KR20150000148A - Chuck Table And Manufacturing Method Of The Same - Google Patents
Chuck Table And Manufacturing Method Of The Same Download PDFInfo
- Publication number
- KR20150000148A KR20150000148A KR20130072185A KR20130072185A KR20150000148A KR 20150000148 A KR20150000148 A KR 20150000148A KR 20130072185 A KR20130072185 A KR 20130072185A KR 20130072185 A KR20130072185 A KR 20130072185A KR 20150000148 A KR20150000148 A KR 20150000148A
- Authority
- KR
- South Korea
- Prior art keywords
- adsorption pad
- main body
- pad
- chuck table
- recessed portion
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000004065 semiconductor Substances 0.000 claims abstract description 33
- 238000001179 sorption measurement Methods 0.000 claims description 115
- 238000000034 method Methods 0.000 claims description 26
- 238000005520 cutting process Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 15
- 239000007769 metal material Substances 0.000 claims description 6
- 230000004308 accommodation Effects 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000007788 roughening Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 description 26
- 239000000853 adhesive Substances 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 14
- 230000008602 contraction Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 230000000274 adsorptive effect Effects 0.000 description 3
- 230000004438 eyesight Effects 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention relates to a chuck table and a chuck table manufacturing method capable of preventing shrinkage of a suction pad on a chuck table of a semiconductor equipment and a positional error that may be caused thereby.
Description
The present invention relates to a chuck table and a chuck table manufacturing method of a semiconductor cutting apparatus. More particularly, the present invention relates to a chuck table and a chuck table manufacturing method capable of preventing shrinkage of a suction pad on a chuck table of a semiconductor equipment and a positional error that may be caused thereby.
The cutting process in the semiconductor manufacturing process is generally a process of separating a semiconductor strip (semiconductor material) that has undergone a predetermined semiconductor manufacturing process into individual semiconductor units (for example, individual semiconductor chips or semiconductor packages). Such a semiconductor cutting process can be performed by cutting the semiconductor strip (semiconductor material) into individual semiconductor units by using a cutting blade as a cutting device in a state of being adsorbed and mounted on the chuck table 1 'by air pressure.
Fig. 1 shows a plan view of a general chuck table 1 ', and Figs. 2 and 3 show a cross-sectional view and a shot image of the chuck table 1' in which a problem occurs in the adsorption pad 200 '.
The chuck table 1 'shown in FIG. 1 includes a main body 100' of a metal material having a connection hole 110 'formed therein for performing a semiconductor cutting process and a suction pad 200' '). A suction hole 210 'and a blade relief groove 230' through which the cutting blade can pass may be formed on the adsorption pad 200 '.
2 and 3) is formed on the upper surface of the main body 100 'constituting the chuck table 1' so that the suction pad 200 'can be seated thereon, A method of adhering the adsorption pad 200 'to the accommodation portion with an adhesive or the like and then forming a suction hole 210' or a blade relief groove or the like at a precise position measured by using a vision unit or the like on the adsorption pad 200 ' The chuck table 1 'can be manufactured.
The chuck table 1 'can be contracted or inflated over time, and when the shrinkage of the chuck table 1' is repeated, the chuck table 1 ' The body 100 'of the adsorption pad may be separated from the adhesion site of the adsorption pad, or a crack may be generated in a specific site.
2 shows a cross-sectional view and an image pickup plane image of the chuck table 1 'in which a part of the side-direction adhesion surface of the main body 100' is separated from the adsorption pad 200 'constituting the chuck table 1'.
2 (a) is a cross-sectional view of the chuck table 1 'with the adsorption pad 200' and the main body 100 'separated. FIG. 2 (b) And the main body 100 'are separated from each other.
As shown in FIG. 2 (a), the adsorption pad 200 'constituting the chuck table 1' can be adhered in a state of being seated in a receiving portion formed in a metal body 100 '. A connection hole 110 'is formed on the bottom surface of the receiving portion so that air can be selectively applied thereto. The connection hole 110' is communicated with a suction hole 210 'formed on the suction pad 200' have. The upper surface of the suction pad 200 'may be provided with a blade relief groove 230' for preventing interference during cutting or cutting of the cutting blade.
Since the absorbent pad 200 'bonded to the main body 100' is formed in the shape of a large plate of rubber material, the receiving portion (not shown) in which the lower portion of the absorbent pad 200 ' The region may be configured to be recessed to have a step.
The adsorption pad 200 'may be adhered to the receiving portion of the main body 100' by applying an adhesive.
