KR20190121854A - Hydroponic growing device - Google Patents

Abstract

The hydroponic cultivation apparatus 100 includes a cultivation tank 7 containing at least a part of the plant 8 and a liquid fertilizer 50 so as to supply the liquid fertilizer 50 to at least a part of the plant 8. Liquid for cleaning into the space in the cultivation tank 7 so as to clean at least one of the liquid fertilizer spraying part 5a sprayed into the space in the space) and at least a part of the plant 8 and the inner surface of the cultivation tank 7. And a discharge passage 30 for guiding the liquid fertilizer 50 and the liquid for cleaning from the cultivation tank 7 to the outside of the cultivation tank 7.

Description

Hydroponic growing device

The present invention relates to a hydroponic cultivation apparatus for growing a plant without using soil.

Conventionally, development of a hydroponic cultivation apparatus for cultivating plants has been carried out without using soil. In hydroponic cultivation apparatus, the plant is grown while the root of the plant is soaked in liquid fertilizer or water.

Japanese Patent Laid-Open No. 2012-10651

In general, the plants are weak in the wet state, so that when they are in contact with the liquid fertilizer for a long time, germs are generated from the part in contact with the liquid fertilizer, or the plant decay due to lack of oxygen occurs. In the hydroponic cultivation, since soil is not used, the old tissue of the plant remains inside the hydroponic cultivation apparatus without being decomposed after peeling off and falling from the plant. If the old tissue peeled from the plant decays, it may adversely affect the plant. However, in the conventional hydroponic cultivation apparatus, there is no means for maintaining the sanitary environment in the vicinity of the plant in a good state in order to protect the plant from adverse effects due to the generation of bacteria and decay of the exfoliated tissue.

This invention is made | formed in view of the subject which this prior art has. And an object of this invention is to provide the hydroponic cultivation apparatus which can maintain the sanitary environment near a plant in a favorable state.

In order to solve the said subject, the hydroponic cultivation apparatus which concerns on the aspect of this invention sprays the said liquid fertilizer to the space in the said cultivation tank so that the liquid fertilizer may supply a liquid fertilizer to at least one part of a plant, and at least a part of the plant. A liquid fertilizer spraying unit, a cleaning liquid discharge unit for discharging a cleaning liquid into a space in the culture tank so as to clean at least one of at least a part of the plant and the inner surface of the culture tank, and the culture tank from the culture tank. A discharge flow path for guiding the liquid fertilizer and the cleaning liquid to the outside is provided.

According to this invention, the sanitary environment near a plant can be maintained in a favorable state.

BRIEF DESCRIPTION OF THE DRAWINGS It is the whole block diagram for demonstrating the hydroponic cultivation apparatus of Embodiment 1 of this invention.
It is an overall block diagram for demonstrating the hydroponic cultivation apparatus of Embodiment 2 of this invention.
It is a partially enlarged view for demonstrating the hydroponic cultivation apparatus of Embodiment 3 of this invention.
It is a partially enlarged view for demonstrating the hydroponic cultivation apparatus of Embodiment 4 of this invention.
It is an overall block diagram for demonstrating the hydroponic cultivation apparatus of Embodiment 5 of this invention.
It is a partial enlarged view for demonstrating the hydroponic cultivation apparatus of Embodiment 6 of this invention. FIG. 6 (a) is a longitudinal cross-sectional view in the long side direction of the hydroponic cultivation apparatus of the sixth embodiment. FIG. 6B is a longitudinal cross-sectional view in the short side direction of the hydroponic cultivation apparatus of the sixth embodiment. FIG. 6C is a cross-sectional view of the hydroponic cultivation apparatus of the sixth embodiment.
It is an overall block diagram for demonstrating the hydroponic cultivation apparatus of Embodiment 7 of this invention.
It is a partial enlarged view for demonstrating the hydroponic cultivation apparatus of Embodiment 7 of this invention.
It is a partial enlarged view for demonstrating the hydroponic cultivation apparatus of Embodiment 8 of this invention.

EMBODIMENT OF THE INVENTION Hereinafter, the hydroponic cultivation apparatus of embodiment is demonstrated, referring drawings. In the plural embodiments described below, portions given the same reference numerals exhibit the same functions unless otherwise specified, even if there is some difference in the shape on the drawings.

The hydroponic cultivation apparatus of each embodiment described below is for cultivating root vegetables.

(Embodiment 1)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 1 is demonstrated using FIG.

As shown in FIG. 1, in the hydroponic cultivation apparatus 100 of this embodiment, the some plant 8 is cultivated. The plant 8 has a ground section with leaves and stems, and an underground section with roots and underground stems. The plant 8 is, for example, ginseng (Korean ginseng or Korean ginseng) as a root vegetable with a large underground portion. In addition, ginseng is an example of the plant to be cultivated, and what kind of plant may be cultivated in hydroponic cultivation of this embodiment.

As shown in FIG. 1, an example of the hydroponic cultivation apparatus 100 of this embodiment is equipped with the housing 70 like a container of a hexagonal structure. The housing 70 is conceptually drawn as an integral line. Thereby, the plant 8 grows in a space that is blocked from the external space by the housing 70. Therefore, the atmosphere in the housing 70 is substantially blocked from the external atmosphere.

