KR20190024373A - Apparatus for exposing edge of display glass and wafer - Google Patents

Abstract

Disclosed is an edge exposing device for display glass and a wafer. The edge exposing device for display glass and a wafer comprises: a first exposing unit selectively exposing an edge bead depending on formation of a photosensitive film of an object; a second exposing unit exposing other edge beads excluding the edge bead exposed by the first exposing unit; an exposing zone provided with the object placed thereon so that an exposing process is performed, in which the first exposing unit and the second exposing unit expose the edge bead; a first transferring member transferring the first exposing unit to the exposing zone in a vertical direction to the direction in which the object is received; and a second transferring member transferring the second exposing unit to the exposing zone in a vertical direction to the direction in which the object is received. The edge exposing device for display glass and a wafer can easily adjust a range for exposing the edge bead by emitting a light source, can accurately make the light source correspond to the edge bead conveniently compared with the existing art, and can save production costs of equipment by being manufactured in a small size.

Description

Technical Field [0001] The present invention relates to an edge exposure apparatus for a display glass and a wafer,

The present invention relates to an edge exposure apparatus for a display glass and a wafer.

Photolithography is a method of forming a thin film on a substrate such as a display glass or a wafer, forming a desired mask pattern, and then forming a circuit by applying light and taking a picture.

On the other hand, in the process of thinly applying the photosensitive film to the object before the photolithography process, a photosensitive liquid for forming a photosensitive film is deposited on the object, and the photosensitive liquid is spread widely by the spin of the chuck on which the object is placed to cover the upper surface of the object to form a photosensitive film .

In this process, the photosensitive liquid is excessively pushed to the edge portion of the object by the centrifugal force of the chuck, and an edge bead in which the edge portion of the object protrudes abnormally is generated.

These edge beads lowered the flatness of the surface of the object, and sometimes acted as an obstacle in the remaining process, or fragments were generated when the process was broken during the process, and the edge of the object was damaged due to the generation of debris, .

Accordingly, an edge exposure apparatus has been developed which further exposes and removes edge beads in order to remove such edge beads, and examples of such apparatuses are those disclosed in the following patent documents.

However, according to the conventional edge exposure apparatus including the following patent documents, the light source was directly emitted toward the edge bead, and the range in which the light source was emitted and the edge bead was exposed could not be adjusted. Therefore, it was common to expose an edge bead or more.

Further, although the edge bead is made to correspond to the light source by moving the position of the object so that the light source is precisely aligned with the edge bead, the work also requires a precise positional movement, and there is a problem that the worker takes time and accuracy to perform the work.

Registered Patent No. 10-0466311, Registered Date: Jan. 13, 2004, Title of the Invention: Exposure Apparatus for Semiconductor Process and Exposure Method Using the Same Registered Patent No. 10-0960083, Date of Registration: May 19, 2010, Title of the Invention: Light source device for wafer edge exposure

The present invention can easily adjust a range in which a light source is illuminated to expose an edge bead, can easily match a light source to an edge bead more easily than the conventional one, can be manufactured in a small size, And an edge exposing device for an edge.

According to an aspect of the present invention, there is provided an edge exposure apparatus for a display glass and a wafer, comprising: a first exposure unit for selectively exposing an edge bead according to formation of a photosensitive film of a target; A second exposure unit for exposing the edge beads other than the edge bead exposed by the first exposure unit; An exposure zone on which the object is placed so that the first exposure unit and the second exposure unit perform an exposure process for exposing the edge bead; A first transfer unit for transferring the first exposure unit in a direction perpendicular to the direction in which the object is loaded into the exposure zone; And a second transfer unit for transferring the second exposure unit in a direction perpendicular to a direction in which the object is loaded into the exposure zone.

