KR102419748B1 - Liquid crystal display device having uniform cell gap - Google Patents

Abstract

In the present invention, in order to prevent the color filter layer disposed in the pixel-to-pixel region of the first substrate from being smaller than the color filter layer in the dummy region, thereby preventing the cell gaps of the display region and the dummy region from being different, the first column spacer of the display region is The cell gap of the display area and the dummy area is made the same by increasing the height of the second column spacer of the dummy area or removing some or all of the protective layer or color filter layer under the second column spacer.

Description

Liquid crystal display device with uniform cell gap {LIQUID CRYSTAL DISPLAY DEVICE HAVING UNIFORM CELL GAP}

The present invention relates to a liquid crystal display device, in particular, a liquid crystal display in which a color filter layer is disposed on an array substrate and the cell gap in the display area and the dummy area is constantly maintained constant by adjusting the heights of spacers disposed in the display area and the dummy area. It's about the little ones.

In recent years, with the development of various portable electronic devices such as mobile phones, PDAs, and notebook computers, the demand for flat panel display devices that can be applied to them is gradually increasing. Although LCD (Liquid Crystal Display), PDP (Plasma Display Panel), FED (Field Emission Display), and VFD (Vacuum Fluorescent Display) are being actively studied as such flat panel display devices, mass production technology, ease of driving means, and high quality Due to implementation reasons, liquid crystal display devices (LCDs) are currently in the spotlight.

1 is a view showing the structure of a general liquid crystal display device. FIG. 1A is a plan view, and FIG. 1B is a cross-sectional view taken along line I-I' of FIG. 1A.

As shown in FIG. 1A , a pixel of the liquid crystal display 1 is defined by gate lines 3 and data lines 4 arranged vertically and horizontally. Although only the (n, m)-th pixel is shown in the drawing, in an actual liquid crystal panel 1, n and m of the above-described gate lines 3 and m data lines 4 are respectively arranged in the liquid crystal panel (1). n x m pixels are formed over the whole. A thin film transistor 10 is formed at the intersection of the gate line 3 and the data line 4 in the pixel. The thin film transistor 10 includes a gate electrode 11 to which a scan signal is applied from the gate line 3, and a semiconductor layer formed on the gate electrode 11 and activated as a scan signal is applied to form a channel layer ( 12) and a source electrode 13 and a drain electrode 14 that are formed on the semiconductor layer 12 and to which an image signal is applied through a data line 4, and receive an image signal input from the outside in the liquid crystal layer 40 ) is approved.

In the pixel, a plurality of common electrodes 5 and pixel electrodes 7 are arranged substantially parallel to the data line 4 . In addition, a common line 16 connected to the common electrode 5 is disposed in the middle of the pixel, and a pixel electrode line 18 connected to the pixel electrode 7 is disposed on the common line 16, It overlaps with the common line (16). A storage capacitance is formed in the transverse electric field mode liquid crystal display device by the overlap of the common line 16 and the pixel electrode line 18 .

When the thin film transistor 10 is driven and an image signal is applied to the pixel electrode 7 , a transverse electric field substantially parallel to the surface of the liquid crystal display device 1 is generated between the common electrode 5 and the pixel electrode 7 . will do Since the liquid crystal molecules rotate in parallel with the liquid crystal panel 1 along the transverse electric field, it is possible to prevent grayscale inversion due to the refractive index anisotropy of the liquid crystal molecules.

The conventional liquid crystal display device having the above structure will be described in more detail with reference to the cross-sectional view of FIG. 1B as follows.

As shown in FIG. 1B , a gate electrode 11 is formed on the first substrate 20 , and a gate insulating layer 22 is stacked over the entire first substrate 20 . A semiconductor layer 12 is formed on the gate insulating layer 22 , and a source electrode 13 and a drain electrode 14 are formed thereon. In addition, a passivation layer 24 is formed over the entire first substrate 20, and a first alignment film ( 28a) is formed.

In addition, a plurality of common electrodes 5 are formed on the first substrate 20 , and a pixel electrode 7 and a data line 4 are formed on the gate insulating layer 22 , and the common electrode 5 and A transverse electric field E is generated between the pixel electrodes 7 .

A black matrix 32 and a color filter layer 34 are formed on the second substrate 30 . The black matrix 32 is used to prevent light from leaking to a region where liquid crystal molecules do not operate. area) is mainly formed. The color filter layer 34 is composed of R (Red), B (Blue), and G (Green) to realize actual colors. An overcoat layer 36 for protecting the color filter layer 34 and improving the flatness of the substrate is formed on the color filter layer 34 .

A liquid crystal layer 40 is formed between the first substrate 20 and the second substrate 30 to complete the liquid crystal display device 1 .

As described above, in the conventional liquid crystal display device, a transverse electric field is generated inside the liquid crystal layer 40 by the common electrode 5 and the pixel electrode 7 formed on the first substrate 20 and the gate insulating layer 22, respectively. Accordingly, since the liquid crystal molecules inside the liquid crystal layer 40 are rotated in a horizontal state with the substrates 20 and 30, it is possible to prevent gradation inversion due to the refractive index anisotropy of the liquid crystal molecules.

However, the liquid crystal display device as described above has the following problems. In a conventional liquid crystal display device, various metal patterns such as a thin film transistor 10, a common electrode 5, and a pixel electrode 7 are formed on a first substrate 20, and a color filter 34 and a color filter 34 and Since the black matrix 32 is formed, when the first substrate 20 and the second substrate 30 are bonded together, if the first substrate 20 and the second substrate 30 are not accurately aligned, an alignment error occurs. As a result, a defect occurs in the manufactured liquid crystal display device. In order to solve this problem, the first substrate 20 and the second substrate 30 are bonded using a separate alignment device, but in this case, an expensive alignment device is required, which increases the manufacturing cost and the manufacturing process. There was also the problem of this delay.

An object of the present invention is to provide a liquid crystal display device and a manufacturing method that do not require precise alignment of the substrate by forming a color filter layer on a substrate on which a thin film transistor is disposed.

Another object of the present invention is to provide a liquid crystal display device and a manufacturing method capable of preventing a cell gap difference due to flow of a pigment or dye due to a step difference in a pixel-to-pixel region.

In order to achieve the above object, in the present invention, a color filter layer is formed on a first substrate on which a thin film transistor is disposed, and a black matrix is also formed on the first substrate. Accordingly, precise alignment is not required when bonding the first substrate and the second substrate. As a result, an expensive alignment device is not required, thereby reducing the manufacturing cost and simplifying the manufacturing process.

In the present invention, the cell gap of the liquid crystal display is constantly maintained by disposing the first column spacer and the second column spacer in the display area and the dummy area, respectively. In this case, the first column spacer is disposed on the pixel-to-pixel region or the thin film transistor. When the color filter layer is formed in the display area, two color filter layers are stacked on the thin film transistor and the area between adjacent pixels. The thickness of the upper color filter layer is reduced due to the flowing down.