Since the adsorption pad 200 'is made of a rubber material, when the temperature or other environment change occurs, the adsorption pad 200' can be contracted in the horizontal direction.
Therefore, as shown in the enlarged view of FIG. 2 (a) and FIG. 2 (b), the side surface of the adsorption pad 200 'and the side surface of the main body 100' The bonding area of the inner side surface 101 'of the receiving portion can be separated (S) without maintaining the bonding state.
Particularly, since the adsorption pad 200 'is made of a rubber material in the form of a thin plate, the amount of shrinkage in the vertical direction is not so large. However, separation of the adsorption area of the adsorption pad 200' and the main body 100 ' May cause a positional error of the semiconductor strip to be mounted on the adsorption pad 200 ', resulting in defective product.
The separation phenomenon of such an adhesive region may be generated locally only in a part of the inner side surface 101 'of the receiving portion of the main body 100', as shown in Fig. 2 (b).
3 shows a cross-sectional view and an imaging plane image in which a crack C is generated in the adsorption pad 200 'bonded to the main body 100' constituting the chuck table 1 '. 3 (a) is a cross-sectional view of a state in which a crack C is generated in the adsorption pad 200 'of the chuck table 1', and FIG. 3 (b) Shows an imaging plane image in a state where a crack C is generated.
Horizontal contraction of the adsorption pad 200 'may cause a crack in the vicinity of the adhesion region in addition to separation of the adhesion region. Even in the case where the adhesive force of the adhesive pad 200 'and the body 100' by the adhesive is sufficient and the adhesive area is not separated, the horizontal contraction of the suction pad 200 'may cause cracks C of the rubber material in the vicinity of the adhesive area, Can be generated.
Such a crack may be caused to adhere to the adsorption pad 200 'to cause a positional error of the semiconductor strip to be cut, and eventually to cause a defect in the cut product.
The separation S of the adhesion region between the adsorption pad 200 'and the main body 100' caused by the contraction of the adsorption pad 200 'or the generation of the crack C of the adsorption pad 200' An error is generated in the position of the blade relief groove 230 'formed in the adsorption pad 200' after the adhesion, which may cause defective products or lower the durability of the product.
The present invention relates to a chuck table and a chuck table capable of separating a bonding site of a rubber material adsorption pad of a chuck table and a main body of a chuck table from each other or preventing a crack from occurring in the adsorption pad, And a method for providing the same.
According to an aspect of the present invention, there is provided a chuck table of a semiconductor cutting apparatus, comprising: a rubber-made adsorption pad having a plurality of protruding engaging portions on a side surface thereof and having an adsorption hole penetrating the semiconductor material in the up- A chuck table including a main body made of a metal material and having a receiving portion accommodating the adsorption pad and having a shape corresponding to the engaging portion of the adsorption pad, and a connection hole formed to communicate with the adsorption hole.
In this case, the recessed portion may be formed so that the cross-sectional area of the recessed portion is reduced along a direction of an entrance of the recessed portion formed from the certain inner side of the recessed portion to the receiving portion side so that the engagement state of the engagement portion of the suction pad and the recessed portion can be maintained have.
The width of the concave portion may be changed in a plane direction defined by the upper surface of the main body or a depth direction of the receiving portion.
Here, the cross-sectional area of the concave portion may be minimum at the entrance of the concave portion formed on the side of the receiving portion.
In addition, the recessed portion and the engaging portion may be formed at a position exposed to the upper surface of the main body and the adsorption pad.
Here, the recessed portion and the engaging portion may be provided at positions that are not exposed to the upper surface of the main body and the adsorption pad.
In this case, the absorption pad may be adhered to the receiving portion of the main body in a state in which the molten rubber is filled in the receiving portion of the main body and the latch portion is formed or the latch portion is formed.
The protruding portions may be formed at regular intervals on the bottom surface of the receiving portion.
Here, the protrusion may be formed in the form of a partition or a column.
Further, the surface of the receiving portion and the protruding portion may be subjected to the unevenness treatment.
According to another aspect of the present invention, there is provided a method of manufacturing a semiconductor device, comprising the steps of: forming an accommodating portion for accommodating a sucking pad in a main body of a metal material; Wherein the forming of the receiving portion includes forming a concave portion having a shape corresponding to the engaging portion of the adsorption pad on the side surface of the receiving portion.
