KR20140043274A - Method of producing hydrogen chloride - Google Patents

Abstract

The present invention provides a production method of hydrogen chloride in which the temperature increase of a reaction system is controlled by simple processes. The production method of the present invention generates hydrogen chloride through a reaction of hydrogen gas and chlorine gas, by irradiating the hydrogen gas and the chlorine gas with light under the presence of hydrogen chloride gas. [Reference numerals] (A1) Mixing process; (A2,B2) Light irradiation process; (AA,CC) Start; (B1) Supply process; (BB,DD) End

Description

Method for producing hydrogen chloride {METHOD OF PRODUCING HYDROGEN CHLORIDE}

The present invention relates to a method for producing hydrogen chloride in which hydrogen gas is reacted to produce hydrogen chloride.

Hydrogen chloride is used for the etching gas for dry etching of a silicon semiconductor, and the cleaning use of the growth furnace of a silicon wafer. Recently, it is also used in silicon carbide applications, and in particular, its use in the semiconductor field is expanding. In the semiconductor field, since the incorporation of impurities greatly reduces the yield, incorporation of impurities in each process must be avoided above all, and high purity is required for all compounds used in the process. It is also required to be able to manufacture at low cost.

As a method of obtaining hydrogen chloride by reacting hydrogen and chlorine, there is a method of directly producing hydrogen chloride by burning chlorine in hydrogen as shown by the following formula.

H ₂ + Cl ₂ → 2HCl + 184.7kJ

Since the reaction does not proceed by simply mixing hydrogen and chlorine, it is necessary to heat the combustion burner or the like in order to proceed with the reaction, and the reaction temperature becomes high at about 2500 ° C. At such a high temperature, the chemical equilibrium reaction is not completed. When hydrogen and chlorine are reacted in equimolar amounts, about 2% of the added chlorine remains unreacted.

The hydrochloric acid synthesis apparatus described in Japanese Patent Application Laid-open No. Hei 5-105408 includes a cooling unit for cooling at least one of hydrogen gas and chlorine gas before the reaction. Moreover, the synthesis | combining method of Unexamined-Japanese-Patent No. 5-105408 makes the supply amount of hydrogen gas 1.2-1.5 times the theoretically required supply amount.

In order to cool a high temperature reaction product gas with a capacitor | condenser, it is necessary to improve the heat resistance of the material which comprises a capacitor | condenser, or to improve the structure of a capacitor | condenser.

Since it is difficult to improve the capacitor including the improvement of the material, a method of directly absorbing a high temperature reaction product gas into water and recovering it as hydrochloric acid is used. In order to separate hydrogen chloride from this hydrochloric acid, the salt which has a salting effect exists, for example, as described in Unexamined-Japanese-Patent No. 2001-192202, and distills.

When hydrogen chloride is separated from hydrochloric acid by distillation, hydrogen chloride and water are azeotropic, so it is necessary to dehydrate from an azeotropic mixture obtained by distillation using a dehydrating agent such as calcium chloride, magnesium chloride or sulfuric acid. Therefore, in the conventional production method, only the poor energy efficiency method of recovering the hydrogen chloride gas of the reaction product as hydrochloric acid and then distilling and dehydrating it from hydrochloric acid to obtain the hydrogen chloride gas has been put into practical use.

An object of the present invention is to provide a method for producing hydrogen chloride in which the temperature rise of the reaction system is suppressed in a simpler order.

The present invention is a method for producing hydrogen chloride, characterized by generating hydrogen chloride gas by reacting hydrogen gas and chlorine gas with light in the presence of hydrogen chloride gas to react hydrogen gas and chlorine gas.

The present invention also provides a mixing step of mixing a hydrogen gas, chlorine gas and hydrogen chloride gas to obtain a mixed gas,

It is a manufacturing method of the hydrogen chloride characterized by having the light irradiation process which irradiates light to a mixed gas, reacts hydrogen gas and chlorine gas contained in a mixed gas, and produces | generates hydrogen chloride gas.

