KR20150113405A - Antiblocking hard coating layer composition, antiblocking hard coating layer and transparent conductive film including the same - Google Patents

Abstract

Provided is a composition of an antiblocking hard coating layer which comprises: an ultraviolet-ray curable resin; an inorganic particle having the diameter of 200-300 nm; a nano-inorganic particle having the diameter of 1-30 nm; and a photopolymerization initiator. In addition, provided is a transparent conductive film comprising the antiblocking hard coating layer produced by the composition of the antiblocking hard coating layer.

Description

TECHNICAL FIELD [0001] The present invention relates to an anti-blocking hard coat layer composition, an anti-blocking hard coat layer, and a transparent conductive film containing the same. BACKGROUND ART [0002]

An anti-blocking hard coating layer, and a transparent conductive film comprising the same.

The touch panel includes an optical system, an ultrasonic system, an electrostatic capacity system, and a resistive film system depending on the position detection method. The resistance film type touch panel has a structure in which a transparent conductive film and a glass having a transparent conductive layer are arranged to face each other with a spacer interposed therebetween and a voltage is measured in a glass having a transparent conductive layer attached thereto by passing a current through the transparent conductive film . On the other hand, a capacitive touch panel has a basic structure having a transparent conductive layer on a substrate, and is characterized by the absence of a movable part, and has a high durability and a high transmittance.

In particular, in the case of a transparent conductive film, the film may be wound or laminated so that anti-blocking property is required to be able to slide without sticking between the film and the film. In order to secure optical characteristics and productivity, The need for related research is increasing.

One embodiment of the present invention provides an anti-blocking hard coat layer composition that implements anti-blocking performance by including inorganic particles having a particle diameter of from about 200 nm to about 300 nm.

Another embodiment of the present invention provides a transparent conductive film that secures anti-blocking performance and optical characteristics due to an anti-blocking hard coating layer having a micro concavo-convex shape.

In one embodiment of the present invention, an ultraviolet curable resin; Inorganic particles having a particle diameter of about 200 nm to about 300 nm; Nano-inorganic particles having a particle diameter of about 1 nm to about 30 nm; And an anti-blocking hard coat layer composition comprising a photopolymerization initiator.

The inorganic particles may be amorphous inorganic particles in which a plurality of primary inorganic particles are aggregated.

The particle diameter of the primary inorganic particles may be from about 1 nm to about 50 nm.

The nano-inorganic particles may be dispersed in an organic solvent.

The organic solvent may include at least one selected from the group consisting of methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), ethanol, toluene, and combinations thereof.

About 10 parts by weight to about 70 parts by weight of the ultraviolet curable resin, about 1 to about 10 parts by weight of the inorganic particles, about 1 to about 20 parts by weight of the nano- And about 3 parts by weight to about 15 parts by weight of the photopolymerization initiator.

The inorganic particles and the nano-inorganic particles may include at least one metal oxide selected from the group consisting of silica, alumina, zirconium oxide, and combinations thereof.

In another embodiment of the present invention, there is provided a transparent conductive film comprising an anti-blocking hard coat layer formed by the anti-blocking hard coat layer composition.

The anti-blocking hard coating layer may include a fine concavo-convex shape on its surface.

The micro concavo-convex shape may be formed by floating inorganic particles when applying the anti-blocking hard coat layer composition.

The thickness of the anti-blocking hard coating layer may be between about 500 nm and about 3 um.

The antiglare hard coating layer may be formed on one surface of the transparent substrate and the high refractive index layer, the low refractive index layer and the conductive layer may be sequentially formed on the back surface of the transparent substrate.

And a hard coating layer may be further disposed between the transparent substrate and the high refractive index layer.

The hard coat layer may comprise a hard coat layer composition comprising an ultraviolet ray curable resin, nanosize inorganic particles having a particle diameter of about 1 nm to about 30 nm, and a photopolymerization initiator.

By using the anti-blocking hard coating layer composition, anti-blocking performance and optical performance can be secured at the same time, and the productivity of the anti-blocking hard coating layer can be improved.

The anti-blocking performance and the optical performance of the transparent conductive film are improved and the application range in the touch panel field can be expanded.

