KR20120134352A - Showerhead module of atomic layer deposition apparatus - Google Patents

Abstract

PURPOSE: A shower head module of an atomic layer deposition device is provided to prevent damage to a ceramic isolator by preventing arc discharge in a shower head generating plasma. CONSTITUTION: A plasma electrode(131) makes reactance gas(S2) into plasma. A spray plate(132) is arranged in parallel with the plasma electrode. The spray plate forms a plasma generating space in the inside. An isolator electrically insulates the plasma electrode and the spray plate. A buffer member(135) is formed on the isolator and a combination of a shower head frame.

Description

Showerhead Module for 8th Quarter of Atomic Layer Deposition Equipment {SHOWERHEAD MODULE OF ATOMIC LAYER DEPOSITION APPARATUS}

The present invention is to provide a showerhead module for injecting the deposition gas into the eight quarter in a semi-batch type atomic layer deposition apparatus for forming a thin film on a plurality of substrates at the same time.

In general, a method of depositing a thin film having a predetermined thickness on a substrate such as a semiconductor substrate or glass includes physical vapor deposition (PVD) using physical collision, such as sputtering, and chemical reaction using a chemical reaction. Chemical vapor deposition (CVD) and the like. Recently, as the design rules of semiconductor devices are drastically fined, thin films of fine patterns are required, and the step height of regions where thin films are formed is also very large. Due to this trend, the use of atomic layer deposition (ALD), which is capable of forming a very uniform pattern of atomic layer thickness very uniformly and has excellent step coverage, has been increasing.

ALD is similar to the general chemical vapor deposition method in that it uses chemical reactions between gas molecules. However, in contrast to conventional CVD in which multiple gas molecules are simultaneously injected into a chamber to deposit the reaction product generated on the substrate, ALD injects a gas containing one source material into the chamber to chemisorb the heated substrate. There is a difference in that a product by chemical reaction between the source materials is deposited on the substrate surface by injecting a gas containing another source material into the chamber. Such ALD has a high step coverage property and has the advantage of being capable of depositing a pure thin film having a low impurity content.

A semi-batch type atomic layer deposition apparatus is disclosed in which a deposition process is simultaneously performed on a plurality of substrates in order to improve throughput in an atomic layer deposition apparatus. In general, the semi-batch type atomic layer deposition apparatus has a region in which different kinds of deposition gases are injected, and a substrate is sequentially passed through each region in which deposition gases are sprayed as the gas injection unit or susceptor rotates at high speed. As a result, chemical reactions of the deposition gases occur on the substrate surface to deposit the reaction products.

According to embodiments of the present invention to provide an atomic layer deposition apparatus capable of improving throughput and increasing the deposition rate.

In the semi-batch atomic layer deposition apparatus according to the embodiments of the present invention described above, the showerhead module having a plurality of showerheads is a plasma electrode serving as a plasma for reacting a reactant gas, and disposed in parallel with the plasma electrode. An injection plate for forming a plasma generating space in the substrate and providing a plasmaized reactant gas to the substrate, an isolator formed around the plasma generating space to electrically insulate the plasma electrode from the injection plate, and the isolator and showerhead It is configured to include a buffer member provided in the coupling portion of the frame.

According to one side, the isolator is formed of a ceramic material. The isolator is formed so as to surround the plasma generation space and extends outwardly from an upper end of the vertical part electrically insulating the plasma electrode from the injection plate, and between the frame of the showerhead module and the plasma electrode. And a flange portion interposed therebetween to electrically insulate the frame and the plasma electrode.

According to one side, the buffer member is formed so as to be interposed between the flange portion and the frame of the isolator, the cross-section 'b' shaped so as to surround the lower end and the end of the flange portion which is a portion adjacent to the frame It may be formed in the form. For example, the buffer member may be formed of any one material of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC, and PVDF. The protrusion that separates the end of the flange portion from the buffer member may protrude from a surface of the buffer member which contacts the end of the flange portion. In addition, the buffer member may have a continuous form surrounding the circumference of the isolator. In addition, the isolator may be formed with a stepped portion to which the buffer member is coupled. The shower head may be provided with the buffer member at a position where the plasma electrode, the isolator, and the frame are coupled by the fastening member, and are not restrained by the fastening member between the isolator and the frame.

