KR20150079210A - Liquid crystal display device and method of fabrication the same - Google Patents

Abstract

The present invention relates to a liquid crystal display and a manufacturing method thereof wherein a column spacer is formed on an array substrate rather than a color filter substrate, and red, green and blue sub-color filters are formed to be overlapped on four surfaces in a cushion structure such that the column spacer is positioned and restrained within an overlapped step so as to prevent a red eye defect caused by the column spacer being pushed. The liquid crystal display comprises: a first substrate and a second substrate having a plurality of pixels, each comprising red, green and blue sub-pixels, and arranged in a matrix form and adhered facing each other; a black matrix formed on the first substrate; a color filter formed on the first substrate having the black matrix and comprising red, green and blue sub-color filters; a gate line and a data line vertically and horizontally arranged on the second substrate to define a pixel region; and a column spacer formed on an upper part of the second substrate where the gate line and the data line are formed wherein the color filter is patterned such that each of the red, green and blue sub-color filters are bent once in the direction of a previous sub-pixel. In addition, the liquid crystal display device and the manufacturing method thereof form a column spacer on an array substrate and form a latch structure on a color filter substrate by using a black matrix or an overcoat layer and thereby, become capable of preventing a red eye defect.

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal display device and a method of manufacturing the same,

The present invention relates to a liquid crystal display device and a manufacturing method thereof.

Recently, interest in information display has increased, and a demand for using portable information media has increased, and a light-weight flat panel display (FPD) that replaces a cathode ray tube (CRT) And research and commercialization are being carried out. Particularly, among such flat panel display devices, a liquid crystal display (LCD) is an apparatus for displaying an image using the optical anisotropy of a liquid crystal, and is excellent in resolution, color display and picture quality and is actively applied to a notebook or a desktop monitor have.

The liquid crystal display comprises a color filter substrate, an array substrate, and a liquid crystal layer formed between the color filter substrate and the array substrate.

Hereinafter, a general liquid crystal display device will be described in detail with reference to the drawings.

1 is an exploded perspective view schematically showing a structure of a general liquid crystal display device.

As shown in the drawing, a general liquid crystal display device mainly includes a color filter substrate 5, an array substrate 10, and a column spacer (not shown) And a liquid crystal layer (40) formed between the liquid crystal layer (10).

The color filter substrate 5 includes a color filter C composed of a plurality of sub-color filters 7 implementing colors of red (R), green (G) and blue (B) A black matrix 6 for separating the sub-color filters 7 from each other and blocking light transmitted through the liquid crystal layer 40 and a transparent common layer And an electrode (8).

The array substrate 10 includes a plurality of gate lines 16 and data lines 17 arranged vertically and horizontally to define a plurality of pixel regions P and a plurality of gate lines 16 and data lines 17, A thin film transistor T which is a switching element formed in the intersection region and a pixel electrode 18 formed on the pixel region P. [

The color filter substrate 5 and the array substrate 10 constituted as described above are adhered to each other by a sealant (not shown) formed on the periphery of the image display area to constitute a liquid crystal panel, and the color filter substrate 5 (Not shown) formed on the color filter substrate 5 or the array substrate 10 are bonded to each other.

On the other hand, in the case of a wide model in which the horizontal-vertical size ratio of the high-resolution model or the liquid crystal panel is 16: 9 or more, the column spacer is easily pushed by the force applied from outside as the horizontal size ratio increases. That is, in the wide model, the horizontal size ratio is increased as compared with the vertical dimension, so that the left and right tension is weakened. Therefore, the vertical and horizontal external force is increased, and the vertical movement of the column spacer is increased.

When the column spacer is pushed up and down in this way, the alignment film formed on the surface of the array substrate is also pushed together to generate light leakage, which will be described in detail with reference to the following drawings.

FIGS. 2A to 2C are cross-sectional views for explaining the reason why light leakage occurs due to external force application, and FIG. 3 is a photograph showing, for example, a part of a liquid crystal panel in which a red eye is generated.

4 is a plan view schematically showing a pixel structure of a conventional liquid crystal display device.

2A to 2C, the column spacer 30 generally maintains a cell gap of the liquid crystal panel, and is formed on the black matrix 6 of the gate line region in a circular shape or the like.

The size of the column spacer 30 is minimized in consideration of the liquid crystal margin, the pressing margin, and the process error. The size of the black matrix 6 is caused by disclination occurring during liquid crystal driving or during the rubbing process The column spacers 30 are formed to have a thickness sufficient to prevent light leakage due to the discontinuity of the column spacer 30.

In general, the column spacer 30 formed on the color filter substrate 5 is in contact with the array substrate 10. When receiving an external force, the column spacer 30 slides on the surface of the array substrate 10 in various directions and returns to its original position .

At this time, the moving column spacer 30 damages the alignment film 15 made of polyimide (PI) on the surface of the array substrate 10. This alignment film 15 damages the liquid crystal 40) are twisted and light leaks out (see FIG. 2C and FIG. 3).

That is, when an external force is applied, a positional deviation d is generated between the color filter substrate 5 and the array substrate 10. By the deformation of the liquid crystal panel due to the external force, a column spacer 30 are moved, the alignment film 15 is damaged such as scratches. The scratching of the alignment film 15 is not recovered even if the color filter substrate 5 returns to the original position, and the orientation of the liquid crystal 40 is changed from the original arrangement, and as a result, .

The leaked light is reddish, greenish, or bluish depending on the position of the column spacer 30 in the black image of the liquid crystal panel. It is called red eye bad.

Referring to FIG. 4, in order to prevent the light leakage due to the movement of the column spacer 30, the position of the column spacer 30 is taken into consideration in consideration of the movement distance of the column spacer 30, (6) is designed to be enlarged in width, which is the biggest obstacle to the needs of the customers who require high resolution and high aperture ratio, and has a limit in securing the aperture ratio in particular.

It is an object of the present invention to provide a liquid crystal display device and a method of manufacturing the liquid crystal display device which can prevent a red eye defect by minimizing a phenomenon in which a column spacer due to an external force is pushed up and down.

It is another object of the present invention to provide a liquid crystal display device and a method of manufacturing the same that reduce the width of a black matrix on a gate line to improve the aperture ratio and transmittance of the liquid crystal panel.

Other objects and features of the present invention will be described in the following description of the invention and the claims.

In order to achieve the above object, a liquid crystal display device according to an embodiment of the present invention includes a plurality of pixels arranged in a matrix form including red, green, and blue sub-pixels, facing each other with a liquid crystal layer interposed therebetween A first substrate and a second substrate which are bonded together; A black matrix formed on the first substrate; A color filter formed on the first substrate on which the black matrix is formed, the color filter comprising red, green and blue sub-color filters; A gate line and a data line arranged vertically and horizontally on the second substrate to define a pixel region; And a column spacer formed on a second substrate on which the gate line and the data line are formed, wherein the color filter includes a plurality of red, green, and blue sub-color filters, respectively, in a black matrix area in the horizontal direction through which the gate line passes, And is patterned so as to be bent once in the direction of the previous sub-pixel.

At this time, the color filter may be formed by stacking the red, green, and blue sub-color filters so that four sides of the color filter overlaps the black matrix area in the horizontal direction, and the column spacer may be located in the overlapped step.

Wherein each of the red, green and blue sub-color filters is formed so as to be equally arranged in the sub-pixels in the vertical direction, that is, the pixel areas of the red, green and blue sub-color filters, In the matrix region, they can be patterned to be folded once in the direction of the previous sub-pixel, i.e., the blue, red and green sub-pixels respectively.

Another liquid crystal display device according to an embodiment of the present invention includes a first substrate on which a plurality of pixels composed of red, green, and blue sub-pixels are arranged in a matrix, 2 substrate; A black matrix and an overcoat layer formed on the first substrate; And a column spacer formed on the second substrate. The black matrix or the overcoat layer is patterned so as to have a latch structure in a region where the column spacer is located, thereby restricting the movement of the column spacer.