FIG. 1 (a) shows inorganic particles contained in the anti-blocking hard coat layer composition according to one embodiment of the present invention, and FIG. 1 (b) schematically shows conventional spherical inorganic particles.
Figure 2 schematically shows the anti-blocking hard coating layer.
3 (a) and 3 (b) schematically show cross sections of a transparent conductive film according to another embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail. However, the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.

Hard coating layer  Composition for coating

In one embodiment of the present invention, an ultraviolet curable resin; Inorganic particles having a particle diameter of 200 nm to 300 nm; Nano-inorganic particles having a particle diameter of 1 nm to 30 nm; And an anti-blocking hard coat layer composition comprising a photopolymerization initiator.

Conventionally, a method of adding an anti-blocking property to the hard coat layer has been used for securing the anti-blocking performance of the transparent conductive film. In order to add anti-blocking performance to the hard coat layer, it is necessary to consider the thickness of the hard coat layer, the size of the inorganic particles included in the hard coat layer composition and the haze caused thereby, for example, The anti-blocking performance can not be constantly realized because the film does not have a uniform dispersion and this leads to a decrease in the productivity of the transparent conductive film. In addition, there is a problem that the haze value is increased due to the micro concavity and convexity formed due to the inorganic particles and the optical characteristics are lowered.

However, the anti-blocking hard coating layer composition may comprise an ultraviolet curable resin; Inorganic particles having a particle diameter of 200 nm to 300 nm; Nano-inorganic particles having a particle diameter of 1 nm to 30 nm; And a photopolymerization initiator. When the anti-blocking hard coat layer composition is coated and dried on one surface of a transparent substrate due to the crystal form of the inorganic particles, the dispersibility is excellent, and haze is minimized and a certain level of optical properties are maintained A hard coat layer can be formed.

The term " particle diameter " means an average particle diameter, which means an average value of the respective particle diameters measured, and the inorganic particles may have a particle diameter of about 200 nm to about 300 nm. If the particle diameter is less than about 200 nm, the dispersibility is not excellent, and the anti-blocking performance is not exhibited in the process. Inorganic particles having an excellent dispersibility exceeding about 300 nm are not present. Therefore, by including the inorganic particles having the particle diameters in the above range, a stable anti-blocking effect can be easily realized with uniform dispersibility.

The composition has anti-blocking properties by including inorganic particles having a particle diameter of about 200 nm to about 300 nm, and the inorganic particles may be amorphous inorganic particles in which a plurality of primary inorganic particles are aggregated.

The amorphous inorganic particles are formed by coalescence of a plurality of primary inorganic particles having a small particle diameter, and are distinguished from one spherical inorganic particle having a large particle diameter. The composition containing the amorphous inorganic particles is characterized in that the composition containing the spherical inorganic particles It has excellent dispersibility when forming a hard coating and can realize an anti-blocking performance and an excellent optical characteristic at the same time because of its excellent dispersibility.

FIG. 1 (a) shows inorganic particles contained in the anti-blocking hard coat layer composition according to one embodiment of the present invention, and FIG. 1 (b) schematically shows conventional spherical inorganic particles.

1 (a) and 1 (b) are similar in particle diameter, but the inorganic particles in Fig. 1 (a) are amorphous inorganic particles in which a plurality of primary inorganic particles are aggregated, Of the spherical inorganic particles. By using the anti-blocking hard coat layer composition comprising the inorganic particles of FIG. 1 (a), anti-blocking performance and optical performance can be secured at the same time, and the productivity of the transparent conductive film can be improved.

Specifically, the primary inorganic particles forming the amorphous inorganic particles may have a particle diameter of about 1 nm to about 50 nm. For example, the primary inorganic particles may be the same as the nano-inorganic particles described later.

The nano-inorganic particles may be dispersed in an organic solvent. For example, the organic solvent may be selected from the group consisting of methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), ethanol, toluene, And may include at least one selected.

Specifically, the inorganic particles and the nano-inorganic particles may include at least one metal oxide selected from the group consisting of silica, alumina, zirconium oxide, and combinations thereof. For example, an inorganic particle whose surface has undergone a silane coupling treatment or a titanium coupling treatment may also be used, and a surface treatment agent having a functional group capable of reacting with the component contained in the inorganic particle surface may be used.