According to one side, a fastening member support for cushioning may be provided between the fastening member and the plasma electrode. For example, the fastening member support part is formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC, and PVDF, and a band along the upper circumference of the plasma electrode. It may have a form.

According to one side, a bolt washer made of an insulating material may be provided to prevent arc discharge between the plasma electrode and the fastening member. For example, the bolt washer may be formed of any one material of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF.

On the other hand, the showerhead module of the semi-batch atomic layer deposition apparatus for depositing a plurality of substrates simultaneously in accordance with other embodiments of the present invention described above, a pair of first showerhead, reactance gas for providing a precursor gas And a pair of third showerheads providing a pair of second showerheads and a precursor gas and disposed between the first and second showerheads. The second shower head may include a plasma electrode serving as an electrode for converting the reactant gas into a plasma, a spray plate disposed in parallel with the plasma electrode to form a plasma generating space therein and providing a plasmaized reactant gas to a substrate. And an isolator formed around the plasma generation space to electrically insulate the plasma electrode from the spray plate, and a cushioning member provided at a coupling portion of the isolator and the showerhead frame.

According to one side, the buffer member is formed of any one of the material of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF so as to surround the isolator to the Space between the frame and the isolator.

According to one side, a plasma providing unit for applying a plasma to the second shower head may be provided.

As described above, according to embodiments of the present invention, the isolator provided between the plasma electrode and the frame in the showerhead for providing the plasma can be prevented from being damaged due to the difference in thermal expansion between the frame and the isolator at a high temperature. have.

1 is a plan view showing a showerhead module according to an embodiment of the present invention.
FIG. 2 is a plan view of the second showerhead in the showerhead module of FIG. 1.
3 is a cross-sectional view of the second showerhead along line II in the showerhead module of FIG. 1.
4 is an enlarged view illustrating main parts of the second showerhead of FIG. 3.
5 is an enlarged view illustrating main parts of a modified embodiment of FIG. 4.
6 is a cross-sectional perspective view of a buffer member according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited to or limited by the embodiments. In describing the present invention, a detailed description of well-known functions or constructions may be omitted for clarity of the present invention.

Hereinafter, the showerhead module 10 according to an exemplary embodiment of the present invention will be described in detail with reference to FIGS. 1 to 6. For reference, FIG. 1 is a plan view illustrating a showerhead module 10 according to an embodiment of the present invention, and FIG. 2 is a plan view of a second showerhead 13 in the showerhead module 10 of FIG. 1. .

The present embodiments are directed to a showerhead module 10 that provides deposition gas to a substrate in an atomic layer deposition apparatus (ALD). For reference, in the atomic layer deposition apparatus described in the present embodiments, deposition is simultaneously performed on a plurality of substrates in order to improve throughput and quality, and the surface of the substrate is parallel to the showerhead module 10. A semi-batch type in which a predetermined thin film is deposited may be used as it passes through a region in which different kinds of gases injected from the showerhead module 10 are injected while being idle in a supported state. Here, the detailed technical configuration of the process chamber and the susceptor constituting the atomic layer deposition apparatus can be understood from the known technology and are not the gist of the present invention, and thus, detailed descriptions and illustrations will be omitted and only the main components will be briefly described. .

In addition, in this embodiment, the substrate to be deposited may be a silicon wafer. However, the substrate of the present invention is not limited to the silicon wafer, and the substrate may be a transparent substrate including glass used for a flat panel display device such as a liquid crystal display (LCD) and a plasma display panel (PDP). . In addition, the shape and size of the substrate is not limited by the drawings, and may have substantially various shapes and sizes, such as a circle and a rectangle.

In addition, in the present embodiment, the term 'source gas' is a gas containing a source material for depositing a predetermined thin film, and a precursor gas S1 including constituent elements forming the thin film. ) And a reactant gas S2 chemically reacting with the precursor gas S1 to form a thin film according to a predetermined reaction product, and the precursor gas S1 and the reactance gas S2, and the like. It may include a purge gas (P) for removing unreacted gas and residual gas.

Hereinafter, for convenience of explanation, one kind of precursor gas S1 and one kind of reactance gas S2 are provided, and a purge gas P is provided between the precursor gas S1 and the reactance gas S2. An atomic layer deposition apparatus for depositing a thin film by providing an example will be described. However, the present invention is not limited to the above-described embodiment, and the showerhead module 10 may provide at least two or more kinds of precursor gases to deposit a multicomponent thin film including two or more elements.

