KR20180071808A - Composition for forming conductive layer and conductive layer manufactured using the same - Google Patents
Composition for forming conductive layer and conductive layer manufactured using the same Download PDFInfo
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Conductive Materials (AREA)
Abstract
Description
본 발명은 대면적의 디스플레이 제조과정에서 투명 도전막을 형성하는데 사용되는 도전막 형성용 조성물에 관한 것이다.The present invention relates to a composition for forming a conductive film used for forming a transparent conductive film in a large-area display manufacturing process.
대면적의 디스플레이에서는 빛을 투과하여 이미지를 전달하고 전류를 발생시키는 투명 도전막(즉, 투명 전극)이 핵심 부품 중 하나로, 상기 투명 도전막은 화학적으로 안정해야 하고, 평활성, 도전성이 우수하며 높은 투과도를 갖는 것이 요구된다. 이러한 투명 도전막의 재료로는 인듐주석 산화물(ITO, indium tin oxide), 불소도핑 산화주석(fluorinedoped tin oxide)과 같은 산화물, 도전성 고분자, 금속 나노와이어 등이 사용되고 있다.In a large-area display, a transparent conductive film (that is, a transparent electrode) that transmits light to transmit an image and generates an electric current is one of the key components. The transparent conductive film must be chemically stable, excellent in smoothness, . As materials of the transparent conductive film, oxides such as indium tin oxide (ITO), fluorine doped tin oxide, conductive polymers, and metal nanowires are used.
상기 인듐주석 산화물(Indium Tin Oxide, ITO)은 높은 투과도를 가지며 도전성이 우수하여 투명 도전막 제조 시 가장 널리 사용되고 있다. 그러나, 인듐주석 산화물은 제한된 매장량으로 인해 투명 도전막의 제조 비용이 상승하는 문제점이 있다.Indium tin oxide (ITO) has a high transmittance and is excellent in conductivity and is widely used in the production of a transparent conductive film. However, the indium tin oxide has a problem in that the manufacturing cost of the transparent conductive film is increased due to the limited amount of the storage.
상기 도전성 고분자는 인듐주석 산화물을 대체할 수 있는 재료이지만, 용해도가 낮아 이를 이용한 투명 도전막의 제조 공정이 까다로우며 에너지 밴드갭이 3eV 이하로 색을 띄기 때문에 투명 도전막의 투과도가 떨어지는 문제점이 있다.The conductive polymer is a material that can replace indium tin oxide. However, since the solubility of the conductive polymer is low, a transparent conductive film using the conductive polymer is difficult to manufacture and the energy band gap is 3 eV or less.
상기 금속 나노와이어를 이용하여 제조된 투명 도전막은 인듐주석 산화물로 제조된 투명 도전막과 유사한 표면 저항을 나타낼 수 있지만, 자외선에 매우 취약하여 사용과정에서 표면 저항이 급격히 높아지는 문제점이 있다. 즉, 금속 나노와이어로 투명 도전막 형성 시 바인더 재료로 고분자 화합물이 사용되는데, 상기 고분자 화합물이 자외선에 의해 광 해리됨에 따라 산소를 발생하게 되고, 발생된 산소에 의해 금속 나노와이어가 산화되어 투명 도전막의 표면 저항이 급격히 높아지게 된다.The transparent conductive film prepared using the metal nanowire may exhibit a surface resistance similar to that of the transparent conductive film made of indium tin oxide, but is very vulnerable to ultraviolet rays, resulting in a problem that the surface resistance is rapidly increased during use. That is, a polymer compound is used as a binder material when forming a transparent conductive film with a metal nanowire. As the polymer compound is optically dissociated by ultraviolet rays, oxygen is generated, and the metal nanowires are oxidized by the generated oxygen, The surface resistance of the film is drastically increased.
이에 따라 자외선으로부터 투명 도전막을 보호하기 위해 자외선 안정제가 사용되고 있으나, 만족할 만한 수준의 효과를 얻지 못하고 있다.Accordingly, an ultraviolet stabilizer is used to protect the transparent conductive film from ultraviolet rays, but a satisfactory level of effect is not obtained.
본 발명은 자외선에 대한 안정성이 높아 표면 저항이 낮으며, 높은 투과도를 나타내는 도전막을 형성할 수 있는 도전막 형성용 조성물을 제공하고자 한다.The present invention provides a composition for forming a conductive film which is high in stability against ultraviolet rays and low in surface resistance and capable of forming a conductive film exhibiting high transmittance.