About 10 parts by weight to about 70 parts by weight of the ultraviolet curable resin, about 1 to about 10 parts by weight of the inorganic particles, about 1 to about 20 parts by weight of the nano- And about 3 parts by weight to about 15 parts by weight of the photopolymerization initiator.

The composition contains about 1 part by weight to about 10 parts by weight of the inorganic particles. When the inorganic particles are contained in an amount of less than about 1 part by weight, the anti-blocking performance may not be sufficiently realized. There is a problem of optical performance deterioration due to haze induction. Therefore, it is advantageous to exhibit anti-blocking performance by maintaining the above-mentioned content and securing dispersibility, thereby realizing stable working characteristics in the process.

Also, the composition may include about 1 part by weight to about 20 parts by weight of the nano-inorganic particles. If the amount of the nano-inorganic particles is less than about 1 part by weight, the composition may fail to exhibit wear resistance. When the amount of the nano-inorganic particles is more than about 20 parts by weight, the nano-inorganic particles may not be dispersed in the composition. By maintaining the range, the dispersibility and the wear resistance can be simultaneously realized.

The anti-blocking hard coating layer formed from the composition is formed on one surface of the transparent substrate, which is poor in heat resistance. The hard coating layer may include a UV curable resin to secure a certain level of hardness.

Examples of the ultraviolet ray-curable resin include resins having an acrylate-based functional group such as polyester resins, polyether resins, acrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, (Meth) acrylate resins of polyfunctional compounds such as polythiol polyene resins and polyhydric alcohols.

Specifically, the ultraviolet ray curable resin may include an ultraviolet ray curable oligomer or an ultraviolet ray curable monomer, and examples thereof include ethylene glycol diacrylate, neopentyl glycol di (meth) acrylate, 1,6-hexanediol (meth) (Meta) acrylate of bisphenol A-diglycidyl ether, di (meth) acrylate of polypoly (meth) acrylate, polyhydric alcohol and polyhydric alcohol (Meth) acrylate, polysiloxane polyacrylate, urethane (meth) acrylate, pentaerythritol tetramethacrylate, glycerin trimethacrylate, etc. obtained by esterifying carboxylic acid and its anhydride and acrylic acid But is not limited thereto.

The ultraviolet ray-curable resin may be formed of one compound or a mixture of two or more of the above compounds, and the content of the ultraviolet ray-curable resin may be about 10 to 70 parts by weight based on 100 parts by weight of the solid . When the resin content is less than about 10 parts by weight, cracks tend to occur in the anti-blocking hard coating layer. When the resin content exceeds about 70 parts by weight, the viscosity of the composition for coating the anti-blocking hard coating layer may increase.

For example, when the ultraviolet-curable resin simultaneously contains an ultraviolet-curable oligomer or an ultraviolet-curable monomer, the amount of the oligomer is about 10 parts by weight to about 40 parts by weight based on 100 parts by weight of solids, 30 parts by weight.

The composition may contain a photopolymerization initiator such as, for example, acetophenone, benzophenone, mihira ketone, benzoin, benzyl methyl ketal, benzoin benzoate, hydroxycyclohexyl phenyl ketone, - (4- (methylthio) phenyl) -2- (4-morpholinyl) -1-propane.

In addition, the composition may further include an ultraviolet ray enhancer, a thermoplastic resin, and the like within a range that does not impair the hardness and permeability of the anti-blocking hard coating layer formed of the composition.

Examples of the ultraviolet sensitizer include n-butylamine, triethylamine, tri-n-butylphosphine, and the like as the thermoplastic resin, such as acetylcellulose, nitrocellulose, acetylbutylcellulose, ethylcellulose, methylcellulose Vinyl acetate and its copolymers, vinyl chloride and its copolymers, vinyl chloride resins such as vinylidene chloride and copolymers thereof, acetal resins such as polyvinylformal and polyvinylbutyral, acrylic resins and the like An acrylic resin such as a copolymer, a methacrylic resin and a copolymer thereof, a polystyrene resin, a polyamide resin, a linear polyester resin, and a polycarbonate resin.