The showerhead module 10 includes a plurality of showerheads 11, 13, and 15 for injecting respective deposition gases, and exhausts generated inside the process chamber along the boundary of each showerhead 11, 13, and 15. A tower exhaust 17 for discharging the gas is provided.

Hereinafter, for convenience of description, the showerhead provided with the precursor gas S1 in the showerhead module 10 will be referred to as a 'first showerhead 11' and the showerhead provided with the reactance gas S2 will be described. The second showerhead 13 and the showerhead provided with the purge gas P are referred to as the third showerhead 15. In addition, at least one or more showerheads of the first and second showerheads 11 and 13 may have a dual structure so as to alternately provide two or more kinds of deposition gases.

The showerhead module 10 is formed to provide a certain amount of deposition gas for the same time to the revolving substrate. The showerhead module 10 may be formed such that the plurality of showerheads 11, 13, and 15 have the same area so as to provide a uniform amount of deposition gas to the substrate for the same time. For example, the showerhead module 10 includes eight showerheads 11, 13, and 15 having a fan shape divided at the same angle with respect to the center. The showerhead module 10 includes a pair of first showerheads 11 and a pair of second showerheads 13 disposed at regular intervals, and between the first and second showerheads 11 and 13. Two pairs of the third shower head 15 may be arranged alternately. However, the present invention is not limited by the drawings, and the shape and size of the shower heads 11, 13, and 15 may be changed in various ways.

On the other hand, the showerhead module 10 has a structure in which the reactance gas (S2) in the deposition gas to be plasma to provide a substrate to increase the reactivity. In order to make the reactance gas S2 into plasma, the second showerhead 13 has a structure as follows. One side of the second shower head 13 is connected to the plasma providing unit 19 for generating a plasma.

For reference, FIG. 3 is a cross-sectional view of the second showerhead 13 along line II in the showerhead module 10 of FIG. 1, and FIG. 4 is an enlarged view of main parts of the second showerhead 13 of FIG. 3. One drawing. FIG. 5 is a sectional view showing the principal parts of a modified embodiment of the isolator 134 shown in FIG. 4. 6 is a cross-sectional view and a perspective view of the buffer member 135 of FIG. 3.

Referring to FIGS. 3 to 6, the second showerhead 13 receives the reactant gas S2 to generate and provide plasma, and the plasma electrode 131, the injection plate 132, and the isolator 134. And a buffer member 135 is configured.

The plasma electrode 131 provides a space in which the deposition gas is introduced to generate the plasma, and forms an upper portion of the plasma generating space 130. In the present embodiment, the plasma electrode 131 may be formed in a double structure in which a gas inflow buffer space for introducing the reactance gas S2 into the plasma generation space 10 is formed. The injection plate 132 is provided at a lower portion of the plasma electrode 131 in parallel to be spaced apart from each other to form a lower portion of the plasma generation space 130, and the side surface of the plasma generation space 130 is disposed on the isolator 134. Is formed by. The plasma electrode 131, the spray plate 132, and the isolator 134 are coupled to the frame 133 constituting the showerhead module 10.

The plasma electrode 131 and the injection plate 132 are formed of a metal material to serve as an electrode and a ground electrode for plasma generation, and a plurality of injection holes 13a are formed to provide a reactant gas S2. .

The plasma electrode 131, the injection plate 132, and the frame 133 are formed of a metal material such as aluminum, and an isolator 134 is provided to prevent arc discharge when plasma is generated.

The isolator 134 may prevent the plasma electrode 131, the frame 133, and the injection plate 132 formed of a metal material from being electrically connected to each other in order to prevent arc discharge from occurring in the plasma generation space 130. It is formed to be. In addition, the isolator 134 may be formed of a ceramic material that is an insulator in order to prevent the arc discharge from occurring and to electrically insulate it. In detail, the isolator 134 is formed to electrically insulate between the plasma electrode 131 and the frame 133 as well as between the plasma electrode 131 and the injection plate 132. The isolator 134 forms a side surface of the plasma generating space 130 and vertically electrically insulates the plasma electrode 131 from the injection plate 132, and an outer side from an upper portion of the vertical portion 341. And a flange portion 343 interposed between the plasma electrode 131 and the frame 133 to electrically insulate the plasma electrode 131 and the frame 133 from each other. 'Have a shape.

