 거쳐 나온 처리수는 다량의 용존산소를 포함하게 되므로, 탈기조(40)에서는 이러한 용존산소를 소비하여 처리수내 존재하는 유기물을 산화시켜 제거하고, 이를 통해 처리수내 용존산소는 저감되어진다.The deaeration tank 40 reduces dissolved oxygen contained in the treated water that has passed through the membrane separation exhalation tank 30 at the front end. The degassing tank 40 does not input a separate compressed air, and can be simply performed through stirring. Since the treated water that has passed through the membrane separation aerobic tank 30 contains a large amount of dissolved oxygen, the degassing tank 40 consumes the dissolved oxygen to oxidize and remove organic substances present in the treated water, thereby dissolving the dissolved oxygen in the treated water Is reduced.

상기와 같이 탈기조(40)에 의한 용존산소의 저감을 통해 후단의 반응조(50)에서 수행되는 혐기 분위기가 제공되어진다. 바람직하게는 탈기조(40)를 거친 처리수내 용존산소는 0.2mg/L 이하로 한다.As described above, through the reduction of dissolved oxygen by the deaeration tank 40, an anaerobic atmosphere performed in the reaction tank 50 at the rear stage is provided. Preferably, the dissolved oxygen in the treated water that has passed through the degassing tank 40 is 0.2 mg/L or less.

탈기조(40)에서 나온 처리수는 반응조(50)로 반송된다.The treated water from the degassing tank 40 is returned to the reaction tank 50.

반응조(50)는 탈기조(40)를 거친 반류된 처리수를 유입받아, 바람직하게는 간헐포기 방식을 이용하여 혐기, 호기, 혐기 공정의 순으로 교대로 운영된다. 따라서, 탈기조(40)를 거친 처리수는 먼저 혐기 공정으로 운영되고, 이 기간에는 처리수의 탈질 및 인의 방출이 유도된다. 후속하여 처리수는 호기 공정으로 이어지며 이 과정을 통해 잔류 질소에 대한 질산화 과정이 수행된다. 그리고 나서 질산화 과정을 통해 생성된 질산성질소는 후속하는 혐기공정에 의해 다시 혐기분위기에서 탈질 및 인제거 공정을 거치게 된다. 상기 일련의 공정은 하나의 반응실에서 순차적으로 간헐포기하는 단순한 방법에 의해 수행되어질 수 있다.The reaction tank 50 receives the treated water flowing through the degassing tank 40, and is operated alternately in the order of anaerobic, aerobic, and anaerobic processes, preferably using an intermittent aeration method. Therefore, the treated water that has passed through the degassing tank 40 is first operated as an anaerobic process, and in this period, denitrification of the treated water and release of phosphorus are induced. Subsequently, the treated water is followed by an aerobic process, through which nitrification of residual nitrogen is performed. Then, the nitric acid nitrogen produced through the nitrification process undergoes denitrification and phosphorus removal in the anaerobic atmosphere again by a subsequent anaerobic process. The series of processes may be performed by a simple method of sequentially intermittent aeration in one reaction chamber.

본 발명의 바람직한 실시예에서, 상기 반응조(50)는 바람직하게는 마지막 단계의 혐기분위기를 효율적으로 조성하기 위해 혐기, 호기 공정을 위한 제1반응실(51)과, 마지막 혐기 공정을 위한 제2반응실(52)을 분리설치할 수 있다. 이 경우 바람직하게는 상기 제1반응실(51)과 제2반응실(52) 사이에 연결관로(53)를 두고, 상기 연결관로에는 열공급수단(54)이 추가로 장착될 수 있다. 상기 열공급수단은 연결관로의 일부를 감싸는 형태의 온열자켓 내지는 보일러로부터 공급되는 고온의 유체로부터 열교환방식을 통해 열을 공급받는 열교환기일 수 있다. 또한, 상기 제2반응실(52)의 상부에는 진공감압을 위한 밀폐형 구조와 함께 외부에 진공펌프(미도시)가 연결될 수 있다.In a preferred embodiment of the present invention, the reaction tank 50 is preferably a first reaction chamber 51 for anaerobic and aerobic processes to efficiently create an anaerobic atmosphere in the last step, and a second for the last anaerobic process. The reaction chamber 52 can be separately installed. In this case, preferably, a connecting conduit 53 is placed between the first reaction chamber 51 and the second reaction chamber 52, and a heat supply means 54 may be additionally mounted on the connecting conduit. The heat supply means may be a heat exchanger that receives heat through a heat exchange method from a high temperature fluid supplied from a heating jacket or a boiler in a form surrounding a part of the connection pipe. In addition, a vacuum pump (not shown) may be connected to the outside of the second reaction chamber 52 together with a sealed structure for vacuum decompression.

