KR20160147489A - Method of manufacturing gas conduit generating plasma and gas pipe manufactured by the same - Google Patents
Method of manufacturing gas conduit generating plasma and gas pipe manufactured by the same Download PDFInfo
- Publication number
- KR20160147489A KR20160147489A KR1020150084300A KR20150084300A KR20160147489A KR 20160147489 A KR20160147489 A KR 20160147489A KR 1020150084300 A KR1020150084300 A KR 1020150084300A KR 20150084300 A KR20150084300 A KR 20150084300A KR 20160147489 A KR20160147489 A KR 20160147489A
- Authority
- KR
- South Korea
- Prior art keywords
- ring
- body member
- shaped
- partial body
- gas conduit
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
Abstract
The present invention relates to a method of manufacturing a plasma generating gas conduit and a gas conduit manufactured thereby, comprising: a raw material preparing step of preparing a ring-shaped raw material; Forming a first partial body member and a second partial body member by machining the raw material so as to include a 'C' shaped end face formed in a ring shape and forming a part of the ring-shaped gas flow path; A ring-shaped body member forming step of joining the first partial body member and the second partial body member in an opposed state to each other to form a ring-shaped body member in which the ring-shaped gas flow path is formed; A connection member manufacturing step of manufacturing a connection member formed in a pipe shape in which a channel is formed; A coupling member coupling step of coupling the coupling member to the ring-shaped body member so that the channel communicates with the ring-shaped gas channel; A gas conduit for plasma generation which can significantly reduce the time required for cutting the partial body member and can reliably improve durability life by fundamentally preventing local stress concentration from occurring, Of the present invention.
Description
The present invention relates to a method of manufacturing a gas conduit for supplying a gas for generating plasma, and more particularly, to a method of manufacturing a gas conduit including a ring-shaped conduit by using a brittle material such as a quartz, And more particularly, to a method of manufacturing a gas conduit for a gas.
Plasma is a state in which ions and electrons are present in the space at the same density as the material is ionized, and it is called the fourth form of a substance from solid, liquid, and gas. This type of plasma is widely used for industrial and chemical applications such as semiconductor wafer etching, hydrocarbon material removal, and silicon oxide removal.
The plasma may be generated by forming an electric field in a gas such as O 2 , NF 3 , Ar, CF 4 , 112 and He or a mixed gas thereof (hereinafter referred to as a plasma gas) , A microwave discharge, a high frequency discharge, etc., and a plasma can be generated by forming an electric field in a chamber or a gas guide where a plasma gas is located.
Such a plasma generating gas conduit is disclosed in Fig. 4 of Japanese Patent Laid-Open Publication No. 2015-500557, and is also disclosed in U.S. Published Patent Application No. 2013/146225.
1, the plasma generating
As shown in Fig. 3A, the plasma generating
However, there is a problem that it takes a very long time to process the
Since the
Furthermore, since the glass or quartz material is poor in impact resistance, there is a machining limitation that the cutting depth of the cutting bite must be kept very small. Therefore, from the
3A also includes a
In order to solve the above problems, the present invention provides a method for manufacturing a plasma generating gas conduit which can reliably and reliably guarantee the durability lifetime by preventing the concentration of stress locally while shortening the manufacturing time of the plasma generating gas conduit The purpose is to provide.
That is, the present invention provides a gas conduit for generating plasma of a predetermined shape by reducing a machining amount for manufacturing a gas conduit from a raw material, thereby shortening a manufacturing time, and at the same time, So as to fundamentally suppress local stress concentration.
Accordingly, it is an object of the present invention to provide a gas conduit for plasma generation which is inexpensive and has improved durability while reducing the defective rate.
In order to accomplish the above object, the present invention provides a method of manufacturing a semiconductor device, comprising: preparing a raw material for preparing a ring-shaped raw material; Forming a first partial body member and a second partial body member by machining the raw material so as to include a 'C' shaped end face formed in a ring shape and forming a part of the ring-shaped gas flow path; A ring-shaped body member forming step of joining the first partial body member and the second partial body member in an opposed state to each other to form a ring-shaped body member in which the ring-shaped gas flow path is formed; A connection member manufacturing step of manufacturing a connection member formed in a pipe shape in which a channel is formed; A coupling member coupling step of coupling the coupling member to the ring-shaped body member so that the channel communicates with the ring-shaped gas channel; The method of manufacturing a plasma generating gas conduit according to the present invention includes the steps of:
This is because, after the ring-shaped body member is formed by forming the ring-shaped part body members forming the ring-shaped gas flow path and then joining them to each other, a connecting member protruding from the partial body member is separately manufactured and joined to the ring- By producing the gas conduit for production, it is possible to drastically shorten the time required for cutting the partial body member and to prevent the local concentration of stress.