In addition, the present invention is a supply process for continuously supplying hydrogen gas, chlorine gas and hydrogen chloride gas to the reactor, respectively,

A hydrogen chloride and chlorine gas supplied to a reactor is irradiated with light in the presence of hydrogen chloride gas, and has a light irradiation process which reacts hydrogen gas and chlorine gas, and produces | generates hydrogen chloride gas.

As described above, according to the present invention, the heat of reaction generated by the reaction of hydrogen gas and chlorine gas is absorbed by the hydrogen chloride gas and the temperature rise is suppressed. Hydrogen chloride gas is a reaction product and does not need to be separated after the reaction.

By co-existing the hydrogen chloride gas in this way, the temperature rise of the reaction system can be suppressed in a simpler order.

Moreover, in this invention, it is preferable to make the number-of-moles of hydrogen chloride gas at the time of starting light irradiation 5 times or more of the number of moles of the lesser of the number-of-moles of hydrogen gas and the number-of-moles of chlorine gas.

According to this invention, the temperature in the reaction system by reaction heat is 800 degrees C or less by making the number-of-moles of hydrogen chloride gas at the time of starting light irradiation into 5 times or more of the number of moles of hydrogen gas and the number of moles of chlorine gas less. Can be suppressed.

Moreover, it is preferable that this invention makes the number-of-moles of hydrogen gas at the time of starting light irradiation less than the number-of-moles of chlorine gas.

According to the present invention, after the reaction, a mixture is further obtained in which the hydrogen chloride gas as a reaction product and the hydrogen chloride gas supplied as a raw material further contain unreacted hydrogen gas, but when the hydrogen chloride is liquefied, the hydrogen gas can be easily removed as a gaseous phase. Furthermore, the removed hydrogen gas can be reused as source gas.

Moreover, in this invention, it is preferable that the wavelength of the light irradiated to hydrogen gas and chlorine gas is 250-450 nm.

According to the present invention, chlorine radicals can be efficiently generated from chlorine molecules by irradiating hydrogen gas and chlorine gas with light having a wavelength of 250 to 450 nm.

The objects, features, and advantages of the present invention will become more apparent from the following detailed description and drawings.
1A and 1B are process charts showing an example of a method for producing hydrogen chloride gas.
2 is a schematic view showing the configuration of a hydrogen chloride production apparatus for carrying out the present invention.

EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of this invention is described in detail with reference to drawings.

The mixed gas of hydrogen gas and chlorine gas is stable at room temperature in a dark place, but the reaction proceeds explosively by heating or light irradiation such as ultraviolet rays. By using such a reaction, high purity hydrogen chloride gas can be obtained in large quantities at once by using high purity hydrogen gas and high purity chlorine gas as raw materials.

Initiation reaction

Cl ₂ + light energy → ₂ Cl (radical)

Chain reaction

H ₂ + Cl (radical) → HCl + H (radical)

Cl ₂ + H (radical) → HCl + Cl (radical)

In the initiation reaction, chlorine molecules receive light energy and cleave into chlorine radicals. Chlorine radicals react with hydrogen molecules to produce hydrogen chloride, which in turn produces hydrogen radicals. This hydrogen radical reacts with the chlorine molecule to generate hydrogen chloride, as well as to regenerate the chlorine radical. In this way, the reaction is chained from the initial chlorine radical.

In the reaction for producing hydrogen chloride directly from the hydrogen gas and the chlorine gas as described above, cooling is necessary because the reaction temperature is high at 2500 ° C. Therefore, conventionally, the manufacturing method which melt | dissolves hydrogen chloride gas which is a reaction product, and collect | recovers as hydrochloric acid once is used. If the final target product is hydrochloric acid, there is no problem, but in order to recover the hydrogen chloride gas, it is necessary to separate the hydrogen chloride gas from the hydrochloric acid, which is very poor in energy efficiency.

In any case, in order to suppress the temperature rise of the reaction system, a substance which absorbs the heat of reaction other than water must be added to the reaction system. However, since the substance added in the reaction system becomes an impurity after completion of the reaction, a separation operation of the reaction product and hydrogen chloride is essential.