이와 같은 구성에 의하면, 상기 제1반응실(51)에는 혐기와 호기반응이 연속하여 일어나야 하므로, 제1반응실 내부 하부에 산기수단이 요구되며, 혐기반응 이후에 포기처리를 통해 호기반응을 진행시킬 수 있다. 호기반응이 진행된 처리수는 용존산소를 포함하며, 이는 제2반응실(52)로 유입되기 이전에 열공급수단에 의해 가열되고(바람직하게는 처리수의 수온이 30~40℃에 이를 수 있도록 승온), 가열된 처리수는 제2반응실(52)에 유입되어 온도 상승에 따른 산소 용해도가 저감되고 뿐만 아니라, 진공펌프를 작동시켜 상부에 감압상태를 유지하면 산소 용해도가 더욱 저감되므로, 처리수내 용존산소를 짧은 시간에 대부분 제거할 수 있다. 이러한 과정에 의해 제2반응실(52)은 짧은 시간에 혐기분위기로 조성될 수 있다.According to this configuration, since the anaerobic and aerobic reactions must continuously occur in the first reaction chamber 51, an aerobic means is required inside the first reaction chamber, and after the anaerobic reaction, aerobic reaction is performed through aeration treatment. I can do it. The treated water in which the aerobic reaction proceeds includes dissolved oxygen, which is heated by a heat supply means before entering the second reaction chamber 52 (preferably, the temperature of the treated water is raised to reach 30-40° C. ), the heated treated water is introduced into the second reaction chamber 52, so that the oxygen solubility due to temperature rise is reduced, and when the vacuum pump is operated to maintain a reduced pressure at the top, the oxygen solubility is further reduced. Most of the dissolved oxygen can be removed in a short time. Through this process, the second reaction chamber 52 may be formed as an anaerobic atmosphere in a short time.

상기와 같이 열공급수단(54)이나 진공펌프와 같은 구성의 동작은 제어기(미도시)에 의해 제어될 수 있다. As described above, the operation of the configuration such as the heat supply means 54 or the vacuum pump can be controlled by a controller (not shown).

이러한 일련의 반응을 통해 처리수내 존재하는 질소 및 인 화합물은 대부분 제거가 가능하다. 상기 반응조(50)을 통한 처리과정은 통상 60분으로 운영될 수 있다.Through this series of reactions, most of the nitrogen and phosphorus compounds present in the treated water can be removed. The treatment process through the reaction tank 50 can be normally operated for 60 minutes.

본 발명에서는 바람직하게는 상기 반응조(50)는 혐기, 호기, 혐기 공정의 일련의 반응을 개시하기 전에 탈기조(40)로부터 처리수가 유입되는 시간(대략 60분으로 설정) 동안 혐기분위기로 유지한다.In the present invention, preferably, the reaction tank 50 is maintained in an anaerobic atmosphere for a time during which the treated water is introduced from the deaeration tank 40 (set to approximately 60 minutes) before initiating a series of reactions of anaerobic, aerobic and anaerobic processes. .

본 발명의 바람직한 실시예로써, 한쌍의 반응조(50) 중 하나는 탈기조(40)로부터 혐기 상태로 처리수를 유입받는 시간으로 설정하고, 다른 하나는 유입된 처리수를 혐기, 호기, 혐기공정의 일련의 반응을 수행하도록 하여 반응조의 공정 사이클을 교대로 수행할 수 있도록 한다.As a preferred embodiment of the present invention, one of the pair of reaction tanks 50 is set to a time for receiving the treated water in an anaerobic state from the degassing tank 40, and the other is an anaerobic, aerobic, anaerobic process By performing a series of reactions, it is possible to alternately perform the process cycle of the reactor.

본 발명에서는 상기와 같이 간헐포기 방식을 이용하여 포기하므로 자체 슬러지 반송효과가 있어 유지비를 절감하는 것이 가능하다.In the present invention, since it is abandoned using the intermittent aeration method as described above, it has a self-sludge transfer effect, and thus it is possible to reduce maintenance costs.