According to an aspect of the present invention, there is provided an edge exposure apparatus for a display glass and a wafer, comprising: a first exposure unit for selectively exposing an edge bead according to formation of a photosensitive film of a target; A second exposure unit for exposing the edge beads other than the edge bead exposed by the first exposure unit; An exposure zone on which the object is placed so that the first exposure unit and the second exposure unit perform an exposure process for exposing the edge bead; A first transfer unit for transferring the first exposure unit in a direction perpendicular to the direction in which the object is loaded into the exposure zone; And a second transfer unit for transferring the second exposure unit in a direction perpendicular to a direction in which the object is loaded into the exposure zone. Thus, the range of light source light emission and edge bead exposure can be easily adjusted, The light source can be more accurately matched to the edge bead more easily than in the prior art, and it is manufactured in a small size and the manufacturing cost of equipment can be saved.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a structure of a first exposure unit disposed on an object with a photosensitive film formed thereon according to a first embodiment of the present invention; FIG.
FIG. 2 is a schematic view of a structure of a second exposure unit disposed on an object to be formed with a photoresist film according to a first embodiment of the present invention; FIG.
FIG. 3 is a top view of a state in which an object is prepared on a carry-in member according to the first embodiment of the present invention; FIG.
FIG. 4 is a top view showing a state in which a target object according to the first embodiment of the present invention is brought into an exposure zone from a carry-in member; FIG.
5 is a top view of a target object brought into the exposure zone according to the first embodiment of the present invention.
6 is a view showing a state in which the first exposure unit according to the first embodiment of the present invention is moved by the first transfer member and the second exposure unit is moved in the direction perpendicular to the entry direction in which the object enters the exposure zone by the second transfer member Fig.
7 is a view showing a state in which the first exposure unit and the second exposure unit, which have been moved according to the first embodiment of the present invention, are turned off.
8 is a view showing a state before the first exposure unit and the second exposure unit according to the first embodiment of the present invention are transferred to the original position.
9 is a view showing a state in which only the second exposure unit among the first exposure unit and the second exposure unit transferred to the home position according to the first embodiment of the present invention is lit.
FIG. 10 is a top view showing a state in which a target object of an exposure zone according to the first embodiment of the present invention is transferred to a carry-out member; FIG.
FIG. 11 is a top view showing a state in which a target object to which edge beads are completely exposed is taken out by a carry-out member according to a first embodiment of the present invention; FIG.
12 is a view schematically showing the structure of a first bead confirmation unit disposed on an upper portion of a target object on which a photoresist layer is formed according to a second embodiment of the present invention;
13 is a view schematically showing a structure of a second bead confirmation unit disposed on an upper portion of a target object on which a photosensitive film according to a second embodiment of the present invention is formed.
FIG. 14 is a top view showing a state in which a target object according to a second embodiment of the present invention is conveyed to a confirmation zone; FIG.
15 is a top view of a target object brought into a check zone according to a second embodiment of the present invention.
16 is a view showing a state in which the first bead confirmation unit according to the second embodiment of the present invention is held by the first confirmation conveyance member and the second bead confirmation unit is moved in the vertical direction in the entry direction in which the object enters the confirmation zone by the second confirmation & In direction.
17 is a view showing a state where the first bead confirmation unit and the second bead confirmation unit that have been moved according to the second embodiment of the present invention are turned off.
FIG. 18 is a view showing an activated state of only the first bead check unit and the second bead check unit, which have been delivered to the home position according to the second embodiment of the present invention; FIG.
FIG. 19 is a top view showing a state in which an object of an exposure zone is taken out according to a second embodiment of the present invention; FIG.

Hereinafter, an edge exposure apparatus for a display glass and a wafer according to embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic view showing a structure of a first exposure unit disposed on an object formed with a photoresist film according to a first embodiment of the present invention. FIG. 2 is a cross- FIG. 3 is a top view showing a state in which a target body is prepared on a carry-in member according to the first embodiment of the present invention, and FIG. 4 is a cross- FIG. 5 is a top view of a target object brought into the exposure zone according to the first embodiment of the present invention, and FIG. 5 is a top view of the object taken in the exposure zone according to the first embodiment of the present invention. 6 is a graph showing the relationship between the number of entrance directions in which the first exposure unit according to the first embodiment of the present invention is moved by the first transfer member and the second exposure unit is moved by the second transfer member into the exposure zone FIG. 7 is a view showing a state in which the first exposure unit and the second exposure unit, which have been moved according to the first embodiment of the present invention, are turned off, and FIG. FIG. 9 is a view showing a state in which the first exposure unit and the second exposure unit transferred in the home position according to the first embodiment of the present invention and the second exposure unit FIG. 10 is a top view showing a state in which a target body of an exposure zone according to the first embodiment of the present invention is transferred to a carry-out member, and FIG. 11 is a cross- The edge bead according to the first embodiment of the present invention is viewed from the top when the object to which the entire object is exposed is taken out by the carry-out member.

