KR20170090906A - Superb optical characteristics metal nanowire, coating film and preparing method of the same - Google Patents
Superb optical characteristics metal nanowire, coating film and preparing method of the same Download PDFInfo
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- KR20170090906A KR20170090906A KR1020160011870A KR20160011870A KR20170090906A KR 20170090906 A KR20170090906 A KR 20170090906A KR 1020160011870 A KR1020160011870 A KR 1020160011870A KR 20160011870 A KR20160011870 A KR 20160011870A KR 20170090906 A KR20170090906 A KR 20170090906A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/16—Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
Abstract
The present invention relates to a method for producing a transparent conductive film having improved visibility and a transparent conductive film comprising the transparent conductive film. More particularly, the present invention relates to a transparent conductive film comprising a metal nano structure layer provided on a substrate, Metal particles having a refractive index similar to that of a metal wire and Ag particles having a refractive index of 2.0 or less are coated or vapor-deposited on the antireflection layer to improve visibility and have excellent properties of sheet resistance, chemical resistance, transit and haze , A method for manufacturing a transparent conductive film which is easily patternable even in a dry and wet etching process and is easy to control the refractive index, and a transparent conductive film produced thereby.
Description
The present invention relates to an AgNW coating film which realizes a higher optical characteristic while maintaining high conductivity by applying a coating layer containing a resin component material of metal particles (nano to angstrom) similar in refractive index to a metal wire, more specifically, An antireflection layer is formed on the other surface of the metal nano structure layer and an Ag particle having a refractive index of 2.0 or less is coated or vapor deposited on the antireflection layer to produce a transparent conductive film having improved visibility And a transparent conductive coating film produced thereby.
Transparent conductive members that are transparent in the visible light region and have conductivity are used in addition to transparent electrodes in displays such as liquid crystal displays and electroluminescent displays, touch panels, and the like, as well as for preventing electrification of an article.
BACKGROUND ART [0002] It is known that, as a transparent conductive film used in touch panels and the like, a transparent conductive layer made of a conductive metal oxide such as ITO is laminated on a flexible transparent substrate such as a transparent film.
Indium Tin Oxide (ITO) refers to indium oxide (In2O3) having conductivity when tin oxide (SnO2) is added to improve conductivity. When ITO is sputtered to a sputtering target and sputtered on a glass plate , A transparent electrode film can be obtained, and a transparent electrode film can be obtained by dissolving ITO and spraying it onto a glass plate or immersing a glass plate in a solution.
In general, ITO is used as a material used for transparent conductive film. However, recently, demand for ITO replacement films has been increasing due to limitations of ITO properties due to the enlargement of the display due to the adoption of touch screen panels on medium and large screens.
Korean Patent Publication No. 2011-0027297 (Applicant: ELJ CHEMICAL CO., LTD.) Relates to a transparent conductive film, and more particularly, to a transparent conductive film which comprises a transparent substrate, a conductive thin film formed on one surface of the transparent substrate, Wherein the conductive thin film comprises a metal oxide, a carbon nanotube, a nanowire, or a conductive polymer, and the transparent thin film is a transparent conductive film comprising an organic material, an inorganic material, an organic hybrid or a mixture thereof, Invented. In addition, a transparent conductive film prepared by coating an ink composition containing silver-coated silica, hollow silver, and nanowire on a substrate in Korean Published Patent Application No. 2011-0071539 (Applicant: Chems Co., Ltd.) A transparent conductive film having an antireflection film formed by coating a resin (acrylic resin) was invented.
However, important performance of the transparent conductive base material is difficult to drive smoothly if the conductivity is poor due to conductivity and transparency, and when the transparency is deteriorated, the display performance is degraded. However, if the thickness of the conductive thin film is increased in order to improve the conductivity of the conductive base material, it is difficult to improve both the conductivity and the transparency because the transmittance decreases and the transparency decreases because the surface reflectance and the absorption rate of the conductive thin film increase.
In order to solve this problem, there has been an attempt to coat a layer of layers such as acrylic and silicon in order to protect the metal layer on the metal layer when manufacturing the transparent conductive film using the silver nanowire and the metal nano structure.
When Ag is dispersed in solvent (water, alcohol) and coated on the surface of the substrate, it is possible to produce a transparent conductive film having conductivity by contacting each Ag wire randomly like a thread. Do.
However, in such a case, a phenomenon occurs in which a pattern is visually recognized by diffuse reflection on light by a metal nanostructure.
Disclosure of the Invention The present invention has been conceived to solve the problems as described above, and it is an object of the present invention to provide a method of coating metal particles having a refractive index similar to that of a metal wire and Ag particles having a refractive index of 2.0 or less, A method for producing a transparent conductive film having improved diffusional reflection reflectivity and improved visibility and ease of controlling the refractive index, and a transparent conductive film produced by the method.
According to a preferred embodiment of the present invention, a method of manufacturing a transparent conductive film includes: providing a substrate on one surface of a metal nanostructure layer; Forming an anti-reflection layer on the other surface of the metal nanostructure layer; And coating or depositing metal particles having a refractive index similar to that of the metal wire and Ag particles having a refractive index of 2.0 or less on the antireflection layer.
In addition, the substrate is characterized by one kind selected from the group consisting of polyethylene terephthalate (PET), polyethylene naphthalene (PEN), polyimide (PI), cyclic olefin polymer (COP) film or polycarbonate (PC).
The metal nano structure layer may be formed of at least one selected from the group consisting of gold, silver, platinum, palladium, copper, titanium oxide, cadmium oxide, copper iodide, indium tin oxide containing tin, tin oxide containing antimony, A metal oxide of at least one metal selected from the group consisting of tin oxide (FTO) and zinc oxide; Carbon nanotubes; A nanowire comprising a material selected from the group consisting of silver and copper; Or a conductive polymer selected from the group consisting of Polythiophene-based polymers and Polyanilin-based polymers including PSS (poly (styrene sulfonate) and poly (styrenesulfonate)).
Further, the particles are characterized by being selected from the group consisting of organic particles, inorganic particles, and organic hybrids.
According to another preferred embodiment of the present invention, a transparent conductive film having improved visibility is produced by the above-described method.
The transparent conductive film of the present invention is manufactured by coating or vapor-depositing metal particles having a refractive index similar to that of a metal wire and Ag particles having a refractive index of 2.0 or less on the antireflection layer to reduce diffusion reflection reflected on the metal nanostructure layer, Not only is it excellent in surface resistance, chemical resistance, combat transient and haze characteristics, can be easily patterned in a dry and wet etching process, and the refractive index can be easily controlled.
FIG. 1 shows a schematic diagram of a transparent conductive coating film according to the present invention.
2 is a simplified schematic diagram of a conventional transparent conductive coating film.
Hereinafter, the present invention will be described in detail with reference to embodiments and drawings of the present invention. It will be apparent to those skilled in the art that these embodiments are merely illustrative of the present invention in order to more particularly illustrate the present invention and that the scope of the present invention is not limited by these embodiments .
The present invention provides a method for fabricating a semiconductor device, comprising: providing a substrate on one surface of a metal nanostructure layer; Forming an anti-reflection layer on the other surface of the metal nanostructure layer; And coating or vapor-depositing metal particles having a refractive index similar to that of the metal wire and Ag particles having a refractive index of 2.0 or less on the antireflection layer.
Meanwhile, the substrate used in the present invention is not limited to polyethylene terephthalate (PET), polyethylene naphthalene (PEN), polyimide (PI), cyclic olefin polymer (COP) film or polycarbonate Do not.
The metal nanostructured layer is not particularly limited, but may be selected from the group consisting of gold, silver, platinum, palladium, copper, titanium oxide, cadmium oxide, copper iodide, indium tin oxide (ITO) A metal oxide of at least one metal selected from the group consisting of tin oxide, fluorinated tin oxide (FTO), and zinc oxide; Carbon nanotubes; A nanowire comprising a material selected from the group consisting of silver and copper; Or a conductive polymer selected from the group consisting of Polythiophene type polymers and Polyanilin type polymers including PSS (poly (styrene sulfonate) and Poly (styrenesulfonate)), and silver nanowires And metal nanowires are preferably used.
The method for producing the silver nanowires and the metal nanowires of the present invention will be described in more detail below.
Silver nanowires and metal nanowires are prepared by preparing a solution containing a silver salt or metal salt, a capping agent, a catalyst which is an organic halogen ionic salt, and a reducing solvent, and then heating the solution.
As the reducing solvent, at least one selected from the group consisting of glycols including ethylene glycol, propylene glycol, glycerin, glycerol, and glucose may be used, but is not limited thereto.
At this time, it is preferable that the reaction temperature of the reducing solvent is variously controlled in consideration of the type and characteristics of the solvent and the compound.
As described above, after heating the reducing solvent composed of glycols, a silver salt, a metal salt, a capping agent and a catalyst which is an organic halogen ionic salt are added to prepare a solution.
The capping agent may be at least one selected from the group consisting of polypyrrolidone, polyvinyl alcohol, cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, polyacrylamide and polyacrylic acid, but is not limited thereto.
The molecular weight of the capping agent is preferably 40,000 to 100,000, and when the molecular weight of the water-soluble polymer is within the above range, one-dimensional nanowires can be grown.