또한, 본 발명은 상기 도전막 형성용 조성물을 이용하여 제조된 도전막을 제공하고자 한다.The present invention also provides a conductive film produced using the composition for forming a conductive film.
상기 과제를 해결하기 위해 본 발명은, 금속 나노와이어; 바인더; 자외선 안정제; 및 무기 산화물을 포함하고, 상기 무기 산화물의 평균 입자 크기(D50)가 20 ㎚ 이하인 것인 도전막 형성용 조성물을 제공한다.In order to solve the above problems, the present invention provides a metal nanowire; bookbinder; Ultraviolet stabilizer; And an inorganic oxide, wherein the inorganic oxide has an average particle size (D 50 ) of 20 nm or less.
또한 본 발명은, 상기 도전막 형성용 조성물을 이용하여 제조된 도전막을 제공한다.The present invention also provides a conductive film produced using the composition for forming a conductive film.
본 발명의 도전막 형성용 조성물은 특정된 입자 크기를 갖는 무기 산화물을 포함하기 때문에 이를 이용하여 도전막을 형성할 경우 자외선에 대한 안정성이 높아 낮은 표면 저항을 유지할 수 있고, 고강도 및 고투과도를 나타낼 수 있는 도전막을 제공할 수 있다.Since the composition for forming a conductive film of the present invention contains an inorganic oxide having a specific particle size, when a conductive film is formed using the composition, the stability against ultraviolet rays is high, and thus a low surface resistance can be maintained, high strength and high permeability Can be provided.
이하 본 발명을 설명한다.Hereinafter, the present invention will be described.
1. One. 도전막Conductive film 형성용 조성물 Composition for forming
본 발명의 도전막 형성용 조성물(이하, '조성물'이라 함)은 금속 나노와이어; 바인더; 자외선 안정제; 및 무기 산화물을 포함한다.The composition for forming a conductive film of the present invention (hereinafter, referred to as a "composition") includes metal nanowires; bookbinder; Ultraviolet stabilizer; And inorganic oxides.
본 발명의 조성물에 포함되는 금속 나노와이어는 조성물에 도전성을 부여하는 역할을 한다. 이러한 금속 나노와이어는 특별히 한정되지 않으나, 도전성이 우수하고 전기적 안정성이 높은 은 나노와이어, 금 나노와이어 및 백금 나노와이어로 이루어진 군에서 선택된 1종 이상인 것이 바람직하다.The metal nanowires included in the composition of the present invention serve to impart conductivity to the composition. Such metal nanowires are not particularly limited, but they are preferably at least one selected from the group consisting of silver nanowires having high electrical conductivity and high electrical stability, gold nanowires, and platinum nanowires.
상기 금속 나노와이어의 직경은 특별히 한정되지 않으나, 20 ㎚ 이하인 것인 바람직하고, 10 내지 20 ㎚인 것이 더욱 바람직하다. 상기 금속 나노와이어의 직경이 20 ㎚를 초과할 경우 Milky 현상이 발생하여 도전막이 적용된 디스플레이의 시인성을 저하시킬 수 있다.The diameter of the metal nanowires is not particularly limited, but is preferably 20 nm or less, more preferably 10 to 20 nm. When the diameter of the metal nanowire exceeds 20 nm, milky phenomenon occurs and the visibility of the display on which the conductive film is applied may be reduced.
이러한 금속 나노와이어의 함량은 특별히 한정되지 않으나, 조성물 100 중량부를 기준으로 0.05 내지 0.2 중량부인 것이 바람직하다. 상기 금속 나노와이어의 함량이 0.05 중량부 미만일 경우에는 조성물의 도전성이 저하될 수 있으며, 0.2 중량부를 초과할 경우에는 필요 이상으로 사용되어 경제성이 저하될 수 있다.The content of the metal nanowires is not particularly limited, but is preferably 0.05 to 0.2 parts by weight based on 100 parts by weight of the composition. If the content of the metal nanowires is less than 0.05 parts by weight, the conductivity of the composition may be deteriorated. If the content of the metal nanowires exceeds 0.2 parts by weight, the composition may be used more than necessary.
