KR20190030754A - Material for Metal Mask and Manufacturing Method Thereof - Google Patents

Abstract

A preferable material for a metal mask and a method of manufacturing the same are provided in that the shape change after etching is suppressed and satisfactory resist adhesion and etching processability are obtained. The surface roughness in the rolling direction and the surface roughness in the direction perpendicular to the rolling direction are both 0.05 占 퐉 Ra? 0.25 占 퐉 and Rz? 1.5 占 퐉, and the metal mask material is in a direction perpendicular to the rolling direction And a deflection when a sample having a length of 150 mm and a width of 30 mm is cut out from the metal mask material and the sample is etched from one side to remove 60% of the plate thickness of the sample And the thickness of the metal mask material is 0.10 mm or more and 0.5 mm or less.

Description

Material for Metal Mask and Manufacturing Method Thereof

The present invention relates to a material for a metal mask and a manufacturing method thereof.

For example, in the fabrication of an organic EL display, a metal mask is used to deposit with a substrate to produce color patterning. Such a metal mask is one of methods for fabricating openings, and a method of performing etching on a thin plate of an Fe-Ni alloy is known. Various proposals have been made to improve the etching characteristics. For example, in Patent Document 1, in order to enable formation of a highly detailed etching pattern, the surface roughness Ra measured in the direction perpendicular to the rolling direction is 0.08 to 0.20 μm and the surface roughness measured in the rolling direction is Ra: 0.01 And the surface roughness measured in the direction perpendicular to the rolling direction is greater than 0.02 탆 in terms of Ra rather than the surface roughness measured in the rolling direction, and the rough surface roughness is described have. Patent Document 2 describes a metal mask material in which the etching properties are improved by adjusting the X-ray diffraction intensities of the crystal orientations (111), (200), (220), and (311) on the rolled surface.

Japanese Patent Application Laid-Open No. 2010-214447 Japanese Patent Application Laid-Open No. 2014-101543

In order to manufacture a product such as a fixed organic EL display, it is necessary to form a more precise pattern on a mask to be used. For this purpose, in addition to the surface skin on which the etching can proceed uniformly, it is also required to further improve the adhesion between the resist and the material in order to suppress the side etching. Patent Document 1 and Patent Document 2 are excellent inventions in terms of improving the etching processability, respectively, but there is room for further examination as to the improvement of adhesion at the same time.

An object of the present invention is to provide a material for a metal mask and a method of manufacturing the same that are suitable for suppressing shape changes after etching and obtaining good resist adhesion and etching processability.

In order to achieve the above object, the inventors of the present invention have extensively studied various factors affecting etching processing such as chemical composition, surface roughness, residual stress and the like. As a result, the inventors of the present invention have found a structure which can improve the adhesion with a resist and perform uniform etching, and which is effective in suppressing the change in shape after etching.

That is, one mode of the present invention is a metal mask comprising 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, 30 to 50% of Ni and the balance of Fe and inevitable impurities As a material for use,

Wherein the metal mask material has a surface roughness in a rolling direction and a surface roughness in a direction orthogonal to the rolling direction of 0.05 μm ≦ Ra ≦ 0.25 μm and Rz ≦ 1.5 μm,

Wherein the metal mask material has a strain Rsk of 0 or more in a direction perpendicular to the rolling direction,

A sample having a length of 150 mm and a width of 30 mm was cut out from the metal mask material and the sample was etched from one side to remove 60% of the plate thickness of the sample, and the amount of warping was 15 mm or less. Mm or more and 0.5 mm or less.

Preferably, the distortion Rsk in the rolling direction of the metal mask material is smaller than the Rsk in the direction orthogonal to the rolling direction of the metal mask material.

Preferably, the surface roughness Ra in the direction orthogonal to the rolling direction of the metal mask material is larger than the surface roughness Ra in the rolling direction of the metal mask material.

Preferably, Rsk in the direction orthogonal to the rolling direction of the metal mask material is 1 or less.

Preferably, a sample having a length of 150 mm and a width of 30 mm is cut out from the metal mask material, and one of 20%, 30% and 50% of the plate thickness of the sample is removed by etching the sample from one side Is not more than 15 mm.

