KR20130030975A - Liquid crystal display device - Google Patents

Abstract

PURPOSE: A liquid crystal display device is provided to improve the light leakage of an edge part and to improve display quality. CONSTITUTION: Common electrodes(116,173) are formed on a first protection layer(140) and pixel electrodes(170). A patterned spacer of a pillar type is formed on the boundary of a pixel region. A light leakage preventing pattern for a first edge(187) surrounds a display area. A first dummy pattern(179) covers the patterned spacer.

Description

[0001] Liquid crystal display device [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device. In particular, the number of mask processes can be reduced by omitting a black matrix, and both color filters and patterned spacers are formed on an array substrate having a thin film transistor. The present invention relates to a liquid crystal display device.

Recently, liquid crystal displays have been spotlighted as next generation advanced display devices having low power consumption, good portability, high technology value, and high added value.

In general, a liquid crystal display device is driven by using optical anisotropy and polarization properties of a liquid crystal. Since the liquid crystal has a long structure, it has a directionality in the arrangement of molecules, and the direction of the molecular arrangement can be controlled by artificially applying an electric field to the liquid crystal.

Therefore, when the molecular alignment direction of the liquid crystal is arbitrarily adjusted, the molecular arrangement of the liquid crystal is changed, and light is refracted in the molecular alignment direction of the liquid crystal by optical anisotropy, so that image information can be expressed.

Currently, an active matrix liquid crystal display (hereinafter, referred to as an active matrix LCD), in which a thin film transistor and pixel electrodes connected to the thin film transistor are arranged in a matrix manner, is attracting the most attention because of its excellent resolution and video performance.

1 is a cross-sectional view of a general liquid crystal display device.

As illustrated, the general liquid crystal display device 1 has a configuration in which the array substrate 10 and the color filter substrate 20 face each other with the liquid crystal layer 30 interposed therebetween.

The lower array substrate 10 is provided with a plurality of gate wirings (not shown) and data wirings (not shown) arranged vertically and horizontally on the upper surface thereof to define a plurality of pixel regions P, A thin film transistor Tr is provided at one of the intersections of the pixel electrodes 18 and the pixel electrodes 18 provided in the pixel regions P in a one-to-one correspondence.

In addition, the color filter substrate 20 includes a lattice covering each pixel region P to cover components such as the gate wiring (not shown), the data wiring (not shown), and the thin film transistor (Tr) on an inner surface thereof. A first black matrix 24 having a shape is formed, and a second black matrix 25 that surrounds the entire display area AA is provided. Each of the grids includes a first black matrix 24. A color filter layer 26 including red, green, and blue color filter patterns 26a, 26b, and 26c sequentially arranged in order to correspond to the pixel region P is formed, and is formed on the entire surface of the color filter layer 26. A transparent common electrode 28 is provided.

Each of the two substrates 10 and 20 is provided with a seal pattern 70 along the outermost edge of the non-display area NA in order to prevent leakage of the liquid crystal layer 30 interposed therebetween. 10 and 20 are interposed between upper and lower alignment layers (not shown) for providing an initial arrangement state of liquid crystal molecules at the boundary between the liquid crystal layer 30 and the liquid crystal layer 30.

In addition, a first polarizing plate (not shown) is attached to an outer surface of the array substrate 10 and a second polarizing plate (not shown) is attached to an outer surface of the color filter substrate 20.

In addition, an outer surface of the array substrate 10 having the thin film transistor Tr is more precisely provided with a backlight on the outer surface of the first polarizing plate (not shown) to supply light.

Accordingly, the on / off signal of the thin film transistor Tr is sequentially scanned and applied to the gate wiring (not shown), so that the data wiring (not shown) is applied to the pixel electrode 18 of the selected pixel region P. FIG. When the image signal is transmitted, the liquid crystal molecules constituting the liquid crystal layer 30 are driven by the vertical electric field therebetween, and various images can be displayed by the change in the transmittance of light.

The conventional liquid crystal display device 1 having such a configuration is completed by performing several mask processes. Since the mask process includes exposure, development, etching, and unit processes of strips, the mask process is time consuming and the mask process proceeds. For this reason, the use of photoresist, which is generally a photosensitive material, increases the manufacturing cost.

Therefore, in recent years, efforts have been made to reduce the number of mask processes to reduce the manufacturing cost of liquid crystal display devices.

