KR20120134241A - A method and an apparatus for repairing glass - Google Patents

Abstract

PURPOSE: A method and apparatus for repairing a glass substrate are provided to reduce a residual portion as a protrusion with a large diameter is repaired and a ground portion is formed in a wide range. CONSTITUTION: An apparatus for repairing a glass substrate comprises a measuring unit, a judging unit, and a repairing unit(35). The measuring unit measures the size of a protruding portion. The judging unit determines the way of repairing the substrate on the basis of the diameter of the protruding portion. The repairing unit repairs the protruding portion on the substrate. The repairing unit comprises a grinding head(130) and a grinding tape(144). The grinding head vertically presses the protruding portion on the substrate. The grinding tape horizontally moves in contact with the grinding head, and repairs the protruding portion.

Description

Repair apparatus for glass substrate and repair method for glass substrate {A method and an apparatus for repairing glass}

The embodiment relates to a repair apparatus for a glass substrate.

The embodiment relates to a repair method of a glass substrate.

Various display apparatuses for displaying information have been developed. The display device is, for example, a liquid crystal display device, a plasma display panel device, an electrophoretic display device, an organic electro-luminescence display device and a semiconductor. And a semi-conductor light-emitting display device. Among them, the liquid crystal display device has the advantages of light and small, high brightness, full color, and large size, and thus has been in the spotlight in the mainstream of the display device.

In the liquid crystal display, liquid crystals are placed between two glass substrates each including an electrode, and display information by controlling transmission / blocking of light according to displacement of the liquid crystals.

Glass substrate manufacturing methods of such liquid crystal display devices typically include a float process, a down draw process, a redraw process, and an overflow downdraw fusion process.

1 is a view showing an apparatus for manufacturing a glass substrate by the overflow downdraw method.

The apparatus for manufacturing a glass substrate of FIG. 1 includes an isopipe 13.

The isopipe 13 comprises a collecting vessel 11 and a root 15 and is connected with a feed pipe 9. The isopipe 13 may be made of a material such as platinum having high fire resistance.

In the glass substrate manufacturing process by the overflow downdraw method, molten glass is supplied to the collecting tube 11 of the isopipe 13 through the supply pipe 9. The molten glass fills the collecting container 11 and then overflows the upper part of the collecting container 11. The overflowed molten glass flows downward along the outer surface of the isopipe 13. The molten glass that flows along both outer surfaces of the isopipe 13 meets at the root 15 of the isopipe 13, where it forms a single glass substrate.

The glass substrate manufacturing process by the overflow downdraw method has an advantage that the glass substrate is in contact only with the isopipe 13, thereby obtaining a glass substrate having an excellent outer surface. However, there is a problem in that a material such as platinum forming the isopipe 13 is separated and included in the surface or the inside of the glass substrate to cause protrusion of the glass substrate surface.

The embodiment provides a repair method capable of repairing a glass substrate including a protrusion.

The embodiment provides a repair apparatus capable of repairing a glass substrate including a protrusion.

According to an embodiment, a repair apparatus for a glass substrate may include a measuring unit measuring a size of a protrusion on a substrate; A determination unit to determine a repair method according to the diameter of the protrusion measured in the measurement unit; And a repair portion for repairing the protrusion of the substrate by the command of the determination unit, wherein the repair portion includes: a polishing head configured to press the protrusion on the substrate in a vertical direction; And a polishing tape which moves in a horizontal direction in contact with the polishing head and repairs the protrusion on the substrate.

According to an embodiment, a repair method of a glass substrate may include measuring a size of a protrusion on a substrate; Determining a repair method according to the diameter of the protrusion; Repairing the protruding portion of the substrate at the repair portion by the repair method; And re-measuring the size of the protrusion after repair of the repair portion, wherein the repair portion includes: a polishing head configured to press the protrusion on the substrate in a vertical direction; And a polishing tape which moves in a horizontal direction in contact with the polishing head and repairs the protrusion on the substrate.

The embodiment provides a repair apparatus for a glass substrate that polishes the protrusions of the glass substrate to be used as a substrate of the liquid crystal display device.

The embodiment provides a method for repairing a glass substrate, which can be used as a substrate of a liquid crystal display by polishing the protrusion of the glass substrate.

