KR20150092389A - Developing apparatus and developing method using the same - Google Patents

Abstract

The present invention relates to a developing device comprising: a transferring unit for transferring a substrate to be treated in a first direction for a first period, transferring the same in a second direction opposed to the first direction during a second period following the first period, and transferring the same in the first direction during a third period following the second period; and a first developing nozzle disposed on the transferring unit to be separated from the transferring unit, and discharging a developing liquid on the substrate to be treated.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a development apparatus,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing apparatus, a photolithography apparatus including the same, and a developing method using the same. More particularly, the present invention relates to a developing apparatus capable of improving reliability, a photolithography apparatus including the same, and a developing method using the same.

In general, a liquid crystal display device is divided into a display panel for displaying an image and a driver for driving the display panel. The display panel includes a first substrate, a second substrate facing the first substrate, and a liquid crystal layer formed between the first substrate and the second substrate.

The first substrate may include a plurality of gate lines arranged in a predetermined direction, a plurality of data lines arranged in a direction perpendicular to the gate lines, a thin film transistor, a pixel electrode, and the like. The second substrate may include a color filter, a common electrode, and the like.

The liquid crystal display device includes an array process for forming the gate line, the data line, the thin film transistor and the like on a transparent substrate such as glass, a cell process for forming the liquid crystal layer, Module process.

The array process includes a photolithography process and an etching process.

The photolithography process is a process in which a pattern material to be formed on a transparent substrate and a photoresist (PR) are coated to a predetermined thickness, a glass substrate coated with a photoresist, and a mask having a desired pattern shape An exposure process of aligning the photoresist to expose the photoresist by irradiating a light source onto the aligned photoresist, and a developing process of selectively exposing the photoresist exposed to the photoresist using a developing solution.

The etching process dissolves the pattern material in the pattern of the photoresist formed on the transparent substrate.

In the developing step, the degree of development by the developer is uniformly controlled by the difference in turbidity of the developer due to the density difference of the pattern, the difference in flowability of the developer due to the advancing direction of the transparent substrate, and the flowability of the developer due to the liquid- And the critical dimension (CD) is increased.

SUMMARY OF THE INVENTION Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide a developing apparatus capable of reducing a critical dimension and improving reliability in a developing process.

Another object of the present invention is to provide a developing method using the developing apparatus.

According to an aspect of the present invention, there is provided a developing apparatus for transferring a substrate to be processed in a first direction for a first period of time and for opposing the first direction during a second period subsequent to the first period, A transporting unit for transporting the substrate in the first direction for a third period subsequent to the second period and a transporting unit for transporting the developing solution on the transporting unit, the transporting unit being spaced apart from the transporting unit, 1 development nozzle.

In an embodiment of the present invention, the developing device may further include a second developing nozzle that is disposed apart from the first developing nozzle in the first direction, and discharges the developer on the substrate to be processed.

In one embodiment of the present invention, the first developing nozzle discharges the developing solution onto the substrate in the first period, and the second developing nozzle discharges the developing solution on the substrate in the second period The developing solution can be discharged.

In an embodiment of the present invention, the second developing nozzle may gradually increase the discharge amount of the developer depending on the degree to which the substrate is transferred in the second direction.

In an embodiment of the present invention, the second developing nozzle may be disposed at least one quarter of the length of the conveying portion in the first direction from the first developing nozzle.

In an embodiment of the present invention, the first developing nozzle and the second developing nozzle may include nozzles in the form of lip.

In an embodiment of the present invention, the first developing nozzle includes a nozzle in the form of a lip, and the second developing nozzle may include a nozzle in the form of a spray.

In one embodiment of the present invention, the first developing nozzle may discharge the developer to the substrate to be processed in the first period and the second period.

In one embodiment of the present invention, the first developing nozzle may gradually increase the discharge amount of the developer in accordance with the degree to which the substrate is transferred in the second direction in the second period.

In one embodiment of the present invention, the transfer unit may include a roller.

In one embodiment of the present invention, the transfer unit may remove the developer by inclining the substrate to be processed in a second direction perpendicular to the first direction during a fourth period following the third period.

According to another aspect of the present invention, there is provided a developing method including discharging a developer on a substrate to be transferred in a first direction using a first developing nozzle during a first period of time, Transferring the substrate to be processed in a second direction opposite to the first direction during a second period subsequent to the first period, and transferring the substrate to be processed in the first direction for a third period subsequent to the second period .