본 발명의 조성물에 포함되는 바인더는 금속 나노와이어를 분산 및 상호 연결된 상태로 고정시키는 매트릭스 역할을 한다. 이러한 바인더는 특별히 한정되지 않으나, 셀룰로오스계 고분자인 것이 바람직하다. 상기 셀룰로오스계 고분자를 바인더로 사용할 경우, 도전막이 고투과도를 유지하는 범위 내에서 일정 점도 유지 및 고정 매트릭스 역할을 할 수 있다.The binder included in the composition of the present invention serves as a matrix for fixing metal nanowires dispersed and interconnected. Such a binder is not particularly limited, but is preferably a cellulose-based polymer. When the cellulose-based polymer is used as a binder, the conductive film can serve as a constant viscosity maintaining and fixing matrix within a range of maintaining a high transmittance.
상기 셀룰로오스계 고분자는 특별히 한정되지 않으나, 메틸셀룰로오스, 에틸셀룰로오스, 히드록시에틸셀룰로오스, 히드록시메틸셀룰로오스, 히드록시프로필메틸셀룰로오스, 니트로셀룰로오스 및 카르복시메틸셀룰로오스로 이루어진 군에서 선택된 1종 이상인 것이 바람직하다.The cellulose-based polymer is not particularly limited, but is preferably at least one selected from the group consisting of methyl cellulose, ethyl cellulose, hydroxyethyl cellulose, hydroxymethyl cellulose, hydroxypropyl methyl cellulose, nitrocellulose and carboxymethyl cellulose.
이러한 바인더의 함량은 특별히 한정되지 않으나, 조성물 100 중량부를 기준으로 0.05 내지 1 중량부인 것이 바람직하다. 상기 바인더의 함량이 0.05 중량부 미만일 경우에는 금속 나노와이어의 분산 및 상호 연결성이 저하될 수 있으며, 1 중량부를 초과할 경우에는 도전막의 Yellow index 값이 상승하여 도전막이 적용된 디스플레이의 시인성을 저하시킬 수 있다.The content of such a binder is not particularly limited, but is preferably 0.05 to 1 part by weight based on 100 parts by weight of the composition. If the content of the binder is less than 0.05 part by weight, dispersion and interconnectivity of the metal nanowire may be deteriorated. If the content of the binder is more than 1 part by weight, the yellow index value of the conductive film may increase, have.
본 발명의 조성물에 포함되는 자외선 안정제는 조성물의 자외선 안정성을 높이는 역할을 한다. 이러한 자외선 안정제는 특별히 한정되지 않으나, 힌더드 아민계 화합물(Hindered Amine Light Stabilizer, HALS)인 것이 바람직하다. 상기 힌더드 아민계 화합물을 자외선 안정제로 사용함에 따라 도전막 내의 산소 라디칼 제거가 효율적으로 이루어져 도전막 내의 고분자 화합물이 빛에 의해 열화되는 것을 방지할 수 있다.The ultraviolet stabilizer included in the composition of the present invention enhances ultraviolet stability of the composition. Such ultraviolet stabilizer is not particularly limited, but is preferably a hindered amine light stabilizer (HALS). When the hindered amine compound is used as an ultraviolet stabilizer, oxygen radicals in the conductive film are effectively removed, and the polymer compound in the conductive film is prevented from being deteriorated by light.
이러한 자외선 안정제의 함량은 특별히 한정되지 않으나, 조성물 100 중량부를 기준으로 0.01 내지 0.1 중량부인 것이 바람직하다. 상기 자외선 안정제의 함량이 0.01 중량부 미만일 경우에는 조성물의 자외선 안정성이 저하될 수 있으며, 0.1 중량부를 초과할 경우에는 절연막으로 작용하여 면저항을 상승시킬 수 있다.The content of such ultraviolet stabilizer is not particularly limited, but is preferably 0.01 to 0.1 parts by weight based on 100 parts by weight of the composition. If the content of the ultraviolet stabilizer is less than 0.01 part by weight, the ultraviolet stability of the composition may be deteriorated. If the amount of the ultraviolet stabilizer is more than 0.1 parts by weight, the sheet resistance may be increased.