In view of such a situation, the inventors of the present invention have diligently studied and found that hydrogen chloride gas, which is a reaction product, is suitable as an additive substance capable of completing the formation reaction of hydrogen chloride by addition into the reaction system and suppressing the rise of the reaction temperature.

When hydrogen gas and chlorine gas are made to react in presence of hydrogen chloride gas, reaction heat is absorbed by hydrogen chloride gas, and temperature of a reaction system can be suppressed to the temperature of 800 degrees C or less, for example. Since hydrogen chloride gas is a reaction product, it does not become an impurity even if it is added to the reaction system, and it is not necessary to separate the hydrogen chloride gas produced by the reaction and the hydrogen chloride gas as an additive.

The present invention is characterized in that hydrogen chloride gas is generated by reacting hydrogen gas and chlorine gas by irradiating light to hydrogen gas and chlorine gas of a raw material in the presence of hydrogen chloride gas.

When the reaction of hydrogen gas and chlorine gas is started by irradiation of light, the reaction temperature rises immediately. Therefore, the reaction is initiated by irradiating light on hydrogen gas and chlorine gas in the presence of hydrogen chloride gas in advance. Therefore, in the manufacturing method of this invention, as long as it irradiates in the presence of hydrogen chloride gas, what kind of order may be sufficient. For example, hydrogen gas, chlorine gas, and hydrogen chloride gas may be mixed in advance to generate a mixed gas, and the generated mixed gas may be irradiated with light, or hydrogen gas and chlorine gas may be supplied while the hydrogen chloride gas is irradiated with light. You may irradiate light, supplying hydrogen gas, chlorine gas, and hydrogen chloride gas continuously to a reactor.

The mixing ratio of hydrogen gas, chlorine gas and hydrogen chloride gas can be changed suitably. When the reaction is completed, in order to suppress the reaction temperature to 800 ° C. or lower, preferably 500 ° C. or lower, at the time of starting light irradiation, the number of moles of hydrogen chloride gas is 5 times the number of moles of hydrogen gas and chlorine gas. As mentioned above, it is preferable to mix hydrogen chloride gas so that it may become 8 times or more preferably.

If the number of moles of hydrogen chloride gas is less than five times, the effect of suppressing the reaction temperature is lowered. In addition, it is not preferable to make the number of moles of hydrogen chloride gas excessively tens or more times because the amount of hydrogen chloride produced per reaction volume and reaction time decreases.

As for the mixing ratio of hydrogen gas and chlorine gas in the source gas, the ratio of the number of moles of hydrogen gas and the number of moles of chlorine gas (moles of hydrogen gas / moles of chlorine gas) may be 1, and the number of moles of hydrogen gas / moles of chlorine gas It may be less than 1 or greater than 1.

When the number of moles of hydrogen gas / number of chlorine gases is less than 1, after irradiation with light, a mixture of hydrogen chloride gas which is a reaction product and unreacted chlorine gas is obtained. On the other hand, when the number of moles of hydrogen gas / number of chlorine gases is greater than 1, a mixture of hydrogen chloride gas as a reaction product and unreacted hydrogen gas is obtained after irradiation with light. In any case, when the obtained mixture is liquefied and distilled, high purity hydrogen chloride gas can be obtained.

When the number of moles of hydrogen gas / number of chlorine gases is greater than 1, hydrogen chloride is liquefied by compressing the mixture obtained after the reaction, but hydrogen is not liquefied and remains as hydrogen gas, and these can be separated. This separated hydrogen gas contains a trace amount of hydrogen chloride and can be reused as a source gas. By reuse of such raw material gas, hydrogen chloride gas can be obtained from the hydrogen gas and the chlorine gas of the raw material in substantially 100% yield.

When the number of moles of hydrogen gas / number of chlorine gases is greater than 1, preferably 5 or less (5 times mole or less), more preferably 3 or less (3 times mole or less), hydrogen chloride may be removed from the mixture obtained after the reaction. It can liquefy and withdraw efficiently.