Therefore, when the first column spacer and the second column spacer are formed at the same height, a cell gap difference occurs in the display area and the dummy area. In the present invention, in order to prevent this cell gap difference, the height of the first column spacer is increased The cell gaps of the display area and the dummy area are made the same by making the height of the second column spacer larger than the height of the second column spacer or removing some or all of the protective layer or color filter layer under the second column spacer.

Also, in the present invention, the cell gaps of the display area and the dummy area are made the same by adjusting the heights of the first column spacer and the second column spacer and at the same time removing some or all of the protective layer or color filter layer under the second column spacer. You may.

In addition, the present invention provides a liquid crystal display device having R, G, B, and W pixels. At this time, the W pixel is formed with a transparent insulating layer corresponding to the color filter layers of the R, G, and B pixels to transmit the light supplied from the light supply means as it is, thereby improving the luminance of the liquid crystal display device. In the liquid crystal display device having this structure, the transparent insulating layer may be formed of the same material as the first column spacer and the second column spacer by one process.

In the present invention, since the color filter layer is disposed on the first substrate on which the thin film transistor is disposed, it is possible to simplify the manufacturing process and reduce the manufacturing cost.

In addition, in the present invention, since the black matrix as well as the color filter layer are disposed on the first substrate, precise alignment of the first and second substrates is not required, thereby simplifying the manufacturing process.

Furthermore, in the present invention, since the transparent insulating layer of the W pixel is formed simultaneously with the first column spacer of the display area and the second column spacer of the dummy area, the manufacturing process can be further simplified and the manufacturing cost can be reduced. In addition, in the present invention, part or all of the thickness of the protective layer under the second column spacer of the dummy region and part or all of the color filter are etched to reduce the thickness of the color filter layer in the display region to increase the cell gap in the display region and the dummy region. It is possible to effectively prevent a difference from occurring.

1A and 1B are views showing the structure of a conventional liquid crystal display device.
2 is a plan view showing the structure of a liquid crystal display device according to a first embodiment of the present invention.
3 is a cross-sectional view showing a structure of a liquid crystal display device according to a first embodiment of the present invention.
4A to 4C are cross-sectional views showing the structure of a liquid crystal display device according to a second embodiment of the present invention.
5A and 5B are views showing the structure of a liquid crystal display device according to a third embodiment of the present invention.
6A to 6E are views showing a method of manufacturing a liquid crystal display device according to the present invention.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

2 is a plan view showing the structure of the liquid crystal display device according to the first embodiment of the present invention. At this time, although the drawing shows an in-plane switching mode liquid crystal display device as an example, the present invention is not applied only to the transverse electric field mode, but a TN (Twisted Nematic) mode, VA (Vertical Alignment) mode, FFS ( Fringe Field Switching) mode liquid crystal display device may also be applied. Although a plurality of pixels are actually disposed in the liquid crystal display, only one pixel is illustrated in the drawings for convenience of description.

The term 'pixel' described in the following description means a unit pixel that implements red, blue, and green colors, respectively. Although these red, blue, and green pixels constitute one pixel to display the color desired by the pixel, 'pixel' or 'pixel' is used as a unit pixel that implements a single color. Accordingly, the term 'pixel' described in the following description will also include the general meaning of 'pixel' unless otherwise indicated.

As shown in FIG. 2 , in the liquid crystal display according to the present invention, a plurality of pixels defined by a plurality of gate lines 103 and a data line 104 are disposed. In this case, the pixel is composed of R, G, and B pixels, and a desired color image can be realized by the R, G, and B pixels.

The thin film transistor 110 is disposed at the intersection of the gate line 103 and the data line 104 of each pixel. The thin film transistor 110 is connected to the gate line 103 and receives a gate electrode 111 to which a scan signal is applied from the gate line 103 , and is disposed on the gate electrode 111 to scan the gate electrode 111 . A semiconductor layer 112 that is activated as a signal is applied to form a channel, and an image signal that is disposed on the semiconductor layer 112 and is input through the data line 104 as the semiconductor layer 112 is activated is converted into a pixel. It consists of a source electrode 113 and a drain electrode 114 that pass into the inside.

In each pixel, at least a pair of common electrode 105 and pixel electrode 107 are disposed parallel to each other. A common signal is applied to the common electrode 105 from the outside through a common line 116 , and to the pixel electrode 107 , the data line 104 through the thin film transistor 110 and the pixel electrode line 118 through the image A signal is applied. At this time, since a potential difference exists between the common signal and the image signal, an electric field is generated between the common electrode 105 and the pixel electrode 107 due to the potential difference.

As shown in the drawing, the common electrode 105 and the pixel electrode 107 are bent a plurality of times and arranged in a zigzag shape, so that one pixel is divided into a plurality of regions in which the directions of electric fields are opposite to each other, so that the liquid crystal display device It is possible to compensate for the viewing angle characteristic of However, in the present invention, the common electrode 105 and the pixel electrode 107 may be arranged in a straight line parallel to the data line 104 or a straight line having a predetermined angle with the data line 104 .

Although not shown in the drawings, R, G, and B color filter layers are respectively formed in the R, G, and B pixels, and a color image is displayed on the pixels by controlling the transmittance of light passing through the R, G, and B pixels by an image signal. do.

In addition, a first column spacer 119a is disposed in the R, G, and B pixels. In order to maintain a constant cell gap of the liquid crystal display of the first column spacer 119a, the first column spacer 119a of various shapes may be used, but in the present invention, it is preferable to use a column spacer having a columnar shape. do. In the drawings, the cross section of the columnar first column spacer 119a is circular, but a polygonal cross-section such as a quadrangle or a triangle is possible.

In the drawing, the first column spacer 119a is disposed in the R pixel, but may be disposed in the G pixel or the B pixel. Also, the first column spacer 119a may be disposed in two of the R, G, and B pixels and in all of the R, G, and B pixels.

In addition, the first column spacer 119a may be disposed in all pixels, and one of the first column spacers 119a may be disposed in the extension direction of the gate line 103 (ie, the horizontal direction) and the extension direction of the data line 104 (ie, the vertical direction). Alternatively, the plurality of pixels may be arranged at regular intervals with an interval therebetween.

The first column spacer 119a may be formed anywhere in the pixel, but as shown in the figure, it is disposed on the gate line 103, which is an area where no image is displayed, due to the arrangement of the first column spacer 119a. It is preferable because it is possible to prevent deterioration of luminance or image quality. From this point of view, the first column spacer 119a may be disposed on the data line 104 on which no image is displayed, at the intersection of the gate line 103 and the data line 104 , and on the thin film transistor 110 .

