KR20170109081A - 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법 - Google Patents

조절된 압력하에서 헬륨을 사용하는 고온 처리 방법 Download PDF

Info

Publication number
KR20170109081A
KR20170109081A KR1020177026254A KR20177026254A KR20170109081A KR 20170109081 A KR20170109081 A KR 20170109081A KR 1020177026254 A KR1020177026254 A KR 1020177026254A KR 20177026254 A KR20177026254 A KR 20177026254A KR 20170109081 A KR20170109081 A KR 20170109081A
Authority
KR
South Korea
Prior art keywords
furnace
heating zone
pressure
reaction
reactive gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020177026254A
Other languages
English (en)
Korean (ko)
Inventor
프레더릭 쉬미드
데이비드 비. 조이스
존 브로우일렛
다니엘 피. 베티
리안 필포트
Original Assignee
지티에이티 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 지티에이티 코포레이션 filed Critical 지티에이티 코포레이션
Publication of KR20170109081A publication Critical patent/KR20170109081A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/003Heating or cooling of the melt or the crystallised material
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/20Aluminium oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/006Controlling or regulating
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/02Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method without using solvents
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/10Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by application of pressure, e.g. hydrothermal processes
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B17/00Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1004Apparatus with means for measuring, testing, or sensing
    • Y10T117/1008Apparatus with means for measuring, testing, or sensing with responsive control means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020177026254A 2009-09-02 2010-09-01 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법 Ceased KR20170109081A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23922809P 2009-09-02 2009-09-02
US61/239,228 2009-09-02
PCT/US2010/047506 WO2011028787A1 (en) 2009-09-02 2010-09-01 High-temperature process improvements using helium under regulated pressure
US12/873,388 US9546434B2 (en) 2009-09-02 2010-09-01 High-temperature process improvements using helium under regulated pressure
US12/873,388 2010-09-01

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020127006660A Division KR20120083333A (ko) 2009-09-02 2010-09-01 조절된 압력하에 헬륨을 사용하는 고온 처리 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187029893A Division KR101975735B1 (ko) 2009-09-02 2010-09-01 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법

Publications (1)

Publication Number Publication Date
KR20170109081A true KR20170109081A (ko) 2017-09-27

Family

ID=43622958

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020177026254A Ceased KR20170109081A (ko) 2009-09-02 2010-09-01 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법
KR1020127006660A Ceased KR20120083333A (ko) 2009-09-02 2010-09-01 조절된 압력하에 헬륨을 사용하는 고온 처리 방법
KR1020187029893A Active KR101975735B1 (ko) 2009-09-02 2010-09-01 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020127006660A Ceased KR20120083333A (ko) 2009-09-02 2010-09-01 조절된 압력하에 헬륨을 사용하는 고온 처리 방법
KR1020187029893A Active KR101975735B1 (ko) 2009-09-02 2010-09-01 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법

Country Status (6)