1 is a view showing an apparatus for manufacturing a glass substrate by the overflow downdraw method.
2 is a diagram illustrating a pixel area of a liquid crystal display device formed by a glass substrate including a fine pattern.
3 is a block diagram of a glass substrate repair apparatus.
4 is a diagram of a repair unit.
5 is a view of a polishing head used in the glass substrate repair apparatus.
6 is a glass substrate formed after the glass substrate repair according to the first embodiment.
7 is a graph of experimental data on the polishing head size according to the first embodiment.
8A is a graph of polishing time versus height of a protrusion when the polishing rate of the glass substrate repair apparatus according to the first embodiment is 15 mm / s.
8B is a graph of polishing time versus height of a protrusion when the polishing speed of the glass substrate repair apparatus according to the first embodiment is 20 mm / s.
FIG. 9 is a graph of the remaining part height according to the balance height of the first embodiment. FIG.
10 is a view illustrating a glass substrate repairing method according to a second embodiment.

2 is a diagram illustrating a pixel area of a liquid crystal display device formed by a glass substrate including a fine pattern.

The liquid crystal display 20 of FIG. 2 includes an upper plate 23, a lower plate 21, and a liquid crystal layer 29 formed between the upper plate 23 and the lower plate 21.

The common electrode 27 may be formed on the upper plate 23. The common electrode 27 may be formed of a transparent conductive material.

The pixel electrode 25 may be formed on the lower plate 21. The pixel electrode 15 may be formed of a transparent conductive material.

The liquid crystal display device 20 transmits light due to a change in refractive index of the liquid crystal 26 forming the liquid crystal layer 29 due to a potential difference between the pixel electrode 25 and the common electrode 27. / Blocking is controlled to display information.

Equation 1 shows the kerr effect of defining the change of the refractive index of the liquid crystal with the strength of the electric field.

The refractive index Δn of the liquid crystal is proportional to the square of the wavelength λ of the light, the kerr constant K, and the intensity E of the electric field, respectively. In other words, the refractive index of the liquid crystal may be expressed as the product of the square of the intensity (E) of the electric field, the wavelength (λ) of the light and the kerr constant (K).

The intensity E of the electric field is proportional to the potential difference V between the pixel electrode and the common electrode and is inversely proportional to the distance d between the electrodes. That is, it satisfies the relation of E = V / d.

Therefore, when the refractive index Δn of the liquid crystal is represented by the interval d between the electrodes, it may be defined as in Equation 2.

According to Equation 2, the refractive index Δn of the liquid crystal is proportional to the square of the potential difference V between the pixel electrode and the common electrode, and inversely proportional to the square of the interval d between the electrodes.

The lower plate 21 of the liquid crystal display device 20 of FIG. 2 includes a fine pattern 22 generated during glass substrate forming by the overflow downdraw method of FIG. 1.

The lower plate 21 includes a protrusion 24 formed by the micropattern 22 and a flat portion 28 free from the influence of the micropattern 22.

The pixel electrode 25 is formed on the protruding portion 24 and the flat portion 28 of the lower plate 21. An interval between the pixel electrode 25 in the flat portion 28 and the common electrode 27 of the upper plate 23 is represented by a first interval d1, and the pixel electrode in the protrusion 24 is formed. The distance between the common electrode 27 of the upper plate 23 and the second plate 23 may be represented by a second interval d2. The first pattern d1 is larger than the second gap d2 by the fine pattern 22.

Therefore, since the first interval d1 in the flat portion 28 and the second interval d2 in the protrusion 24 are different, the potential difference formed in the flat portion 28 and the potential difference formed in the protrusion 24 are different. It also becomes different. Accordingly, the refractive indices of the liquid crystals in the flat part 28 and the protrusion part 24 become different from each other, and thus, there is a problem that accurate luminance control is difficult. In other words, for accurate luminance control by the liquid crystal, the distance between the lower plate 21 and the upper plate 23 should be uniform in all regions.

The above description has been made about the case where the fine pattern 22 is included in the lower plate 21, but the same applies to the case where the fine pattern 22 is included in the upper plate 23. In other words, the present invention can be applied to the glass substrate including the lower plate 21 and the upper plate 23.

3 is a block diagram of a glass substrate repair apparatus.

The glass substrate repair apparatus of FIG. 3 may include a measurement unit 31, a determination unit 33, and a repair unit 35.

The measuring unit 31 measures the height and diameter of the protrusion 24. The measuring unit 31 may be configured by a white light source interperometry (WSI) method to measure the protrusion 24 having a small size. The WSI method is an optical measuring technique for measuring a three-dimensional shape having a high step by detecting a position where the value of the interference fringe is maximized by using the limited coherence of white light.