Another embodiment of the present invention is a cold-rolled steel sheet comprising, by mass%, at least 0.01% of C, at most 0.5% of Si, at most 1.0% of Mn, and at most 30% of Ni and the balance of Fe and inevitable impurities A process for producing a metal mask material for cold rolling a rolling material to obtain a metal mask material,

Wherein the conditions of the final pass in the finish cold rolling step for the cold rolling material are not more than 35%, the rolling angle of the rolling roll is not less than 1.0 °,

Wherein the metal mask material has a surface roughness in a rolling direction and a surface roughness in a direction orthogonal to the rolling direction of 0.05 mu m ≤ 0.25 mu m and Rz mu 1.5 mu m or less, The reason why Rsk is 0 or more,

A sample having a length of 150 mm and a width of 30 mm was cut out from the metal mask material and the amount of warping when the sample was etched from one side to remove 60% of the plate thickness of the sample was 15 mm or less,

And the plate thickness of the material after the finish cold-rolling is 0.10 mm or more and less than 0.5 mm.

Preferably, the engaging angle of the rolling roll is 3.0 DEG or less.

Preferably, the reduction ratio of the final pass in the finish cold rolling step is 15% to 35%.

Preferably, the surface roughness Ra in the direction perpendicular to the circumferential direction of the roll used in the final pass of the finish cold rolling step is 0.05 to 0.25 탆.

Preferably, the rolling speed of the finish cold rolling step is 150 m / min or less.

(Effects of the Invention)

According to the present invention having the above features, it is possible to obtain a material for a metal mask which is less likely to change in shape after etching and is suitable for improving adhesion with a resist.

Hereinafter, the present invention will be described in detail. However, the present invention is not limited to the embodiments described herein, but can be appropriately combined and improved without departing from the technical idea of the invention. The material for the metal mask of the present invention includes a coil wound around a coil or a rectangular thin plate produced by cutting the coil.

The metal mask material according to the present invention is characterized by containing, by mass%, C: not more than 0.01%, Si: not more than 0.5%, Mn: not more than 1.0%, Ni: 30 to 50%, the balance being Fe and inevitable impurities The reason why the Fe-Ni alloy is used is as follows.

[C: 0.01 mass% or less]

C is an element that affects the etchability. When C is excessively contained, the upper limit of C is set to 0.01% to deteriorate the etching property. C may be 0%, but the lower limit is not particularly limited because it is included in the manufacturing process in a considerable amount.

[Si: 0.5 mass% or less, Mn: 1.0 mass% or less]

Si and Mn are usually used for the purpose of deoxidation and are contained in a small amount in the Fe-Ni alloy. However, when contained excessively, segregation tends to occur, so that Si and Mn are set to 0.5% or less and 1.0% or less of Mn. The preferable amount of Si and Mn is 0.1% or less of Si and 0.5% or less of Mn. The lower limit of Si and Mn can be set to, for example, 0.05% for Si and 0.05% for Mn.

[Ni: 30 to 50 mass%]

Ni has an action of adjusting the coefficient of thermal expansion and is an element that greatly affects the low thermal expansion property. When the content is less than 30% or exceeds 50%, the effect of lowering the coefficient of thermal expansion is lost. Therefore, the range of Ni is set to 30 to 50%. The preferable amount of Ni is 32 to 45%.

Other constituents than the above are Fe and inevitable impurities.

First, the metal mask material of the present invention will be described.

(Surface roughness)