상기와 같이 반응조(50)를 거친 처리수는 다시 막분리 호기조(30)로 유입시켜, 처리수내 잔류할 수 있는 유기물을 산화시켜 제거하면서, 완벽한 질산화 및 인의 제거가 이루어진다. 막분리 호기조(30)를 거친 처리수는 탈기조(40)로 유입되어 용존산소를 저감시키고, 처리수의 일부는 다시 반송라인을 거쳐 반응조(50)로 반송되고, 나머지는 스컴저류조(70)을 거쳐 스컴을 제거한 후, 방류처리된다.As described above, the treated water that has passed through the reaction tank 50 flows back into the membrane separation aerobic tank 30 to oxidize and remove organic substances that may remain in the treated water, while completely removing nitrification and phosphorus. The treated water that has passed through the membrane separation aerobic tank 30 flows into the degassing tank 40 to reduce dissolved oxygen, and a part of the treated water is returned to the reaction tank 50 through a conveying line again, and the rest is scum reservoir 70 After removing the scum through, it is discharged.

바람직하게는 상기 탈기조(40)와 막분리 호기조(30)의 연결관로(미도시)에 반응조에서와 마찬가지로 온열자켓 내지 열교환기 등의 열공급수단을 두고, 탈기조(40)의 상부에는 진공감압을 위한 밀폐형 구조와 함께 외부에 진공펌프(55)가 연결된다. 이를 통해 탈기조에서의 짧은 체류시간 동안 용존산소를 거의 완벽하게 저감할 수 있어 처리효율을 향상시킬 수 있다. Preferably, a heat supply means such as a heat jacket or a heat exchanger is placed in a connection pipe (not shown) between the degassing tank 40 and the membrane separation exhalation tank 30, and vacuum decompression is applied to the upper portion of the degassing tank 40. A vacuum pump 55 is connected to the outside together with a sealed structure for. Through this, dissolved oxygen can be almost completely reduced during a short residence time in the degassing tank, thereby improving treatment efficiency.

이하 본 발명의 내용을 실시예를 참조하여 보다 상세하게 설명하고자 한다. 다만 하기 예시된 실시예는 본 발명의 이해를 돕기 위해 제시되는 것일 뿐 이에 의해 본 발명의 권리범위가 한정되는 것으로 해석되어서는 아니된다.Hereinafter, the contents of the present invention will be described in more detail with reference to Examples. However, the exemplified examples below are only presented to help the understanding of the present invention and should not be construed as limiting the scope of the present invention.

[실시예 1] [Example 1]

본 발명의 장치를 이용하여 실리카를 다량 함유한 것으로 알려진 아산디지털 산업단지에서 발생하는 폐수를 대상으로 실험을 실시한 결과 일평균 TMS 측정값은 하기 표 1과 같다. 다만, 2018.04.10.일과 2018.04.11.일은 기존 처리공법(MBR 공법)에 의해 수행하였으며, 2018.04.12.일부터 공법을 변경하여 도 1에 도시한 본 발명에 따른 처리장치를 이용하여 테스트를 수행하였다.As a result of experiments on wastewater generated in the Asan Digital Industrial Complex, which is known to contain a large amount of silica using the device of the present invention, daily average TMS measurement values are shown in Table 1 below. However, 2018.04.10. and 2018.04.11. were performed according to the existing treatment method (MBR method), and the method was changed from April 12, 2018 to test using the treatment device according to the present invention shown in FIG. Was performed.

측정일Measurement day CODCOD T-NT-N T-PT-P pHpH SSSS 비교예Comparative example 2018.04.022018.04.02 7.27.2 1.571.57 0.0490.049 7.757.75 41.241.2 2018.04.112018.04.11 8.38.3 1.421.42 0.0490.049 7.827.82 27.727.7 실시예Example 2018.04.122018.04.12 9.79.7 1.271.27 0.0490.049 7.937.93 5.45.4 2018.04.212018.04.21 6.86.8 1.261.26 0.0310.031 7.847.84 0.50.5

상기와 같이, 기존의 MBR 공법만으로는 실리카를 포함한 부유물(SS)을 효과적으로 제거하지 못하는 것을 확인할 수 있는 반면, 본 발명에 따른 개선된 공법에 의하면 실리카가 완벽하게 제거되는 것을 확인할 수 있다.As described above, it can be confirmed that the existing MBR method alone does not effectively remove the suspended solids (SS) containing silica, whereas the improved method according to the present invention confirms that the silica is completely removed.