Country Link
US (2) US9546434B2 (https=)
JP (3) JP2013503811A (https=)
KR (3) KR20170109081A (https=)
CN (2) CN106948004A (https=)
TW (1) TWI519684B (https=)
WO (1) WO2011028787A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110179992A1 (en) * 2008-10-24 2011-07-28 Schwerdtfeger Jr Carl Richard Crystal growth methods and systems
JP5838727B2 (ja) * 2011-10-28 2016-01-06 株式会社Sumco サファイア単結晶の製造方法及び製造装置
CN102605426B (zh) * 2012-03-14 2015-05-13 苏州先端稀有金属有限公司 一种用于超高温状态下产生温差的热场结构
US9407746B2 (en) * 2012-12-27 2016-08-02 Gtat Corporation Mobile electronic device comprising a sapphire cover plate having a low level of inclusions
CN103173855B (zh) * 2013-03-12 2016-01-06 贵阳嘉瑜光电科技咨询中心 一种惰性气体保护下的hem晶体生长方法
US10633759B2 (en) * 2013-09-30 2020-04-28 Gtat Corporation Technique for controlling temperature uniformity in crystal growth apparatus
CN107130289A (zh) * 2017-06-13 2017-09-05 江苏吉星新材料有限公司 一种改进热交换大尺寸蓝宝石晶体的生长方法
CN108588832B (zh) * 2018-04-28 2021-09-24 内蒙古恒嘉晶体材料有限公司 制备蓝宝石晶体的改进的泡生法及晶体生长炉
CN112501690A (zh) * 2020-12-02 2021-03-16 通辽精工蓝宝石有限公司 一种蓝宝石单晶的生长方法
AT524602B1 (de) * 2020-12-29 2023-05-15 Fametec Gmbh Vorrichtung zur Herstellung eines Einkristalls
TWI811639B (zh) * 2021-02-25 2023-08-11 環球晶圓股份有限公司 長晶純化設備及熱場配件純化方法
CN113880460B (zh) * 2021-11-10 2022-04-08 沃米真玻科技(北京)有限公司 真空玻璃封边抽真空封口一体化加热炉和连续生产线
CN115369489A (zh) * 2022-07-29 2022-11-22 江西兆驰半导体有限公司 一种衬底片无氧退火炉、退火方法以及衬底片
CN117702259A (zh) * 2024-02-06 2024-03-15 宁波合盛新材料有限公司 一种pvt炉快速降温的方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3058915A (en) * 1960-01-18 1962-10-16 Westinghouse Electric Corp Crystal growing process
US3653432A (en) * 1970-09-01 1972-04-04 Us Army Apparatus and method for unidirectionally solidifying high temperature material
JPS5529011B2 (https=) * 1972-12-07 1980-07-31
US3898051A (en) * 1973-12-28 1975-08-05 Crystal Syst Crystal growing
US4096025A (en) * 1974-02-21 1978-06-20 The United States Of America As Represented By The Secretary Of The Army Method of orienting seed crystals in a melt, and product obtained thereby
US3998686A (en) * 1975-03-10 1976-12-21 Corning Glass Works Sapphire growth from the melt using porous alumina raw batch material
DE2700994C2 (de) 1976-04-16 1986-02-06 International Business Machines Corp., Armonk, N.Y. Verfahren und Vorrichtung zum Ziehen von kristallinen Siliciumkörpern
US4116641A (en) * 1976-04-16 1978-09-26 International Business Machines Corporation Apparatus for pulling crystal ribbons from a truncated wedge shaped die
DE2821481C2 (de) * 1978-05-17 1985-12-05 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Vorrichtung zum Ziehen von hochreinen Halbleiterstäben aus der Schmelze
US4256530A (en) * 1978-12-07 1981-03-17 Crystal Systems Inc. Crystal growing
JPH0777994B2 (ja) * 1989-11-16 1995-08-23 信越半導体株式会社 単結晶の酸素濃度コントロール方法及び装置
DE69208146T2 (de) * 1991-05-30 1996-06-20 Chichibu Cement Kk Rutil-Einkristalle sowie Verfahren zu deren Zuchtung
JP3360626B2 (ja) * 1998-12-01 2002-12-24 三菱住友シリコン株式会社 シリコン単結晶の製造方法
US6749683B2 (en) * 2000-02-14 2004-06-15 Memc Electronic Materials, Inc. Process for producing a silicon melt
US6543466B2 (en) * 2000-03-02 2003-04-08 Rajinder S. Gill Mass flow controller and method of operation of mass flow controller
CN1485467A (zh) * 2003-08-08 2004-03-31 中国科学院上海光学精密机械研究所 大面积晶体的温梯法生长装置及其生长晶体的方法
CN100404730C (zh) * 2005-12-21 2008-07-23 北京有色金属研究总院 一种晶体生长的装置及方法
DE102006017622B4 (de) * 2006-04-12 2008-03-27 Schott Ag Verfahren und Vorrichtung zur Herstellung von multikristallinem Silizium
JP2008007354A (ja) * 2006-06-28 2008-01-17 Sumitomo Metal Mining Co Ltd サファイア単結晶の育成方法
US8152921B2 (en) * 2006-09-01 2012-04-10 Okmetic Oyj Crystal manufacturing
DE102007020006A1 (de) * 2007-04-27 2008-10-30 Freiberger Compound Materials Gmbh Vorrichtung und Verfahren zur Herstellung von poly- oder multikristallinem Silizium, dadurch hergestellter Masseblock (Ingot) sowie Wafer aus poly- oder multikristallinem Silizium, und Verwendung zur Herstellung von Solarzellen
US20080271447A1 (en) * 2007-05-03 2008-11-06 Abel John B Method and apparatus for supplying air to an emission abatement device by use of a turbocharger