The surface roughness of the metal mask material of the present invention is 0.05 to 0.25 탆 in terms of arithmetic mean roughness Ra (in accordance with JIS-B-0601-2001), and the maximum height Rz (in accordance with JIS-B-0601-2001) And is 1.5 mu m or less. By having Ra and Rz within the above range, the material of the present invention can be etched with high accuracy. If Ra is more than 0.25 占 퐉, the surface of the workpiece is excessively rough, which causes variations in the progress of etching and makes it difficult to perform highly accurate etching. When Ra is less than 0.05 占 퐉, the adhesion of the resist tends to decrease. If Rz exceeds 1.5 mu m even if the above Ra range is satisfied, a large acid portion in the roughness curve is formed on a part of the work surface and etching proceeds from the ridge portion to cause etching unevenness. I can not. The lower limit of Rz is not particularly limited, but it is preferable to set the lower limit of Rz to 0.3 mu m in order to obtain higher adhesion. The upper limit of Ra is more preferably 0.20 占 퐉, and the upper limit of Rz is more preferably 1.2 占 퐉. The surface roughness is defined by the surface roughness of a direction orthogonal to the rolling direction of the metal mask material (hereinafter also referred to as "width direction" or "perpendicular to the rolling direction") in order to suppress local etching unevenness, Direction (hereinafter, also referred to as " longitudinal direction "). The surface roughness in the width direction of the metal mask material in the present embodiment is preferably larger than the surface roughness measured in the rolling direction. As a result, the rolling oil can be easily discharged from between the roll and the workpiece, and the oil pit formed by the binding of the rolling oil can be suppressed. Concretely, Ra in the width direction is preferably 10% or more higher than Ra in the rolling direction, because it is easy to obtain the oil-pit suppressing effect described above. In order to measure the surface roughness, a contact type or non-contact type roughness meter generally used can be used.

The metal mask material of the present embodiment is characterized by having a distortion Rsk (in accordance with JIS-B-0601-2001) ≥0 in a direction orthogonal to the rolling direction of the material in addition to the above surface roughness . By satisfying the above-described numerical value range, a large number of peak portions having a sharp shape are formed in the roughness curve of the work surface, so that a high anchor effect can be obtained. As a result, it is possible to improve the adhesion between the metal mask material and the resist, thereby suppressing the side etching caused by the penetration of the etching liquid into the boundary between the material and the resist. If the value of Rsk excessively increases excessively, there is a possibility of inhibiting the uniform progress of the etching, the upper limit of Rsk is preferably 1.0, more preferably 0.5. Further, by making Rsk in the rolling direction of the blank smaller than Rsk in the width direction, the oil-pit suppressing effect described above can be improved. Rsk in the rolling direction may be a value (minus value) less than 0 if it is smaller than the value of Rsk in the width direction. The metal mask material of the present embodiment is applied to a material having a thickness of 0.5 mm or less in order to sufficiently obtain the above-described Rsk effect. Preferably, the plate thickness is 0.2 mm or less. Further, the lower limit of the plate thickness is set to 0.10 mm in order to make it easy to adjust the engagement angle to be described later to 1.0 degrees or more.

(Amount of deflection)

The metal mask material of the present embodiment is characterized in that a specimen having a length of 150 mm and a width of 30 mm is cut out and the specimen is etched from one side to remove 60% of the thickness of the specimen, do. As described above, even when the residual stress in the region of 60% of the plate thickness is reduced, the balance of the stress is further reduced, even if etching is performed in the vicinity of the center of the plate thickness, the etching can be progressed satisfactorily by suppressing the deformation. Therefore, it is possible to cope with half etching of various depths, and the degree of freedom of the etching pattern can be improved. Preferably, the amount of warping when any one of 20%, 30%, and 50% of the thickness of the sample is removed is 15 mm or less. More preferably, the warpage is 15 mm or less even if 20, 30 or 50% of the plate thickness of the sample is removed. This bending amount is preferably 13 mm or less, more preferably 11 mm or less, and further preferably 9 mm or less. Most preferably, when the stress balance is likely to collapse and large warpage easily occurs, the amount of warpage when the sample is removed by 50% of the plate thickness is 9 mm or less, and when 20% or 30% of the plate thickness is removed Is preferably 7 mm or less. In the present embodiment, the sample is cut so that the longitudinal direction is in the rolling direction, and the warpage is measured. The method of measuring the amount of deflection in this embodiment is a method in which the upper end of a cut sample is suspended in contact with a vertical platen after being removed from one side of the sample by etching and the lower end of the cut sample, And the horizontal distance is measured as a bending amount.

Next, a method for manufacturing a metal mask material of the present invention will be described.