In an effort to reduce the mask process, attempts have been made to reduce the number of mask processes and further improve the aperture ratio by eliminating the black matrix provided in the color filter substrate.

However, when the black matrix provided in the color filter substrate of the liquid crystal display device, in particular, the second black matrix that surrounds the display area, is deleted, FIG. As shown in the photo), light leakage occurs at the edges of the display area, thereby degrading the display quality of the liquid crystal display.

In addition, in the conventional liquid crystal display device, when the color filter layer is dualized and formed on the color filter substrate, which is the upper substrate, a large margin is required when the array substrate and the color filter substrate are bonded together. It becomes an element.

SUMMARY OF THE INVENTION The present invention has been made to solve the problems of the conventional liquid crystal display, and by removing the black matrix, the aperture ratio can be improved, and further, light leakage at the edge of the display area can be suppressed, and at the same time, the number of masks can be reduced. It is possible to provide a liquid crystal display device and a method of manufacturing the same, which does not require a bonding margin.

According to an embodiment of the present invention, a liquid crystal display device includes: a first substrate and a second substrate defined by a display area and a non-display area and facing each other through a liquid crystal layer; Gate wiring and data wiring intersecting the display region of the inner surface of the first substrate to define a plurality of pixel regions; A common wiring formed on an inner side surface of the first substrate in parallel with the gate wiring; A thin film transistor connected to the gate line and the data line and formed in each pixel area; A color filter layer formed of a sequentially repeated red, green, and blue color filter pattern formed on the entire display area over the thin film transistor; A first protective layer formed over the color filter layer; A plurality of pixel electrodes connected to the thin film transistors on the first passivation layer and formed in the pixel areas; A plurality of common electrodes connected to the common wiring on the first passivation layer and alternately formed with the plurality of pixel electrodes; A patterned spacer having a pillar shape on the boundary of the pixel area over the first passivation layer; A first dummy formed of a black resin in the non-display area of the first substrate and including a first edge light leakage preventing pattern formed around the display area, and covering the patterned spacer and made of the same material forming the pixel electrode; A pattern is formed.

In this case, a second protective layer made of an inorganic insulating material is formed on the entire surface of the first substrate between the thin film transistor and the color filter layer.

In addition, the first edge light leakage prevention pattern is in contact with the second protective layer is characterized in that formed on top.

The non-display area of the first substrate may be formed of the same material as the red, green, and blue color filter patterns between the first edge light leakage preventing pattern and the second protective layer in response to the first edge light leakage preventing pattern. A color pattern of any one color of red, green, and blue is formed to form a second edge light leakage preventing pattern, wherein the first edge light leakage prevention pattern and the second edge light leakage prevention pattern are formed between the first and second edge light leakage prevention patterns. It is characterized by interposing a protective layer.

In addition, the non-display area of the first substrate may be formed of the same material as the red, green, and blue color filter patterns between the first edge light leakage preventing pattern and the second protective layer in response to the first edge light leakage preventing pattern. The second edge light leakage prevention pattern forming a double layer structure is formed by overlapping the color patterns of any two colors of red, green, and blue, wherein the second edge light leakage preventing pattern and the first edge light leakage prevention pattern are It is characterized by being formed in contact.

In addition, a second dummy pattern formed of the same material forming the pixel electrode and covering the first edge light leakage preventing pattern is formed.

The first and second alignment layers may be formed on the uppermost part of the first substrate and the inner surface of the second substrate to contact the liquid crystal layer, respectively.

On the other hand, the patterned spacer is formed of a plurality of spacers for gap formation in the form of a column having a first height, and a plurality of anti-press spacers in the form of a column having a second height smaller than the first height, the gap formed The spacer is characterized in that its end is in contact with the inner surface of the counter substrate.

The first substrate may include an outermost common electrode formed in the pixel area in the pixel area by being adjacent to the data line by being branched from the common line, and the data line and the outermost layer on the first protective layer. The conductive pattern is formed of the same material forming the pixel electrode corresponding to the common electrode.

In this case, the pixel electrode, the common electrode, and the conductive pattern may each have a double layer structure of a lower layer made of molybdenum and an upper layer made of a transparent conductive material or copper nitride (CuNx). In this case, the transparent conductive material may be formed of indium-. Tin-oxide (ITO), indium-zinc-oxide (IZO), and aluminum doped zinc-oxide (AZO).