3 is a cross-sectional view showing the structure of the liquid crystal display according to the first embodiment, and the present invention will be described in more detail with reference to this. In this case, for convenience of explanation, only the R pixel and the dummy area of the display area are illustrated in the drawings.

As shown in FIG. 3 , the thin film transistor 110 is disposed on the first substrate 120 of each pixel of the liquid crystal display device. The thin film transistor 110 includes a gate electrode 111 disposed on a first substrate 120 made of a transparent material such as glass or plastic, and stacked over the entire first substrate 120 on which the gate electrode 111 is disposed. a gate insulating layer 122 , a semiconductor layer 112 disposed on the gate insulating layer 122 , and a source electrode 113 and a drain electrode 114 disposed on the semiconductor layer 112 .

Although not shown in the drawing, a plurality of gate lines electrically connected to the gate electrode 111 are disposed on the first substrate 120 . The gate line may be formed by a process separate from the gate electrode 111, but is preferably formed by the same process. In addition, although not shown in the drawing, a plurality of data lines are disposed on the gate insulating layer 122 . In this case, the data line may be formed by the same process as the source electrode 113 and the drain electrode 114 or may be formed by a different process.

An interlayer insulating layer 124 is laminated on the first substrate 120 on which the thin film transistor 110 is formed. In this case, an inorganic insulating material such as SiOx or SiNx or an organic insulating material such as photoacrylic may be used as the interlayer insulating layer 124 .

A color filter layer is disposed on the interlayer insulating layer 124 of the pixel of the first substrate 120 . As described above, since the liquid crystal display device of the present invention includes R, G, and B pixels, a corresponding color filter layer is disposed in each pixel. That is, the R-color filter layer 126r is disposed on the R pixel, the G-color filter layer (not shown) is disposed on the G-pixel, and the B-color filter layer 126b is disposed on the B pixel.

The color filter layer is formed by laminating a pigment or dye on the first substrate 120 by a dyeing method, a dispersion method, an electrodeposition method, or a printing method. A pigment or dye is laminated and patterned to form an R color filter layer 126r in the R pixel, and then a blue pigment or dye is laminated over the entire first substrate 120 on which the R color filter layer 126r is formed. Then, the B color filter layer 126b is formed in the B pixel by patterning. Thereafter, a green pigment or dye is stacked over the entire first substrate 120 on which the R color filter layer 126r and the B color filter layer 126b are formed, and then patterned to form a G color filter layer in the G pixel. do.

When the R, G, and B color filter layers are formed in the corresponding pixel, the R, G, and B color filter layers are laminated not only on the corresponding pixel but also around the corresponding pixel, so that the region between the R, G, and B pixels (that is, the gate line and The data line forming region) and the thin film transistor 110 are disposed overlapping two color filter layers. For example, an R color filter layer 126r and a B color filter layer 126b are stacked on the region between the R pixel and the B pixel and on the thin film transistor 110 , and the region between the G pixel and the B pixel and the thin film transistor 110 . A G color filter layer and a B color filter layer 126b are stacked on them, and an R color filter layer 126r and a G color filter layer are stacked on the region between the R pixels and the G pixels and on the thin film transistor 110 . That is, between two adjacent pixels, the corresponding color filter layers are stacked with two overlapping layers.

In addition, a stacked structure of the same color filter layer may be disposed in all pixels and the regions between the pixels. For example, the stacked structure of the R color filter layer 126r and the B color filter layer 126b is disposed not only in the region between the R pixel and the B pixel, but also in the region between the R pixel and the G pixel and between the B pixel and the G pixel. can be

A gate insulating layer 122 , an interlayer insulating layer 124 , and two color filter layers are disposed on the first substrate 120 in the dummy region. In this case, in the dummy region, two color filter layers may be formed in various types of stacked structures. That is, the color filter layer of the dummy region has a stacked structure of the R color filter layer 126r and the B color filter layer 126b, the R color filter layer 126r and the G color filter layer, the G color filter layer and the B color filter layer 126b, if necessary. It may be formed in a laminated structure of

In addition, a single color filter layer may be disposed in the dummy area. In this case, when the color filter layer in the dummy area is stacked thicker than the specific color filter layer to be stacked in the pixel area and then another color filter layer is stacked in the pixel area, the corresponding color filter layer is not stacked in the dummy area.

A protective layer 128 is formed on the first substrate 120 in the display area and the dummy area. The protective layer 128 may be formed of an inorganic insulating material, but by forming it with an organic insulating material, the surface can be planarized. In addition, although the protective layer 128 is made of a single layer in the drawings, the protective layer 128 may be formed as a double layer of two or more layers. In this case, the protective layer 128 is composed of an organic insulating layer/inorganic insulating layer or an inorganic insulating layer/organic insulating layer/inorganic insulating layer, so that the interface characteristics with other layers can be improved and the layer can be planarized. .

At least a pair of a common electrode 105 and a pixel electrode 107 are disposed on the protective layer 128 of the display area. At this time, the common electrode 105 and the pixel electrode 107 are arranged parallel to each other in a band shape of a certain width, and as an image signal is applied to the pixel electrode 107 and the common signal is applied to the common electrode 105 , An electric field substantially parallel to the surface of the first substrate 120 is formed. Although not shown in the drawings, a contact hole is formed in the protective layer 128 so that the pixel electrode 107 is electrically connected to the drain electrode 114 of the thin film transistor 110 through the contact hole.

In addition, the first column spacer 119a is disposed on the pixel-to-pixel region or on the upper portion of the thin film transistor of the display region, and the second column spacer 119b is disposed on the protective layer 128 on the color filter layer of the dummy region. The first column spacer 119a and the second column spacer 119b are for maintaining a constant cell gap of the liquid crystal display device, and may be formed of an organic material or a photosensitive organic material.

The second substrate 130 is bonded to the first substrate 120 with the first column spacer 119a and the second column spacer 119b therebetween. In this case, the liquid crystal layer 140 is disposed between the first substrate 120 and the second substrate 130 . Although not shown in the drawings, a real material is applied to the outer region of at least one of the first and second substrates 120 and 130 to bond the first and second substrates 120 and 130 together. At the same time, it is possible to seal the liquid crystal layer 140 therebetween.

Meanwhile, although not shown in the drawings, a black matrix may be disposed on the second substrate 130 . The black matrix is to prevent light leakage to an area where an actual image is not realized, resulting in image quality deterioration, and may be disposed between a pixel and a thin film transistor formation area.

Also, the black matrix may be formed on the first substrate 210 . In this case, the black matrix may be formed of a metal oxide such as CrO or CrOx or a black resin. In this case, a black matrix is disposed on the first substrate 120 , and after a buffer layer covering the black matrix is formed, a thin film transistor or the like is formed on the buffer layer.

As such, when the black matrix is formed on the first substrate 120 , no components of the liquid crystal display such as a black matrix or a color filter layer are formed on the second substrate 130 , so the first substrate 110 and When bonding the second substrate 130, precise alignment is not required. Accordingly, since an expensive substrate alignment device is not required, it is possible to simplify the manufacturing cost and manufacturing process.

Meanwhile, in the present invention, it is possible to block light transmitted by the stacked color filter layers without forming a black matrix. In the present invention, two color filter layers are stacked between the pixels and on the thin film transistor, and the layered color filter layers make it impossible to transmit visible light, so that it is possible to block light transmission. Accordingly, by forming the color filter layer stacked in two layers to completely cover the area where no image is realized, that is, between the pixels and the upper part of the thin film transistor, the color filter layer can serve as a black matrix. In this case, since there is no need for a separate black matrix, it is possible to reduce the manufacturing cost and shorten the manufacturing process.

Meanwhile, the first column spacer 119a and the second column spacer 119b respectively disposed in the display area and the dummy area are formed to have different heights. In particular, in the present invention, the height t1 of the first column spacer 119a is made larger than the height t2 of the first column spacer 119b (t1 > t2), for the following reasons.

As shown in the drawing, the pixel-to-pixel region, for example, the first column spacer 119a disposed on the thin film transistor 110 is disposed on the two overlapping color filter layers 126r and 126b.

However, a step S is generated in the lower R color filter layer 126r among the two color filter layers, and the upper B color filter layer 126b overlaps the R color filter layer 126r, and the R color filter layer 126r. Since it is formed to cover the step S of will flow down to the bottom. Accordingly, the upper B color filter layer 126b has a smaller thickness than the lower R color filter layer 126r.

On the other hand, the second column spacer 119b of the dummy area is also disposed on the second color filter layer, for example, the R color filter layer 126r and the B color filter layer 126b. However, since the two color filter layers 126r and 126b disposed in the dummy region are formed to have the same width, there is no step difference. will not flow out.

As described above, when the color filter layers 126r and 126b of the display area are formed, the pigment or dye flows down due to the step difference, whereas when the color filter layers 126r and 126b of the dummy area are formed, the step does not occur. will not flow out. Accordingly, the thickness a2 of the color filter layers 126r and 126b of the dummy area is greater than the thickness a1 of the color filter layers 126r and 126b of the display area (a1 < a2). In this case, when the first column spacer 119a and the second column spacer 119b are formed to have the same height (t1 = t2), the liquid crystal produced due to the thickness difference between the color filter layers 126r and 126b in the display area and the dummy area The cell gaps of the display area and the dummy area of the display device are different, and such a cell gap difference causes the image quality of the liquid crystal display device to deteriorate.

In the present invention, by varying the heights of the first column spacer 119a and the second column spacer 119b respectively disposed in the display area and the dummy area (t1 > t2), the cell gaps of the display area and the dummy area are made the same. . That is, in the present invention, the sum (a1+t1) of the thickness (a1) of the color filter layer of the display area and the height (t1) of the first column spacer 119a is calculated as the thickness (a2) of the color filter layer of the dummy area and the first column By always maintaining the same sum (a2+t2) of the heights (t2) of the spacers 119a (a1+t1=a2+t2), the cell gaps of the display area and the dummy area are kept the same, and as a result, the cell gap difference Defects caused by this can be prevented.

Meanwhile, in the drawings, the overlapping color filter layer 126r and 126b structure is a structure stacked on the pixel-to-pixel region or on the thin film transistor 110, but the structure is not limited thereto. In the drawings, the color filter layers 126r and 126b are stacked on the pixel-to-pixel area or on the thin film transistor 110 because the color filter layers 126r and 126b are stacked in the dummy area. That is, the height of the first column spacer 119a and the second column spacer 119b may be adjusted or This is to easily control the thickness of the color filter layer.

Accordingly, for example, when the G-color filter layer and the B-color filter layer are stacked on the dummy region and the first column spacer 119a is disposed on the thin film transistor of the R pixel or the region between the R pixel and the B pixel, the first In order to make the stacked structure of the color filter layer under the column spacer 119a and the second column spacer 119b the same, the R color filter layer and the B color filter layer are stacked on the thin film transistor of the R pixel or the region between the R pixel and the B pixel. Instead, the G color filter layer and the B color filter layer are stacked.

As described above, in the present invention, the color filter layer stacked on the pixel-to-pixel area or on the thin film transistor of the pixel varies depending on the color filter layer stacked on the dummy area regardless of the color filter layer of the adjacent pixel.

4A-4C are diagrams showing the structure of a liquid crystal display device according to a second embodiment of the present invention. At this time, since the structure of FIGS. 4A-4C is the same as that of FIG. 3 except for the structure of the dummy region, the description of the same structure will be simplified and only other structures will be described in detail.

As shown in FIG. 4A , in the liquid crystal display of this embodiment, a thin film transistor is disposed in each pixel of the display area of the first substrate 220, and a color filter layer of a corresponding color is stacked on the thin film transistor. At this time, since the R pixel, the G pixel, and the B pixel are alternately arranged in the pixel, the corresponding color filter layers are also alternately arranged. Two color filter layers of adjacent pixels are stacked in a pixel-to-pixel region. That is, the R color filter layer 226r and the B color filter layer 226b are stacked in the region between the R pixel and the B pixel, and the G color filter layer (not shown) and the B color filter layer in the region between the G pixel and the B pixel. 226b is stacked. In addition, a G color filter layer and an R color filter layer 226r are stacked in a region between the G pixel and the R pixel.

The two-layered color filter layer stacked in the pixel-to-pixel region may vary depending on the arrangement of the pixels.

Two color filter layers are also disposed in the dummy area of the first substrate 220 . For example, an R color filter layer 226r and a B color filter layer 226b may be stacked on the dummy area, and a B color filter layer 226b and a G color filter layer (not shown) may be stacked. In addition, a G color filter layer and an R color filter layer 226r may be stacked on the dummy region. The color filter layer of the dummy area may be formed by the same process as the color filter layer of the display area. A method of forming the color filter layer of the display area and the dummy area will be briefly described as follows.

For example, after stacking and patterning a red pigment or dye over the entire display area and the dummy area to form the R color filter layer 226r in the R pixel and a part of the dummy area, a blue pigment is again applied over the entire display area and the dummy area Alternatively, the B color filter layer 226b is formed on the B pixel and the R color filter layer 226r of the dummy region by laminating and patterning a dye. Then, a G color filter layer is formed in the G pixel of the display area by laminating and patterning the green pigment or dye in the entire display area and the dummy area or only in the display area. As described above, in the present invention, when the color filter layers of two adjacent pixels are formed, two color filter layers are also stacked on the dummy area, and the other color filter layer is formed only on the corresponding pixel without stacking on the dummy area. In this case, only two color filter layers can be formed.

In addition, a stacked structure of the same color filter layer may be disposed in all pixels and the regions between the pixels. For example, the stacked structure of the R color filter layer 226r and the B color filter layer 226b is disposed not only in the region between the R pixel and the B pixel, but also in the region between the R pixel and the G pixel and between the B pixel and the G pixel. can be

In addition, a single color filter layer may be disposed in the dummy area. That is, when stacking the color filter layer in the dummy region thicker than the specific color filter layer in the pixel region in this case on the dummy region and then stacking another color filter layer in the pixel region, do not stack the corresponding color filter layer in the dummy region. does not

A protective layer 228 is stacked on the display area and the dummy area. In this case, the passivation layer 228 is entirely stacked on the display area, but may be formed only on the entire area or a partial area (eg, on the color filter layer 226b) in the dummy area.

The first column spacer 219a is disposed on the pixel-to-pixel region or on the thin film transistor 210 , and the second column spacer 219b is disposed on the color filter layers 226r and 226b of the dummy region. At this time, the passivation layer 228 under the second column spacer 219b is etched so that the second column spacer 219b is disposed in the region where the passivation layer 228 is removed. Hereinafter, the second column spacer 219b ) is disposed in the region where the protective layer 228 has been removed.

As mentioned in the description of the first embodiment, when a color filter layer is stacked on a pixel in the display area, two color filter layers 226r and 226b are stacked on an area between adjacent pixels, in which case the lower color filter layers 226r and 226b are stacked. Due to the step difference of the filter layer (for example, the R color filter layer 226r), the pigment or dye of the upper color filter layer (for example, the B color filter layer 226b) flows down, and the thickness of the upper color filter layer is reduced than the set thickness. . On the other hand, when the color filter layer is stacked on the dummy region, there is no step difference in the lower color filter layer (for example, the R color filter layer 226r), so the upper color filter layer (for example, the B color filter layer 226b) The thickness reduction due to the dripping of pigments or dyes does not occur during lamination.

Accordingly, when the first column spacer 219a and the second column spacer 219b have the same height (t1 = t2), a difference occurs in the cell gaps of the display area and the dummy area. Due to the cell gap difference, the liquid crystal display device will cause picture quality degradation.

In this embodiment, the protective layer 228 on which the second column spacer 219b is disposed is removed so that the cell gaps of the display area and the dummy area are the same. In other words, by forming the first column spacer 219a and the second column spacer 219b at the same height and removing the protective layer 228 under the second column spacer 219b, the color of the display area and the dummy area By compensating for the height difference of the filter layer, it is possible to maintain a constant cell gap of the entire liquid crystal display device.

As such, the reason for maintaining the cell gap constant by removing the protective layer 228 under the second column spacer 219b is that the first column spacer 219a and the second column spacer 219a and the second column spacer ( 219b) is difficult to form. The height difference between the color filter layer in the display area and the dummy area caused by the flow of the pigment or dye due to the step difference is about several μm. Meanwhile, in order to form the first column spacer 219a and the second column spacer 219b having different heights, an organic material must be laminated and an exposure method using a halftone mask must be used. However, when the first column spacers 219a and the second column spacers 219b having different heights are formed in one process by the exposure method using the halftone mask, the first column spacers 219a and 219b are formed due to the limitation of the process. It is difficult to make the difference in height between the 219a and the second column spacer 219b several mu m.

Of course, when the first column spacer 219a and the second column spacer 219b are formed in a separate process by two exposure processes, the first column spacer 219a and the second column spacer have a height difference of several μm. (219b) can be formed, but in this case, there is a problem in that the manufacturing process becomes complicated and the manufacturing cost increases.

In this embodiment, the height difference between the first column spacer 219a and the second column spacer 219b is equalized and the protective layer 228 under the second column spacer 219b is removed to remove the cell gap between the display area and the dummy area. In the same way, since the passivation layer 228 is etched by an exposure method using a general exposure mask rather than an exposure method using a halftone mask, the passivation layer 228 having a thickness of several μm can be etched.

On the other hand, in this embodiment, the height of the first column spacer 219a and the second column spacer 219b are different, and at the same time, the protective layer 228 under the second column spacer 219b is removed to reduce the thickness of the liquid crystal display device. It is possible to keep the entire cell gap constant. In this way, not only the height difference between the first column spacer 219a and the second column spacer 219b is adjusted or only the protective layer 228 under the second column spacer 219b is removed, but the first column spacer 219a The color filter layer in the pixel-to-pixel area of the display area and the color filter layer in the dummy area by removing the protective layer 228 under the second column spacer 219b while adjusting the height difference between the second column spacer 219b and the second column spacer 219b. It is possible to compensate for various height differences that occur between them.

In the structure shown in FIG. 4B , the passivation layer 228 under the second column spacer 219b of the dummy area is not entirely removed, but only a portion thereof is removed. In this structure, only a portion of the passivation layer 228 is removed according to the height difference between the first column spacer 219a and the second column spacer 219b, so that the cell gap of the liquid crystal display device can be constantly maintained.

Also, in this structure, the first column spacer 219a and the second column spacer 219b are formed at different heights and a part of the protective layer 228 under the second column spacer 219b is removed to maintain a constant cell gap. may be

In the structure of FIG. 4C , part or all of the color filter layer under the second column spacer 219b of the dummy region is etched instead of part or all of the protective layer 228 of the dummy region to etch the display region of the liquid crystal display device. and a constant cell gap in the dummy region. For example, by etching the upper or lower color filter layer of the dummy area by a thickness corresponding to a thickness reduction value caused by the flow of pigment or dye in the display area, the cell gap of the display area and the dummy area of the liquid crystal display is uniformly be able to do In addition, the first column spacer 219a and the second column spacer 219b are formed at different heights, and the color filter layer under the second column spacer 219b, for example, the R color filter layer 226r and/or the B color filter layer. Part or all of 226b may be removed to maintain a constant cell gap.

5 is a cross-sectional view showing the structure of a liquid crystal display device according to a third embodiment of the present invention. FIG. 5A is a plan view and FIG. 5B is a cross-sectional view.

As shown in Fig. 5A, the liquid crystal display device of this embodiment is composed of R (Red), G (Green), B (Blue), and W (White) pixels. As described above, the provision of the W pixel in the liquid crystal display device is to improve the luminance of the liquid crystal display device. In general, a liquid crystal display device includes a color filter layer to realize color, and the color filter layer transmits only light in a frequency band corresponding to the color and absorbs light in other frequency bands. Accordingly, most of the light emitted from the backlight of the liquid crystal display device and passing through the color filter layer is absorbed by the color filter layer and only a part of the light is transmitted, so that the luminance of the liquid crystal display device is lowered. In this embodiment, by providing the W pixel, it is possible to significantly increase the luminance of the liquid crystal display device by transmitting all the white light supplied from the backlight.

As shown in the drawing, the W pixel has the same structure as the R, G, and B pixels. That is, the thin film transistor 310 is disposed in each of the R, G, B, and W pixels. The thin film transistor 310 is connected to the gate line 303 and receives a gate electrode 311 to which a scan signal is applied from the gate line 303 , and is disposed on the gate electrode 311 to scan the gate electrode 311 . A semiconductor layer 312 that is activated as a signal is applied to form a channel, and an image signal that is disposed on the semiconductor layer 312 and is input through the data line 304 as the semiconductor layer 112 is activated is converted into a pixel. It consists of a source electrode 313 and a drain electrode 314 which are transferred into the inside.

At least a pair of a common electrode 305 and a pixel electrode 307 are disposed parallel to each other in each of the R, G, B, and W pixels. A common signal is applied to the common electrode 305 from the outside through a common line 316 , and a data line 304 through a thin film transistor 310 through a pixel electrode line 318 to the pixel electrode 307 . A signal is applied. At this time, since a potential difference exists between the common signal and the image signal, an electric field is generated between the common electrode 305 and the pixel electrode 307 due to the potential difference.

The common electrode 305 and the pixel electrode 307 are bent a plurality of times to be arranged in a zigzag shape, but the common electrode 305 and the pixel electrode 307 are a straight line or a data line 304 parallel to the data line 104 . ) and may be arranged in a straight line having a certain angle.

Although not shown in the drawings, R, G, and B color filter layers are respectively formed in the R, G, and B pixels, and a color image is displayed on the pixels by controlling the transmittance of light passing through the R, G, and B pixels by an image signal. and a transparent insulating layer such as a transparent resin is formed in the W pixel.

In addition, a first column spacer 319a is disposed in the pixel including the R, G, B, and W pixels. In order to maintain a constant cell gap of the liquid crystal display of the first column spacer 319a, the first column spacer 319a having various shapes may be used.

In the drawing, the first column spacer 319a is disposed in the R pixel, but may be disposed in the G pixel, the B pixel, or the W pixel. Also, the first column spacer 119a may be disposed in two of the R, G, B, and W pixels and in all of the R, G, B, and W pixels.

In addition, the first column spacer 319a may be disposed in all pixels, and one of the first column spacers 319a may be disposed in the extending direction (ie, horizontal direction) of the gate line 303 and in the extending direction (ie, vertical direction) of the data line 304 . Alternatively, the plurality of pixels may be arranged at regular intervals with an interval therebetween.

The first column spacer 319a may be formed anywhere in the pixel, but as shown in the figure, it is the luminance due to the arrangement of the first column spacer 319a that is disposed above the gate line 303, which is an area where an image is not displayed. It is preferable because it is possible to prevent deterioration or image quality deterioration. In this regard, the first column spacer 119a may be disposed on the data line 304 on which no image is displayed, on the intersection of the gate line 303 and the data line 304 , and on the thin film transistor 310 .

5B is a cross-sectional view of FIG. 5A and shows the structure of a liquid crystal display including R, G, B, and W pixels, but the structure of the R pixel is the same as that of the G pixel and the B sub-pixel except for the color filter layer. , only the R pixel, the W pixel, and the dummy area are illustrated in the drawings for convenience of explanation.

As shown in FIG. 5B , gate lines 303 are respectively disposed in the regions between the pixels of the first substrate 320 . In addition, a black matrix 302 may be disposed below the gate line 303 . In this case, a buffer layer 321 made of an inorganic insulating material or an organic insulating material may be stacked on the upper surface of the black matrix 302 . Although not shown in the drawing, the black matrix 302 is also disposed below the data line and under the thin film transistor to prevent light from leaking into the corresponding area.

In the drawing, the black matrix 302 is disposed on both sides of the gate line 303 made of an opaque metal to block light from transmitting to the area between the pixels together with the gate line 303, but the black matrix 302 is It may be stacked over the entire area between the pixels and the thin film transistor formation area. The black matrix 302 may be formed of a metal oxide such as CrO or CrOx or a black resin.

Meanwhile, in this embodiment, light transmitted by the stacked color filter layers can be blocked without forming a black matrix. That is, in the present invention, two color filter layers are stacked between a pixel and a pixel and on the thin film transistor, and the stacked color filter layer is partially extended between the pixel and the pixel and the upper part of the thin film transistor as well as the pixel area to be between the pixel and the pixel. By forming it to completely cover the region and the thin film transistor formation region, it is possible to substantially block light transmission into this region.

A gate insulating layer 322 is laminated on the first substrate 320 on which the gate line 303 is formed, and an interlayer insulating layer 324 is laminated thereon. Although not shown in the drawings, thin film transistors are disposed in each of the R, G, B, and W pixels, and an interlayer insulating layer 324 is stacked thereon (refer to the structure of FIG. 3 ). In addition, a data line is disposed on the gate insulating layer 322 .

A color filter layer is disposed in each of the R, G, and B pixels of the display area. That is, the R color filter layer 326r is formed on the R pixel, the B color filter layer 326bg is formed on the B pixel, and the G color filter layer (not shown) is formed on the G pixel. The color filter layer may be formed by laminating and patterning a pigment or dye.

When the R, G, and B color filter layers are formed in the corresponding pixel, the R, G, and B color filter layers are stacked not only on the corresponding pixel but also around the corresponding pixel, so that the region between the R, G, and B pixels and the thin film transistor formation region The two color filter layers are arranged overlapping each other. For example, an R color filter layer 326r and a B color filter layer 326b are stacked on the region between the R pixel and the B pixel and on the thin film transistor, and a G color filter layer on the region between the G pixel and the B pixel and on the thin film transistor and a B color filter layer 326b are stacked, and an R color filter layer 326r and a G color filter layer are stacked on the region between the R pixel and the G pixel and on the thin film transistor. That is, between two adjacent pixels, the corresponding color filter layers are stacked with two overlapping layers.

In addition, a stacked structure of the same color filter layer may be disposed in all pixels and the regions between the pixels. For example, the R color filter layer 326r and the B color filter layer 326b may be overlapped and stacked not only in the region between the R pixel and the B pixel, but also in the region between the R pixel and the G pixel and between the B pixel and the G pixel. can

A gate insulating layer 322 , an interlayer insulating layer 324 , and two color filter layers are disposed on the first substrate 320 in the dummy region. At this time, the color filter layer of the dummy region has a stacked structure of R color filter layer 326r and B color filter layer 326b, a stacked structure of R color filter layer 326r and G color filter layer, G color filter layer and B color filter layer ( 326b), it may be arranged in various two-layer structures.

In addition, a single color filter layer may be disposed in the dummy area. That is, when stacking the color filter layer in the dummy region thicker than the specific color filter layer stacked in the pixel region in this case on the dummy region, and then stacking another color filter layer in the pixel region, do not stack the corresponding color filter layer in the dummy region. does not

A protective layer 328 made of an inorganic insulating material or an organic insulating material is disposed on the first substrate 310 of the display area and the dummy area, and at least a pair of common electrodes 305 and A pixel electrode 307 is disposed.

A transparent insulating layer 327 is stacked on the W pixel of the display area. The transparent insulating layer 327 has a configuration corresponding to the color filter layers of the R, G, and B pixels. In the R, G, and B pixels, monochromatic light of a specific wavelength is transmitted by the color filter layer, whereas the transparent insulating layer 327 is White light supplied from a light supply means such as a backlight is transmitted as it is to increase the luminance of the liquid crystal display device. The transparent insulating layer 327 is formed to have the same thickness as the color filter layer and the protective layer 328 of the R, G, and B pixels, and the common electrode 305 and the pixel electrode 307 of the W pixel are transparent. It is disposed on the insulating layer 327 . Therefore, since the common electrode 305 and the pixel electrode 307 of the R, G, and B pixels are preferably disposed on the same level as the common electrode 305 and the pixel electrode 307 of the W pixel, the transparent insulating layer ( The thickness of 327 is preferably approximately equal to the thickness and sum of the color filter layer and the protective layer 328 .

A first column spacer 319a and a second column spacer 319b are respectively disposed on the protective layer 328 of the display area and the dummy area to maintain a constant cell gap of the liquid crystal display.

The second substrate 330 is bonded to the first substrate 310 with the first column spacer 319a and the second column spacer 319b interposed therebetween. In this case, the liquid crystal layer 340 is disposed between the first substrate 110 and the second substrate 130 . Although not shown in the drawings, a real material is applied to the outer region of at least one of the first substrate 310 and the second substrate 330 to bond the first substrate 310 and the second substrate 330 together. At the same time, it is possible to seal the liquid crystal layer 340 therebetween.

Part or all of the passivation layer 328 under the second column spacer 319b is removed, and the color filter layer ( 326b). In this way, as a part or all of the protective layer 328 under the second column spacer 319b is removed, the thickness of the color filter layer in the display area is caused by the flow of the pigment or dye due to the step generated during the formation of the color filter layer. to prevent a difference in the cell gap between the display area and the dummy area from occurring. In other words, the etched thickness of the protective layer 328 under the second column spacer 319b corresponds to a decrease in the thickness of the color filter layer in the display area due to the flow of the pigment or dye due to the step difference occurring during the formation of the color filter layer. .

In addition, in the present embodiment, some or all of the color filter layers 326b and/or 326r under the second column spacer 319b are removed, and the second column spacer 319b is disposed in the removed region to form a cell gap of the liquid crystal display device. may be kept constant, or the color filter layers 326b and/or 326r and the passivation layer 328 under the second column spacer 319b may be etched to keep the cell gap of the liquid crystal display constant.

In addition, in the present embodiment, all or part of the color filter layers 326b and/or 326r and/or the passivation layer 328 under the second column spacer 319b are etched while simultaneously etching the first column spacer 319a and the second column spacer 319a. By varying the thickness of the column spacer 319b, the cell gap of the liquid crystal display device may be kept constant.

The first column spacer 319a and the second column spacer may be formed by the same process as the transparent insulating layer 327 of the W pixel. Of course, the first column spacer 319a and the second column spacer may be formed by a process separate from the transparent insulating layer 327, but by forming in one process, the manufacturing process is simplified and manufacturing cost is reduced. be able to do

6A to 6E are diagrams illustrating a method of manufacturing a liquid crystal display device according to the present invention. In this case, the manufacturing method shown in the drawings is a manufacturing method of a liquid crystal display device according to the third embodiment of the present invention shown in FIGS. 5A and 5B . In particular, unlike FIGS. 5A and 5B, the drawing shows a structure including a thin film transistor, thereby explaining the overall method of manufacturing the liquid crystal display device.

First, as shown in FIG. 6A , R, G, B, and R of the first substrate 320 are made of a transparent material such as glass or plastic and are composed of a display area including R, G, B, and W pixels and a dummy area. A gate electrode 311 is formed in each W pixel. Although not shown in the drawing, a gate line is formed when the gate electrode 311 is formed. The gate electrode 311 and the gate line are formed by depositing a metal such as Al or an Al alloy on the first substrate 310 by evaporation or sputtering, and then using a photolithography process using a mask. It can be formed by patterning.

Next, the gate insulating layer 322 is formed by laminating SiOx or SiNx over the entire first substrate 320 on which the gate electrode 311 is formed, that is, over the display area and the dummy area by a chemical vapor deposition process (CVD). to form

Thereafter, a semiconductor layer 312 is formed on the gate insulating layer 322 in the R, G, B, and W pixels, and a source electrode 313 and a drain electrode 314 are formed on the semiconductor layer 312 . The semiconductor layer 312 is made of amorphous silicon or crystalline silicon. When an amorphous semiconductor layer is formed, amorphous silicon is laminated by a CVD method and then patterned to form an amorphous silicon layer. After forming, it is formed by crystallizing it or laminating crystalline silicon.

The source electrode 313 and the drain electrode 314 are formed by depositing a metal such as Cr, Mo, Al, or Al alloy by deposition or sputtering and then patterning it by a photo process using a mask. In addition, although not shown in the drawings, a data line is also formed when the source electrode 313 and the drain electrode 314 are formed.

Next, an interlayer insulating layer 324 is formed on the first substrate 320 on which the thin film transistor is formed. The interlayer insulating layer 324 may be formed by laminating an inorganic insulating material such as SiOx or SiNx by CVD or coating an organic material.

Thereafter, as shown in FIG. 6B , color filter layers corresponding to the R, G, and B pixels are respectively formed. The color filter layer is formed by laminating a pigment or dye on the first substrate 320 and patterning the layer. That is, a red pigment or dye is applied over the entire first substrate 320 by a method such as a screen printing method or a dripping method, and then patterned by a photo process to form an R color filter layer 326r in the R pixel. After that, a blue pigment or dye is applied again to the first substrate 320 and patterned by a photo process to form a B color filter layer 326b in the B pixel. At this time, the R color filter layer 326r and the B color filter layer 326b are stacked on the gate line and the data line, which are the boundary regions between the R pixel and the B pixel, and on the thin film transistor. When the blue pigment or dye is applied due to the step difference, the blue pigment or dye on the R color filter layer 326r flows down, so that the thickness of the upper B color filter layer 326b is that of the lower R color filter layer 326r. smaller than the thickness.

Next, a green pigment or dye is applied to the first substrate 320 and patterned by a photo process to form a G color filter layer in the G pixel.