In the manufacturing method of the present embodiment, for example, a process such as vacuum melting-hot forging-hot rolling-cold rolling can be applied. If necessary, homogenization heat treatment may be performed at a temperature of about 1200 ° C before the cold rolling, and annealing at 800 ° C to 950 ° C may be performed at least once to reduce the hardness of the cold rolled steel during the cold rolling step. In the cold rolling step, an edge cutting process may be performed to remove the scale of the surface, or to remove the edge wave portion generated in the removal of the off gauge portion (the thick plate portion) of the material end and the rolling process. It is possible to use conventional ones such as a furnace, a vertical furnace, and a horizontal furnace (horizontal furnace) to be used in the heat treatment process. However, in order to prevent the furnace from bending and to increase the steepness of the material, It is preferable to use a vertical furnace.

In the production method of this embodiment, the reduction rate in the final pass in the finish cold rolling step is adjusted to 35% or less. If the reduction rate exceeds 35%, the residual deformation of the material becomes large, and the occurrence of deformation during the etching process tends to increase. The upper limit of the preferable reduction rate is 30%. If the reduction rate is too small, it is difficult to adjust the surface roughness as described above. Therefore, the lower limit of the reduction rate is preferably set to 15%. More preferably, the lower limit of the reduction rate is 18%, and the lower limit of the reduction rate is more preferably 20%. The number of passes in the finish cold rolling is not specifically defined but may be carried out a plurality of times (for example, three times or more), but the finish rolling is carried out with a single pass number in order to prevent rolling- desirable.

In the production method of the present embodiment, a roll used for finish cold rolling may be a roll having a surface roughness Ra of 0.05 to 0.25 탆 in a direction perpendicular to the circumferential direction of the roll (the direction of rotation of the roll). The upper limit of Ra is preferably 0.15 mu m. Thus, a desired roughness can be imparted to the metal mask material. The material of the roll is not particularly limited, and for example, an alloy tool steel roll specified in JIS-G4404 can be used. In addition, since generation of oil pits can be suppressed by giving the rolls an illuminance that facilitates the oil at the time of rolling to escape between the surface of the rolled material and the rolls, the roll surface of the production method according to the present invention It is preferable to form a concavity. The formation of the forty-five streaks can be achieved by preparing a grindstone having roughness Ra of 0.05 to 0.25 μm in the direction perpendicular to the circumferential direction of the roll, and pressing the grindstone while rolling the roll. It is more preferable that the difference between the circumferential roughness of the roll in the present embodiment and the surface roughness in the direction perpendicular to the circumferential direction is 0.02 탆 or more by Ra. With this feature, it is possible to intentionally make a difference between the surface roughness of the metal mask material in the direction perpendicular to the rolling direction and the surface roughness in the rolling direction, and the rolling oil is more easily discharged, It is possible.

In the manufacturing method according to the present invention, in the finish cold rolling, the engaging angle which is an angle at which the pressurized steel strip and the work roll start to contact is set to 1.0 degrees or more. By adjusting the engagement angle in this manner, it is possible to obtain a desired surface roughness while suppressing excessive occurrence of oil pits. Here, if the engaging angle is excessively large, there is a possibility that the rolling load becomes excessive and a desired rolled shape may not be obtained, so that the upper limit of the engaging angle can be set to 3.0 degrees. The upper limit of the preferred engagement angle is 2.0 [deg.]. In addition, it is preferable that the above-mentioned engagement angle is applied to all passes of finish cold rolling. Also can be derived from the calculation of each of the engagement when said angle θ for engagement in this embodiment, θ = 180 / π · arccos ((R- (h 0 -h 1) / 2) / R). Where R: roll radius, h _0: a rolling material after the panel thickness: material sheet thickness before rolling, h _1.

In the manufacturing method of the present embodiment, it is preferable to set the rolling speed to 150 m / min or less. By setting the rolling speed to 150 m / min or less, it is possible to reduce the rolling flow rate introduced between the work roll and the metal mask material, suppress the occurrence of oil pits, and more reliably adjust Rsk to a positive value. The upper limit of the rolling speed is more preferably 120 m / min. More preferably, the upper limit is set at 100 m / min. The lower limit of the rolling speed is not specially set, but if it is too slow, the production efficiency is lowered, and therefore it can be set at 20 m / min. Preferably 30 m / min.