The first protective layer, the color filter layer, and the second protective layer may include a drain contact hole exposing a drain electrode of the thin film transistor, and a common contact hole exposing one end of the outermost common electrode. The electrode is in contact with the drain electrode of the thin film transistor through the drain contact hole, and the common electrode is in contact with the outermost common electrode through the common contact hole, wherein the pixel electrode and the outermost common electrode And the common electrode has a structure in which the common electrode is symmetrically bent with respect to the central portion of the pixel region so that each pixel region forms a double domain.

The first substrate may be formed with a seal pattern on the first edge light leakage preventing pattern.

In the liquid crystal display according to the present invention, the bonding margin is considered by forming a color filter layer including a red, green, and blue color filter pattern and a patterned spacer on an array substrate having a thin film transistor. Since there is no need to do so, there is an effect of providing a liquid crystal display device having excellent display quality of high resolution.

Furthermore, omitting the black matrix has the effect of reducing the number of mask processes, reducing the material cost, and improving the aperture ratio.

In addition, when forming a patterned spacer formed by using a black resin containing black pigment, the same material is used to form a light leakage preventing edge light leakage prevention pattern outside the display area to prevent light leakage at the edge of the display area to improve display quality. It is effective to let.

In addition, by forming a patterned spacer in contact with the second protective layer made of an organic material and formed thereon, the adhesion is improved, and the first dummy pattern is further covered by covering the patterned spacer with the same material forming the pixel electrode. As a result, there is an effect of preventing a defect in which the patterned spacer is lost.

In addition, a bar-shaped common electrode and a pixel electrode formed in parallel with the data line form a line-symmetrical structure that is bent up and down in each pixel area to realize a dual domain, thereby suppressing color difference due to a change in viewing angle. There is.

1 is a cross-sectional view of a portion of a display area and a non-display area of a conventional general liquid crystal display device.
FIG. 2 is a photograph showing that light leakage occurs at the edge of a display area in a conventional liquid crystal display device with black matrices removed. FIG.
3 is a cross-sectional view of a non-display area and a part of a display area of a liquid crystal display according to an exemplary embodiment of the present invention.
4A and 4B are sectional views of a non-display area and a part of a display area of the liquid crystal display according to the first and second modifications of the embodiment of the present invention;

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

3 is a cross-sectional view of a non-display area and a portion of a display area of a liquid crystal display according to an exemplary embodiment of the present invention. In this case, the thin film transistor Tr is provided only for one pixel area P among the plurality of pixel areas P in the display area AA. For convenience of description, each pixel area P is illustrated. An area in which the thin film transistor Tr, which is a switching element, is formed is defined as a switching area TrA, and an area in which a storage capacitor (not shown) is formed is defined as a storage area (not shown).

As shown in the drawing, the liquid crystal display 100 according to the exemplary embodiment of the present invention has a plurality of pixel electrodes 170 having a bar shape alternately spaced from each other in the display area AA, and a central common electrode 173. And the color filter layer 150, the gap forming spacer 188 having a height of one, and the anti-depression spacer 189 having a second height lower than the first height of the array substrate 102 and the second alignment layer (not shown). Opposed substrate 191, characterized in that provided only when the two liquid crystal layer 195 interposed between the two substrates (102, 191).

First, gate wirings (not shown) extending in one direction are formed in the display area AA of the lower array substrate 102, and common wirings (not shown) are spaced apart from the gate wirings (not shown). Formed.

In this case, a portion of the gate line itself or a portion branched from the gate line (not shown) corresponds to the switching region TrA to form the gate electrode 105.

In addition, the pixel electrode P is branched from the common line (not shown) to be adjacent to the data line 130 to form the outermost common electrode 116. In this case, the storage area (not shown) forms a first storage electrode (not shown) as the common wiring (not shown) itself.

Next, an inorganic insulating material, such as silicon oxide (SiO ₂ ) or silicon nitride, is formed on the gate wiring (not shown), the gate electrode 105, the common wiring (not shown), and the outermost common electrode 116. A gate insulating film 118 made of SiNx is formed.

In addition, an active layer 120a made of pure amorphous silicon and an ohmic contact layer 120b formed of impurity amorphous silicon and spaced apart from each other in the switching region TrA on the gate insulating layer 118. The semiconductor layer 120 is formed.