10: 제1중력침전조
20: 제2중력침전조
30: 막분리 호기조
40: 탈기조
50: 반응조
60: 분배조
70: 스컴저류조
10: first gravity sedimentation tank
20: second gravity sedimentation tank
30: membrane separation aerobic tank
40: degasser
50: reactor
60: distribution tank
70: scum storage tank

Claims (3)

실리카 함유 폐수가 유입되어 실리카를 1차 침전제거하는 제1중력침전조; 상기 제1중력침전조의 후단에 설치되고, 처리수내 함유된 잔류 실리카를 침전제거하는 제2중력침전조; 상기 제2중력침전조의 후단에 설치되고, 유입된 처리수를 포기처리하여 처리수의 고액분리 및 질산화를 수행하는 막분리 호기조; 상기 호기조의 후단에 설치되어, 유입된 처리수내 함유된 용존산소를 저감하는 탈기조; 상기 탈기조에서 반송된 처리수를 유입받아 처리수내 함유된 질산화 및 탈질을 수행하는 반응조; 및 최종 처리수의 방류이전에 스컴을 제거하기 위해 탈기조의 후단에 설치되는 스컴저류조를 포함하되,
상기 제1중력침전조, 제2중력침전조, 막분리 호기조, 탈기조, 및 반응조는 대칭이 되도록 좌우 한쌍으로 병렬적으로 설치되며, 이를 위해 폐수가 유입되는 최전단에는 분배조가 설치되고, 분배조는 외부에서 유입되는 원수 혹은 전처리를 거친 처리수를 유입받아 이를 좌우 한쌍의 제1중력침전조에 분배하며,
상기 반응조는 혐기, 호기 공정을 위한 제1반응실과, 후속하여 혐기 공정을 위한 제2반응실이 분리설치되되,
상기 반응조 중 하나는 탈기조로부터 혐기 상태로 처리수를 유입받는 시간으로 설정하고, 다른 하나는 유입된 처리수를 혐기, 호기, 혐기의 교대반응을 수행하도록 하여 반응조의 공정 사이클을 교대로 할 수 있도록 구성된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.
A first gravity sedimentation tank in which silica-containing wastewater is introduced to firstly remove silica; A second gravity sedimentation tank installed at a rear end of the first gravity sedimentation tank and sedimenting and removing residual silica contained in the treated water; A membrane separation aerobic tank installed at a rear end of the second gravity sedimentation tank and performing a solid-liquid separation and nitrification of the treated water by abandoning the treated water; A degassing tank installed at a rear end of the exhalation tank to reduce dissolved oxygen contained in the treated water introduced; A reaction tank that receives the treated water returned from the degassing tank and performs nitrification and denitrification contained in the treated water; And a scum storage tank installed at a rear end of the degassing tank to remove scum before discharge of the final treated water,
The first gravity settling tank, the second gravity settling tank, the membrane separation aerobic tank, the degassing tank, and the reaction tank are installed in parallel in a pair of left and right so as to be symmetrical, and for this purpose, a distribution tank is installed at the foremost stage where the wastewater flows, and the distribution tank is external. It receives raw water flowing from or treated water that has been pretreated, and distributes it to a pair of left and right first gravity sedimentation tanks.
In the reaction tank, a first reaction chamber for anaerobic and aerobic processes and a second reaction chamber for anaerobic processes are separately installed.
One of the reactors is set to the time for receiving the treated water in an anaerobic state from the degassing tank, and the other is to alternate the process cycle of the reactor by allowing the introduced treated water to perform an alternate reaction of anaerobic, aerobic and anaerobic. Silica-containing wastewater treatment device, characterized in that configured to be.
제 1항에 있어서,
상기 제1반응실과 제2반응실 사이에 연결관로를 두고, 상기 연결관로에는 열공급수단이 추가로 장착된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.
According to claim 1,
Silica-containing wastewater treatment apparatus, characterized in that a connecting conduit is disposed between the first and second reaction chambers, and a heat supply means is additionally mounted on the connecting conduit.
제 2항에 있어서,
상기 제2반응실의 상부에는 진공감압을 위한 밀폐형 구조와 함께 외부에 진공펌프가 연결된 것을 특징으로 하는 실리카 함유 폐수의 처리장치.
According to claim 2,
Silica-containing wastewater treatment apparatus characterized in that a vacuum pump is connected to the outside of the second reaction chamber together with a sealed structure for vacuum decompression.
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RU2745212C1 (en) * 2020-06-25 2021-03-22 Наргиз Габбасович Маликов Modular deaeration installation
WO2021262028A1 (en) * 2020-06-25 2021-12-30 Наргиз Габбасович МАЛИКОВ Modular deaeration system

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