In the manufacturing method of the present embodiment, deformation removing annealing may be performed in order to remove deformation remaining in the material for etching after the finish rolling and to suppress a shape defect occurring in the material. The deformation removing annealing is preferably performed at a temperature of about 400 to 700 占 폚. The annealing time is not particularly limited, but if it is excessively long, the characteristics such as tensile strength largely deteriorate. If the annealing time is too short, the effect of removing deformation can not be obtained. Therefore, the annealing time is preferably about 0.5 to 3.0 min. More preferably, the lower limit of the deformation-removing annealing time is 1.2 min, and the lower limit of the deformation-removing annealing time is more preferably 1.5 min.

(Example)

The present invention will be described in more detail in the following examples.

The chemical composition of the metal mask material of this embodiment is shown in Table 1. The Fe-Ni alloy of the present example was subjected to cold rolling after a step of finishing with a thickness of 2 to 3 mm by vacuum melting-hot forging-homogenizing heat treatment-hot rolling. The Fe-Ni alloy after the hot rolling was subjected to cold rolling including two annealing steps to produce an Fe-Ni alloy cold rolled steel sheet. The thickness of each of the Fe-Ni alloy cold rolled steel sheets before the final pass of the finish cold rolling was 0.125 mm (sample No. 1) and 0.275 mm (sample No. 2), and the sample No. 1 was 0.10 mm The reduction rate was 20%), and the sample No. 2 was subjected to cold rolling to adjust the rolling conditions so as to be 0.20 mm (reduction ratio of 27%). The roll angle of the sample No. 1 at this time was 1.28 °. The roll angle of the sample No. 2 was 2.22 °. In Sample Nos. 1 and 2, the rolling speed at the time of finish cold rolling was approximately 100 m / min. Further, a roll having a roughness Ra in a direction orthogonal to the circumferential direction of the roll used for finishing cold rolling (the direction of rotation of the roll) was in the range of 0.08 to 0.25 占 퐉. After finishing cold rolling, the sample No. 1 was subjected to deformation removal annealing at a temperature of 600 캜 for 2 minutes and the sample No. 2 was annealed at a temperature of 630 캜 for 1 minute. As a comparative example, Sample No. 11 was prepared by adjusting the rolling conditions and adjusting the roll engagement angle to less than 1.0 °. The chemical composition of the sample No. 11, the final plate thickness, and the deformation removing annealing conditions are the same as those of the sample No. 1.

Subsequently, the surface roughness and warpage of the obtained sample were measured. The surface roughnesses Ra, Rz and Rsk were measured randomly at three positions according to the measuring methods indicated by JISB0601 and JISB0651, and the surface roughnesses in the longitudinal direction and the width direction were measured. The measurement was performed using a contact-type illuminometer, under the conditions of an evaluation length of 4 mm, a measurement speed of 0.3 mm / s, and a cut-off value of 0.8 mm. Table 2 shows the average values at three places. In addition, the measurement of the warpage was made by cutting samples having a length of 150 mm and a width of 30 mm, etching from one side so as to be 2/5 of the plate thickness (removing 60% of the plate thickness) Was measured and evaluated. The cut samples were collected in the widthwise middle portion of the fabricated sample so that the longitudinal direction was the rolling direction. The test piece was corroded by spraying an etching solution at a liquid temperature of 50 DEG C using an aqueous ferric chloride solution as an etching solution. The results are shown in Table 2.

From the results shown in Table 2, Sample No. 1 and Sample No. 2, which are materials for the metal mask of the present invention, exhibit good adhesion and uniform etching workability, and thus are in an optimum surface state, It was confirmed that the change in the shape after the etching can be suppressed. On the other hand, it was confirmed that the sample No. 11, which is a comparative example, has a high possibility that the adhesiveness is lower than that of the present invention because the width direction of Rsk is a minus value.

