KR20160146913A - 공초점 라인 검사 광학 시스템 - Google Patents

공초점 라인 검사 광학 시스템 Download PDF

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Publication number
KR20160146913A
KR20160146913A KR1020167032599A KR20167032599A KR20160146913A KR 20160146913 A KR20160146913 A KR 20160146913A KR 1020167032599 A KR1020167032599 A KR 1020167032599A KR 20167032599 A KR20167032599 A KR 20167032599A KR 20160146913 A KR20160146913 A KR 20160146913A
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KR
South Korea
Prior art keywords
line image
survey line
slit aperture
processor
wafer inspection
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Ceased
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KR1020167032599A
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English (en)
Korean (ko)
Inventor
마크 에스 왕
크리스 커크
안드레이 카리소브
Original Assignee
케이엘에이-텐코 코포레이션
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Publication of KR20160146913A publication Critical patent/KR20160146913A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0028—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0072—Optical details of the image generation details concerning resolution or correction, including general design of CSOM objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • H01L22/12—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/121—Correction signals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Surgery (AREA)
  • Radiology & Medical Imaging (AREA)
  • Ophthalmology & Optometry (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020167032599A 2014-04-22 2015-04-22 공초점 라인 검사 광학 시스템 Ceased KR20160146913A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461982754P 2014-04-22 2014-04-22
US61/982,754 2014-04-22
US14/691,966 2015-04-21
US14/691,966 US9927371B2 (en) 2014-04-22 2015-04-21 Confocal line inspection optical system
PCT/US2015/027162 WO2015164540A1 (en) 2014-04-22 2015-04-22 Confocal line inspection optical system

Publications (1)

Publication Number Publication Date
KR20160146913A true KR20160146913A (ko) 2016-12-21

Family

ID=54333152

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167032599A Ceased KR20160146913A (ko) 2014-04-22 2015-04-22 공초점 라인 검사 광학 시스템

Country Status (6)

Country Link
US (1) US9927371B2 (https=)
JP (3) JP2017519971A (https=)
KR (1) KR20160146913A (https=)
CN (1) CN106233125B (https=)
IL (1) IL247812A0 (https=)
WO (1) WO2015164540A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT516887B1 (de) * 2015-02-27 2022-12-15 Ait Austrian Inst Tech Gmbh Bildaufnahmeeinheit
US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
US10778925B2 (en) 2016-04-06 2020-09-15 Kla-Tencor Corporation Multiple column per channel CCD sensor architecture for inspection and metrology
US10313622B2 (en) 2016-04-06 2019-06-04 Kla-Tencor Corporation Dual-column-parallel CCD sensor and inspection systems using a sensor
US11662646B2 (en) 2017-02-05 2023-05-30 Kla Corporation Inspection and metrology using broadband infrared radiation
CN108519329B (zh) * 2018-03-26 2021-01-15 华中科技大学 一种多路扫描与探测的线共聚焦成像装置
US11624710B2 (en) * 2019-05-24 2023-04-11 Lawrence Livermore National Security, Llc Fast image acquisition system and method using pulsed light illumination and sample scanning to capture optical micrographs with sub-micron features

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JPS61149812A (ja) * 1984-12-24 1986-07-08 Mitsubishi Electric Corp 振動する物体の表面検査装置
JPS62103503A (ja) * 1985-10-31 1987-05-14 Hitachi Electronics Eng Co Ltd ウエハ測定装置
JPH0749209A (ja) * 1993-08-05 1995-02-21 Hitachi Electron Eng Co Ltd ラインセンサの位置合せ方法
US5965910A (en) 1997-04-29 1999-10-12 Ohmeda Inc. Large cell charge coupled device for spectroscopy
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
ATE272224T1 (de) 1997-11-17 2004-08-15 Max Planck Gesellschaft Konfokales spektroskopiesystem und -verfahren
KR20020084786A (ko) 2001-05-04 2002-11-11 이재웅 선형 선 스캐닝을 이용하는 공초점 영상 형성 장치 및 방법
US7435941B2 (en) 2003-03-14 2008-10-14 Inphase Technologies, Inc. Methods for measuring optical characteristics by differential diffractive scanning
JP2005055196A (ja) * 2003-08-05 2005-03-03 Olympus Corp 基板検査方法及びその装置
CN100452199C (zh) * 2004-04-21 2009-01-14 松下电器产业株式会社 共焦光学系统开口位置检测装置、控制装置、及其检测方法、光学头装置及光信息处理装置
DE102004034970A1 (de) * 2004-07-16 2006-02-02 Carl Zeiss Jena Gmbh Lichtrastermikroskop und Verwendung
WO2008081729A1 (ja) 2006-12-22 2008-07-10 Nikon Corporation レーザ走査共焦点顕微鏡
JP5489392B2 (ja) * 2007-05-09 2014-05-14 オリンパス株式会社 光学系評価装置、光学系評価方法および光学系評価プログラム
US7525649B1 (en) 2007-10-19 2009-04-28 Kla-Tencor Technologies Corporation Surface inspection system using laser line illumination with two dimensional imaging
JP2010019630A (ja) * 2008-07-09 2010-01-28 Tokyo Institute Of Technology 顕微分光装置
TWI490444B (zh) * 2009-01-23 2015-07-01 Univ Nat Taipei Technology 線型多波長共焦顯微方法與系統
US8773760B2 (en) * 2009-04-27 2014-07-08 The Arizona Board Of Regents On Behalf Of The University Of Arizona Multi-point scan architecture
CN105549341A (zh) * 2012-02-21 2016-05-04 Asml荷兰有限公司 检查设备和方法

Also Published As

Publication number Publication date
US20150369750A1 (en) 2015-12-24
JP2022183309A (ja) 2022-12-08
CN106233125B (zh) 2020-08-11
JP2021067697A (ja) 2021-04-30
IL247812A0 (en) 2016-11-30
CN106233125A (zh) 2016-12-14
JP2017519971A (ja) 2017-07-20
JP7599463B2 (ja) 2024-12-13
WO2015164540A1 (en) 2015-10-29
US9927371B2 (en) 2018-03-27

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