The hydroponic cultivation apparatus 100 includes an air conditioner 20 for adjusting the temperature and humidity of the space in the housing 70, and a control unit 60 for controlling the air conditioner 20. Therefore, it is possible to introduce external air into the housing 70 or to discharge air in the housing 70 to the outside. Therefore, according to the hydroponic cultivation apparatus 100, it is easy to manage the surrounding environment of the plant 8.

In addition, since the housing 70 is formed of an opaque plastic material, light from the outside does not enter the housing 70. The worker who grows the plant 8 comes out from the opening provided in the housing 70 by opening or closing a door (not shown) provided on the side of the housing 70, or from the opening. (70) I can go inside.

In the housing 70, a multi-stage rack 80 is provided. However, in order to simplify the drawing, only one stage of the rack 80 is drawn. In addition, the rack 80 is conceptually drawn as an integrated line. One cultivation tank 7 is provided in each of the plurality of spaces divided into the matrix shape of the rack 80.

The hydroponic cultivation apparatus 100 includes a cultivation tank 7 for accommodating the underground portion of the plant 8. The opening of the upper side of the cultivation tank 7 is blocked by the partition part 9. As a material of the partition part 9, foamed styrofoam may be used, for example. In the partition portion 9, a through hole having a size that allows the plant 8 to pass through is opened, and a retaining portion 10 made of sponge is inserted into the through hole. The cultivation tank 7 contains at least a part of the plant 8, specifically, an underground part of the plant 8. The plant 8 has a frictional force between the holding portion 10 and the through hole of the partition portion 9 and the friction force between the holding portion 10 and the plant 8 so that the ground portion protrudes upward from the partition portion 9. It is seen by.

In this embodiment, even when the plant 8 is being cultivated, the piping as the discharge flow path 30 at the bottom of the cultivation tank 7 so that the liquid fertilizer 50 is not stored in the cultivation tank 7. This is provided. The discharge flow path 30 is connected to each of the cultivation tank 7 and the liquid fertilizer tank 1, and the liquid fertilizer tank 1 which gravity dropped the liquid fertilizer 50 which fell to the bottom of the cultivation tank 7 is carried out. To guide.

The liquid fertilizer tank 1 stores the liquid fertilizer 50. The liquid fertilizer 50 is supplied to the liquid fertilizer spray part 5a in the culture tank 7 via the liquid fertilizer supply flow passage 5 by the spray pump 2A. The liquid fertilizer spray unit 5a sprays the liquid fertilizer 50 supplied by the liquid fertilizer supply passage 5 into the space in the culture tank 7. Most of the liquid fertilizer 50 is sprayed in the cultivation tank 7 toward the basement of the plant 8.

The hydroponic cultivation apparatus 100 of the present embodiment includes a lighting device 11, an air conditioner 20, a spray pump 2A, and a washing pump 2B. The control part 60 controls each of the illuminating device 11, the air conditioner 20, the spray pump 2A, and the washing pump 2B by transmitting a radio wave.

The lighting device 11 is a light source such as an LED (Light Emitting Diode) or a fluorescent lamp mounted on the lower surface of the shelf of the rack 80, and irradiates light from above to the ground of the plant 8. The light emission aspect of the lighting device 11 is controlled by the control part 60. The air conditioner 20 is mounted on the ceiling surface of the housing 70 and controlled by the control unit 60 to change the temperature and humidity of the atmosphere around the plant 8 in the housing 70.

2 A of spray pumps supply the liquid fertilizer 50 in the liquid fertilizer tank 1 to the liquid fertilizer spray part 5a via the liquid fertilizer supply flow path 5. The cleaning pump 2B supplies the liquid fertilizer 50 as the liquid for cleaning in the liquid fertilizer tank 1 to the cleaning liquid discharge part 3a via the cleaning liquid supply passage 3. That is, in this embodiment, the liquid fertilizer 50 as a nutrient of the plant 8 is used as a washing | cleaning liquid. However, when the liquid fertilizer 50 is supplied into the cultivation tank 7 as a cleaning liquid, when the liquid fertilizer 50 is supplied into the cultivation tank 7 as nutrients in order to achieve the purpose of cleaning. In comparison, the supply per unit time is quite large. Both the spray pump 2A and the washing pump 2B are controlled by the control unit 60. The washing | cleaning liquid supply flow path 3 is provided with the washing | cleaning liquid adjustment part 4 controlled by the control part 60, and which controls the discharge aspect from the washing | cleaning liquid discharge part 3a of the cleaning liquid. The washing | cleaning liquid adjustment part 4 is comprised by the flow regulating valve specifically ,.

In this embodiment, the control part 60 controls the operation | movement of the washing | cleaning liquid adjusting part 4 so that the washing | cleaning liquid adjusting part 4 may adjust discharge aspect. Thereby, each washing | cleaning liquid discharge part 3a of the some cultivation tank 7 wash | cleans at least one of at least one part of the plant 8 and the inner surface of the cultivation tank 7 in the cultivation tank 7 The cleaning liquid is discharged into the space. The discharge flow path 30 guides the liquid fertilizer 50 and the liquid for washing | cleaning discharged from the cultivation tank 7 to the liquid fertilizer tank 1. Therefore, the sanitary environment near the plant 8 is maintained in a favorable state.

