KR20150137587A - Photocurable Resin Composition for Manufacturing Photocured Tansparant Chips for Artificial Marble - Google Patents
Photocurable Resin Composition for Manufacturing Photocured Tansparant Chips for Artificial Marble Download PDFInfo
- Publication number
- KR20150137587A KR20150137587A KR1020140065685A KR20140065685A KR20150137587A KR 20150137587 A KR20150137587 A KR 20150137587A KR 1020140065685 A KR1020140065685 A KR 1020140065685A KR 20140065685 A KR20140065685 A KR 20140065685A KR 20150137587 A KR20150137587 A KR 20150137587A
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- KR
- South Korea
- Prior art keywords
- acrylate
- bis
- meth
- mercaptoisobutyrate
- mercaptovalerate
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 239000002928 artificial marble Substances 0.000 title claims abstract description 34
- 239000011342 resin composition Substances 0.000 title claims abstract description 34
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 59
- 229920005989 resin Polymers 0.000 claims abstract description 15
- 239000011347 resin Substances 0.000 claims abstract description 15
- 238000000016 photochemical curing Methods 0.000 claims abstract description 14
- 239000003085 diluting agent Substances 0.000 claims abstract description 8
- 239000000178 monomer Substances 0.000 claims abstract description 8
- 229920006305 unsaturated polyester Polymers 0.000 claims abstract description 7
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 239000012986 chain transfer agent Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 20
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 19
- -1 2-ethylhexyl Chemical group 0.000 claims description 17
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 14
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 claims description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 11
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 11
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 8
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 7
- MHRDCHHESNJQIS-UHFFFAOYSA-N 2-methyl-3-sulfanylpropanoic acid Chemical compound SCC(C)C(O)=O MHRDCHHESNJQIS-UHFFFAOYSA-N 0.000 claims description 6
- RQPNXPWEGVCPCX-UHFFFAOYSA-N 3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O RQPNXPWEGVCPCX-UHFFFAOYSA-N 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 4
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 claims description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 claims description 4
- JTMBCYAUSCBSEY-UHFFFAOYSA-N 2-methyl-2-sulfanylpropanoic acid Chemical compound CC(C)(S)C(O)=O JTMBCYAUSCBSEY-UHFFFAOYSA-N 0.000 claims description 4
- PTPQZNNAUUSACC-UHFFFAOYSA-N 3-sulfanylpentanoic acid Chemical compound CCC(S)CC(O)=O PTPQZNNAUUSACC-UHFFFAOYSA-N 0.000 claims description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 claims description 4
- HOXINJBQVZWYGZ-UHFFFAOYSA-N fenbutatin oxide Chemical compound C=1C=CC=CC=1C(C)(C)C[Sn](O[Sn](CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C1=CC=CC=C1 HOXINJBQVZWYGZ-UHFFFAOYSA-N 0.000 claims description 4
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- SRZXCOWFGPICGA-UHFFFAOYSA-N 1,6-Hexanedithiol Chemical compound SCCCCCCS SRZXCOWFGPICGA-UHFFFAOYSA-N 0.000 claims description 2
- RQQLOWXQARLAAX-UHFFFAOYSA-N 1-(2-methyl-3-sulfanylpropanoyl)oxybutyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OC(CCC)OC(=O)C(C)CS RQQLOWXQARLAAX-UHFFFAOYSA-N 0.000 claims description 2
- VIBNCKNEGZJBHA-UHFFFAOYSA-N 1-(2-sulfanylpropanoyloxy)butyl 2-sulfanylpropanoate Chemical compound CC(S)C(=O)OC(CCC)OC(=O)C(C)S VIBNCKNEGZJBHA-UHFFFAOYSA-N 0.000 claims description 2
- UYWJYQBUSUMZDF-UHFFFAOYSA-N 1-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OC(CCC)OC(=O)CC(C)S UYWJYQBUSUMZDF-UHFFFAOYSA-N 0.000 claims description 2
- NNPCVQRRYRVUOC-UHFFFAOYSA-N 1-(3-sulfanylpentanoyloxy)butyl 3-sulfanylpentanoate Chemical compound CCC(S)CC(=O)OC(CCC)OC(=O)CC(S)CC NNPCVQRRYRVUOC-UHFFFAOYSA-N 0.000 claims description 2
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 claims description 2
- ZUWFDHPIBGDTSU-UHFFFAOYSA-N 2-(2-methyl-2-sulfanylpropanoyl)oxypropyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(S)(C)C(=O)OC(C)COC(=O)C(C)(C)S ZUWFDHPIBGDTSU-UHFFFAOYSA-N 0.000 claims description 2
- SDOLXVNBYQTXKO-UHFFFAOYSA-N 2-(2-sulfanylpropanoyloxy)ethyl 2-sulfanylpropanoate Chemical compound CC(S)C(=O)OCCOC(=O)C(C)S SDOLXVNBYQTXKO-UHFFFAOYSA-N 0.000 claims description 2
- LVOWEXPQXNYTLG-UHFFFAOYSA-N 2-[2-(2-methyl-2-sulfanylpropanoyl)oxyethoxy]ethyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(C)(S)C(=O)OCCOCCOC(=O)C(C)(C)S LVOWEXPQXNYTLG-UHFFFAOYSA-N 0.000 claims description 2
- YOVMPJJCQAOBGV-UHFFFAOYSA-N 2-[2-(3-phenyl-3-sulfanylpropanoyl)oxyethoxy]ethyl 3-phenyl-3-sulfanylpropanoate Chemical compound C=1C=CC=CC=1C(S)CC(=O)OCCOCCOC(=O)CC(S)C1=CC=CC=C1 YOVMPJJCQAOBGV-UHFFFAOYSA-N 0.000 claims description 2
- SOXVWNSYWOAERH-UHFFFAOYSA-N 2-[2-(3-sulfanylpentanoyloxy)ethoxy]ethyl 3-sulfanylpentanoate Chemical compound CCC(S)CC(=O)OCCOCCOC(=O)CC(S)CC SOXVWNSYWOAERH-UHFFFAOYSA-N 0.000 claims description 2
- PCJJPMPLYYESTQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol 3-sulfanylpentanoic acid Chemical compound CCC(S)CC(O)=O.CCC(S)CC(O)=O.CCC(S)CC(O)=O.CCC(CO)(CO)CO PCJJPMPLYYESTQ-UHFFFAOYSA-N 0.000 claims description 2
- WBEKRAXYEBAHQF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O.CC(S)CC(O)=O.CC(S)CC(O)=O.CCC(CO)(CO)CO WBEKRAXYEBAHQF-UHFFFAOYSA-N 0.000 claims description 2
- HAUVRGZOEXGUJS-UHFFFAOYSA-N 2-methyl-4-(oxiran-2-yl)but-2-enoic acid Chemical compound OC(=O)C(C)=CCC1CO1 HAUVRGZOEXGUJS-UHFFFAOYSA-N 0.000 claims description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-M 2-sulfanylpropanoate Chemical compound CC(S)C([O-])=O PMNLUUOXGOOLSP-UHFFFAOYSA-M 0.000 claims description 2
- XMIIGOLPHOKFCH-UHFFFAOYSA-M 3-phenylpropionate Chemical compound [O-]C(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-M 0.000 claims description 2
- BEMVNKOTBKCXER-UHFFFAOYSA-N C(C1=CC=CC=C1)C(C=O)(CC)N(C)C Chemical compound C(C1=CC=CC=C1)C(C=O)(CC)N(C)C BEMVNKOTBKCXER-UHFFFAOYSA-N 0.000 claims description 2
- XVZXOLOFWKSDSR-UHFFFAOYSA-N Cc1cc(C)c([C]=O)c(C)c1 Chemical group Cc1cc(C)c([C]=O)c(C)c1 XVZXOLOFWKSDSR-UHFFFAOYSA-N 0.000 claims description 2
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 claims description 2
- OWENYJIXMBIZBB-UHFFFAOYSA-N [3-(2-methyl-2-sulfanylpropanoyl)oxy-2,2-bis[(2-methyl-2-sulfanylpropanoyl)oxymethyl]propyl] 2-methyl-2-sulfanylpropanoate Chemical compound CC(C)(S)C(=O)OCC(COC(=O)C(C)(C)S)(COC(=O)C(C)(C)S)COC(=O)C(C)(C)S OWENYJIXMBIZBB-UHFFFAOYSA-N 0.000 claims description 2
- AXLPVPOXGHGHGN-UHFFFAOYSA-N [3-(3-sulfanylpentanoyloxy)-2,2-bis(3-sulfanylpentanoyloxymethyl)propyl] 3-sulfanylpentanoate Chemical compound CCC(S)CC(=O)OCC(COC(=O)CC(S)CC)(COC(=O)CC(S)CC)COC(=O)CC(S)CC AXLPVPOXGHGHGN-UHFFFAOYSA-N 0.000 claims description 2
- XMIIGOLPHOKFCH-UHFFFAOYSA-N beta-phenylpropanoic acid Natural products OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 claims description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 claims description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 claims description 2
- 150000003440 styrenes Chemical class 0.000 claims description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 2
- NEAFWRKPYYJETG-UHFFFAOYSA-N 4-sulfanylpentanoic acid Chemical compound CC(S)CCC(O)=O NEAFWRKPYYJETG-UHFFFAOYSA-N 0.000 claims 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 claims 2
- 239000007983 Tris buffer Substances 0.000 claims 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 claims 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims 1
- ILVWNAMWRGLVJO-UHFFFAOYSA-N 1-(2-methyl-2-sulfanylpropanoyl)oxybutyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(S)(C)C(=O)OC(CCC)OC(=O)C(C)(C)S ILVWNAMWRGLVJO-UHFFFAOYSA-N 0.000 claims 1
- PESCXBALTVVUFX-UHFFFAOYSA-N 1-(4-sulfanylpentanoyloxy)butyl 4-sulfanylpentanoate Chemical compound CC(S)CCC(=O)OC(CCC)OC(=O)CCC(C)S PESCXBALTVVUFX-UHFFFAOYSA-N 0.000 claims 1
- MZQZXSHFWDHNOW-UHFFFAOYSA-N 1-phenylpropane-1,2-diol Chemical compound CC(O)C(O)C1=CC=CC=C1 MZQZXSHFWDHNOW-UHFFFAOYSA-N 0.000 claims 1
- HIFFIDIWEOBZII-UHFFFAOYSA-N 1-prop-1-enyl-4-propylbenzene Chemical compound CCCC1=CC=C(C=CC)C=C1 HIFFIDIWEOBZII-UHFFFAOYSA-N 0.000 claims 1
- GAGZMZMLWYGJJJ-UHFFFAOYSA-N 2,2-bis(2-sulfanylpropanoyloxymethyl)butyl 2-sulfanylpropanoate Chemical compound CC(S)C(=O)OCC(CC)(COC(=O)C(C)S)COC(=O)C(C)S GAGZMZMLWYGJJJ-UHFFFAOYSA-N 0.000 claims 1
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 claims 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 claims 1
- NRFOCVDLQPKTOA-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl 2,2-bis(sulfanyl)propanoate Chemical compound CC(S)(S)C(=O)OCCOCCO NRFOCVDLQPKTOA-UHFFFAOYSA-N 0.000 claims 1
- OUNXABDTPQONBC-UHFFFAOYSA-N 2-(2-methyl-3-sulfanylpropanoyl)oxypropyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OC(C)COC(=O)C(C)CS OUNXABDTPQONBC-UHFFFAOYSA-N 0.000 claims 1
- YYOPQPVSBDLOBR-UHFFFAOYSA-N 2-(2-sulfanylpropanoyloxy)propyl 2-sulfanylpropanoate Chemical compound CC(S)C(=O)OCC(C)OC(=O)C(C)S YYOPQPVSBDLOBR-UHFFFAOYSA-N 0.000 claims 1
- UXVINRUFDWQENP-UHFFFAOYSA-N 2-(3-phenyl-3-sulfanylpropanoyl)oxyethyl 3-phenyl-3-sulfanylpropanoate Chemical compound C=1C=CC=CC=1C(S)CC(=O)OCCOC(=O)CC(S)C1=CC=CC=C1 UXVINRUFDWQENP-UHFFFAOYSA-N 0.000 claims 1
- TXJZAWRTHMZECY-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCOC(=O)CC(C)S TXJZAWRTHMZECY-UHFFFAOYSA-N 0.000 claims 1
- KQBUONNTLMDRIE-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)propyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(C)OC(=O)CC(C)S KQBUONNTLMDRIE-UHFFFAOYSA-N 0.000 claims 1
- LDVVGHWJTSBTSL-UHFFFAOYSA-N 2-(3-sulfanylpentanoyloxy)ethyl 3-sulfanylpentanoate Chemical compound CCC(S)CC(=O)OCCOC(=O)CC(S)CC LDVVGHWJTSBTSL-UHFFFAOYSA-N 0.000 claims 1
- ZVLHJMYLLYRAED-UHFFFAOYSA-N 2-(3-sulfanylpentanoyloxy)propyl 3-sulfanylpentanoate Chemical compound CCC(S)CC(=O)OCC(C)OC(=O)CC(S)CC ZVLHJMYLLYRAED-UHFFFAOYSA-N 0.000 claims 1
- XJVUIQYBEPGDTH-UHFFFAOYSA-N 2-(4-sulfanylpentanoyloxy)ethyl 4-sulfanylpentanoate Chemical compound CC(S)CCC(=O)OCCOC(=O)CCC(C)S XJVUIQYBEPGDTH-UHFFFAOYSA-N 0.000 claims 1
- XXWUKIJKJNOJHL-UHFFFAOYSA-N 2-(4-sulfanylpentanoyloxy)propyl 4-sulfanylpentanoate Chemical compound CC(S)CCC(=O)OCC(C)OC(=O)CCC(C)S XXWUKIJKJNOJHL-UHFFFAOYSA-N 0.000 claims 1
- DQVMFULYAVKKQJ-UHFFFAOYSA-N 2-[2-(2-methyl-3-sulfanylpropanoyl)oxyethoxy]ethyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OCCOCCOC(=O)C(C)CS DQVMFULYAVKKQJ-UHFFFAOYSA-N 0.000 claims 1
- ZQAOLCXEYGIIQE-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol 3-phenyl-3-sulfanylpropanoic acid Chemical compound CCC(CO)(CO)CO.OC(=O)CC(S)C1=CC=CC=C1.OC(=O)CC(S)C1=CC=CC=C1.OC(=O)CC(S)C1=CC=CC=C1 ZQAOLCXEYGIIQE-UHFFFAOYSA-N 0.000 claims 1
- BSMGLVDZZMBWQB-UHFFFAOYSA-N 2-methyl-1-phenylpropan-1-one Chemical compound CC(C)C(=O)C1=CC=CC=C1 BSMGLVDZZMBWQB-UHFFFAOYSA-N 0.000 claims 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 claims 1
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- FVGHZNADJVJTAK-UHFFFAOYSA-N CCC(C(=O)C1=CC=CC=C1)(C(=O)C2=C(C=C(C=C2)SC3=CC=C(C=C3)C)N4CCOCC4)N(C)C Chemical compound CCC(C(=O)C1=CC=CC=C1)(C(=O)C2=C(C=C(C=C2)SC3=CC=C(C=C3)C)N4CCOCC4)N(C)C FVGHZNADJVJTAK-UHFFFAOYSA-N 0.000 claims 1
- CJPVDFOIZMUDKE-UHFFFAOYSA-N Clc1cccc(Cl)c1C(=O)P(=O)c1ccccc1 Chemical compound Clc1cccc(Cl)c1C(=O)P(=O)c1ccccc1 CJPVDFOIZMUDKE-UHFFFAOYSA-N 0.000 claims 1
- YFPJFKYCVYXDJK-UHFFFAOYSA-N Diphenylphosphine oxide Chemical compound C=1C=CC=CC=1[P+](=O)C1=CC=CC=C1 YFPJFKYCVYXDJK-UHFFFAOYSA-N 0.000 claims 1
- 239000004386 Erythritol Substances 0.000 claims 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 claims 1
- BVUUYMIWMZGCJF-UHFFFAOYSA-N SC(C(=O)OCCOCCO)(CC)S Chemical compound SC(C(=O)OCCOCCO)(CC)S BVUUYMIWMZGCJF-UHFFFAOYSA-N 0.000 claims 1
- RZITUYVIQBQJGJ-UHFFFAOYSA-N [(2,6-dichlorobenzoyl)-(4-ethoxyphenyl)phosphoryl]-(2,6-dichlorophenyl)methanone Chemical compound C1=CC(OCC)=CC=C1P(=O)(C(=O)C=1C(=CC=CC=1Cl)Cl)C(=O)C1=C(Cl)C=CC=C1Cl RZITUYVIQBQJGJ-UHFFFAOYSA-N 0.000 claims 1
- DNRISHWSPBDRTH-UHFFFAOYSA-N [(2,6-dichlorobenzoyl)-phenylphosphoryl]-(2,6-dichlorophenyl)methanone Chemical compound ClC1=CC=CC(Cl)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(Cl)C=CC=C1Cl DNRISHWSPBDRTH-UHFFFAOYSA-N 0.000 claims 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 claims 1
- JTNDLZWTXWUZFC-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 3-sulfanylpentanoate Chemical compound SC(CC(=O)OCC(CO)(CO)CO)CC JTNDLZWTXWUZFC-UHFFFAOYSA-N 0.000 claims 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 claims 1
- 235000019414 erythritol Nutrition 0.000 claims 1
- 229940009714 erythritol Drugs 0.000 claims 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 claims 1
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- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/20—Compounding polymers with additives, e.g. colouring
- C08J3/22—Compounding polymers with additives, e.g. colouring using masterbatch techniques
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
Abstract
Description
본 발명은 인조대리석용 광경화형 투명칩의 제조 방법에 관한 것이다.
The present invention relates to a method of manufacturing a photo-curable transparent chip for artificial marble.
내외장재로 사용되는 대리석에는 천연대리석과 인조대리석이 있다. 천연대리석은 채석장에서 직접 채취한 돌을 가공한 것이고, 인조대리석은 천연광물질을 합성 수지와 혼합하여 굳혀서 제조한 것으로 천연대리석의 미감을 나타내도록 한 것이다. Marbles used as interior and exterior materials include natural marble and artificial marble. Natural marble is a stone taken directly from a quarry. Artificial marble is made by mixing natural minerals with synthetic resin and showing natural beauty of natural marble.
천연대리석은 수려한 외관으로 공간을 품위있게 장식할 수 있는 최상의 재료로 인정받고 있으나, 그 양이 한정되어 있고, 가공 및 운반에 많은 비용이 들기 때문에 그 사용이 제한적이다. 이와 같은 천연대리석의 단점을 보완하기 위하여, 요즈음에는 인조대리석이 많이 사용되고 있다. 인조대리석은 천연대리석에 비해 단가가 낮고 중량이 가벼우며, 독특한 색감들을 자유롭게 표현 가능하다는 장점이 있다.Natural marble is regarded as the finest material to decorate the space with its exquisite appearance, but its use is limited because it is limited in quantity, and it is expensive to process and transport. In order to overcome the disadvantages of such natural marble, artificial marble is widely used these days. Artificial marble has lower cost and weight than natural marble, and has the advantage of being able to express unique colors freely.
인조대리석은 천연대리석 칩이나 광물을 아크릴계 또는 불포화 폴리에스테르계 수지 등과 배합하고 이에 각종의 첨가제 또는 안료 등을 부가하여 천연대리석의 질감을 구현하는 인조 합성체를 통칭한다. 일반적으로 인조대리석은 구성하는 수지의 종류에 따라 크게 아크릴계 인조대리석 및 불포화 폴리에스테르계 인조대리석으로 나뉜다. Artificial marble generally refers to artificial composites that combine natural marble chips or minerals with acrylic or unsaturated polyester resins, and add various additives or pigments thereto to realize the texture of natural marble. In general, artificial marbles are classified into acrylic artificial marble and unsaturated polyester artificial marble depending on the type of the resin.
아크릴계 인조대리석은 외관이 미려하고 가공성이 우수하며, 천연대리석에 비하여 가볍고 우수한 강도를 나타내므로, 카운터, 테이블을 비롯한 각종 인테리어 재료로 널리 사용되고 있다. 그러나 일반적으로 알려진 단색 위주의 칩 조합으로는 천연대리석 또는 화강석에 비하여 다양한 패턴을 표현하기에 기술적인 한계가 있다.Acrylic artificial marble has excellent appearance, good workability, light weight and excellent strength compared with natural marble, and is widely used as various interior materials including counters and tables. However, there are technical limitations in expressing various patterns compared with natural marble or granite with the monochromatic chip combination generally known.
이때 인조대리석의 외관을 표현하기 위한 수단으로는 안료 또는 칩 등이 사용된다. 그런데, 현재까지 알려져 있는 대부분의 인조대리석에서는 주로 단색의 불투명한 칩의 조합으로 외관 효과를 구현하고 있으며, 이러한 처리만으로는 천연대리석 또는 화강석과 유사한 패턴을 구현하기에는 한계가 있다.At this time, a pigment or a chip is used as means for expressing the appearance of the artificial marble. However, most artificial marbles known to date have a combination of monochromatic and opaque chips to realize the appearance effect, and such processing is limited to implement a pattern similar to natural marble or granite.
따라서 이러한 한계를 극복하고 인조대리석에 천연대리석 또는 화강석과 유사한 패턴의 보다 세련된 느낌을 부여하기 위해서는 투명칩을 사용하는 것이 바람직하다. It is therefore desirable to use transparent chips to overcome these limitations and to impart a more refined impression of natural marble or granite-like patterns to artificial marble.
이러한 인조대리석용 투명칩은 아크릴 수지 또는 불포화폴리에스테르 수지를 고온에서 열경화시켜 제조하여 왔다.Such a transparent chip for artificial marble has been produced by thermally curing an acrylic resin or an unsaturated polyester resin at a high temperature.
이러한 열경화 방식은 투명칩 제조를 위한 성형체의 두께가 얇아지면 경화하는데 충분한 열을 받지 못해 충분히 경화되지 않고, 경화 두께를 두껍게 하면 발열반응으로 인해 경화물에 크랙이 발생하거나 높은 경화 온도로 인해 황변이 발생할 수 있어 열경화를 위해서는 성형체를 일정 두께로 조절할 필요가 있다.Such a thermosetting method does not sufficiently cure due to insufficient heat to cure if the thickness of the molded body for the transparent chip is reduced, and if the thickness of the cured layer is made thick, cracks may occur in the cured product due to exothermic reaction, It is necessary to adjust the molded body to a certain thickness in order to heat harden.
또한 투명칩 제조를 위한 열경화 방식은 경화시키기 위해 열원을 필요로 하므로 친환경적이지 못하고, 투명칩을 충분히 경화시키기 위해서는 많은 시간을 필요로 하므로 생산성도 나쁘다.
In addition, since the heat curing method for producing a transparent chip requires a heat source for curing, it is not environmentally friendly, and it takes a lot of time to cure the transparent chip sufficiently, resulting in poor productivity.
본 발명의 목적은 인조대리석용 광경화형 투명칩을 제조하기 위한 수지 조성물을 제공하는 데 있다.It is an object of the present invention to provide a resin composition for producing a photocurable transparent chip for artificial marble.
본 발명의 다른 목적은 상기 수지 조성물을 이용하여 인조대리석용 광경화형 투명칩을 제조하는 방법을 제공하는 데 있다.It is another object of the present invention to provide a method for producing a photo-curable transparent chip for artificial marble using the resin composition.
본 발명의 다른 목적이나 구체적인 목적은 이하에서 제시될 것이다.
Other and further objects of the present invention will be described below.
본 발명은 일 측면에 있어서 인조대리석용 광경화형 투명칩을 제조하기 위한 수지 조성물에 관한 것이다.In one aspect, the present invention relates to a resin composition for producing a photo-curable transparent chip for artificial marble.
본 발명자들은 아래의 실시예 및 실험예에서 확인되는 바와 같이, 베이스 수지로서 브롬화 에폭시 아크릴레이트 올리고머에, 단파장 개시제인 이루가큐어 184(Irgacure 184), 장파장 개시제인 다로커 TPO(Darocur TPO) 및/또는 장파장 개시제인 이루가큐어 819(Irgacure 819)를, 산화방지제인 이루가녹스 1076(Irganox 1076)와 함께 혼합한 수지 조성물을 트레이에 일정 두께가 되도록 붓고 고압수은램프로 광경화시켜 두께가 1mm, 20mm, 30mm, 40mm, 50mm, 60mm, 70mm 및 80mm인 경화체를 제조하였을 때, 장파장 개시제인 다로커 TPO 또는 이루가큐어 819를 단독으로 사용하거나 단파장 개시제인 이루가큐어 184와 함께 사용한 경우 두께가 70mm인 경화체에 있어서도 그 경화체의 하부까지 모두 경화가 되었으나 단파장 개시제인 이루가큐어 184만을 사용한 경우는 경화체의 두께가 40mm 이상에서는 하부가 경화되지 않았음을 확인하였다(즉 1mm 내지 30mm 경화체의 경우 그 하부까지 모두 경화가 되었으나 40mm 내지 80mm 경화체의 경우는 그 하부가 경화되지 않았음).As shown in the following examples and experiments, the inventors of the present invention have found that when a brominated epoxy acrylate oligomer as a base resin, Irgacure 184 as a short wavelength initiator, Darocur TPO as a long wavelength initiator, and / Or a long wavelength initiator Irgacure 819 and Irganox 1076 as an antioxidant was poured into a tray to a predetermined thickness and photocured with a high pressure mercury lamp to form a film having a thickness of 1 mm, When a cured product of 20 mm, 30 mm, 40 mm, 50 mm, 60 mm, 70 mm and 80 mm was produced using Duroker TPO or Irgacure 819 as a long wavelength initiator alone or Irgacure 184 as a short wavelength initiator, In the case of using only Irgacure 184, which is a short wavelength initiator, the thickness of the cured product is not less than 40 mm It was confirmed that no bottom is not cured (i.e., all but the hardened case of 1mm to 30mm cured to its lower 40mm to 80mm In the case of the cured product is lower that the curing was not).
또한 본 발명자들은 상기 광경화 방식에 사용한 동일한 베이스 수지인 브롬화 에폭시 아크릴레이트 올리고머를 사용하고 개시제로서 디(4-터셔리-부틸사이클로헥실)퍼옥시디카보네이트, 터셔리-부틸퍼옥시-2-에틸헥사노에이트, 벤조일퍼옥사이드, 및/또는 비스(4-터셔리부칠사이클로헥실)퍼록시디카르보네이트를 산화방지제인 이루가녹스 1076와 함께 사용하여 70℃에서 20분 내지 30분 정도 가온·경화시켜 얻은 경화체를 상기 광경화체와 비교하였을 때, 경화체의 두께가 10mm 또는 20mm 등의 두께에서는 경화가 되지 않았으며, 두께가 클 경우는 경화는 되었으나 황변이나 크랙 등의 현상이 발생하였다.Further, the inventors of the present invention have found that the use of a brominated epoxy acrylate oligomer, which is the same base resin used in the photocuring method, and the use of di (4-tertiary-butylcyclohexyl) peroxydicarbonate, tertiary-butylperoxy- Peroxide, and / or bis (4-tertiary-butylcyclohexyl) peroxydicarbonate with an antioxidant, Irganox 1076, at 70 ° C for 20 minutes to 30 minutes When the obtained cured product was compared with the above-mentioned photo-cured product, the cured product was not cured at a thickness of 10 mm or 20 mm. When the cured product was thick, the cured product was yellowed and cracked.
일반적으로 인조대리석용 투명칩은 아크릴 수지 또는 불포화폴리에스테르 수지를 경화시켜 일정한 두께의 경화체를 제조한 후에 이 경화체를 입경이 0.1 내지 20mm인 크기로 파쇄한 후 사용하거나 필요한 경우 파쇄물을 크기별로 분급하여 사용한다. Generally, a transparent chip for artificial marble is prepared by curing an acrylic resin or an unsaturated polyester resin to produce a cured product having a uniform thickness, then crushing the cured product to a size of 0.1 to 20 mm, or if necessary, use.
따라서 투명칩의 제조를 위해서는 일정 두께의 경화체의 제조가 선행되어야 한다. Therefore, in order to manufacture a transparent chip, it is necessary to prepare a cured product having a certain thickness.
본 발명은 이러한 경화체의 제조에 있어 기존 열경화 방식 대신에 광경화 방식을 사용함을 특징으로 하며, 그럼으로써 열경화 방식에 따른 문제점, 예컨대 경화 시간이 장시간인 점, 경화체의 두께가 작을 경우 내부 발열 반응이 약해 경화가 일어나지 않는 점, 경화체의 두께가 클 경우 황변이나 크랙 현상이 발생하는 점을 극복할 수 있다. 또한 광경화 방식을 사용하는 본 발명에 따르면, 열경화 방식에 따를 때 요구되는 성형체 제작 후의 냉각 시간이 필요하지 않다.The present invention is characterized in that a photocuring method is used instead of the conventional thermosetting method in the production of such a cured body, and thus a problem caused by the thermosetting method, such as a long curing time and a small thickness of the cured body, It is possible to overcome the fact that the reaction is weak so that no curing occurs and that a yellowing or cracking phenomenon occurs when the thickness of the cured product is large. Further, according to the present invention using the photo-curing method, the cooling time after the production of the molded article required when the thermosetting method is adopted is not required.
전술한 바를 고려할 때, 본 발명의 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물은 (i) 아크릴레이트 올리고머 및 불포화 폴리에스테르 중에서 선택된 베이스수지, (ii) 반응성 희석제인 모노머, 및 (iii) 광개시제를 포함함을 특징으로 한다.(I) a base resin selected from an acrylate oligomer and an unsaturated polyester, (ii) a monomer as a reactive diluent, and (iii) a photoinitiator as a photoinitiator. .
본 발명의 수지 조성물에 있어서, 상기 아크릴레이트 올리고머는 에폭시아크릴레이트, 할로겐화 에폭시 아크릴레이트, 우레탄아크릴레이트, 폴리에스테르아크릴레이트 올리고머를 사용할 수 있다.In the resin composition of the present invention, the acrylate oligomer may be an epoxy acrylate, a halogenated epoxy acrylate, a urethane acrylate, or a polyester acrylate oligomer.
이러한 아크릴레이트 올리고머 및 불포화 폴리에스테르를 본 발명에 사용하는 이유는 광반응에 의해 경화하는 반응기를 가질 뿐만 아니라, 특히 에폭시 및 불포화폴리에스테르 계열의 경우 접착성 및 내식성 등이 뛰어나기 때문이다.The reason for using such an acrylate oligomer and an unsaturated polyester in the present invention is not only to have a reactor which is cured by a photoreaction but also to be excellent in adhesiveness and corrosion resistance particularly in the case of epoxy and unsaturated polyester series.
이러한 광반응을 위한 아크릴기를 도입하여 감광성을 갖는 아크릴레이트 올리고머는 현대사회에서 요구되는 에너지절약 및 환경 친화적인 특성으로 인해 많은 사업분야에서 사용되며, 그 특징으로는 복잡한 모양의 구조물에 적용하기가 어려우며 가격이 비싼 단점이 있으나, 일반적인 열경화 반응과는 달리 저온에서 빠르게 경화되어 에너지가 절감되고, 경화특성이 우수하며, 희석제로 용매 대신 반응성 아크릴계 단량체를 사용하는 액상 형태이므로 대기오염에 의한 환경문제를 야기 시키지 않는 장점이 있다.The acrylate oligomer having photosensitivity by introducing an acrylic group for such a photoreaction is used in many business fields due to the energy saving and environment friendly characteristics required in the modern society, and it is difficult to apply the acrylate oligomer to a complicated shaped structure Although it has a disadvantage of high price, it is a liquid form which uses a reactive acrylic monomer instead of a solvent as a diluent, and thus can prevent environmental problems caused by air pollution There is an advantage not to cause it.
이러한 장점 때문에 UV경화형 코팅제나 접착제는 목재, 플라스틱, 바닥재, 금속 등 탑코팅이나 접착용도에 다량 사용되고 있으며, 최근에 환경문제가 대두되면서 전자부품 등의 정밀소재부문에 그 적용분야와 수요가 급속히 증가되고 있고, 일반적으로 많이 사용되고 있다.Because of these advantages, UV-curable coatings and adhesives are widely used for top coating and bonding applications such as wood, plastic, flooring, and metal. Recently, as environmental problems have arisen, their applications and demand have rapidly increased And is generally used in many cases.
본 발명에서 베이스 수지는 불포화 폴리에스테르, 에폭시 아크릴레이트, 할로겐화 에폭시아크릴레이트, 우레탄 아크릴레이트, 폴리에스테르 아크릴레이트 올리고머 중 선택된 1종 이상을 사용한다. 그 중 바람직하게는 할로겐화 에폭시 아크릴레이트가 비중이 높고 기재 접착력이 우수하며 굴절율이 높아 고급스러운 느낌을 낼 수 있어 인조대리석용 투명칩으로 많이 사용되어진다. 본 발명에서는 할로겐화 에폭시 아크릴레이트 올리고머 이외의 아크릴레이트 올리고머를 사용할 수 있다. 이 중에서 할로겐화 에폭시 아크릴레이트 올리고머는 할로겐화 에폭시 수지에 아크릴산 또는 메타아크릴산을 첨가하여 반응시켜 할로겐화 에폭시아크릴레이트 올리고머를 제조할 수 있다.In the present invention, at least one selected from the group consisting of unsaturated polyester, epoxy acrylate, halogenated epoxy acrylate, urethane acrylate and polyester acrylate oligomer is used. Of these, halogenated epoxy acrylates are preferred because they have a high specific gravity, excellent adhesive strength to substrates, and a high refractive index to give a feeling of luxury. In the present invention, acrylate oligomers other than halogenated epoxy acrylate oligomers can be used. Among these halogenated epoxy acrylate oligomers, halogenated epoxy acrylate oligomers can be prepared by reacting halogenated epoxy resin with acrylic acid or methacrylic acid.
본 발명의 하나의 예로서, 상기 할로겐화 에폭시 수지로 비스페놀에이 또는 페놀-포름알데히드 노볼락 타입을 사용할 수 있다.As one example of the present invention, bisphenol A or phenol-formaldehyde novolak type may be used as the halogenated epoxy resin.
상기 광중합성 아크릴레이트올리고머의 함유량은 60~90 중량%로 포함하는 것이 바람직한데, 90 중량%를 초과하면 불완전한 경화가 발생한다. 따라서, 상기 광중합성 아크릴레이트 올리고머는 경화시 수축성 및 광중합시 불균일하게 중합되는 경향이 있고, 경화 후 크랙을 유발시키는 문제가 있다. The content of the photopolymerizable acrylate oligomer is preferably 60 to 90% by weight, and if it exceeds 90% by weight, imperfect curing occurs. Therefore, the photopolymerizable acrylate oligomer tends to be polymerized non-uniformly during shrinkage and light polymerization, resulting in cracking after curing.
본 발명에서, 상기 반응성 희석제인 모노머로는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트, 옥틸(메타)아크릴레이트, 도데실(메타)아크릴레이트, 옥타데실(메타)아크릴레이트, 메틸사이클로헥실(메타)아크릴레이트, 이소보닐(메타)아크릴레이트, 페닐(메타)아크릴레이트, 벤질(메타)아크릴레이트, 클로로페닐(메타)아크릴레이트, 메톡시페닐(메타)아크릴레이트, 브로모페닐(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 1,2-프로필렌글리콜(메타)아크릴레이트, 1,3-부탄디올디(메타)아크릴레이트, 1,3-프로필렌글리콜(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,5-펜탄디올디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 디프로필렌글리콜디(메타)아크릴레이트, 디알릴테레프탈레이트, 디알릴프탈레이트, 디알릴카르보네이트, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 에톡시에톡시에틸아크릴레이트, 글리시딜메타크릴산의 에폭시아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 글리세린트리(메타)아크릴레이트, 메틸프로판디올디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 스티렌, 할로겐화 스티렌, 비닐톨루엔, 디비닐벤젠, 알파메틸스티렌, 비스페놀에이 디(메타)아크릴레이트, 에톡실레이트드 비스페놀에이디(메타)아크릴레이트 및 이들의 혼합물로 이루어진 군으로부터 1종 이상을 선택하여 사용할 수 있다. In the present invention, the monomer as the reactive diluent is preferably selected from the group consisting of methyl (meth) acrylate, ethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, dodecyl (Meth) acrylate, benzyl (meth) acrylate, chlorophenyl (meth) acrylate, methoxyphenyl (meth) acrylate, Propylene glycol (meth) acrylate, 1,3-butanediol di (meth) acrylate, 1, 2-propylene glycol di Butanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, Methacrylate, triethylene glycol (Meth) acrylate, dipentaerythritol tri (meth) acrylate, dipropylene glycol di (meth) acrylate, diallyl terephthalate, diallyl phthalate, diallyl carbonate, trimethylolpropane tri Pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (metha) acrylate, ethoxyethoxyethyl acrylate, epoxy acrylate of glycidyl methacrylic acid, 1,6-hexanediol di (meth) (Meth) acrylate, styrene, halogenated styrene, vinyl toluene, divinylbenzene, alpha methyl styrene, bisphenol A di (meth) acrylate, (Meth) acrylate, ethoxylated bisphenol A (meth) acrylate, and mixtures thereof, at least one selected from the group consisting of Can be used.
본 발명에서 사용되는 반응성 희석제인 모노머는 본 발명의 인조대리석용 광경화 투명칩으로 인조대리석을 제조할 때에 인조대리석의 경도, 강도, 내약품성, 내수성등을 향상시키기 위해서 중요한 것인 바, 5~30 중량% 사용하고, 바람직하게는 10-30 중량%를 사용하는 것이 바람직하다. 사용량이 5 중량부 미만에서는 크랙 발생 가능성이 있고, 30 중량%를 초과하면 고강도의 제품을 얻을 수 없다.The monomer as a reactive diluent used in the present invention is important for improving the hardness, strength, chemical resistance, water resistance, and the like of the artificial marble in producing the artificial marble with the light-curing transparent chip for artificial marble of the present invention, Preferably 30 to 30% by weight, and more preferably 10 to 30% by weight. When the amount is less than 5 parts by weight, cracks may occur. When the amount is more than 30 parts by weight, a product having high strength can not be obtained.
본 발명에서 사용되는 광개시제는 수지 조성물의 노광부에서 광경화를 개시하는 역할을 하며, 200-350㎚ 범위에서 광흡수를 나타내는 단파장 광개시제와 300-480㎚ 범위에서 광흡수를 나타내는 장파장 광개시제를 모두 사용할 수 있다. 단파장 광개시제를 사용할 경우 ?은 두께의 경화물의 제조에 유리하고, 장파장 광개시제를 사용할 경우 두꺼운 두께의 경화물의 제조에 유리하다. 다만 경화물의 두께가 너무 얇으면 생산성이 떨어지고 그 경화물을 파쇄하여 얻어지는 투명칩의 입경이 너무 작아 바람직하지 않으므로 장파장 광개시제의 사용이 바람직하다. 장파장 광개시제를 사용할 경우 장파장 광개시제 단독으로 사용할 수도 있지만 단파장 광개시제와 적정한 조성비(장파장 광개시제 : 단파장 광개시제 = 1 : 0.1 ~ 2.0의 중량비)로 혼합하여 사용할 수도 있다. The photoinitiator used in the present invention serves to initiate photo-curing in the exposed portion of the resin composition, and both a short-wavelength photoinitiator exhibiting light absorption in the range of 200-350 nm and a long-wavelength photoinitiator exhibiting light absorption in the range of 300-480 nm . When a short-wavelength photoinitiator is used, it is advantageous in producing a cured product of a thick thickness, and when a long-wavelength photoinitiator is used, it is advantageous in producing a cured product of a thick thickness. However, if the thickness of the cured product is too thin, the productivity is decreased, and the particle diameter of the transparent chip obtained by crushing the cured product is too small, which is not preferable, so that the use of a long wavelength photoinitiator is preferable. When a long wavelength photoinitiator is used, long wavelength photoinitiator may be used alone, but it may be mixed with a short wavelength photoinitiator and a proper composition ratio (long wavelength photoinitiator: short wavelength photoinitiator = 1: 0.1 ~ 2.0 weight ratio).
광개시제를 혼합하여 사용할 경우 서로 다른 흡수 파장 영역을 갖는 2개 이상의 광개시제 사용하는 것이 바람직하다. 그것은 광원으로부터 발생하는 광에너지를 효율적으로 이용함과 함께 경화 속도를 보다 증가시킬 수 있기 때문이다.When a photoinitiator is mixed and used, it is preferable to use two or more photoinitiators having different absorption wavelength regions. This is because it can efficiently utilize the light energy generated from the light source and increase the curing rate.
단파장 광개시제로는 당업계에 공지된 임의의 것을 사용할 수 있으며, 그러한 것으로서 예컨대 1-히드록시-시클로헥실-페닐 케톤, 2-하이드록시-2-메틸-1-페닐-1-프로판온, 2-하이드록시-1-[4-(2-하이드록시에톡시)페닐]-2-메틸-1-프로판온, 메틸벤조일포르메이트, α,α-디메톡시-α-페닐아세토페논, 2-벤조일-2-(디메틸아미노)-1-[4-(4-모포린일)페닐]-1-부타논, 2-메틸-1-[4-(메틸씨오)페닐]-2-(4-몰포린일)-1-프로판온 등을 들 수 있으며, 현재 시판되고 있는 제품으로는 바스프사의 Irgacure 184, Darocur 1173, Irgacure 2959, Darocur MBF, Irgacure 651, Irgacure 369, Irgacure 907 등을 들 수 있다.As short-wavelength photoinitiators, any of those known in the art may be used, and examples thereof include 1-hydroxy-cyclohexyl-phenylketone, 2-hydroxy-2-methyl- Methylbenzoylformate,?,? - dimethoxy -? - phenylacetophenone, 2-benzoyl- Methyl-1- [4- (methylcio) phenyl] -2- (4-morpholino) Propanone. Examples of products currently available on the market include Irgacure 184, Darocur 1173, Irgacure 2959, Darocur MBF, Irgacure 651, Irgacure 369 and Irgacure 907 from BASF.
장파장 광개시제도 공지된 임의의 것을 사용할 수 있으며, 그러한 것으로서 2-벤질-2-디메틸아미노-1-부타논, 디페닐(2,4,6-트리메틸벤조일)-포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥사이드, 벤질 디메틸케탈, 2,4,6-트리메틸벤조페논, 올리고(2-히드록시-2-메틸-1-(4-(메틸비닐)페닐 프로판), 2,2-디메톡시-1,2-디페닐에탄-1-온, 1-히드록시-시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐프로판-1-온, 2,4-디에틸티옥산토인, 3,3-디메틸-4-메톡시-벤조페논, 에틸 p-디메틸안미노벤조에이트, 이소아밀 p-디메틸아미노벤조에이트, 비스(2,6-디클로르벤조일)-페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-2,5-디메틸페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-4-에톡시페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-4-프로필페닐포스핀옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸포스핀옥사이드, 2,4,6-트리메틸벤조일-디페닐포스핀옥사이드 등을 들 수 있으며, 시판되고 있는 제품으로서는 스위스 바스프사의 Irgacure819, Irgacure369, Irgacure2020, Irgacure 2022, Irgacure 2100, Irgacure784, Lucirin TPO, Darocur 4265 등을 들 수 있다. The long wavelength photoinitiator may be any known one, and examples thereof include 2-benzyl-2-dimethylamino-1-butanone, diphenyl (2,4,6-trimethylbenzoyl) -phosphine oxide, bis (6-trimethylbenzoyl) -phenylphosphine oxide, benzyldimethyl ketal, 2,4,6-trimethylbenzophenone, oligo (2-hydroxy- Methoxy-1,2-diphenylethan-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy- (2, 6-dichlorobenzoyl) - diethyl thioxanthone, 3,3-dimethyl-4-methoxy-benzophenone, ethyl p-dimethyl aninobenzoate, isoamyl p- (2,6-dichlorobenzoyl) -4-ethoxyphenylphosphine oxide, bis (2,6-dichlorobenzoyl) -2,5-dimethylphenylphosphine oxide, bis 6-dichlorobenzoyl) -4-propylphenylphosphine oxide, bis (2,6- Trimethylpentylphosphine oxide, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide and the like. Commercially available products include Irgacure 819, Irgacure 369, Irgacure 2020 , Irgacure 2022, Irgacure 2100, Irgacure 784, Lucirin TPO, Darocur 4265, and the like.
광개시제는 본 발명의 수지 조성물에 0.01 내지 10 중량%로 함유되어 사용될 수 있다. 광개시제의 함량이 0.01 중량% 미만일 경우 충분한 경화가 일어나지 않을 수 있고 10 중량%를 초과할 때는 미반응 개시제로 인하여 내후성을 저하시킬 수 있다. The photoinitiator may be contained in the resin composition of the present invention in an amount of 0.01 to 10% by weight. When the content of the photoinitiator is less than 0.01% by weight, sufficient curing may not occur. When the content of the photoinitiator exceeds 10% by weight, the weather resistance may be lowered due to the unreacted initiator.
또한 본 발명의 수지 조성물은 사슬이동제(chain transfer agent)를 추가로 포함할 수 있다. 아래의 실시예 및 실험예가 보여주는 바와 같이 사슬이동제를 추가로 사용할 경우 경화체의 두께가 두꺼워지면서 경화시 발생하게 되는 발열을 효과적으로 제어할 수 있으며 이러한 발열반응으로 인한 기포나 크랙 현상 또한 효과적으로 제어할 수 있다. The resin composition of the present invention may further comprise a chain transfer agent. As shown in the following examples and experimental examples, when the chain transfer agent is additionally used, the thickness of the cured product becomes thick, the heat generated during curing can be effectively controlled, and the bubbles and cracks due to the exothermic reaction can be effectively controlled .
사슬이동제는 티올기(-SH기)를 포함하는 유기 화합물이라면 특별히 제한 없이 모두 사용될 수 있으며, 이러한 티올기 포함 화합물 이외에도 알파메틸 스타이렌 다이머 등이 또한 사용될 수 있다.The chain transfer agent may be any organic compound including a thiol group (-SH group) without any particular limitation. In addition to the thiol group-containing compound, alpha methyl styrene dimer and the like may also be used.
구체적으로 에틸 메르캅탄(Ethyl mercaptan), 부틸 메르캅탄(Butyl mercaptan), 헥실 메르캅탄(Hexyl mercaptan) 또는 도데실 메르캅탄(Dodecyl mercaptan)과 같은 알킬 메르캅탄류; 페닐 메르캅탄(Phenyl mercaptan) 또는 벤질 메르캅탄(Benzyl mercaptan)과 같은 티오페놀류; 티오글리콜산 (Thioglycolic acid), 3-메르캅토 프로피온산(3-Mercapto propionic acid) 또는 티오살리실산 (Thiosalicylic acid)과 같은 카르복실기 함유 메르캅탄류; 2-메르캅토 에탄올(2-Mercapto ethanol) 또는 3-메르캅토-1,2-프로판디올(3-Mercapto-1,2-propanediol)과 같은 수산기 함유 메르캅탄류; 또는 펜타에리트리톨 테트라키스 (3-메르캅토) 프로피오네이트 (Pentaerythritol tertrakis(3-mercapto)propionate)와 같이 상기의 기능기를 조합적으로 두 개 이상 갖는 메르캅탄류 등을 단독 또는 2종 이상 혼합하여 사용할 수 있다.Specifically, alkyl mercaptans such as ethyl mercaptan, butyl mercaptan, hexyl mercaptan or dodecyl mercaptan; Thiophenols such as phenyl mercaptan or benzyl mercaptan; Carboxyl group-containing mercaptans such as thioglycolic acid, 3-mercapto propionic acid or thiosalicylic acid; Hydroxyl group-containing mercaptans such as 2-mercapto ethanol or 3-mercapto-1,2-propanediol; Or mercaptans having two or more of the above functional groups in combination such as pentaerythritol tertracis (3-mercapto) propionate, or the like, or a mixture of two or more thereof Can be used.
한편 아래의 실시예 및 실험예에서 확인되는 바와 같이, 사슬이동제 중 분자 내에 1개의 티올기를 갖는 화합물 즉 단관능성 사슬이동제만을 사용할 경우 광경화 후 분자량이 낮아져 경화체의 경도가 낮아지는 단점이 있으나, 한 분자 내에 2개 이상의 관능기(티올기)를 갖는 다관능성 사슬이동제를 사용할 경우 입체적 가교결합도 유도함으로써 단관능성 사슬이동제를 사용할 때의 단점인 경도가 낮아지는 문제점도 해결할 수 있다. 따라서 바람직하게는 다관능성 사슬이동제를 사용하는 경우이다.On the other hand, as shown in the following Examples and Experimental Examples, when a compound having only one thiol group in the molecule, that is, a monofunctional chain transfer agent, is used in the chain transfer agent, there is a disadvantage in that the hardness of the cured product is lowered due to lower molecular weight after photo- When a multifunctional chain transfer agent having two or more functional groups (thiol groups) in the molecule is used, it is also possible to solve the problem that the hardness, which is a disadvantage in using a monofunctional chain transfer agent, is lowered by inducing steric cross-linking. Therefore, it is preferable to use a multifunctional chain transfer agent.
사용될 수 있는 다관능성 사슬이동제로서는 당업계에 공지된 임의의 것을 사용할 수 있으며, 그러한 것으로서 1,5-펜탄다이티올, 1,6-헥산다이티올, 에틸렌글리콜비스(3-메르캅토부티레이트), 프로필렌글리콜비스(3-메르캅토부티레이트), 디에틸렌글리콜비스(3-메르캅토부티레이트), 부탄디올비스(3-메르캅토부티레이트), 옥탄디올비스(3-메르캅토부티레이트), 트리메티롤프로판트리스(3-메르캅토부티레이트), 펜타에리스리톨테트라키스(3-메르캅토부티레이트), 디펜타에리스톨헥사키스(3-메르캅토부티레이트), 에틸렌글리콜비스(2-메르캅토프로피오네이트), 프로필렌글리콜비스(2-메르캅토프로피오네이트), 디에틸렌글리콜비스(2-메르캅토프로피오네이트), 부탄디올비스(2-메르캅토프로피오네이트), 옥탄디올비스(2-메르캅토프로피오네이트), 트리메티롤프로판트리스(2-메르캅토프로피오네이트), 펜타에리스리톨테트라키스(2-메르캅토프로피오네이트), 디펜타에리스리톨헥사키스(2-메르캅토프로피오네이트), 에틸렌글리콜비스(3-메르캅토이소부티레이트), 프로필렌글리콜비스(3-메르캅토이소부티레이트), 디에틸렌글리콜비스(3-메르캅토이소부티레이트), 부탄디올비스(3-메르캅토이소부티레이트), 옥탄디올비스(3-메르캅토이소부티레이트), 트리메티롤프로판트리스(3-메르캅토이소부티레이트), 펜타에리스리톨테트라키스(3-메르캅토이소부티레이트), 디펜타에리스톨헥사키스(3-메르캅토이소부티레이트), 에틸렌글리콜비스(2-메르캅토이소부티레이트), 프로필렌글리콜비스(2-메르캅토이소부티레이트), 디에틸렌글리콜비스(2-메르캅토이소부티레이트), 부탄디올비스(2-메르캅토이소부티레이트), 옥탄디올비스(2-메르캅토이소부티레이트), 트리메티롤프로판트리스(2-메르캅토이소부티레이트), 펜타에리스리톨테트라키스(2-메르캅토이소부티레이트), 디펜타에리스리톨헥사키스(2-메르캅토이소부티레이트), 에틸렌글리콜비스(4-메르캅토발레레이트), 프로필렌글리콜비스(4-메르캅토이소발레레이트), 디에틸렌글리콜비스(4-메르캅토발레레이트), 부탄디올비스(4-메르캅토발레레이트), 옥탄디올비스(4-메르캅토발레레이트), 트리메티롤프로판트리스(4-메르캅토발레레이트), 펜타에리스리톨테트라키스(4-메르캅토발레레이트), 디펜타에리스톨헥사키스(4-메르캅토발레레이트), 에틸렌글리콜비스(3-메르캅토발레레이트), 프로필렌글리콜비스(3-메르캅토발레레이트), 디에틸렌글리콜비스(3-메르캅토발레레이트), 부탄디올비스(3-메르캅토발레레이트), 옥탄디올비스(3-메르캅토발레레이트), 트리메티롤프로판트리스(3-메르캅토발레레이트), 펜타에리스리톨테트라키스(3-메르캅토발레레이트), 디펜타에리스리톨헥사키스(3-메르캅토발레레이트), 수소화 비스페놀A 비스(3-메르캅토부티레이트), 비스페놀A 디히드록시에틸에테르-3-메르캅토부티레이트, 4,4'-(9-플루오레닐리덴)비스(2-페녹시에틸(3-메르캅토부티레이트)), 에틸렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 프로필렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 디에틸렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 부탄디올비스(3-메르캅토-3-페닐프로피오네이트), 옥탄디올비스(3-메르캅토-3-페닐프로피오네이트), 트리메티롤프로판트리스(3-메르캅토-3-페닐프로피오네이트), 트리스-2-(3-메르캅토-3-페닐프로피오네이트)에틸이소시아누레이트, 펜타에리스리톨테트라키스(3-메르캅토-3-페닐프로피오네이트), 디펜타에리스톨헥사키스(3-메르캅토-3-페닐프로피오네이트) 등을 들 수 있다.As the multifunctional chain transfer agent that can be used, any one known in the art can be used, and examples thereof include 1,5-pentanediol, 1,6-hexanedithiol, ethylene glycol bis (3-mercaptobutyrate) (3-mercaptobutyrate), diethylene glycol bis (3-mercaptobutyrate), butanediol bis (3-mercaptobutyrate), octanediol bis (3-mercaptobutyrate), trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakis (3-mercaptobutyrate), dipentaerythol hexacis (3-mercaptobutyrate), ethylene glycol bis (2-mercaptopropionate), propylene glycol bis Mercaptopropionate), diethylene glycol bis (2-mercaptopropionate), butanediol bis (2-mercaptopropionate), octanediol bis (2-mercaptopropionate) (2-mercaptopropionate), pentaerythritol tetrakis (2-mercaptopropionate), dipentaerythritol hexakis (2-mercaptopropionate), ethylene glycol bis (3-mercapto (3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), octanediol bis (3-mercaptopropionate) (3-mercaptoisobutyrate), pentaerythritol tetrakis (3-mercaptoisobutyrate), dipentaerythol hexacis (3-mercaptoisobutyrate) , Ethylene glycol bis (2-mercaptoisobutyrate), propylene glycol bis (2-mercaptoisobutyrate), diethylene glycol bis (2-mercaptoisobutyrate), butanediol bis Butyrate), octanediol (2-mercaptoisobutyrate), trimethylolpropane tris (2-mercaptoisobutyrate), pentaerythritol tetrakis (2-mercaptoisobutyrate), dipentaerythritol hexakis Propyleneglycol bis (4-mercaptoisovalerate), diethylene glycol bis (4-mercaptovalerate), butanediol bis (4-mercaptobalate), ethylene glycol bis (4-mercaptovalerato), pentaerythritol tetrakis (4-mercaptovalerate), dipentaerythol hexacis (4-mercaptovalerate) Propylene glycol bis (3-mercaptovalerate), diethylene glycol bis (3-mercaptovalerate), butanediol bis (3-mercaptovalerate), ethylene glycol bis -Mercaptovalerate), octanediol bis (3- Mercaptovalerate), trimethylolpropane tris (3-mercaptovalerate), pentaerythritol tetrakis (3-mercaptovalerate), dipentaerythritol hexakis (3-mercaptovalerate), hydrogenated bisphenol A (3-mercaptobutyrate), bisphenol A dihydroxyethyl ether-3-mercaptobutyrate, 4,4 '- (9-fluorenylidene) bis (2-phenoxyethyl 3-phenylpropionate), propylene glycol bis (3-mercapto-3-phenylpropionate), diethylene glycol bis (3-mercapto-3-phenylpropionate) 3-phenylpropionate), butanediol bis (3-mercapto-3-phenylpropionate), octanediol bis (3-mercapto- Phenyl propionate), tris-2- (3-mercapto-3-phenylpropionate) ethyl isocyanurate, pentaerythritol Pentaerythritol tetra there may be mentioned tetrakis (3-mercapto-3-phenyl propionate), pentaerythrityl di stall hexahydro tetrakis (3-mercapto-3-phenyl propionate) and the like.
사슬이동제는 당업계에 공지된 단관능성 사슬이동제 및 다관능성 사슬이동제 1종 이상을 선택하여 단독으로 사용하거나 2종 이상을 선택·혼합하여 사용할 수 있다. 사슬이동제는 본 발명의 수지 조성물에 0.01 중량% 내지 10.0 중량%의 범위, 바람직하게는 0.01 중량% 내지 5.0 중량%로 포함될 수 있는데, 0.01 중량% 이하인 경우는 그 의도한 효과를 나타내기가 어려우며 10 중량% 이상인 경우는 반응 속도 및 반응 안정성에 바람직하지 못한 영향을 끼칠 수 있다.As the chain transfer agent, at least one monofunctional chain transfer agent and at least one multifunctional chain transfer agent known in the art can be used alone or in combination of two or more kinds. The chain transfer agent may be contained in the resin composition of the present invention in an amount of 0.01 to 10.0% by weight, preferably 0.01 to 5.0% by weight. When it is 0.01% by weight or less, it is difficult to exhibit the intended effect, % Can have an undesirable effect on the reaction rate and the reaction stability.
또한 본 발명의 수지 조성물에는 산화방지제, 무기충전제, 커플링제, 안료, 가교제, 자외선안정제, 소포제, 광확산제, 중합방지제, 경화성 조절제, 대전방지제, 난연제, 열안정제 등의 첨가제를 더 포함할 수도 있다.The resin composition of the present invention may further contain additives such as an antioxidant, an inorganic filler, a coupling agent, a pigment, a crosslinking agent, a UV stabilizer, a defoamer, a light diffusing agent, a polymerization inhibitor, a curing modifier, an antistatic agent, a flame retardant, have.
이러한 첨가제는 당업계에 공지되어 있으며, 해당 첨가제를 적절히 선택하여 그 사용 목적에 맞는 적량으로 첨가될 수 있다. 여기서 적량으로 첨가한다는 것은 해당 첨가제의 첨가 목적을 충분히 달성할 정도의 충분한 양으로 첨가되면서 경화물의 다른 물성을 저하하지 않는 양으로 첨가하는 것을 말한다.These additives are well known in the art and may be added in an appropriate amount to suit the intended use of the additive. Herein, the addition in an appropriate amount means that the additive is added in an amount sufficient to achieve the purpose of adding the additive in an amount not lowering the other physical properties of the cured product.
예컨대 산화방지제로서는 인계 산화방지제와 페놀계 산화방지제가 공지되어 있으며, 이러한 산화방지제는 본 발명의 수지 조성물에 본 발명의 수지 조성물 100 중량부 기준 0.01 내지 10 중량부의 범위로 첨가될 수 있다.For example, antioxidants and phenolic antioxidants are known as antioxidants. These antioxidants may be added to the resin composition of the present invention in the range of 0.01 to 10 parts by weight based on 100 parts by weight of the resin composition of the present invention.
또한 예컨대 무기충전제는 투명칩의 비중을 높일 목적으로 첨가되는 것으로 수산화알루미늄, 수산화칼슘 등이 공지되어 있으며, 이러한 무기 충전제는 본 발명의 수지 조성물 100 중량부 기준 10 내지 80 중량부의 범위로 첨가될 수 있다.Further, for example, inorganic fillers are added for the purpose of increasing the specific gravity of the transparent chips, and aluminum hydroxide, calcium hydroxide and the like are known, and such inorganic fillers can be added in the range of 10 to 80 parts by weight based on 100 parts by weight of the resin composition of the present invention .
또한 예컨대 커플링제는 수지와 무기충전제의 결합력을 높이기 위하여 첨가되는 것으로 실리케이트 무수물 등이 공지되어 있으며, 본 발명의 수지 조성물 100 중량부 기준 0.01 내지 5 중량부의 범위로 첨가될 수 있으며, 안료는 의도한 색상에 따라 당업계에 공지된 적절한 안료를 선택하여(적갈색을 표현하고자 할 때는 산화철 안료, 황색을 표현하고자 할 때는 수산화철 안료 등), 본 발명의 수지 조성물 100 중량부 기준 0.01 내지 5 중량부 범위로 첨가될 수 있다. 가교제의 경우는 테트라에틸렌글리콜, 에틸렌글리콜 디메타크릴레이트 등이 사용될 수 있고 본 발명의 본 발명의 수지 조성물 100 중량부 기준 0.01 내지 5 중량부 범위로 첨가될 수 있다. 소포제, 자외선 안정제 등 적절한 첨가제의 선택과 그 첨가량의 결정은 당업계에 공지된 기술에 기초하는 한 당업자의 통상의 능력 범위에 속한다. Further, for example, a coupling agent is added to increase the bonding strength between the resin and the inorganic filler, and silicate anhydride is known, and may be added in the range of 0.01 to 5 parts by weight based on 100 parts by weight of the resin composition of the present invention. A suitable pigment known in the art may be selected according to the color (iron oxide pigment for reddish brown color and iron hydroxide pigment for yellow color) in the range of 0.01 to 5 parts by weight based on 100 parts by weight of the resin composition of the present invention Can be added. In the case of the crosslinking agent, tetraethylene glycol, ethylene glycol dimethacrylate and the like may be used, and may be added in the range of 0.01 to 5 parts by weight based on 100 parts by weight of the resin composition of the present invention. The selection of suitable additives, such as anti-foaming agents, ultraviolet stabilizers, and the like, are within the ordinary skill in the art as long as they are based on techniques known in the art.
본 발명의 인용대리석용 광경화형 투명칩의 제조 방법은 (a) 전술한 바의 수지 조성물을 제조하는 단계, (b) 그 수지조성물에 광을 조사하여 광경화시켜 경화체를 얻는 단계, 및 (c) 그 경화체를 파쇄하는 단계를 포함하여 구성된다. The method for producing a photocurable transparent chip for marble according to the present invention comprises the steps of: (a) preparing a resin composition as described above; (b) irradiating the resin composition with light to obtain a cured product by photo- ), And crushing the cured product.
본 발명의 방법에 있어서, 상기 (a) 수지 조성물 제조 단계 후에는 그 수지 조성물의 기포를 제거하는 단계가 추가로 포함될 수 있다. 기포의 제거는 대기압보다 낮은 압력 조건 하에 방치시켜 이루어지거나 적정 온도(50~90℃)로 가열하여 이루어질 수 있다. 본 발명의 수지 조성물은 열경화 개시제를 포함하지 않고 있기 때문에 열경화형 수지 조성물과 다르게 가열하여 기포를 제거하더라도 무방하다. In the method of the present invention, after the step (a) of preparing the resin composition, a step of removing the bubbles of the resin composition may be further included. Removal of air bubbles may be accomplished by leaving under a pressure condition lower than atmospheric pressure or by heating to an appropriate temperature (50 to 90 ° C). Since the resin composition of the present invention does not contain a thermosetting initiator, the bubbles may be removed by heating differently from the thermosetting resin composition.
상기 (b) 단계의 광경화 시 사용될 수 있는 광원은 특별한 제한이 없으며, 고압수은램프, 메탈할라이드램프, LED 램프 등을 사용할 수 있다. 이러한 광경화 시에 있어서 광경화 시간은 광량이나 경화체의 두께 등에 따라 당업자의 통상의 능력 범위 내에서 따라 결정될 수 있는데, 아래의 실시예에서는 1200 mJ/cm2의 광량으로 2분 내지 3분 정도 광 조사하여 경화체를 얻었다.There is no particular limitation on the light source that can be used in the light curing in the step (b), and a high-pressure mercury lamp, a metal halide lamp, an LED lamp, or the like can be used. At the time of this photo-photo-curing time it can be determined in accordance within the ordinary skills of one of ordinary skill in the art depending on the thickness of the light quantity or the cured body, the degree embodiment, 2 minutes to 3 minutes, and the amount of light of 1200 mJ / cm 2 below the light To obtain a cured product.
또 상기 (c) 경화체의 두께는 1 내지 70mm 범위일 수 있다. 70mm를 초과할 경우 경화체 하부의 경화가 일어나지 않을 수 있고 경화의 불균일성으로 인하여 크랙이 발생할 수 있다. 이는 아래의 실시예에서 확인되는 바로, 경화체의 두께를 80mm로 할 때 장파장 개시제를 사용하더라도 하부 미경화 부분이 발생하였기 때문이다.The thickness of the cured product (c) may range from 1 to 70 mm. If it is more than 70 mm, hardening of the lower portion of the hardened body may not occur and cracks may occur due to non-uniformity of hardening. This is because, as shown in the following examples, when the thickness of the cured product is 80 mm, the lower uncured portions are generated even when the long wavelength initiator is used.
바람직하게는 경화체의 두께가 20mm 이상인 경우이다. 경화체의 두께가 너무 얇으면 생산성이 낮고 또한 투명칩의 입경이 너무 작아 인조대리석 제조시에 적합하지 않기 때문이다.Preferably, the thickness of the cured body is 20 mm or more. If the thickness of the cured product is too thin, the productivity is low and the particle size of the transparent chips is too small, which is not suitable for the production of artificial marble.
또 상기 (c)의 파쇄 단계는 파쇄물(즉 투명칩)의 입경이 0.1 ~ 20mm 범위를 갖도록 이루어지는 것이 바람직하며, 필요 시 파쇄물을 분급하여 사용할 수도 있다.
It is preferable that the crushing step (c) is performed so that the particle size of the crushed material (i.e., the transparent chip) is in the range of 0.1 to 20 mm, and the crushed material may be classified if necessary.
전술한 바와 같이, 본 발명에 따르면 인조대리석용 광경화형 투명칩 수지 조성물 및 그 광경화형 투명칩의 제조 방법을 제공할 수 있다.As described above, according to the present invention, a photo-curable transparent chip resin composition for artificial marbles and a method for producing the photo-curable transparent chip can be provided.
본 발명은 인조대리석용 투명칩 제조에 사용되는 경화체의 제조에 있어 기존 열경화 방식 대신에 광경화 방식을 사용함으로써 열경화 방식에 따른 문제점, 예컨대 경화 시간이 장시간인 점, 경화체의 두께가 작을 경우 내부 발열 반응이 약해 경화가 일어나지 않는 점, 경화체의 두께가 클 경우 황변이나 크랙 현상이 발생하는 점을 극복할 수 있다. 또한 본 발명에 따르면 작업 시간이 짧아 생산성을 높일 수 있는 효과도 있다.
The present invention relates to a method for producing transparent chips for artificial marble, which uses a photo-curing system instead of the conventional thermal curing system to produce a transparent cured product for artificial marble. In the case where the curing time is long, It is possible to overcome the point that the internal exothermic reaction is weak and no curing occurs, and the yellowing or cracking phenomenon occurs when the thickness of the cured product is large. Further, according to the present invention, the productivity is improved because the working time is short.
이하 본 발명을 실시예를 참조하여 설명한다. 그러나 본 발명의 범위가 이러한 실시예에 한정되는 것은 아니다.
Hereinafter, the present invention will be described with reference to examples. However, the scope of the present invention is not limited to these embodiments.
<< 실시예Example > > 광경화Photocuring 투명칩의Transparent chip 제조 Produce
<실시예 1> 브롬화 에폭시 아크릴레이트 올리고머의 제조 ≪ Example 1 > Synthesis of brominated epoxy acrylate Preparation of oligomers
브롬화 비스페놀에이형 에폭시 수지(국도화학 제품, YDB-400) 67.8 중량%를 교반기, 온도계, 드로핑장치 및 충전냉각기가 장착된 4구 플라스크에 투입한 후, 가열·용융시키고, 반응온도를 95-100℃로 올렸다. 산화방지제 Irganox 1010을 0.01 중량%로 투입하고, 중합방지제로서 하이드로퀴논 모노메틸에테르 0.01 중량% 투입하고, 1분 이내에 아크릴산 12.81 중량% 및 트리에틸아민 0.3 중량%를 미리 혼합하여 드로핑 장치에 넣어 둔 혼합 용액을 드로핑 반응시켰다. 발열을 이용하여 반응물의 온도를 110℃로 상승시켜 산가 5 이하인 브롬화 에폭시 아크릴레이트를 제조하였다.67.8% by weight of a bisphenol-A brominated epoxy resin (YDB-400, manufactured by Kokudo Chemical Co., Ltd.) was added to a four-necked flask equipped with a stirrer, a thermometer, a dropping device and a charge cooler, heated and melted, Lt; / RTI > 0.01% by weight of an antioxidant Irganox 1010 as a polymerization inhibitor, 0.01% by weight of hydroquinone monomethyl ether as a polymerization inhibitor, and 12.81% by weight of acrylic acid and 0.3% by weight of triethylamine were mixed in a dropping apparatus within 1 minute The mixed solution was subjected to dropping reaction. Using the exotherm, the temperature of the reactant was raised to 110 캜 to prepare a brominated epoxy acrylate having an acid value of 5 or less.
상기에서 제조된 브롬화 에폭시 아크릴레이트를 90℃까지 냉각하여 메틸메타아크릴레이트 19.07 중량%로 희석하여 브롬화 에폭시 아크릴레이트 올리고머를 제조하였다. The brominated epoxy acrylate prepared above was cooled to 90 DEG C and diluted with methyl methacrylate to 19.07 wt% to prepare a brominated epoxy acrylate oligomer.
<실시예 2> 광경화 수지 용액의 제조 ≪ Example 2 > Preparation of photocurable resin solution
상기 <실시예 1>에서 제조된 브롬화 에폭시 아크릴레이트 올리고머를 이용하여 아래의 [표 1] 및 [표 2]의 성분 및 함량으로 광경화용 수지 용액을 제조하였다. Using the brominated epoxy acrylate oligomer prepared in Example 1, a photo-curing resin solution was prepared by the components and contents shown in Tables 1 and 2 below.
아래 [표 1]의 수지 조성물은 다관능 사슬이동제(PEMP)를 사용함과 더불어 단파장 광개시제(Irgacure 184) 및/또는 장파장 광개시제(TPO, Irgacure 819)를 사용하여 상기 사슬이동제의 사용이 하부 크랙이나 황변 현상의 발생 여부에 미치는 영향과 상기 광개시제가 경화에 미치는 영향을 보기 위하여 제조한 것이고, 아래 [표 2]의 수지 조성물은 단관능(Dodecyl Mercaptane) 또는 다관능(PEMP) 사슬이동제의 사용이 발열 제어와 경화체의 굴곡강도 등에 미치는 영향을 보기 위한 제조한 것이다. The use of a chain transfer agent using a short-wavelength photoinitiator (Irgacure 184) and / or a long-wavelength photoinitiator (TPO, Irgacure 819) in combination with a polyfunctional chain transfer agent (PEMP) The use of a monodisperse (Dodecyl mercaptane) or polyfunctional (PEMP) chain transfer agent in the resin composition shown in Table 2 below was used to control the heat generation And the flexural strength of the cured product.
* TPO : Diphenyl (2,4,6-trimethylbenzoyl)-phosphine oxide(Basf)
* Irgacure 819 : Phosphine oxide, phenyl bis (2,4,6-trimethyl benzoyl)(Basf)
* Irganox 1076 : Octadecyl-3-(3,5-di-tert.butyl-4-hydroxyphenyl)-propionate(Ciba)
* PEMP : Penntaerythritol tetrakis(3-mercaptopropionate)* Irgacure 184: 1-Hydroxy-cyclohexyl-phenyl-ketone (Basf)
* TPO: Diphenyl (2,4,6-trimethylbenzoyl) -phosphine oxide (Basf)
* Irgacure 819: Phosphine oxide, phenyl bis (2,4,6-trimethyl benzoyl) (Basf)
* Irganox 1076: Octadecyl-3- (3,5-di-tert.butyl-4-hydroxyphenyl) -propionate (Ciba)
* PEMP: Penntaerythritol tetrakis (3-mercaptopropionate)
* PEMP : Penntaerythritol tetrakis(3-mercaptopropionate)* TPO: Diphenyl (2,4,6-trimethylbenzoyl) -phosphine oxide (Basf)
* PEMP: Penntaerythritol tetrakis (3-mercaptopropionate)
<실시예 3> 광경화체의 제조 ≪ Example 3 > Preparation of photocured product
상기 <실시예 2>에서 제조된 광경화 수지 용액을 트레이에 일정 두께로 붓고 고압은램프를 이용한 자외선 경화기에서 광량 1200mJ/cm2로 경화시켜 인조대리석용 투명칩을 제조를 위한 경화체를 제조하였다. The photocurable resin solution prepared in Example 2 was poured into a tray to a predetermined thickness and the high pressure was cured at a light intensity of 1200 mJ / cm 2 in an ultraviolet curing apparatus using a lamp to prepare a cured product for producing transparent chips for artificial marble.
<< 비교예Comparative Example > > 열경화체의Thermoset 제조 Produce
상기 <실시예 1>에서 제조된 브롬화 에폭시 아크릴레이트 올리고머를 이용하여 아래의 [표 3]의 성분 및 함량으로 열경화 수지 용액을 제조하였다. 열경화 수지 조성물은 730mmHg에서 5분간 진공 탈포한 후 트레이에 붓고 70℃에서 가온·경화시켜 인조대리석용 투명칩 제조를 위한 경화체를 제조하였다.Using the brominated epoxy acrylate oligomer prepared in Example 1, a thermosetting resin solution was prepared with the components and contents shown in Table 3 below. The thermosetting resin composition was vacuum-defoamed at 730 mmHg for 5 minutes, poured into a tray, and heated and cured at 70 DEG C to prepare a cured product for producing transparent chips for artificial marble.
<< 실험예Experimental Example 1> 1> 광경화체와The photo- 열경화체의Thermoset 물성 비교 Comparison of physical properties
상기 실시예 및 비교예에서 제조된 경화체에 대하여 다음과 같이 물성을 비교하여 아래의 [표 4]에 나타내었다.The physical properties of the cured products prepared in the above Examples and Comparative Examples were compared as shown in Table 4 below.
30mmHardening thickness
30mm
40mmHardening thickness
40mm
미경화bottom
Uncured
황변Cured
Yellow
황변
크랙발생Cured
Yellow
Cracking
50mmHardening thickness
50mm
미경화bottom
Uncured
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
60mmHardening thickness
60mm
미경화bottom
Uncured
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
70mmHardening thickness
70mm
미경화bottom
Uncured
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
80mmHardening thickness
80mm
미경화bottom
Uncured
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
황변
크랙발생Cured
Yellow
Cracking
상기 [표 4]에서 나타난 바와 같이, 제조예 3의 경우 단파장 개시제(Irgacure 184)만을 사용한 결과 하부 미경화 부분이 발생하였다. 이는 추측건대 상부에서 에너지를 많이 소모하여 하부까지 에너지가 전달되지 못하였기 때문인 것으로 보인다. 또한 장파장 개시제를 사용한 경우에 있어서도(제조예 1 및 2) 경화 두께가 80mm 이상에서는 모든 제조예에서 하부 미경화 부분이 발생하여 광경화를 통하여 투명칩 제조할 경우 두께는 70mm까지 조절하는 것이 바람직함을 알 수 있다. 또한 사슬이동제(PEMP)를 사용하지 아니한 제조예 4의 경우는 하부까지 경화가 되었으나 내부 발열 반응을 제어하지 못한 결과 황변 현상이 발생하고 크랙이 발생하였다.As shown in Table 4, in the case of Production Example 3, only a short wavelength initiator (Irgacure 184) was used, resulting in a lower uncured portion. This seems to be due to the fact that energy is consumed at the upper part of the specimen and the energy is not transferred to the lower part. Also, even when a long wavelength initiator is used (Production Examples 1 and 2), when the hardening thickness is 80 mm or more, the lower uncured portions are generated in all production examples, and it is preferable to control the thickness to 70 mm when the transparent chip is manufactured through photo- . In the case of Production Example 4, in which no chain transfer agent (PEMP) was used, curing was performed to the lower part, but yellowing occurred and cracks occurred due to the inability to control the internal exothermic reaction.
열경화의 경우(비교예 1 내지 3)는 두께가 얇은 경우는 경화되지 않고 또 두께가 두꺼울 경우는 황변 현상이나 크랙이 발생함을 알 수 있다.In the case of the thermosetting (Comparative Examples 1 to 3), when the thickness is thin, it is not cured and when the thickness is thick, yellowing phenomenon and crack are generated.
<< 실험예Experimental Example 2> 2> 사용된 Used 사슬이동제에To the chain transfer agent 따른 Following 광경화체의Of the light cured body 물성 비교 Comparison of physical properties
상기 제조예 5 내지 8에서 제조된 광경화체의 크랙, 황변 발생 여부, 발열온도 및 굴곡강도를 측정하여 아래의 [표 5]에 나타내었다. 여기서 굴곡강도는 ASTM D-790 방법으로 측정하였고, 발열 온도는 히트라벨을 붙여 체크 하였다.Cracks, yellowing occurrence, heat generation temperature and flexural strength of the photocurable compositions prepared in Production Examples 5 to 8 were measured and shown in Table 5 below. Here, the flexural strength was measured by ASTM D-790 method, and the heating temperature was checked with a heat label.
상기 [표 5]의 결과를 보면, 다관능 사슬이동제인 PEMP를 사용한 경우 굴곡 강도가 높으면서 발열 제어도 가능함을 알 수 있다. 이는 다관능 사슬이동제의 경우 가교결합을 유도하기 때문인 것으로 보인다. 사슬 이동제를 사용하지 않은 경우 발열 온도가 높아져 크랙과 항변 현상이 발생하였으며, 단관능 사슬이동제를 사용한 경우는 크랙과 황변 현상이 발생하지 않았으나 강도가 낮은 경화체가 얻어지는 단점이 있었다.
As shown in the results of Table 5 above, it can be seen that the PEMP, which is a multifunctional chain transfer agent, is used to control the heat generation while the bending strength is high. This seems to be due to the induction of crosslinking in the case of polyfunctional chain transfer agents. When the chain transfer agent was not used, cracks and protrusion occurred due to a high temperature of heat generation. In the case of using a monofunctional chain transfer agent, cracks and yellowing did not occur but a cured product with low strength was obtained.
Claims (10)
(a) a resin composition for the manufacture of a photocurable transparent chip for artificial marble comprising a base resin selected from unsaturated polyester and acrylate oligomers, a monomer as a reactive diluent, and a photoinitiator.
상기 베이스 수지는 60 내지 90 중량%로 포함되고, 상기 반응성 희석제인 모노머는 5 내지 30 중량%로 포함되며, 상기 광개시제는 0.01 내지 10 중량%로 포함되는 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
Wherein the base resin is contained in an amount of 60 to 90% by weight, the reactive diluent monomer is contained in an amount of 5 to 30% by weight, and the photoinitiator is included in an amount of 0.01 to 10% Resin composition.
상기 아크릴레이트 올리고머는 에폭시아크릴레이트 수지, 할로겐화 에폭시아크릴레이트 수지, 우레탄아크릴레이트 수지 및 폴리에스테르아크릴레이트 수지로 구성된 군에서 선택된 1종 이상인 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
Wherein the acrylate oligomer is at least one selected from the group consisting of an epoxy acrylate resin, a halogenated epoxy acrylate resin, a urethane acrylate resin, and a polyester acrylate resin. .
상기 반응성 희석제인 모노머는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트, 옥실(메타)아크릴레이트, 도데실(메타)아크릴레이트, 옥타데실(메타)아크릴레이트, 메틸사이클로헥실(메타)아크릴레이트, 이소보닐(메타)아크릴레이트, 페닐(메타)아크릴레이트, 벤질(메타)아크릴레이트, 클로로페닐(메타)아크릴레이트, 메톡시페닐(메타)아크릴레이트, 브로모페닐(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 1,2-프로필렌글리콜(메타)아크릴레이트, 1,3-부탄디올디(메타)아크릴레이트, 1,3-프로필렌글리콜(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,5-펜탄디올디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 디프로필렌글리콜디(메타)아크릴레이트, 디알릴테레프탈레이트, 디알릴프탈레이트, 디알릴카르보네이트, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 에톡시에톡시에틸아크릴레이트, 글리시딜메타크릴산의 에폭시아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 글리세린트리(메타)아크릴레이트, 메틸프로판디올디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 스티렌, 할로겐화 스티렌, 비닐톨루엔, 디비닐벤젠, 알파메틸스티렌, 비스페놀에이 디(메타)아크릴레이트, 에톡실레이트드 비스페놀에이디(메타)아크릴레이트 및 이들의 혼합물로 이루어진 군으로부터 1종 이상인 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
The reactive diluent monomer may be selected from the group consisting of methyl (meth) acrylate, ethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, oxyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (Meth) acrylate, methoxycarbonyl (meth) acrylate, methylcyclohexyl (meth) acrylate, isobornyl (meth) acrylate, phenyl Propylene glycol (meth) acrylate, 1,3-butanediol di (meth) acrylate, 1,3-propylene glycol (meth) acrylate, (Meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,5-pentanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di Triethylene glycol di (meth) acrylate (Meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, diethylene glycol di (Meth) acrylate, dipentaerythritol hexa (meth) acrylate, ethoxyethoxyethyl acrylate, epoxy acrylate of glycidyl methacrylic acid, 1,6-hexanediol di (meth) acrylate, glycerin tri Acrylate, styrene, halogenated styrene, vinyltoluene, divinylbenzene, alpha methylstyrene, bisphenol A di (meth) acrylate, poly (Meth) acrylate, a mixture thereof, and a mixture thereof. Lee seokyong sight resin composition for manufacturing transparent chips burned.
상기 광개시제는 장파장 광개시제 및 단파장 광개시제 중 1종 이상인 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
Wherein the photoinitiator is at least one of a long-wavelength photoinitiator and a short-wavelength photoinitiator.
