KR20110104007A - 입자 슬러리로부터의 큰 입자의 선택적 제거를 위한 필터 - Google Patents
입자 슬러리로부터의 큰 입자의 선택적 제거를 위한 필터 Download PDFInfo
- Publication number
- KR20110104007A KR20110104007A KR1020117015799A KR20117015799A KR20110104007A KR 20110104007 A KR20110104007 A KR 20110104007A KR 1020117015799 A KR1020117015799 A KR 1020117015799A KR 20117015799 A KR20117015799 A KR 20117015799A KR 20110104007 A KR20110104007 A KR 20110104007A
- Authority
- KR
- South Korea
- Prior art keywords
- slurry
- particles
- fabric
- less
- cloth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
- B01D39/1607—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous
- B01D39/1623—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/02—Types of fibres, filaments or particles, self-supporting or supported materials
- B01D2239/025—Types of fibres, filaments or particles, self-supporting or supported materials comprising nanofibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/12—Methods and means for introducing reactants
- B01D2259/126—Semi-solid reactants, e.g. slurries
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Filtering Materials (AREA)
- Nonwoven Fabrics (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12099508P | 2008-12-09 | 2008-12-09 | |
| US61/120,995 | 2008-12-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110104007A true KR20110104007A (ko) | 2011-09-21 |
Family
ID=42260309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117015799A Ceased KR20110104007A (ko) | 2008-12-09 | 2009-12-09 | 입자 슬러리로부터의 큰 입자의 선택적 제거를 위한 필터 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100200519A1 (enExample) |
| EP (1) | EP2355915B1 (enExample) |
| JP (1) | JP5661642B2 (enExample) |
| KR (1) | KR20110104007A (enExample) |
| CN (2) | CN104107589B (enExample) |
| BR (1) | BRPI0916466A2 (enExample) |
| WO (1) | WO2010077718A2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201040319A (en) * | 2009-01-16 | 2010-11-16 | Fujimori Kogyo Co Ltd | Method of corrosion prevention and corrosion preventive structure |
| JP2012095520A (ja) * | 2010-10-01 | 2012-05-17 | Canon Inc | アクチュエータ |
| HUE039313T2 (hu) | 2013-02-14 | 2018-12-28 | Nanopareil Llc | Elektrosztatikus szálképzéssel nyert hibrid nanoszálas nemez, eljárás annak készítésére, valamint eljárás biomolekulák tisztítására |
| CN108507814A (zh) * | 2018-03-06 | 2018-09-07 | 冯悦然 | 一种碎屑的取样及运输方法 |
| WO2019173752A1 (en) | 2018-03-08 | 2019-09-12 | Repligen Corporation | Tangential flow depth filtration systems and methods of filtration using same |
| JP7519912B2 (ja) | 2018-05-25 | 2024-07-22 | レプリゲン・コーポレイション | タンジェンシャルフローフィルトレーションのシステムおよび方法 |
| US20210114170A1 (en) * | 2019-10-22 | 2021-04-22 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Container for storing slurry having fumed silica particles and cmp apparatus having the same |
Family Cites Families (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7007A (en) * | 1850-01-08 | Improvement in machinery for making cotton cordage | ||
| US3852134A (en) * | 1969-05-05 | 1974-12-03 | Gen Electric | Method for forming selectively perforate bodies |
| GB1522605A (en) | 1974-09-26 | 1978-08-23 | Ici Ltd | Preparation of fibrous sheet product |
| US4056476A (en) | 1975-02-27 | 1977-11-01 | Johnson & Johnson | Blood filter media |
| US4104170A (en) | 1975-08-28 | 1978-08-01 | Met-Pro Corporation | Liquid filter having improved extended polypropylene element |
| US4025679A (en) * | 1976-08-06 | 1977-05-24 | W. L. Gore & Associates, Inc. | Fibrillated polytetrafluoroethylene woven filter fabric |
| US4225642A (en) * | 1976-12-08 | 1980-09-30 | Teijin Limited | Raised and fused fabric filter and process for producing the same |
| JPS6058208A (ja) | 1983-09-09 | 1985-04-04 | Kurabo Ind Ltd | フイルタ−エレメントとその製法 |
| DE3445291C1 (de) * | 1984-12-12 | 1986-04-30 | Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt | Verfahren zum Trennen von gas- bzw. dampffoermigen oder fluessigen Stoffgemischen voneinander mittels Diffusion durch Membranen |
| US4795559A (en) * | 1985-03-29 | 1989-01-03 | Firma Carl Freudenberg | Semipermeable membrane support |
| JPS61222506A (ja) * | 1985-03-29 | 1986-10-03 | Japan Vilene Co Ltd | 半透膜支持体及びその製造方法 |
| US4836934A (en) * | 1986-02-26 | 1989-06-06 | General Signal Corporation | System for removing liquid from slurries of liquid and particulate material |