After the step of forming the adsorption pad, the adsorption pad may further include a suction pad for adsorbing the semiconductor material on the upper surface of the adsorption pad and a suction pad processing step for forming a blade relief groove for preventing interference of the cutting blade.
In addition, the adsorption pad forming step may be performed by filling molten rubber in the receiving portion of the main body.
Here, the step of forming the adsorption pad may be performed by a method of adhering the adsorption pad previously formed with the engagement part to the accommodation part.
In this case, the receiving portion forming step may include forming protrusions on the bottom surface of the receiving portion at regular intervals.
According to the chuck table according to the present invention, the adhesion state of the adsorption pad and the body constituting the chuck table can be further strengthened.
Specifically, according to the chuck table according to the present invention, separation phenomenon between the adsorption pad and the main body can be prevented or mitigated by a physical method other than the adhesive, and occurrence of cracks or the like generated in the adsorption pad can be prevented.
It is possible to minimize the error of the semiconductor cutting process which may be caused by the separation phenomenon of the adsorption pad or the occurrence of cracks, so that the failure of the cut semiconductor chip can be minimized and the durability of the chuck table itself can be improved .
Figure 1 shows a plan view of a typical chuck table.
2 shows a cross-sectional view and a shot image of a general chuck table in which a problem occurs in the adsorption pad.
Fig. 3 shows a sectional view and a shot image of a general chuck table in which a problem occurs in the adsorption pad.
Figure 4 shows a top view of a chuck table according to the invention.
Fig. 5 shows a perspective view and a cross-sectional view of the chuck table shown in Fig.
6 shows an imaging plane image of a chuck table according to the present invention.
Figure 7 shows another embodiment of a chuck table according to the present invention.
Figure 8 shows a cross-sectional view of another embodiment of a chuck table according to the present invention.
9 shows a block diagram of a method of manufacturing the chuck table according to the present invention.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are provided so that the disclosure can be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals designate like elements throughout the specification.
Fig. 4 shows a plan view of the chuck table 1 according to the present invention, and Fig. 5 shows a perspective view and a cross-sectional view of the chuck table 1 shown in Fig.
The chuck table 1 according to the present invention as shown in FIGS. 4 and 5 also includes a metal body (not shown) formed with a
The
The present invention can prevent separation of the adhesion area between the
Specifically, the chuck table 1 of the semiconductor cutting apparatus according to the present invention includes a plurality of protruding engaging
4 and 5, the
4 and 5, the
The latching
The
4 and 5, the engaging
The engaging
6 shows an imaging plane image of the chuck table 1 according to the present invention.
The shape of the latching
That is, the recessed
The size of the width of the latching
Therefore, even when each of the engaging
Therefore, even if the
In the embodiment shown in FIGS. 4 to 6, the latching protrusion as the latching
Fig. 7 shows another embodiment of the chuck table 1 according to the present invention. The description with reference to Figs. 1 to 6 is omitted.
The embodiment shown in FIG. 7 also has a configuration in which the shape of the latching protrusion as the latching
That is, the width of the recess may be minimized at the entrance of the recess, and may have a triangular shape increasing linearly in each end direction of the latching
The separation preventing function of the
4 to 7 illustrate a state in which the latching protrusion of the
However, in order to perform the separation prevention function when the
Fig. 8 shows a cross-sectional view of another embodiment of the chuck table 1 according to the present invention.
8A is a perspective view illustrating a state in which the
However, the width of the latching
That is, the latching protrusion of the
4 to 7 show that the engaging
8B shows an example in which the latching
The latching
Specifically, the embodiment shown in FIG. 8 (b) is characterized in that a latching
However, unlike the above-described embodiments, the
The locking
Here, the height h2 of the projecting
8 (b), the latching
The embodiment shown in FIG. 8B may be used to prevent separation of the
The adhesive region or the adhesive surface of the
However, if the projecting portion is configured so as to protrude in the vertical direction from the bottom surface of the accommodating portion and the engaging projection is disposed between the side surface of the accommodating portion of the
It can be understood that the protruding portion generates an opposite direction stress to the stress in the adjacent region of the bonding surface, thereby alleviating the stress concentration which is a cause of cracking.