Transparent conductive film

In another embodiment of the present invention, an ultraviolet curable resin; Inorganic particles having a particle diameter of 200 nm to 300 nm; Nano-inorganic particles having a particle diameter of 1 nm to 30 nm; And an anti-blocking hard coating layer composition comprising a photopolymerization initiator.

The matters concerning the anti-blocking hard coat layer composition are as described above.

2 schematically shows the anti-blocking hard coating layer. Referring to FIG. 2, the anti-blocking hard coating layer may include a fine uneven shape on the surface. When the anti-blocking hard coat layer composition is coated on the transparent substrate, the inorganic particles float to form fine particles. The anti-blocking property of the hard coat layer is realized by forming the uneven shape.

At this time, although the particle diameter of the inorganic particles is comparatively large, about 200 nm to about 300 nm, the inorganic particles are amorphous inorganic particles having a plurality of primary inorganic particles, which are excellent in dispersibility and can realize optical characteristics simultaneously with anti- The productivity of the transparent conductive film can also be improved due to the hard coating layer.

Conventional particles for implementing the anti-blocking effect are very advantageous in selecting the thickness of the anti-blocking hard coating layer floating on the surface of the hard coating layer when the particle diameter is considered according to the thickness of the hard coating layer, And it is possible to minimize the haze due to the optical interference of particles due to the thickness.

Specifically, the thickness of the anti-blocking hard coating layer may be about 500 nm to about 3 mu m. When the thickness of the hard coat layer is less than about 500 nm, the thickness is too thin, which may cause deterioration of hardness and mechanical properties.

3 (a) schematically shows a cross-section of a transparent conductive film according to another embodiment of the present invention. Referring to FIG. 3 (a), the antireflection hard coating layer may be formed on one surface of a transparent substrate, and a high refractive index layer, a low refractive index layer, and a conductive layer may be sequentially formed on the back surface of the transparent substrate.

The high refractive index layer and the low refractive index layer improve the insulating property and transmittance between the transparent substrate and the conductive layer.

The high refractive index layer and the low refractive index layer may be formed of various materials such as an inorganic material, an organic material, or a mixture of an inorganic material and an organic material. Examples of the organic material include melamine resin, alkyd resin, urethane resin, acrylic resin, siloxane-based polymer, and organic silane condensate such as SiO2, MgF2, Al2O3, NaF, Na3AlF6, LiF, CaF2, BaF2, LaF3, Etc. may be used.

In particular, the refractive index of the high refractive index layer may be from about 1.65 to about 1.8 and the thickness from about 15 nm to about 100 nm. By maintaining the thickness of the high-refraction layer, excellent transmittance and visibility can be improved, and occurrence of cracks and curls due to stress can be reduced.

Further, the refractive index of the low refractive layer may be about 1.35 to about 1.5, and the thickness may be about 10 nm to about 500 nm. The refractive index of the transparent conductive film can be controlled within the thickness range, thereby improving the overall visibility of the transparent conductive film by controlling the refractive index difference with the high refractive index layer.

The transparent material may be at least one selected from the group consisting of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polycarbonate (PC), polypropylene (PP), polyvinyl chloride (PVC) And may be a single or laminated film comprising any one selected from the group consisting of polymethyl methacrylate (PMMA), ethylene vinyl alcohol (EVA), polyvinyl alcohol (PVA), and combinations thereof. The thickness of the transparent substrate may be between about 25 um and about 500 um.

The conductive layer is formed on the low refraction layer and may include ITO (Indium Tin Oxide) or FTO (Fluorine-doped Tin Oxide). Specifically, the thickness of the conductive layer may be about 5 nm to about 50 nm, and it is advantageous in that the conductive layer can secure a low resistance by keeping the thickness of the conductive layer within the above range.

FIG. 3B is a schematic cross-sectional view of a transparent conductive film according to another embodiment of the present invention, and may further include a hard coating layer between the transparent substrate and the high refractive index layer. The hard coating layer is distinguished from the anti-blocking hard coating layer in order to secure the hardness and optical characteristics of the transparent conductive film.