1 to 11, a display glass and an edge exposure apparatus 100 for a wafer according to the present embodiment includes a first exposure unit 110, a second exposure unit 120, an exposure zone 150, A first conveying member 130, and a second conveying member 140. As shown in FIG.

The edge exposure apparatus 100 for a display glass and a wafer may further include a carry-in member 160 and a carry-out member 170.

The first exposure unit 110 selectively exposes the edge beads 15 according to the formation of the photosensitive film 13 of the object 10 and includes a first case 111, a first light emitting body 112, 1 reflector 114, a first refracting body 115, and a first light source adjusting body 113.

Here, the object 10 refers to a display glass or a wafer on which a thin photosensitive film 13 is formed on a surface thereof in order to undergo a photolithography process.

The first case 111 is formed to have a predetermined size and has a hollow interior, and the first illuminant 112 to be described later is emitted toward the inside of the first case 111.

The first case 111 is preferably formed to have a small size that can be moved along the edge of the object 10 in conformity with a narrow width of the edge bead 15. However, It is needless to say that it can be made large so that it can be exposed at one time.

The first light emitting body 112 may be formed of a light emitting element such as an LED or an ultraviolet lamp by shooting a light source into the first case 111.

The first light emitting body 112 may be coupled to the first case 111 outside the case, but may be installed in the first case 111.

The first reflector 114 reflects the light source of the first light emitter 112 emitted toward the inside of the case and can change its path toward the first refractor 115 to be described later, May be formed of glass or metal capable of reflecting the light.

The first refracting body 115 refracts the light source so as to be emitted to the outside of the first case 111 by aggregating or dispersing the light source whose path is changed by the first reflector 114 , And the light source is formed to be transparent or opaque so as to be emitted from the first case (111).

1, the first refracting body 115 is formed of a convex lens protruding convexly toward the edge bead 15, and the light source is agglomerated to form the edge bead 15 But it may be formed of a concave lens so that the light source is dispersed to expose the edge bead 15. [

Here, since the first refracting body 115 formed in a convex lens shape can aggregate the light source, the edge bead 15 can be selectively and precisely exposed.

The first light source adjustment body 113 adjusts the inclined angle of the first reflector 114 to adjust the range of the light source reflected by the first reflector 114 to the first refractor 115 You can.

The first light source adjustment body 113 can rotate the first reflector 114 at the center of the first reflector 114 and precisely control the angle of rotation of the first reflector 114 , It can be formed as a servo motor which is easy to precisely control.

When the first light source adjustment body 113 is controlled to vertically close the first reflector 114 from the edge bead 15 in the state as described above, When the first light source adjustment body 113 controls the first reflector 114 to be close to the edge bead 15 in a horizontal state, the light source is moved to the first refraction body 115 ) Is increased.

The first exposure unit 110 formed as described above can finely adjust the light source to match the edge bead 15. That is, there is an advantage that the light source can be more accurately matched to the edge bead 15 than in the prior art.

The second exposure unit 120 selectively exposes the edge beads 15 in the same manner as the first exposure unit 110. The edge beads 15 exposed by the first exposure unit 110 The edge beads 15 are exposed. The second exposure unit 120 includes a second case 121, a second light emitting body 122, a second reflector 124, a second refracting body 125, a second light source adjusting body 123 ).

The second case 121 is formed to have a predetermined size and has a hollow interior. The second illuminator 122, which will be described later, is emitted toward the inside of the second case 121.

The second case 121 is preferably formed to have a small size that can be moved along the edge of the object 10 in conformity with the narrow width of the edge bead 15. However, It is needless to say that it can be made large so that it can be exposed at one time.

The second light emitting body 122 may be formed of a light emitting element such as an LED or an ultraviolet lamp by shooting a light source into the second case 121.

The second light emitting body 122 may be coupled to the second case 121 outside the case, but may be installed in the second case 121.

The second reflector 124 reflects the light source of the second light emitter 122 emitted toward the inside of the case and can change its path toward the second refractor 125 to be described later. May be formed of glass or metal capable of reflecting the light.

The second refracting body 125 refracts the light source so that the second refracting body 125 may reflect the light reflected by the second reflector 124 and agglomerate or disperse the light to be emitted to the outside of the second case 121 And is formed to be transparent or opaque so that the light source can be emitted from the second case 121.

