KR20170137647A - 발광 다이오드 칩의 제조 방법 및 발광 다이오드 칩 - Google Patents
발광 다이오드 칩의 제조 방법 및 발광 다이오드 칩 Download PDFInfo
- Publication number
- KR20170137647A KR20170137647A KR1020170068439A KR20170068439A KR20170137647A KR 20170137647 A KR20170137647 A KR 20170137647A KR 1020170068439 A KR1020170068439 A KR 1020170068439A KR 20170068439 A KR20170068439 A KR 20170068439A KR 20170137647 A KR20170137647 A KR 20170137647A
- Authority
- KR
- South Korea
- Prior art keywords
- light emitting
- emitting diode
- transparent substrate
- wafer
- diode chip
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 81
- 238000005520 cutting process Methods 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 claims abstract description 12
- 239000013078 crystal Substances 0.000 claims abstract description 6
- 238000002360 preparation method Methods 0.000 claims abstract description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 11
- 239000010980 sapphire Substances 0.000 claims description 11
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 239000005304 optical glass Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000005488 sandblasting Methods 0.000 claims description 2
- 230000010354 integration Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 48
- 230000003287 optical effect Effects 0.000 description 7
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 5
- 239000011295 pitch Substances 0.000 description 3
- 229910002601 GaN Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
- Dicing (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Laser Beam Processing (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2016-111540 | 2016-06-03 | ||
JP2016111540A JP2017220476A (ja) | 2016-06-03 | 2016-06-03 | 発光ダイオードチップの製造方法及び発光ダイオードチップ |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20170137647A true KR20170137647A (ko) | 2017-12-13 |
Family
ID=60546134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170068439A KR20170137647A (ko) | 2016-06-03 | 2017-06-01 | 발광 다이오드 칩의 제조 방법 및 발광 다이오드 칩 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2017220476A (zh) |
KR (1) | KR20170137647A (zh) |
CN (1) | CN107464860A (zh) |
TW (1) | TW201812889A (zh) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006278751A (ja) * | 2005-03-29 | 2006-10-12 | Mitsubishi Cable Ind Ltd | GaN系半導体発光素子 |
CN101499508A (zh) * | 2008-02-01 | 2009-08-05 | 群康科技(深圳)有限公司 | 发光二极管装置及其制造方法 |
CN101807568B (zh) * | 2010-03-04 | 2012-05-23 | 四川锦明光电股份有限公司 | 多芯片led封装结构及其加工方法 |
JP2011243875A (ja) * | 2010-05-20 | 2011-12-01 | Disco Abrasive Syst Ltd | サファイアウェーハの分割方法 |
KR101843501B1 (ko) * | 2011-03-30 | 2018-03-29 | 서울반도체 주식회사 | 발광장치 |
JP5509394B2 (ja) * | 2012-02-01 | 2014-06-04 | パナソニック株式会社 | 半導体発光素子、その製造方法及び光源装置 |
CN202616282U (zh) * | 2012-05-30 | 2012-12-19 | 华南理工大学 | 一种具有金字塔阵列结构的led芯片 |
JP2014175354A (ja) * | 2013-03-06 | 2014-09-22 | Disco Abrasive Syst Ltd | 発光ダイオード |
JP6129322B2 (ja) * | 2013-08-30 | 2017-05-17 | 旭化成株式会社 | 半導体発光素子及び光学フィルム |
CN104993029A (zh) * | 2015-07-09 | 2015-10-21 | 佛山市南海区联合广东新光源产业创新中心 | 半导体发光芯片级封装 |
-
2016
- 2016-06-03 JP JP2016111540A patent/JP2017220476A/ja active Pending
-
2017
- 2017-05-03 TW TW106114603A patent/TW201812889A/zh unknown
- 2017-05-31 CN CN201710398310.7A patent/CN107464860A/zh active Pending
- 2017-06-01 KR KR1020170068439A patent/KR20170137647A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TW201812889A (zh) | 2018-04-01 |
CN107464860A (zh) | 2017-12-12 |
JP2017220476A (ja) | 2017-12-14 |
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