The determination unit 33 determines whether to repair or a repair method based on the measured value by the measurement unit 31. The determination unit 33 determines the repair method of the glass substrate according to the diameter of the protrusion 24 measured by the measuring unit 31.

For example, the determination unit 33 may determine the repair method of the glass substrate by classifying the case where the diameter of the protrusion 24 measured by the measurement unit 31 is greater than 600 μm and less than 600 μm.

For example, when the diameter of the protrusion 24 is 600 μm or less, the determination unit 33 may drive the repair unit 35 to repair the glass substrate according to the first embodiment. For example, when the diameter of the protrusion 24 is greater than 600 μm, the determination unit 33 may drive the repair unit 35 to repair the glass substrate according to the second embodiment.

The repair unit 35 repairs the protrusion 24 of the glass substrate including the fine pattern by the command of the determination unit 33. The repair of the protrusions 24 will be described later.

The area where the protrusion of the glass substrate repaired by the repair unit 35 may be remeasured by the measurement unit 31. The protruding portion remaining by the remeasurement may be repaired by the repair portion 35 again.

4 is a diagram of a repair unit.

The repair unit 35 may include a polishing head 130, a polishing tape 144, a first roller 140, and a second roller 142.

The polishing head 130 moves up and down and presses the protrusion 124 of the glass substrate 121 including the fine pattern 122 in the vertical direction.

The polishing tape 144 moves in a horizontal direction in contact with the lower surface of the polishing head 130.

The protrusion 124 is contacted with the contact portion of the polishing tape 144 and the polishing head 130 to cut off the protrusion 124. In other words, the repair unit 35 presses the protrusion 124 in the vertical direction by using the polishing head 130 to planarize the protrusion 124 and simultaneously pushes the polishing tape 144 in the horizontal direction. By moving, the protrusion 124 may be repaired.

The first roller 140 maintains the polishing tape 144 in a circular shape, and then moves the polishing tape 144 to the second roller 142 by moving the polishing tape 144 in a horizontal direction. Can provide. The first roller 140 may include a power for a rotational motion for providing the polishing tape 144.

The second roller 142 may serve to pull the polishing tape 144 in the horizontal direction. The second roller 142 may include a power for rotating the winding of the polishing tape 144.

The polishing head 130 may be made of stainless steel.

The abrasive tape 144 may be made of a polyester material on which abrasive particles are deposited. The abrasive particles may be diamond particles.

The polishing tape 144 may recover the protruding pieces scraped from the polishing tape 144 by the repair of the glass substrate. The polishing tape 144 may be adhered to the protrusion pieces to be wound around the second roller 142 to remove the protrusion pieces. The protrusion pieces are adhered to the polishing tape 144 so that a separate cleaning process is not required after the glass substrate repair.

5 is a view of a polishing head used in the glass substrate repair apparatus.

Referring to FIG. 5, the polishing head 130 has a cylindrical shape. The lower surface of the polishing head 130 is composed of a curve. The polishing head 130 may be defined by a diameter 133 and a radius of curvature 135.

The diameter 133 means the diameter of the circle that appears when the cylindrical polishing head 130 is cut in the horizontal direction.

The radius of curvature 135 refers to the radius of a circle drawn when the arc is extended when the lower surface of the curve is viewed as an arc.

6 is a glass substrate formed after the glass substrate repair according to the first embodiment.

Referring to FIG. 6, the quartz glass substrate 221 includes a polishing unit 224 repaired by the glass substrate repair apparatus. In the quartz glass substrate 221, the protrusion 124 may be polished by the glass substrate repair apparatus to form the polishing part 224.

The quartz glass substrate 221 may include a fine pattern 222 even when polished by the glass substrate repair apparatus. Although the quartz glass substrate 221 includes the fine pattern 222, the protrusion 124 is removed from the quartz glass substrate 221, so that the second gap in the polishing unit 224 may be a flat portion ( 228 may be equal to or substantially similar to the first interval. Therefore, the error range of the electric field strength in the flat part 228 and the polishing part 224 is reduced, and the error in the refractive index of the liquid crystal is also reduced, so that the quartz glass substrate 221 can be used as the substrate of the liquid crystal display device.

Since the polishing portion 224 of the quartz glass substrate 221 is polished by the polishing head 130, the lower portion of the quartz glass substrate 221 has a concave shape according to the shape of the polishing head 130. The polishing unit 224 may be defined as the polishing width 210 and the balance height 220. The polishing width 210 may be a diameter of the polishing portion 224 of a circular shape. The balance height 220 may be a distance to a position where the end of the polishing head 130 reaches based on a horizontal extension line of the flat portion 228. The balance height 220 may be represented by a plus sign or a minus sign. When the balance height 220 has a minus sign, it means that the end of the polishing head 130 has reached down to the flat part 228. When the balance height 220 has a plus sign, it means that the end of the polishing head 130 has reached upward based on the flat part 228.

The polishing part 224 may include a remaining part 213. The remaining portion 213 may be formed because the polishing portion 224 is formed by polishing the protrusion 124 convex upwardly by the polishing head 130 convex downwardly. The remaining portion 213 may protrude in an upward direction based on an extension line extending in a horizontal direction from an upper surface of the flat portion 228. The height of the remaining portion 213 may be defined as a straight line distance from the extension line to the top of the remaining portion 213 having a peak point. The height of the remaining portion 213 may be represented by a plus sign or a minus sign. When the height of the remaining portion 213 is a plus sign, the remaining portion 213 is formed upward based on the flat portion 228. When the height of the remaining portion 213 is a minus sign, the remaining portion 213 is formed below the flat portion 228.

Table 1 shows experimental data on the size of the polishing head according to the first embodiment, and FIG. 7 is a graph of experimental data on the size of the polishing head according to the first embodiment.

Polishing Head Size (mm) Primary Secondary Third 4th 5th 6th 7th 8th 9th 10th Polishing width (㎛) result 5 155 153 149 151 139 152 148 150 153 159 150.9 Narrow grinding width 10 199 203 190 197 188 215 204 201 213 205 201.5 Narrow grinding width 15 251 255 248 247 239 251 253 252 257 250 250.3 Narrow grinding width 20 288 289 315 287 295 298 297 286 311 301 296.7 Narrow grinding width 25 343 342 338 348 349 350 351 349 355 352 347.7 Narrow grinding width 30 397 396 385 400 411 398 397 395 389 403 397.1 Narrow grinding width 35 440 452 459 448 436 443 452 461 453 452 449.6 Narrow grinding width 40 488 503 507 508 515 501 499 511 503 512 504.7 Narrow grinding width 45 551 556 552 549 553 556 551 547 552 553 552 Narrow grinding width 50 590 583 615 601 613 607 595 611 596 609 602 55 661 638 637 648 647 644 652 661 650 648 648.6 60 685 694 713 695 698 711 705 702 698 689 699 Polishing Tape Damage 65 763 762 744 743 753 746 748 745 739 746 748.9 Polishing Tape Damage 70 789 798 795 796 794 799 811 799 810 812 799.4 Polishing Tape Damage 75 861 846 847 844 845 852 853 846 851 837 848.2 Polishing Tape Damage 80 912 883 905 903 894 896 892 899 897 907 898.8 Polishing Tape Damage

The glass substrate repair apparatus according to the first embodiment repairs a glass substrate having a protrusion of 600 μm or less. Therefore, the polishing width 210 of FIG. 6 should be at least 600 μm.

Other variables must be fixed to determine the proper grinding head size. In the experiment, the polishing rate was fixed at 10 mm / s, the balance height at -0.5 μm, and the polishing time was 20 seconds, and the diameter 133 of the polishing head 130 which was difficult to change was fixed at 12 mm. As the radius of curvature 135 is changed, an appropriate polishing width is tested to determine the size of the polishing head 130.

As a result of polishing the curvature radius 135 of the polishing head 130 at 5 mm intervals up to 5 mm to 80 mm, in the case of the polishing head 130 having the curvature radius 135 ranging from 5 mm to 45 mm, the polishing width 210 is 600. It is not suitable for the glass substrate repair apparatus of the first embodiment because it is less than or equal to μm. When the radius of curvature 135 of the polishing head 130 is 60 μm to 80 μm, the polishing tape 144 may be damaged, which is not suitable for the glass substrate repair apparatus of the first embodiment. Therefore, the radius of curvature of the polishing head 130 of the glass substrate repair apparatus according to the first embodiment is most effective when it is 50㎛ to 55㎛.