1, the second refracting body 125 is formed of a convex lens protruding toward the edge bead 15 such that the light source is agglomerated to form the edge bead 15 But it may be formed of a concave lens so that the light source is dispersed to expose the edge bead 15. [

Here, the second refracting body 125 formed in a convex lens shape can agglomerate the light source, so that the edge bead 15 can be selectively and precisely exposed.

The second light source conditioning body 123 adjusts the inclined angle of the second reflector 124 to adjust the range of the light source reflected by the second reflector 124 to the second refractor 125 You can.

The second light source conditioning body 123 can rotate the second reflector 124 at the center of the second reflector 124 and precisely control the angle of rotation of the second reflector 124 , It can be formed as a servo motor which is easy to precisely control.

When the second light source adjusting body 123 is controlled to vertically close the second reflector 124 from the edge bead 15 in the state as described above, When the second light source conditioning body 123 controls the second reflector 124 to be close to the edge bead 15 in a horizontal state, the light source is moved to the second refraction body 125 ) Is increased.

The second exposure unit 120 formed as described above can finely adjust the light source to match the edge bead 15. That is, there is an advantage that the light source can be more accurately matched to the edge bead 15 than in the prior art.

The object 10 is placed on the exposure zone 150 so that the exposure process for exposing the edge bead 15 is performed by the first exposure unit 110 and the second exposure unit 120, Is relatively wider than the object (10) so as to securely support the object (10).

The first transfer unit 130 transfers the first exposure unit 110 in a direction perpendicular to the direction in which the target 10 is loaded into the exposure zone 150. The first transfer unit 130 And a first conveying rail 131. The first conveying rail 131 includes a first conveying rail 131,

The first conveying body 132 transportably connects the first case 111 to the first conveying rail 131. When electricity is supplied by an external power source (not shown), the first conveying body 132 (Not shown).

The first transfer rail 131 is formed to have a predetermined length so as to be transferred along the first transfer body 132. The first transfer rail 131 is disposed on the exposure zone 150 on the side where the object 10 enters the exposure zone 150, And the edge of the edge bead 15 in the direction perpendicular to the entering direction in which the object 10 enters the exposure zone 150 when the object 10 is disposed in the exposure zone 150. [ It is formed a long length in the sky.

The first conveying rail 131 can be moved in a direction perpendicular to the entry direction in which the object 10 enters the exposure zone 150 while the first conveying body 132 conveys the first exposure unit 110 And the edge beads 15 in the direction of exposure.

The first conveying rail 131 may be formed to extend from one side of the exposure zone 150 to the other side of the exposure zone 150, Is disposed above the exposure zone (150) to expose the substrate (15).

One side in this embodiment refers to the side on which the first exposure unit 110 is disposed with reference to the object 10 in Fig. 5, and the other side in this embodiment refers to the object 10 in Fig. Is the side on which the second exposure unit 120 is disposed.

The second transfer unit 140 transfers the second exposure unit 120 in a direction perpendicular to the direction in which the object 10 is loaded into the exposure zone 150. The second transfer unit 140 includes a second transfer body 142, And a second conveying rail 141,

The second conveying body 142 transportably connects the second case 121 to the second conveying rail 141. When electricity is supplied by an external power source (not shown), the second conveying body 142 (Not shown).

The second conveying rail 141 is formed to have a predetermined length so as to be conveyed along the second conveying body 142. The second conveying rail 141 is disposed on the exposed region 150 on the side where the object 10 is taken out of the exposure region 150, And the edge of the edge bead 15 in the direction perpendicular to the entering direction in which the object 10 enters the exposure zone 150 when the object 10 is disposed in the exposure zone 150. [ It is formed a long length in the sky.

The second conveying rail 141 is moved in a direction perpendicular to the entering direction in which the object 10 enters the exposure zone 150 while the second conveying body 142 conveys the second exposure unit 120 And the edge beads 15 in the direction of exposure.

That is, the second conveyance rail 141 is elongated in such a manner as to connect one side portion and the other side portion of the exposure zone 150, and the second conveyance rail 141 is provided on the side where the object 10 is taken out from the exposure zone 150 Is disposed above the exposure zone (150) to expose the edge bead (15).

5, the first conveying rail 131 and the second conveying rail 141 formed in the above-described manner are spaced apart from each other in parallel to each other above the exposure zone 15, The conveying rail 131 is provided on the side where the target body 10 is carried on the exposure zone 150 and on the side where the target body 10 is carried out from the exposure zone 150 by the second conveyance rail 141 And is formed so as to connect one side and the other side.