Here, the black matrix may include a first black matrix formed to have a latch structure in a region where the column spacer is located, and a second black matrix formed to have a uniform thickness in other regions.

At this time, the first black matrix may have a latch structure so as to have a movement preventing jaw protruding around the region where the column spacer is located.

The overcoat layer may have a latch structure as it is formed to have a movement preventing hole around an area where the column spacer is located.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, including: providing a first substrate and a second substrate on which a plurality of pixels each including red, green, and blue sub-pixels are arranged in a matrix; Forming a black matrix on the first substrate; Forming a color filter composed of sub-color filters of red, green, and blue on the first substrate on which the black matrix is formed; Forming a gate line and a data line arranged vertically and horizontally on the second substrate to define a pixel region; Forming a column spacer on a second substrate on which the gate line and the data line are formed; And attaching the first substrate and the second substrate with the cell gap maintained through the column spacers, wherein the color filter is arranged in a black matrix area in the transverse direction through which the gate line passes, the red, green, and blue The sub-color filters are patterned so as to be folded once in the direction of the previous sub-pixel.

The forming of the color filter may include forming a red sub-color filter on the first substrate on which the black matrix is formed, Forming a green sub-color filter on the first substrate on which the red sub-color filter is formed; And forming a blue sub-color filter on the first substrate on which the red sub-color filter and the green sub-color filter are formed.

In this case, the red sub-color filter is formed so as to be equally arranged with respect to a pixel region of a sub-pixel in a vertical direction, that is, a red sub-pixel. In the black matrix region in the horizontal direction, In the sub-pixel direction of FIG.

At this time, the red sub-color filter may have a margin to overlap a sub-color filter, that is, a green sub-color filter in three sides in the black matrix area in the lateral direction to form a predetermined step.

In this case, the green sub-color filter is formed so as to be equally arranged in a vertical sub-pixel, that is, a pixel area of a green sub-pixel. In the black matrix area in the horizontal direction, In the sub-pixel direction of FIG.

At this time, the green sub-color filter may have a margin to overlap with the sub-color filter, i.e., the blue sub-color filter, which is three sides in the black matrix area in the horizontal direction to form a step.

At this time, the red sub-color filter overlaps with the green sub-color filter patterned so that the three sides thereof in the black matrix area in the horizontal direction are folded to form a step.

In this case, the blue sub-color filter is formed so as to be equally arranged with respect to the sub-pixels of the vertical direction, that is, the sub-pixels of the blue sub-pixel. In the black matrix area of the horizontal direction, In the sub-pixel direction of FIG.

At this time, the blue sub-color filter may have a margin to overlap with the sub-color filter, i.e., the red sub-color filter, in three sides in the black matrix area in the horizontal direction to form a step.

At this time, the green sub-color filter overlaps with the blue sub-color filter patterned so that the three sides thereof in the black matrix area in the horizontal direction are folded to form a step.

At this time, the red sub-color filter overlaps the blue sub-color filter patterned so that the remaining one surface in the black matrix area in the horizontal direction is folded to form a step.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, including: providing a first substrate and a second substrate on which a plurality of pixels each including red, green, and blue sub-pixels are arranged in a matrix; Forming a color filter of red, green, and blue sub-color filters on the first substrate; Forming an overcoat layer on the first substrate on which the color filter is formed; Forming a black matrix on the first substrate on which the overcoat layer is formed; Forming a column spacer over the second substrate; And bonding the first substrate and the second substrate with the cell gap maintained through the column spacer, wherein the black matrix is formed to have a movement preventing jaw protruding around the region where the column spacer is located And the movement of the column spacer is restricted according to the movement of the column spacer.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, including: providing a first substrate and a second substrate on which a plurality of pixels arranged in a matrix form, each of which is composed of red, green and blue sub-pixels, are arranged in a matrix; Forming a black matrix on the first substrate; Forming a color filter composed of sub-color filters of red, green, and blue on the first substrate on which the black matrix is formed; Forming an overcoat layer on the first substrate on which the color filter is formed; Forming a column spacer over the second substrate; And attaching the first substrate and the second substrate with the cell gap maintained through the column spacer, wherein the overcoat layer is formed to have a movement preventing hole around the region where the column spacer is located And restrains movement of the column spacer.

As described above, in the liquid crystal display device and the manufacturing method thereof according to an embodiment of the present invention, column spacers are formed on the array substrate instead of the color filter substrate, and the red, green, and blue sub- And the column spacer is placed and restrained in the overlapping steps.

Another liquid crystal display device and a manufacturing method thereof according to an embodiment of the present invention include forming a column spacer on an array substrate and forming a latch structure using a black matrix or an overcoat layer on a color filter substrate .

As a result, the red eye defect is prevented, and the aperture ratio and transmittance are increased, thereby improving the display quality.

1 is an exploded perspective view schematically showing a structure of a general liquid crystal display device.
2A to 2C are sectional views for explaining the reason why light leakage occurs due to external force application.
3 is a photograph showing, for example, a part of a liquid crystal panel in which a red eye is generated.
4 is a plan view schematically showing a pixel structure of a conventional liquid crystal display device.
5 is a plan view schematically showing a part of an array substrate of a liquid crystal display device according to the first embodiment of the present invention.
6 is a plan view schematically showing a part of a color filter substrate of a liquid crystal display device according to a first embodiment of the present invention.
7 is a cross-sectional view taken along the line A-A 'in the liquid crystal display according to the first embodiment of the present invention shown in FIG. 5, for example.
8A to 8E are plan views sequentially showing a manufacturing process of the color filter substrate according to the first embodiment of the present invention shown in FIG.
9A to 9K are cross-sectional views sequentially showing the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention shown in FIG.
10 is a view schematically showing a cross-sectional structure of a liquid crystal display device according to a second embodiment of the present invention.
11A to 11L are sectional views sequentially showing a manufacturing process of a liquid crystal display device according to a second embodiment of the present invention shown in FIG.
12 is a view schematically showing a cross-sectional structure of a liquid crystal display device according to a third embodiment of the present invention.
13A to 13K are cross-sectional views sequentially showing the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention shown in FIG. 12;

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification. The dimensions and relative sizes of the layers and regions in the figures may be exaggerated for clarity of illustration.

It will be understood that when an element or layer is referred to as being another element or "on" or "on ", it includes both intervening layers or other elements in the middle, do. On the other hand, when a device is referred to as "directly on" or "directly above ", it does not intervene another device or layer in the middle.

The terms spatially relative, "below," "lower," "above," "upper," and the like, And may be used to easily describe the correlation with other elements or components. Spatially relative terms should be understood to include, in addition to the orientation shown in the drawings, terms that include different orientations of the device during use or operation. For example, when inverting an element shown in the figures, an element described as "below" or "beneath" of another element may be placed "above" another element. Thus, the exemplary term "below" can include both downward and upward directions.

The terminology used herein is for the purpose of describing embodiments only and is not intended to be limiting of the invention. In the present specification, the singular form includes plural forms unless otherwise specified in the specification. &Quot; comprise "and / or" comprising ", as used in the specification, means that the presence of stated elements, Or additions.

FIG. 5 is a plan view schematically showing a part of an array substrate of a liquid crystal display according to a first embodiment of the present invention, in which a fringe field formed between a pixel electrode and a common electrode passes through a slit, (FFS) type liquid crystal display device that implements an image by driving liquid crystal molecules of a liquid crystal display device. However, the present invention is not limited thereto, and is applicable to an IPS type liquid crystal display device using a transverse electric field as well as the FFS method.

At this time, in an actual liquid crystal display device, N gate lines and M data lines intersect to form MxN sub-pixels. However, in order to simplify the description, the red, green, and blue sub- B) are shown as an example.

5, when the pixel electrode including the slit has a bending structure, the liquid crystal molecules are arranged in two directions to form a two-domain structure, thereby further improving the viewing angle compared to the mono-domain. do. However, the present invention is not limited to the liquid crystal display device having the two-domain structure, and the present invention can be applied to a liquid crystal display device having a multi-domain structure of two or more domains as well as a mono-domain structure .