As described above, the present invention only needs to be able to react the hydrogen gas and the chlorine gas in the presence of hydrogen chloride gas. Thus, the treatment method may be a batch method or a continuous method. 1 is a process chart showing an example of a method for producing hydrogen chloride gas.

As shown in Fig. 1A, in a batch system, a mixed gas obtained by mixing hydrogen gas, chlorine gas, and hydrogen chloride gas as a raw material in a reaction container at least partially transparent to light to be irradiated for the start of the reaction is sealed (step) A1 mixing process). Thereafter, light is irradiated into the reaction vessel from a light source provided outside the reaction vessel to react the source gas in the reaction vessel (step A2 light irradiation step). After completion of the reaction, a mixture of hydrogen chloride gas which is a reaction product and a mixed gas of a raw material, and an unreacted raw material is taken out from the reaction vessel when an unreacted raw material remains, to obtain hydrogen chloride gas. In the case of a batch system, it is preferable to use a pressure-resistant vessel for the reaction vessel because the temperature in the reaction vessel increases with the start of the reaction and the pressure of the enclosed gas rises.

As shown in FIG. 1B, in the case of the continuous system, hydrogen gas, chlorine gas and hydrogen chloride gas are continuously supplied from the supply pipe to the reaction vessel (step B1 supply step). The reaction of hydrogen gas and chlorine gas in the presence of hydrogen chloride gas in the reaction vessel by light irradiation (step B2 light irradiation step), and the reaction product hydrogen chloride gas and the supplied hydrogen chloride gas, and unreacted raw materials if there is an unreacted raw material The mixture of the raw materials of is taken out continuously from the reaction vessel.

It is preferable to appropriately adjust the position of the supply port of each gas into the reaction vessel, the inflow direction of each gas supplied into the reaction vessel, and supply the respective gases so as to be in a mixed state so that each gas is not ubiquitous in the reaction vessel. Do. For example, it is preferable to supply each gas supplied so that a flow may become turbulent in a reactor, and it is preferable to make the inflow direction of each gas into the direction which a vortex generate | occur | produces in a reaction container.

2 is a schematic view showing the configuration of a hydrogen chloride production apparatus 1 for carrying out the present invention. The hydrogen chloride producing apparatus 1 has a photoreactor 2, a cooler 3, a compressor 4, and a pump 5. Hydrogen gas, chlorine gas, and hydrogen chloride gas, which are raw materials, are supplied to the photoreactor 2, and in the photoreactor 2, light is irradiated in the presence of hydrogen chloride gas, whereby hydrogen gas and chlorine gas react, and hydrogen chloride as a reaction product. A mixture of the gas and the supplied hydrogen chloride gas and the unreacted raw material is introduced into the cooler 3 when there is an unreacted raw material. The mixture is cooled to about 100 to 200 ° C. in the cooler 3, partly reused as source gas, and the remainder is compressed in the compressor 4 to obtain liquefied hydrogen chloride. When the number of moles of hydrogen gas / mole number of chlorine gas is greater than 1 as the composition of the raw material, hydrogen chloride is liquefied when compressed by the compressor 4, and the hydrogen contained in the mixture is kept as gas to obtain hydrogen chloride without hydrogen. Can be.

In the reaction of the photoreactor 2, reaction by-products and the like do not occur, and therefore, the mixture obtained after the reaction does not contain substances which are impurities other than the raw material composition. Therefore, when a part of the mixture is reused as the source gas, a separation operation for removing impurities is unnecessary, so that only a part of the mixture derived from the cooler 3 can be returned to the source of raw material using the pump 5. do.

The mixture derived from the photoreactor 2 may also be cooled until liquefied in the cooler 3 to be obtained as liquefied hydrogen chloride. In this case, the compressor 4 is unnecessary. Moreover, hydrogen chloride once liquefied can also be reused as a raw material.