The edge bead 15 is formed in the exposure zone 150 in order to perform the exposure process of exposing the edge bead 15 using the display glass and the edge exposure apparatus 100 for a wafer, 3, the first exposure unit 110 may be disposed at one edge of the edge bead 15 where the edge beads 15 enter the exposure zone 150, and the second exposure The unit 120 is disposed at a position diagonally to the first exposure unit 110. [

The first exposure unit 110 exposes the edge bead 15 at one side edge of the target body 10 while the target body 10 is carried into the exposure zone 150. [

The first exposure unit 110 and the second exposure unit 120 are moved in a direction in which the first transfer unit 130 and the second transfer unit 130 are moved, The member 10 is moved in a direction perpendicular to the entering direction in which the object 10 enters the exposure zone 150 by the member 140 so that the object 10 is perpendicular to the entering direction in which the object 10 enters the exposure zone 150 To expose the edge bead 15 at the location.

The second exposure unit 120 exposes the remaining edge bead 15 which is the other edge portion of the object 10 when the object 10 is taken out from the exposure zone 150. [

As described above, since the entire edge bead 15 can be exposed even by using the first exposure unit 110 and the second exposure unit 120 manufactured in a small size, the edge exposure of the display glass and the wafer The production cost of the device 100 itself can be saved.

The carrying member 160 conveys the object 10 to the exposure zone 150 and is provided with a conveyor belt for rotating the object 10 to enter the exposure zone 150, As shown in FIG.

The carry-out member 170 conveys the object 10 of the exposure zone 150 and conveys the object 10 in a conveyor belt rotating in a direction in which the object 10 is taken out from the exposure zone 150, A transfer device may be formed.

Hereinafter, a method of exposing the edge bead 15 formed on the photoresist film 13 of the object 10 using the display and wafer edge exposing apparatus 100 will be described in detail with reference to the drawings.

First, the object 10 on which the edge beads 15 are formed by the photosensitive film 13 is prepared on the carrying member 160.

In order to proceed with the exposure process of exposing the edge bead 15 using the display glass and the edge exposing apparatus 100 for a wafer, the edge bead 15 is formed in the exposure zone 150, As shown in FIG. 3, the first exposure unit 110 may be disposed at one edge of the edge bead 15 to be exposed to the exposure zone 150 before the object 10 enters, 2 exposure unit 120 is disposed at a position diagonally to the first exposure unit 110. [

4, when the object 10 is transferred to the exposure zone 150 by the operation of the carry-in member 160, the first exposure unit 110 moves the edge beads 15 ) Is exposed.

Here, only the first light emitting unit 112 of the first exposure unit 110 emits light, and the second light emitting unit 122 of the second exposure unit 120 is turned off so that the standby power of the second light emitting unit 122 .

5, the object 10 is placed on the exposure zone 150 by the carrying member 160, and the second light emitter 122 is also placed on the first light emitter 112 And are emitted together.

6, the first exposure unit 110 is disposed on the other side perpendicular to the entry direction in which the object 10 enters the exposure zone 150 by the first transfer member 130. In addition, And the second exposure unit 120 is moved in the vertical direction of the entry direction in which the object 10 enters the exposure zone 150 by the second transfer member 140, The edge beads 15 in the direction perpendicular to the direction in which the object 10 enters are exposed to the exposure zone 150.

Then, as shown in FIG. 7, the light emission of the first light emitting body 112 and the second light emitting body 122 is stopped.

Then, as shown in FIG. 8, the first exposure unit 110 and the second exposure unit 120 respectively move to the original position.

Here, the home position refers to a position before the first exposure unit 110 and the second exposure unit 120 are conveyed by the first conveyance member 130 or the second conveyance member 140, The position of the first exposure unit 110 and the second exposure unit 120 shown in FIG.

10, after the second light emitting unit 122 of the second exposure unit 120 is emitted, only the second light emitting unit 122 of the second exposure unit 120 is illuminated toward the carry-out member 170 .

Then, the other edge of the remaining unexposed edge bead 15 is finally exposed while the object 10 is transferred to the carry-out member 170.

Finally, the object 10 carried by the carry-out member 170 is transported to a place where the object 10 is transported and transported.