FIG. 6 is a plan view schematically showing a part of a color filter substrate of a liquid crystal display according to a first embodiment of the present invention, showing a sub-color filter of a cushion structure according to the first embodiment of the present invention.

7 is a cross-sectional view taken along the line A-A 'in the liquid crystal display device according to the first embodiment of the present invention shown in FIG. 5, wherein the color filter substrate and the array substrate A part of a cross section of the liquid crystal panel to which the liquid crystal panel is adhered is schematically shown.

Referring to the drawings, a gate line 116 and a data line 117, which are vertically and horizontally arranged on the transparent array substrate 110 to define a pixel region, are formed on the array substrate 110 according to the first embodiment of the present invention. Respectively. A thin film transistor, which is a switching device, is formed in the intersection region of the gate line 116 and the data line 117. In the pixel region, a common electrode 108 and a plurality of slits 118s Is formed on the surface of the pixel electrode 118.

The thin film transistor is electrically connected to the pixel electrode 118 through a gate electrode 121 connected to the gate line 116, a source electrode 122 connected to the data line 117, and a first contact hole 120. [ And a drain electrode 123 connected thereto. The thin film transistor includes a gate insulating layer 115a for insulation between the gate electrode 121 and the source and drain electrodes 122 and 123 and a source electrode And an active layer 124 between the drain electrode 122 and the drain electrode 123 to form a conductive channel.

At this time, when an amorphous silicon thin film is used as the active layer 124, the source / drain regions of the active layer 124 are electrically connected to the source / drain electrodes 122 and 123 through the ohmic- . However, the present invention is not limited thereto, and a polycrystalline silicon thin film or an oxide semiconductor may be used for the active layer 124.

The common electrode 108 and the pixel electrode 118 are formed in the pixel region so as to generate a fringe field. At this time, the common electrode 108 is electrically connected to the interlayer insulating layer 115b and the planarization layer 115c, And the pixel electrode 118 is formed in a box shape in each pixel region, while a plurality of pixel electrodes (not shown) are formed on the passivation layer 115d. And may have slits 118s. However, the present invention is not limited thereto. Instead of the pixel electrode 118, the common electrode 108 may have a plurality of slits.

At this time, the common electrode 108 may be electrically connected to a common line 108L arranged in parallel to the gate line 116 through a second contact hole (not shown).

The array substrate 110 having the above structure is bonded to the color filter substrate 105 with the cell gap maintained through the column spacers 130a and 130b to form a liquid crystal panel. A color filter 107 composed of red, green and blue sub-color filters 107R, 107G and 107B embodying the colors of red, green and blue and a color filter 107 composed of the red, green and blue sub-color filters 107R, 107G And 107B, and blocks the light transmitted through the liquid crystal layer (not shown).

The column spacers 130a and 130b according to the first embodiment of the present invention may include a first column spacer 130a having a double structure that maintains a gap between the color filter substrate 105 and the array substrate 110 Hereinafter referred to as a gap spacer), and a second column spacer 130b (hereinafter referred to as a pressed spacer) for preventing the pressing. However, the present invention is not limited thereto.

When an external force such as pressing is applied to the liquid crystal panel, a light leakage occurs. Such a light leakage is caused by a slip between the color filter substrate 105 and the array substrate 110 due to an external force, There is a reason for this.

That is, the rubbing directions of the color filter substrate 105 and the array substrate 110 do not become parallel to each other in the bending direction of the liquid crystal panel, so that the liquid crystal adjacent to the color filter substrate 105 and the surface of the array substrate 110 They are arranged in parallel in the fin direction, and are arranged differently from the initial state as a whole.

In such a case, the arrangement of the liquid crystals does not maintain the initial black state, so that the light passing through the liquid crystal layer rotates while experiencing a retardation different from that of the normal region, and light leakage appears.

For this reason, the gap spacer 130a and the pressing spacer 130b are required.

The gap spacer 130a functions to maintain a gap between the color filter substrate 105 and the array substrate 110. Therefore, the gap spacer 130a is configured to contact the color filter substrate 105 and the array substrate 110 And the pressed spacers 130b should be spaced apart from any one of the color filter substrate 105 and the array substrate 110. [

It is preferable that the gap spacer 130a and the pressed spacer 130b are located in a region where they are in the pixel region than in the pixel region. Therefore, the region where the thin film transistor is located, the gate line or the common line 108L, It is preferable to be located in the region where the "

The gap spacer 130a and the pressed spacer 130b may be located in a single sub-pixel R, G, B depending on the resolution, and the neighboring sub-pixels R, G, It can also be divided into two.

At this time, the gap spacer 130a according to the first embodiment of the present invention is formed on the red sub-pixel R while the pressed spacer 130b is formed on the red sub-pixel R without the gap spacer 130a. - pixel (R) and blue sub-pixel (B). However, the present invention is not limited thereto.

Particularly, the column spacers 130a and 130b according to the first embodiment of the present invention are formed on the lower array substrate 110, not on the upper color filter substrate 105. FIG.

In addition, the color filter 107 according to the first embodiment of the present invention has a red, green, and blue sub-color in the region of the black matrix 106 in the horizontal direction through which the gate line 106 and the common line 108L pass, Each of the filters 107R, 107G, and 107B is patterned by folding once in the directions of the previous sub-pixels R, G, and B to have a cushion structure as a whole, and four sides are overlapped in the area of the black matrix 106 in the horizontal direction. Color filter 107R, 107G, and 107B of red, green, and blue are stacked and formed to position the column spacers 130a and 130b in the overlapped step S.

The column spacers 130a and 130b located in the step S of the red, green and blue sub-color filters 107R, 107G and 107B thus overlapped with the column spacers 130a and 130b by the external force, So that the phenomenon of being pushed up and down can be minimized.

The overlapping step S of the red, green and blue sub-color filters 107R, 107G and 107B can be formed without additional exposure and etching steps and the column spacers 130a and 130b As the phenomenon of being pushed up and down is minimized, defects of the conventional red eye are prevented, and the aperture ratio and transmittance are increased by securing the additional aperture area.

For example, the gap spacer 130a according to the first embodiment of the present invention formed on the array substrate 110 is in contact with the color filter substrate 105, and when the external force is applied, the color filter substrate 105 ) Plane, and then return to the original position.

At this time, the gap spacer 130a to be moved is moved by the step S according to the first embodiment of the present invention formed by the lamination of the red, green and blue sub-color filters 107R, 107G and 107B, The positional deviation between the color filter substrate 105 and the array substrate 110 can be minimized.

Accordingly, even if the color filter substrate 105 returns to its original position, the damage of the alignment film (not shown) is minimized to prevent red eye defects. On the other hand, So that it can be uniformly formed.

Hereinafter, a manufacturing method of a liquid crystal display device according to a first embodiment of the present invention will be described in detail with reference to the drawings.

8A to 8E are plan views sequentially showing the manufacturing process of the color filter substrate according to the first embodiment of the present invention shown in FIG.

9A to 9K are cross-sectional views sequentially illustrating the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention shown in FIG.

9A, a gate electrode 121, a gate line (not shown), and a common line (not shown) are formed on an array substrate 110 made of a transparent insulating material such as glass, ).

The gate electrode 121 and the gate line, that is, the gate line and the common line are formed by selectively depositing a first conductive film on the entire surface of the array substrate 110 and then performing a photolithography process (first mask process) .

At this time, the first conductive layer may be formed of aluminum (Al), aluminum alloy, tungsten (W), copper (Cu), chromium (Cr) , Molybdenum (Mo), and molybdenum alloy, and the like. The first conductive layer may have a multi-layer structure in which two or more low-resistance conductive materials are stacked.

Next, as shown in FIG. 9B, a gate insulating layer 115a, an amorphous silicon thin film, and an n + amorphous silicon thin film are formed on the entire surface of the array substrate 110 on which the gate electrode 121, the gate line, and the common line are formed.