On the other hand, the organic halogen based ionic salt which is a catalyst may be at least one selected from the group consisting of a chloride ionic salt, a bromine ionic salt and an iodine ionic salt, but is not limited thereto.
These catalysts have a variety of metals or halogen elements to facilitate the reaction of nanowire formation.
A solution is prepared by heating a silver salt or a metal salt, a capping agent and a reducing solvent to which a catalyst is added, and then heated to a reaction temperature of 120 ° C or higher to prepare silver nanowires and metal nanowires.
On the other hand, an antireflection layer is formed on the metal nano structure layer, and metal particles having a refractive index similar to that of the metal wire and Ag particles having a refractive index of 2.0 or less are coated or deposited on the antireflection layer to produce a transparent conductive film. When the refractive index exceeds 21.0, it does not exhibit an excellent effect on the improvement of visibility.
The particles may consist of particles of organic particles, inorganic particles and organic hybrids or mixtures thereof.
It is preferable that the organic material is at least one polymeric binder resin selected from the group consisting of acrylic, urethane, epoxy, olefin, ester, amide, carbonate, cellulose resin and copolymers thereof. it is preferably at least one member selected from the group consisting of SiO 2, ZrO 2, MgF 2 , Sb 2 O 5, BaF 2, TiO 2, ZnO, ZnS, CeF 2 , and Nb 2 O 5. The organic or inorganic hybrid may be at least one selected from the group consisting of methyltrimethoxysilane, methyltriethoxysilane, tetramethoxysilane, tetraethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, glycidyl At least one member selected from the group consisting of trimethylolpropane trimethoxysilane, trimethylolpropane trimethoxysilane, oxypropyltrimethoxysilane, aminopropyltriethoxysilane and aminopropyltrimethoxysilane.
The transparent conductive film of the present invention manufactured by the above method is useful as a top substrate and / or a bottom substrate of a touch panel, particularly a resistive touch panel. In a resistive touch panel, a pair of transparent conductive substrates are aligned and arranged via spacers. When the upper panel is pressed with a finger or a pen, the transparent conductive substrate is bent and its position is detected.
Meanwhile, as described above, a touch panel including the transparent conductive film of the present invention and a display device including such a touch panel are provided. At this time, the display device may be an LCD, PDP, LED, OLED or E-paper.
Hereinafter, embodiments of the present invention will be described in detail. However, these examples are for illustrating the present invention specifically, and the scope of the present invention is not limited to these examples.
Example One
1, a substrate is provided on one surface of a metal nanostructure layer made of silver nanowires, an antireflection layer is formed on the other surface of the metal nanostructure layer, and particles coated with a refractive index of 1.73 are coated on the antireflection layer A transparent conductive coating film was prepared.
Example 2
A film was prepared in the same manner as in Example 1, except that a resin having a refractive index of 1.53 was used in place of the resin having a refractive index of 1.73
Example 3
A film was prepared in the same manner as in Example 1, except that a resin having a refractive index of 1.33 was used instead of the resin having a refractive index of 1.73
Comparative Example One
A film was prepared in the same manner as in Example 1 except that a resin having a refractive index of 2.10 was used in place of the resin having a refractive index of 1.73
Evaluation example
The transmission characteristics of the transparent conductive film produced in Example 1 and Comparative Example 1 were measured by a US-Vis spectrometer. The results are shown in Table 1 below.
As can be seen from Table 1, when the transparent conductive film was prepared by coating the particles on the antireflection layer, the light transmittance was higher and the haze was lower than when the transparent conductive film was prepared without particles.
101, 201: substrate
102, 202: metal nanostructure
103: Antireflection layer
203: protective layer
104: particles
Claims (3)
Forming an anti-reflection layer on the other surface of the metal nanostructure layer; And
And coating or depositing metal particles having a refractive index similar to that of the metal wire and Ag particles having a refractive index of 2.0 or less on the antireflection layer.
Wherein the substrate is one selected from the group consisting of polyethylene terephthalate (PET), polyethylene naphthalene (PEN), polyimide (PI), cyclic olefin polymer (COP) film or polycarbonate (PC) ≪ / RTI >
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111384286A (en) * | 2018-12-29 | 2020-07-07 | Tcl集团股份有限公司 | Quantum dot light-emitting diode and preparation method thereof |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111384286A (en) * | 2018-12-29 | 2020-07-07 | Tcl集团股份有限公司 | Quantum dot light-emitting diode and preparation method thereof |
CN111384286B (en) * | 2018-12-29 | 2021-07-06 | Tcl科技集团股份有限公司 | Quantum dot light-emitting diode and preparation method thereof |
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