Also Published As

Publication number Publication date
TW201129728A (en) 2011-09-01
JP2013503811A (ja) 2013-02-04
JP2017100945A (ja) 2017-06-08
US9546434B2 (en) 2017-01-17
WO2011028787A1 (en) 2011-03-10
JP6423908B2 (ja) 2018-11-14
TWI519684B (zh) 2016-02-01
CN106948004A (zh) 2017-07-14
CN102625864A (zh) 2012-08-01
US20170096746A1 (en) 2017-04-06
KR20120083333A (ko) 2012-07-25
KR101975735B1 (ko) 2019-05-07
JP2015129089A (ja) 2015-07-16
US20110048316A1 (en) 2011-03-03
KR20180115815A (ko) 2018-10-23

Similar Documents

Publication Publication Date Title
KR101975735B1 (ko) 조절된 압력하에서 헬륨을 사용하는 고온 처리 방법
US11661671B2 (en) Technique for controlling temperature uniformity in crystal growth apparatus
US12404601B2 (en) Method for growing crystals
CN112501690A (zh) 一种蓝宝石单晶的生长方法
US6800136B2 (en) Axial gradient transport apparatus and process
KR101299037B1 (ko) 마이크로 웨이브를 이용한 단결정 성장장치 및 그 성장방법
JP2008280206A (ja) 単結晶成長装置
JP7115592B1 (ja) 単結晶製造装置
TWI877422B (zh) 具有穿伸殼體之經流體填充排氣管之拉晶系統
CN114959868A (zh) 一种主动气氛调节的晶体生长方法
TW201940754A (zh) 矽單晶的製造方法
JP2021042095A (ja) シリコン単結晶の製造方法
JP2006096578A (ja) 炭化珪素単結晶の製造方法及び炭化珪素単結晶インゴット
KR102731587B1 (ko) 단결정 성장 장치 및 이를 이용한 단결정 성장 방법
US20030070612A1 (en) Vented susceptor
JP2710433B2 (ja) 単結晶引上装置
JP2004043211A (ja) SiC単結晶の製造方法及び製造装置
KR20210073681A (ko) 탄화규소 단결정 성장 장치
KR101469704B1 (ko) 사파이어 단결정의 제조 방법 및 제조 장치
CN121556142A (zh) 一种用于晶棒生长的控制装置、方法以及拉晶炉
JPH11157980A (ja) 化合物単結晶製造装置および/または熱処理装置

Legal Events

Date Code Title Description
A107 Divisional application of patent
A201 Request for examination
PA0104 Divisional application for international application

Comment text: Divisional Application for International Patent

Patent event code: PA01041R01D

Patent event date: 20170918

Application number text: 1020127006660

Filing date: 20120314

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20170929

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20180730

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20170929

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

A107 Divisional application of patent
PA0104 Divisional application for international application

Comment text: Divisional Application for International Patent

Patent event code: PA01041R01D

Patent event date: 20181016

Application number text: 1020127006660

Filing date: 20120314