On the other hand, a data line 130 is formed on the gate insulating layer 118 to define the pixel region P while crossing the gate line (not shown). In this case, although the semiconductor pattern 121 including the first and second patterns 121a and 121b made of the same material constituting the semiconductor layer 120 is formed under the data line 130, the semiconductor pattern ( 121) may be omitted due to the manufacturing process.

In the switching region TrA, a source electrode 133 is formed on the semiconductor layer 120 by branching from the data line 130, and the drain electrode 136 is spaced apart from the source electrode 133. Formed. In this case, the source electrode 133 and the drain electrode 136 are in contact with the ohmic contact layer 120b spaced apart from each other.

The gate electrode 105, the gate insulating layer 118, the semiconductor layer 120, and the source and drain electrodes 133 and 136 spaced apart from each other, sequentially stacked in the switching region TrA, are thin film transistors Tr as switching elements. To achieve.

The drain electrode 136 extends in the storage region (not shown) to correspond to the first storage electrode (not shown) to form a second storage electrode (not shown). . In this case, the first storage electrode (not shown), the gate insulating layer 118, and the second storage electrode (not shown) sequentially stacked in the storage area (not shown) form a storage capacitor (not shown).

Next, an inorganic insulating material such as silicon oxide (SiO ₂ ) or silicon nitride (SiNx) is formed on the data line 130, the source and drain electrodes 133 and 136, and the second storage electrode (not shown). The protective layer 140 is formed on the front surface.

In the display area AA, a red, green, and blue color is formed on the gate line (not shown) and the data line 130 to correspond to each pixel area P on the first passivation layer 140. The color filter layer 150 having a form in which the color filter patterns 150a, 150b, and 150c are sequentially repeated is formed.

Next, a second passivation layer 155 made of photo acryl, which is a material having a relatively low dielectric constant among organic insulating materials, is formed on the color filter layer 150 in the display area.

The second protective layer 155 is formed of photoacryl having low dielectric constant due to the overlap of the conductive line 175 formed on the data line 130 and the outermost common electrode 116. This is to minimize the parasitic capacitance, and to minimize the influence of the unwanted electric field generated by the outermost common electrode 116 formed around the data line 130 and the data line 130.

In addition, photo acryl has a negative type characteristic that is left during development upon receiving light, so that when a contact hole or the like is formed in a component provided under the manufacturing process, a separate strip process is not required. This is because it has the advantage of simplifying the process.

Meanwhile, in addition to the second protective layer 155 made of photo acryl having such a low dielectric constant, the color filter layer 150, the first protective layer 140, and the gate insulating layer 118 provided thereunder are provided. A common contact hole (not shown) that exposes one end of the outermost common electrode 116 is provided, and the second protective layer 155, the color filter layer 150, and the first protective layer 140 have the Drain electrode 136 More precisely, a drain contact hole 157 is formed to expose the second storage electrode (not shown), which is an extended portion of the drain electrode 136.

Next, one of the most characteristic configurations of the liquid crystal display device according to the embodiment of the present invention is a black resin including black pigment and has a first height in a column shape corresponding to the boundary of the pixel area P. Forming spacers 188 are formed at regular intervals, and at the same time, anti-pressing spacers 189 having a second height smaller than the first height as a columnar shape are formed at regular intervals.

Meanwhile, in the non-display area NA, the second protective layer 155 formed of the color filter layer 150 and the photo acryl is removed to form a state in which the first protective layer 140 is exposed. An edge light leakage prevention pattern 187 is formed on the first passivation layer 140 formed of the same material forming the gap forming spacers 188 and 189 to surround the display area AA. .

Thus, in the liquid crystal display device 100 according to the exemplary embodiment of the present invention, the edge light leakage preventing pattern 187 configured to surround the display area AA in the non-display area NA has a border around a conventional display area. It serves as a second black matrix (25 in FIG. 1) formed to suppress light leakage.

In this case, the edge light leakage preventing pattern 187 may be formed to have the same first height as the gap forming spacer 188 or may have the same second height as the pressing preventing spacer.