In this embodiment, the washing | cleaning liquid adjustment part 4 is provided in each of the some branch flow path branched from the stem flow path of the washing | cleaning liquid supply flow path 3. Therefore, the control part 60 can independently control each of the discharge aspects of the cleaning liquid discharged in the some cultivation tank 7 using the some washing | cleaning liquid adjustment part 4 separately. However, in this embodiment, the control part 60 performs control which makes the several operation | movement liquid adjustment part 4 corresponding to each of the some cultivation tanks 7 perform the same operation.

The hydroponic cultivation apparatus 100 includes a washing liquid adjusting unit 4 whose operation is controlled by the control unit 60. The cleaning liquid adjusting unit 4 adjusts the discharge mode of the cleaning liquid discharged from the cleaning liquid discharge unit 3a. Therefore, by suitably adjusting the discharge mode, such as the discharge time, discharge amount, and discharge timing of the cleaning liquid discharged from the cleaning liquid discharge part 3a, the liquid for cleaning, ie, liquid fertilizer 50, in a more favorable embodiment. Can be discharged. As a result, the sanitary environment in the vicinity of the plant 8 can be maintained in a good state.

In this embodiment, the washing | cleaning liquid discharge part 3a uses the liquid fertilizer 50 stored in the liquid fertilizer tank 1, respectively, and the underground part as at least a part of the plant 8, and each of the inner surface of the cultivation tank 7 is carried out. Clean. According to this, since the liquid for washing | cleaning other than the liquid fertilizer 50 is not used separately, the structure for washing | cleaning can be simplified.

In addition, the washing | cleaning liquid discharge part 3a may wash | clean only any one of the underground part as at least one part of the plant 8, and the inner surface of the cultivation tank 7. As shown in FIG. In any case, in this embodiment, the cleaning liquid discharge part 3a discharges the liquid fertilizer 50 upwards, contacts the plant 8, falls to the bottom of the cultivation tank 7, and discharges it. It flows along the bottom face of the cultivation tank 7 toward the flow path 30. Therefore, the liquid fertilizer 50, together with the old tissue that has fallen from the plant 8 present on the bottom surface of the cultivation tank 7 and the bacteria that have been reproduced on the surface of the plant 8, etc. It flows toward the discharge flow path 30 along the bottom of 7).

The cleaning liquid discharge part 3a may be an opening at the tip of a simple pipe or may be a shower nozzle. On the other hand, the liquid fertilizer spray section 5a is configured to spray the mist-like liquid so that the liquid fertilizer 50 is easily absorbed from the root of the plant 8. The flow rate of the liquid per unit time of the cleaning liquid discharge unit 3a may be larger than the flow rate of the liquid per unit time of the liquid fertilizer spray unit 5a. That is, as long as the cleaning liquid discharge part 3a can increase the effect of washing away the old tissue which peeled from the plant 8 using the liquid fertilizer 50 of larger amount per unit time than the liquid fertilizer spray part 5a, Any may be sufficient.

In the present embodiment, the liquid fertilizer 50 is used as the cleaning liquid, but the liquid fertilizer 50 in the liquid fertilizer tank 1 is replaced with a liquid for cleaning other than the liquid fertilizer 50 such as water. You may discharge from the washing | cleaning liquid discharge part 3a into the inside of the cultivation tank 7. According to this, when it is not desirable for the excess liquid fertilizer 50 to adhere to the plant 8 for a long time, the liquid fertilizer 50 can be effectively washed off from the plant 8.

(Embodiment 2)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 2 is demonstrated using FIG.

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 1, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 1 with respect to the matter demonstrated below.

In the present embodiment, instead of the spray pump 2A and the washing pump 2B of the first embodiment, one pump 2 is provided with a liquid in each of the liquid fertilizer supply flow passage 5 and the cleaning liquid supply flow passage 3. The fertilizer 50 is sent out. According to this, since the number of pumps can be reduced, the structure of the hydroponic cultivation apparatus 100 can be simplified. In this embodiment, the liquid fertilizer control part 6 is provided in the liquid fertilizer supply flow path 5. The liquid fertilizer control unit 6 adjusts spraying aspects such as spray amount, spray pressure, and spray timing from the liquid fertilizer spray unit 5a of the liquid fertilizer 50 flowing through the liquid fertilizer supply flow passage 5. In the present embodiment, the cleaning liquid supply passage 3 is provided with a cleaning liquid adjusting part 4. The washing | cleaning liquid adjustment part 4 adjusts the flow volume of the liquid fertilizer 50 as a washing liquid which flows through the washing | cleaning liquid supply flow path 3. The washing | cleaning liquid adjustment part 4 is comprised by the flow regulating valve specifically ,.

The control part 60 controls the washing | cleaning liquid adjustment part 4 and the liquid fertilizer adjustment part 6, and the spraying time of the liquid fertilizer 50 from the liquid fertilizer spray part 5a for a predetermined time, for example, 15 minutes. After a while, spraying is stopped for a specific time, for example, for 15 minutes. In this case, execution of this spray and stop of spraying are repeated alternately for 24 hours. Furthermore, at the end of one day, i.e., after the spraying and stopping of spraying are repeated alternately for some time, for example 24 hours, the old tissue of the plant 8 attached to the plant 8 is washed off. The liquid fertilizer 50 as a liquid for cleaning from the cleaning liquid discharge part 3a is discharged | emitted so that it may come out.