| JPS63108041A (ja) * | 1986-06-12 | 1988-05-12 | Tokuyama Soda Co Ltd | 微多孔性フィルム及びその製法 |
| US4863604A (en) * | 1987-02-05 | 1989-09-05 | Parker-Hannifin Corporation | Microporous asymmetric polyfluorocarbon membranes |
| US5084071A (en) * | 1989-03-07 | 1992-01-28 | International Business Machines Corporation | Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor |
| US4954142A (en) * | 1989-03-07 | 1990-09-04 | International Business Machines Corporation | Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor |
| CA1278533C (en) | 1989-08-22 | 1991-01-02 | E. Lee Noddin | Polyimide composite filter fabrics |
| US5154827A (en) | 1990-01-22 | 1992-10-13 | Parker-Nannifin Corporation | Laminated microporous fluorocarbon membrane and fluorocarbon filter cartridge using same |
| JP2581994B2 (ja) * | 1990-07-02 | 1997-02-19 | チッソ株式会社 | 高精密カートリッジフィルターおよびその製造方法 |
| US5449917A (en) * | 1992-02-06 | 1995-09-12 | Costar Corporation | Method and apparatus for forming a plurality of tracks in a flexible workpiece with a high energy particle |
| US5314843A (en) * | 1992-03-27 | 1994-05-24 | Micron Technology, Inc. | Integrated circuit polishing method |
| US5264010A (en) * | 1992-04-27 | 1993-11-23 | Rodel, Inc. | Compositions and methods for polishing and planarizing surfaces |
| US5209816A (en) * | 1992-06-04 | 1993-05-11 | Micron Technology, Inc. | Method of chemical mechanical polishing aluminum containing metal layers and slurry for chemical mechanical polishing |
| JP2655975B2 (ja) * | 1992-09-18 | 1997-09-24 | 三菱マテリアル株式会社 | ウェーハ研磨装置 |
| GB9220975D0 (en) * | 1992-10-06 | 1992-11-18 | Air Prod & Chem | Apparatus for supplying high purity gas |
| US5232875A (en) | 1992-10-15 | 1993-08-03 | Micron Technology, Inc. | Method and apparatus for improving planarity of chemical-mechanical planarization operations |
| US5543047A (en) | 1992-11-06 | 1996-08-06 | Pall Corporation | Filter with over-laid pleats in intimate contact |
| US5607718A (en) * | 1993-03-26 | 1997-03-04 | Kabushiki Kaisha Toshiba | Polishing method and polishing apparatus |
| US5318927A (en) | 1993-04-29 | 1994-06-07 | Micron Semiconductor, Inc. | Methods of chemical-mechanical polishing insulating inorganic metal oxide materials |
| US5407526A (en) * | 1993-06-30 | 1995-04-18 | Intel Corporation | Chemical mechanical polishing slurry delivery and mixing system |
| JP2531486B2 (ja) * | 1993-06-30 | 1996-09-04 | 旭化成工業株式会社 | 無機質粒子が分散した排液を処理する濾材 |
| US5395801A (en) * | 1993-09-29 | 1995-03-07 | Micron Semiconductor, Inc. | Chemical-mechanical polishing processes of planarizing insulating layers |
| JPH07116427A (ja) * | 1993-10-21 | 1995-05-09 | Tonen Chem Corp | フィルター用不織布及びその製造方法 |
| US5340370A (en) | 1993-11-03 | 1994-08-23 | Intel Corporation | Slurries for chemical mechanical polishing |
| JPH07197363A (ja) * | 1993-11-26 | 1995-08-01 | Toyobo Co Ltd | 極細繊維不織布およびその製造方法 |
| US5643053A (en) * | 1993-12-27 | 1997-07-01 | Applied Materials, Inc. | Chemical mechanical polishing apparatus with improved polishing control |
| US5650039A (en) | 1994-03-02 | 1997-07-22 | Applied Materials, Inc. | Chemical mechanical polishing apparatus with improved slurry distribution |
| US5607341A (en) * | 1994-08-08 | 1997-03-04 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
| US5597443A (en) * | 1994-08-31 | 1997-01-28 | Texas Instruments Incorporated | Method and system for chemical mechanical polishing of semiconductor wafer |
| US5655954A (en) | 1994-11-29 | 1997-08-12 | Toshiba Kikai Kabushiki Kaisha | Polishing apparatus |
| US5637185A (en) | 1995-03-30 | 1997-06-10 | Rensselaer Polytechnic Institute | Systems for performing chemical mechanical planarization and process for conducting same |
| US5665201A (en) | 1995-06-06 | 1997-09-09 | Advanced Micro Devices, Inc. | High removal rate chemical-mechanical polishing |
| JP3311203B2 (ja) | 1995-06-13 | 2002-08-05 | 株式会社東芝 | 半導体装置の製造方法及び半導体製造装置、半導体ウェーハの化学的機械的ポリッシング方法 |
| US5658185A (en) | 1995-10-25 | 1997-08-19 | International Business Machines Corporation | Chemical-mechanical polishing apparatus with slurry removal system and method |
| US5709593A (en) | 1995-10-27 | 1998-01-20 | Applied Materials, Inc. | Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
| US5700383A (en) | 1995-12-21 | 1997-12-23 | Intel Corporation | Slurries and methods for chemical mechanical polish of aluminum and titanium aluminide |