본 발명의 조성물에 포함되는 무기 산화물은 자외선을 흡수하는 역할을 한다. 구체적으로, 상기 무기 산화물은 무기 산화물이 가지고 있는 고유 파장의 자외선을 흡수하여 도전막 내의 고분자 화합물 및 기재(예를 들어, PET)가 자외선에 의해 광 해리되는 방지할 수 있다. 또한 상기 무기 산화물은 도전막 내에 산소 라디칼이 존재하는 것을 최소화하여 도전막에 포함된 금속 나노와이어의 산화를 방지할 수 있다.The inorganic oxide contained in the composition of the present invention plays a role of absorbing ultraviolet rays. Specifically, the inorganic oxide absorbs ultraviolet rays having intrinsic wavelengths possessed by the inorganic oxide, so that the polymer compound and the base material (for example, PET) in the conductive film can be prevented from being optically dissociated by ultraviolet rays. In addition, the presence of the oxygen radical in the conductive film is minimized, and the oxidation of the metal nanowires included in the conductive film can be prevented.
상기 무기 산화물의 평균 입자 크기(D50)는 20 ㎚ 이하이며, 바람직하게는 5 내지 20 ㎚일 수 있다. 상기 무기산화물의 평균 입자 크기가 20 ㎚를 초과할 경우에는 도전막의 Milky 특성이 저하될 수 있다.The average particle size (D 50 ) of the inorganic oxide is 20 nm or less, preferably 5 to 20 nm. If the average particle size of the inorganic oxide exceeds 20 nm, the Milky characteristic of the conductive film may be deteriorated.
상기 무기 산화물은 특별히 한정되지 않으나, 이산화티타늄, 산화아연, 산화지르코늄, 산화세륨, 산화마그네슘, 탈크, 카올린, 삼산화텅스텐 및 페로브스카이트형 금속 산화물로 이루어진 군에서 선택된 1종 이상인 것이 바람직하다.The inorganic oxide is not particularly limited, but is preferably at least one selected from the group consisting of titanium dioxide, zinc oxide, zirconium oxide, cerium oxide, magnesium oxide, talc, kaolin, tungsten trioxide and perovskite type metal oxides.
이러한 무기 산화물의 함량은 특별히 한정되지 않으나, 0.05 내지 0.1 중량부인 것이 바람직하다. 상기 무기 산화물의 함량이 0.05 중량부 미만일 경우에는 도전막의 강도 및 투명성 등이 저하될 수 있고, 0.1 중량부를 초과할 경우에는 도전막의 형성 시 작업성 및 성형성 등이 저하될 수 있다.The content of such an inorganic oxide is not particularly limited, but is preferably 0.05 to 0.1 parts by weight. If the content of the inorganic oxide is less than 0.05 part by weight, the strength and transparency of the conductive film may be lowered. If the content is more than 0.1 part by weight, the workability and moldability of the conductive film may be lowered.
한편 본 발명의 조성물은 그 물성을 높이기 위해 증점제, 표면장력조절제 및 접착증진제로 이루어진 군에서 선택된 1종 이상의 첨가제를 더 포함할 수 있다. 이러한 첨가제의 함량은 특별히 한정되지 않으나, 조성물 100 중량부를 기준으로, 0.005 내지 0.1 중량부인 것이 바람직하다.The composition of the present invention may further include at least one additive selected from the group consisting of a thickener, a surface tension modifier, and an adhesion promoter in order to improve the physical properties thereof. The content of such an additive is not particularly limited, but is preferably 0.005 to 0.1 part by weight based on 100 parts by weight of the composition.
구체적으로, 상기 증점제는 조성물의 점도를 상승시켜 조성물의 코팅성을 높이는 역할을 한다. 이러한 증점제는 당 업계에 공지된 성분을 사용할 수 있다.Specifically, the thickener enhances the viscosity of the composition to improve the coating property of the composition. These thickeners may be those known in the art.
상기 표면장력조절제는 조성물의 코팅성을 상승시켜 도전막의 성형성을 높이는 역할을 한다. 이러한 표면장력조절제는 특별히 한정되지 않으나, 과불소알킬 카르복시산염, 과불소화 설폰산염, 과불소화 황산염, 과불소화 인산염 등의 불소계 화합물(불소계 계면활성제)을 들 수 있다.The surface tension regulator enhances the coatability of the composition to improve the moldability of the conductive film. Such surface tension regulators are not particularly limited, but fluorine-based compounds (fluorine surfactants) such as perfluoroalkyl carboxylates, perfluorinated sulfonates, perfluorinated sulfates and perfluorinated phosphates can be mentioned.