In addition, in this embodiment, it is provided only in the stem flow path of the washing | cleaning liquid supply flow path 3 which branches so that one washing | cleaning liquid adjustment part 4 may be connected to each of the some cultivation tank 7. According to this, the number of the washing | cleaning liquid adjustment parts 4 can be reduced.

(Embodiment 3)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 3 is demonstrated using FIG.

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 1, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 1 with respect to the matter demonstrated below.

In this embodiment, the washing | cleaning liquid discharge part 3a which is an opening of the front end of the washing | cleaning liquid supply flow path 3 is exposed to the inner surface of the cultivation tank 7. As shown in FIG. Therefore, the liquid fertilizer 50 discharged from the washing | cleaning liquid discharge part 3a flows to the discharge flow path 30 along the bottom face of the cultivation tank 7. As a result, the old tissue, bacteria, and the like of the plant 8 existing on the bottom surface of the cultivation tank 7 can be washed away with the liquid fertilizer 50 more efficiently.

(Embodiment 4)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 4 is demonstrated using FIG.

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 2, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 2 about the matter demonstrated below.

The liquid fertilizer supply flow path 5 and the cleaning liquid supply flow path 3 of the second embodiment are realized by the same structure, that is, the same pipe 35. However, the liquid fertilizer spray section 5a and the cleaning liquid discharge section 3a are realized by different structures. The switching valve 35a is provided in the pipe 35. The switching valve 35a is controlled by the control unit 60 to guide the liquid fertilizer 50 to the liquid fertilizer spray unit 5a, or to discharge the liquid fertilizer 50 as a cleaning liquid. It switches whether to guide to the section 3a. Therefore, in this embodiment, the switching valve 35a has achieved the function of both the washing | cleaning liquid adjustment part 4 of Embodiment 2, and the liquid fertilizer adjustment part 6 of Embodiment 2. As shown in FIG. Also in this embodiment, the flow volume of the liquid per unit time of the cleaning liquid discharge part 3a may be more than the flow rate of the liquid per unit time of the liquid fertilizer spraying part 5a.

According to the present embodiment, the liquid fertilizer 50 is sprayed while simplifying the structure of the hydroponic cultivation apparatus 100 by the commonization of the flow path for guiding the liquid fertilizer 50 and the cleaning liquid to the cultivation tank 7. The sun and the discharge mode of the liquid (liquid fertilizer 50) for washing | cleaning can be made different.

(Embodiment 5)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 5 is demonstrated using FIG.

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 1, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 1 with respect to the matter demonstrated below.

In the present embodiment, the spray pump 2A is provided in the liquid fertilizer tank 1A, but the cleaning pump 2B is provided in the cleaning liquid tank 1B. The liquid fertilizer 50 is stored in the liquid fertilizer tank 1A, but the water 51 is stored in the cleaning liquid tank 1B. Therefore, when the washing pump 2B is driven, water 51 flows through the pipe as the washing liquid supply flow path 3. Thereby, the inner surface of the cultivation tank 7 and the underground part of the plant 8 are washed with water 51. That is, in this embodiment, the washing | cleaning liquid discharge part 3a wash | cleans at least one part of the plant 8 and each of the inner surface of the cultivation tank 7 using the water 51 as a washing | cleaning liquid. Therefore, the liquid fertilizer 50 can be wash | cleaned from the plant 8 with water 51. FIG. As a result, generation | occurrence | production of the state which the liquid fertilizer 50 adheres to the plant 8 can be suppressed. Therefore, the hydroponic cultivation apparatus 100 of the embodiment has a higher effect when the excess liquid fertilizer 50 adheres to the plant 8 for a long time, adversely affects the growth of the plant 8. Can be exercised.

In this embodiment, the example in which the washing | cleaning liquid tank 1B which stores water 51 is provided. However, when the hydroponic cultivation apparatus 100 does not have the washing | cleaning liquid tank 1B and opens the tap provided in the public water pipe, the tap water will be discharged from the washing | cleaning liquid discharge part 3a by flowing the piping as the washing | cleaning liquid supply flow path 3. It may be.

In the present embodiment, the discharge flow passage 30 includes a flow passage reaching the liquid fertilizer tank 1A from the cultivation tank 7 and a flow passage reaching the cleaning liquid tank 1B from the cultivation tank 7. The opening / closing valve V1 in which the opening / closing operation is controlled by the control part 60 is provided in the flow path which reaches from the cultivation tank 7 to the liquid fertilizer tank 1A. When the on-off valve V1 is closed, the liquid fertilizer 50 does not flow from the cultivation tank 7 to the liquid fertilizer tank 1A, and when the on-off valve V1 is open, the liquid fertilizer from the cultivation tank 7. The liquid fertilizer 50 flows to the tank 1A. The opening / closing valve V2 in which the opening / closing operation is controlled by the control part 60 is provided in the flow path which reaches from the cultivation tank 7 to the washing | cleaning liquid tank 1B. When the opening / closing valve V2 is closed, the water 51 as the liquid for cleaning does not flow from the culture tank 7 to the cleaning liquid tank 1B, and when the opening / closing valve V2 is open, the culture tank 7 Water 51 as a cleaning liquid flows from the cleaning liquid tank 1B to the cleaning liquid tank 1B.