FIG. 8A shows a graph of polishing time versus height of a protrusion when the polishing rate of the glass substrate repair apparatus according to the first embodiment is 15 mm / s, and FIG. 8B shows the polishing rate of the glass substrate repair apparatus according to the first embodiment. A graph of the polishing time against the height of the protrusion at 20 mm / s is shown.

In FIG. 8A and FIG. 8B, the balance height 220 is fixed to −0.5 μm and the radius of curvature 135 of the polishing head is 50 mm to find an appropriate polishing rate. Polishing time is defined as the time polished until the height of a protrusion becomes 0.2 micrometer or less.

Referring to the graph of FIG. 8A, it can be seen that the height of the protrusion is mostly 2 μm or less. When the polishing rate of the glass substrate repair apparatus is 15 mm / s, projections of 2 µm or less can be polished within 20 seconds, and projections of 1 µm or less, which occupy the largest part of the number of projections, can be polished within 10 seconds.

Referring to the graph of FIG. 8B, it can be seen that the height of the protrusion is mostly 2 μm or less. When the polishing rate of the glass substrate repair apparatus is 20 mm / s, projections of 2 μm or less can be polished within 15 seconds. However, since the x part on the graph indicates a damage to the polishing tape, when the polishing speed is 20mm / s, the polishing speed is high but the polishing tape may be damaged, so the polishing speed of 20mm / s or more is not appropriate.

Therefore, the polishing speed of the glass substrate repair apparatus is 10 mm / s to 15 mm / s in terms of efficiency and equipment damage prevention.

FIG. 9 is a graph of the remaining part height according to the remaining height of the first embodiment. FIG.

Referring to FIG. 6, the balance height 220 may be a distance from an upper surface of the flat portion 228 to a position at which the end of the polishing head 130 reaches based on an extension line extending in the horizontal direction. The height of the remaining portion 213 may be defined as a straight line distance to the top of the remaining portion 213 based on the extension line.

In order to determine the appropriate balance height 220 in the first embodiment, the polishing time is 20 seconds, the polishing speed is 10 mm / s, the radius of curvature of the polishing head is fixed at 50 mm, and the balance height 220 is -0.5 μm to 0.3 μm. The height of the remaining portion 213 was measured while changing to.

When the balance height 220 is -0.5 μm or less, a depression larger than an appropriate amount occurs in a portion indicated by a triangle in the graph, and a defect by the recessed portion is likely to occur. When the balance height 220 is -0.1 µm or more, the height of the remaining portion 213 is large at the portion indicated by the x-shape on the graph, so that the defect by the remaining portion 213 is likely to occur. Thus, the appropriate balance height 220 has a range of more than -0.5 μm and less than -0.1 μm. In other words, when the balance can be adjusted in units of 0.1 mu m, the appropriate balance height 220 is -0.4 mu m to -0.2 mu m.

10 is a view illustrating a glass substrate repairing method according to a second embodiment.

The glass substrate repairing method according to the second embodiment may be performed when the diameter of the protrusion is greater than 600 μm.

The glass substrate repairing method according to the second embodiment is the same as the first embodiment except that the polishing unit 300 is composed of five regions.

The polishing unit 300 includes a first polishing unit 311, a second polishing unit 313, a third polishing unit 315, a fourth polishing unit 317, and a fifth polishing unit 319. The first to fifth polishing units 311, 313, 315, 317, and 319 may be formed in a circular shape having the same size. The first to fifth abrasive parts 311, 313, 315, 317, and 319 may have a circular shape having a diameter of 600 μm. Each of the first to fifth polishing parts 311, 313, 315, 317, and 319 may be formed of the same apparatus used to form the polishing part 224 of the first embodiment. Each of the first to fifth polishing units 311, 313, 315, 317, and 319 may be formed in the same manner as the polishing unit 224 of the first embodiment.

The first to fifth polishing parts 311, 313, 315, 317, and 319 may be formed by repairing a glass substrate while the polishing head 130 and the polishing tape 144 of the first embodiment are moved. The first to fifth polishing parts 311, 313, 315, 317, and 319 may be formed by repairing a glass substrate while the polishing head 130 and the polishing tape 144 of the first embodiment are fixed. have.

