KR20150099408A - 합성 반강자성 판독기 - Google Patents
합성 반강자성 판독기 Download PDFInfo
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- KR20150099408A KR20150099408A KR1020150014508A KR20150014508A KR20150099408A KR 20150099408 A KR20150099408 A KR 20150099408A KR 1020150014508 A KR1020150014508 A KR 1020150014508A KR 20150014508 A KR20150014508 A KR 20150014508A KR 20150099408 A KR20150099408 A KR 20150099408A
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- 230000005290 antiferromagnetic effect Effects 0.000 title claims abstract description 9
- 230000005291 magnetic effect Effects 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 21
- 230000005415 magnetization Effects 0.000 description 50
- 230000008859 change Effects 0.000 description 12
- 230000007704 transition Effects 0.000 description 9
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 230000033001 locomotion Effects 0.000 description 8
- 125000006850 spacer group Chemical group 0.000 description 7
- 230000005641 tunneling Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3909—Arrangements using a magnetic tunnel junction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/02—Recording, reproducing, or erasing methods; Read, write or erase circuits therefor
- G11B5/09—Digital recording
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/398—Specially shaped layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Magnetic Heads (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
도 2는 판독기에서의 자화 및 자화 회전의 예시적 3-차원 도면을 예시한다.
도 3은 미디어 트랜지션(media transition)의 다운트랙 리드백(downtrack readback) 동안, 도 2의 판독기의 자유 층 각도 도함수(angle derivative)의 예시적 그래픽 묘사를 예시한다.
도 4는 미디어 트랜지션의 다운트랙 리드백 동안, 도 2의 판독기의 기준 층 각도 도함수의 예시적 그래픽 묘사를 예시한다.
도 5는 미디어 트랜지션의 다운트랙 리드백 동안, 예시적 판독기의 신호 도함수의 그래픽 묘사를 예시한다.
도 6은 상이한 SAF 비율들을 갖는 판독기에 대한 PW50 대 SAF 피닝의 예시적 그래픽 묘사를 예시한다.
Claims (20)
- 장치로서,
합성 반강자성(SAF:synthetic antiferromagnetic) 구조물
을 포함하고,
상기 SAF 구조물의 피닝(pinning)된 층의 총 모멘트(MrT)는 상기 SAF 구조물의 기준 층의 총 모멘트(MrT)보다 실질상 더 큰,
장치. - 제 1 항에 있어서,
상기 피닝된 층의 자기 모멘트(Mr)는 상기 기준 층의 자기 모멘트(Mr)와 비교하여 실질상 더 크고, 상기 피닝된 층의 두께는 상기 기준 층의 두께와 유사한,
장치. - 제 1 항에 있어서,
상기 피닝된 층의 두께는 상기 기준 층의 두께와 비교하여 실질상 더 두껍고, 상기 피닝된 층의 자기 모멘트(Mr)는 상기 기준 층의 자기 모멘트(Mr)와 유사한,
장치. - 제 1 항에 있어서,
상기 피닝된 층의 MrT 및 상기 기준 층의 MrT의 비율은 1.1보다 실질상 더 높은,
장치. - 제 1 항에 있어서,
상기 피닝된 층의 피닝 강도는 0.9 erg/㎠보다 실질상 더 낮은,
장치. - 제 1 항에 있어서,
상기 SAF 구조물은 MR 센서의 센서 스택에서 사용되는,
장치. - 제 1 항에 있어서,
상기 SAF 구조물은 피닝된 바닥 차폐부에서 사용되는,
장치. - 제 1 항에 있어서,
상기 피닝된 층의 자기 모멘트(Mr) 및 상기 기준 층의 자기 모멘트(Mr)의 비율은 1.1보다 실질상 더 높고, 상기 피닝된 층의 두께는 상기 기준 층의 두께와 유사한,
장치. - 제 1 항에 있어서,
상기 SAF 구조물의 피닝 강도는 0.5 erg/㎠보다 실질상 더 낮은,
장치. - 방법으로서,