As described above, since the reaction of generating hydrogen chloride in the present invention is the rate of generation of chlorine radicals by irradiation of light, the reaction rate of the entire reaction is not greatly influenced by the pressure. Therefore, there is little need to raise the pressure in the photoreactor 2, and although it depends also on supply temperature of raw material chlorine as a pressure, 1 Mpa or less is preferable. In addition, when the pressure in the photoreactor 2 is 0.67 MPa or more, since chlorine liquefies at 20 degreeC, time is needed until the chlorine supplied to the photoreactor 2 gasifies in the photoreactor 2, It is necessary to lengthen the residence time in the photoreactor 2. In the case of using liquefied chlorine, it is not necessary to lengthen the residence time by heating the liquefied chlorine in advance and supplying it as chlorine gas to the photoreactor 2, so that the pressure in the photoreactor 2 is the specification of the photoreactor 2. It can select suitably according to these.

When the pressure in the photoreactor 2 is lower than 0.03 MPa, the partial pressure of hydrogen gas and chlorine gas in the photoreactor 2 is lowered, the collision frequency of each molecule and radical is lowered, and the reaction rate is lowered. (2) Productivity per volume and reaction time will fall.

The wavelength of the light to be irradiated to initiate the reaction of hydrogen gas and chlorine gas may be a wavelength having energy enough to absorb the irradiated light to the chlorine molecules and break the bond between the chlorine atom and the chlorine atom, Wavelength bands are preferred. Since the light of this wavelength band is contained also in sunlight, reaction can also be started by irradiating a source gas with sunlight.

A high pressure mercury lamp is often used as a light source for irradiating light in this wavelength band. As other light sources, for example, laser light sources such as XeF (xenon fluoride) excimer laser (351 nm of irradiation light) and XeCl (xenon chloride) excimer laser (308 nm of irradiation light) may be used.

As the reaction proceeds, the concentration of hydrogen gas and chlorine gas in the photoreactor 2 decreases, but the energy of the light irradiated from the light source is approximately 100 moles of chlorine gas in the photoreactor 2 as the photon number (photon) number. Chlorine radicals can be produced sufficiently if it is 10,000 to 10,000 or more.

The light source may be disposed in the photoreactor 2 or may be disposed outside the photoreactor 2. When arrange | positioned outside the photoreactor 2, the window member which is transparent with respect to the light of the said wavelength band is provided in the wall part of the photoreactor 2, and the structure which receives light in the photoreactor 2 from this window member, or The structure which guide | induces light in the photoreactor 2 is employ | adopted using the optical conduit etc. of optical fibers. If a light source is arrange | positioned in the photoreactor 2, since it is not necessary to use the structure for such light irradiation, it is preferable. In addition, when the light source is disposed in the photoreactor 2, there is no need to use a window member or the like, so that the photoreactor 2 can be configured using a material having excellent pressure resistance.

Since the reaction rate of hydrogen chloride in this invention is comparatively high, the volume of the photoreactor 2 can be made small. The residence time of the supplied source gas in the photoreactor 2 is preferably a volume of several seconds to several tens of seconds. If the residence time is shorter than this range, a portion of hydrogen or chlorine may flow out of the photoreactor 2 unreacted. If the residence time is longer than this range, it is not necessary to lengthen the residence time since the reaction is substantially completed in the photoreactor 2.

As the material constituting the photoreactor 2, it is resistant to temperatures up to about 500 ° C., and general metal materials can be used. Cast iron, SUS304, SUS310, SUS316, SUS316L, nickel, titanium, tantalum, and high heat resistance corrosion resistance An alloy etc. can be used suitably. Moreover, glass materials, such as glass, heat resistant glass, and quartz glass, can also be used suitably, The material which coated these materials on the metal surface, for example, glass lining material, can also be used. As the material having resistance to temperatures up to about 250 ° C, a material coated with polyhydrofluoride hydrocarbons such as ethylene fluoride resin, polyvinylidene fluoride, and polytetrafluoroethylene can also be used.