Thereafter, the amorphous silicon thin film and the n + amorphous silicon thin film are selectively removed through a photolithography process (second mask process), thereby forming the amorphous silicon thin film with the gate insulating film 115a interposed therebetween The active layer 124 is formed.

At this time, the n + amorphous silicon thin film pattern 125 made of the n + amorphous silicon thin film is formed on the active layer 124.

Next, as shown in FIG. 9C, a second conductive layer is formed on the entire surface of the array substrate 110 on which the active layer 124 is formed.

The second conductive layer may be formed of a low-resistance opaque conductive material such as aluminum, aluminum alloy, tungsten, copper, chromium, molybdenum, and molybdenum alloy to form a source electrode, a drain electrode, and a data line. The second conductive layer may be formed in a multi-layered structure in which two or more low-resistance conductive materials are stacked.

Thereafter, the n + amorphous silicon thin film and the second conductive film are selectively removed through a photolithography process (a third mask process), thereby forming a source electrode 122 and a drain electrode, which are the second conductive film, on the active layer 124, And a data line 117 made of the second conductive film is formed in the data line region of the array substrate 110. [

At this time, an n + amorphous silicon thin film is formed on the active layer 124, and an ohmic contact is formed between the source / drain region of the active layer 124 and the source / drain electrodes 122 and 123, The layer 125n is formed.

Although the first embodiment of the present invention has been described by way of example in which two mask processes are used to form the active layer 124 and the data line, the present invention is not limited to this, The data line 124 and the data line may be formed by a single mask process using a half-tone mask or a diffraction mask.

9D, an interlayer insulating layer 115b and a planarization layer 115c are formed on the entire surface of the array substrate 110 on which the source electrode 122, the drain electrode 123, and the data line 117 are formed. .

The interlayer insulating layer 115b may be formed of an inorganic insulating layer such as a silicon nitride layer or a silicon oxide layer, and the planarization layer 115c may be formed using an organic insulating material having a low dielectric constant such as photo-acryl. However, the present invention is not limited thereto, and the planarization layer 115c may not be formed on the interlayer insulation layer 115b.

Then, a third conductive layer is deposited on the entire surface of the array substrate 110, and then selectively patterned using a photolithography process (fourth mask process) to form the third conductive layer on the entire pixel except for the first contact hole. And a common electrode 108 electrically connected to the common line is formed through the second contact hole.

At this time, the third conductive layer may be formed of a transparent conductive material having a high transmittance such as indium tin oxide (ITO) or indium zinc oxide (IZO).

9E, a protective film 115d is deposited on the entire surface of the array substrate 110 on which the common electrode 108 is formed. Subsequently, a protective film 115d is deposited on the entire surface of the interlayer insulating film The first contact hole 120 exposing a part of the drain electrode 123 is formed by selectively patterning the gate electrode 115b, the planarization film 115d and the protective film 115d.

Then, as shown in FIG. 9F, a fourth conductive layer is deposited on the entire surface of the array substrate 110 on which the protective layer 115d is formed.

At this time, the fourth conductive layer may be made of a transparent conductive material having a high transmittance such as ITO or IZO.

Thereafter, a pixel electrode 118 electrically connected to the drain electrode 123 is formed through the first contact hole by selectively patterning using a photolithography process (a sixth mask process). At this time, the pixel electrode 118 may have a plurality of slits 118s in the pixel region.

9G, a gap spacer 130a and a column spacer 130a (not shown) made of a pressed spacer (not shown) are formed on the surface of the array substrate 110 of the first embodiment of the present invention manufactured as described above, ).

At this time, it is advantageous in view of image quality that the gap spacer 130a and the pressed spacer are located in the avoided region rather than in the pixel region. Therefore, the region where the thin film transistor is located, the region where the gate line or the common line is located, That is, in the black matrix area in the horizontal direction.

Depending on the resolution, the gap spacers 130a and the pressed spacers may be located within a single sub-pixel or may be located between neighboring sub-pixels.

At this time, the gap spacer 130a according to the first embodiment of the present invention is formed on the red sub-pixel, while the pressed spacer is formed on the red sub-pixel where the gap spacer 130a is not formed and the blue sub- - pixels. However, the present invention is not limited thereto.

8A and 9H, a black matrix 106 is formed on a color filter substrate 105 made of a transparent insulating material such as glass to block unnecessary light. .

The black matrix 106 may be an organic film of a resin material. For example, an acrylic film, an epoxy film, or a polyimide film containing any one of carbon black and black pigment may be used. Colored organic resin and the like can be applied.

Thereafter, a red sub-color filter 107R is formed on the color filter substrate 105 on which the black matrix 106 is formed, as shown in Figs. 8B and 9I. At this time, instead of the red sub-color filter 107R, a green sub-color filter or a blue sub-color filter may be formed first.

At this time, generally, a method of forming a color filter includes a dyeing method and a pigmenting method depending on the material of the organic filter used in manufacturing the color filter, and a dyeing method, an electrodeposition method, a printing method, The most common method used in the manufacture of color filters is the pigment dispersion method.

The pigment dispersion method is a method of forming a color filter by repeating a process of applying a photoresisted resist onto a substrate, coloring it with a pigment prepared in advance, and exposing and developing it.

First, a photosensitive first organic film is formed on the color filter substrate 105. The first organic layer is composed of color pigments sensitized by ultraviolet rays. The first organic layer is formed of a red color, a green color, and a blue color among the red color (here, based on formation of sub-color filters in the order of red, green and blue) A color resist is applied to the entire surface of the color filter substrate 105 and then selectively exposed to form a red sub-color filter 107R in a desired area.

At this time, the red sub-color filter 107R is formed using a photolithography process, and the other point is that a color resist is used as a photoresist.

The color resist used in the pigment dispersion method is mainly composed of a photopolymerizable photosensitive composition such as a photopolymerization initiator, a monomer and a binder, and an organic pigment for realizing hue.

The photopolymerization initiator in the photopolymerization type photosensitive composition is a highly sensitive and stable triazine which generates light by receiving light and contains three atoms of nitrogen and is a generic term of three kinds of six-membered cyclic compounds represented by the molecular formula of C ₃ H ₃ N ₃ ) Based compound is used, and the monomer is converted into a polymer form after initiation of the polymerization reaction by the radical, and is not dissolved in the melt. The binder maintains liquid monomer at room temperature in the form of a film to withstand a developer, stabilizes pigment dispersion, and maintains reliability of the color filter pattern in terms of heat resistance, light resistance, chemical resistance, and the like.

Pigments use organic materials having excellent light resistance and heat resistance. Pigment particles are generally opaque due to scattering of light. However, when the particle size is smaller than the wavelength of light, it becomes transparent by transmitting light. Therefore, the smaller the particle size, .

The red sub-color filter 107R is formed so as to be equally arranged in the pixel region of the sub-pixel in the vertical direction, that is, the sub-pixel of the red color, while the horizontal black matrix 106 ) Region is patterned by once folding in the direction of the previous sub-pixel, that is, the sub-pixel of blue color.

At this time, the red sub-color filter 107R overlaps with the sub-color filters neighboring to the three sub-color filters, that is, the green sub-color filter in the black matrix area 106 of the horizontal direction, So as to form a margin.

8C and 9J, a green color resist is coated on the entire surface of the color filter substrate 105 on which the red sub-color filter 107R is formed, and then selectively exposed to form a second organic film Green sub-color filter 107G.

In this case, the green sub-color filter 107G is also formed so as to be equally arranged in a vertical sub-pixel, that is, a pixel area of a green sub-pixel, In the matrix 106 region, patterning is performed once in the direction of the former sub-pixel, that is, in the direction of the red sub-pixel.

In addition, the green sub-color filter 107G overlaps with a sub-color filter, i.e., a blue sub-color filter, having three sides in the area of the black matrix 106 in the lateral direction to form a step S And a margin is provided.

The red sub-color filter 107R overlaps the green sub-color filter 107G patterned in such a manner that the three sides thereof in the area of the black matrix 106 in the horizontal direction are folded to form the step S Respectively.

