KR20160120037A - Residual gas exhaust hood Device for chamber - Google Patents
Residual gas exhaust hood Device for chamber Download PDFInfo
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- KR20160120037A KR20160120037A KR1020150049022A KR20150049022A KR20160120037A KR 20160120037 A KR20160120037 A KR 20160120037A KR 1020150049022 A KR1020150049022 A KR 1020150049022A KR 20150049022 A KR20150049022 A KR 20150049022A KR 20160120037 A KR20160120037 A KR 20160120037A
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- gas
- chamber
- exhaust
- exhaust pipe
- process chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- Condensed Matter Physics & Semiconductors (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
The present invention relates to a residual gas exhaust hood apparatus for a chamber, and more particularly to a residual gas exhaust hood apparatus for a chamber which removes toxic gas remaining in a process chamber for replacement of a product produced in the process chamber, A main body having a plurality of casters at a lower portion thereof; A horizontal moving part provided on the upper part of the main body so as to be movable along one side and the other side along a horizontal guide part; A lifting unit provided in the horizontal moving unit and being lifted and lowered along the vertical guide unit by operation of the operation lifting unit; A chamber upper cover which is provided so as to be able to be drawn out to one side through the drawing means and which sucks residual toxic gas in the process chamber while discharging outside air into the process chamber while partially covering the upper portion of the process chamber, Wealth; And an exhaust unit provided in the main body and connected to the exhaust side of the chamber upper cover part.
Description
BACKGROUND OF THE
In general, to manufacture semiconductors and flat panel displays (FPDs), process chambers that are shielded from the outside are used. Various mixed gases (toxic, pyrophoric, flammable, and corrosive gas) are quantitatively introduced into the process chamber as reaction gas. In the present technology, only a part of the gases are used, and more than 50% .
Therefore, various kinds of toxic gases are generated in the reaction chamber of the reaction chamber or the unreacted reaction gas in the process chamber for producing semiconductors and FPD, And then discharged to the atmosphere through a purifying process. A toxic gas purifying apparatus including an exhaust duct is essentially installed on the production line.
Accordingly, a known toxic gas purification apparatus includes an exhaust hood detachably provided on an upper portion of a process chamber and including an exhaust pipe, and an exhaust pipe connected to the exhaust pipe for forcibly discharging a toxic gas in the process chamber to a toxic gas purifier The exhaust gas purifying apparatus is mainly composed of three components such as a vacuum pump, a dust collector, and a gas treating apparatus. The vacuum pump discharges the toxic gas from the process chamber to the dust collector and the gas treating apparatus. In the dust collector, the toxic gas moving along the exhaust duct through the vacuum pump acts to filter the powder generated due to the temperature change during movement. The gas processing apparatus is divided into a wet type and a dry type, And is selectively used according to the gas to purify the toxic gas in the gaseous state.
Therefore, conventionally, a reaction gas is injected into a process chamber to produce a product, and a reaction gas, that is, a toxic gas is exhausted while injecting a clean gas to exhaust the reaction gas remaining in the process chamber, It is purified and released into the atmosphere.
When replacing the product of the process chamber in the process of producing the product through the conventional process chamber, first, the supply of the reaction gas is stopped in the reaction gas supply pipe of the process chamber. Then, a clean gas (nitrogen gas) is injected through the reaction gas supply pipe, and the vacuum pump and the toxic gas purifier are operated to purify the toxic gas remaining in the process chamber. Then, we replace the products produced in the process chamber.
When the product produced in the process chamber is replaced as described above, the residual toxic gas in the process chamber is evacuated and purified through the operation of the vacuum pump and the toxic gas purifier. However, in the process of exhausting the residual toxic gas in the process chamber, the clean gas is injected into the process chamber to exhaust the reactive gas, but toxic gas as a reactive gas remains even if the exhaust gas is sufficiently exhausted .
Therefore, when the produced product of the process chamber is replaced as described above, the residual gas remains in the process chamber, so that the residual gas mixed with the reactive gas, which is different from the reactive gas introduced in the production of the new product, In addition, there is a serious problem of causing a safety accident including a fire due to a chemical reaction.
Particularly, when a toxic gas having a completely different reacting gas is input, the process chamber is finely imported and a reaction gas having a different property is introduced. At this time, in order to prevent the residual gas remaining in the process chamber, And the exhaust gas is exhausted through the exhaust hood. However, the conventional exhaust hood does not completely seal the upper part of the opened process chamber, so that the residual gas in the chamber is exhausted to the outside (the indoor space in which the production line is installed) So that many unspecified workers are exposed to the residual gas.
Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art,
It is an object of the present invention to allow residual toxic gas in the process chamber to be exhausted while introducing outside air into the interior of the process chamber prior to replacing the product in the process chamber, So that the apparatus can be easily moved in a narrow passage.
It is a further object of the present invention to provide a method of cleaning a process chamber by treating the inside surface of the process chamber manually by opening each of the front cover plate and the rear cover plate constituting the chamber upper cover unit one by one after treating the toxic gas in the process chamber through exhaustion So that the chamber can be cleaned.
Another object of the present invention is to provide a residual gas exhaust hood apparatus for a chamber, which further comprises a peripheral sealing packing around the lower portion of the chamber upper cover portion, thereby allowing the toxic gas to be sucked and removed more safely.
It is a further object of the present invention to provide an apparatus and a method for manufacturing a semiconductor device, which further includes a pair of central sealing packing at the front and rear of the lower center of the chamber upper cover portion, Thereby enabling the sealing between the upper cover portion and the periphery of the process chamber.
It is another object of the present invention to provide a residual gas exhaust hood apparatus for a chamber which allows a horizontal moving unit to be drawn out from a main body without deflection through a horizontal guide unit and vertically elevated and lowered by a vertical guide unit, .
It is a further object of the present invention to provide a process for producing a process for producing a residual gas exhaust gas for a chamber which can more stably support the lower portion of the chamber upper cover portion, Thereby providing a hood device.
The present invention also provides a residual gas exhaust hood apparatus for a chamber, which allows the chamber upper cover to be drawn out to one side of the elevator without being bent downwardly through a pull-out means comprising a pair of guide rail portions.
Another object of the present invention is to provide a residual gas exhaust hood apparatus for a chamber which allows a chamber upper cover portion to be placed on an upper portion of a process chamber by a simple operation of an operator.
It is another object of the present invention to provide a gas purifying apparatus capable of further enhancing the exhausting performance of toxic gases by forcibly sucking and discharging gas at an exhaust part provided inside the main body, So that the cleaning efficiency of the toxic gas can be further improved.
Another object of the present invention is to provide a chamber residual gas evacuation hood apparatus which can prevent the insertion of a castor into a hole of a perforated bottom plate constituting the floor of a clean room by constituting the castor with a ball caster.
In order to achieve the above object, a "residual gas exhaust hood apparatus for a chamber" according to the present invention comprises: a body having a plurality of castors at a lower portion thereof; A horizontal moving part provided on the upper part of the main body so as to be movable along one side and the other side along a horizontal guide part; A lifting unit provided in the horizontal moving unit and being lifted and lowered along the vertical guide unit by operation of the operation lifting unit; A chamber upper cover which is provided so as to be able to be drawn out to one side through the drawing means and which sucks residual toxic gas in the process chamber while discharging outside air into the process chamber while partially covering the upper portion of the process chamber, Wealth; And an exhaust unit provided in the main body and connected to the exhaust side of the chamber upper cover part.
The chamber upper cover portion of the "residual gas exhaust hood apparatus for a chamber" according to the present invention is provided on the upper portion of the elevating portion so as to be movable laterally through a drawing means, a gas suction hole is formed in the lower portion, And a front cover plate and a rear cover plate which are connected to the front and rear sides of the exhaust pipe by hinges and are foldably connected to the upper portion of the exhaust pipe, respectively .
The chamber upper cover portion of the " residual gas exhaust hood apparatus for a chamber "according to the present invention is characterized in that the chamber upper cover portion includes a lower periphery of both sides of the lower cover plate and a rear periphery thereof, Sealing packing, and side sealing packings provided on both sides of the lower portion of the exhaust pipe.
Further, the exhaust pipe of the "residual gas exhaust hood apparatus for a chamber" according to the present invention further comprises a central sealing packing provided longitudinally in the front and rear of the lower portion of the exhaust pipe.
Further, the horizontal moving part of the "residual gas exhaust hood apparatus for a chamber" according to the present invention includes a horizontally moving part connected to the upper part of the main body by a horizontal guide part and horizontally moved and having vertical parts on the front and rear sides of both sides, The elevating and lowering unit includes a horizontal elevating unit connected to the horizontal moving unit by the operation elevating unit and vertically moved, and the horizontal elevating unit is provided at the front and rear of the upper part. The elevating and lowering unit is provided between the horizontal moving unit and the platform And an X-shaped link type lifting jack for lifting and lowering the platform through rotation of a screw shaft connected to the handle.
Further, the horizontal moving table of the " residual gas exhaust hood apparatus for a chamber "according to the present invention further includes a support protrusion protruding from one side to the lower side and having a plurality of castors at the lower end thereof and closely contacting the foot plate of the process chamber .
The withdrawing means of the "residual gas exhaust hood apparatus for a chamber" according to the present invention is characterized in that the withdrawing means of the residual gas exhaust hood apparatus according to the present invention is provided with a horizontal band on the front and rear of the upper portion of the ascending and descending portion and on the front and rear of the exhaust pipe, And two horizontal guide rail portions for enabling the drawing operation.
The exhaust unit of the "residual gas exhaust hood apparatus for a chamber" according to the present invention may further include a filter unit connected to the exhaust pipe and the exhaust tube in the main body to filter and discharge the toxic gas, A gas exhaust pipe connected to a known gas purifier and connected to a gas exhaust pipe, and an exhaust brick fan provided inside the body between the gas exhaust pipes for forcibly exhausting the toxic gas and having a filter net at the outside air inlet .
Further, the filter portion of the "residual gas exhaust hood apparatus for a chamber" according to the present invention is provided inside the main body, a filter is built in the center of the inside thereof, and gas inflow passages and gas exhaust passages are formed And a gas exhaust hole formed at a lower portion of the gas exhaust passage and connected to the exhaust pipe, wherein the gas exhaust hole is formed at an upper portion of the gas inflow passage and connected to the exhaust tube, .
Further, the above-mentioned "the residual gas exhaust hood apparatus for a chamber" according to the present invention is characterized in that it is constituted by a ball caster.
The present invention as described above has the effect of allowing the residual toxic gas in the process chamber to be exhausted more smoothly while introducing the outside air into the process chamber before replacing the product in the process chamber, The residual toxic gas is not scattered to the indoor space where the production line is installed, so that the indoor space is not contaminated. By discharging the residual toxic gas completely while discharging the outside air, it is possible to prevent the defective product caused by the mixture of the reaction gas and the residual gas, which are introduced in the production of the new product, in advance, It is also possible to prevent a fire caused by a chemical reaction between the reaction gas and the residual gas. In addition, since the width of the front and rear of the apparatus can be reduced, the apparatus can be easily moved in a narrow passage of the facility line, thereby providing convenience of the moving image.
The present invention also provides a method of cleaning the inside surface of a process chamber cleanly by manually opening each of the front cover plate and the rear cover plate constituting the chamber upper cover unit after exhausting the toxic gas in the process chamber Thus, there is an effect that the residual toxic gas attached to the inner surface of the process chamber is cleanly removed, and the organic volatile substance scattered in the gauze wiping the inner surface of the process chamber is not scattered to the outside.
The present invention also provides an exhaust hood apparatus with improved safety by further including a peripheral sealing packing around the lower portion of the chamber upper cover portion to more effectively absorb and remove toxic gas.
In addition, the present invention further includes a pair of central sealing packing at the front and rear of the lower center of the chamber upper cover portion, so that even if the area of the chamber upper cover portion is larger than the open area of the upper portion of the process chamber, And sealing between the periphery of the process chamber and the periphery of the process chamber.
It is another object of the present invention to provide an exhaust hood apparatus with improved safety by allowing the horizontal moving unit to be drawn out from the main body without deflection through the horizontal guide unit and vertically elevating the platform through the vertical guide unit There is also an effect.
It is a further object of the present invention to provide a supporting projection which is in close contact with a foot plate of a process chamber at a lower portion of one side of a horizontal moving table, thereby further supporting the lower portion of the chamber upper cover portion more stably.
The present invention also provides an exhaust hood apparatus with improved safety by allowing the upper chamber cover portion to be drawn out to one side of the elevator without being bent downwardly through a pull-out means comprising a pair of guide rail portions There is also.
The present invention also provides an advantage in that the chamber upper cover can be placed on the upper part of the process chamber by a simple operation of the operator, thereby providing convenience in use.
In addition, the present invention has an effect of further enhancing the exhaust performance of toxic gases by forcibly sucking and discharging the gas at the exhaust part provided inside the main body, and further, the toxic gas is firstly filtered inside the main body, The purification efficiency can be further improved.
It is another object of the present invention to provide an exhaust hood apparatus in which stability of a moving image is secured by preventing a castor from being inserted into a hole of a perforated bottom plate constituting a bottom of a clean room.
1 shows a residual gas exhaust hood apparatus for a chamber according to the present invention,
1A is a perspective view,
FIG. 1B is a perspective view showing a state in which the lifting and lowering portion is raised,
1C is a perspective view showing a state in which the horizontal moving table is drawn out to one side.
2 is a cross-sectional view showing the interior of a residual gas exhaust hood apparatus for a chamber according to the present invention.
3 is a perspective view of a residual gas exhaust hood apparatus for a chamber according to the present invention, viewed from below.
4 is a perspective view of a chamber upper cover part constituting the present invention as seen from below.
5 is a cross-sectional view showing the inside of a filter portion constituting the present invention.
Fig. 6 shows a state in which the chamber upper cover portion constituting the present invention is opened.
6A is a perspective view,
6B is a sectional view taken along the line AA in Fig. 6A.
FIG. 7 shows a state in which the chamber upper cover portion constituting the present invention is closed.
7A is a perspective view,
Fig. 7B is a sectional view taken along line BB of Fig. 7A.
8 shows a state in which the rear cover plate of the chamber upper cover part constituting the present invention is opened,
8A is a perspective view,
8B is a cross-sectional view taken along line CC of Fig. 8A.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood, however, that the invention can be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
FIG. 1 is a perspective view showing a residual gas exhaust hood apparatus for a chamber according to the present invention. FIG. 1 (a) is a perspective view, FIG. 1 (b) is a perspective view showing a state in which a lift unit is raised, Fig. 3 is a perspective view of the residual gas exhaust hood apparatus for a chamber according to the present invention, as viewed from below, and FIG. 4 is a cross-sectional view of the residual gas exhaust hood apparatus for a chamber according to the present invention And FIG. 5 is a cross-sectional view showing the inside of the filter unit constituting the present invention. As shown in FIG. FIG. 6 is a view showing a state in which the upper chamber cover part of the present invention is opened. FIG. 7 shows a state in which the upper chamber cover part of the present invention is closed. And the rear cover plate is opened.
The residual gas exhaust hood apparatus according to the present invention is separately installed in the
Therefore, the residual gas exhaust hood apparatus according to the present invention comprises a
The
The upper part of the inside of the
1 to 3, the horizontal moving
The horizontal moving
A plurality of casters C are provided at one side of the horizontal movement table 21 to protrude downward so as to more stably support the lower part of the chamber
Accordingly, the present invention further includes a
1 to 3, the elevating
The lifting and lowering
The
Various types of the lifting jacks 41 are known, and in the accompanying drawings, the height is variable between the horizontal moving table 21 and the
Therefore, when the
The upper
The chamber
A peripheral sealing packing 54 is further provided to allow the toxic gas to be sucked and removed more safely around the lower both sides and the rear periphery of the
Even when the area of the chamber
On the other hand, the pull-out means 56 is provided on the upper and lower horizontal bases 311 (see FIG. 3) on the upper part of the
The horizontal guide rail portion includes a fixed rail R1 provided in each of the
1 to 3, the
The
In order to further enhance the filtering effect of the toxic gas, the
Hereinafter, the operation of the residual gas exhaust hood apparatus according to the present invention will be described.
As shown in FIGS. 1 to 8, when treating residual toxic gas in the
The
The operator moves the horizontally moving
The operator moves the upper
Next, the
Accordingly, the present invention can prevent the toxic gas remaining inside the
As the
After the toxic gas in the
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. It is clear that the present invention can be suitably modified and applied in the same manner. Therefore, the above description does not limit the scope of the invention defined by the limitations of the following claims.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the scope of the present invention.
1: Body
2: Horizontal moving part
21: Horizontal moving table
211: Vertical stand
22: Horizontal guide portion
23: support protrusion
3:
31: platform
311: Horizontal band
32: vertical guide portion
4: Operation elevating means
41: lifting jack
411: X-shaped link, 412: Screw shaft, 413: Handle
5: chamber upper cover part
51: Exhaust pipe
511: gas suction hole, 512: open connection duct
52: front cover plate
53: rear cover plate
54: Perimeter sealing packing
55: Central seal packing
56:
H: Hinge section
6:
61: exhaust tube
62:
621: Filtering chamber, 622: Gas inflow hole, 623: Gas exhaust hole
63: gas exhaust pipe
64: Exhaust Brush Fan
10: Process chamber
C: Caster
Claims (7)
The chamber upper cover part 5 is provided on the upper part of the elevating part 3 so as to be movable laterally through the drawing means 56. A gas suction hole 511 is formed in the lower part of the chamber upper cover part 5, The exhaust pipe 51 is connected to the front and rear of the exhaust pipe 51 by a hinge portion H so that the exhaust pipe 51 can be folded to the upper portion of the exhaust pipe 51. [ And a front cover plate (52) and a rear cover plate (53) connected to the rear cover plate (53).
The chamber upper cover portion 5 includes a peripheral seal packing 54 provided on both sides of the lower and both sides of the lower cover plate 53 and around the front and lower sides of the front cover plate 52, And a side sealing packing 54a provided on both sides of the lower portion of the exhaust pipe 51. The exhaust pipe 51 is formed in a central sealing packing (55). ≪ Desc / Clms Page number 19 >
The horizontal movement unit 2 includes a horizontal movement table 21 connected to the upper part of the main body 1 by a horizontal guide unit 22 and moved horizontally and having vertical bases 211 on the front and rear sides of both sides, The horizontal movement table 21 is provided with a plurality of casters C protruding from one side to the lower side and a lower end of which is the same as the casters C provided at the lower portion of the main body 1, And a supporting protrusion 23 attached to the foot plate of the process chamber 10 is provided and the elevating portion 3 is connected to the inside of the horizontally moving portion 2 by the operation elevating means 4 And the elevation bar 31 is vertically moved and provided with a horizontal bar 311 at the front and the rear of the upper barrel 311. The operation elevator means 4 is disposed between the horizontal movement bar 21 and the platform 31 Shaped linkage 31 for elevating and lowering the platform 31 through rotation of a screw shaft 412 connected to the handle 413, And a lifting jack (41) for lifting the residual gas.
The drawing means 56 is provided on the front and rear of the horizontal base 311 and the exhaust pipe 51 on the upper portion and the rear portion of the upper portion of the elevating portion 3 to draw the chamber upper cover portion 5 to one side (22) for enabling the gas to be introduced into the chamber.
The exhaust unit 6 includes a filter unit 62 connected to the main body 1 through the exhaust pipe 51 and the exhaust tube 61 to filter and discharge the toxic gas, And a gas exhaust pipe 63 connected to a known gas purifying device and a gas exhaust pipe connected to a discharge side of the gas exhaust pipe 63. The gas exhaust pipe 63 is provided inside the main body 1 between the gas exhaust pipe 63 to forcibly exhaust the toxic gas, Comprises an exhaust brick fan (64) equipped with a filter net.
The filter unit 62 is provided inside the main body 1 and has a filter built in the center thereof and has a gas inlet channel 621a and a gas exhaust channel 621b formed on the other side thereof, A gas inflow hole 622 formed at an upper portion of the gas inflow passage 621a to connect the exhaust tube 61 and a gas exhaust pipe 621 formed at a lower portion of the gas exhaust passage 621b, And a gas exhaust hole (623) to which the gas exhaust hole (623) is connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150049022A KR101689957B1 (en) | 2015-04-07 | 2015-04-07 | Residual gas exhaust hood Device for chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150049022A KR101689957B1 (en) | 2015-04-07 | 2015-04-07 | Residual gas exhaust hood Device for chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160120037A true KR20160120037A (en) | 2016-10-17 |
| KR101689957B1 KR101689957B1 (en) | 2016-12-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020150049022A KR101689957B1 (en) | 2015-04-07 | 2015-04-07 | Residual gas exhaust hood Device for chamber |
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| Country | Link |
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| KR (1) | KR101689957B1 (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020036118A (en) * | 2000-11-08 | 2002-05-16 | 장동복 | Apparatus for exhausting fume in Chamber |
| KR100461601B1 (en) | 2002-01-21 | 2004-12-14 | 주성엔지니어링(주) | Exhaust apparatus for use in process chamber of semiconductor device processing equipment |
| KR100567439B1 (en) * | 2003-10-16 | 2006-04-04 | 장동복 | Apparatus for exhausting a fume in chamber |
| KR100582235B1 (en) * | 2004-02-25 | 2006-05-23 | 장동복 | Apparatus for exhausting a fume in chamber |
| KR20120043511A (en) * | 2010-10-26 | 2012-05-04 | 김재용 | Portable air cleaning apparatus using filters |
-
2015
- 2015-04-07 KR KR1020150049022A patent/KR101689957B1/en active IP Right Grant
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020036118A (en) * | 2000-11-08 | 2002-05-16 | 장동복 | Apparatus for exhausting fume in Chamber |
| KR100461601B1 (en) | 2002-01-21 | 2004-12-14 | 주성엔지니어링(주) | Exhaust apparatus for use in process chamber of semiconductor device processing equipment |
| KR100567439B1 (en) * | 2003-10-16 | 2006-04-04 | 장동복 | Apparatus for exhausting a fume in chamber |
| KR100582235B1 (en) * | 2004-02-25 | 2006-05-23 | 장동복 | Apparatus for exhausting a fume in chamber |
| KR20120043511A (en) * | 2010-10-26 | 2012-05-04 | 김재용 | Portable air cleaning apparatus using filters |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101689957B1 (en) | 2016-12-26 |
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