 The hard coat layer may comprise a hard coat layer composition comprising an ultraviolet ray curable resin, nano inorganic particles having a particle diameter of 1 nm to 30 nm, and a photopolymerization initiator, each of which is as described above.

The thickness of the hard coat layer may be from about 900 nm to about 2000 nm. If the thickness of the hard coating layer is less than about 900 nm, there is a problem that the dispersion of the optical characteristics is uneven by wavelength. When the thickness of the hard coating layer is more than about 2000 nm, the hard coating layer may be curled. By maintaining the thickness of the range, it is possible to easily realize dispersion by wavelength and minimization of curling, and the refractive index of the hard coat layer can be maintained at about 1.45 to about 1.6.

Hereinafter, specific embodiments of the present invention will be described. However, the embodiments described below are only intended to illustrate or explain the present invention, and thus the present invention should not be limited thereto.

< Manufacturing example >

Manufacturing example  1-1. Anti-blocking Hard coating layer  Composition

64 parts by weight of urethane acrylate oligomer (HX-920UV, Kyoeisha Chemical Co., Ltd.), 15 parts by weight of dipentaerythritol hexaacrylate monomer, and silica fine particles having a particle diameter of 250 nm (CIKasei Co., Ltd.) were added to 100 parts by weight of solids. , 15 parts by weight of nano-silica fine particles dispersed in methyl ethyl ketone (MEK) and 5 parts by weight of a photopolymerization initiator (Irgacure-184, manufactured by Ciba) were diluted with a diluting solvent methyl ethyl ketone (MEK) To prepare a solid content 45% anti-blocking hard coating composition having a refractive index of 1.52.

Manufacturing example  1-2, 1-3. Anti-blocking Hard coating layer  Composition

An anti-blocking hard coating composition was prepared in the same manner as in Preparation Example 1-1, except that the contents of urethane acrylate oligomer and silica fine particles were changed as shown in Table 1 below.

Manufacturing example  1-4. Anti-blocking Hard coating layer  Composition

An anti-blocking hard coating composition was prepared in the same manner as in Preparation Example 1-2 except that spherical silica particles having a particle diameter of 200 nm (MEK20, manufactured by Shin-Kagaku Co., Ltd.) were used as the silica fine particles.

Manufacturing example  1-5. Anti-blocking Hard coating layer  Composition

An anti-blocking hard coating composition was prepared in the same manner as in Preparation Example 1-1, except that amorphous silica particles having a particle diameter of 1 μm (SFP 30, Denka) were used as the silica fine particles.

division Composition (based on 100 parts by weight of solids) Silica fine particles Nano silica fine particles Oligomer Monomer Photoinitiator Manufacturing example
1-1 One 15 64 15 5 Manufacturing example
1-2 5 15 59 15 5 Manufacturing example
1-3 10 15 55 15 5 Manufacturing example
1-4 5 15 59 15 5 Manufacturing example
1-5 One 15 64 15 5

Manufacturing example  2. Low refraction layer  Composition

Tetraethoxyorthosilicate (TEOS) was mixed with water and ethanol at a ratio of 1: 2: 2, and a 0.1 molar solution of nitric acid was added thereto. The reaction was carried out for 24 hours to synthesize a silica sol by a sol-gel reaction. The sol thus prepared was diluted with methyl ethyl ketone (MEK) to prepare a solid 5% low refraction layer composition having a refractive index of 1.43.

Manufacturing example  3. High-refraction layer  Composition

35 parts by weight of zirconia nanoparticles, 35 parts by weight of a re-acrylate oligomer (HX-920UV, Kyoeisha Chemical Co., Ltd.) and 5 parts by weight of a photopolymerization initiator (Irgacure-184, manufactured by Ciba) were mixed and diluted with methyl ethyl ketone (MEK) To prepare a 10% solid high refractive index layer composition having a refractive index of 1.65.

Manufacturing example  4. Hard coating layer  Composition

A hard coat composition was prepared in the same manner as in Preparation Example 1-1, except that silica fine particles were not included.