The angle of the first reflector 114 or the second reflector 124 may be adjusted by adjusting the first light source adjusting member 113 or the second light source adjusting member 123 during the exposure process, Can be adjusted. It goes without saying that the light source amount can be adjusted to the edge node.

Hereinafter, an edge exposure apparatus for a display glass and a wafer according to another embodiment of the present invention will be described with reference to the drawings. In carrying out the above description, the description overlapping with the content already described in the embodiment of the present invention described above will be omitted and it will be omitted here.

FIG. 12 is a schematic view showing the structure of a first bead confirmation unit disposed on an object with a photoresist film formed thereon according to a second embodiment of the present invention. FIG. 13 is a cross- FIG. 14 is a top view showing a state in which a target body according to a second embodiment of the present invention is conveyed to a confirmation zone, FIG. 15 is a view FIG. 16 is a view showing a state in which the first bead confirmation unit according to the second embodiment of the present invention is carried by the first confirmation transfer member, and the second bead confirmation unit according to the second embodiment of the present invention, FIG. 17 is a view showing a state in which the bead confirmation unit is moved in a direction perpendicular to the entry direction in which the object enters the confirmation zone by the second confirmation / FIG. 18 is a view showing a first bead confirmation unit and a second bead confirmation unit according to a second embodiment of the present invention, FIG. 19 is a top view showing a state in which a target object of an exposure zone is taken out according to the second embodiment of the present invention. FIG.

12 to 19, the display glass and edge exposing apparatus for wafer according to the present embodiment includes a first exposure unit, a second exposure unit, an exposure zone, a first transfer member, A first confirmation conveyance member 282, a second confirmation conveyance member 292, a control unit 202, a confirmation bead confirmation unit 280, a first bead confirmation unit 280, a second bead confirmation unit 290, (201).

The first bead confirmation unit 280, the second bead confirmation unit 290, the first confirmation conveyance member 282, the second confirmation conveyance member 292, the control unit 202, The edge of the edge bead 15 of the target body 10 is exposed to the edge of the edge of the edge of the edge of the edge 10 of the target body 10, To determine the range of the edge beads 15 located at the edge.

The first bead confirmation unit 280 may be configured to detect the edge bead 15 before the exposure process of the edge bead 15 according to the formation of the photoresist film 13 of the target body 10 by the first exposure unit and the second exposure unit, And includes a first confirmation case 281 and a first height measurement sensor 285 for grasping the range of the edge bead 15 located at each portion of the object 10 by measuring the height of the edge bead 15 .

The first check case 281 is formed in a predetermined size, and the first height measurement sensor 285, which will be described later, is coupled to the bottom thereof.

The first height measurement sensor 285 is capable of measuring the linear distance in a noncontact manner. The first height measurement sensor 285 is configured to measure a distance from the first sensing range 286 shown in FIG. 12 by a plurality of lasers It is built-in.

The laser emits light in a straight line, and when the obstacle is encountered, the light is emitted and the distance to the obstacle is measured.

The range of the edge beads 15 passing through the lower space of the first height measurement sensor 285 and the height thereof can be measured.

The second bead confirmation unit 290 is configured to detect the edge bead 15 located at each portion of the object 10 except for the portion of the edge bead 15 measured by the first bead confirmation unit 280 before the exposure is released, And includes a second confirmation case 291 and a second height measurement sensor 295. [

The second check case 291 is formed in a predetermined size, and the second height measurement sensor 295, which will be described later, is coupled to the bottom surface of the second check case 291.

The second height measurement sensor 295 can measure the linear distance in a noncontact manner. The second height measurement sensor 295 can measure a distance of a second sensing range 296 shown in FIG. 13 by a plurality of lasers (not shown) It is built-in.

The laser emits light in a straight line, and when the obstacle is encountered, the light is emitted and the distance to the obstacle is measured.

The range of the edge beads 15 passing through the lower space of the second height measuring sensor 295 and the height thereof can be measured.

The confirmation zone 201 is configured to allow the first bead confirmation unit 280 and the second bead confirmation unit 290 to determine the range of the edge beads 15, And is formed to be relatively wider than the target body 10 so as to securely support the target body 10.

The first confirmation conveyance member 282 conveys the first bead confirmation unit 280 in a direction perpendicular to the direction in which the object 10 is carried into the confirmation zone 201, (284), and a first confirmation rail (283).