상기 장파장 광개시제는 2-벤질-2-디메틸아미노-1-부타논, 디페닐(2,4,6-트리메틸벤조일)-포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥사이드, 벤질 디메틸케탈, 2,4,6-트리메틸벤조페논, 올리고(2-히드록시-2-메틸-1-(4-(메틸비닐)페닐 프로판), 2,2-디메톡시-1,2-디페닐에탄-1-온, 1-히드록시-시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐프로판-1-온, 2,4-디에틸티옥산토인, 3,3-디메틸-4-메톡시-벤조페논, 에틸 p-디메틸안미노벤조에이트, 이소아밀 p-디메틸아미노벤조에이트, 비스(2,6-디클로르벤조일)-페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-2,5-디메틸페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-4-에톡시페닐포스핀옥사이드, 비스(2,6-디클로르벤조일)-4-프로필페닐포스핀옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸포스핀옥사이드 및 2,4,6-트리메틸벤조일-디페닐포스핀옥사이드로 구성된 군에서 선택된 1종 이상이고,
상기 단파장 광개시제는 1-히드록시-시클로헥실-페닐 케톤, 2-하이드록시-2-메틸-1-페닐-1-프로판온, 2-하이드록시-1-[4-(2-하이드록시에톡시)페닐]-2-메틸-1-프로판온, 메틸벤조일포르메이트, α,α-디메톡시-α-페닐아세토페논, 2-벤조일-2-(디메틸아미노)-1-[4-(4-모포린일)페닐]-1-부타논 및 2-메틸-1-[4-(메틸씨오)페닐]-2-(4-몰포린일)-1-프로판온로 구성된 군에서 선택된 1종 이상인 것을 특징으로하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
6. The method of claim 5,
The long wavelength photoinitiator may be 2-benzyl-2-dimethylamino-1-butanone, diphenyl (2,4,6-trimethylbenzoyl) -phosphine oxide, bis (2,4,6-trimethylbenzoyl) (2-hydroxy-2-methyl-1- (4- (methylvinyl) phenylpropane), 2,2-dimethoxy-1,2 2-methyl-1-phenylpropan-1-one, 2,4-diethylthioxanthone, 3,3 (2,6-dichlorobenzoyl) -phenylphosphine oxide, bis (2,6-dichlorobenzoyl) -phenylphosphine oxide, bis (2,6-dichlorobenzoyl) -4-ethoxyphenylphosphine oxide, bis (2,6-dichlorobenzoyl) -4-propylphenoxide Phenylphosphine oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide It represents at least one member selected from the group consisting of diphenylphosphine oxide pin, - 2,4,6-trimethylbenzoyl
The short wavelength photoinitiator may be selected from the group consisting of 1-hydroxy-cyclohexyl-phenyl ketone, 2-hydroxy-2-methyl- (2-benzoyl-2- (dimethylamino) -1- [4- (4-methylphenylsulfanyl) (4-morpholinyl) phenyl] -1-butanone and 2-methyl-1- [4- By weight based on the total weight of the composition.
상기 수지 조성물은 사슬이동제를 추가로 포함하는 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
Wherein the resin composition further comprises a chain transfer agent. ≪ RTI ID = 0.0 > 11. < / RTI >
상기 사슬이동제는 다관능성 사슬이동제이고,
그 다관능성 사슬이동제는 1,5-펜탄다이티올, 1,6-헥산다이티올, 에틸렌글리콜비스(3-메르캅토부티레이트), 프로필렌글리콜비스(3-메르캅토부티레이트), 디에틸렌글리콜비스(3-메르캅토부티레이트), 부탄디올비스(3-메르캅토부티레이트), 옥탄디올비스(3-메르캅토부티레이트), 트리메티롤프로판트리스(3-메르캅토부티레이트), 펜타에리스리톨테트라키스(3-메르캅토부티레이트), 디펜타에리스톨헥사키스(3-메르캅토부티레이트), 에틸렌글리콜비스(2-메르캅토프로피오네이트), 프로필렌글리콜비스(2-메르캅토프로피오네이트), 디에틸렌글리콜비스(2-메르캅토프로피오네이트), 부탄디올비스(2-메르캅토프로피오네이트), 옥탄디올비스(2-메르캅토프로피오네이트), 트리메티롤프로판트리스(2-메르캅토프로피오네이트), 펜타에리스리톨테트라키스(2-메르캅토프로피오네이트), 디펜타에리스리톨헥사키스(2-메르캅토프로피오네이트), 에틸렌글리콜비스(3-메르캅토이소부티레이트), 프로필렌글리콜비스(3-메르캅토이소부티레이트), 디에틸렌글리콜비스(3-메르캅토이소부티레이트), 부탄디올비스(3-메르캅토이소부티레이트), 옥탄디올비스(3-메르캅토이소부티레이트), 트리메티롤프로판트리스(3-메르캅토이소부티레이트), 펜타에리스리톨테트라키스(3-메르캅토이소부티레이트), 디펜타에리스톨헥사키스(3-메르캅토이소부티레이트), 에틸렌글리콜비스(2-메르캅토이소부티레이트), 프로필렌글리콜비스(2-메르캅토이소부티레이트), 디에틸렌글리콜비스(2-메르캅토이소부티레이트), 부탄디올비스(2-메르캅토이소부티레이트), 옥탄디올비스(2-메르캅토이소부티레이트), 트리메티롤프로판트리스(2-메르캅토이소부티레이트), 펜타에리스리톨테트라키스(2-메르캅토이소부티레이트), 디펜타에리스리톨헥사키스(2-메르캅토이소부티레이트), 에틸렌글리콜비스(4-메르캅토발레레이트), 프로필렌글리콜비스(4-메르캅토이소발레레이트), 디에틸렌글리콜비스(4-메르캅토발레레이트), 부탄디올비스(4-메르캅토발레레이트), 옥탄디올비스(4-메르캅토발레레이트), 트리메티롤프로판트리스(4-메르캅토발레레이트), 펜타에리스리톨테트라키스(4-메르캅토발레레이트), 디펜타에리스톨헥사키스(4-메르캅토발레레이트), 에틸렌글리콜비스(3-메르캅토발레레이트), 프로필렌글리콜비스(3-메르캅토발레레이트), 디에틸렌글리콜비스(3-메르캅토발레레이트), 부탄디올비스(3-메르캅토발레레이트), 옥탄디올비스(3-메르캅토발레레이트), 트리메티롤프로판트리스(3-메르캅토발레레이트), 펜타에리스리톨테트라키스(3-메르캅토발레레이트), 디펜타에리스리톨헥사키스(3-메르캅토발레레이트), 수소화 비스페놀A 비스(3-메르캅토부티레이트), 비스페놀A 디히드록시에틸에테르-3-메르캅토부티레이트, 4,4'-(9-플루오레닐리덴)비스(2-페녹시에틸(3-메르캅토부티레이트)), 에틸렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 프로필렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 디에틸렌글리콜비스(3-메르캅토-3-페닐프로피오네이트), 부탄디올비스(3-메르캅토-3-페닐프로피오네이트), 옥탄디올비스(3-메르캅토-3-페닐프로피오네이트), 트리메티롤프로판트리스(3-메르캅토-3-페닐프로피오네이트), 트리스-2-(3-메르캅토-3-페닐프로피오네이트)에틸이소시아누레이트, 펜타에리스리톨테트라키스(3-메르캅토-3-페닐프로피오네이트) 및 디펜타에리스톨헥사키스(3-메르캅토-3-페닐프로피오네이트) 중에서 선택된 1종 이상인 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.The method according to claim 1,
The chain transfer agent is a polyfunctional chain transfer agent,
The multifunctional chain transfer agent is selected from the group consisting of 1,5-pentanedithiol, 1,6-hexanedithiol, ethylene glycol bis (3-mercaptobutyrate), propylene glycol bis (3-mercaptobutyrate), diethylene glycol bis Mercaptobutyrate), butanediol bis (3-mercaptobutyrate), octanediol bis (3-mercaptobutyrate), trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakis ), Dipentaerythritol hexacis (3-mercaptobutyrate), ethylene glycol bis (2-mercaptopropionate), propylene glycol bis (2-mercaptopropionate), diethylene glycol bis Mercaptopropionate), butanediol bis (2-mercaptopropionate), octanediol bis (2-mercaptopropionate), trimethylolpropane tris (2-mercaptopropionate), pentaerythritol tetrakis (2-mercapto (3-mercaptoisobutyrate), propylene glycol bis (3-mercaptoisobutyrate), diethylene glycol bis (3-mercaptoisobutyrate), dipentaerythritol hexa 3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), octanediol bis (3-mercaptoisobutyrate), trimethylolpropane tris (3-mercaptoisobutyrate) (2-mercaptoisobutyrate), propylene glycol bis (2-mercaptoisobutyrate), erythritol tetrakis (3-mercaptoisobutyrate), dipentaerythol hexacis Diisobutyrate), diethylene glycol bis (2-mercaptoisobutyrate), butanediol bis (2-mercaptoisobutyrate), octanediol bis (2-mercaptoisobutyrate), trimethylolpropane tris 2-mercaptoisobutyrate ), Pentaerythritol tetrakis (2-mercaptoisobutyrate), dipentaerythritol hexakis (2-mercaptoisobutyrate), ethylene glycol bis (4-mercaptovalerate), propylene glycol bis (4-mercaptovalerate), butanediol bis (4-mercaptovalerate), octanediol bis (4-mercaptovalerate), trimethylolpropane tris (4 (4-mercaptovalerate), ethylene glycol bis (3-mercaptovalerate), propylene glycol bis (3-mercaptovalerate), pentaerythritol tetrakis (3-mercaptovalerate), diethylene glycol bis (3-mercaptovalerate), butanediol bis (3-mercaptovalerate), octanediol bis (3-mercaptovalerate), trimethylolpropane tris (3-mercaptovalerate), pentaerythritol (3-mercaptovalerate), dipentaerythritol hexaquis (3-mercaptovalerate), hydrogenated bisphenol A bis (3-mercaptobutyrate), bisphenol A dihydroxyethyl ether-3-mercapto Butyrate, 4,4'- (9-fluorenylidene) bis (2-phenoxyethyl (3-mercaptobutyrate)), ethylene glycol bis (3-mercapto-3-phenylpropionate), propylene glycol 3-phenylpropionate), diethylene glycol bis (3-mercapto-3-phenylpropionate), butanediol bis (3-mercapto-3-phenylpropionate) (3-mercapto-3-phenylpropionate), trimethylolpropane tris (3-mercapto-3-phenylpropionate), tris-2- Pentaerythritol tetrakis (3-mercapto-3-phenylpropionate) and dipentaerythole hexakis (3- Le mercaptomethyl-3-phenyl propionate) resin composition for producing artificial marble photocurable transparent chips, characterized in that at least one member selected from.
상기 수지 조성물은 사슬이동제를 추가로 포함하고
상기 경화체의 두께는 1 내지 70mm인 것을 특징으로 하는 인조대리석용 광경화형 투명칩 제조를 위한 수지 조성물.
The method according to claim 1,
The resin composition further comprises a chain transfer agent
Wherein the cured product has a thickness of 1 to 70 mm.
A photocured product for producing a photocurable transparent chip for artificial marble, which is obtained by irradiating light to the resin composition according to any one of claims 1 to 9 and photo-curing the same.
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KR1020140065685A KR20150137587A (en) | 2014-05-30 | 2014-05-30 | Photocurable Resin Composition for Manufacturing Photocured Tansparant Chips for Artificial Marble |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180035534A (en) * | 2016-09-29 | 2018-04-06 | 케이에스케미칼 주식회사 | Resin composition for the transparent artificial marble chips and preparing method thereof |
JP2019119849A (en) * | 2018-01-09 | 2019-07-22 | ジャパンコンポジット株式会社 | Curable resin composition |
-
2014
- 2014-05-30 KR KR1020140065685A patent/KR20150137587A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180035534A (en) * | 2016-09-29 | 2018-04-06 | 케이에스케미칼 주식회사 | Resin composition for the transparent artificial marble chips and preparing method thereof |
JP2019119849A (en) * | 2018-01-09 | 2019-07-22 | ジャパンコンポジット株式会社 | Curable resin composition |
JP7160648B2 (en) | 2018-01-09 | 2022-10-25 | ジャパンコンポジット株式会社 | Curable resin composition |
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