Next, a lower layer (not shown) and a transparent conductive layer made of molten titanium (MoTi), an opaque low resistance metal material, are disposed on the second protective layer 155 provided with the common contact hole (not shown) and the drain contact hole 157. An upper layer (not shown) made of any one of the materials indium tin oxide (ITO), indium zinc oxide (IZO), aluminum doped zinc oxide (AZO) or copper nitride (CuNx), which is a low reflective opaque metal material The auxiliary common pattern (not shown) and the auxiliary pixel pattern (not shown) each having a double layer structure are formed to face each other.

In this case, the auxiliary common pattern (not shown) is in contact with the outermost common electrode 116 through the common contact hole (not shown), and the auxiliary pixel pattern (not shown) is the drain contact hole 157. The second storage electrode (not shown) connected to the drain electrode 136 is in contact with each other.

In addition, the second protective layer 155 and the upper part branched from the auxiliary common pattern (not shown) to overlap the data line 130 and the outermost common electrode 116 adjacent thereto, and the conductive pattern 175 is formed. It is being formed.

The conductive pattern 175 overlaps the boundary region of each pixel region P, so that the first black matrix is formed to surround each pixel region in the display region of the conventional liquid crystal display (1 in FIG. 1). It is characterized by serving as 24) of FIG.

In addition, in each pixel area P, a plurality of central common electrodes 173 in the form of bars are formed on the second passivation layer 155 and branched from the auxiliary common pattern (not shown). The outermost common electrode 116 is formed to be spaced apart at a predetermined interval.

In addition, each pixel region P branches in the auxiliary pixel pattern (not shown) and alternates with a plurality of central common electrodes 173 having a bar shape inside the outermost common electrode 116. A plurality of pixel electrodes 170 having a bar shape are formed.

In this case, the plurality of pixel electrodes 170 and the central common electrode 173 may also include lower layers 170a and 173a made of molybdenum (MoTi), and indium tin oxide (ITO) and indium zinc oxide, which are transparent conductive materials. (IZO), aluminum doped zinc-oxide (AZO), or a double layer structure made of upper layers 170b and 173b made of copper nitride (CuNx), which is a low reflection opaque metal material.

In this case, the pixel electrode 170 having the double layer structure, the central common electrode 173, and the outermost common electrode 116 may have a straight bar shape in each pixel region P, or It may have a bar shape that is symmetrically bent with respect to the central portion of each pixel area P.

As such, when the pixel electrode 170 and the common electrode 116 and 173 form a bar symmetrically folded in each pixel area, each pixel area P forms a double domain. It has the effect of suppressing color difference generation.

On the other hand, in the display area AA, the gap forming spacers and the anti-pressing spacers 188 and 189 are formed on the boundary of the pixel region P at a predetermined distance from the second protective layer 155. The first dummy pattern 179 having a double layer structure formed of the same material forming the pixel electrode 170 and the central common electrode 173 is also formed on the side surfaces and the top surfaces of the forming and pressing preventing spacers 188 and 189. It is characteristic.

The first dummy pattern 179 may be a separate component, or the conductive pattern 175 when the gap forming spacers and the anti-pressing spacers 188 and 189 are formed to overlap the data line 130. ) May itself form the first dummy pattern.

In the drawing, the gap forming and pressing preventing spacers 188 and 189 are formed to correspond to the data line 130, so that the first dummy pattern 179 is formed as one part of the conductive pattern 175. Shown.

The gap forming spacers and the anti-pressing spacers 188 and 189 have a columnar shape, each of which is formed in an island shape, and is formed of an organic material having a characteristic of having a height of 1 μm or more.

The bonding force between the organic material and the metal material is relatively lower than the bonding between the organic material and the inorganic material or between the organic material and the organic material.

Accordingly, the pixel electrode 170, the central common electrode 173, and the conductive pattern 175 are first formed on the second protective layer 155 made of organic photoacryl, and the gap is formed thereon. In the case of forming the anti-pressing spacers 188 and 189, when the bonding force is relatively weak and an external force is applied from the outside, the gap-forming and anti-pressing spacers 188 and 189 are separated from the array substrate 102. This happens.

Therefore, in the liquid crystal display device 100 according to the embodiment of the present invention, in order to solve the problem that the above-described gap forming spacers and the anti-pressing spacers 188 and 189 are separated from the array substrate 102, the photoacryl may be formed of photoacryl. 2 The gap forming and pressing preventing spacers 188 and 189 are preferentially formed on the protective layer 155 to have a bonding force larger than the bonding force between the metal material and the organic material, and at the same time, the gap forming and pressing preventing spacer 188 is formed. And the first dummy pattern 179 made of a metal and a conductive material to cover the first and second layers 189, and thus the gap forming spacers and the anti-pressing spacers 188 and 189 are separated from the second protective layer 155. It is characterized by a configuration that prevents the loss.