When the spraying of the liquid fertilizer 50 from the liquid fertilizer spraying part 5a is being performed, the control part 60 opens and closes the opening / closing valve V1, and closes the opening / closing valve V2, and The on / off valve V2 is controlled. On the other hand, when the water 51 as the liquid for cleaning is discharged from the cleaning liquid discharge part 3a, the control part 60 closes the opening / closing valve V1 and opens the opening / closing valve V2. V1) and on-off valve V2 are controlled. According to this, since the liquid fertilizer supply flow path 5 and the washing | cleaning liquid supply flow path 3 are provided independently, the mixing of the liquid fertilizer 50 and the water 51 as a liquid for washing | cleaning is suppressed.

In the present embodiment, other cleaning liquid may be used instead of the water 51 as long as it is not harmful to the plant 8.

Embodiment 6

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 6 is demonstrated using FIG. 6 (a)-FIG. 6 (c).

Since the hydroponic cultivation apparatus 100 of the present embodiment is almost the same as the hydroponic cultivation apparatus of the third embodiment, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 3 regarding the matter demonstrated below.

In this embodiment, the washing | cleaning liquid discharge part 3a wash | cleans toward only the inner wall surface which is a surface extended in the vertical direction of the cultivation tank 7 in addition to the part which sprays the cleaning liquid toward the underground part of the plant 8. And a portion for discharging the liquid. That is, at least one part of the cleaning liquid discharge part 3a is arrange | positioned inside the cultivation tank 7 so that the liquid for cleaning may be discharged only toward the inner wall surface of the cultivation tank 7. Therefore, by sanitizing the inner wall surface of the cultivation tank 7 more effectively, the sanitary environment of the plant 8 vicinity can be maintained in a more favorable state. In addition, the cleaning liquid discharge part 3a does not have a portion for spraying the cleaning liquid toward the basement part of the plant 8, and the cleaning liquid is directed toward only the inner wall surface, which is a surface extending in the vertical direction of the cultivation tank 7. It may be only a portion for discharging the ink.

(Embodiment 7)

Hereinafter, the hydroponic cultivation apparatus 100 of Embodiment 7 is demonstrated using FIG. 7 and FIG.

Since the hydroponic cultivation apparatus 100 of the present embodiment is almost the same as the hydroponic cultivation apparatus of the fifth embodiment, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 5 with respect to the matter demonstrated below.

The hydroponic cultivation apparatus 100 of the present embodiment further includes a duct as the air blowing unit 15 having a blowout hole 15a for blowing out air inside the cultivation tank 7. Therefore, foreign matter such as old tissue attached to at least one of at least part of the plant 8 and the inner surface of the cultivation tank 7 is blown by air. Thereby, the foreign material is peeled off from the plant 8 and falls on the bottom surface of the cultivation tank 7. Therefore, the foreign material discharge from the cultivation tank 7 using the cleaning liquid discharged | emitted from the washing | cleaning liquid discharge part 3a is performed more effectively.

The direction of the wind blown out from the blowout hole 15a is not particularly limited. However, it is preferable that the blowout hole 15a is arrange | positioned so that wind may be sent over the whole space in the cultivation tank 7.

In this embodiment, as shown in FIG. 8, the blowing part 15 is arrange | positioned so that it may extend in a horizontal direction in the cultivation tank 7, and the some extraction hole 15a is spaced at a fixed interval in the horizontal direction. It is prepared. However, the space | interval between some extraction hole 15a does not need to be constant.

The amount of wind blown out from the blowout hole 15a is not particularly limited, but the amount of extra wind attached to the inner side and bottom of the cultivation tank 7, the surface of the basement part of the plant 8, and the lower surface of the holding part 10 is not limited. It is preferable that it is the grade which can remove water.

The blower 15 is provided with a blower air volume adjusting unit V3, specifically, a wind volume control valve and a wind volume meter, and the controller 60 controls the blower air volume adjuster V3. Control the airflow valve so that the value of. Thereby, at least any one of the air volume, the wind speed, and the air pressure of the air blown out from the blowout hole 15a into the space in the culture tank 7 is adjusted. When the blowing of the wind from the blowout hole 15a is performed, the blowing amount in each of the some cultivation tank 7 is kept constant.

The timing at which the wind is blown out of the blowout hole 15a is a fixed time after the washing liquid is discharged from the washing liquid discharge part 3a. For example, after the liquid for washing | cleaning is discharged from the washing | cleaning liquid discharge part 3a, wind may be blown out from the blowout hole 15a to the space in the cultivation tank 7 for 20 minutes.

According to this embodiment, the excess water of the inner side surface and the bottom surface of the cultivation tank 7, the surface of the underground part of the plant 8, and the holding part 10 can be removed. According to this, since the root of the plant 8 can be suppressed from being exposed to the excessive wet state, decay of the plant 8 can be prevented.

Embodiment 8

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 2, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 2 about the matter demonstrated below.