Meanwhile, when the color filter layer is formed in the R, G, and B pixels of the display area, the color filter layer is also formed in the dummy area. In the drawing, during the lamination process of the R color filter layer 326r and the B color filter layer 326b in the display area, the R color filter layer 326r and the B color filter layer 326b are stacked in the dummy area, but the G color filter layer and the B color filter layer 326b are stacked in the dummy area. The color filter layer 326b may be stacked, or the G color filter layer and the R color filter layer 326r may be stacked.

Next, as shown in FIG. 6C , an organic material such as benzo cyclo-butene (BCB) or photo acryl is laminated over the entire first substrate 320 and then patterned by a photo process to form a display area and a passivation layer 328 is formed on the color filter layer in the dummy region. In this case, the passivation layer 328 of the dummy region may be etched to a predetermined thickness or the entire region may be etched. When the protective layer 328 of the dummy region is etched to a certain thickness, the photo process for forming the protective layer 328 is exposed using a half-tone mask or a diffraction mask. Through the process, it is possible to form the protective layer 328 having different thicknesses (different thicknesses in the display area and the dummy area) by one photo process.

Subsequently, as shown in FIG. 6D , an organic material such as a resin is laminated over the entire first substrate 320 and the organic material laminated by a halftone mask or a diffraction mask is selectively patterned to form pixels and pixels in the display area. A first column spacer 319a and a second column spacer 319b are respectively formed in the etched region of the etched region of the passivation layer 328 and the dummy region in the region or the upper portion of the thin film transistor, and at the same time, a transparent insulating layer 327 is formed in the W pixel. to form

In this way, since the first column spacer 319a and the second column spacer 319b and the transparent insulating layer 327 are simultaneously formed on the W pixel by one process, the manufacturing process can be greatly shortened and the manufacturing cost can be reduced. be able to do

Thereafter, as shown in FIG. 6E , metal such as Al, Al alloy, Cr, Mo, etc. is laminated on the protective layer 328 of the R, G, and B pixels and the transparent insulating layer 327 of the W pixel and etched. Thus, the common electrode 305 and the pixel electrode 307 are formed.

Next, after bonding the second substrate 330 to the first substrate 320 , a liquid crystal layer 340 is formed between the first substrate 310 and the second substrate 330 to complete the liquid crystal display device. At this time, unlike the conventional liquid crystal display device, since a color filter layer or a black matrix is not formed on the second substrate 330, an expensive alignment device for precisely bonding the first substrate 320 and the second substrate 330 together; process is not required.

In addition, the liquid crystal layer may be formed by dropping liquid crystal on the first substrate 320 or the second substrate 330 and bonding the first substrate 320 and the second substrate 330 together. It may be formed by bonding the second substrate 330 and then injecting it therebetween.

As described above, in the present invention, since the color filter layer is disposed on the first substrate on which the thin film transistor is disposed, the color filter layer can be formed using the thin film transistor process line, thereby simplifying the manufacturing process and reducing the manufacturing cost. there will be In addition, in the present invention, not only the color filter layer but also the black matrix is disposed on the first substrate and no configuration is disposed on the second substrate, so precise alignment of the first substrate and the second substrate is not required, thereby simplifying the manufacturing process. do.

Furthermore, in the present invention, since the transparent insulating layer of the W pixel is formed simultaneously with the first column spacer of the display area and the second column spacer of the dummy area, the manufacturing process can be further simplified and the manufacturing cost can be reduced. In addition, in the present invention, part or all of the thickness of the protective layer under the second column spacer of the dummy region and part or all of the color filter are etched to reduce the thickness of the color filter layer in the display region to increase the cell gap in the display region and the dummy region. It is possible to effectively prevent a difference from occurring.

In addition, although the above detailed description does not specifically describe the structure of the present invention, the present invention is not limited only to this specific structure. Since the most important object of the present invention is to maintain a constant cell gap between the display area and the dummy area, if this object can be achieved, the heights of the first column spacer and the second column spacer and the dummy in which the second column spacer is disposed The thickness of the protective layer and the color filter layer in the region may be set in various ways.

Substrate: 110,30 Gate line: 103
Data line: 104 Column spacer: 119a, 119b
Gate insulating layer: 122 Interlayer insulating layer: 124
Color filter layer: 126r, 126b protective layer: 128

Claims (15)

a first substrate comprising a display area including a plurality of R, G, and B pixels and a dummy area;
a color filter layer and a protective layer stacked on the first substrate;
a first column spacer disposed on the protective layer of the display area;
a second column spacer disposed on the passivation layer of the dummy region; and
a second substrate bonded to the first substrate;
Part or all of the thickness of the central region of at least one of the protective layer and the color filter layer of the dummy region is removed, and the second column spacer is inserted into the removed central region so that the cell gaps of the display region and the dummy region are the same. liquid crystal display device. The method of claim 1,
The first column spacer is disposed on the color filter layer having the same stacked structure as the second color filter layer stacked on the dummy region. The liquid crystal display device of claim 1 , wherein the height of the first column spacer and the second column spacer are the same. The liquid crystal display of claim 1 , wherein the heights of the first column spacer and the second column spacer are different. The liquid crystal display of claim 4 , wherein a height of the first column spacer is greater than a height of the second column spacer. The liquid crystal display device of claim 1 , further comprising a black matrix disposed on the first substrate. The method of claim 1, wherein two color filter layers among R, G, and B color filters corresponding to adjacent pixels are stacked in a boundary region between the R, G, and B pixels, and the R, G, A liquid crystal display device in which two color filter layers among B color filters are stacked. 8. The method of claim 7,
An upper color filter layer among the two color filter layers stacked on the boundary region has a thickness smaller than a thickness of an upper color filter layer among the two color filter layers stacked on the dummy region. The liquid crystal display device of claim 1 , wherein the display area includes a W pixel. The liquid crystal display device of claim 9 , further comprising a transparent insulating layer disposed on the W pixel to transmit white light. The liquid crystal display device of claim 10 , wherein the transparent insulating layer is simultaneously formed of the same material as the first column spacer and the second column spacer. a first substrate and a second substrate including a display area and a dummy area;
a first color filter layer disposed on pixels of the display area of the first substrate; and
a second color filter layer disposed in each of the pixels of the display area and the area between the pixels and the dummy area;
a protective layer laminated on the display area and the dummy area;
and a first column spacer and a second column spacer respectively disposed in the display area and the dummy area,
At least a portion of the thickness of the central portion of the protective layer is removed and the second column spacer is inserted and fixed,
A thickness of the first color filter layer of the display area is smaller than a thickness of the second color filter layer of the dummy area, and a cell gap of the display area and the dummy area is the same. The liquid crystal display device of claim 10 , wherein the second column spacer has a height greater than that of the first column spacer so that the cell gaps of the display area and the dummy area are the same. 14. The liquid crystal display device of claim 12 or 13, wherein at least a portion of the second color filter layer under the second column spacer is removed so that the cell gaps of the display area and the dummy area are the same. delete

Images