| US5645682A (en) | 1996-05-28 | 1997-07-08 | Micron Technology, Inc. | Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers |
| KR100202659B1 (ko) | 1996-07-09 | 1999-06-15 | 구본준 | 반도체웨이퍼의 기계화학적 연마장치 |
| US5705435A (en) * | 1996-08-09 | 1998-01-06 | Industrial Technology Research Institute | Chemical-mechanical polishing (CMP) apparatus |
| US6015499A (en) * | 1998-04-17 | 2000-01-18 | Parker-Hannifin Corporation | Membrane-like filter element for chemical mechanical polishing slurries |
| US6260709B1 (en) * | 1998-11-09 | 2001-07-17 | Parker-Hannifin Corporation | Membrane filter element for chemical-mechanical polishing slurries |
| US20070017879A1 (en) * | 1998-12-03 | 2007-01-25 | Stephen Proulx | Filtration cartridge and process for filtering a slurry |
| WO2001019490A1 (en) * | 1999-09-17 | 2001-03-22 | Millipore Corporation | Process and filter for filtering a slurry |
| US6746517B2 (en) * | 2000-09-05 | 2004-06-08 | Donaldson Company, Inc. | Filter structure with two or more layers of fine fiber having extended useful service life |
| WO2002089951A1 (en) * | 2001-05-03 | 2002-11-14 | Mykrolis Corporation | Process for regenerating a filtration cartridge for filtering a slurry |
| KR100549140B1 (ko) | 2002-03-26 | 2006-02-03 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 일렉트로-브로운 방사법에 의한 초극세 나노섬유 웹제조방법 |
| US7235122B2 (en) * | 2004-11-08 | 2007-06-26 | E. I. Du Pont De Nemours And Company | Filtration media for filtering particulate material from gas streams |
| US8689985B2 (en) * | 2005-09-30 | 2014-04-08 | E I Du Pont De Nemours And Company | Filtration media for liquid filtration |
| CN102227247B (zh) * | 2008-12-05 | 2014-01-01 | 纳幕尔杜邦公司 | 具有纳米纤维网层的过滤介质 |
-
2009
- 2009-12-09 JP JP2011540856A patent/JP5661642B2/ja not_active Expired - Fee Related
- 2009-12-09 KR KR1020117015799A patent/KR20110104007A/ko not_active Ceased
- 2009-12-09 EP EP09768579.6A patent/EP2355915B1/en not_active Not-in-force
- 2009-12-09 CN CN201410347222.0A patent/CN104107589B/zh not_active Expired - Fee Related
- 2009-12-09 BR BRPI0916466A patent/BRPI0916466A2/pt not_active IP Right Cessation
- 2009-12-09 WO PCT/US2009/067272 patent/WO2010077718A2/en not_active Ceased
- 2009-12-09 US US12/633,825 patent/US20100200519A1/en not_active Abandoned
- 2009-12-09 CN CN200980149648.2A patent/CN102271782B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP2355915A2 (en) | 2011-08-17 |
| WO2010077718A2 (en) | 2010-07-08 |
| WO2010077718A3 (en) | 2010-08-26 |
| EP2355915B1 (en) | 2018-03-14 |
| JP5661642B2 (ja) | 2015-01-28 |
| JP2012511428A (ja) | 2012-05-24 |
| BRPI0916466A2 (pt) | 2016-02-16 |
| CN102271782A (zh) | 2011-12-07 |
| CN104107589A (zh) | 2014-10-22 |
| CN104107589B (zh) | 2017-09-12 |
| CN102271782B (zh) | 2014-08-20 |
| US20100200519A1 (en) | 2010-08-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20110708 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| AMND | Amendment | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20141208 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20160512 Patent event code: PE09021S01D |
|
| AMND | Amendment | ||
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20161227 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20160512 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
| AMND | Amendment | ||
| PX0901 | Re-examination |
Patent event code: PX09011S01I Patent event date: 20161227 Comment text: Decision to Refuse Application Patent event code: PX09012R01I Patent event date: 20160909 Comment text: Amendment to Specification, etc. Patent event code: PX09012R01I Patent event date: 20141208 Comment text: Amendment to Specification, etc. |
|
| PX0601 | Decision of rejection after re-examination |
Comment text: Decision to Refuse Application Patent event code: PX06014S01D Patent event date: 20170223 Comment text: Amendment to Specification, etc. Patent event code: PX06012R01I Patent event date: 20170125 Comment text: Decision to Refuse Application Patent event code: PX06011S01I Patent event date: 20161227 Comment text: Amendment to Specification, etc. Patent event code: PX06012R01I Patent event date: 20160909 Comment text: Notification of reason for refusal Patent event code: PX06013S01I Patent event date: 20160512 Comment text: Amendment to Specification, etc. Patent event code: PX06012R01I Patent event date: 20141208 |