As shown in FIG. 9, in the hydroponic cultivation apparatus 100 of this embodiment, the same structure X is each of the liquid fertilizer spray part 5a and the cleaning liquid discharge part 3a of Embodiment 2 mentioned above. Achieve function. In addition, the same structure Y achieves the respective functions of the liquid fertilizer supply flow path 5 and the cleaning liquid supply flow path 3 of Embodiment 2 described above. According to this, the spraying of the liquid fertilizer 50 and the discharge of the liquid for cleaning can be realized without complicating the structure of the hydroponic cultivation apparatus 100, that is, by the same structure X and the same structure Y. Can be. Although not shown, the cleaning liquid control part 4 of Embodiment 2 and the liquid fertilizer control part 6 of Embodiment 2 are also comprised by the same structure.

In this case, the control part 60 controls at least any one of the pressure of spraying, the quantity of spraying, and the timing of spraying by the same structure X which functions as the liquid fertilizer spraying part 5a. Thereby, the discharge aspect of the liquid for cleaning discharged from the same structure X which functions as the cleaning liquid discharge part 3a can be adjusted. That is, the control part 60 controls from the same structure X by controlling the same structure which achieves each function of the washing | cleaning liquid adjustment part 4 of Embodiment 2, and the liquid fertilizer adjustment part 6 of Embodiment 2. Whether to spray the liquid fertilizer 50 or to discharge it. However, also in this case, the quantity of the liquid fertilizer 50 as the liquid for cleaning discharged from the same structure X which functions as the cleaning liquid discharge part 3a is equivalent to the same structure which functions as the liquid fertilizer spraying part 5a ( More than the amount of liquid fertilizer 50 sprayed from X). According to this structure, the sanitary environment in the vicinity of the plant 8 can be maintained in a favorable state with a simple structure.

(Embodiment 9)

Since the hydroponic cultivation apparatus 100 of this embodiment is almost the same as the hydroponic cultivation apparatus of Embodiment 1, the description of the same part is not repeated. The hydroponic cultivation apparatus 100 of this embodiment differs from the hydroponic cultivation apparatus 100 of Embodiment 1 with respect to the matter demonstrated below.

As for the hydroponic cultivation apparatus 100 of this embodiment, in the hydroponic cultivation apparatus 100 of each said embodiment, the water-repellent coating (not shown) is given to the whole inner surface of the cultivation tank 7. The water-repellent coating makes it difficult for foreign substances such as old tissue or bacteria peeled from the plant 8 to adhere to the inner surface of the cultivation tank 7. Therefore, it becomes easy to wash away the foreign material which exists on the inner surface of the cultivation tank 7 by discharge of the cleaning liquid. The water repellent coating may be any one such as a fluorine coating or a silicone coating as long as it inhibits adhesion of foreign matter to the inner surface of the cultivation tank 7 and facilitates cleaning of the foreign matter with a cleaning liquid. The water repellent coating may be applied only to a part of the inner surface of the cultivation tank 7 in which foreign matter easily adheres.

(Common matter of each embodiment)

In the hydroponic cultivation apparatus 100 of each above-mentioned embodiment, the control part 60 discharges the cleaning liquid from the cleaning liquid discharge part 3a after spraying the liquid fertilizer 50 by the liquid fertilizer spray part 5a. In order to make it, the operation | movement of the cleaning liquid adjustment part 4 is controlled. Since the liquid fertilizer 50 is restrained from being left in the state of being adhered to the plant 8 for a long time, the sanitary environment near the plant 8 can be maintained in a good state. However, for the same reason, the control unit 60 discharges the cleaning liquid from the cleaning liquid discharge unit 3a during the spraying of the liquid fertilizer 50 by the liquid fertilizer spray unit 5a. May be controlled.

The liquid fertilizer 50 is sent from the liquid fertilizer supply flow passage 5 to the liquid fertilizer spraying section 5a by a certain amount at a predetermined time. The liquid fertilizer spraying section 5a may be a structure capable of spraying. Although the number of spray holes is not specifically limited, It is preferable that the liquid fertilizer 50 can be sprayed uniformly to the plant 8. In addition, the size of a spray hole should just be a size which can spray the mist-like liquid fertilizer 50 toward the underground part of the plant 8. The flow rate and flow rate of the liquid for cleaning, for example, liquid fertilizer 50 or water, may be any. However, the cleaning liquid discharge part 3a uses the cleaning liquid for a flow rate, flow rate, and time such that the old tissue separated from the plant 8 is not washed from the bottom of the cultivation tank 7 to the discharge flow path 30. It is preferable that the control part 60 controls the washing | cleaning liquid adjustment part 4 so that discharge may be carried out.

The cleaning liquid discharge part 3a discharges the cleaning liquid such as water or liquid fertilizer 50 for a predetermined time during or after spraying the liquid fertilizer 50 from the liquid fertilizer spraying part 5a. It may be. After the liquid fertilizer spray unit 5a mist-sprays the liquid fertilizer 50 for a predetermined time, for example, 5 minutes, the liquid liquid fertilizer 50 for the cleaning liquid discharge unit 3a for a specific time, for example, 10 minutes. ) Or water 51 may be discharged.

In the hydroponic cultivation apparatus 100 of each said embodiment, it is preferable that the bottom face of the cultivation tank 7 inclines toward the discharge flow path 30. According to this, foreign matter, such as old tissue peeled off from the plant 8 and the bacteria washed from the plant 8 together with the liquid fertilizer 50 and the liquid for cleaning, can be effectively guided to the discharge flow path 30. have.