In one embodiment of the present invention, the step of transferring in the second direction comprises

The developer can be discharged using the second developing nozzle on the substrate to be transferred in the second direction during the second period.

In an embodiment of the present invention, the second developing nozzle may be disposed apart from the first developing nozzle in the first direction.

In one embodiment of the present invention, the step of ejecting the developer using the second developing nozzle may gradually increase the ejection amount of the developer in accordance with the degree of conveyance of the substrate to be processed in the second direction .

In an embodiment of the present invention, the first developing nozzle and the second developing nozzle may include nozzles in the form of lip.

In an embodiment of the present invention, the first developing nozzle includes a nozzle in the form of a lip, and the second developing nozzle may include a nozzle in the form of a spray.

In one embodiment of the present invention, the step of transferring in the second direction comprises

The developing solution can be discharged on the substrate to be transferred in the second direction during the second period by using the first developing nozzle.

In one embodiment of the present invention, the first developing nozzle may gradually increase the discharge amount of the developer depending on the degree to which the substrate is transferred in the second direction during the second period.

In one embodiment of the present invention, the method may further include removing the developer by inclining the substrate to be processed in a second direction perpendicular to the first direction during a fourth period subsequent to the third period.

According to such a developing apparatus and a developing method using the same, the reliability of the developing process can be improved by improving the dispersion of the critical dimension in the developing process.

1 is a block diagram showing a photolithography apparatus according to an embodiment of the present invention.
Fig. 2 is a perspective view showing the developing apparatus of Embodiment 1. Fig.
3A to 3D are perspective views showing a developing process of the developing apparatus of FIG.
4 is a perspective view showing a developing apparatus according to Embodiment 2 of the present invention.
FIGS. 5A to 5G are perspective views illustrating developing processes of the developing apparatus of FIG.
6 is a perspective view showing a developing apparatus according to Embodiment 3 of the present invention.
7 is a perspective view showing a developing apparatus according to Embodiment 4 of the present invention.
8 is a perspective view showing a developing apparatus according to Embodiment 5 of the present invention.
9A to 9D are perspective views showing developing processes of the developing apparatus in Fig.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in more detail with reference to the accompanying drawings.

1 is a block diagram showing a photolithography apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the photolithography apparatus includes a coating apparatus 100, an exposure apparatus 200, and a developing apparatus 300.

The coating apparatus 100 applies a pattern material to be formed on a substrate to be processed and a photo resist (PR) to a predetermined thickness. The pattern material is formed between the substrate to be processed and the photoresist. If the pattern does not have an electrical function other than the maintenance of the gap between the substrates of the display panel like the column spacer, the photoresist alone may be applied to form a pattern with the photoresist. The photoresist includes a photosensitive polymer compound that reacts when light of a specific wavelength is received.

The exposure apparatus 200 aligns the pattern material and the photoresist or the mask on which the predetermined pattern is drawn with the photoresist or the photoresist, and irradiates a light source on the aligned mask, Selectively sensitized.

The developing apparatus 300 selectively dissolves the photoresist selectively photographed by the mask using a developer. The developing apparatus will be described in detail later with reference to FIG.

The photolithography apparatus may further include a scrubber, a drying device, a vacuum drier, a prebaker, a pattern inspector, an oven, and a cooling device.

The cleaner cleans the substrate that has been put into the photolithography apparatus before the coating apparatus 100.

The drying apparatus removes the cleaning liquid used in the cleaner by applying heat.

The vacuum dryer is positioned between the coating apparatus 100 and the exposure apparatus 200 to dry the target substrate coated with the photoresist from the coating apparatus 100.

The pre-baker removes the solvent of the photoresist before the exposure apparatus 200. The solvent of the photoresist may include a solvent.

The pattern inspecting unit inspects the developed pattern on the substrate after the substrate is developed in the developing apparatus 300.

The oven unit heat-treats the developed substrate.

The cooling unit cools the substrate subjected to heat treatment in the oven.

Hereinafter, the developing apparatus 300 will be described in detail.

Fig. 2 is a perspective view showing the developing apparatus of Embodiment 1. Fig. 3A to 3D are perspective views showing a developing process of the developing apparatus of FIG.

1 to 3D, the developing apparatus 300 includes a transfer unit 310, a first developing nozzle 320, and a second developing nozzle 330.

