IL247812A0 - Optical system for confocal line inspection - Google Patents

Optical system for confocal line inspection

Info

Publication number
IL247812A0
IL247812A0 IL247812A IL24781216A IL247812A0 IL 247812 A0 IL247812 A0 IL 247812A0 IL 247812 A IL247812 A IL 247812A IL 24781216 A IL24781216 A IL 24781216A IL 247812 A0 IL247812 A0 IL 247812A0
Authority
IL
Israel
Prior art keywords
optical system
line inspection
inspection optical
confocal line
confocal
Prior art date
Application number
IL247812A
Other languages
English (en)
Hebrew (he)
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of IL247812A0 publication Critical patent/IL247812A0/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0028—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0072—Optical details of the image generation details concerning resolution or correction, including general design of CSOM objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/121—Correction signals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Surgery (AREA)
  • Radiology & Medical Imaging (AREA)
  • Ophthalmology & Optometry (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IL247812A 2014-04-22 2016-09-14 Optical system for confocal line inspection IL247812A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461982754P 2014-04-22 2014-04-22
US14/691,966 US9927371B2 (en) 2014-04-22 2015-04-21 Confocal line inspection optical system
PCT/US2015/027162 WO2015164540A1 (en) 2014-04-22 2015-04-22 Confocal line inspection optical system

Publications (1)

Publication Number Publication Date
IL247812A0 true IL247812A0 (en) 2016-11-30

Family

ID=54333152

Family Applications (1)

Application Number Title Priority Date Filing Date
IL247812A IL247812A0 (en) 2014-04-22 2016-09-14 Optical system for confocal line inspection

Country Status (6)

Country Link
US (1) US9927371B2 (https=)
JP (3) JP2017519971A (https=)
KR (1) KR20160146913A (https=)
CN (1) CN106233125B (https=)
IL (1) IL247812A0 (https=)
WO (1) WO2015164540A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT516887B1 (de) * 2015-02-27 2022-12-15 Ait Austrian Inst Tech Gmbh Bildaufnahmeeinheit
US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
US10778925B2 (en) 2016-04-06 2020-09-15 Kla-Tencor Corporation Multiple column per channel CCD sensor architecture for inspection and metrology
US10313622B2 (en) 2016-04-06 2019-06-04 Kla-Tencor Corporation Dual-column-parallel CCD sensor and inspection systems using a sensor
US11662646B2 (en) 2017-02-05 2023-05-30 Kla Corporation Inspection and metrology using broadband infrared radiation
CN108519329B (zh) * 2018-03-26 2021-01-15 华中科技大学 一种多路扫描与探测的线共聚焦成像装置
US11624710B2 (en) * 2019-05-24 2023-04-11 Lawrence Livermore National Security, Llc Fast image acquisition system and method using pulsed light illumination and sample scanning to capture optical micrographs with sub-micron features

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149812A (ja) * 1984-12-24 1986-07-08 Mitsubishi Electric Corp 振動する物体の表面検査装置
JPS62103503A (ja) * 1985-10-31 1987-05-14 Hitachi Electronics Eng Co Ltd ウエハ測定装置
JPH0749209A (ja) * 1993-08-05 1995-02-21 Hitachi Electron Eng Co Ltd ラインセンサの位置合せ方法
US5965910A (en) 1997-04-29 1999-10-12 Ohmeda Inc. Large cell charge coupled device for spectroscopy
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
ATE272224T1 (de) 1997-11-17 2004-08-15 Max Planck Gesellschaft Konfokales spektroskopiesystem und -verfahren
KR20020084786A (ko) 2001-05-04 2002-11-11 이재웅 선형 선 스캐닝을 이용하는 공초점 영상 형성 장치 및 방법
US7435941B2 (en) 2003-03-14 2008-10-14 Inphase Technologies, Inc. Methods for measuring optical characteristics by differential diffractive scanning
JP2005055196A (ja) * 2003-08-05 2005-03-03 Olympus Corp 基板検査方法及びその装置
CN100452199C (zh) * 2004-04-21 2009-01-14 松下电器产业株式会社 共焦光学系统开口位置检测装置、控制装置、及其检测方法、光学头装置及光信息处理装置
DE102004034970A1 (de) * 2004-07-16 2006-02-02 Carl Zeiss Jena Gmbh Lichtrastermikroskop und Verwendung
WO2008081729A1 (ja) 2006-12-22 2008-07-10 Nikon Corporation レーザ走査共焦点顕微鏡
JP5489392B2 (ja) * 2007-05-09 2014-05-14 オリンパス株式会社 光学系評価装置、光学系評価方法および光学系評価プログラム
US7525649B1 (en) 2007-10-19 2009-04-28 Kla-Tencor Technologies Corporation Surface inspection system using laser line illumination with two dimensional imaging
JP2010019630A (ja) * 2008-07-09 2010-01-28 Tokyo Institute Of Technology 顕微分光装置
TWI490444B (zh) * 2009-01-23 2015-07-01 Univ Nat Taipei Technology 線型多波長共焦顯微方法與系統
US8773760B2 (en) * 2009-04-27 2014-07-08 The Arizona Board Of Regents On Behalf Of The University Of Arizona Multi-point scan architecture
CN105549341A (zh) * 2012-02-21 2016-05-04 Asml荷兰有限公司 检查设备和方法

Also Published As

Publication number Publication date
US20150369750A1 (en) 2015-12-24
JP2022183309A (ja) 2022-12-08
CN106233125B (zh) 2020-08-11
JP2021067697A (ja) 2021-04-30
KR20160146913A (ko) 2016-12-21
CN106233125A (zh) 2016-12-14
JP2017519971A (ja) 2017-07-20
JP7599463B2 (ja) 2024-12-13
WO2015164540A1 (en) 2015-10-29
US9927371B2 (en) 2018-03-27

Similar Documents

Publication Publication Date Title
GB2529003B (en) Optical device
GB2536248B (en) Optical apparatus
SG11201610604RA (en) Optical coupler
SG11201704276TA (en) Substrate-guided optical device
PT3115816T (pt) Cabo ótico
EP3168668A4 (en) Objective optical system
ZA201606559B (en) Optical fibre sensor system
GB2541814B (en) Optical fiber
GB2528934B (en) Preform Optical Inspection
EP3226054A4 (en) Objective optical system
GB2522082B (en) Optical component
GB201420070D0 (en) Optical bridge
GB201704259D0 (en) Optical (DE)multiplexers
SG11201700389TA (en) Optical member
IL247812A0 (en) Optical system for confocal line inspection
SG10201501238UA (en) Optical device
GB2533397B (en) Optical Systems
GB201510400D0 (en) Optical system
GB201413262D0 (en) Optical Apparatus
IL255810B (en) An optical system with two fields of view
IL243165A0 (en) Polarization-enhanced optical inspection
EP3327411C0 (en) OPTICAL SYSTEM
EP3140612A4 (en) Five axis optical inspection system
GB2550721B (en) Optical measurement system
GB201417711D0 (en) Optical identification system

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed