KR20160114627A - 구조화된 표면을 갖는 연마 재료 - Google Patents

구조화된 표면을 갖는 연마 재료 Download PDF

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Publication number
KR20160114627A
KR20160114627A KR1020167022667A KR20167022667A KR20160114627A KR 20160114627 A KR20160114627 A KR 20160114627A KR 1020167022667 A KR1020167022667 A KR 1020167022667A KR 20167022667 A KR20167022667 A KR 20167022667A KR 20160114627 A KR20160114627 A KR 20160114627A
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KR
South Korea
Prior art keywords
less
abrasive
treatment
structured surface
layer
Prior art date
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Withdrawn
Application number
KR1020167022667A
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English (en)
Korean (ko)
Inventor
히데키 미나미
도시히코 와타세
요코 나카무라
쇼이치 마스다
지로 하토리
모세 엠 데이비드
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
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Publication of KR20160114627A publication Critical patent/KR20160114627A/ko
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
KR1020167022667A 2014-01-24 2015-01-21 구조화된 표면을 갖는 연마 재료 Withdrawn KR20160114627A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461931136P 2014-01-24 2014-01-24
US61/931,136 2014-01-24
PCT/US2015/012158 WO2015112540A1 (en) 2014-01-24 2015-01-21 Abrasive material having a structured surface

Publications (1)

Publication Number Publication Date
KR20160114627A true KR20160114627A (ko) 2016-10-05

Family

ID=53681879

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167022667A Withdrawn KR20160114627A (ko) 2014-01-24 2015-01-21 구조화된 표면을 갖는 연마 재료

Country Status (6)

Country Link
US (1) US20170008143A1 (enExample)
JP (1) JP2017503670A (enExample)
KR (1) KR20160114627A (enExample)
CN (1) CN106413986A (enExample)
TW (1) TW201538272A (enExample)
WO (1) WO2015112540A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101904732B1 (ko) * 2014-07-07 2018-10-05 반도 카가쿠 가부시키가이샤 연마필름
JP2019521020A (ja) * 2016-06-30 2019-07-25 スリーエム イノベイティブ プロパティズ カンパニー フルオロカーボン剥離コーティング
JP6925699B2 (ja) * 2016-10-04 2021-08-25 株式会社ディスコ 平面研削砥石
JP7300441B2 (ja) * 2017-07-11 2023-06-29 スリーエム イノベイティブ プロパティズ カンパニー 適合性コーティングを含む研磨物品及びそれらからのポリッシングシステム
US12043785B2 (en) 2017-07-11 2024-07-23 3M Innovative Properties Company Abrasive articles including conformable coatings and polishing system therefrom
CN110869166B (zh) * 2017-07-11 2023-01-20 3M创新有限公司 包括适形涂层的磨料制品和由其形成的抛光系统
CN111032285B (zh) * 2017-08-25 2022-07-19 3M创新有限公司 表面突起抛光垫
TWI649775B (zh) * 2018-01-02 2019-02-01 台灣積體電路製造股份有限公司 離子佈植機及離子佈植機腔室的製造方法
CN110065011A (zh) * 2018-01-23 2019-07-30 项刚 金刚石砂轮及其制备方法
US11331767B2 (en) 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
CN110530313B (zh) * 2019-07-26 2021-05-28 西安交通大学 一种跨量级多尺度线宽标准器及其制备方法
US20210040608A1 (en) * 2019-08-05 2021-02-11 GM Global Technology Operations LLC Method for bonding a polymeric material to a substrate
KR102287923B1 (ko) * 2019-10-30 2021-08-09 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법
TWI761921B (zh) 2019-10-30 2022-04-21 南韓商Ｓｋｃ索密思股份有限公司 研磨墊、製造該研磨墊之方法及使用該研磨墊以製造半導體裝置之方法
KR102298114B1 (ko) * 2019-11-05 2021-09-03 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법
US20210185793A1 (en) * 2019-12-13 2021-06-17 Applied Materials, Inc. Adhesive material removal from photomask in ultraviolet lithography application
US20220178017A1 (en) * 2020-12-03 2022-06-09 Applied Materials, Inc. Cfx layer to protect aluminum surface from over-oxidation
TWI779728B (zh) * 2021-07-20 2022-10-01 大陸商廈門佳品金剛石工業有限公司 鑽石修整碟及其製造方法
CN116652825B (zh) * 2023-07-24 2023-11-10 北京寰宇晶科科技有限公司 一种金刚石cmp抛光垫修整器及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001179640A (ja) 1999-12-21 2001-07-03 Three M Innovative Properties Co 研磨層が立体構造を有する研磨材料
JP2002542057A (ja) 1999-04-23 2002-12-10 スリーエム イノベイティブ プロパティズ カンパニー ガラスおよびガラスセラミックワークピースを研摩するのに好適な研摩物品
WO2005012592A2 (en) 2003-07-25 2005-02-10 Morgan Advanced Ceramics, Inc. Cvd diamond-coated composite substrate for making same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6015597A (en) * 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles
US6821189B1 (en) * 2000-10-13 2004-11-23 3M Innovative Properties Company Abrasive article comprising a structured diamond-like carbon coating and method of using same to mechanically treat a substrate
US8080073B2 (en) * 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
EP2240298A4 (en) * 2007-12-31 2014-04-30 3M Innovative Properties Co PLASMA TREATED ABRASIVE ARTICLE AND PROCESS FOR PRODUCING THE SAME

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002542057A (ja) 1999-04-23 2002-12-10 スリーエム イノベイティブ プロパティズ カンパニー ガラスおよびガラスセラミックワークピースを研摩するのに好適な研摩物品
JP2001179640A (ja) 1999-12-21 2001-07-03 Three M Innovative Properties Co 研磨層が立体構造を有する研磨材料
WO2005012592A2 (en) 2003-07-25 2005-02-10 Morgan Advanced Ceramics, Inc. Cvd diamond-coated composite substrate for making same

Also Published As

Publication number Publication date
JP2017503670A (ja) 2017-02-02
TW201538272A (zh) 2015-10-16
CN106413986A (zh) 2017-02-15
US20170008143A1 (en) 2017-01-12
WO2015112540A1 (en) 2015-07-30

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Date Code Title Description
PA0105 International application

Patent event date: 20160819

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid