KR101848827B1 - Liquid crystal display device - Google Patents

Abstract

The present invention provides a liquid crystal display device comprising: a first substrate and a second substrate which are defined by a display region and a non-display region and which are adhered to each other with a liquid crystal layer interposed therebetween; Gate lines and data lines formed to define a plurality of pixel regions intersecting with each other in the display region of the inner surface of the first substrate; A common wiring formed on an inner surface of the first substrate so as to be parallel to the gate wiring; A thin film transistor connected to the gate wiring and the data wiring and formed in each of the pixel regions; A color filter layer formed on the thin film transistor and having red, green, and blue color filter patterns sequentially repeating over the display region; A border light leakage prevention pattern formed by superimposing color patterns of two colors of red, green, and blue, which are made of the same material as the red, green, and blue color filter patterns, in the non-display area so as to surround the display area; A first protective layer formed on the entire surface of the color filter layer and the edge light shielding pattern; A plurality of pixel electrodes connected to the thin film transistors on the first passivation layer and formed in the pixel regions; A plurality of central common electrodes connected to the common wiring on the first protective layer and formed alternately with the plurality of pixel electrodes; A spacer for forming a cell gap and spacers formed on the inner surface of the second substrate, the spacers being spaced apart from each other by a predetermined distance in the display area and having a different height from each other, The present invention provides a liquid crystal display device including a plurality of auxiliary color patterns spaced apart in an island shape.

Description

[0001] Liquid crystal display device [0002]

The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device capable of reducing the number of mask processes by omitting a black matrix, preventing light leakage at an outermost viewing angle of the display area, To the same level so as to improve the display quality.

Recently, liquid crystal display devices have been attracting attention as next generation advanced display devices with low power consumption, good portability, and high value-added.

In general, a liquid crystal display device is driven by using optical anisotropy and polarization properties of a liquid crystal. Since the liquid crystal has a long structure, it has a directionality in the arrangement of molecules, and the direction of the molecular arrangement can be controlled by artificially applying an electric field to the liquid crystal.

Therefore, when the molecular alignment direction of the liquid crystal is arbitrarily adjusted, the molecular arrangement of the liquid crystal is changed, and light is refracted in the molecular alignment direction of the liquid crystal by optical anisotropy, so that image information can be expressed.

At present, active matrix liquid crystal display devices (hereinafter, abbreviated as liquid crystal display devices) in which a thin film transistor and pixel electrodes connected to the thin film transistor are arranged in a matrix manner have been receiving the most attention because of their excellent resolution and video realization ability.

1 is a cross-sectional view of a general liquid crystal display device.

As shown in the figure, the general liquid crystal display device 1 has a structure in which the array substrate 10 and the color filter substrate 20 are attached to each other with the liquid crystal layer 30 interposed therebetween.

The lower array substrate 10 is provided with a plurality of gate wirings (not shown) and data wirings (not shown) arranged vertically and horizontally on the upper surface thereof to define a plurality of pixel regions P, A thin film transistor Tr is provided at one of the intersections of the pixel electrodes 18 and the pixel electrodes 18 provided in the pixel regions P in a one-to-one correspondence.

The color filter substrate 20 has a lattice which surrounds each pixel region P so as to cover the gate wiring (not shown), the data wiring (not shown) and the thin film transistor Tr, The first black matrix 24 having the shape of the first black matrix 24 and the second black matrix 25 surrounding the entire display area AA are provided. A color filter layer 26 including red, green and blue color filter patterns 26a, 26b and 26c which are sequentially and repeatedly arranged corresponding to the pixel region P is formed on the front surface of the color filter layer 26, A transparent common electrode 28 is provided.

The two substrates 10 and 20 are provided with a seal pattern 70 along the outermost edges of the non-display area NA in order to prevent leakage of the liquid crystal layer 30 interposed therebetween. 10 and 20) and the liquid crystal layer 30 are interposed between the upper and lower alignment films (not shown) for giving an initial alignment state of liquid crystal molecules.

A first polarizer (not shown) is attached to the outer surface of the array substrate 10 and a second polarizer (not shown) is attached to the outer surface of the color filter substrate 20.

In addition, back-light is provided on the outer surface of the array substrate 10 provided with the thin film transistor Tr, more precisely on the outer surface of the first polarizer plate (not shown) to supply light.

Therefore, on / off signals of the thin film transistor Tr are sequentially applied to the gate wiring (not shown) to scan the pixel electrodes 18 of the selected pixel region P to form data lines (not shown) The liquid crystal molecules constituting the liquid crystal layer 30 are driven by the vertical electric field between them, and various images can be displayed by the light transmittance change.

The conventional general liquid crystal display device 1 having such a configuration is completed by performing several mask processes. Since the mask process includes a unit process of exposure, development, etching, and strip, it takes a lot of time, A photoresist, which is a photosensitive material, is generally used to increase the manufacturing cost.

Therefore, in recent years, efforts have been made to reduce the manufacturing cost of the liquid crystal display device and thereby reduce the number of mask processes.

As an effort to reduce such a mask process, attempts have been made to reduce the number of mask processes and further improve the aperture ratio by eliminating the black matrix provided on the color filter substrate.

However, when the black matrix provided on the color filter substrate of the liquid crystal display device, particularly the second black matrix surrounding the display area, is removed, light leakage occurs at the edge of the display area to degrade the display quality of the liquid crystal display device It is true.

The present invention has been conceived in order to solve the problems of the conventional liquid crystal display device, and it is an object of the present invention to provide a liquid crystal display device capable of suppressing light leakage at the edge of the display area even when the black matrix is removed, And an object thereof is to provide a device.

According to an aspect of the present invention, there is provided a liquid crystal display device comprising: a first substrate and a second substrate which are defined by a display area and a non-display area and which are bonded to each other with a liquid crystal layer interposed therebetween; Gate lines and data lines formed to define a plurality of pixel regions intersecting with each other in the display region of the inner surface of the first substrate; A common wiring formed on an inner surface of the first substrate so as to be parallel to the gate wiring; A thin film transistor connected to the gate wiring and the data wiring and formed in each of the pixel regions; A color filter layer formed on the thin film transistor and having red, green, and blue color filter patterns sequentially repeating over the display region; A border light leakage prevention pattern formed by superimposing color patterns of two colors of red, green, and blue, which are made of the same material as the red, green, and blue color filter patterns, in the non-display area so as to surround the display area; A first protective layer formed on the entire surface of the color filter layer and the edge light shielding pattern; A plurality of pixel electrodes connected to the thin film transistors on the first passivation layer and formed in the pixel regions; A plurality of central common electrodes connected to the common wiring on the first protective layer and formed alternately with the plurality of pixel electrodes; A spacer for forming a cell gap and spacers formed on the inner surface of the second substrate, the spacers being spaced apart from each other by a predetermined distance in the display area and having a different height from each other, And a plurality of auxiliary color patterns spaced apart in an island shape.

Wherein the auxiliary color pattern is formed of a color filter pattern of any one of red, green, and blue color filter patterns, and has a color different from a color pattern of the light leakage prevention pattern, 1, the outermost edge adjacent to the edge of the substrate has a stepped shape.

In addition, the edge light-preventing pattern is characterized in that red and blue color patterns are superimposed, and the auxiliary color pattern is green.

Wherein the cell gap forming spacer is in contact with an end portion of the uppermost layer of the first substrate and the first protective layer located on the auxiliary color pattern is in contact with the second substrate, The light leakage preventing pattern, the auxiliary color pattern, and the first protective layer serve as the spacers for forming the cell gap.

And a second protective layer made of an inorganic insulating material is formed on the entire surface of the first substrate between the thin film transistor and the color filter layer.

In addition, an outermost common electrode is formed in each of the pixel regions in the first substrate so as to branch off from the common wiring and adjacent to the data wiring in an adjacent manner, and the data wiring and the outermost common electrode The pixel electrode, the central common electrode, and the conductive pattern are formed of molybdenum titanium, and the conductive pattern is formed of the same material as the central common electrode corresponding to the common electrode, thereby preventing light leakage in each pixel region. (ITO), indium-zinc-oxide (IZO), aluminum-doped zinc-oxide (ITO), and the like. The transparent conductive material has a double layer structure of a transparent conductive material or an upper layer composed of a transparent conductive material or copper nitride AZO).

A drain contact hole exposing a drain electrode of the thin film transistor and a common contact hole exposing one end of the outermost common electrode are formed in the first passivation layer, the color filter layer and the second passivation layer, And the drain electrode of the thin film transistor is in contact with the drain electrode of the thin film transistor through the drain contact hole, and the common electrode is in contact with the outermost common electrode through the common contact hole.

The pixel electrode, the outermost common electrode, and the common electrode are symmetrically bent with respect to the center of each pixel region, so that each pixel region forms a double domain.

A liquid crystal display device according to the present invention is characterized in that a color filter layer composed of color filter patterns of red, green and blue is formed on an array substrate, and two color filter layers are formed on the array substrate in such a manner as to surround the non- The color filter pattern of the color is overlapped to form the light leakage preventing pattern, thereby preventing the edge light leakage and improving the display quality.

In addition, the remaining color filter patterns that are not used for the edge light leakage preventing patterns are selectively formed on the edge light leakage preventing patterns provided in the non-display area in a manner to be spaced apart from each other by a predetermined distance, The cell gap in the display area and the non-display area are matched to each other to prevent deterioration of display quality due to the cell gap difference.

In addition, the liquid crystal display device according to the present invention has the effect of reducing the number of mask processes, reducing the material cost, and ultimately reducing the manufacturing cost by omitting the black matrix. By omitting the black matrix for framing the pixel region on the color filter substrate, .

1 is a cross-sectional view of a display area and a part of a non-display area of a conventional general liquid crystal display device.
2 is a cross-sectional view of a non-display area and a part of a display area of a liquid crystal display according to an embodiment of the present invention.
3 is a cross-sectional view of a non-display area and a part of a display area of a liquid crystal display device according to a first comparative example.
4 is a cross-sectional view of a non-display area and a part of a display area of a liquid crystal display device according to a first comparative example;

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

2 is a cross-sectional view of a non-display area and a part of a display area of a liquid crystal display device according to an embodiment of the present invention. At this time, in the drawing, the thin film transistor Tr is provided only for one pixel region P among the plurality of pixel regions P in the display region AA. For convenience of explanation, each pixel region P A region where a thin film transistor Tr as a switching element is formed is defined as a switching region TrA and a region where a storage capacitor (not shown) is formed is defined as a storage region (not shown).

The liquid crystal display 100 according to the exemplary embodiment of the present invention includes a plurality of pixel electrodes 170 and a central common electrode 173 in the form of a bar, (188) having a first height and a pressure suppression spacer (189) having a second height lower than the first height, the array substrate (102) having the color filter layer (181) and a liquid crystal layer (195).

First, gate lines (not shown) extending in one direction are formed in the display area AA of the lower array substrate 102 and common wirings (not shown) are formed in parallel to the gate wirings Respectively. At this time, a portion of the gate wiring (not shown) itself or a portion branched from the gate wiring (not shown) corresponding to the switching region TrA constitutes the gate electrode 105.

In the pixel region P, an outermost common electrode 116 is formed, which is branched from the common wiring (not shown) and adjacent to the data line 130. The storage region (not shown) And a first storage electrode (not shown) is formed as wiring (not shown) per se.

The gate wiring (not shown), the gate electrode 105, the common wiring (not shown), the outermost common electrode 116, and the first storage electrode (not shown) provided in the array substrate 102 are all formed of the same layer To form a first metal layer having a thickness of about 3000 Å to about 4000 Å, and then patterning the first metal layer to have the same thickness.

Next, an inorganic insulating material such as silicon oxide (SiO ₂ ) or silicon nitride (SiO ₂ ) is formed on the entire surface of the gate wiring (not shown), the gate electrode 105, the common wiring (not shown) and the outermost common electrode 116 A gate insulating film 118 made of SiNx is formed. At this time, the gate insulating layer 118 has a thickness of about 2000 Å to 3500 Å and has the same thickness over the entire surface.

An active layer 120a made of pure amorphous silicon and an ohmic contact layer 120b made of impurity amorphous silicon and spaced apart from each other are formed in the switching region TrA above the gate insulating layer 118, The semiconductor layer 120 is formed.

A data line 130 is formed on the gate insulating layer 118 to define a pixel region P intersecting the gate line (not shown). At this time, a semiconductor pattern 121 including first and second patterns 121a and 121b made of the same material forming the semiconductor layer 120 is formed under the data line 130. However, 121 may be omitted due to the manufacturing process.

A source electrode 133 is formed in the switching region TrA so as to branch off from the data line 130 above the semiconductor layer 120. The source electrode 133 is spaced apart from the source electrode 133, Respectively. At this time, the source electrode 133 and the drain electrode 136 are in contact with the ohmic contact layer 120b which are separated from each other.

The gate electrode 105, the gate insulating film 118, the semiconductor layer 120, and the source and drain electrodes 133 and 136, which are sequentially stacked in the switching region TrA, Respectively.

The semiconductor layer 120 formed of the active layer 120a made of pure amorphous silicon and the ohmic contact layer 120b made of the impurity amorphous silicon has a thickness of about 1000 Å to about 1500 Å, The source and drain electrodes 133 and 136 have a thickness of about 2000 Å to about 4000 Å.

The drain electrode 136 extends to correspond to the first storage electrode (not shown) above the gate insulating layer 118 to form a second storage electrode (not shown) in the storage region (not shown) . At this time, the first storage electrode (not shown), the gate insulating layer 118, and the second storage electrode (not shown), which are sequentially stacked in the storage region (not shown), constitute storage capacitors (not shown).

Next, a first insulating layer (not shown) made of an inorganic insulating material such as silicon oxide (SiO ₂ ) or silicon nitride (SiNx) is formed on the data line 130, the source and drain electrodes 133 and 136, A protective layer 140 is formed on the entire surface. At this time, the first passivation layer 140 has a thickness of about 1000 Å to 1500 Å.

In the display area AA, the first passivation layer 140 is formed on the gate line (not shown) and the data line 130 in a bordered manner corresponding to each pixel region P, A color filter layer 150 having a shape in which the color filter patterns 150a, 150b, and 150c are sequentially repeated is formed.

The color filter layer 150 has a thickness of about 12,000 to 25,000 ANGSTROM. At this time, the red, green and blue color filter patterns 150a, 150b and 150c may have the same thickness or may have different thicknesses within the thickness range of red, green and blue.

The non-display area NA includes part of the outermost portion of the display area AA as one of the most characteristic structures in the liquid crystal display device 100 according to the embodiment of the present invention, The color patterns 151a and 151b having two or more different colors of the red, green, and blue color filter patterns 151a, 151b, and 151c forming the color filter layer 150 are formed in a superimposed manner, Prevention pattern 151 is formed. The rim prevention pattern 151 serves as a rim black matrix (25 in FIG. 1) provided in a conventional liquid crystal display device (1 in FIG. 1) for preventing edge light leakage generated around the display area AA .

At this time, the edge light leakage prevention pattern 151 surrounding the display area AA in the non-display area NA is formed so that the red and blue patterns 151a and 151b overlap each other to form a double layer structure Is preferably formed.

This is because, in the case of the green color filter pattern 150b, the optical density of the red and blue color filter patterns 150a and 150c is relatively lower than that of the red and blue color filter patterns 150a and 150c.

At this time, the outermost edge of the edge light leakage preventing pattern 151 has a stepped shape of right upward.

The formation of the edge light blocking prevention pattern 151 in which the color patterns 151a and 151b of different colors are formed in a superposed manner such that the outermost edge has a stepped shape may be caused by a sharp step of the component This is to suppress rubbing failure.

According to another exemplary embodiment of the present invention, a color pattern 151a and 151b having different colors from the color patterns 151a and 151b of the different colors forming the edge light-preventing pattern 151 may be formed on the edge light- (Hereinafter referred to as an auxiliary color pattern 152) is formed in an island shape at a predetermined interval so that a second protective layer 155 provided on the second protective layer 155 and a second protective layer 155 And serves as a spacer for auxiliary gap formation together with the rim prevention pattern 151.

The reason why the edge light-preventing pattern and the auxiliary color pattern are superimposed on each other to serve as a spacer for forming the auxiliary gap will be described later in detail.

Next, a second passivation layer 155 made of photo acryl, which is a material having a relatively low dielectric constant, is formed on the color filter layer 150 and the edge light prevention pattern 151. At this time, the second passivation layer 155 is formed to have a thickness of about 10000 Å to 15000 Å. In this case, the second protective layer 155 made of photo-acryl has a flat surface over the step for the step smaller than the thickness of the second protective layer 155 due to the planarization property of the photo-acrylic, And the step difference larger than the thickness of the protective layer 155 is formed by reflecting the step difference.

In the exemplary embodiment of the present invention, the edge light leakage prevention pattern 151 having a two-layer structure of two color patterns 151a and 151b of different colors has red, green, and blue color filter patterns 150a, 150b, and 150c, And has a thickness greater than the thickness of the second passivation layer 155.

Therefore, the second passivation layer 155 provided on the rim prevention pattern 151 has a thinner thickness than the second passivation layer 155 formed in the display area.

The formation of the second passivation layer 155 with the photo-acryl material having the low dielectric constant is performed in a superposition of the data line 130 and the conductive pattern 175 formed on the uppermost common electrode 116 And minimizes the influence of the undesired electric field generated by the data line 130 and the outermost common electrode 116 formed in the periphery of the data line 130. In addition,

In addition, since photo-acryl has a negative type characteristic that is left at the time of development upon reception of light, when a contact hole or the like is formed in the lower part of the manufacturing process, it is not necessary to perform a separate strip process, This is because it has advantages.

The color filter layer 150, the first passivation layer 140, and the gate insulating layer 118, which are provided below the second passivation layer 155 made of photoacrylic material having such a low dielectric constant, The color filter layer 150 and the first passivation layer 140 are formed with a common contact hole (not shown) exposing one end of the electrode 116. The second passivation layer 155, the color filter layer 150, A drain contact hole 157 is formed to expose the second storage electrode (not shown), which is a portion where the drain electrode 136 extends.

Next, a lower layer (not shown) made of moly titanium (MoTi), which is an opaque low resistance metal material, and a transparent layer (not shown) are formed on the second passivation layer 155 having the common contact hole (not shown) and the drain contact hole 157, (Not shown) made of copper nitride (CuNx), which is one of indium-tin-oxide (ITO), indium-zinc-oxide (IZO), aluminum- doped zinc- (Not shown) having a bilayer structure and an auxiliary pixel pattern (not shown) facing each other.

At this time, the auxiliary common pattern (not shown) is in contact with the outermost common electrode 116 through the common contact hole (not shown), and the auxiliary pixel pattern (not shown) (Not shown) connected to the drain electrode 136 through the second storage electrode (not shown).

A conductive pattern 175 is formed on the second passivation layer 155 so as to overlap the data line 130 and the outermost common electrode 116 adjacent to the data line 130 by branching from the auxiliary common pattern (not shown) . This conductive pattern 175 is formed to overlap with the boundary region of each pixel region P, and thus serves as a role of the first black matrix (24 in FIG. 1) provided in the display region of the conventional liquid crystal display device (1 in FIG. 1) .

In this case, the common auxiliary pattern (not shown) may be formed so as to cover the gate wiring (not shown) and the common wiring (not shown) Is formed in a lattice shape surrounding each pixel region P regardless of the pixel region P in the display region AA together with the conductive pattern 175 connected thereto.

In each pixel region P, a plurality of center portion common electrodes 173 in the form of a bar branched from the auxiliary common pattern (not shown) and having a bilayer structure are formed on the second protection layer 155 And is spaced apart from the outermost common electrode 116 by a predetermined distance.

In each pixel region P, a plurality of central common electrodes 173 in the form of a bar are branched from the auxiliary pixel pattern (not shown) to the inside of the outermost common electrode 116, a plurality of pixel electrodes 170 in a bar shape are formed.

At this time, the plurality of pixel electrodes 170 and the central common electrode 173 are formed of a lower layer 170a, 173a made of moly titanium (MoTi), a transparent conductive material such as indium-tin-oxide (ITO), indium- Layer structure composed of an upper layer 170b and a lower layer 173b made of copper nitride (CuNx), which is either low-reflectivity opaque metal material, IZO, or aluminum-doped zinc-oxide (AZO).

At this time, the pixel electrode 170, the central common electrode 173, and the outermost common electrode 116 having the bilayer structure may have a linear bar shape in each pixel region P, And may have a bar shape that is symmetrically deflected with respect to a central portion of each pixel region P. [

In the case where the pixel electrode 170 and the common electrodes 116 and 173 are formed in a bar shape symmetrically in each pixel region, each pixel region P has a double domain, And has an effect of suppressing color difference generation.

 The plurality of pixel electrodes 170 and the common electrodes 116 and 173 are bent in the pixel regions P so that the data lines 130 are also aligned with the center of each pixel region P And has a symmetrically deflected configuration.

Since the data lines 130 are not formed separately for each pixel region P but are connected to the entire display region, the data lines 130 are formed in a central portion of each pixel region P in the display region It is characterized in that it forms a zigzag shape which is bent by reference.

The common electrodes 116 and 173 and the pixel electrodes 170 and the data lines 130 are formed in the center portion of each pixel region P in the case of the array substrate for the transverse electric field type liquid crystal display device 100 according to the embodiment of the present invention, The common electrodes 116 and 173 and the pixel electrodes 170 and the data lines 130 must be formed in a central portion of each pixel region P as shown in FIG. It is not necessary to form a folded structure by reference, and it may be a straight line.

On the other hand, the opposing substrate 181, which is located in correspondence with the array substrate 102 having such a configuration, is formed of a transparent organic insulating material and has a first height in a columnar shape corresponding to the boundary of some pixel regions P in the display region Spacing spacers 188 are formed spaced apart from each other by a predetermined distance. At the same time, a pillar-shaped spacer 189 having a second height smaller than the first height is formed at a predetermined interval.

In this case, the gap-forming spacer 188 is not formed in the non-display area NA of the liquid crystal display 100 according to the embodiment of the present invention, The auxiliary color pattern 152 and the second protective layer 155 serve as a gap forming spacer 188 provided on the counter substrate 181.

The reason why the cell gap forming spacer 188 is not formed on the counter substrate 181 in correspondence with the non-display area NA is that the array substrate 102 is provided with the edge light leakage prevention pattern 151 so as to serve as a frame black matrix, And the counter substrate 181 is positioned and attached so that the counterpressure spacer 189 having a relatively small second height corresponds to the counterpart substrate 181 corresponding to the display area AA, And the cell gap is poor.

3 (a cross-sectional view showing a part of a non-display region and a display region of the liquid crystal display device according to the first comparative example, in which 100 is added to the same constituent elements as those of the embodiment of the present invention, The central portion of the pixel region P includes a gate insulating film 218, a first passivation layer 240, and a first passivation layer 240. In this case, The filter layer 250 and the second protective layer 255 are stacked.

The gate insulating layer 218 has a thickness of about 2800 Å, the first passivation layer 240 has a thickness of about 1000 Å, the color filter layer 250 having a red color filter pattern 250a has a thickness of about 22000 Å, The blue color filter pattern 250c is 20000 angstroms), and the second passivation layer 255 is formed to have a thickness of 12300 angstroms, the final height of the central portion of each pixel region is 38100 angstroms with respect to the surface of the array substrate 202 , And the first height of the spacer 188 for forming a gap of 37000 angstroms is 75100 angstroms.

Therefore, in the case of the liquid crystal display device 200 according to the first comparative example, there is a gap of 75100 angstroms between the facing surfaces of the counter substrate 281 and the array substrate 202 in the display area AA Able to know.

On the other hand, in the non-display area NA, the portion where the edge light leakage preventing pattern 151 is formed is not shown in the drawing, but an auxiliary wiring (not shown) is formed on the same layer where the gate wiring (not shown) The gate insulating film 218 and the first passivation layer 240 are formed to overlap each other with the red and blue color patterns 251a and 251b having a thickness of 22000 Å and 20000 Å, respectively. And the second protective layer 255 is 8000 Å (the thickness of the display area is decreased by the step difference), and the second protective layer 255 has a relatively small second height formed on the counter substrate 281 (31000 ANGSTROM) correspond to each other, it can be understood that the spacing distance between the surface of the array substrate 202 and the surface of the counter substrate 281 is 88100 ANGSTROM.

Therefore, in the case of the liquid crystal display device 200 according to the first comparative example, the cell gap difference is about 13000 ANGSTROM in the display area AA and the non-display area NA as described above.

In this case, when the array substrate 202 and the counter substrate 281 are bonded together to form the liquid crystal display device 200 in a state where there is a difference in cell gap between the non-display area NA and the display area AA, The display quality is degraded due to the cell gap difference.

In order to prevent deterioration of display quality caused by the difference in cell gap, as a second comparative example, a cross-sectional view showing a part of the display area and the non-display area of the liquid crystal display device according to the second comparative example The cell gap forming spacers 288 and the compression preventing spacers 289 of the first and second heights provided on the counter substrate 281 have a lower third height than the cell gap forming spacers 288 and the compression preventing spacers 289 However, in this case, since a separate mask process must be performed for the spacer 290 having the third height, a mask reduction effect generated by deleting the black matrix can not be realized .

2, in the liquid crystal display device 100 according to the embodiment of the present invention, the cell gap (hereinafter, referred to as " cell gap ") generated in the liquid crystal display device according to the first and second comparative examples Display area NA in the non-display area NA by overlapping the auxiliary color pattern 152 in addition to the edge light-shielding pattern 151 as described above in order to suppress the occurrence of problems such as defects and increase in the number of mask processes, As well.

For example, assuming that the liquid crystal display device 100 according to the embodiment of the present invention is formed to have the same thickness as the constituent elements of the liquid crystal display device 200 according to the first comparative example (200 in FIG. 3) If the filter pattern 150b is formed to have a thickness of 18000 ANGSTROM, the auxiliary color pattern 152 has the same thickness and the same thickness as the green color filter pattern 150b.

Therefore, in the non-display area NA, the thickness up to the uppermost layer of the edge anti-glare pattern 151 is 49100 angstroms, and the thickness of the auxiliary color pattern 152 overlapped with the upper edge of the anti- The sum of the thickness of 18000A and the thickness of the second protective layer of 8000A has a total thickness of 75100A in the non-display area NA, which is equal to the total thickness of the pixel area P of the display area AA Able to know.

In this case, since the liquid crystal display device 100 according to the embodiment of the present invention has substantially no cell gap difference between the display area AA and the non-display area NA, it is possible to prevent display quality deterioration caused by the cell gap difference.

On the other hand, the liquid crystal layer 195 is resumed between the array substrate 102 and the counter substrate 181 having such a configuration, and the end of the gap forming spacer 188 is positioned at the top of the array substrate 102 And are joined together.

At this time, the non-display area NA serves as an adhesive to surround the liquid crystal layer 195 so that the array substrate 102 and the counter substrate 181 are adhered to each other to maintain the state of the panel. The liquid crystal display device 100 according to the embodiment of the present invention is completed by providing the seal pattern 197.

In the liquid crystal display device 100 according to the embodiment of the present invention having such a configuration, since the common electrodes 116 and 173 and the pixel electrode 170 are both provided on the array substrate 102, And the liquid crystal is driven by the transverse electric field generated by the pixel electrode 170 and the color filter layer 150 without the black matrix on the array substrate 102 And a color filter on TFT (COT) structure without a black matrix.

Meanwhile, the liquid crystal display device 100 according to the embodiment of the present invention having such a configuration does not form a black matrix, so that a single mask process for forming a black matrix can be omitted, thereby simplifying the process and reducing the manufacturing cost .

The liquid crystal display device 100 according to the exemplary embodiment of the present invention includes the edge light leakage prevention pattern 151 formed by superimposing two or more color filter patterns 151a and 151b having different colors constituting the color filter layer 150 Is formed in a non-display area NA including a part of the outermost part of the display area AA in a form surrounding the display area AA so as to serve as a frame black matrix in a conventional liquid crystal display device.

Therefore, the liquid crystal display device 100 according to the embodiment of the present invention has the effect of suppressing the generation of light leakage in the edge of the display area AA generated by not forming the black matrix.

The liquid crystal display 100 according to the embodiment of the present invention may further include a plurality of auxiliary color patterns 152 spaced apart from each other in an irregular manner on the edge light leakage prevention pattern 151 in the non- ) So as to function as a spacer for forming a cell gap together with the edge light preventing pattern 152 so that cell gaps in the display area AA and the non-display area NA coincide with each other. Thereby, there is an effect of suppressing the display quality deterioration due to the cell gap difference.

100: liquid crystal display device 102: array substrate
105: gate electrode 116: outermost common electrode
118: gate insulating film 120: semiconductor layer
120a: active layer 120b: ohmic contact layer
121: semiconductor patterns 121a and 121b: first and second patterns
130: data line 133: source electrode
136: drain electrode 140: first protective layer
150: Color filter layer
150a, 150b, 150c: red, green, and blue color filter patterns
151: Rim prevention pattern
151a and 151b: upper and lower color patterns (of the border light preventing pattern)
152: auxiliary color pattern 155: second protective layer
157: drain contact hole 170: pixel electrode
173: central common electrode 175: conductive pattern
181: opposing substrate 187: second border light leakage prevention pattern
188: gap forming spacer 189: pressing preventing spacer
195: liquid crystal layer 197: seal pattern
AA: display area NA: non-display area
P: pixel region Tr: thin film transistor
TrA: switching area

Claims (12)

A first substrate and a second substrate which are defined by a display region and a non-display region and are bonded to each other with a liquid crystal layer interposed therebetween;
Gate lines and data lines formed to define a plurality of pixel regions intersecting with each other in the display region of the inner surface of the first substrate;
A common wiring formed on the inner surface of the first substrate in parallel with the gate wiring;
A thin film transistor connected to the gate wiring and the data wiring and formed in each of the pixel regions;
A color filter layer covering the thin film transistor and having red, green, and blue color filter patterns sequentially formed on the entire surface of the display region;
A border light leakage prevention pattern formed by superimposing color patterns of two colors of red, green, and blue, which are made of the same material as the red, green, and blue color filter patterns, in the non-display area so as to surround the display area;
A first protective layer formed on the entire surface of the color filter layer and the edge light shielding pattern;
A drain contact hole formed in the first passivation layer and the color filter layer, the drain contact hole exposing a drain electrode of the thin film transistor;
A plurality of pixel electrodes disposed in the respective pixel regions, the pixel electrodes being disposed on the first passivation layer and in contact with the drain electrodes of the thin film transistors through the drain contact holes;
A plurality of central common electrodes connected to the common wiring on the first protective layer and formed alternately with the plurality of pixel electrodes;
A spacer for forming a cell gap formed in the inner surface of the second substrate and formed in a columnar shape having a different height from the display region and spaced apart from the common wiring by a predetermined distance,
.

The method according to claim 1,
Further comprising a plurality of auxiliary color patterns spaced apart in an island form between the edge light-preventing pattern and the first protective layer,
Wherein the auxiliary color pattern comprises a color filter pattern of any one of red, green, and blue color filter patterns, and has a color different from a color pattern of the light leakage prevention pattern.

3. The method of claim 2,
Wherein the edge light leakage preventing pattern has an outermost edge adjacent to an edge of the first substrate in a stepped shape.
The method of claim 3,
Wherein the rim prevention pattern is formed by overlapping red and blue color patterns, and the auxiliary color pattern is green.
3. The method of claim 2,
Wherein the cell gap forming spacer is in contact with an end of a component provided on the uppermost layer of the first substrate,
The edge light leakage prevention pattern, the auxiliary color pattern, and the first protective layer overlapping each other by the contact of the first protective layer and the second substrate located above the auxiliary color pattern serve as the cell gap formation spacer .
The method according to claim 1,
And a second protective layer made of an inorganic insulating material is formed between the thin film transistor and the color filter layer.
The method according to claim 1,
In the first substrate,
An outermost common electrode branched from the common wiring and formed adjacent to the data wiring in the pixel region is formed,
And a conductive pattern made of the same material as the central common electrode corresponding to the data line and the outermost common electrode is formed on the first passivation layer to prevent light leakage in each pixel region.
8. The method of claim 7,
Wherein the pixel electrode, the central common electrode, and the conductive pattern each have a bilayer structure of a lower layer made of moly titanium and an upper layer made of a transparent conductive material or copper nitride (CuNx).
9. The method of claim 8,
Wherein the transparent conductive material is any one of indium-tin-oxide (ITO), indium-zinc-oxide (IZO), and aluminum-doped zinc-oxide (AZO).
10. The method of claim 9,
Wherein the first passivation layer and the color filter layer are provided with a common contact hole exposing one end of the outermost common electrode,
And the common electrode is in contact with the outermost common electrode through the common contact hole.
The method according to claim 1,
Wherein the pixel electrode, the outermost common electrode, and the common electrode are symmetrically bent with respect to a central portion of each pixel region, so that each pixel region forms a double domain. 3. The method of claim 2,
Wherein the first protective layer has a first thickness in the display region and a second thickness that is thinner than the first thickness on the edge light leakage preventing pattern.

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