8D, a blue color resist is coated on the entire surface of the color filter substrate 105 on which the red sub-color filter 107R and the green sub-color filter 107G are formed, When the blue sub-color filter 107B which is the third organic film is formed by exposure, the color filter 107 is completed.

At this time, the blue sub-color filter 107B is also formed so as to be equally arranged in a vertical sub-pixel, that is, a pixel region of a blue sub-pixel, In the matrix 106 region, the pattern is formed by being bent once in the direction of the previous sub-pixel, that is, the green sub-pixel.

In addition, the blue sub-color filter 107B overlaps three sub-color filters, that is, a red sub-color filter, in the area of the black matrix 106 in the lateral direction to form a step S And a margin is provided.

In addition, the green sub-color filter 107G overlaps the blue sub-color filter 107B patterned in such a manner that the three surfaces of the green sub-color filter 107G are bent in the area of the black matrix 106 in the horizontal direction, Respectively.

In addition, the red sub-color filter 107R overlaps the blue sub-color filter 107B patterned so that the remaining one surface in the area of the black matrix 106 in the lateral direction is folded to form the step S Respectively.

Next, as shown in FIGS. 8E and 9K, the array substrate 110 is adhered to the color filter substrate 105 while being held in a cell gap through a column spacer 130a (not shown) Panel.

In the meantime, the liquid crystal display device and the manufacturing method thereof of the present invention are similar to the first embodiment of the present invention, except that a column spacer is formed on an array substrate, and a black matrix or an overcoat layer is used as a latch ) Structure, it is possible to prevent red eye failures, which will be described in detail in the following second and third embodiments of the present invention.

FIG. 10 is a schematic view showing a cross-sectional structure of a liquid crystal display device according to a second embodiment of the present invention, and schematically shows a part of an FFS-mode liquid crystal display device. However, the present invention is not limited thereto, and is applicable to an IPS type liquid crystal display device using a transverse electric field as well as the FFS method.

10, the array substrate 210 according to the second embodiment of the present invention includes gate lines (not shown) arranged vertically and horizontally on the transparent array substrate 210 to define pixel regions, data lines 217 Is formed. A thin film transistor, which is a switching device, is formed in the intersection region of the gate line and the data line 217. In the pixel region, a common electrode 208 and a plurality of slits 218s are provided for driving the liquid crystal molecules A pixel electrode 218 is formed.

The thin film transistor includes a gate electrode 221 connected to the gate line, a source electrode 222 connected to the data line 217, and a drain electrode 223 electrically connected to the pixel electrode 218 through a first contact hole. ). The thin film transistor includes a gate insulating film 215a for insulation between the gate electrode 221 and the source and drain electrodes 222 and 223 and a source electrode 222 and a drain electrode 223 formed on the substrate.

In this case, when the amorphous silicon thin film is used as the active layer 224, the source / drain regions of the active layer 224 are electrically connected to the source / drain electrodes 222 and 223 through the ohmic- . However, the present invention is not limited thereto, and the active layer 224 may include a polycrystalline silicon thin film or an oxide semiconductor.

A common electrode 208 and a pixel electrode 218 are formed in the pixel region to generate a fringe field. In this case, the common electrode 208 is formed in the interlayer insulating film ( And the planarization layer 215c and the planarization layer 215c. The pixel electrode 218 is formed in a single pattern on the entire pixel region except for the first contact hole. The pixel electrode 218 is formed in a box shape in each pixel region, 215d may have a plurality of slits 218s. However, the present invention is not limited thereto. Instead of the pixel electrode 218, the common electrode 208 may have a plurality of slits.

At this time, the common electrode 208 may be electrically connected to a common line (not shown) arranged in parallel to the gate line through a second contact hole (not shown).

The array substrate 210 thus formed is bonded to the color filter substrate 205 while maintaining the cell gap through the column spacer 230a (not shown) to form a liquid crystal panel. At this time, A color filter 207 consisting of red, green and blue sub-color filters 207R, 207G and 207B embodying the colors of red, green and blue, an overcoat layer 209 formed on the color filter 207, And black matrices 206a and 206b for separating the red, green and blue sub-color filters 207R, 207G and 207B from each other and blocking light transmitted through a liquid crystal layer (not shown).

In this case, the column spacer 230a (not shown) according to the second embodiment of the present invention has a double structure, as in the first embodiment of the present invention, between the color filter substrate 205 and the array substrate 210 A gap spacer 230a for retaining a gap between the gate electrode and the gate electrode, and a pressing spacer (not shown) for preventing the gate electrode from being pressed. However, the present invention is not limited thereto.

Since the gap spacer 230a functions to maintain a gap between the color filter substrate 205 and the array substrate 210, the gap spacer 230a is configured to contact the color filter substrate 205 and the array substrate 210 And the pressing spacers must be spaced apart from any one of the color filter substrate 205 and the array substrate 210.

The gap spacer 230a and the pressed spacer are advantageous in view of image quality so as to be located in the pixel region, rather than in the pixel region. Therefore, the gap spacer 230a and the pressed spacer are located in the region where the thin film transistor is located, .

Depending on the resolution, the gap spacers 230a and the pressed spacers may be located within a single sub-pixel or may be located between neighboring sub-pixels.

At this time, the gap spacer 230a according to the second embodiment of the present invention is formed on the red sub-pixel, while the pressed spacer includes the red sub-pixel in which the gap spacer 230a is not formed and the blue sub- - pixels. However, the present invention is not limited thereto.

Particularly, the column spacer 230a (not shown) according to the second embodiment of the present invention is formed on the lower array substrate 210, not on the upper color filter substrate 205.

The black matrices 206a and 206b according to the second embodiment of the present invention are formed after the color filter 207 is formed and have a latch structure in an area where the lower column spacer 230a So as to have the same shape.

The black matrices 206a and 206b according to the second embodiment of the present invention may include a first black matrix 206a formed to have a latch structure in a region where the column spacer 230a (not shown) And a second black matrix 206b formed in a uniform thickness in the region of the second black matrix 206b.

The first black matrix 206a is formed to have a movement preventing jaw B protruding around a region where the column spacer 230a (not shown) is positioned using a half-tone mask or a diffraction mask, .

The column spacer 230a (not shown) positioned within the movement preventing jaw B of the first black matrix 206a is moved upward or downward due to external force due to the constraint of the movement of the column spacer 230a So that it can be minimized.

As a result, the conventional red eye defect is prevented, and at the same time, the aperture ratio and the transmittance are increased due to the provision of additional aperture regions.

For example, the gap spacer 230a according to the second embodiment of the present invention formed on the array substrate 210 is in contact with the color filter substrate 205, and when the external force is applied, the color filter substrate 205 ) Plane, and then return to the original position.

At this time, the gap spacer 230a to be moved is positioned within the movement preventing jaw B of the first black matrix 206a, so that the movement of the gap spacer 230a is restricted by the movement of the color filter substrate 205 and the array substrate 210, Can be minimized.

Accordingly, even if the color filter substrate 205 returns to its original position, the damage of the alignment film (not shown) is minimized to prevent the red eye defect. On the other hand, the black matrix region is formed to have a width So that it can be uniformly formed.

Hereinafter, a manufacturing method of a liquid crystal display device according to a second embodiment of the present invention will be described in detail with reference to the drawings.

11A to 11L are cross-sectional views sequentially illustrating a manufacturing process of a color filter substrate according to a second embodiment of the present invention shown in FIG.

11A, a gate electrode 221, a gate line (not shown), and a common line (not shown) are formed on an array substrate 210 made of a transparent insulating material such as glass, ).

The gate electrode 221 and the gate line, that is, the gate line and the common line are formed by selectively depositing a first conductive film on the entire surface of the array substrate 210 and then patterning through a photolithography process (first mask process) .

Next, as shown in FIG. 11B, a gate insulating layer 215a, an amorphous silicon thin film, and an n + amorphous silicon thin film are formed on the entire surface of the array substrate 210 on which the gate electrode 221, the gate line, and the common line are formed.

Thereafter, the amorphous silicon thin film and the n + amorphous silicon thin film are selectively removed through a photolithography process (second mask process) to form the amorphous silicon thin film in a state where the gate insulating film 215a is interposed on the gate electrode 221 The active layer 224 is formed.

At this time, the n + amorphous silicon thin film pattern 225 made of the n + amorphous silicon thin film is formed on the active layer 224.

Next, as shown in FIG. 11C, a second conductive layer is formed on the entire surface of the array substrate 210 on which the active layer 224 is formed.

Thereafter, the n + amorphous silicon thin film and the second conductive film are selectively removed through a photolithography process (a third mask process), thereby forming a source electrode 222 and a drain electrode 222 of the second conductive film on the active layer 224, And a data line 217 made of the second conductive film is formed in the data line region of the array substrate 210.

At this time, an n + amorphous silicon thin film is formed on the active layer 224 and an ohmic contact is formed between the source / drain region of the active layer 224 and the source / drain electrodes 222 and 223, A layer 225n is formed.

Although the second embodiment of the present invention has been described by way of example in which the active layer 224 and the data line are formed using two mask processes, the present invention is not limited to this, The data line 224 and the data line may be formed by a single mask process using a half-tone mask or a diffraction mask.

11D, an interlayer insulating layer 215b and a planarization layer 215c are formed on the entire surface of the array substrate 210 on which the source electrode 222, the drain electrode 223, and the data line 217 are formed. .

The interlayer insulating layer 215b may be formed of an inorganic insulating layer such as a silicon nitride layer or a silicon oxide layer. The planarization layer 215c may be formed using an organic insulating material having a low dielectric constant such as photo-acryl. However, the present invention is not limited thereto, and the planarization layer 215c may not be formed on the interlayer insulation layer 215b.

Then, a third conductive layer is deposited on the entire surface of the array substrate 210, and then selectively patterned using a photolithography process (fourth mask process) to form the third conductive layer on the entire pixel except for the first contact hole. And a common electrode 208 electrically connected to the common line is formed through the second contact hole.

11E, a protective film 215d is deposited on the entire surface of the array substrate 210 on which the common electrode 208 is formed, and then a protective film 215d is formed on the interlayer insulating film ( The first contact hole 220 exposing a part of the drain electrode 223 is formed by selectively patterning the gate electrode 215b, the planarization film 215d and the protective film 215d.

Then, as shown in FIG. 11F, a fourth conductive film is deposited on the entire surface of the array substrate 210 on which the protective film 215d is formed.

Thereafter, a pixel electrode 218 electrically connected to the drain electrode 223 is formed through the first contact hole by selectively patterning using a photolithography process (sixth mask process). At this time, the pixel electrode 218 may have a plurality of slits 218s in the pixel region.

Next, as shown in FIG. 11G, a gap spacer 230a and a column spacer 230a (not shown) made of a pressed spacer (not shown) are formed on the surface of the array substrate 210 of the second embodiment of the present invention, ).

In this case, as described above, it is advantageous in view of image quality that the gap spacer 230a and the pressed spacer are located in the avoided region rather than in the pixel region. Therefore, the region where the thin film transistor is located, That is, the black matrix area in the horizontal direction.

Depending on the resolution, the gap spacers 230a and the pressed spacers may be located within a single sub-pixel or may be located between neighboring sub-pixels.

At this time, the gap spacer 230a according to the second embodiment of the present invention is formed on the red sub-pixel, while the pressed spacer includes the red sub-pixel in which the gap spacer 230a is not formed and the blue sub- - pixels. However, the present invention is not limited thereto.

Next, the manufacturing process of the color filter substrate will be described. As shown in Fig. 11H, a red sub-color filter 207R is formed on a color filter substrate 205 made of a transparent insulating material such as glass. At this time, instead of the red sub-color filter 207R, a green sub-color filter or a blue sub-color filter may be formed first.

First, a photosensitive first organic film is formed on the color filter substrate 205 as described above. The first organic layer is composed of color pigments sensitized by ultraviolet rays. The first organic layer is formed of a red color, a green color, and a blue color among the red color (here, based on formation of sub-color filters in the order of red, green and blue) A color resist is applied to the entire surface of the color filter substrate 205 and then selectively exposed to form a red sub-color filter 207R in a desired area.

At this time, the red sub-color filter 207R is formed using a photolithography process, and the other point is that a color resist is used as a photoresist.

Then, as shown in FIG. 11I, a green color resist is coated on the entire surface of the color filter substrate 205 on which the red sub-color filter 207R is formed, and then selectively exposed to form a green sub- - color filter 207G.

11J, a blue color resist is coated on the entire surface of the color filter substrate 205 on which the red sub-color filter 207R and the green sub-color filter 207G are formed, When the blue sub-color filter 207B which is the third organic film is formed by exposure, the color filter 207 is completed.

Next, as shown in FIG. 11K, after the overcoat layer 209 is formed on the color filter substrate 205 on which the color filter 207 is formed and is planarized, black matrices 206a and 206b are formed to shield unnecessary light, .

For the black matrices 206a and 206b, an organic film of a resin material may be used. For example, a colored organic resin such as acrylic, epoxy or polyimide resin including any one of carbon black and black pigment may be applied .

The black matrices 206a and 206b according to the second embodiment of the present invention may include a first black matrix 206a formed to have a latch structure in a region where the column spacer 230a (not shown) And a second black matrix 206b formed in a uniform thickness in the region of the second black matrix 206b.

The first black matrix 206a is formed to have a movement preventing jaw B protruding around a region where the column spacer 230a (not shown) is positioned using a half-tone mask or a diffraction mask, . However, the present invention is not limited thereto, and a mask may be added to form the latch structure of the first black matrix 206a.

Next, as shown in FIG. 11L, the array substrate 210 is adhered to the color filter substrate 205 in a state of being held in a cell gap through a column spacer 230a (not shown) to form a liquid crystal panel .

12 schematically shows a cross-sectional structure of a liquid crystal display device according to a third embodiment of the present invention, and schematically shows a part of an FFS type liquid crystal display device. However, the present invention is not limited thereto, and is applicable to an IPS type liquid crystal display device using a transverse electric field as well as the FFS method.

The liquid crystal display device according to the third embodiment of the present invention shown in FIG. 12 is different from the liquid crystal display device according to the second embodiment of the present invention except that the latch structure is formed on the surface of the overcoat layer. As shown in Fig.

12, the array substrate 210 according to the third exemplary embodiment of the present invention includes gate lines (not shown) arranged vertically and horizontally on the transparent array substrate 310 to define pixel regions and data lines 317 Is formed. In addition, a thin film transistor, which is a switching device, is formed in an intersection region of the gate line and the data line 317, and a common electrode 308 and a plurality of slits 318s are formed in the pixel region to drive liquid crystal molecules A pixel electrode 318 is formed.

The thin film transistor includes a gate electrode 321 connected to the gate line, a source electrode 322 connected to the data line 317 and a drain electrode 323 electrically connected to the pixel electrode 318 through a first contact hole. ). The thin film transistor includes a gate insulating film 315a for insulation between the gate electrode 321 and the source and drain electrodes 322 and 323 and a source electrode And an active layer 324 that forms a conduction channel between the drain electrode 322 and the drain electrode 323.

When the amorphous silicon thin film is used as the active layer 324, the source / drain regions of the active layer 324 are electrically connected to the source / drain electrodes 322 and 323 through the ohmic-contact layer 325n, . However, the present invention is not limited thereto, and the active layer 324 may be formed of a polycrystalline silicon thin film or an oxide semiconductor.

The common electrode 308 and the pixel electrode 318 are formed in the pixel region to generate a fringe field in the same manner as in the first and second embodiments of the present invention, Is formed on the interlayer insulating film 315b and the planarization film 315c and is formed in a single pattern on the entire pixel portion excluding the first contact hole and the pixel electrode 318 is formed in a box shape in each pixel region On the other hand, it can be formed to have a plurality of slits 318s on the protective film 315d. However, the present invention is not limited thereto. Instead of the pixel electrode 318, the common electrode 308 may have a plurality of slits.