상기 표면장력조절제의 함량은 특별히 한정되지 않으나, 조성물 100 중량부를 기준으로, 0.001 내지 0.01 중량부인 것이 바람직하다. 상기 표면장력조절제의 함량이 0.001 중량부 미만일 경우에는 조성물의 표면장력이 높아 도전막의 성형성이 저하될 수 있고, 0.01 중량부를 초과할 경우에는 조성물의 기포발생 제어효과가 떨어지고 경제성이 저하될 수 있다.The content of the surface tension modifier is not particularly limited, but is preferably 0.001 to 0.01 part by weight based on 100 parts by weight of the composition. If the content of the surface tension regulator is less than 0.001 part by weight, the surface tension of the composition may be high and the formability of the conductive film may be deteriorated. If the amount is more than 0.01 part by weight, the effect of controlling the bubble formation of the composition may be deteriorated, .
상기 접착증진제는 조성물을 기재에 코팅하여 도전막 형성 시 기재와 도전막의 접착력을 높이는 역할을 한다. 이러한 접착증진제는 특별히 한정되지 않으나, 에폭시계 수지, 아크릴계 수지, 우레탄계 수지 등을 들 수 있다.The adhesion promoter serves to enhance the adhesion between the substrate and the conductive film when the conductive film is formed by coating the composition on the substrate. The adhesion promoting agent is not particularly limited, and examples thereof include an epoxy resin, an acrylic resin, and a urethane resin.
상기 접착증진제의 함량은 조성물 100 중량부를 기준으로, 0.005 내지 0.1 중량부인 것이 바람직하다. 상기 접착증진제의 함량이 0.005 중량부 미만일 경우에는 기재와 도전막의 접착력이 저하될 수 있고, 0.1 중량부를 초과할 경우에는 절연막으로 작용하여 면저항을 상승시킬 수 있다.The content of the adhesion promoting agent is preferably 0.005 to 0.1 part by weight based on 100 parts by weight of the composition. When the content of the adhesion promoter is less than 0.005 parts by weight, the adhesion between the substrate and the conductive film may be deteriorated. When the content of the adhesion promoter is more than 0.1 parts by weight, the sheet resistance may be increased.
이외에도 본 발명의 조성물은 그 물성에 영향을 미치지 않는 범위 내에서 당 업계에 공지된 용매, 안정제, 분산제, 환원제, 습윤제, 소포제, 커플링제 등을 더 포함할 수 있다.In addition, the composition of the present invention may further contain solvents, stabilizers, dispersants, reducing agents, wetting agents, antifoaming agents, coupling agents and the like known in the art within a range not affecting the physical properties thereof.
2. 2. 도전막Conductive film
본 발명은 상술한 조성물로 제조된 도전막을 제공한다.The present invention provides a conductive film made from the composition described above.
본 발명의 도전막을 제조하는 방법은 특별히 한정되지 않으나, 기재에 상술한 조성물을 코팅하고 건조시키는 과정을 거쳐 제조할 수 있다.The method for preparing the conductive film of the present invention is not particularly limited, but may be prepared by coating the substrate with the above-mentioned composition and drying.
상기 조성물이 코팅되는 기재는 특별히 한정되지 않으나, 폴리이미드(PI), 폴리에틸렌테레프탈레이트(PET), 폴리에테르술폰(PES), 나일론(Nylon), 폴리테트라플루오로에틸렌(PTFE), 폴리에테르에테르케톤(PEEK), 폴리카보네이트(PC), 폴리아릴레이트(PAR) 등과 같은 투명 수지 필름; 또는 유리 기판 등을 들 수 있다.The substrate to which the composition is coated is not particularly limited, but may be a polyimide (PI), a polyethylene terephthalate (PET), a polyethersulfone (PES), a nylon, a polytetrafluoroethylene (PTFE) (PEEK), polycarbonate (PC), polyarylate (PAR), and the like; Or a glass substrate.
상기 기재 상에 조성물을 코팅하는 방법은 특별히 한정되지 않으나, 바(bar) 코팅, 스핀(spin) 코팅, 롤(roll) 코팅, 스프레이 코팅, 딥(dip) 코팅, 잉크젯 프린팅, 옵셋 프린팅, 스크린 프린팅, 패드(pad) 프린팅, 그라비아 프린팅, 플렉소(flexography) 프린팅, 스텐실 프린팅, 임프린팅(imprinting) 등을 들 수 있다.The method of coating the composition on the substrate is not particularly limited, and a method of coating the composition on the substrate is not particularly limited, and examples thereof include a bar coating, a spin coating, a roll coating, a spray coating, a dip coating, an inkjet printing, , Pad printing, gravure printing, flexography printing, stencil printing, imprinting, and the like.