The transfer unit 310 seats the target substrate 10 passed through the exposure apparatus 200 and transfers the target substrate 10 in the first direction D1. The transfer unit 310 may include a plurality of rollers. The plurality of rollers extend in a second direction D2 perpendicular to the first direction D1 and are continuously arranged in the first direction D1.

The first developing nozzle 320 is disposed on the transfer unit 310 to discharge the developing solution onto the substrate 10 to be processed. The first developing nozzle 320 may be formed on the transfer unit 310 at one end of the transfer unit 310 that is inserted into the substrate 10. The first developing nozzle 320 may be formed on the transfer unit 310 at a predetermined distance from the one end of the transfer unit 310 in the first direction D1.

The first developing nozzle 320 may include a lip-shaped nozzle having a slit formed therein to discharge the developing solution through the slit.

The substrate 10 to be processed includes a first end located in the first direction and a second end opposite to the first end. The substrate 10 to be processed includes a plurality of cells, and each cell forms a substrate of the display panel.

The first developing nozzle 320 is moved from the first end to the second end of the target substrate 10 as the substrate 10 is transported in the first direction D1, .

The second developing nozzle 330 is disposed on the transferring unit 310 in the first direction D1 and is spaced apart from the first developing nozzle 320 in the first direction D1. More specifically, the second developing nozzle 330 may be disposed at a distance equal to or greater than a quarter of the length of the conveying unit 310 in the first direction D1 from the first developing nozzle 320. Or the second developing nozzles 330 may be disposed after 25% of the entire length of the conveying unit 310. [ Alternatively, the second developing nozzles 330 may be disposed at the second or later stage when the transferring unit 310 has four stages. Or the second developing nozzle 330 may be disposed at a position capable of discharging the developer 20 seconds after the start of development if the total developing time corresponds to 70 seconds.

The second developing nozzle 330 discharges the developing solution onto the substrate 10 to be processed. The developing solution discharged by the second developing nozzle 330 may be the same as the developing solution discharged by the first developing nozzle 320. Alternatively, the developing solution discharged by the second developing nozzle 330 may be different from the developing solution discharged by the first developing nozzle 320.

The second developing nozzle 330 is moved in a direction from the first end of the substrate 10 to the second end as the substrate 10 is transported in the first direction D1, .

The amount of the developing solution discharged by the second developing nozzle 330 may vary. For example, the amount of developer discharged from the second developing nozzle 330 to the substrate 10 may increase as the developer flows from the first end toward the second end.

The second developing nozzle 330 may include a lip-shaped nozzle having a slit formed therein to discharge the developing solution through the slit.

The developing apparatus 300 develops the target substrate 10 in a puddle manner. For example, the substrate to be processed 10 is transferred in a state in which the developer is discharged onto the upper side. The photoresist on the substrate 10 is developed by the developer while being transferred.

The developing apparatus 300 may discard the developer by inclining the target substrate 10 in the second direction D2 after the target substrate 10 is transferred in the first direction D1.

Hereinafter, the operation of the developing apparatus 300 according to the progress of the substrate to be processed 10 will be examined.

3A through 3D, when the substrate to be processed 10 passes between the first developing nozzle 320 and the transferring unit 310, the first developing nozzle 320 operates, The developing solution 30a is discharged onto the photosensitive drum 10. When the substrate to be processed 10 passes through the first developing nozzle 320, the first developing nozzle 320 stops its operation. The second developing nozzle 330 may be moved in the first direction D1 while the substrate 10 is continuously conveyed by the conveying unit and passes between the second developing nozzle 330 and the conveying unit 310. [ And discharges the developer 30b onto the substrate 10 to be processed. The developer 30a discharged from the first developing nozzle 320 dissolves the photoresist over time and increases the turbidity. The second developing nozzle 330 may additionally discharge the developing solution 30b to the developing solution 30a having increased turbidity, thereby lowering the turbidity of the developing solution on the substrate. The developing solution 30a discharged by the first developing nozzle 320 and the developing solution 30b discharged by the second developing nozzle 330 may be identical to each other. The developing solution 30a discharged by the first developing nozzle 320 and the developing solution 30b discharged by the second developing nozzle 330 may be different from each other.