In other words, since the ring-shaped body member is formed in a ring shape such as a donut, it is possible to perform the cutting process even by the CNC lathe without depending on the machining center, so that the machining time and the machining process can be simplified.
The partial body member may be formed with a recessed groove into which the connecting member is inserted, and the connecting member may be formed by welding the connecting member in the recessed groove of the ring-shaped body member.
In this way, the joining parts of the partial body member and the connecting member can be joined to each other in a correct posture without being twisted, and at the same time, the connecting member is formed so as to extend linearly in the extending direction of the oil passage, The stress is not concentrated on the joining portion between the connecting member and the body member during the cutting process or the joining process, so that the durability can be further improved.
The connecting member and the ring-shaped body member are both formed of a material of either a quartz or a glass.
The connecting member may communicate with the waveguide and may be provided in a number corresponding to the number of the grooves and may be connected to either the gas inlet or the gas outlet.
And joining and joining the gas inlet and the flange coupled to the gas outlet at the other end of the connecting member. Here, the flange may be coupled to the body member after being integrally formed with the connecting member, or may be coupled to the end of the connecting member after the connecting member and the body member are coupled to each other.
And sanding the welded portion of the coupling member and the concave groove when the coupling member is welded to the concave groove.
According to another aspect of the present invention, there is provided a gas conduit for plasma generation, which is manufactured by the method for manufacturing a plasma generating gas conduit according to an aspect of the present invention.
According to the present invention, a partial body member for forming a ring-shaped gas flow path is formed in a ring shape, and a connecting member protruding from the partial body member is separately manufactured and then joined to produce a raw material It is possible to reduce the time required for machining the partial body member and to reduce the manufacturing cost.
Further, according to the present invention, since the partial body member forming the ring-shaped gas flow channel is formed in a ring shape that does not protrude radially outward or inward in the radial direction, the partial body member can be processed in a simpler process using a CNC lathe .
The present invention is characterized in that a ring-shaped body member is formed into a ring shape, a connecting member is formed in the form of a pipe in the shape of a letter, and then these are joined by welding so that the ring- It is possible to obtain the effect of eliminating the problem of stress concentration at the boundary between them when machined into the body.
Further, according to the present invention, since the ring-shaped body member and the connecting member are formed in advance in the recessed groove into which the connecting member is inserted, the ring-shaped body member and the connecting member are accurately An advantage that can be combined in the posture can be obtained.
It is therefore an object of the present invention to provide a gas conduit in which a ring-shaped gas flow path is formed at a much lower cost and a higher yield than in the prior art, and an advantageous effect of reliably ensuring the durability life of the manufactured gas conduit is obtained have.
1 is a perspective view showing a general plasma generating gas conduit.
FIG. 2 is a view showing a raw material for forming the partial body member of FIG. 1;
FIGS. 3A and 3B sequentially illustrate the steps of manufacturing the gas conduit of FIG. 1;
4 is a perspective view showing a general plasma generating gas conduit.
FIG. 5 is a view showing a raw material for molding the partial body member of FIG. 4;
6A and 6B are views sequentially showing the steps of manufacturing the gas conduit of FIG.
Hereinafter, a gas conduit for plasma generation according to an embodiment of the present invention will be described with reference to the accompanying drawings. The present invention may be embodied in other specific forms without departing from the spirit and scope of the present invention as defined by the appended claims. And is provided to fully disclose the scope of the invention. In addition, it is to be understood that the drawings used in the present embodiment are provided to facilitate understanding of the present invention and can be exaggerated or modified in shape and scale.
The plasma generating
The plasma generating
A method of manufacturing a plasma generating
Hereinafter, a method for manufacturing a plasma generating gas conduit according to this embodiment will be described in detail with reference to Figs. 5 to 6B.