센서 스택의 합성 반강자성(SAF) 구조물에서 피닝된 층의 총 모멘트(MrT) 및 기준 층의 총 모멘트(MrT)의 비율을 제어함으로써, 상기 센서 스택의 PW50을 제어하는 단계
를 포함하는,
방법. - 제 10 항에 있어서,
상기 피닝된 층의 상기 MrT의 모멘트 및 상기 기준 층의 상기 MrT의 모멘트의 비율은 1.1보다 실질상 더 높게 증가되는,
방법. - 제 10 항에 있어서,
상기 SAF 구조물의 피닝 강도를 실질상 0.9 erg/㎠ 미만으로 감소시키는 단계
를 더 포함하는,
방법. - 제 10 항에 있어서,
상기 피닝된 층의 총 모멘트(MrT) 및 기준 층의 총 MrT 모멘트의 비율을 제어하는 단계는, 상기 기준 층의 모멘트와 비교하여 상기 피닝 층의 상대 모멘트를 제어하는 단계를 더 포함하는,
방법. - 제 10 항에 있어서,
상기 피닝된 층의 총 모멘트(MrT) 및 기준 층의 총 모멘트(MrT)의 비율을 제어하는 단계는, 상기 기준 층의 두께와 비교하여 상기 피닝 층의 상대 두께를 제어하는 단계를 더 포함하는,
방법. - 방법으로서,
센서 스택의 합성 반강자성(SAF) 구조물을 언밸런싱함으로써, 상기 센서 스택의 PW50을 제어하는 단계
를 포함하는,
방법. - 제 15 항에 있어서,
상기 SAF 구조물을 언밸런싱하는 것은, 기준 층의 총 모멘트와 비교하여 더 큰 총 모멘트를 갖도록, 피닝된 층에 유리하게 상기 SAF 구조물을 언밸런싱하는 것을 더 포함하는,
방법. - 제 15 항에 있어서,
상기 SAF 구조물의 피닝된 층의 피닝 강도를 감소시킴으로써, 상기 센서 스택의 상기 PW50을 제어하는 단계
를 더 포함하는,
방법. - 제 17 항에 있어서,
상기 피닝된 층의 피닝 강도는 0.9 erg/㎠보다 더 낮은,
방법. - 제 15 항에 있어서,
상기 SAF 구조물을 언밸런싱하는 것은 1.1을 초과하는 SAF 비율을 갖도록 상기 SAF 구조물을 언밸런싱하는 것을 더 포함하는,
방법. - 제 19 항에 있어서,
상기 SAF 구조물을 언밸런싱하는 것은 상기 피닝된 층의 자기 모멘트(Mr) 및 상기 기준 층의 자기 모멘트(Mr)의 비율을 1.2를 초과하게 증가시키는 것을 더 포함하는,
방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/167,575 | 2014-01-29 | ||
US14/167,575 US20150213815A1 (en) | 2014-01-29 | 2014-01-29 | Synthetic antiferromagnetic reader |
Publications (2)
Publication Number | Publication Date |
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KR20150099408A true KR20150099408A (ko) | 2015-08-31 |
KR101763741B1 KR101763741B1 (ko) | 2017-08-16 |
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US (1) | US20150213815A1 (ko) |
JP (1) | JP2015156247A (ko) |
KR (1) | KR101763741B1 (ko) |
Families Citing this family (6)
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US9691417B1 (en) | 2013-06-28 | 2017-06-27 | Seagate Technology Llc | Magnetoresistive sensor having a synthetic antiferromagnetic bottom shield |
DE102019107689A1 (de) * | 2019-03-26 | 2020-10-01 | Sensitec Gmbh | Schichtstruktur für einen magnetoresistiven Magnetfeldsensor, magnetoresistiver Magnetfeldsensor und Verfahren zu deren Herstellung |
US11506734B2 (en) | 2019-02-01 | 2022-11-22 | Sensitec Gmbh | Arrangement of adjacent layer structures for a magnetoresistive magnetic field sensor, magnetoresistive magnetic field sensor and method for producing |
US10714136B1 (en) * | 2019-09-06 | 2020-07-14 | Headway Technologies, Inc. | Alternative designs for magnetic recording assisted by two spin hall effect (SHE) layers in the write gap |
US10748562B1 (en) | 2019-11-12 | 2020-08-18 | Headway Technologies, Inc. | Third alternative design for magnetic recording assisted by one or two spin hall effect (SHE) layers in the write gap |