In the embodiment shown in FIG. 8 (b), it is preferable that the
Here, the latching
Although not shown in FIG. 8B, a plurality of protrusions may be formed at a predetermined interval on the bottom surface of the accommodating portion to prevent concentration of shrinkage force generated when the
As shown in FIG. 8 (b), the protruding
The surface of the receiving portion, the recessed portion, and the protruding portion of the
When the chuck table 1 and the
The adsorption pad of the chuck table according to the present invention described with reference to FIGS. 4 to 8 may be configured such that the molten rubber is filled in the receiving portion of the main body and the hook portion is formed, or the hook portion is adhered to the receiving portion of the main body have. That is, it is also possible to form a suction pad having a pouring part with a molten liquid rubber in a receiving part provided with a recessed part, and a plurality of suction parts provided on the side of the rim part are mounted on the receiving part of the main body The chuck table may be manufactured by a method of individually inserting the engaging portions of the adsorption pad into the recessed portions formed in advance in the accommodation portion.
The present invention provides a method of manufacturing a semiconductor device, the method comprising: forming a receiving portion (S100) for forming a receiving portion in which a receiving pad is received in a body of a metal material; and forming an adsorption pad on the adsorption pad receiving portion S200). In the receiving portion forming step (S100), a recessed portion having a shape corresponding to the engaging portion of the adsorption pad is formed on a side surface of the receiving portion.
The method of forming the adsorption pad in the adsorption pad forming step (S200) may be carried out by a method of attaching the adsorption pad formed in advance with the catching part to the receiving part, or by injecting the molten rubber into the receiving part, Thereby forming a latching portion or the like.
As described with reference to Fig. 8 (b), at least one projecting portion may be formed on the bottom surface of the accommodating portion in the process of forming the accommodating portion, and the surface of the accommodating portion, the recessed portion, It may further include a separation prevention function by performing surface roughness increasing treatment.
In the chuck table manufacturing method according to the present invention, after the adsorption pad forming step (S200), adsorption holes for adsorbing the semiconductor material and adsorption holes for forming blade relief grooves for preventing interference of the cutting blades are formed on the adsorption pad, And a pad processing step (S300).
The adsorption pad processing step (S300) is preferably performed by grasping an accurate position or the like through image information captured by a vision unit or the like.
While the present invention has been particularly shown and described with reference to preferred embodiments thereof, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the following claims. . It is therefore to be understood that the modified embodiments are included in the technical scope of the present invention if they basically include elements of the claims of the present invention.
1: chuck table
100:
150:
200: adsorption pad
250:
Claims (15)
A rubber-made adsorption pad having a plurality of protruding engaging portions on a side surface thereof and having a suction hole penetrating the semiconductor material in a vertical direction; And
And a main body made of a metal material, the main body including a receiving portion accommodating the adsorption pad and having a recess having a shape corresponding to the engaging portion of the adsorption pad, and a connection hole communicating with the adsorption hole.
Wherein the recessed portion is configured to be reduced along a direction of an entrance of the recessed portion formed at a certain inner side of the recessed portion to a side of the recessed portion so that the engagement state of the engagement portion of the suction pad and the recessed portion is maintained. Chuck table.
Wherein the width of the concave portion changes in a plane direction formed by the upper surface of the main body or a depth direction of the receiving portion.
And the cross-sectional area of the recessed portion is minimum at the entrance of the recessed portion formed in the side surface of the receiving portion.
Wherein the recessed portion and the engaging portion are formed at positions exposed to the upper surface of the body and the adsorption pad.
Wherein the recessed portion and the engaging portion are provided at positions that are not exposed to the upper surface of the body and the adsorption pad.
Wherein the adsorption pad is adhered to a receiving portion of the main body in a state in which a molten rubber is filled in a receiving portion of the main body and a latching portion is formed or a latching portion is formed.
Wherein a protruding portion is formed at a predetermined interval on a bottom surface of the accommodating portion.
Wherein the protrusions are formed in the form of pillars or pillars.
And the surfaces of the receiving portion and the protruding portion are subjected to a roughening treatment.
And forming an adsorption pad on the side of the adsorption pad, the adsorption pad having a plurality of protrusion-type engagement portions formed on a side surface thereof,
Wherein the forming of the accommodating portion includes forming a concave portion having a shape corresponding to the engaging portion of the adsorption pad on a side surface of the accommodating portion.
And forming a suction relief groove for absorbing the semiconductor material on the upper surface of the adsorption pad and a blade relief groove for preventing the interference of the cutting blade after the adsorption pad formation step.
Wherein the adsorption pad forming step is performed by filling molten rubber in a receiving portion of the main body.
Wherein the step of forming the adsorption pad is carried out by a method of adhering the adsorption pad previously formed with the engagement part to the accommodation part.