At this time, the common electrode 308 may be electrically connected to a common line (not shown) arranged in parallel to the gate line through a second contact hole (not shown).

The array substrate 310 thus formed is bonded to the color filter substrate 305 in a state where the cell gap is maintained through the column spacer 330a (not shown) to form a liquid crystal panel. At this time, Color filters 307R, 307G, and 307B that are composed of red, green, and blue sub-color filters 307R, 307G, and 307B that emit red, green, And 307B and blocks light transmitted through a liquid crystal layer (not shown), and an overcoat layer 309 formed on the color filter 307 and the black matrix 306 .

In this case, the column spacer 330a (not shown) according to the third embodiment of the present invention has a double structure in which the color filter substrate 305 and the array substrate A gap spacer 330a for holding a gap between the first and second electrodes 310 and 310, and a pressing spacer (not shown) for preventing the pressing. However, the present invention is not limited thereto.

The gap spacer 330a functions to maintain a spaced gap between the color filter substrate 305 and the array substrate 310 so that the color filter substrate 305 and the array substrate 310 And the pressing spacers must be spaced apart from any one of the color filter substrate 305 and the array substrate 310.

The gap spacer 330a and the pressed spacer are advantageous in terms of image quality in that they are located in the avoided region rather than in the pixel region and thus are located in the region where the thin film transistor is located or in the region where the gate line or the common line is located .

Depending on the resolution, the gap spacers 330a and the pressed spacers may be located within a single sub-pixel or may be located between neighboring sub-pixels.

At this time, the gap spacer 330a according to the third embodiment of the present invention is formed on the red sub-pixel, while the pressed spacer is formed on the red sub-pixel in which the gap spacer 330a is not formed and the blue sub- - pixels. However, the present invention is not limited thereto.

Particularly, the column spacer 330a (not shown) according to the third embodiment of the present invention is formed on the lower array substrate 310, not on the upper color filter substrate 305.

The overcoat layer 309 according to the third embodiment of the present invention is formed to have a latch structure in which a movement preventing hole H is formed in a region where a lower column spacer 330a (not shown) do.

As described above, the overcoat layer 309 according to the third embodiment of the present invention is provided with a movement preventing hole H around a region where the column spacer 330a (not shown) is positioned using a half-tone mask or a diffraction mask So that it has a latching structure.

At this time, the movement of the column spacer 230a (not shown) located in the movement preventing hole H of the overcoat layer 309 is restricted so that the phenomenon that the column spacer 230a (not shown) is pushed up and down by an external force is minimized .

As a result, the conventional red eye defect is prevented, and at the same time, the aperture ratio and the transmittance are increased due to the provision of additional aperture regions.

Hereinafter, a manufacturing method of a liquid crystal display device according to a third embodiment of the present invention will be described in detail with reference to the drawings.

13A to 13K are cross-sectional views sequentially showing a manufacturing process of a color filter substrate according to a third embodiment of the present invention shown in FIG.

13A, a gate electrode 321, a gate line (not shown), and a common line (not shown) are formed on an array substrate 310 made of a transparent insulating material such as glass, ).

The gate electrode 321 and the gate line, that is, the gate line and the common line are formed by selectively depositing a first conductive film on the entire surface of the array substrate 310 and then performing a photolithography process (first mask process) .

Next, as shown in FIG. 13B, a gate insulating film 315a, an amorphous silicon thin film, and an n + amorphous silicon thin film are formed on the entire surface of the array substrate 310 on which the gate electrode 321 and the gate line and the common line are formed.

Thereafter, the amorphous silicon thin film and the n + amorphous silicon thin film are selectively removed through a photolithography process (second mask process) to form the amorphous silicon thin film with the gate insulating film 315a interposed therebetween The active layer 324 is formed.

At this time, the n + amorphous silicon thin film pattern 325 made of the n + amorphous silicon thin film is formed on the active layer 324.

Next, as shown in FIG. 13C, a second conductive layer is formed on the entire surface of the array substrate 310 on which the active layer 324 is formed.

Thereafter, the n + amorphous silicon thin film and the second conductive film are selectively removed through a photolithography process (a third mask process), thereby forming a source electrode 322 and a drain electrode 322 of the second conductive film on the active layer 324, And a data line 317 made of the second conductive film is formed in the data line region of the array substrate 310. [

At this time, an n + amorphous silicon thin film is formed on the active layer 324 and an ohmic contact is formed between the source / drain region of the active layer 324 and the source / drain electrodes 322 and 323, A layer 325n is formed.

In the third embodiment of the present invention, two mask processes are used to form the active layer 324 and the data line. However, the present invention is not limited to this, The data line 324 and the data line may be formed by a single mask process using a half-tone mask or a diffraction mask.

13D, an interlayer insulating layer 315b and a planarization layer 315c are formed on the entire surface of the array substrate 310 on which the source electrode 322, the drain electrode 323, and the data line 317 are formed. .

The interlayer insulating layer 315b may be an inorganic insulating layer such as a silicon nitride layer or a silicon oxide layer. The planarization layer 315c may be formed using an organic insulating material having a low dielectric constant such as photo-acryl. However, the present invention is not limited thereto, and the planarizing film 315c may not be formed on the interlayer insulating film 315b.

Then, a third conductive layer is deposited on the entire surface of the array substrate 310, and then selectively patterned using a photolithography process (fourth mask process) to form the third conductive layer on the entire pixel except for the first contact hole. And a common electrode 308 electrically connected to the common line is formed through the second contact hole.

13E, a protective film 315d is deposited on the entire surface of the array substrate 310 on which the common electrode 308 is formed. Then, a protective film 315d is formed on the entire surface of the interlayer insulating film 315d by using a photolithography process (fifth mask process) The first contact hole 320 exposing a part of the drain electrode 323 is selectively formed by selectively patterning the gate insulating layer 315b, the planarization layer 315d and the protective layer 315d.

Then, as shown in FIG. 13F, a fourth conductive layer is deposited on the entire surface of the array substrate 310 on which the protective layer 315d is formed.

Thereafter, a pixel electrode 318 electrically connected to the drain electrode 323 is formed through the first contact hole by selectively patterning using a photolithography process (a sixth mask process). At this time, the pixel electrode 318 may have a plurality of slits 318s in the pixel region.

Next, as shown in FIG. 13G, a gap spacer 330a and a column spacer 330a (not shown) made of a pressed spacer (not shown) are formed on the surface of the array substrate 310 of the third embodiment of the present invention, ).

Next, as shown in FIG. 13H, a black matrix 306 is formed on the color filter substrate 305 made of a transparent insulating material such as glass to shield unnecessary light .

For the black matrix 306, an organic film made of a resin material can be applied. For example, a colored organic resin such as acrylic, epoxy or polyimide resin including any one of carbon black and black pigment can be applied.

Next, as shown in FIG. 13I, a red sub-color filter 307R is formed on the color filter substrate 305 on which the black matrix 306 is formed. At this time, instead of the red sub-color filter 307R, a green sub-color filter or a blue sub-color filter may be formed first.

First, a photosensitive first organic film is formed on the color filter substrate 305 as described above. The first organic layer is composed of color pigments sensitized by ultraviolet rays. The first organic layer is formed of a red color, a green color, and a blue color among the red color (here, based on formation of sub-color filters in the order of red, green and blue) A color resist is applied to the entire surface of the color filter substrate 305 and then selectively exposed to form a red sub-color filter 307R in a desired area.

At this time, the red sub-color filter 307R is formed by using a photolithography process, and the other point is that a color resist is used as a photoresist.

Then, a green color resist is coated on the entire surface of the color filter substrate 305 on which the red sub-color filter 307R is formed, and then selectively exposed to form a green sub-color filter 307G do.

