KR20190018391A - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

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Publication number
KR20190018391A
KR20190018391A KR1020180091213A KR20180091213A KR20190018391A KR 20190018391 A KR20190018391 A KR 20190018391A KR 1020180091213 A KR1020180091213 A KR 1020180091213A KR 20180091213 A KR20180091213 A KR 20180091213A KR 20190018391 A KR20190018391 A KR 20190018391A
Authority
KR
South Korea
Prior art keywords
mold
electrodes
pattern
substrate
imprint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020180091213A
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English (en)
Korean (ko)
Inventor
히로 노리카네
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20190018391A publication Critical patent/KR20190018391A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • H01L21/0274—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020180091213A 2017-08-14 2018-08-06 임프린트 장치 및 물품 제조 방법 Ceased KR20190018391A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017156641A JP2019036620A (ja) 2017-08-14 2017-08-14 インプリント装置、および物品製造方法
JPJP-P-2017-156641 2017-08-14

Publications (1)

Publication Number Publication Date
KR20190018391A true KR20190018391A (ko) 2019-02-22

Family

ID=65584815

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180091213A Ceased KR20190018391A (ko) 2017-08-14 2018-08-06 임프린트 장치 및 물품 제조 방법

Country Status (2)

Country Link
JP (1) JP2019036620A (https=)
KR (1) KR20190018391A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102244514B1 (ko) * 2019-11-28 2021-04-26 연세대학교 산학협력단 외부 전기장 및 적외선 대역 레이저 투과형 몰드를 이용하는 금속 임프린팅 성형 장치 및 성형 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015149390A (ja) 2014-02-06 2015-08-20 キヤノン株式会社 インプリント装置、型、および物品の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015149390A (ja) 2014-02-06 2015-08-20 キヤノン株式会社 インプリント装置、型、および物品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102244514B1 (ko) * 2019-11-28 2021-04-26 연세대학교 산학협력단 외부 전기장 및 적외선 대역 레이저 투과형 몰드를 이용하는 금속 임프린팅 성형 장치 및 성형 방법

Also Published As

Publication number Publication date
JP2019036620A (ja) 2019-03-07

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St.27 status event code: A-0-1-A10-A12-nap-PA0109

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D14-X000 Search report completed

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St.27 status event code: A-1-2-D10-D21-exm-PE0902

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000