US11500042B2 (en) | 2020-02-28 | 2022-11-15 | Brown University | Magnetic sensing devices based on interlayer exchange-coupled magnetic thin films |
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JP2004296000A (ja) * | 2003-03-27 | 2004-10-21 | Hitachi Ltd | 磁気抵抗効果型ヘッド、及びその製造方法 |
JP3974587B2 (ja) * | 2003-04-18 | 2007-09-12 | アルプス電気株式会社 | Cpp型巨大磁気抵抗効果ヘッド |
US7408747B2 (en) * | 2005-02-01 | 2008-08-05 | Hitachi Global Storage Technologies Netherlands B.V. | Enhanced anti-parallel-pinned sensor using thin ruthenium spacer and high magnetic field annealing |
US20080055792A1 (en) * | 2006-03-07 | 2008-03-06 | Agency For Science, Technology And Research | Memory cells and devices having magnetoresistive tunnel junction with guided magnetic moment switching and method |
JP2008021896A (ja) * | 2006-07-14 | 2008-01-31 | Tdk Corp | Cpp構造のgmr素子、薄膜磁気ヘッド、ヘッドジンバルアセンブリおよびハードディスク装置 |
JP2008041163A (ja) * | 2006-08-04 | 2008-02-21 | Hitachi Global Storage Technologies Netherlands Bv | 垂直通電型磁気抵抗効果型ヘッド |
US8031441B2 (en) * | 2007-05-11 | 2011-10-04 | Headway Technologies, Inc. | CPP device with an enhanced dR/R ratio |
US8305715B2 (en) * | 2007-12-27 | 2012-11-06 | HGST Netherlands, B.V. | Magnetoresistance (MR) read elements having an active shield |
US8289663B2 (en) * | 2008-04-25 | 2012-10-16 | Headway Technologies, Inc. | Ultra low RA (resistance x area) sensors having a multilayer non-magnetic spacer between pinned and free layers |
US7834385B2 (en) * | 2008-08-08 | 2010-11-16 | Seagate Technology Llc | Multi-bit STRAM memory cells |
US8049997B2 (en) * | 2008-09-29 | 2011-11-01 | Tdk Corporation | Magnetoresistive element including a pair of free layers coupled to a pair of shield layers |
US8125746B2 (en) * | 2009-07-13 | 2012-02-28 | Seagate Technology Llc | Magnetic sensor with perpendicular anisotrophy free layer and side shields |
US8564903B2 (en) * | 2011-05-16 | 2013-10-22 | Headway Technologies, Inc. | Writer with an AFM write gap |
US8462461B2 (en) * | 2011-07-05 | 2013-06-11 | HGST Netherlands B.V. | Spin-torque oscillator (STO) with magnetically damped free layer |
TW201327956A (zh) * | 2011-12-28 | 2013-07-01 | Ind Tech Res Inst | 磁感應器 |
US8900884B2 (en) * | 2012-06-18 | 2014-12-02 | Headway Technologies, Inc. | MTJ element for STT MRAM |
-
2014
- 2014-01-29 US US14/167,575 patent/US20150213815A1/en not_active Abandoned
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- 2015-01-29 JP JP2015015515A patent/JP2015156247A/ja active Pending
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US20150213815A1 (en) | 2015-07-30 |
KR101763741B1 (ko) | 2017-08-16 |
JP2015156247A (ja) | 2015-08-27 |
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