4 is a perspective view showing a developing apparatus according to Embodiment 2 of the present invention. FIGS. 5A to 5G are perspective views illustrating developing processes of the developing apparatus of FIG.

The developing apparatus 301 according to the present embodiment is different from the developing apparatus shown in Figs. 2 to 3d in that the developing apparatus 301 according to this embodiment differs from the developing apparatus shown in Figs. 2 to 3d, except that the transfer section 311 and the second developing nozzle 331 are different. . Therefore, the same members as those of the developing apparatuses of Figs. 2 to 3 are denoted by the same reference numerals, and redundant description may be omitted.

Referring to Figs. 1 and 4 to 5G, the developing apparatus 301 includes a transfer section 311, a first developing nozzle 320, and a second developing nozzle 331.

The transfer unit 311 seats the substrate 10 passed through the exposure apparatus 200 and transfers the substrate 10 in a first direction D1 for a first period of time, Direction D2 and again in the first direction D1 during a third period subsequent to the second period.

The transfer unit 311 transfers the substrate 10 in the second direction D2 after the substrate 10 is transferred in the first direction D1 during a fourth period following the third period ) To discard the developer.

The transfer unit 311 may include a plurality of rollers. The plurality of rollers extend in the second direction D2 and are continuously arranged in the first direction D1.

The first developing nozzle 320 is disposed on the conveying unit 311 to discharge the developing solution onto the substrate 10 to be processed.

The first developing nozzle 320 is moved from the first end of the target substrate 10 to the second end of the target substrate 10 as the substrate 10 is transported in the first direction D1 during the first period. Thereby discharging the developer in the end direction.

The second developing nozzle 331 is disposed on the conveying unit 311 in the first direction D1 and spaced apart from the first developing nozzle 320. [ More specifically, the second developing nozzles 331 may be disposed apart from the first developing nozzles 320 by at least a quarter of the length of the conveying unit 311 in the first direction D1. Alternatively, the second developing nozzles 331 may be disposed after 25% of the entire length of the conveying unit 311. Alternatively, the second developing nozzles 331 may be disposed after the second stage when the conveying unit 311 has four stages. Alternatively, the second developing nozzle 331 may be disposed at a position capable of discharging the developer 20 seconds after the start of development if the total developing time corresponds to 70 seconds.

The second developing nozzle 331 discharges the developing solution onto the substrate 10 to be processed. The developing solution discharged by the second developing nozzle 331 may be the same as the developing solution discharged by the first developing nozzle 320. The developer to be discharged by the second developing nozzle 331 may be different from the developer to be discharged by the first developing nozzle 320

The second developing nozzle 331 is moved from the second end of the substrate 10 to be processed 10 to the first side of the substrate 10 as the substrate 10 is transported in the second direction D2 during the second period. Thereby discharging the developer in the end direction.

The amount of the developing solution discharged by the second developing nozzle 331 may be variable. For example, the amount of the developer discharged from the second developing nozzle 331 to the substrate 10 may increase as the second developing nozzle 331 advances from the second end to the first end.

The second developing nozzle 331 may include a lip-shaped nozzle having a slit formed therein to discharge the developing solution through the slit.

Hereinafter, the operation of the developing apparatus 301 according to the progress of the substrate 10 will be examined.

5A to 5C show the operation of the developing apparatus 301 in the first period, and Figs. 5D and 5E show the operation of the developing apparatus 301 in the second period. Fig. 5F and 5G show the operation of the developing apparatus 301 in the third period.

The first developing nozzle 320 operates when the to-be-processed substrate 10 passes between the first developing nozzle 320 and the transfer unit 311 during the first period, And the developing solution 30a is discharged onto the developing roller 30a. When the substrate to be processed 10 passes through the first developing nozzle 320, the first developing nozzle 320 stops its operation. The target substrate 10 is continuously transported in the first direction D1 by the transporting unit 311 and is transported between the second developing nozzle 331 and the transporting unit 311 in the first direction D1 The second developing nozzle 331 does not operate.

The second developing nozzle 331 is operated when the to-be-processed substrate 10 passes between the second developing nozzle 331 and the conveying unit 311 in the second direction D2 during the second period And discharges the developer 30b onto the substrate 10 to be processed. The developer 30a discharged from the first developing nozzle 320 dissolves the photoresist over time and increases the turbidity. The second developing nozzle 331 may further discharge the developing solution 30b to the developing solution 30a having increased turbidity, thereby lowering the turbidity of the developing solution on the substrate. The developing solution 30a discharged by the first developing nozzle 320 and the developing solution 30b discharged by the second developing nozzle 330 may be identical to each other. The developing solution 30a discharged by the first developing nozzle 320 and the developing solution 30b discharged by the second developing nozzle 330 may be different from each other.