The cooler 3 should just be able to reduce the temperature of the mixture containing the hydrogen chloride gas which is the reaction product derived from the photoreactor 2, and preferably cools the mixture to 200 degrees C or less, more preferably 100 degrees C or less. It is desirable to be able to. If the temperature of the mixture is higher than 200 ° C., thermal load is applied to the pump 5 for recycling hydrogen chloride to the raw material, which is not preferable. In addition, in order to lower the temperature of the mixture in advance in order to lower the load applied to the cooler 3, it is necessary to increase the ratio of the hydrogen chloride gas in the raw material and reduce the content of hydrogen gas and chlorine gas. In this case, since the output per unit volume of the photoreactor 2 and per unit time decrease, it is not preferable.

As the cooler (3), a multi-tube heat exchanger, a double tube heat exchanger, a glass lining heat exchanger, a shell-and-glass lining heat exchanger, a coil heat exchanger, a spiral heat exchanger, a plate heat exchanger, a trombone type heat exchanger, a fire A permeation graphite heat exchanger etc. can be used.

As the material constituting the cooler 3, cast iron, SUS304, SUS310, SUS316, SUS316L, nickel, titanium, tantalum, a high heat resistant corrosion resistant special alloy, and the like can be suitably used. Moreover, glass materials, such as glass, heat resistant glass, and quartz glass, can also be used suitably, The material which coated these materials on the metal surface, for example, glass lining material, can also be used. Fluorine resin-impregnated impermeable graphite can also be used.

As the compressor 4, a reciprocating compressor (reciprocating compressor), a screw compressor, a diaphragm compressor, a centrifugal compressor, or the like can be used. It is also possible to use blowers instead of compressors. As the blower, a reciprocating pump, a rotary pump, a turbo blower, a volume blower, a centrifugal fan, a four-flow fan, an axial fan, and the like can be used.

[Example]

(Example 1)

As the photoreactor 2, a cylindrical flask made of a heat-resistant glass having a diameter of 20 cm and a height of 50 cm in which two inlet ports of source gas were formed in the upper portion and one outlet of the reaction product was formed in the lower portion. The source gas was blown into the photoreactor 2 such that the source gas introduced from the inlet of the source gas swirls in the circumferential direction from the top of the photoreactor 2. The source gas was continuously supplied from the bomb in the following supply amounts, respectively. From one inlet, raw material hydrogen gas was supplied at a flow rate of 6 NL / min. From another inlet, a mixed gas of chlorine gas and hydrogen chloride gas was supplied at a flow rate of 5 NL / min for chlorine gas and 120 NL / min for hydrogen chloride gas. The unit "NL / min" is a flow rate unit expressed by the volume (liter) through which gas in a standard state flows per minute.

A 100 W high-pressure mercury lamp (M-102, manufactured by Ushio Denki) was disposed as a light source in the center of the photoreactor 2 and irradiated with light. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing the hydrogen chloride gas derived from the photoreactor 2 after reaction was 198 degreeC. The composition of the mixture derived from the photoreactor 2 was 0.8 vol% hydrogen, 99.2 vol% hydrogen chloride, and no chlorine was identified.

(Example 2)

Instead of disposing a high-pressure mercury lamp as a light source in the photoreactor 2, it was similar to Example 1 except that it was disposed outside the photoreactor 2 and irradiated with light from the outside. A 100 W high-pressure mercury lamp (manufactured by Ushio Denki Co., Ltd., M-102) was disposed at a distance of 1 m from the center of the photoreactor 2. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing the hydrogen chloride gas derived from the photoreactor 2 after reaction was 190 degreeC. The composition of the mixture derived from the photoreactor 2 was 0.7 vol% hydrogen, 99.3 vol% hydrogen chloride, and 50 ppm chlorine.

(Example 3)

The flow rate of the hydrogen gas to be introduced was 16.5 NL / min, the flow rate of the chlorine gas was 15 NL / min, and the flow rate of the hydrogen chloride gas was 120 NL / min. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing hydrogen chloride gas derived from the photoreactor 2 after reaction was 480 degreeC. The composition of the mixture derived from the photoreactor 2 was 1.0 vol% hydrogen, 99.0 vol% hydrogen chloride, and no chlorine was identified.