상기 기재 상에 코팅된 조성물을 건조하는 조건은 특별히 한정되지 않으나, 건조 온도는 100 내지 120 ℃이고, 건조 시간은 3 내지 7분일 수 있다.Conditions for drying the composition coated on the substrate are not particularly limited, but the drying temperature may be 100 to 120 ° C, and the drying time may be 3 to 7 minutes.
이와 같이 제조된 도전막의 두께는 특별히 한정되지 않으나, 100 내지 200 nm로 형성하는 것이 바람직하다.The thickness of the conductive film thus produced is not particularly limited, but is preferably 100 to 200 nm.
이상의 본 발명에 따른 도전막은 도전성, 투명성과 더불어 자외선에 대한 안정성이 우수한 조성물로 제조되기 때문에 전기 및 전자 기기에 다양하게 적용될 수 있으며, 특히, 실외에서 사용되는 대면적의 디스플레이에 포함된 투명 전극으로써 유용하게 적용될 수 있다.Since the conductive film according to the present invention is made of a composition having excellent conductivity and transparency as well as excellent stability against ultraviolet rays, it can be applied to various electric and electronic devices, and in particular, as a transparent electrode included in a large- Can be usefully applied.
이하 본 발명을 실시예를 통하여 상세히 설명하면 다음과 같다. 단, 하기 실시예는 본 발명을 예시하는 것일 뿐, 본 발명이 하기 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to examples. However, the following examples are illustrative of the present invention, and the present invention is not limited by the following examples.
[[ 실시예Example 1 내지 3] 1 to 3]
하기 표 1의 성분을 믹서(vortex mixer)를 이용하여 약 30분 동안 혼합하는 과정을 거쳐 도전막 형성용 조성물을 제조하였다.The components shown in Table 1 were mixed for about 30 minutes using a vortex mixer to prepare a composition for forming a conductive film.
다음, #12호 바 코터(bar coater)를 이용하여 PET 기재 상에 제조된 도전막 형성용 조성물을 코팅하고 120 ℃에서 5분 동안 건조하여 도전막을 제조하였다.Next, # 12 The composition for forming a conductive film was coated on a PET substrate using a bar coater and dried at 120 ° C for 5 minutes to prepare a conductive film.
(입경: 15 ㎚)The nanowire
(Particle size: 15 nm)
[[ 비교예Comparative Example 1 내지 3] 1 to 3]
하기 표 2의 조성을 갖는 도전막 형성용 조성물을 적용한 것을 제외하고는, 실시예 1과 동일한 과정을 거쳐 도전막을 제조하였다.Except that the composition for forming a conductive film having the composition shown in the following Table 2 was applied, a conductive film was prepared.
(입경: 15 ㎚)The nanowire
(Particle size: 15 nm)
[[ 실험예Experimental Example ]]
제조된 도전막의 물성을 다음과 같은 방법으로 평가하였으며, 그 결과를 하기 표 3에 나타내었다.The properties of the conductive film thus prepared were evaluated by the following methods. The results are shown in Table 3 below.
1. 면저항(Resistivity): 일렉트로닉 디자인 투 마켓, 인크(Electronic Design To Market, Inc.)(오하이오 톨레도)(Toledo, OH)사의 R-CHEK 모델 RC2175 표면 저항률 미터를 사용하여 측정하였다.1. Resistivity: Measured using an R-CHEK model RC2175 surface resistivity meter from Electronic Design To Market, Inc. (Toledo, OH) (Ohio Toledo).
2. 접착성: Elcometer 1542를 사용하여 도전막 위에 cross cut을 한 후 니토덴코 #31b tape를 붙였다 때어주었다. 이후 면저항 측정기를 이용하여 tape 접착 전후의 면저항 변화를 비교 분석하였다.2. Adhesion: Using a Elcometer 1542, a cross cut was made on the conductive film, followed by a Nitodenko # 31b tape. After that, the sheet resistance change before and after the tape adhesion was compared and analyzed using a sheet resistance meter.