< Example  And Comparative Example >

Example 1

The hard coat layer composition of Preparation Example 1-1 was coated on one surface of a PET substrate having a thickness of 50 .mu.m using a Meyer bar to a thickness of 0.8 .mu.m and irradiated with ultraviolet rays of 300 mJ with a 180 W high pressure mercury lamp to form an anti- Respectively.

The low refractive index layer composition of Production Example 2 was coated on the back surface of the PET substrate so as to have a thickness of 20 nm and cured in an oven at 150 ° C for 1 minute to form a low refractive layer. At this time, an ITO layer having a film thickness of 20 nm was formed on the low refractive layer using ITO target of indium: tin = 95: 5 to prepare a transparent conductive film.

Example 2  To 3

A transparent conductive film was prepared in the same manner as in Example 1, except that the hard coating layer was formed using the hard coating layer compositions of Production Examples 1-2 and 1-3.

Example 4

The hard coat layer composition of Preparation Example 1-1 was coated on a PET substrate having a thickness of 125 μm using a Meyer bar to a thickness of 1.5 μm and irradiated with ultraviolet rays of 300 mJ with a 180 W high pressure mercury lamp to form an anti- Respectively.

The hard coating layer composition of Preparation Example 4 was coated on the back surface of the PET substrate to a thickness of 1.5 μm and cured to form a hard coating layer. On the hard coating layer, a high refractive index layer composition of Production Example 3 was formed to a thickness of 50 nm And irradiated with ultraviolet rays of 300 mJ with 180 W of high-pressure mercury to be cured to form a high-refraction layer. Thereafter, the low refraction layer composition of Production Example 2 was coated on the high refraction layer to a thickness of 20 nm and cured in an oven at 150 ° C for 1 minute to form a low refraction layer. At this time, an ITO layer having a film thickness of 20 nm was formed on the low refractive layer using ITO target of indium: tin = 95: 5 to prepare a transparent conductive film.

Example  5 to 6

A transparent conductive film was prepared in the same manner as in Example 4, except that the hard coat layer was formed using the hard coat layer compositions of Production Examples 1-2 and 1-3.

Comparative Example  1 to 2

A transparent conductive film was prepared in the same manner as in Example 1, except that hard coating layers were formed using the hard coating layer compositions of Production Examples 1-4 and 1-5.

Comparative Example  3 to 4

A transparent conductive film was prepared in the same manner as in Example 4, except that the hard coating layer was formed using the hard coating layer compositions of Production Examples 1-4 and 1-5.

Configuration Anti-blocking hard coat layer
(탆) PET substrate
(탆) Hard coating layer
(탆) High-refraction layer
(Nm) Low refraction layer
(Nm) Example 1 0.8 (Preparation Example 1-1) 50 - - 20 Example 2 0.8 (Preparation Example 1-2) 50 - - 20 Example 3 0.8 (Preparation Example 1-3) 50 - - 20 Example 4 1.5 (Production Example 1-1) 125 1.5 50 20 Example 5 1.5 (Preparation Example 1-2) 125 1.5 50 20 Example 6 1.5 (Preparation Example 1-3) 125 1.5 50 20 Comparative Example 1 0.8 (Preparation Example 1-4) 50 - - 20 Comparative Example 2 0.8 (Preparation Example 1-5) 50 - - 20 Comparative Example 3 1.5 (Preparation Example 1-4) 125 1.5 50 20 Comparative Example 4 1.5 (Preparation Example 1-5) 125 1.5 50 20

< Experimental Example > - Physical properties of transparent conductive film

1) Anti-blocking performance: The transparent conductive films of the examples and comparative examples were cut into 10 cm × 10 cm (width X length), and then 10 films of each film were superimposed on the surface of the anti-blocking hard coating layer and placed between SUS plates, The weight was allowed to stand in an oven at 50 ° C for 24 hours. Thereafter, when the film was well separated by the occurrence of anti-blocking property, the film was marked with &amp; cir &amp; if there was no anti-blocking property or partially formed and the film was not well separated.

2) Pencil hardness: The pencil hardness of the transparent conductive film in the above Examples and Comparative Examples was measured according to JIS K 5600-5-4.