During the third period, the substrate 10 is transported again in the first direction D1. The first developing nozzle 320 and the second developing nozzle 331 do not operate during the third period.

6 is a perspective view showing a developing apparatus according to Embodiment 3 of the present invention.

The developing apparatus 302 according to the present embodiment is substantially the same as the developing apparatus of Figs. 2 to 3d except that the second developing nozzle 340 is different from the developing apparatus of Figs. 2 to 3d . Therefore, the same members as those of the developing apparatuses of Figs. 2 to 3 are denoted by the same reference numerals, and redundant description may be omitted.

1 and 6, the developing apparatus 302 includes a transfer unit 310, a first developing nozzle 320, and a second developing nozzle 340.

The second developing nozzle 340 is disposed on the transferring part 310 in the first direction D1 with respect to the first developing nozzle 320. More specifically, the second developing nozzles 340 may be disposed apart from the first developing nozzles 320 by at least a quarter of the length of the conveying unit 310 in the first direction D1. Alternatively, the second developing nozzles 340 may be disposed after 25% of the entire length of the transporting unit 310. Alternatively, the second developing nozzles 340 may be disposed at the second stage after the conveying unit 310 has four stages. Alternatively, the second developing nozzle 340 may be disposed at a position capable of discharging the developer 20 seconds after the start of development if the entire development time corresponds to 70 seconds.

The second developing nozzle 340 discharges the developing solution to the substrate 10 to be processed. The developing solution discharged by the second developing nozzle 340 may be the same as the developing solution discharged by the first developing nozzle 320. Alternatively, the developing solution discharged by the second developing nozzle 340 may be different from the developing solution discharged by the first developing nozzle 320.

The second developing nozzle 340 is moved in a direction from the first end of the substrate 10 to the second end as the substrate 10 is transported in the first direction D1, .

The amount of the developing solution discharged by the second developing nozzle 340 may be variable. For example, the amount of developer discharged by the second developing nozzle 340 onto the substrate 10 may increase as the developer flows from the first end toward the second end.

The second developing nozzle 340 may include a spray-type nozzle for spraying the developer in a spray form over the entire area of the substrate 10 to be processed.

The operation of the developing apparatus 302 according to the progress of the substrate to be processed 10 may be substantially the same as the operation of the developing apparatus 300 described with reference to FIGS. 3A to 3D.

7 is a perspective view showing a developing apparatus according to Embodiment 4 of the present invention.

The developing apparatus 303 according to the present embodiment is substantially the same as the developing apparatus of Figs. 4 to 5G except that the second developing nozzle 341 is different from the developing apparatus of Figs. 4 to 5G . Therefore, the same members as those of the developing apparatuses of Figs. 4 to 5G are denoted by the same reference numerals, and redundant description can be omitted.

1 and 7, the developing apparatus 303 includes a transfer section 311, a first developing nozzle 320, and a second developing nozzle 341.

The second developing nozzle 341 is spaced apart from the first developing nozzle 320 in the first direction D1 and is disposed on the conveying unit 311. More specifically, the second developing nozzle 341 may be disposed at a distance of at least a quarter of the length of the conveying unit 311 in the first direction D1 from the first developing nozzle 320. Alternatively, the second developing nozzle 341 may be disposed after 25% of the entire length of the conveying unit 311. Alternatively, the second developing nozzles 341 may be disposed at the second stage after the conveying unit 311 has four stages. Alternatively, the second developing nozzle 341 may be disposed at a position capable of discharging the developer 20 seconds after the start of development if the total developing time corresponds to 70 seconds.

The second developing nozzle 341 discharges the developing solution to the substrate 10 to be processed. The developing solution discharged by the second developing nozzle 341 may be the same as the developing solution discharged by the first developing nozzle 320. In contrast, the developing solution discharged by the second developing nozzle 341 may be different from the developing solution discharged by the first developing nozzle 320.

The second developing nozzle 341 is moved from the second end of the to-be-processed substrate 10 to the first end of the first substrate W1 as the substrate 10 is transported in the second direction D2 during the second period, Thereby discharging the developer in the end direction.