Step 1 : First, as shown in FIG. 5, two donut-shaped
At this time, the outer diameter Do 'of the
Step 2 : Then, the
Since the
Above all, since the
Generally, the
Step 3 : Once the recessed
Step 4 : After the step 3 is performed, the two
Step 5 : On the other hand, independently of steps 2 to 4, the connecting
That is, the connecting
Step 6 : After the steps 4 and 5 are performed, in a state where the connecting
As described above, the ring-shaped
Step 6 : Thereafter, a sanding process is performed in which the abutting welding portions of the
The method of manufacturing a
In addition, in the present invention, the ring-shaped ring-shaped
While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood that the invention may be practiced. It is therefore to be understood that the embodiments described above are to be considered in all respects only as illustrative and not restrictive. In addition, the scope of the present invention is indicated by the following claims rather than the above detailed description. Also, all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included within the scope of the present invention.
For example, in the embodiment shown in the drawings, a configuration is shown in which the
In the embodiment shown in the drawings, after the recessed
100: gas conduit 110: ring-shaped body member
110A, 110B: partial body member 112: recessed groove
120: connecting member 124: flange
Rs: ring-shaped gas flow path P1, P2: waveguide channel
112, 112:
Claims (5)
Forming a first partial body member and a second partial body member by machining the raw material so as to include a 'C' shaped end face formed in a ring shape and forming a part of the ring-shaped gas flow path;
A ring-shaped body member forming step of joining the first partial body member and the second partial body member in an opposed state to each other to form a ring-shaped body member in which the ring-shaped gas flow path is formed;
A connection member manufacturing step of manufacturing a connection member formed in a pipe shape in which a channel is formed;
A coupling member coupling step of coupling the coupling member to the ring-shaped body member so that the channel communicates with the ring-shaped gas channel;
Wherein the gas conduit comprises a plurality of gas conduits.
Wherein the partial body member is formed with a recessed groove into which the connecting member is inserted in advance and the connecting member engaging step is performed by welding the connecting member in the recessed groove of the ring- Wherein the gas conduit is a gas conduit.
Wherein the connecting member and the ring-shaped body member are both made of a material selected from the group consisting of quartz and glass.
Wherein a flange is coupled to an end of the connecting member.
Priority Applications (1)
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KR1020150084300A KR101703429B1 (en) | 2015-06-15 | 2015-06-15 | Method of manufacturing gas conduit generating plasma and gas pipe manufactured by the same |
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KR1020150084300A KR101703429B1 (en) | 2015-06-15 | 2015-06-15 | Method of manufacturing gas conduit generating plasma and gas pipe manufactured by the same |
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KR20160147489A true KR20160147489A (en) | 2016-12-23 |
KR101703429B1 KR101703429B1 (en) | 2017-02-06 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102406350B1 (en) * | 2022-03-31 | 2022-06-08 | 주식회사 조양 | Plazma creation gas sleeve manufacturing method and gas sleeve thereby |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070104701A (en) * | 2006-04-24 | 2007-10-29 | 최대규 | Inductive coupled plasma source with plasma discharging tube covered with magnetic core block |
KR20140068380A (en) * | 2012-11-28 | 2014-06-09 | 주식회사 월드탑이엔지 | Easy to prevent oxidation of toxic gases only exhaust duct structure |
JP2015500557A (en) | 2011-12-08 | 2015-01-05 | エム ケー エス インストルメンツインコーポレーテッドMks Instruments,Incorporated | Gas injector for plasma applicator |
-
2015
- 2015-06-15 KR KR1020150084300A patent/KR101703429B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070104701A (en) * | 2006-04-24 | 2007-10-29 | 최대규 | Inductive coupled plasma source with plasma discharging tube covered with magnetic core block |
JP2015500557A (en) | 2011-12-08 | 2015-01-05 | エム ケー エス インストルメンツインコーポレーテッドMks Instruments,Incorporated | Gas injector for plasma applicator |
KR20140068380A (en) * | 2012-11-28 | 2014-06-09 | 주식회사 월드탑이엔지 | Easy to prevent oxidation of toxic gases only exhaust duct structure |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102406350B1 (en) * | 2022-03-31 | 2022-06-08 | 주식회사 조양 | Plazma creation gas sleeve manufacturing method and gas sleeve thereby |
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