Then, a blue color resist is coated on the entire surface of the color filter substrate 305 on which the red sub-color filter 307R and the green sub-color filter 307G are formed, and selectively exposed to form a blue Color filter 307B is completed, the color filter 307 is completed.

Next, as shown in FIG. 13J, an overcoat layer 309 is formed on the color filter substrate 305 on which the color filter 307 is formed to planarize.

In this case, the overcoat layer 309 according to the second embodiment of the present invention is formed so as to have a latch structure in which a movement preventing hole H is formed in a region where the lower column spacer 330a (not shown) do.

As described above, the overcoat layer 309 according to the third embodiment of the present invention is provided with a movement preventing hole H around a region where the column spacer 330a (not shown) is positioned using a half-tone mask or a diffraction mask So that it has a latching structure. However, the present invention is not limited thereto, and a mask may be added to form a latch structure of the overcoat layer 309.

Next, as shown in FIG. 13K, the array substrate 310 is adhered to the color filter substrate 305 while being held in a cell gap through a column spacer 330a (not shown) to form a liquid crystal panel .

While a great many are described in the foregoing description, it should be construed as an example of preferred embodiments rather than limiting the scope of the invention. Therefore, the invention should not be construed as limited to the embodiments described, but should be determined by equivalents to the appended claims and the claims.

105, 205, 305: color filter substrate 106, 206, 306: black matrix
107, 207, 307: Color filters 110, 210, 310:
130a, 230a, 330a: gap spacer 130b: pressing spacer
209, 309: Overcoat layer

Claims (20)

A first substrate and a second substrate which are arranged in a matrix and in which a plurality of pixels composed of sub-pixels of red, green and blue are arranged in a matrix and are bonded to each other with a liquid crystal layer interposed therebetween;
A black matrix formed on the first substrate;
A color filter formed on the first substrate on which the black matrix is formed, the color filter comprising red, green and blue sub-color filters;
A gate line and a data line arranged vertically and horizontally on the second substrate to define a pixel region; And
And a column spacer formed on the second substrate on which the gate line and the data line are formed,
Wherein the color filter is patterned to fold each of the red, green, and blue sub-color filters in the direction of the previous sub-pixel in the black matrix area in the horizontal direction through which the gate line passes. The color filter according to claim 1, wherein the color filter is formed by laminating and forming the red, green and blue sub-color filters so that four sides are overlapped in the black matrix area in the transverse direction so that the column spacer is located in the overlapped step Wherein the liquid crystal display device is a liquid crystal display device. 2. The color filter of claim 1, wherein each of the red, green, and blue sub-color filters is formed so as to be equally spaced with respect to the sub-pixels in the vertical direction, i.e., the pixel regions of the red, green, and blue sub- Pixel in the horizontal direction, and in the direction of the sub-pixels in the horizontal direction, that is, in the direction of the sub-pixels of blue, red, and green, respectively. Providing a first substrate and a second substrate on which a plurality of pixels composed of red, green and blue sub-pixels are arranged in a matrix form;
Forming a black matrix on the first substrate;
Forming a color filter composed of sub-color filters of red, green, and blue on the first substrate on which the black matrix is formed;
Forming a gate line and a data line arranged vertically and horizontally on the second substrate to define a pixel region;
Forming a column spacer on a second substrate on which the gate line and the data line are formed; And
And bonding the first substrate and the second substrate while maintaining the cell gap through the column spacer,
Wherein the color filter is patterned so that each of the red, green, and blue sub-color filters is bent in the direction of the previous sub-pixel in the black matrix area in the horizontal direction through which the gate line passes. . 5. The method of claim 4, wherein forming the color filter
Forming a red sub-color filter on the first substrate on which the black matrix is formed;
Forming a green sub-color filter on the first substrate on which the red sub-color filter is formed; And
And forming a blue sub-color filter on the first substrate on which the red sub-color filter and the green sub-color filter are formed. 6. The display device according to claim 5, wherein the red sub-color filter is formed so as to be equally arranged in a pixel area of a sub-pixel in a vertical direction, that is, a red sub-pixel, Pixel, that is, in the direction of a sub-pixel of blue. 7. The color filter according to claim 6, wherein the red sub-color filter overlaps three sub-color filters, that is, a green sub-color filter, in the lateral black matrix area to form a margin Wherein the liquid crystal display device is a liquid crystal display device. [8] The method of claim 7, wherein the green sub-color filter is formed so as to be equally arranged in a vertical sub-pixel, i.e., a pixel area of a green sub-pixel, Pixel, that is, in the red sub-pixel direction. 9. A color filter according to claim 8, wherein the green sub-color filter has a margin to overlap a sub-color filter, i.e., a blue sub-color filter, three sides in the lateral black matrix area, Wherein the liquid crystal display device is a liquid crystal display device. 10. The liquid crystal display according to claim 9, wherein the red sub-color filter overlaps with a green sub-color filter patterned so that three sides thereof in the black matrix area in the lateral direction are patterned to be bent, ≪ / RTI > The display device according to claim 10, wherein the blue sub-color filter is formed so as to be equally arranged in a vertical sub-pixel, that is, a pixel area of a blue sub-pixel, Pixel, that is, in the direction of a green sub-pixel. 12. The color filter of claim 11, wherein the blue sub-color filter has a margin to overlap a sub-color filter, i.e., a red sub-color filter, in three lateral sides within the black matrix area of the lateral direction to form a step Wherein the liquid crystal display device is a liquid crystal display device. 13. The liquid crystal display according to claim 12, wherein the green sub-color filter overlaps with a blue sub-color filter patterned so that the three sides thereof in the black matrix area in the lateral direction are patterned to be bent, ≪ / RTI > 14. The liquid crystal display according to claim 13, wherein the red sub-color filter overlaps with the blue sub-color filter patterned so that the remaining one surface in the black matrix area in the lateral direction is patterned to be bent, ≪ / RTI > A first substrate and a second substrate which are arranged in a matrix and in which a plurality of pixels composed of sub-pixels of red, green and blue are arranged in a matrix and are bonded to each other with a liquid crystal layer interposed therebetween;
A black matrix and an overcoat layer formed on the first substrate; And
And a column spacer formed on the second substrate,
Wherein the black matrix or the overcoat layer is patterned so as to have a latch structure in a region where the column spacer is located, thereby restricting movement of the column spacer. The liquid crystal display according to claim 15, wherein the black matrix comprises a first black matrix formed to have a latch structure in a region where the column spacer is located, and a second black matrix formed in a region other than the first black matrix with a uniform thickness Liquid crystal display device. 17. The liquid crystal display of claim 16, wherein the first black matrix is formed to have a movement preventing jaw protruding around a region where the column spacer is located, so that the first black matrix has a latch structure. The liquid crystal display of claim 15, wherein the overcoat layer is formed to have a movement preventing hole around a region where the column spacer is located, so that the overcoat layer has a latch structure. Providing a first substrate and a second substrate on which a plurality of pixels composed of red, green and blue sub-pixels are arranged in a matrix form;
Forming a color filter of red, green, and blue sub-color filters on the first substrate;
Forming an overcoat layer on the first substrate on which the color filter is formed;
Forming a black matrix on the first substrate on which the overcoat layer is formed;
Forming a column spacer over the second substrate; And
And bonding the first substrate and the second substrate while maintaining the cell gap through the column spacer,
Wherein the black matrix is formed to have a movement preventing protrusion protruding around an area where the column spacer is located, thereby restricting movement of the column spacer. Providing a first substrate and a second substrate on which a plurality of pixels composed of red, green and blue sub-pixels are arranged in a matrix form;
Forming a black matrix on the first substrate;
Forming a color filter composed of sub-color filters of red, green, and blue on the first substrate on which the black matrix is formed;
Forming an overcoat layer on the first substrate on which the color filter is formed;
Forming a column spacer over the second substrate; And
And bonding the first substrate and the second substrate while maintaining the cell gap through the column spacer,
Wherein the overcoat layer is formed to have a movement preventing hole around an area where the column spacer is located, thereby restricting movement of the column spacer.

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