The amount of the developing solution discharged by the second developing nozzle 341 may be variable. For example, the amount of developer discharged from the second developing nozzle 341 to the substrate 10 may increase as the developer flows from the second end toward the first end.

The second developing nozzle 341 may include a nozzle in the form of a spray for discharging the developer in a spray form over the entire area of the substrate 10 to be processed.

The operation of the developing apparatus 303 according to the progress of the substrate 10 to be processed can be substantially the same as the operation of the developing apparatus 301 described in Figs. 5A to 5G.

8 is a perspective view showing a developing apparatus according to Embodiment 5 of the present invention. 9A to 9D are perspective views showing developing processes of the developing apparatus in Fig.

Referring to Figs. 1 and 8 to 9D, the developing apparatus 304 includes a transfer section 312 and a first developing nozzle 321. [

The transfer unit 312 is configured to receive the substrate 10 that has passed through the exposure apparatus 200 and transfer the substrate 10 in a first direction D1 for a first period of time and for a second period subsequent to the first period, Direction D2 and again in the first direction D1 during a third period subsequent to the second period.

The transfer unit 312 transfers the substrate 10 in the second direction D2 after the substrate 10 is transferred in the first direction D1 during a fourth period following the third period ) To discard the developer.

The transfer unit 312 may include a plurality of rollers. The plurality of rollers extend in the second direction D2 and are continuously arranged in the first direction D1.

The first developing nozzle 321 is disposed on the conveying unit 312 and discharges the developer to the substrate 10 to be processed.

The first developing nozzle 321 is moved from the first end of the target substrate 10 to the second end of the target substrate 10 as the substrate 10 is transported in the first direction D1 during the first period, Thereby discharging the developer in the end direction.

The first developing nozzle 321 is moved from the second end of the substrate 10 to be processed 10 to the first side of the substrate 10 during the second period as the substrate 10 is transferred in the second direction D2. Thereby discharging the developer in the end direction.

The amount of the developing solution discharged by the first developing nozzle 321 may be variable. For example, the amount of developer discharged from the first developing nozzle 321 to the substrate 10 during the second period may increase as the developer proceeds from the second end toward the first end.

The first developing nozzle 321 may include a lip-shaped nozzle having a slit formed therein to discharge the developing solution through the slit.

Hereinafter, the operation of the developing apparatus 304 according to the progress of the substrate 10 will be examined.

9A to 9D show the operation of the developing apparatus 304 in the first period and FIGS. 9B and 9C show the operation of the developing apparatus 304 in the second period And Fig. 9D shows the operation of the developing apparatus 304 in the third period.

The first developing nozzle 321 operates when the substrate to be processed 10 passes between the first developing nozzle 321 and the transferring part 312 during the first period so that the to- And the developing solution 30a is discharged onto the developing roller 30a. When the substrate to be processed 10 passes through the first developing nozzle 321, the first developing nozzle 321 stops operating. The development proceeds while the substrate 10 is continuously transported in the first direction D1 by the transporting unit 312. [

The first developing nozzle 321 is moved back in the second direction D2 between the first developing nozzle 321 and the transferring unit 312 during the second period in the second direction D2 And discharges the developer 30b onto the substrate 10 to be processed. The developer 30a discharged from the first developing nozzle 321 dissolves the photoresist over time and has a higher turbidity. The first developing nozzle 321 may further discharge the developing solution 30b to the developing solution 30a having increased turbidity, thereby lowering the turbidity of the developing solution on the substrate. The developing solution 30a and the developing solution 30b discharged by the first developing nozzle 321 may be the same as each other. The developer 30a and the developer 30b discharged by the first developing nozzle 321 may be different from each other.

During the third period, the substrate 10 is transported again in the first direction D1. The first developing nozzle 321 does not operate during the third period.

The transfer unit 312 may adjust the transfer speed of the substrate 10 to adjust the time interval between the first period and the third period. For example, the first direction (D1) conveyance speed during the first period, the second direction (D2) conveyance speed during the second period, and the first direction (D1) conveyance speed during the third period Can be adjusted to be different from each other in accordance with the degree of development of the developer 30a and the developer 30b.

According to the embodiments of the present invention, critical dimension (CD) scattering can be improved because only the undeveloped portion is dissolved by the increase in developer turbidity in the exposure area when the additional developer is supplied due to the additional supply of developer . In addition, it is possible to minimize the CD difference between the distal end portion and the distal end portion of the substrate to be processed by changing the amount of the developing solution discharged from the nozzles when supplying the additional developing solution, transporting the target substrate in the opposite direction, and supplying the developing solution. This makes it possible to improve the reliability of the developing process.

The developing apparatus according to an exemplary embodiment of the present invention may be incorporated in general household appliances such as a refrigerator, a washing machine, and an air conditioner as well as a fixed display device such as a television or a desktop monitor of a portable display device such as a mobile phone, a notebook computer, And can also be used for substrate development of a display device.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined in the appended claims. It will be possible.

10: substrate to be processed 30a, 30b: developer
100: Coating device 200: Exposure device
300: developing apparatus 310, 311, 312:
320, 321: first developing nozzles 330, 331, 340, 341: second developing nozzles

Claims (20)

The substrate is transported in a first direction for a first period and transported in a second direction opposite to the first direction for a second period subsequent to the first period and during a third period subsequent to the second period A transporting unit for transporting the substrate in the first direction; And
And a first developing nozzle spaced apart from the conveying unit and disposed on the conveying unit, for discharging the developer on the substrate to be processed. The developing device according to claim 1, further comprising a second developing nozzle which is disposed apart from the first developing nozzle in the first direction and discharges the developer on the substrate to be processed. 3. The method of claim 2,
The first developing nozzle discharges the developing solution onto the substrate to be processed in the first period,
And said second developing nozzle discharges said developer onto said substrate to be processed in said second period. The developing device according to claim 3, wherein the second developing nozzle gradually increases the discharge amount of the developer in accordance with the degree of conveyance of the substrate to be processed in the second direction. 3. The developing device according to claim 2, wherein the second developing nozzles are disposed apart from the first developing nozzles by at least a quarter of the length of the conveying portion in the first direction. 3. The developing apparatus according to claim 2, wherein the first developing nozzle and the second developing nozzle include nozzles in the form of lip. 3. The method of claim 2,
Wherein the first developing nozzle includes a nozzle in the form of a lip,
Wherein the second developing nozzle comprises a nozzle in the form of a spray. The developing device according to claim 1, wherein the first developing nozzle discharges the developer to the substrate to be processed in the first period and the second period. The developing device according to claim 8, wherein the first developing nozzle gradually increases the discharge amount of the developer in accordance with the degree of transfer of the substrate to be processed in the second direction in the second period. The developing device according to claim 1, wherein the conveying portion includes a roller. 2. The developing device according to claim 1, wherein the transferring portion tilts the substrate to be processed in a second direction perpendicular to the first direction during a fourth period subsequent to the third period to remove the developer. Discharging a developer on a substrate to be transferred in a first direction during a first period using a first developing nozzle;
Transferring the substrate to be processed in a second direction opposite to the first direction during a second period subsequent to the first period; And
And transferring the substrate to be processed in the first direction for a third period following the second period. 13. The method of claim 12, wherein transferring in the second direction comprises:
And the developing solution is discharged using the second developing nozzle on the substrate to be transferred in the second direction during the second period. 14. The developing method according to claim 13, wherein the second developing nozzle is spaced apart from the first developing nozzle in the first direction. 14. The method of claim 13,
Wherein the step of ejecting the developer using the second developing nozzle gradually increases the ejection amount of the developer in accordance with the degree of conveyance of the substrate to be processed in the second direction. 14. The developing method according to claim 13, wherein the first developing nozzle and the second developing nozzle include nozzles in the form of a lip. 14. The method of claim 13,
Wherein the first developing nozzle includes a nozzle in the form of a lip,
Wherein the second developing nozzle includes a nozzle in the form of a spray. 13. The method of claim 12, wherein transferring in the second direction comprises:
And the developing solution is discharged using the first developing nozzle onto the substrate to be transferred in the second direction during the second period. 19. The developing method as claimed in claim 18, wherein the first developing nozzle gradually increases the amount of developer discharged in accordance with the degree of transfer of the substrate to be processed in the second direction during the second period. 13. The developing method according to claim 12, further comprising the step of removing the developer by inclining the substrate to be processed in a second direction perpendicular to the first direction during a fourth period subsequent to the third period .

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