3. 연필경도: M-Tech사의 연필경도계 MT-PC1을 이용하여 도전막의 스크레치 발생 여부를 확인하여 측정하였다.3. Pencil hardness: The pencil hardness meter MT-PC1 manufactured by M-Tech Co., Ltd. was used to check whether a conductive film was scratched or not.
4. 투과도: NIPPON DENSHUKU사의 NDH5000를 사용하여 측정하였다.4. Transmittance: Measured using NDH5000 from NIPPON DENSHUKU.
상기 표 3을 참조하면, 본 발명의 도전막 형성용 조성물로 제조된 도전막은 면저항의 증가율이 낮고, 접착성, 연필경도, 투과도가 모두 우수한 것을 확인할 수 있다.Referring to Table 3, it can be seen that the conductive film made of the composition for forming a conductive film of the present invention has a low increase rate of sheet resistance and excellent adhesion, pencil hardness, and transparency.
Claims (12)
상기 무기 산화물의 평균 입자 크기(D50)가 20 ㎚ 이하인 것인 도전막 형성용 조성물.Metal nanowires; bookbinder; Ultraviolet stabilizer; And an inorganic oxide,
Wherein the inorganic oxide has an average particle size (D 50 ) of 20 nm or less.
상기 무기 산화물이 이산화티타늄, 산화아연, 산화지르코늄, 산화세륨, 산화마그네슘, 탈크, 카올린, 삼산화텅스텐 및 페로브스카이트형 금속 산화물로 이루어진 군에서 선택된 1종 이상인 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the inorganic oxide is at least one selected from the group consisting of titanium dioxide, zinc oxide, zirconium oxide, cerium oxide, magnesium oxide, talc, kaolin, tungsten trioxide and perovskite type metal oxides.
상기 금속 나노와이어가 은 나노와이어, 금 나노와이어 및 백금 나노와이어로 이루어진 군에서 선택된 1종 이상인 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the metal nanowires are at least one selected from the group consisting of silver nanowires, gold nanowires, and platinum nanowires.
상기 금속 나노와이어의 직경이 20 ㎚ 이하인 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the metal nanowires have a diameter of 20 nm or less.
상기 바인더가 셀룰로오스계 고분자인 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the binder is a cellulose-based polymer.
상기 셀룰로오스계 고분자는 메틸셀룰로오스, 에틸셀룰로오스, 히드록시에틸셀룰로오스, 히드록시메틸셀룰로오스, 히드록시프로필메틸셀룰로오스, 니트로셀룰로오스 및 카르복시메틸셀룰로오스로 이루어진 군에서 선택된 1종 이상인 것인 도전막 형성용 조성물.The method of claim 5,
Wherein the cellulose polymer is at least one selected from the group consisting of methylcellulose, ethylcellulose, hydroxyethylcellulose, hydroxymethylcellulose, hydroxypropylmethylcellulose, nitrocellulose, and carboxymethylcellulose.
상기 자외선 안정제가 힌더드 아민계 화합물(HALS)인 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the ultraviolet light stabilizer is a hindered amine compound (HALS).
증점제, 표면장력조절제 및 접착증진제로 이루어진 군에서 선택된 1종 이상의 첨가제를 더 포함하는 것인 도전막 형성용 조성물.The method according to claim 1,
Wherein the composition further comprises at least one additive selected from the group consisting of a thickener, a surface tension modifier, and an adhesion promoter.
상기 표면장력조절제가 불소계 화합물인 것인 도전막 형성용 조성물.The method of claim 8,
Wherein the surface tension regulator is a fluorine-based compound.
상기 금속 나노와이어 0.05 내지 0.2 중량부;
상기 바인더 0.05 내지 1 중량부;
상기 자외선 안정제 0.01 내지 0.1 중량부;
상기 무기 산화물 0.05 내지 0.1 중량부; 및
상기 첨가제 0.005 내지 0.1 중량부를 포함하는 것인 도전막 형성용 조성물.The method of claim 8,
0.05 to 0.2 parts by weight of the metal nanowire;
0.05 to 1 part by weight of the binder;
0.01 to 0.1 parts by weight of the ultraviolet stabilizer;
0.05 to 0.1 parts by weight of the inorganic oxide; And
And 0.005 to 0.1 part by weight of the additive.
디스플레이에 포함된 투명 전극인 것인 도전막.The method of claim 11,
Wherein the conductive film is a transparent electrode included in the display.
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