The first confirmation body 284 transportably connects the first confirmation case 281 to the first confirmation rail 283. When the first confirmation case 281 is powered by an external power source (not shown) And is conveyed along the rail 283.

The first confirmation rail 283 is formed to have a predetermined length so as to be conveyed along the first confirmation body 284. The first confirmation rail 283 is provided on the check zone 201 on the side where the object 10 enters the confirmation zone 201, And is formed so as to connect the other side from one side of the confirmation zone (201) above.

More specifically, the first confirmation rail 283 is provided on the side of the edge 10 of the edge 10 where the target 10 enters the check zone 201 when the target 10 is seated on the check zone 201 ) Is measured.

The second confirmation conveyance member 292 conveys the second bead confirmation unit 290 in a direction perpendicular to the direction in which the target body 10 is taken out from the confirmation zone 201, (294), and a second confirmation rail (293).

The second confirmation body 294 transportably connects the second confirmation case 291 to the second confirmation rail 293. When electricity is supplied by an external power source (not shown) And is conveyed along the rail 293.

The second confirmation rail 293 is formed to have a predetermined length so as to be transported along the second confirmation body 294 and the confirmation zone 201 on the side where the object 10 is taken out of the confirmation zone 201, And is formed so as to connect the other side from one side of the confirmation zone (201) above.

More specifically, the second confirmation rail 293 is formed on the side of the edge 10 of the edge 10 of the object 10 on the side where the object 10 enters the check zone 201 when the object 10 is seated on the check zone 201 ) Is measured.

As shown in FIG. 14, the first confirmation rail 283 and the second confirmation rail 293 are formed in parallel to each other above the check zone 201, and the first confirmation rail 283 are connected to the side where the target body 10 is carried on the check zone 201 and the second check rail 293 is provided on the side where the target body 10 is taken out from the check zone 201, As shown in FIG.

The control unit 202 stores the range value of the edge bead 15 measured by the first bead confirmation unit 280 and the second bead confirmation unit 290, And the second light source control body is automatically and precisely controlled to automatically expose the edge bead 15 to the range of the edge bead 15. [

More specifically, the controller 202 accumulates the range values of the edge beads 15 measured by the first bead confirmation unit 280 and the second bead confirmation unit 290 and stores the values.

Then, the range of the edge beads 15 formed on the object 10 can be grasped.

Then, when the first exposure unit and the second exposure unit perform the exposure process while passing through the exposure zone, the value measured in the first exposure unit and stored in the control unit 202 is converted into the first exposure Since the range of the edge beads 15 formed on the object 10 is determined according to the position of the unit, the first light source control unit is adjusted according to the value, and the control unit 202 , The range of the edge bead 15 formed on the object 10 is grasped according to the position of the second exposure unit, so that the second light source control unit is adjusted according to the value.

As described above, when the operator or another control system does not directly adjust the first light source control object and the second light source control object, precise control can be automatically performed.

Hereinafter, a method of measuring the range of the edge beads 15 formed on the photoresist film 13 of the object 10 using the display glass and the edge exposing apparatus for wafers will be described with reference to the drawings.

14, the first bead confirmation unit 280 is attached to one corner and the second bead confirmation unit 290 is attached to the first bead confirmation unit 280 before the object 10 enters the confirmation zone 201 And placed at the other corner. Here, only the first height measurement sensor 285 of the first bead confirmation unit 280 is operated, and the second height measurement sensor 295 is turned off.

The edge bead 15 formed at one end of the object 10 passes through the lower space of the first bead check unit 280 when the object 10 enters the check zone 201 And measures the range of the edge beads 15 formed at one end of the target body 10, and transmits the measured value to the controller 202.

Then, as shown in FIG. 15, when the object 10 is placed on the confirmation zone 201, the second height measurement sensor 295 is also operated.

Then, as shown in Fig. 16, the first confirmation conveyance member 282 conveys the first bead confirmation unit 280 to the other side, and the second confirmation conveyance member 292 conveys the first bead confirmation unit 280 to the other side 1 bead confirmation unit 280 to one side. Then, the range of the edge bead 15 in the vertical direction of the entry direction in which the object 10 enters the confirmation zone 201 can be measured, and the measured value is transmitted to the control unit 202 .

Then, as shown in Fig. 17, the first height measurement sensor 285 and the second height measurement sensor 295 are turned off and transferred to the original position.