3) Transmittance, haze: The transmittance, reflectance and haze of the transparent conductive film in the above Examples and Comparative Examples were measured using CM-5 manufactured by Konica Minolta.

Configuration Anti-blocking performance Pencil hardness Transmittance Haze Example 1 ○ 1H 90 0.3 Example 2 ○ 1H 89.8 0.5 Example 3 ○ 1H 90 0.7 Example 4 ○ 2H 89.8 0.3 Example 5 ○ 2H 89.9 0.5 Example 6 ○ 2H 89.8 0.7 Comparative Example 1 △ 1H 89.1 0.9 Comparative Example 2 △ 1H 89.2 0.85 Comparative Example 3 △ 2H 89.0 0.9 Comparative Example 4 △ 2H 89.1 0.85

The transparent conductive films of Comparative Examples 1 to 4 including an anti-blocking hard coating layer formed of a composition containing spherical silica particles or amorphous silica particles having a large particle diameter had a transmittance And the haze was measured to be high, it was found that excellent optical characteristics could not be realized.

In addition, although the transparent conductive films of Examples 1 to 6 were superimposed, the films did not stick to each other and the films were well separated. As a result, anti-blocking properties were exhibited due to the anti- 4 of the transparent conductive film adhered to each other due to the overlapping of the films and the non-slip phenomenon occurred. As a result, it was found that the anti-blocking performance was not exhibited or the anti-blocking performance was partially exerted due to the weak dispersion of the silica particles.

Claims (14)

Ultraviolet ray curable resin;
Inorganic particles having a particle diameter of 200 nm to 300 nm;
Nano-inorganic particles having a particle diameter of 1 nm to 30 nm; And
Containing a photopolymerization initiator
Anti-blocking hard coat layer composition.
The method according to claim 1,
The inorganic particles are amorphous inorganic particles in which a plurality of primary inorganic particles are aggregated
Anti-blocking hard coat layer composition.
3. The method of claim 2,
The primary inorganic particles have a particle diameter of 1 nm to 50 nm
Anti-blocking hard coat layer composition.
The method according to claim 1,

The nano-inorganic particles are present in a form dispersed in an organic solvent
Anti-blocking hard coat layer composition.
5. The method of claim 4,
Wherein the organic solvent comprises at least one selected from the group consisting of methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), ethanol, toluene, and combinations thereof
Anti-blocking hard coat layer composition.
The method according to claim 1,
10 parts by weight to 70 parts by weight of the ultraviolet curable resin, 1 part by weight to 10 parts by weight of the inorganic particles, 1 part by weight to 20 parts by weight of the nano-inorganic particles, 3 parts by weight of the photopolymerization initiator, By weight to 15 parts by weight
Anti-blocking hard coat layer composition.
The method according to claim 1,
Wherein the inorganic particles and the nano-inorganic particles comprise at least one metal oxide selected from the group consisting of silica, alumina, zirconium oxide, and combinations thereof
A composition for coating a hard coat layer.
An anti-blocking hard coat layer formed by the anti-blocking hard coat layer composition according to any one of claims 1 to 7
Transparent conductive film.
9. The method of claim 8,
Wherein the anti-blocking hard coat layer comprises a fine uneven shape on the surface
Transparent conductive film.
10. The method of claim 9,
The micro concavo-convex shape is formed by floating the inorganic particles when applying the anti-blocking hard coat layer composition
Transparent conductive film.
9. The method of claim 8,
The thickness of the anti-blocking hard coating layer is 500 nm to 3 um
Transparent conductive film.
9. The method of claim 8,
The optical information recording medium according to claim 1, wherein the anti-blocking hard coating layer is formed on one surface of the transparent substrate,
And a high refractive index layer, a low refractive index layer and a conductive layer sequentially on the back surface of the transparent substrate
Transparent conductive film.
13. The method of claim 12,
Further comprising a hard coat layer between the transparent substrate and the high refractive index layer
Transparent conductive film.
14. The method of claim 13,
Wherein the hard coat layer comprises a hard coat layer composition comprising an ultraviolet light curable resin, a nanosinus particle having a particle diameter of 1 nm to 30 nm, and a photopolymerization initiator
Transparent conductive film.

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