(Example 4)

The mixture containing the hydrogen chloride gas derived from the photoreactor 2 of Example 1 was cooled using ice water as a refrigerant, and a condenser of SUS316L and a heat transfer area of 0.3 m 2 was used as the cooler 3. The temperature of the mixture was cooled to 30 ° C. by the cooler 3. The mixture was joined with the chlorine gas of the raw material by the pump 5 at 120 NL / min, and the mixture was reused as the raw material gas. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing the hydrogen chloride gas derived from the photoreactor 2 after reaction was 190 degreeC. The composition of the mixture derived from the photoreactor 2 was 0.6 vol% hydrogen, 99.4 vol% hydrogen chloride, and no chlorine was identified.

(Example 5)

Hydrogen chloride by compressing the mixture derived from the cooler 3 of Example 4 to 0.9 MPaG using a compressor 4 and cooling the jacketed vessel (volume 2L) with a dry ice-acetone cryogen (-78 ° C). Was liquefied. The reaction was continued for 1 hour while purging the gas phase from the exclusion line. The obtained liquefied hydrogen chloride was 958 kg and the yield was 98%. Hydrogen as an impurity contained in liquefied hydrogen chloride was 1 ppm or less.

(Example 6)

The flow rate of the hydrogen gas to be introduced was 4 NL / min, the flow rate of the chlorine gas was 5 NL / min, and the flow rate of the hydrogen chloride gas was 120 NL / min. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing hydrogen chloride gas derived from the photoreactor 2 after reaction was 160 degreeC. The composition of the mixture derived from the photoreactor 2 was 0.8 vol% hydrogen, 99.2 vol% hydrogen chloride, and no chlorine was identified.

(Example 7)

The flow rate of the hydrogen gas to be introduced was 6 NL / min, the flow rate of the chlorine gas was 5 NL / min, the flow rate of the hydrogen chloride gas was 120 NL / min, and the mixed gas was mixed in advance to the photoreactor 2. It carried out similarly to Example 1 except having introduced. The temperature of source gas was 30 degreeC, and the temperature of the mixture containing the hydrogen chloride gas derived from the photoreactor 2 after reaction was 198 degreeC. The composition of the mixture derived from the photoreactor 2 was 0.8 vol% hydrogen, 99.2 vol% hydrogen chloride, and no chlorine was identified.

This invention can be implemented in other various forms, without deviating from the mind or main character. Therefore, embodiment mentioned above is only a mere illustration at all points, the scope of the present invention is shown by a claim, and is not restrained by the specification body at all. In addition, all the modifications and changes which belong to a claim are within the scope of the present invention.

Claims (6)

A method for producing hydrogen chloride, characterized in that hydrogen gas and chlorine gas are reacted with light in the presence of hydrogen chloride gas to produce hydrogen chloride gas. A mixing step of mixing a hydrogen gas, a chlorine gas and a hydrogen chloride gas to obtain a mixed gas,
A method of producing hydrogen chloride, comprising a light irradiation step of irradiating light to a mixed gas to react hydrogen gas and chlorine gas contained in the mixed gas to generate a hydrogen chloride gas. A supplying step of continuously supplying hydrogen gas, chlorine gas and hydrogen chloride gas to the reactor,
And a light irradiation step of irradiating hydrogen gas and chlorine gas to the hydrogen gas and chlorine gas supplied to the reactor to react hydrogen gas and chlorine gas to generate hydrogen chloride gas. 4. The method according to any one of claims 1 to 3,
The number of moles of hydrogen chloride gas at the time of starting light irradiation is 5 times or more of the number of moles of the lesser of the number of moles of hydrogen gas and the number of moles of chlorine gas. 4. The method according to any one of claims 1 to 3,
The number-of-moles of hydrogen gas at the time of starting light irradiation are made more than the number-of-moles of chlorine gas, The manufacturing method of hydrogen chloride. 4. The method according to any one of claims 1 to 3,
The wavelength of the light irradiated to hydrogen gas and chlorine gas is 250-450 nm, The manufacturing method of hydrogen chloride.

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