(Example 2)

Subsequently, a plurality of cut samples each having a length of 150 mm and a width of 30 mm of sample No. 1 and sample No. 2 were prepared, and sample Nos. 3 to 8 of the present invention in which the etching removal amount was changed as shown in Table 3 were prepared And the amount of deflection was measured. In Table 3, 3 to 5 are samples prepared in Sample No. 1, and Sample Nos. 6 to 8 are samples prepared in Sample No. 2. The method of measuring the amount of bending and the etchant used are the same as those used in Example 1. [ The results are shown in Table 3.

From the results shown in Table 3, it was confirmed that the metal mask material of the present invention can suppress the amount of deflection even if the etching depth is changed. Particularly, when the removal amount of the material by etching is 50% of the plate thickness, the balance between the compressive residual stress and the tensile residual stress tends to collapse and excessive warpage tends to occur. However, excessive warpage does not occur in the material of the present invention It was confirmed that it is suitable for use in etching. Further, it was confirmed that the specimens Nos. 3 to 5 had less warpage than the specimens Nos. 6 to 8. This is considered to be because the deformation removing and annealing time of the specimens Nos. 6 to 8 was shorter than that of the specimens Nos. 3 to 5 at the time of preparing the specimen, so that the amount of deformation remained was slightly increased.

Claims (10)

And a balance of Fe and unavoidable impurities, wherein the content of C is 0.01% or less, the content of Si is 0.5% or less, the content of Mn is 1.0% or less and the content of Ni is 30-50%
Wherein the metal mask material has a surface roughness in a rolling direction and a surface roughness in a direction orthogonal to the rolling direction of 0.05 μm ≦ Ra ≦ 0.25 μm and Rz ≦ 1.5 μm,
Wherein the metal mask material has a strain Rsk of 0 or more in a direction perpendicular to the rolling direction,
A specimen having a length of 150 mm and a width of 30 mm was cut out from the metal mask material and the specimen was etched from one side to remove 60% of the thickness of the specimen and the amount of warping was 15 mm or less, Mm or more and 0.5 mm or less. The method according to claim 1,
And the distortion Rsk in the rolling direction of the metal mask material is smaller than Rsk in the direction orthogonal to the rolling direction of the metal mask material. 3. The method according to claim 1 or 2,
Wherein the surface roughness Ra in the direction perpendicular to the rolling direction of the metal mask material is larger than the surface roughness Ra in the rolling direction of the metal mask material. 4. The method according to any one of claims 1 to 3,
And the Rsk in the direction orthogonal to the rolling direction of the metal mask material is 1.0 or less. 5. The method according to any one of claims 1 to 4,
A sample having a length of 150 mm and a width of 30 mm was cut out from the metal mask material and the amount of warping when any one of 20%, 30% and 50% of the plate thickness of the sample was removed by etching the sample from one side Wherein the metal mask material has a thickness of 15 mm or less. The cold-rolled material, which contains 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, 30 to 50% of Ni and the balance of Fe and inevitable impurities, A method of manufacturing a material for a metal mask,
Wherein the conditions of the final pass in the finish cold rolling step for the cold rolling material are a rolling reduction of 35% or less and a rolling angle of the rolling roll of 1.0 DEG or more,
The metal mask material is characterized in that the surface roughness in the rolling direction and the surface roughness in the direction perpendicular to the rolling direction are all 0.05 μm ≦ Ra ≦ 0.25 袖 m and Rz ≦ 1.5 袖 m and in the direction orthogonal to the rolling direction The reason why Rsk is 0 or more,
A sample having a length of 150 mm and a width of 30 mm was cut out from the metal mask material and the amount of warping when the sample was etched from one side to remove 60% of the plate thickness of the sample was 15 mm or less,
Wherein the thickness of the material after the finish cold-rolling is 0.10 mm or more and 0.5 mm or less. The method according to claim 6,
Wherein the rolling angle of the rolling roll is 3.0 DEG or less. 8. The method according to claim 6 or 7,
Wherein the reduction rate of the final pass in the finish cold rolling step is 15% to 35%. 9. The method according to any one of claims 6 to 8,
Wherein the surface roughness Ra in the direction perpendicular to the circumferential direction of the roll used in the final pass of the finish cold rolling step is 0.05 to 0.25 占 퐉. 10. The method according to any one of claims 6 to 9,
Wherein the rolling speed of the finish cold rolling step is 150 m / min or less.