In addition, the isolator 134 has a size and shape that can insulate the plasma electrode 131, the injection plate 132, and the frame 133.

The second shower head 13 is fastened by the fastening member 136 with the isolator 134 interposed between the plasma electrode 131 and the frame 133.

On the other hand, since the metal frame 133 and the ceramic isolator 134 having different thermal expansion coefficients are firmly fastened by the fastening member 136, the isolator 134 is at a high temperature due to a difference in thermal expansion rate. Can be broken. The shock absorbing member 135 is provided between the isolator 134 and the frame 133 to prevent damage of the isolator 134.

The shock absorbing member 135 is provided at a portion where the isolator 134 and the frame 133 are coupled to each other to maintain a gap between the isolator 134 and the frame 133 to allow a thermal expansion of the frame 133 so that the isolator ( 134) to prevent damage. For example, the buffer member 135 is formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF.

The buffer member 135 is formed to support the lower portion and the end portion 344 of the flange portion 343, the vertical cross section is formed in the 'b' shape. In addition, the buffer member 135 is provided at a position that is not constrained by the isolator 134 or the frame 133 by the fastening member 136.

In addition, the shock absorbing member 135 is formed to continuously surround the entire circumference of the isolator 134. Since the second shower head 13 according to the present embodiment has an approximately fan shape, the isolator 134 and the shock absorbing member are formed. (135) also has a fan shape. However, the present invention is not limited by the drawings, and the shape of the isolator 134 and the shock absorbing member 135 may be substantially variously changed according to the shapes of the showerhead module 10 and the second showerhead 13. have.

Since the buffer member 135 is interposed between the isolator 134 and the frame 133, a gap is formed between the isolator 134 and the frame 133 by the thickness of the isolator 134, and the frame 133 is formed at a high temperature. It can give room for thermal expansion.

Meanwhile, the buffer member 135 may have a protrusion 355 having a predetermined size protruding from a surface of the buffer member 135 contacting the end portion 344 of the flange portion 343 so as to be spaced apart from the isolator 134 by a predetermined distance.

In the drawings, reference numeral 351 denotes a horizontal support 351 supporting the flange portion 343 of the isolator 134 in the shock absorbing member 135, and 353 denotes a vertical support portion supporting the end portion 3440 of the flange portion 343. (353).

5 is an enlarged view illustrating main parts of a modified embodiment of FIG. 4. As shown in FIG. 5, the isolator 134 may have a stepped portion 346 to which the buffer member 135 is coupled.

A fastening member supporter 137 may also be provided between the fastening member 136 and the plasma electrode 131 to serve as a buffer. The fastening member supporter 137 serves to electrically insulate the plasma electrode 131 and the fastening member 136, and the pressure due to thermal expansion of the plasma electrode 131 and the frame 133 during thermal expansion at high temperature isolators 134. ) To mitigate the For example, the fastening member support 137 may be formed of any one material of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC, and PVDF like the buffer member 135. have. The fastening member supporter 137 may be interposed in a portion where the fastening member 136 is fastened in the plasma electrode 131, and may have a band shape having a predetermined thickness along an upper circumference of the plasma electrode 131 and having a continuous shape. .

In order to prevent the arc discharge from occurring between the fastening member 136 and the plasma electrode 131, the fastening member support part 137, which is an insulating material, is similar to the buffer member 135, such as PFFE, PGFE, PET, VITON, ABS, A bolt washer 138 formed of any one of MCNYLON, PFA, PEEK, PE, PP, PVC, and PVDF may be provided.

4, the tolerance hole 139 is provided in the coupling hole to which the coupling member 136 is fastened in the plasma electrode 131 to prevent breakage of the isolator 134 due to tolerance and misalignment.

According to the present embodiments, the buffer member 135 is provided between the frame 133 and the isolator 134 to effectively prevent breakage of the isolator 134 due to thermal expansion of the plasma electrode 131 and the frame 133. Can be.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. In addition, the present invention is not limited to the above-described embodiments, and various modifications and variations are possible to those skilled in the art to which the present invention pertains. Therefore, the spirit of the present invention should not be limited to the above-described embodiments, and all the things that are equivalent to or equivalent to the scope of the claims as well as the claims to be described later belong to the scope of the present invention.

10: showerhead module
11, 13, and 15: first to third showerheads
13a: injection hole
17: exhaust
19: plasma providing unit
130: plasma generation space
131: plasma electrode
132: spray plate
133: frame
134: isolator
135: buffer member
136: fastening member
137: fastening member support
138: bolt washer
139: tolerance support
341: vertical section
343: flange portion
344: end
346: stepped portion
351: horizontal support
353 vertical support
355: protrusion

Claims (14)

A showerhead module having a plurality of showerheads in a semi-batch atomic layer deposition apparatus,
A plasma electrode serving as an electrode for plasmalizing the reactant gas;
An injection plate disposed in parallel with the plasma electrode to form a plasma generation space therein and provide a plasmaized reactance gas to the substrate;
An isolator formed around the plasma generation space to electrically insulate the plasma electrode from the injection plate; And
A cushioning member provided at a coupling portion of the isolator and the shower head frame;
Showerhead module of the atomic layer deposition apparatus comprising a.
The method of claim 1,
The isolator is formed of a ceramic material,
A vertical part formed to surround the plasma generation space to electrically insulate the plasma electrode from the injection plate; And
A flange portion extending outward from an upper end portion of the vertical portion and interposed between the frame and the plasma electrode of the showerhead module to electrically insulate the frame and the plasma electrode;
Showerhead module of the atomic layer deposition apparatus comprising a.
The method of claim 2,
The buffer member is formed to be interposed between the flange portion of the isolator and the frame,
Shower head module of the atomic layer deposition apparatus is formed in the 'b' shape so that the flange portion surrounding the lower portion and the end portion of the flange portion adjacent to the frame.
The method of claim 3,
The buffer member is a showerhead module of the atomic layer deposition apparatus formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF.
The method of claim 3,
The showerhead module of the atomic layer deposition apparatus of the buffer member is formed on the surface in contact with the end of the flange portion protruding projections for separating the end of the flange portion and the buffer member.
The method of claim 3,
The buffer member is a showerhead module of the atomic layer deposition apparatus having a continuous shape surrounding the circumference of the isolator.
The method of claim 3,
The isolator is a showerhead module of the atomic layer deposition apparatus having a stepped portion coupled to the buffer member.
The method of claim 1,
The shower head is coupled to the plasma electrode, the isolator and the frame by the fastening member,
The showerhead module of the atomic layer deposition apparatus provided with the buffer member in a position not constrained by the fastening member between the isolator and the frame.
The method of claim 1,
Showerhead module of the atomic layer deposition apparatus further comprises a fastening member support for buffering between the fastening member and the plasma electrode.
10. The method of claim 9,
The fastening member support is formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF,
Showerhead module of the atomic layer deposition apparatus having a band shape along the upper circumference of the plasma electrode.
10. The method of claim 9,
Further provided with a bolt washer made of an insulating material to prevent arc discharge between the plasma electrode and the fastening member,
The bolt washer is shower head module of the atomic layer deposition apparatus formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC and PVDF.
In the showerhead module of a semi-batch atomic layer deposition apparatus for depositing a plurality of substrates at the same time,
A pair of first showerheads providing precursor gas;
A pair of second showerheads providing reactance gas; And
Two pairs of third showerheads providing precursor gas and disposed between the first and second showerheads;
Including,
The second shower head,
A plasma electrode serving as an electrode for plasmalizing the reactant gas;
An injection plate disposed in parallel with the plasma electrode to form a plasma generation space therein and provide a plasmaized reactance gas to the substrate;
An isolator formed around the plasma generation space to electrically insulate the plasma electrode from the injection plate; And
A cushioning member provided at a coupling portion of the isolator and the shower head frame;
Showerhead module of the atomic layer deposition apparatus comprising a.
The method of claim 12,
The cushioning member is formed of any one of PFFE, PGFE, PET, VITON, ABS, MCNYLON, PFA, PEEK, PE, PP, PVC, and PVDF to surround the isolator between the frame and the isolator. Showerhead module of the atomic layer deposition apparatus spaced apart.
The method of claim 12,
The showerhead module of the atomic layer deposition apparatus further comprises a plasma providing unit for applying a plasma to the second showerhead.

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