The first polishing part 311 may be formed at the center of the protrusion 124 of FIG. 4. The lower end of the second polishing unit 313 may pass through the center of the first polishing unit 311. In other words, the second polishing unit 313 may overlap the first polishing unit 311 and be formed above. The right end of the third polishing unit 315 may pass through the center of the first polishing unit 311. In other words, the third polishing unit 315 may overlap the first polishing unit 311 and be formed on the left side. An upper end of the fourth polishing unit 317 may pass through the center of the first polishing unit 311. In other words, the fourth polishing unit 317 may overlap the first polishing unit 311 and be formed below. The left end of the fifth polishing unit 319 may pass through the center of the first polishing unit 311. In other words, the fifth polishing portion 319 may overlap the first polishing portion 311 and be formed on the right side.

That is, the second polishing unit 313 and the fourth polishing unit 317 may be externally formed, and the third polishing unit 315 and the fifth polishing unit 319 may be formed externally. Therefore, the longest distance in the left and right directions of the polishing unit 300 according to the second embodiment is equal to the sum of the diameters of the third polishing unit 315 and the fifth polishing unit 319. The longest distance in the left and right directions of the polishing unit 300 may be 1200㎛.

The longest distance in the vertical direction of the polishing unit 300 is equal to the sum of the diameters of the second polishing unit 313 and the fourth polishing unit 317. Therefore, the longest distance in the vertical direction of the polishing unit 300 may be 1200㎛.

The repair method according to the second embodiment has an effect of repairing a protrusion having a larger diameter than the repair method according to the first embodiment. In addition, there is a technical effect to form a polishing portion in a wide range, to reduce the remaining portion.

20: liquid crystal display device 21, 121: lower plate
22, 122, 222: fine pattern 23: top plate
24, 124: protrusion 25: pixel electrode
27: common electrode 28, 228: flat part
29: liquid crystal layer 31: measuring unit
33: judgment unit 35: repair unit
130: polishing head 140: first roller
142: second roller 213: remaining part
221: quartz glass substrate 224: polishing unit
228 flat part

Claims (14)

A measuring unit measuring a size of a protrusion on the substrate;
A determination unit to determine a repair method according to the diameter of the protrusion measured in the measurement unit;
It includes a repair unit for repairing the protrusion of the substrate by the command of the determination unit,
The repair unit,
A polishing head for urging the protrusion on the substrate in a vertical direction; And
And a polishing tape for contacting the polishing head and moving in the horizontal direction to repair the protrusion on the substrate. The method of claim 1,
A first roller providing the polishing tape; And
And a second roller for collecting the polishing tape. The method of claim 1,
The lower surface of the polishing head is a glass substrate repair device having a curvature radius of 50mm to 55mm. The method of claim 1,
The polishing rate of the protrusion on the substrate is a glass substrate repair apparatus of 10mm / s to 15mm / s. The method of claim 1,
Repairing apparatus of the glass substrate for repairing the projecting portion in the lower direction relative to the flat portion of the substrate until it is less than 0.1㎛, less than 0.5㎛. The method of claim 1,
Further comprising a polishing portion repaired to the substrate by the repair portion,
The glass substrate repair apparatus for determining the number of the polishing unit in the determination unit. The method of claim 1,
Further comprising a polishing portion repaired to the substrate by the repair portion,
The repair portion of the glass substrate for forming a plurality of the polishing portion. Measuring the size of the protrusion on the substrate;
Determining a repair method according to the diameter of the protrusion;
Repairing the protruding portion of the substrate at the repair portion by the repair method; And
Re-measuring the size of the protrusion after repair of the repair portion,
The repair unit,
A polishing head for urging the protrusion on the substrate in a vertical direction; And
And a polishing tape which moves in a horizontal direction in contact with the polishing head and repairs the protrusion on the substrate. 9. The method of claim 8,
The lower surface of the polishing head is a repair method of a glass substrate having a curvature radius of 50mm to 55mm. 9. The method of claim 8,
The polishing rate of the protrusion on the substrate is 10mm / s to 15mm / s repair method of a glass substrate. 9. The method of claim 8,
A repair method of a glass substrate, wherein the projection is ground until the protrusion becomes less than 0.1 µm and less than 0.5 µm in a downward direction based on the flat portion of the substrate. 9. The method of claim 8,
Further comprising a polishing portion repaired to the substrate by the repair portion,
Repairing method of the glass substrate for determining the number of the polishing unit in the determination unit. 9. The method of claim 8,
Further comprising a polishing portion repaired to the substrate by the repair portion,
The repair unit repairs a glass substrate to form a plurality of polishing units. 9. The method of claim 8,
A first roller providing the polishing tape; And
Repairing a glass substrate further comprises a second roller for collecting the polishing tape.

Images