Wherein the accommodating portion forming step includes forming protrusions on the bottom surface of the accommodating portion at regular intervals.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130072185A KR20150000148A (en) | 2013-06-24 | 2013-06-24 | Chuck Table And Manufacturing Method Of The Same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130072185A KR20150000148A (en) | 2013-06-24 | 2013-06-24 | Chuck Table And Manufacturing Method Of The Same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20150000148A true KR20150000148A (en) | 2015-01-02 |
Family
ID=52474338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20130072185A KR20150000148A (en) | 2013-06-24 | 2013-06-24 | Chuck Table And Manufacturing Method Of The Same |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20150000148A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111771272A (en) * | 2017-12-27 | 2020-10-13 | 胜高股份有限公司 | Adsorption chuck |
KR102320338B1 (en) * | 2021-04-16 | 2021-11-02 | (주)네온테크 | Vacuum pad capable of easily desticking electronic chips, vacuum chuck table and picker having the same and pick-up method of electronic chips by the same |
KR102427019B1 (en) * | 2021-12-03 | 2022-07-28 | 윤동열 | vacuum chuck |
KR102622598B1 (en) * | 2023-08-30 | 2024-01-09 | 제너셈(주) | Method for making kit for package sawing |
KR102622597B1 (en) * | 2023-08-30 | 2024-01-09 | 제너셈(주) | Member applied to kit for package sawing and kit for package sawing including the same |
-
2013
- 2013-06-24 KR KR20130072185A patent/KR20150000148A/en active IP Right Grant
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111771272A (en) * | 2017-12-27 | 2020-10-13 | 胜高股份有限公司 | Adsorption chuck |
CN111771272B (en) * | 2017-12-27 | 2023-12-05 | 胜高股份有限公司 | Adsorption chuck |
KR102320338B1 (en) * | 2021-04-16 | 2021-11-02 | (주)네온테크 | Vacuum pad capable of easily desticking electronic chips, vacuum chuck table and picker having the same and pick-up method of electronic chips by the same |
KR102427019B1 (en) * | 2021-12-03 | 2022-07-28 | 윤동열 | vacuum chuck |
KR102622598B1 (en) * | 2023-08-30 | 2024-01-09 | 제너셈(주) | Method for making kit for package sawing |
KR102622597B1 (en) * | 2023-08-30 | 2024-01-09 | 제너셈(주) | Member applied to kit for package sawing and kit for package sawing including the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR20150000148A (en) | Chuck Table And Manufacturing Method Of The Same | |
KR101712187B1 (en) | Method and Apparatus of Batch Process for Semiconductor Packages | |
KR101596461B1 (en) | Apparatus and Method for Chip Detaching | |
JP4405211B2 (en) | Semiconductor chip peeling apparatus, peeling method, and semiconductor chip supply apparatus | |
KR102104300B1 (en) | Substrate holding device | |
KR101415162B1 (en) | Suction unit for semiconductor manufacturing apparatus | |
KR101384494B1 (en) | Die bonder and die bonding method | |
US9806057B2 (en) | Chip arranging method | |
JP2017022269A (en) | Suction mechanism, suction method, manufacturing device and manufacturing method | |
KR101640773B1 (en) | Method of semiconductor package formed with electromagnetic interference shield and apparatus for the same | |
TW202106475A (en) | Pick and place machine cleaning system and method | |
TWI513059B (en) | Phosphor film pick-up apparatus for led chip | |
TWI730763B (en) | Suction plate, cutting apparatus, and cutting method | |
JP5679950B2 (en) | Electronic component holder | |
JP6074734B2 (en) | Suction head for semiconductor manufacturing apparatus, manufacturing method thereof, and suction method of semiconductor device | |
TWM535874U (en) | Wafer attachment tray | |
JP6366223B2 (en) | Semiconductor chip pickup device | |
TWI416752B (en) | Tape machine | |
KR101887117B1 (en) | Module for fixing semiconductor apparatus and semiconductor apparatus test kit including the same | |
KR20200000102A (en) | Particle removing tip and index type particle removing apparatus using the same | |
KR200460715Y1 (en) | Semiconductor chip pick-up apparatus | |
JP2013214749A (en) | Carrier plate for holding chip and method for manufacturing the same | |
KR101666357B1 (en) | image sensor semiconductor package and its manufacturemethod | |
TWI501349B (en) | Wafer adsorption head | |
TW201616591A (en) | Apparatus for handling semiconductor packages and method of acquiring location information of semiconductor packages using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right |