Thus, in the liquid crystal display device 100 according to the exemplary embodiment of the present invention, the first dummy pattern 179 is provided to cover the gap forming spacers and the anti-pressing spacers 188 and 189. It is possible to prevent the spacers 188 and 189 from being separated from the second protective layer 155, and further, to suppress the black resin including the black pigment from being exposed to the liquid crystal layer 195. .

At this time, although not shown in the drawing, a second dummy pattern (not shown) made of metal and a conductive material may be further formed to cover the upper surface and the side surface of the black light resin to prevent the edge light leakage preventing pattern 187. .

On the other hand, the array substrate 102 having such a configuration is not shown in the figure, but the common portion of the pixel electrode 170 and the central portion of the non-display area NA, including the entire surface of the display area AA, are located inside the seal pattern 197. A first alignment layer (not shown) is disposed on the electrode 173, the conductive pattern 175, the auxiliary pixel pattern (not shown), the auxiliary common pattern (not shown), and the first dummy pattern 179.

On the other hand, the counter substrate 191 is provided to correspond to the array substrate 102 having such a configuration, and in this case, the inner surface of the opposing substrate 191 includes the front surface or the display area AA and the seal pattern ( It is a feature that only the second alignment layer (not shown) is provided corresponding to the region surrounded by 197.

The opposing substrate 191 may be made of a transparent glass material and a plastic material, or may be formed of a film having a multilayer structure made of heterogeneous acrylic materials.

In addition, a liquid crystal layer 195 is interposed between the array substrate 102 having the above configuration and the first and second alignment layers (not shown) of the counter substrate 191, and the gap forming spacer 188 is provided. The first alignment layer (not shown) positioned at the end of the first dummy pattern 179 formed covering the gap forming spacer 188 and the second alignment layer (not shown) provided on the opposing substrate 191 may be formed on the formed portion. ) Are in contact with each other so that the array substrate 102 and the counter substrate 191 form a constant spacing.

In this case, the edge light leakage preventing pattern 187 is formed in the non-display area NA so that the array substrate 102 and the counter substrate 191 are bonded to each other through the liquid crystal layer 195 to form a panel. The liquid crystal display device 100 according to the exemplary embodiment of the present invention is completed by providing the seal pattern 197 serving as an adhesive to surround the liquid crystal layer 195.

In the liquid crystal display device 100 according to the exemplary embodiment of the present invention, the common electrode 116 and 173 and the pixel electrode 170 are both provided on the array substrate 102 so that these common electrodes 116 and 173 are provided. And the transverse electric field type liquid crystal display device 100 in which the liquid crystal is driven by the transverse electric field generated by the pixel electrode 170, and the color filter layer 150 is provided on the array substrate 102 without the black matrix. It features a matrix-less thin film transistor (Tr) on color filter (COT) structure.

On the other hand, the liquid crystal display device 100 according to the embodiment of the present invention having such a configuration can omit a single mask process for forming the black matrix by eliminating the black matrix, thereby simplifying the process and at the same time reducing the manufacturing cost That has the advantage.

In addition, the liquid crystal display device 100 according to an exemplary embodiment of the present invention surrounds the display area AA and has the same material forming the spacers 188 and 189 for forming gaps and preventing depressions in the non-display area NA. The black resin containing phosphorus black pigment is provided with an edge light leakage preventing pattern 187 to serve as an edge black matrix (25 of FIG. 1) in a conventional liquid crystal display device (FIG. 1 of FIG. 1).

Accordingly, the liquid crystal display device 100 according to the exemplary embodiment of the present invention has an effect of suppressing light leakage of the edge of the display area AA generated by not forming a black matrix.

In addition, the liquid crystal display device 100 according to the exemplary embodiment of the present invention is provided on the array substrate 102 up to the gap forming and pressing preventing spacers 188 and 189 together with the color filter layer 150. By forming a configuration in which only the second doubling film (not shown) is provided, the defect due to the bonding error can be suppressed at the source even when the array substrate 102 and the counter substrate 191 are not bonded, without having a separate bonding margin. There is an advantage of forming a liquid crystal display having excellent quality.