Then, as shown in FIG. 18, after the second height measurement sensor 295 is operated, the object 10 is taken out from the confirmation zone 201. 19, when the object 10 is taken out of the check zone 201, the edge bead 15 at the other end of the object 10 is moved to the lower space of the second confirmation unit 201, The second height measuring sensor 295 measures the range of the edge bead 15 at the other end of the target body 10 and stores the measured value in the controller 202. [

Thereafter, the object 10 is transferred to a carry-in member, and the carry member is subjected to an exposure operation for exposing the edge bead 15 while transferring the object 10 to the exposure zone. Here, the exposure process is performed while automatically controlling the first light source control unit and the second light source control unit using the measured value of the range of the edge beads 15 stored in the controller 202.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the following claims And can be changed. However, it is intended that the present invention covers the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents.

According to one aspect of the present invention, an edge exposure apparatus for a display glass and a wafer can easily adjust a range in which a light source is emitted to expose an edge bead, and can more easily match a light source to an edge bead, And the manufacturing cost of equipment can be saved, so that it is highly likely to be used in the industry.

10: object
13: Photosensitive film
15: Edge Bead
100: edge exposure device for display glass and wafer
110: first exposure unit
120: a second exposure unit
130: first conveying member
140: second conveying member
150: Exposure Zone
160: carrying member
170:
280: first exposure confirmation unit
290: second exposure confirmation unit

Claims (5)

A first exposure unit for selectively exposing the edge beads in accordance with the formation of the photosensitive film of the object;
A second exposure unit for exposing the edge beads other than the edge bead exposed by the first exposure unit;
An exposure zone on which the object is placed so that the first exposure unit and the second exposure unit perform an exposure process for exposing the edge bead;
A first transfer unit for transferring the first exposure unit in a direction perpendicular to the direction in which the object is loaded into the exposure zone; And
And a second transfer member for transferring the second exposure unit in a direction perpendicular to the direction in which the object is loaded into the exposure zone. The method according to claim 1,
The first exposure unit exposes the edge bead at one side edge of the object while the object is carried in the exposure zone,
When the object is placed in the exposure zone, the first exposure unit and the second exposure unit are arranged in a direction perpendicular to the entry direction in which the object enters the exposure zone by the first transfer member and the second transfer member And exposes the edge bead at a position vertical to the entry direction in which the object enters the exposure zone,
And the second exposure unit exposes the remaining edge bead, which is the other corner portion of the object, when the object is taken out from the exposure zone. The method according to claim 1,
The first exposure unit
A first case having a hollow interior,
A first light emitter for emitting a light source into the first case,
A first reflector that reflects the light source of the first light emitter to change its path,
A first refracting body for refracting the light source so that the light source reflected by the first reflector is cohered or dispersed and is emitted to the outside of the first case;
And a first light source control unit which adjusts a tilted angle of the first reflector to adjust a range of the light source reflected by the first reflector toward the first refractor,
The second exposure unit
A second case having an inner space,
A second light emitter for shooting a light source into the second case,
A second reflector that reflects the light source of the second light emitter to change its path,
A second refractor for refracting the light source so that the light source reflected by the second reflector is cohered or dispersed and is emitted to the outside of the second case;
And a second light source control unit that adjusts a tilted angle of the second reflector so as to adjust a range of the light source reflected by the second reflector to the second refractor, Exposure apparatus. The method of claim 3,
The display glass and edge exposing apparatus for wafers
A carrying member for carrying the object to the exposure zone; And a carry-out member for carrying out the object of the exposure zone. 5. The method of claim 4,
The first exposure unit exposes one edge of the edge bead while the object is prepared on the carry-in member, and the object is transferred to the exposure zone by the carry-in member,
When the object is placed on the exposure zone by the carry-in member, the first exposure unit is moved in the other direction perpendicular to the entry direction in which the object enters the exposure zone by the first transfer member, Wherein the second exposure unit is configured to move the edge bead in a direction perpendicular to a direction in which the object enters the exposure zone while being moved in one direction perpendicular to the entry direction in which the object enters the exposure zone by the second transfer member, Lt; / RTI >
Then, the light emission of the first light emitting body and the second light emitting body is stopped, the first exposure unit and the second exposure unit are respectively moved to the home position,
And the other end of the edge bead is exposed while the object is transferred to the carry-out member.

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