In each said embodiment, although the discharge flow path 30 is connected to the cultivation tank 7, the liquid fertilizer tanks 1 and 1A, or the washing | cleaning liquid tank 1B, the cultivation tank 7 and the liquid fertilizer tank 1 , 1A) or other external equipment other than the cleaning liquid tank 1B. In this case, the liquid fertilizer 50 or the cleaning liquid in the culture tank 7 may be discarded after being used.

In each said embodiment, the liquid fertilizer supply part is comprised by 2 A of spray pumps, and the liquid fertilizer supply flow path 5. Moreover, the washing | cleaning liquid supply part is comprised by the washing | cleaning pump 2B and the washing | cleaning liquid supply flow path 3. In each embodiment, the liquid fertilizer 50 is supplied into the cultivation tank 7 by 2 A of spray pumps, and the liquid for cleaning is supplied into the cultivation tank 7 by the washing pump 2B. However, at least one of the liquid fertilizer 50 and the cleaning liquid may be supplied to the cultivation tank 7 by its own weight. In this case, at least one of the liquid fertilizer tank 1A and the cleaning liquid tank 1B is disposed at a position higher than the cultivation tank 7, and at least one of the liquid fertilizer supply flow passage 5 and the cleaning liquid supply flow passage 3. The on / off valve in which the opening / closing operation is controlled by the control part 60 may be provided in the

(Combination of Embodiments)

As long as it does not contradict each other, it is possible to combine each structure and function of the said embodiment. That is, the structure and function of a part of embodiment and the structure and function of a part of other embodiment can be combined with each other, unless the invention can be implemented by combining.

Hereinafter, the characteristic structure of the hydroponic cultivation apparatus 100 of embodiment, and the effect obtained by it are demonstrated.

(1) The hydroponic cultivation apparatus 100 includes a cultivation tank 7, a liquid fertilizer spraying unit 5a, a cleaning liquid discharge unit 3a, and a discharge passage 30. The cultivation tank 7 contains at least part of the plant 8. The liquid fertilizer spray unit 5a sprays the liquid fertilizer 50 into the space in the cultivation tank 7 so as to supply the liquid fertilizer 50 to at least part of the plant 8. The washing | cleaning liquid discharge part 3a discharges the liquid for washing | cleaning to the space in the cultivation tank 7 so that at least one of at least one part of the plant 8 and the inner surface of the cultivation tank 7 may be wash | cleaned. The discharge flow path 30 guides the liquid fertilizer 50 and the cleaning liquid from the cultivation tank 7 to the outside of the cultivation tank 7. According to this, the sanitary environment in the vicinity of the plant 8 can be maintained in a favorable state.

(2) It is preferable that the hydroponic cultivation apparatus 100 further includes a washing liquid adjusting unit 4 and a control unit 60. The cleaning liquid adjusting unit 4 adjusts the discharge mode of the cleaning liquid discharged from the cleaning liquid discharge unit 3a. The control part 60 controls the operation | movement of the washing | cleaning liquid adjustment part 4 so that the washing | cleaning liquid adjusting part 4 may adjust the discharge aspect. According to this, since the liquid for washing | cleaning can be discharged in a more favorable aspect, the sanitary environment near the plant 8 can be maintained in a favorable state.

(3) The control part 60 discharges the cleaning liquid from the cleaning liquid discharge part 3a during or after the spraying of the liquid fertilizer 50 by the liquid fertilizer spraying part 5a. It is desirable to control the operation of h). Since the liquid fertilizer is prevented from being left in a state of being adhered to the plant 8 for a long time, the sanitary environment near the plant can be maintained in a good state.

(4) The same structure X may achieve the respective functions of the liquid fertilizer spray unit 5a and the cleaning liquid discharge unit 3a. In this case, the control part 60 controls the operation | movement of the washing | cleaning liquid adjustment part 4, and the discharge aspect of the liquid for cleaning of the same structure X and the spraying aspect of the liquid fertilizer 50 of the same structure X. Differently. According to this, spraying of liquid fertilizer and discharge of the liquid for washing | cleaning can be implement | achieved, without complicating the structure of the hydroponic cultivation apparatus 100. FIG.

(5) The hydroponic cultivation apparatus 100 guides the liquid fertilizer tank 1A for storing the liquid fertilizer 50 and the liquid for guiding the liquid fertilizer 50 from the liquid fertilizer tank 1A to the liquid fertilizer sprayer 5a. The fertilizer supply flow path 5 and the spray pump 2A which sends the liquid fertilizer 50 from the liquid fertilizer tank 1A to the liquid fertilizer supply flow path 5 may be provided. The hydroponic cultivation apparatus 100 further includes a washing liquid tank 1B for storing the washing liquid, a washing liquid supply flow passage 3 for guiding the washing liquid from the washing liquid tank 1B to the washing liquid discharge portion 3a; The cleaning pump 2B may be provided to send the cleaning liquid from the cleaning liquid tank 1B to the cleaning liquid supply passage 3. According to this, the liquid fertilizer 50 and the cleaning liquid can be made different.

(6) At least a part of the cleaning liquid discharge part 3a may be disposed inside the cultivation tank 7 so as to discharge the cleaning liquid toward the inner wall surface of the cultivation tank 7. According to this, the sanitary environment in the vicinity of the plant 8 can be maintained in a more favorable state by washing | cleaning the inner wall surface of the cultivation tank 7 more effectively.