In the liquid crystal display 100 according to the exemplary embodiment of the present invention, the edge light leakage preventing pattern 187 may be variously modified.

4 and 5 are cross-sectional views of a non-display area and a portion of a display area of the liquid crystal display according to the first and second modifications of the embodiment of the present invention.

In the case of the first and second modified examples according to the embodiment of the present invention, the same reference numerals are given to the same constituents as the embodiment, and 100 and 200 are added to the reference elements to prevent the light leakage patterns having different points. It was.

In the exemplary embodiment of the present invention, as shown in FIG. 3, the edge light leakage prevention of the single layer structure made of the same material forming the gap forming spacers 188 and 189 for forming gaps and preventing depressions on the second protective layer 155. Although the edge light leakage preventing pattern 187 is formed for the above, the edge light leakage preventing pattern 190 may be variously modified.

That is, as shown in FIG. 4A, in the liquid crystal display device 200 according to the first modified example, red and green are formed on the array substrate 102 to form the color filter layer 150 on the first protective layer 140. , A first layer light leakage prevention pattern 251 having a single layer structure formed of a color pattern of any one color of blue is formed, and the first edge light leakage prevention pattern 251 having a single layer structure is formed of photoacryl A second protective layer 155 is formed, and the material forming the gap and the anti-press spacers 188 and 189 corresponding to the first edge light leakage preventing pattern 251 on the second protective layer 155. Since the second edge light leakage preventing pattern 287 made of in black resin is formed, the edge light leakage prevention pattern 290 having a double layer structure is provided through the second protective layer 155.

In this case, the second edge light leakage preventing pattern 251 has the same second height as the depression preventing spacer 189, and like the gap forming spacer and the spacer for preventing depression 188 and 189, the upper edge thereof has a second edge. A second dummy pattern (not shown) may be formed to cover the light leakage preventing pattern 251.

Other components are the same as the above-described embodiment of the present invention, so description thereof will be omitted.

In addition, in the case of the liquid crystal display device 300 according to the second modified example, as shown in FIG. 4B, the non-display area NA of the array substrate 102 is displayed on the first protective layer 140. Color patterns 351a and 351b having two or more different colors among red, green, and blue color filter patterns constituting the color filter layer 150 in a form surrounding the area AA are overlapped to form a first layer of the double layer structure. The edge light leakage preventing pattern 351 is provided.

In this case, the color patterns 151a and 151b formed by overlapping the display area AA and overlapping the display area AA are preferably patterns 151a and 151b which respectively display red and blue colors as shown in the drawing. It is characterized by being formed to overlap and form a double layer structure.

In addition, a second edge light leakage prevention pattern 387 formed of black resin, which is a material forming the gap forming and pressing prevention spacers 188 and 189, is formed on the first edge light leakage prevention pattern 351 having the double layer structure. It is being formed.

Accordingly, in the liquid crystal display device 300 according to the second modification of the embodiment of the present invention, the first edge light leakage preventing pattern 387 having a double layer structure formed of color patterns of different colors and the second edge light leakage made of black resin are provided. The edge light leakage prevention pattern 390 forming a structure in which the prevention pattern 351 is stacked is provided.

In this case, although not shown in the figure, the gap forming and pressing preventing spacers 188, which cover the upper and side surfaces of the second edge light leakage preventing pattern 351, are not shown in the drawing. A second dummy pattern (not shown) made of the same material as the first dummy pattern 179 formed covering the 189 may be further formed.

Other components are the same as the above-described embodiment of the present invention, so description thereof will be omitted.

The present invention is not limited to the above embodiments and modifications, and various changes and modifications are possible without departing from the spirit of the invention.

100 liquid crystal display device 102 array substrate
105: gate electrode 116: outermost common electrode
118: gate insulating film 120: semiconductor layer
120a: active layer 120b: ohmic contact layer
121: semiconductor patterns 121a and 121b: first and second patterns
130: data wiring 133: source electrode
136: drain electrode 140: first protective layer
150: color filter layer 155: second protective layer
157: drain contact hole 170: pixel electrode
173: center common electrode 175: conductive pattern
179: First dummy pattern 181: Opposing substrate
187: border light leakage prevention pattern 188: gap forming spacer
189: anti-press spacer 195: liquid crystal layer
197: seal pattern
AA: Display Area NA: Non-Display Area
P: Pixel Area Tr: Thin Film Transistor
TrA: switching area

Claims (16)

A first substrate and a second substrate defined by the display area and the non-display area and facing each other via the liquid crystal layer;
Gate wiring and data wiring intersecting the display region of the inner surface of the first substrate to define a plurality of pixel regions;
A common wiring formed on an inner side surface of the first substrate in parallel with the gate wiring;
A thin film transistor connected to the gate wiring and the data wiring and formed in each of the pixel regions;
A color filter layer formed of a sequentially repeated red, green, and blue color filter pattern formed on the entire display area over the thin film transistor;
A first protective layer formed over the color filter layer;
A plurality of pixel electrodes connected to the thin film transistors on the first passivation layer and formed in the pixel areas;
A plurality of common electrodes connected to the common wiring on the first passivation layer and alternately formed with the plurality of pixel electrodes;
A patterned spacer having a pillar shape on the boundary of the pixel area over the first passivation layer;
The first edge light leakage preventing pattern formed of black resin on the non-display area of the first substrate and surrounding the display area
And a first dummy pattern formed of the same material covering the patterned spacer and forming the pixel electrode.
The method of claim 1,
And a second protective layer made of an inorganic insulating material is formed on the entire surface of the first substrate between the thin film transistor and the color filter layer.
The method of claim 2,
And the first edge light leakage preventing pattern is formed on and in contact with the second protective layer.
The method of claim 2,
In the non-display area of the first substrate, a red, green, and blue color filter pattern made of the same material between the first edge light leakage prevention pattern and the second protective layer in response to the first edge light leakage prevention pattern; And a color pattern of any one of green and blue to form a second edge light leakage preventing pattern.
The method of claim 4, wherein
And the first protective layer is interposed between the first edge light leakage preventing pattern and the second edge light leakage preventing pattern.
The method of claim 2,
In the non-display area of the first substrate, a red, green, and blue color filter pattern made of the same material between the first edge light leakage prevention pattern and the second protective layer in response to the first edge light leakage prevention pattern; And a second edge light leakage prevention pattern forming a double layer structure by overlapping color patterns of any two colors of green and blue.
The method according to claim 6,
The second edge light leakage preventing pattern and the first edge light leakage preventing pattern are formed in contact with each other.
8. The method according to any one of claims 1 to 7,
And a second dummy pattern formed of the same material forming the pixel electrode and covering the first edge light leakage preventing pattern.
8. The method according to any one of claims 1 to 7,
And a first and a second alignment layer formed on the uppermost part of the first substrate and the inner surface of the second substrate, respectively, and in contact with the liquid crystal layer.
8. The method according to any one of claims 1 to 7,
The patterned spacer may include a plurality of spacers for gap formation in the form of a column having a first height, and a plurality of spacers for preventing depression in the form of a column having a second height smaller than the first height. The liquid crystal display device, characterized in that the end is in contact with the inner surface of the opposing substrate.
8. The method according to any one of claims 1 to 7,
In the first substrate,
The outermost common electrode is formed in each of the pixel regions by branching from the common wiring to be adjacent to the data wiring.
And a conductive pattern formed of the same material forming the pixel electrode in correspondence with the data line and the outermost common electrode.
The method of claim 11,
And the pixel electrode, the common electrode, and the conductive pattern each have a double layer structure of a lower layer made of molybdenum and an upper layer made of a transparent conductive material or copper nitride (CuNx).
13. The method of claim 12,
The transparent conductive material may be any one of indium tin oxide (ITO), indium zinc oxide (IZO), and aluminum doped zinc oxide (AZO).
The method of claim 11,
The first protective layer, the color filter layer, and the second protective layer are provided with a drain contact hole exposing the drain electrode of the thin film transistor and a common contact hole exposing one end of the outermost common electrode,
And the pixel electrode contacts the drain electrode of the thin film transistor through the drain contact hole, and the common electrode contacts the outermost common electrode through the common contact hole.
15. The method of claim 14,
And the pixel electrode, the outermost common electrode, and the common electrode are symmetrically bent with respect to the center portion of each pixel region, so that each pixel region forms a double domain.
8. The method according to any one of claims 1 to 7,
And a seal pattern formed over the first edge light leakage preventing pattern on the first substrate.

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