(7) The cleaning liquid discharge part 3a may discharge the liquid fertilizer 50 as a liquid for cleaning into the space in the cultivation tank 7. Since the cleaning liquid is not used separately from the liquid fertilizer 50, the structure for cleaning can be simplified.

(8) The cleaning liquid discharge part 3a may discharge the water 51 as a liquid for cleaning into the space in the cultivation tank 7. According to this, the liquid fertilizer 50 can be wash | cleaned from the plant 8 with water 51. FIG. Therefore, generation | occurrence | production of the state in which the liquid fertilizer 50 adheres to the plant 8 for a long time can be suppressed, without adversely affecting the plant 8. This is effective when cultivating the plant 8 in which the liquid fertilizer 50 is not preferably attached for a long time.

(9) It is preferable that the hydroponic cultivation apparatus 100 is coated with a water repellent on the inner surface of the cultivation tank 7. According to this, since a foreign material does not adhere easily to the inner surface of the cultivation tank 7, it becomes easy to wash off the foreign material which exists on the inner surface of the cultivation tank 7 by discharge of the liquid for cleaning.

(10) It is preferable that the hydroponic cultivation apparatus 100 further includes an air blowing unit 15 having a blowout hole 15a for taking air out of the cultivation tank 7. According to this, the foreign material adhering to at least one of at least one part of the plant 8 and the inner surface of the cultivation tank 7 can be dropped on the bottom face of the cultivation tank 7 by blowing with air. Therefore, it is possible to more easily discharge the foreign matter from the culture tank 7 using the cleaning liquid.

This application claims the priority based on Japanese Patent Application No. 2017-079759 of the Japanese application for which it applied on April 13, 2017, and uses all the description of that Japan application by reference.

3a: washing liquid discharge portion 4: washing liquid adjusting portion
5a: liquid fertilizer spraying unit 7: cultivation tank
8: plant 15: blower
15a: ejection hole 30: discharge passage
35a: switching valve (cleaning liquid control part) 50: liquid fertilizer
60: control unit 100: hydroponic cultivation apparatus
X: same structure (liquid fertilizer spray part, cleaning liquid discharge part)

Claims (10)

A cultivation containing at least part of the plant,
A liquid fertilizer spraying unit for spraying the liquid fertilizer into the space in the cultivation tank so as to supply liquid fertilizer to at least a part of the plant;
A cleaning liquid discharge unit for discharging a liquid for cleaning to a space in the culture tank so as to clean at least one of the plant and at least one of the inner surfaces of the culture tank;
And a discharge passage for guiding the liquid fertilizer and the cleaning liquid from the cultivation tank to the outside of the cultivation tank.
Hydroponic cultivation device. The method of claim 1,
A washing liquid adjusting unit for adjusting a discharge mode of the washing liquid discharged from the washing liquid discharge unit;
And a control unit for controlling the operation of the cleaning liquid adjusting unit such that the cleaning liquid adjusting unit adjusts the discharge mode.
Hydroponic cultivation device. The method of claim 2,
The control unit controls the operation of the cleaning liquid adjusting unit to discharge the cleaning liquid from the cleaning liquid discharge unit during or after the spraying of the liquid fertilizer by the liquid fertilizer spraying unit.
Hydroponic cultivation device. The method of claim 2 or 3,
The same structure achieves the respective functions of the liquid fertilizer sprayer and the cleaning liquid discharger,
The control unit controls the operation of the cleaning liquid adjusting unit so that the spraying mode of the liquid fertilizer of the same structure is different from the discharge mode of the cleaning liquid of the same structure.
Hydroponic cultivation device. The method according to any one of claims 1 to 3,
A liquid fertilizer tank for storing the liquid fertilizer,
A liquid fertilizer supply passage for guiding the liquid fertilizer from the liquid fertilizer tank to the liquid fertilizer spray unit;
A spray pump for sending the liquid fertilizer from the liquid fertilizer tank to the liquid fertilizer supply passage;
A washing liquid tank for storing the washing liquid;
A cleaning liquid supply passage for guiding the cleaning liquid from the cleaning liquid tank to the cleaning liquid discharge section;
A cleaning pump for sending the cleaning liquid from the cleaning liquid tank to the cleaning liquid supply passage.
Hydroponic cultivation device. The method according to any one of claims 1 to 5,
At least a portion of the cleaning liquid discharge portion is disposed inside the culture tank to discharge the cleaning liquid toward the inner wall surface of the culture tank.
Hydroponic cultivation device. The method according to any one of claims 1 to 6,
The cleaning liquid discharge unit discharges the liquid fertilizer as the liquid for cleaning to the space in the culture tank.
Hydroponic cultivation device. The method according to any one of claims 1 to 6,
The cleaning liquid discharge unit discharges water as the cleaning liquid to the space in the culture tank.
Hydroponic cultivation device. The method according to any one of claims 1 to 8,
On the inner surface of the cultivation tank is subjected to a water-repellent coating
Hydroponic cultivation device. The method according to any one of claims 1 to 9,
In the inside of the cultivation tank, further comprising a blower having a blowout hole for taking out air
Hydroponic cultivation device.

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